CN1867704B - Electrolytic method for phosphating metal surfaces and phosphated metal layer - Google Patents

Electrolytic method for phosphating metal surfaces and phosphated metal layer Download PDF

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Publication number
CN1867704B
CN1867704B CN200480030171.3A CN200480030171A CN1867704B CN 1867704 B CN1867704 B CN 1867704B CN 200480030171 A CN200480030171 A CN 200480030171A CN 1867704 B CN1867704 B CN 1867704B
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electrolytic solution
salt
layer
alloy
zinc
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CN200480030171.3A
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CN1867704A (en
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J·哈肯伯格
D·齐默曼
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Robert Bosch GmbH
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Robert Bosch GmbH
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/565Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/36Phosphatising

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)

Abstract

The invention relates to a method for phosphating metal layers by electrodeposition from acidic aqueous solutions containing at least zinc ions and phosphate ions, and by using direct current. Electrodeposition of zinc takes place in the same electrolytes and at the same time as deposition of the phosphating layer. The current density lies in the region of > A/dm<2>.

Description

The electrolysis process and the phosphated thus metal level that are used for the phosphated metal surface
Generality of the present invention relates to the electrolysis process that is used for the phosphated metal surface according to the preamble of claim 1.This method also relates to the phosphated metal level by this method preparation.
Background technology
The phosphoric acid zinc impregnation is to be widely used in the low alloy steel preserving method.Wherein in the precipitin reaction of pH value control, zn phosphate crystal (hopeite) is deposited on the component surface.For ability sedimentary phosphor silicate layer, must surpass the solubility product of zn phosphate.This is through corroding (pickling) (Fe > for example to base metal; Fe 2++ 2 E-) and realize.D/d thus electronics is used to reduce proton.PH is to the migration of neutrality to alkalescence and surpass solubility product.Usually form the thick layer of 2-3 μ m thus with about 90-95% coverage.Therefore the anticorrosion thin porous layer that is produced that is subject to also combines with other coatings (for example cosmoline or KTL) usually.Further the target of research is to avoid improving antiseptic property under the condition of these additional coatings.
A kind of technical scheme that is used to obtain than thick-layer is to use Faradaic current.The pH that obtains regulating easily through electrolytic reaction moves and the growth of adjustable ganglionic layer thus.
JP-A-85/211080 relates to a kind of method that under the situation that intermittently applies cathodic current, on the metallic surface, produces corrosion protection coating by phosphoric acid zinc impregnation solution.Wherein especially on the edge of pending metallic surface, also obtained corrosion resistant resist.
EP-A-0171790 discloses a kind of similar method.Wherein handle with the acidic aqueous solution that contains zine ion, phosphate anion and cl ions after the phosphoric acid zinc impregnation of routine the metallic surface, wherein on the metallic surface of anodizing, applies direct current simultaneously.
By the known a kind of metal surface phosphor acidifying method that is used for of DE-4111186A1; Be preferred for the phosphated method of electrogalvanizing or the galvanized surface of steel plate of melt impregnation; This method is wherein used the said workpiece of direct current anodizing simultaneously through carrying out with acidic aqueous phosphating solution processing in dipping or in the sprinkling dipping.Wherein handle by phosphating solution, this phosphating solution comprises the Zn of following component: 0.1-5g/l 2+Positively charged ion; The PO of 5-50g/l 4 3-Negatively charged ion; 0.1-50g/l NO 3 -Negatively charged ion; 0.1-5g/l Ni 2+The Co of positively charged ion and/or 0.1-5g/l 2+Positively charged ion.The pH value of this phosphating solution is 1.5-4.5, and the temperature of phosphating solution is 10-80 ℃.The galvanic current density of during phosphatize, this workpiece being carried out anodizing is 0.01-100mA/cm 2
The defective of tradition phosphatize method is that it is confined to low alloy steel and Zn and Al, and the gained layer is owing to be to be constituted and do not had a cathodic protection property by the zn phosphate crystal.In addition, in most of the cases need activation in advance.
Advantage of the present invention
With respect to prior art, the method that is used for the phosphated metal surface of the present invention has following advantage, promptly forms thickness and is close to the dense layer that can regulate arbitrarily.
Another advantage is that the gained layer has significantly higher erosion resistance.
In addition advantageously, can need not activation ground and carry out phosphatize.
Other favourable improvement of the present invention are provided by the measure of mentioning in the dependent claims.
Like this, electrolysis can for example perhaps be carried out under these two portions mix in constant voltage or constant current.
The accompanying drawing summary
Embodiments of the invention have been described in the drawings and description in more detail in the specification sheets of back.Accompanying drawing has shown preparing method's of the present invention schematic diagram.
Embodiment
Target of the present invention is to develop the electrolysis coating method that is used for the phosphated metal surface, and wherein the hole in phosphate layer is able to fill through metallic zinc or zinc alloy.According to the method for the invention, in same electrolytic solution with form the electrolytic deposition that the zn phosphate crystal side by side carries out zinc or zinc alloy.Method of the present invention is opposite with conventional phosphatize method, in ordinary method purify or pickling after in titanium phosphate suspension-s, flood workpiece (in pH~9 time about 60 seconds), method of the present invention then need not preparatory reactivation process.At j=-10--50A/dm 2Current density under cambial speed be about 3-20 μ m/min, this is very fast.In the ordinary method of using so far, only deposit with about 1 μ m/min.Utilize aforesaid method, except low alloy steel, can also directly be coated with coating stainless steel and other precious metals and base metal material (for example Al, Al alloy, Cu, Cu alloy, Ni, Ni alloy etc.).In contrast, in currentless method, only can on permission pickling erosive material, deposit, because otherwise it can not reach above-mentioned required pH migration.Wherein said electrolysis both can also can be regulated on constant current ground on constant voltage ground, perhaps mixed with these two portions and carried out.
Formed dense layer through method of the present invention, this layer is characterised in that the space between the zn phosphate crystal is filled by the zinc or the zinc alloy network of metal deposition.Through forming the zinc or the zinc alloy of conduction simultaneously, the pH migration (promptly by the outside electronics being provided) of electrolytic initiation can take place, and through the H at zinc surface +Reduction realize the almost bed thickness growth arbitrarily of zinc (zinc alloy)/zinc phosphate layer.
Said accompanying drawing shows the schematic diagram according to coating method of the present invention.Wherein, in a conventional electrolysis pond 10 with working electrode 11, through electrolytic solution 13 zinc/zinc phosphate layer 14 is deposited on the base metal 11, wherein said working electrode is made up of corresponding base metal and counter electrode 12.As stated, opposite with the standard phosphatize, being used herein to the required electronics of pH migration is not the iron rot (pickling on base metal is corroded) from low alloy steel, but from external current source 15.This protective current especially also is used to make base metal 11 not weather.
About 3 μ m that can almost deposit sealing (promptly atresia) as far as possible by method of the present invention without restriction are to about 500 μ m mixolimnions (with the metal phosphate layer of zinc, zinc/nickel no bare substrate metal of filling for example).The layer that routine obtains has about 5 hours patience to forming iron rust in the salt spray test, and can in the salt spray test, reach the patience greater than 1000 hours by 20-30 μ m zinc/zn phosphate mixolimnion.After 30 seconds phosphatize time, just reached and surpassed 420 hours erosion resistance.
Coating method of the present invention can carry out in the electrolyzer that routine is used.Wherein counter electrode both can be made up of for example noble metal plate such as platinum, Pt/Ti or gold, also can be by constituting like base metal sacrificial anodes such as Zn, Ni, Fe, and this counter electrode is used for transporting continuously metals ion.Can use stainless steel and bronze, Cu, Cu alloy, Ni, Ni alloy etc. as the working electrode (base metal) that deposits said layer above that.Electrolytic solution is the electrolytic solution that in not containing the phosphatize purposes of extrinsic current, uses basically.Wherein said electrolytic solution can for example contain:
Zn 2+:5-50g/l
H 2PO 4 -:5-80g/l
For this reason, importantly use so-called high zinc to bathe (Hochzinkbad), its zinc content is greater than 5g/l, and zinc content is merely about 1-5g/l in normal common low zinc is bathed, and wherein can not cause simple substance zinc or zinc alloy deposition between phosphate crystal.
In addition, said electrolytic solution can contain the ion that can form the element of alloy with zinc, makes deposition zinc alloy in deposition phosphatize layer.What it is also conceivable that is to add nano particle and organic molecule.Other possible bath additives that are used for layer is carried out modification are polyphosphate/ester, borate/ester, organic polyhydroxy compound, phosphoglyceride and fluorochemical.Can for example consider the ion of divalent metal M for additional ions, wherein other divalent metal M is selected from Ni, Fe, Co, Cu, Mn etc.
Said reaction can be carried out under the situation of adding or not adding accelerator.Can consider for example urea, nitrate salt, nitrite, oxymuriate, bromate, hydrogen peroxide, ozone, organic nitro-body, superoxide, oxyamine or their mixture as accelerator.As the accelerator nitrate ion in the 0-20g/l scope advantageously.The pH value of bathing is 1.5-4, is preferably 2.5-3.5.Can deposit binary alloy, ternary alloy or more senior alloy through adding Zn salt, Ni salt, Co salt, Fe salt or Mn salt.Metals ion also can be supplied with electrolytic solution by anode dissolution.
Aspect electrolytic condition, said electrolytic solution can be immobilized or mobile in said technology.Current density is greater than-1A/dm 2And preferably be in about j=-1 to about j=-100A/dm 2Between.Especially preferred be current density-5~-50A/dm 2Between.Electrolyte temperature is greater than 40 ℃ and is preferably 40~80 ℃, especially preferred 60~70 ℃.
As stated, electrolytic process both can also can be regulated and control on constant current ground on constant voltage ground, wherein can use direct current or pulse direct current.Through regulating local current densities, promptly pass through typing and/or mixed flow between anode and the workpiece, can regulate layer thickness distribution.Can also apply geometrical shape by this way and require harsh parts.

Claims (17)

1. the method for phosphated metal layer; It carries out through using under the galvanic situation electrolytic deposition by acidic aqueous solution at the same time; This acidic aqueous solution contains zine ion and phosphate anion at least; Said method is characterised in that, in same electrolytic solution, in deposition phosphatize layer, carries out the electrolytic deposition of zinc, and wherein current density is greater than-5A/dm 2, and said acidic aqueous solution also contains nano particle or organic molecule.
2. the method for claim 1 is characterized in that, temperature is greater than 40 ℃.
3. the method for claim 2 is characterized in that, temperature be greater than 40 ℃~smaller or equal to 80 ℃.
4. the method for claim 2 is characterized in that, temperature is 60~70 ℃.
5. the method for claim 1 is characterized in that, the contained zine ion of said electrolytic solution is greater than 5g/l, and institute's phosphorus-containing acid ion is greater than 10g/l.
6. the method for claim 5 is characterized in that, the contained zine ion of said electrolytic solution is smaller or equal to 50g/l greater than 5g/l-.
7. the method for claim 5 is characterized in that, said electrolytic solution institute phosphorus-containing acid ion is smaller or equal to 80g/l greater than 10g/l-.
8. the method for claim 1 is characterized in that, said metal level is selected from stainless steel, Al, Al alloy, Cu, Cu alloy, Ni and Ni alloy.
9. the method for claim 1 is characterized in that, the pH value of said electrolytic solution is 1.5~4.
10. the method for claim 9 is characterized in that, the pH value of said electrolytic solution is 2.5~3.5.
11. the method for claim 1 is characterized in that, in said electrolytic solution, adds accelerator.
12. the method for claim 11 is characterized in that, said accelerator is selected from urea, nitrate salt, nitrite, oxymuriate, bromate, ozone, organic nitro-body, superoxide, oxyamine or their mixture.
13. the method for claim 1 is characterized in that, the salt of extra interpolation Zn salt, Ni salt, Co salt and/or Mn in electrolytic solution.
14. the method for claim 1 is characterized in that, said electrolysis constant voltage or constant current or two portions mixing are carried out.
15. the method for claim 1 is characterized in that, the layer thickness distribution on metal level is regulated through local current densities.
16. the method for claim 1 is characterized in that, said direct current is pulse.
17. the method for claim 1 is characterized in that, layer formation speed is 3-20 μ m/ minute.
CN200480030171.3A 2003-10-16 2004-09-22 Electrolytic method for phosphating metal surfaces and phosphated metal layer Expired - Fee Related CN1867704B (en)

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DE10348251A DE10348251A1 (en) 2003-10-16 2003-10-16 Electrolytic process for phosphating metal surfaces and phosphated metal layer
DE10348251.2 2003-10-16
PCT/EP2004/052269 WO2005038095A2 (en) 2003-10-16 2004-09-22 Electrolytic method for phosphating metal surfaces and phosphated metal layer

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EP (1) EP1675975A2 (en)
JP (1) JP2007508457A (en)
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BR (1) BRPI0415520A (en)
DE (1) DE10348251A1 (en)
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DE102006035974A1 (en) * 2006-08-02 2008-02-07 Robert Bosch Gmbh Process for phosphating a metal layer
AU2009260794A1 (en) * 2008-06-18 2009-12-23 Massachusetts Institute Of Technology Catalytic materials, electrodes, and systems for water electrolysis and other electrochemical techniques
CN101643928B (en) * 2009-09-09 2011-01-05 重庆科技学院 Method for electrodepositing phosphate/metal composite film on cathode of surface of magnesium alloy
DE102010030465B4 (en) 2010-06-24 2023-12-07 Bayerische Motoren Werke Aktiengesellschaft Method for producing a sheet metal part from a high-strength steel sheet material with an electrolytically applied zinc-nickel coating
DE102011100974A1 (en) * 2011-05-09 2012-11-15 Knorr-Bremse Systeme für Schienenfahrzeuge GmbH Rail wheel and method for producing a rail wheel
CN102212864A (en) * 2011-06-10 2011-10-12 沈阳理工大学 Method for modifying electrolysis phosphorization membrane
US9393759B2 (en) * 2013-10-24 2016-07-19 General Electric Company Metal laminate structures with systems and methods for treating
DE102016100245A1 (en) 2016-01-08 2017-07-13 Staku Anlagenbau Gmbh Self-lubricating electrodeposited phosphating coating
CN105951155B (en) * 2016-06-01 2017-12-29 中钢集团郑州金属制品研究院有限公司 A kind of steel wire double method for bonderizing and its continuous producing apparatus online
CN107630243B (en) * 2017-10-16 2019-07-02 浙江五源科技股份有限公司 A kind of electrolytic preparation method of complex phosphate coating
CN114824263B (en) * 2021-01-29 2024-03-19 中南大学 Zn@Zn-E composite negative electrode, preparation method thereof and application thereof in water-based zinc ion battery
CN114883560B (en) * 2021-02-05 2024-03-19 中南大学 Three-dimensional current collector/Zn/Zn-E composite negative electrode, preparation thereof and application thereof in water-based zinc ion battery
CN114737179B (en) * 2022-05-05 2024-05-24 东南大学 High-temperature alloy heat-resistant phosphating film, and preparation method and application thereof

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BRPI0415520A (en) 2006-12-26
DE10348251A1 (en) 2005-05-12
EP1675975A2 (en) 2006-07-05
CN1867704A (en) 2006-11-22
TR200601814T1 (en) 2007-01-22
WO2005038095A2 (en) 2005-04-28
WO2005038095A3 (en) 2005-07-14
JP2007508457A (en) 2007-04-05
US20070295608A1 (en) 2007-12-27

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