CN1891143A - High-density electrode array and its making method - Google Patents

High-density electrode array and its making method Download PDF

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Publication number
CN1891143A
CN1891143A CN 200510012103 CN200510012103A CN1891143A CN 1891143 A CN1891143 A CN 1891143A CN 200510012103 CN200510012103 CN 200510012103 CN 200510012103 A CN200510012103 A CN 200510012103A CN 1891143 A CN1891143 A CN 1891143A
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CN
China
Prior art keywords
array
electrode
microwell array
lead
wire
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Pending
Application number
CN 200510012103
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Chinese (zh)
Inventor
唐世明
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Institute of Biophysics of CAS
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Institute of Biophysics of CAS
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Publication date
Application filed by Institute of Biophysics of CAS filed Critical Institute of Biophysics of CAS
Priority to CN 200510012103 priority Critical patent/CN1891143A/en
Publication of CN1891143A publication Critical patent/CN1891143A/en
Pending legal-status Critical Current

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Abstract

The present invention belongs to the field of high-density electrode array technology, in particular, it relates to a high-density electrode array and its making method. Said high-density electrode array is formed from microhole array, single electrode, fixing resin and interface board, in which the single electrode is placed in vertical hole of microhole array; on the tail portion of said single electrode a lead wire is welded, the head portion of the single electrode is made into tip form, and is extended from the vertical hole of microhole array; the tail portion of said single electrode and upper surface of said microhole array are sealed by coating fixing resin and fixed together; and the tail end of said lead wire is welded with interface board. Besides, said invention also provides the concrete steps of its making method.

Description

A kind of high-density electrode array and manufacture method thereof
Technical field
The present invention relates to the high-density electrode array technical field, particularly a kind of high-density electrode array and manufacture method thereof.
Background technology
Electrod-array is to form array at the integrated a plurality of microelectrodes of substrate, implants the multiple electrode array of cortex, can read the active detailed information of neuron colony in the brain.Aspect the neuroscience basic research, multiple electrode array begins to become a kind of important nerve information detection means, and aspect medical application, multiple electrode array becomes the interface of neuroscience towards medical application.
1981, people such as U.S. scientist Kruger became multiple electrode array with the fixing a plurality of microelectrodes of ceramic material on the grid of 250 microns of spacings, and this method efficient is low, and the electrode length and the depth of parallelism are wayward.Multiple improvement multiple electrode array manufacture method has appearred later on, electrod-array as You Ta university is directly to carve a plurality of electrode tip with saw blade on silicon chip, make finished product through technologies such as insulation, bonding wires again, this class methods problem is that the size of electrode tip can not do too carefully, and too thick electrode pair brain tissue injury is bigger, also is difficult to make the high multiple electrode array of density simultaneously.Adopt planar integrated circuit manufacturing process such as photoengraving, ion sputtering to make flaky multi-electrode in addition in addition, be built up multiple electrode array again, as the electrod-array of Univ Michigan-Ann Arbor USA, but this class electrod-array still need improve yet not commercialization at present aspect combination property.
Summary of the invention
The objective of the invention is to provide a kind of high-density electrode array and manufacture method thereof.
Provide a kind of electrode diameter very thin, be easy to realize highdensity multiple electrode array manufacture method.
For achieving the above object, solution of the present invention provides a kind of high-density electrode array, is made up of microwell array, single electrode, lead-in wire, fixing resin and interface, and its single electrode is a square, places the upright opening of microwell array; Unipolar afterbody is than head length, horizontal-extending, and unipolar head is pointed, stretches out the upright opening of microwell array; Above the upper surface of unipolar part of horizontal afterbody and microwell array, fixing resin is arranged.
The present invention is the single electrode that superfine wire electrode is made, and lead-in wire is inserted in the microwell array then on the electrode afterbody welds in advance, forms multiple electrode array.It is leaded that this method is assembled out the electrod-array back side, saved the higher technology at array back side solder taul of difficulty.A kind of high-density electrode array is made up of microwell array, single electrode, lead-in wire, fixing resin and interface board, it is characterized in that, single electrode is a square, places the upright opening of microwell array; Unipolar afterbody is welded with lead-in wire, and unipolar head is pointed, stretches out the upright opening of microwell array; Above the upper surface of unipolar afterbody and microwell array, fixing resin is arranged; Lead terminal is welded on the interface board.
A kind of manufacture method of multiple electrode array comprises the steps:
A) on resin substrate, make microwell array with photoetching process;
B) be welding lead on the tinsel single electrode of tip shape at head;
C) single electrode is inserted in the upright opening of microwell array, the head of electrode stretches out upright opening;
D) be locked togather with the upper surface of fixing resin unipolar afterbody and microwell array;
E) lead terminal is welded on the interface board;
F) make finished product.
Described lead-in wire is enamel covered wire or the enamel-cover silver line or the enamel-cover gold thread of 0.01 millimeter ~ 0.03 mm dia.
The present invention uses the single electrode that is welded with lead-in wire in advance, can assemble out a lot of arrays of electrodeplate, and electrode spacing also can be very little, is easy to produce high-density electrode array.
Description of drawings
Fig. 1 is the single electrode sketch map of high-density electrode array of the present invention.
Fig. 2 is the microwell array sketch map of high-density electrode array of the present invention.
Fig. 3 is the microwell array scheme of installation of high-density electrode array of the present invention.
The specific embodiment
See Fig. 1, be equipped with 150 microns in about 25 microns in aperture, 1 millimeter of hole depth, pitch of holes, 15 * 15 microwell array 2.Be equipped with diameter and be 20 microns totally 225 of single electrodes 1, locate to go between 3 in the welding at 2.5 millimeters at electrode 1 end, operation is gone into micropore array 2 holes with single electrode 1, after all electrode 1 is gone into, drip resin 42 of microwell arrays, fixed electrode 1 and lead solder-joint, 3 ends that go between are soldered to interface board 5.
Fig. 2, the microwell array structure of high-density electrode array has a plurality of holes in microwell array 2, in order to the insertion of electrode 1.
Fig. 3, the mounting structure sketch map in the microwell array 2 of high-density electrode array behind the insertion electrode 1.

Claims (4)

1, a kind of high-density electrode array is made up of microwell array, single electrode, lead-in wire, fixing resin and interface board, it is characterized in that, single electrode is a square, places the upright opening of microwell array; Unipolar afterbody is welded with lead-in wire, and unipolar head is pointed, stretches out the upright opening of microwell array; Above the upper surface of unipolar afterbody and microwell array, fixing resin is arranged; Lead terminal is welded on the interface board.
2, a kind of high-density electrode manufacture method is characterized in that, comprises the steps:
A) on resin substrate, make microwell array with photoetching process;
B) be welding lead on the tinsel single electrode of tip shape at head;
C) single electrode is inserted in the upright opening of microwell array, the head of electrode stretches out upright opening;
D) be locked togather with the upper surface of fixing resin unipolar afterbody and microwell array;
E) lead terminal is welded on the interface board;
F) make finished product.
3, high-density electrode array according to claim 1 is characterized in that, described lead-in wire is enamel covered wire or the enamel-cover silver line or the enamel-cover gold thread of 0.01 millimeter ~ 0.03 mm dia.
4, high-density electrode manufacture method according to claim 2 is characterized in that, described lead-in wire is enamel covered wire or the enamel-cover silver line or the enamel-cover gold thread of 0.01 millimeter ~ 0.03 mm dia.
CN 200510012103 2005-07-07 2005-07-07 High-density electrode array and its making method Pending CN1891143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200510012103 CN1891143A (en) 2005-07-07 2005-07-07 High-density electrode array and its making method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200510012103 CN1891143A (en) 2005-07-07 2005-07-07 High-density electrode array and its making method

Publications (1)

Publication Number Publication Date
CN1891143A true CN1891143A (en) 2007-01-10

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200510012103 Pending CN1891143A (en) 2005-07-07 2005-07-07 High-density electrode array and its making method

Country Status (1)

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CN (1) CN1891143A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102525569A (en) * 2011-12-28 2012-07-04 浙江省肿瘤医院 Array type microdialysis probe
CN108042129A (en) * 2017-12-29 2018-05-18 广东省中医院 A kind of three-dimensional tiny array electrode for being used to detect cardiac muscular tissue's electric signal
CN111398898A (en) * 2020-04-08 2020-07-10 中国科学院长春光学精密机械与物理研究所 Neural mimicry bionic curved surface compound eye system for large-field-of-view three-dimensional motion detection
WO2021008222A1 (en) * 2019-07-17 2021-01-21 杭州暖芯迦电子科技有限公司 High-density array free-form surface miniature electrode and manufacturing method therefor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102525569A (en) * 2011-12-28 2012-07-04 浙江省肿瘤医院 Array type microdialysis probe
CN102525569B (en) * 2011-12-28 2013-12-25 浙江省肿瘤医院 Array type microdialysis probe
CN108042129A (en) * 2017-12-29 2018-05-18 广东省中医院 A kind of three-dimensional tiny array electrode for being used to detect cardiac muscular tissue's electric signal
WO2021008222A1 (en) * 2019-07-17 2021-01-21 杭州暖芯迦电子科技有限公司 High-density array free-form surface miniature electrode and manufacturing method therefor
CN111398898A (en) * 2020-04-08 2020-07-10 中国科学院长春光学精密机械与物理研究所 Neural mimicry bionic curved surface compound eye system for large-field-of-view three-dimensional motion detection

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