CN1851862A - 平台开盖机构 - Google Patents
平台开盖机构 Download PDFInfo
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- CN1851862A CN1851862A CN 200510126402 CN200510126402A CN1851862A CN 1851862 A CN1851862 A CN 1851862A CN 200510126402 CN200510126402 CN 200510126402 CN 200510126402 A CN200510126402 A CN 200510126402A CN 1851862 A CN1851862 A CN 1851862A
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB2005101264027A CN100383916C (zh) | 2005-12-08 | 2005-12-08 | 平台开盖机构 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CNB2005101264027A CN100383916C (zh) | 2005-12-08 | 2005-12-08 | 平台开盖机构 |
Publications (2)
Publication Number | Publication Date |
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CN1851862A true CN1851862A (zh) | 2006-10-25 |
CN100383916C CN100383916C (zh) | 2008-04-23 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CNB2005101264027A Active CN100383916C (zh) | 2005-12-08 | 2005-12-08 | 平台开盖机构 |
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CN (1) | CN100383916C (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102368469A (zh) * | 2011-09-20 | 2012-03-07 | 嘉兴科民电子设备技术有限公司 | 一种新型icp刻蚀机预真空腔的盖子 |
CN110289235A (zh) * | 2019-07-09 | 2019-09-27 | 北京北方华创微电子装备有限公司 | 开盖装置和半导体加工设备 |
CN111863655A (zh) * | 2019-04-26 | 2020-10-30 | 北京北方华创微电子装备有限公司 | 开盖机构及半导体加工设备 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2290607Y (zh) * | 1997-01-02 | 1998-09-09 | 四川省江油市特殊钢厂 | 小型真空精炼炉 |
CN2438683Y (zh) * | 2000-09-30 | 2001-07-11 | 财团法人工业技术研究院 | 一种前开式晶片箱自动载入装置 |
CN2518792Y (zh) * | 2001-10-22 | 2002-10-30 | 中国农业科学院饲料研究所 | 一种连有盖体容器的盖体启闭装置 |
KR100426816B1 (ko) * | 2002-07-31 | 2004-04-14 | 삼성전자주식회사 | 진공압조절장치가 개선된 플라즈마 처리장치 |
CN2587886Y (zh) * | 2002-12-10 | 2003-11-26 | 贾文峰 | 一种工件表层纳米陶瓷薄膜制备装置 |
KR20050006999A (ko) * | 2003-07-10 | 2005-01-17 | 삼성전자주식회사 | 반도체 제조설비 |
KR100515955B1 (ko) * | 2003-11-18 | 2005-09-23 | 주식회사 에이디피엔지니어링 | 상부 커버를 개폐할 수 있는 개폐장치가 구비된평판표시소자 제조장치의 공정챔버 |
-
2005
- 2005-12-08 CN CNB2005101264027A patent/CN100383916C/zh active Active
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102368469A (zh) * | 2011-09-20 | 2012-03-07 | 嘉兴科民电子设备技术有限公司 | 一种新型icp刻蚀机预真空腔的盖子 |
CN102368469B (zh) * | 2011-09-20 | 2014-01-01 | 天通吉成机器技术有限公司 | 一种新型icp刻蚀机预真空腔的盖子 |
CN111863655A (zh) * | 2019-04-26 | 2020-10-30 | 北京北方华创微电子装备有限公司 | 开盖机构及半导体加工设备 |
CN111863655B (zh) * | 2019-04-26 | 2024-04-12 | 北京北方华创微电子装备有限公司 | 开盖机构及半导体加工设备 |
CN110289235A (zh) * | 2019-07-09 | 2019-09-27 | 北京北方华创微电子装备有限公司 | 开盖装置和半导体加工设备 |
Also Published As
Publication number | Publication date |
---|---|
CN100383916C (zh) | 2008-04-23 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: BEIFANG MICROELECTRONIC BASE EQUIPMENT PROCES RESE Free format text: FORMER OWNER: BEIJING YUANHE ELECTRONIC TECHNOLOGY CO., LTD. Effective date: 20110311 |
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C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 100016 NO. 1, JIUXIANQIAO EAST ROAD, CHAOYANG DISTRICT, BEIJING TO: 100015 NO. 1, JIUXIANQIAO EAST ROAD, CHAOYANG DISTRICT, BEIJING |
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TR01 | Transfer of patent right |
Effective date of registration: 20110311 Address after: 100015 No. 1 East Jiuxianqiao Road, Beijing, Chaoyang District Patentee after: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing Address before: 100016 Jiuxianqiao East Road, Beijing, No. 1, No. Patentee before: Beijing Yuanhe Electronic Technology Co., Ltd. |
|
CP03 | Change of name, title or address |
Address after: 100176 8 Wenchang Avenue, Beijing economic and Technological Development Zone, Beijing Patentee after: Beijing North China microelectronics equipment Co Ltd Address before: 100015 Jiuxianqiao East Road, Chaoyang District, Chaoyang District, Beijing Patentee before: Beifang Microelectronic Base Equipment Proces Research Center Co., Ltd., Beijing |
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CP03 | Change of name, title or address |