CN1839221B - Power supply device in a device for electrochemical treatment - Google Patents
Power supply device in a device for electrochemical treatment Download PDFInfo
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- CN1839221B CN1839221B CN2004800239981A CN200480023998A CN1839221B CN 1839221 B CN1839221 B CN 1839221B CN 2004800239981 A CN2004800239981 A CN 2004800239981A CN 200480023998 A CN200480023998 A CN 200480023998A CN 1839221 B CN1839221 B CN 1839221B
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- 239000000463 material Substances 0.000 claims abstract description 93
- 229910052751 metal Inorganic materials 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 25
- 230000005611 electricity Effects 0.000 claims description 102
- 239000004033 plastic Substances 0.000 claims description 19
- 229920003023 plastic Polymers 0.000 claims description 19
- 238000007789 sealing Methods 0.000 claims description 18
- 238000009413 insulation Methods 0.000 claims description 13
- 238000013461 design Methods 0.000 claims description 8
- 238000002955 isolation Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 6
- 238000013508 migration Methods 0.000 claims description 5
- 230000005012 migration Effects 0.000 claims description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 claims description 3
- 238000001746 injection moulding Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000000110 selective laser sintering Methods 0.000 claims description 3
- 229910001220 stainless steel Inorganic materials 0.000 claims description 3
- 239000010935 stainless steel Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 239000008151 electrolyte solution Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- 238000001465 metallisation Methods 0.000 abstract description 15
- 238000007598 dipping method Methods 0.000 abstract description 2
- 239000012530 fluid Substances 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 description 18
- 229910021645 metal ion Inorganic materials 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 238000005516 engineering process Methods 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005868 electrolysis reaction Methods 0.000 description 3
- 239000003792 electrolyte Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000037427 ion transport Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000012777 electrically insulating material Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000006223 plastic coating Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910001200 Ferrotitanium Inorganic materials 0.000 description 1
- 240000004859 Gamochaeta purpurea Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000000080 chela (arthropods) Anatomy 0.000 description 1
- 210000000038 chest Anatomy 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 239000006261 foam material Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000012811 non-conductive material Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000007785 strong electrolyte Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/06—Suspending or supporting devices for articles to be coated
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/005—Contacting devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electrolytic Production Of Metals (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Connection Of Batteries Or Terminals (AREA)
Abstract
According to the invention, power leads (2, 3) in a power supply device for material for electrochemical treatment (1) can themselves be protected from metal deposition, whereby at least one electrically-insulating sleeve (7, 8) is provided, which encloses the power leads (2, 3) starting from contact means (12) for contacting the material for treatment over a given length, such that, on dipping the power leads (2, 3) in a fluid up to said given length, no metal deposit of more than 0.04 mm occurs on exposed parts of the power leads on the electrochemical treatment of the material for treatment (1).
Description
Technical field
The present invention relates to a kind ofly be used for the equipment of its electrochemical treatment, especially electroplate or etch system in be used for the electric feeding unit of pending material.
Background technology
(plating) used in electrolysis at conducting stratum, and pending material is presented the negative pole that is connected to DC source with securing gear via electricity.Opposite electrode is anode in this case, correspondingly is connected to conductivity the positive pole of DC source.Anode and pending material all are arranged in ionogen (electrolyte), and described ionogen comprises the positive charged ions of material to be applied.Because formed electric field between anode and the pending material, they are moved to this pending material and deposit there.
Polarity is respective opposite in electrolytically etching, so pending material is connected to the positive pole of current source.
At least at the end in abutting connection with pending material, electricity is presented and is typically designed to the contact device that adopts terminal folder, pincers or anchor clamps form, so that they can grasp pending material.It is inner at least that whole electricity is presented, and comprises this contact device, then must be made of and yardstick can be designed so that the strong current that runs in practice can be only be transferred to pending material with less power loss and heating electric conduction material.The exact scale design that electricity is presented depends on employed electric conduction material, for example, needs bigger conduction cross section under the situation of relatively poor conductive material.
Electricity present then should be on the surface electrical isolation as much as possible so that, prevent that a large amount of metals also are deposited on electricity and present during the electroplating technology, just when metal deposition is on pending material.Under these circumstances, need in metallization removal technology subsequently, present the removal metal from electricity, to avoid because these accumulation of metal and to the contact device presented from electricity may disturb to the current delivery of pending material.In fact, compare with the surface of pending material, the metal deposition of approximate two to ten times of amounts is on exposed (blank) part that electricity is presented.This is because the virtual resistance device circuit from DC source to pending material, and electricity is presented and is set near this DC source and therefore is positioned at corresponding high potential, makes to take place there that field wire is concentrated and and then cause bigger metal deposition.
With respect to pending material, so exposed electricity is presented the effect of also playing so-called shunting negative electrode (robbercathode).Particularly, near the next-door neighbour that electricity is presented, the metal deposit of not expecting that electricity is presented causes the metal layer thickness on the pending material to reduce.For example when the application to printed circuit card, layer is important to this very uniformly, and above-mentioned situation causes obsolete underproof plate in etching step subsequently.
For fear of this problem, knownly be that the surface that all electricity that can contact with ionogen of electrical isolation are presented is except those section, for example contact areas of the contact device that is used for electrically contacting with pending material.This is because there be not metal can be deposited on the surface of electrical isolation during the electro-plating method.
This insulation is provided by special plastics usually, and described special plastics have high chemical stability, high thermal stability and high-wearing feature.This special plastic insulation layer is by immersing or spraying the and subsequently curing of this layer being applied.If contact device, for example contact area also is insulated during such immersion or spraying coating process, then its need after curing after by for example grinding or polishing mechanically dismantles.If, then be necessary to repeat described immersion or spray technology and curing subsequently in each case because insulation strength harsher required and will apply thicker layer.
Present in order to make this insulator layer that applies adhere to electricity well, electricity present must be before applying thoroughly cleaning and often experience by for example grinding or the extra process of sandblast, so that support adhesivity.
Although fine processing is also used such as Halar
TMThe special plastics of high quality, such insulator layer is still repeatedly damaged by the pending material of sharp edge, particularly when automatic coating unit is used for electroplating device.Insulation is penetrated at these spot failures, and metal will deposit.After the short period of time of only being everlasting, this metal just no longer can remove by cheap electrolysis metallization removal because utilize this method, before all sedimentary metals can be dissolved, to usually relatively the conduction of the spot failure of small area connect and frequently disconnected.In the case, needing to remove the electricity that also chemical metallization removal is relevant presents.If this must finish with too short interval, then this electricity is presented and is presented changing new electricity into.Present if expensive metal is used for electricity, then need fine processing, unless wherein by fusing, burn off or the mechanical treatment conducting plastic isolator of making a return journey, process metal surfaces again, and utilize the plastic insulation layer to apply electricity again and present.All these algorithms all are meticulous and very expensive.
The example that such electricity is presented is represented in Fig. 8.In this case, power on present 2 and following electricity present 3 and end at contact member 12 respectively.For example, following electricity is presented 3 and is fastened in electrolyte bath round-robin chain or the band of tooth is arranged, and owing to corresponding driving move within the figure plane or outside.Power on and present 2 and be mounted to and make it on vertical direction as shown by arrows, to move, and by compression spring to pressing down.Electricity is presented 2 and 3 and is formed anchor clamps thus, powers on to present 2 formation anchor clamps tops and descend electricity to present 3 to constitute the anchor clamps lower sections.Therefore pending material 1 can be clamped between two contacts 12.
Utilization powers on and presents thrust shoe (not shown) on 2, and by means of this electricity present on the tilting plane presented, the anchor clamps of Xing Chenging are can be when entering electroplating region closed and reopen when leaving this district in this way.When it was closed, anchor clamps engaged and are established to the electrical connection of the corresponding utmost point of electricity supply thus with pending material 1.When leaving electroplating region, electricity is presented and is reopened and pending material 1 is further carried by means of the roller path.
Present 2,3 effects of being electroplated and play the shunting negative electrode for the upper and lower electricity that prevents metal, provide above-mentioned thin plastic insulation layer to them as described above, at least to the liquid level of plating bath more than 21.This insulation layer extends the side up to contact 12.
From DE 19735352 C1, know an interchangeable solution.In this case, use the electricity of making by exposed conductive material to present and need not the plastic insulation layer.Present the over-drastic metal deposition for fear of electricity, mask is provided, described mask is provided with widely along the whole electroplating unit that electricity consumption is presented.In this case, mask is rigidly secured to the housing of electroplating unit or is fastened to anode.Mask is made by electrically insulating material at least in its surface, and they are configured such that and only are included in the less migration that ion, particularly metal ion in the ionogen are presented to electricity when electroplating, because these ions can not see through the electrical isolation mask and not have electric current can flow through the latter.On the contrary, described ion is got the path of minimum impedance, is the expected path to pending material in this case.Under this environment, also relate to by the shielding of mask to the field wire in the ionogen.
Gap in the mask must be arranged to make the pending material of the designed maximum ga(u)ge of equipment not touch mask in the case by these gaps.
If in system, handling thin pending material, promptly have the pending material of the thickness littler than maximum ga(u)ge, then this causes the big spacing between pending material and the mask.So so a large amount of ions can migrate to contact member,, whenever can be deposited near the electricity in gap all over thick relatively metal level and present with about 0.1mm or above thickness although make that mask is arranged.As mentioned above, available is in the time before next time, and these metal levels then no longer can remove by electrolysis metallization removal subsequently.
Be used for the thickness that reaches about 0.04mm copper-plated horizontal electroplating system printed circuit board (PCB), easily remove during operation on the contact member or in this undesirable metal level be very possible.Depend on system configuration, exceed the layer thickness of about 0.05mm to 0.1mm of undesirable metal level, then described layer no longer can be easily from the removal of having a few of contact member.The accumulation and removing subtly must be at work stoppage time the in process subsequently time of described layer.Under the every situation all over the layer thickness that exceeds 0.1mm to this layer, expection will have the interference of pair product.
Another shortcoming of this embodiment is that under the situation that the electricity set as Fig. 8 presented, mask can not move with the engagement movement that electricity is presented.
WO99/29931 discloses a kind of equipment that grasps of clamp-like, is used for grasping releasedly electroplating and galvanized object by means of dipping, as printed circuit board (PCB).This grasps equipment and comprises the first leg, the second leg and be used for that following petiolarea at first and second rods contacts with printed circuit board (PCB) and the contact plug that faces toward mutually of clamping printed circuit board.For example with the corrugated tube form contact plug axially on the sleeve of elastically deformable be fastened to each contact plug, and under relaxed state, extend to beyond the contact area of contact plug.When anchor clamps were grasping printed circuit board (PCB), the telescopic free end was placed on tightly on the surface of printed circuit board (PCB) and therefore and has prevented that contact area from contacting with plating bath, thereby prevents the metal deposit on the contact area.
DE 4211253 A1 disclose a kind of electroplating unit, and wherein the workpiece of electroplated is carried in the horizontal channel and passed through ionogen.Made by rotatable trolley wheel in this case with the workpiece negative electrode contact of passing through of advancing, wherein the lid with insulating material is applied to the distolateral of trolley wheel in case the metal deposit of not expecting on the not-go-end side.
DE 100 43 815 C2 also disclose a kind of electroplating unit.In this case, contact with pending material by the bar shaped contact member.For example, use the electrically insulating material of partial vulcanization to prevent the metallization of not expecting to the contact bar that has contact member.
DE 100 65 643 C2 also use and are used for the contact bar that contacts with pending material, and this contact bar comprises the contact insulation, and it covers the contact bar except that the actual contact zone fully.
WO 03/071009 A1 discloses another kind of electroplating unit, wherein electrically contacts bar and is configured in the electrical isolation axostylus axostyle, the metallization that the axostylus axostyle that wherein insulate protection contact bar avoids not expecting.
Summary of the invention
Therefore; an object of the present invention is to provide a kind of electric feeding unit that is used for pending material at the equipment that is used for its electrochemical treatment; wherein protect electricity to present as far as possible effectively and avoid metal deposition, and described electric feeding unit also is easy to make and maintenance is simple and cheap.
According to the present invention, a kind of electric feeding unit that is used for pending material at the equipment that is used for its electrochemical treatment is provided, comprise: at least one electricity is presented, make by barish at least electric conduction material, contact device, be provided at the end that described at least one electricity is presented, be used for electrically contacting with pending material, wherein electric feeding unit comprises the removable shell of at least one electrical isolation, this removable shell surrounds described at least one electricity at the length-specific that begins from contact device and presents, make during electrochemical treatment to pending material, present in liquid when electricity and to immerse when reaching this length-specific, the metal deposit greater than 0.04mm is not formed on the exposed part of electric conduction material, and, securing gear wherein is provided, is used for that described at least one shell is fastened to described at least one electricity and presents.
It is true very slowly wherein to have utilized metal ion to move in ionogen.Therefore metal ion need constantly take pending material to by the stream of the strong electrolyte in the high-performance plating bath.Otherwise metal ion will become and exhaust in ionogen and metal deposition will not take place, and perhaps less deposition will only take place.On the contrary, electric current will form hydrogen at negative electrode.
This means the washing of during electroplating technology electricity being presented in order to prevent, absolute airtight encirclement is not strict essential.Only be necessary to prevent that metal ion transport from returning exposed material.
In other words, electric feeding unit according to the present invention has used the shell of the form fit basically of presenting around electricity, prevents that thus metal ion transport from returning exposed electric conduction material.
These shells can be presented with electricity and separate preparation and pass through securing gear, and for example screw or clip are anchored on them.This causes simple manufacturing on the one hand, and the shell that damages on the other hand can easily be changed.Described in this case at least one shell preferably by to have from the plastics of the wall thickness of 0.2mm to 8mm carry out injection molding, deep-draw premoulding, automatic mold cutting or selective laser sintering make.
Described in this case at least one shell can be formed by a plurality of parts, and described a plurality of parts are connected to each other by means of sealing or by means of the interlocking section.Therefore this provides sufficient obstacle to returning by electrolytical ion migration, and has prevented thickness not expecting and problematic deposition greater than the metal of 0.04mm.Such shell can be used for particularly that described at least one electricity presents is subjected to the mechanical stress section, applies and be not subjected to mechanical stress partly also can provide insulation.The electricity feeding unit can comprise that particularly two preferred rigidity and/or L shaped electricity present, and described electricity is presented and can relative to each other be moved and so can be used as the anchor clamps that grasp pending material.Can provide spring device for this purpose.
Electricity is presented itself and is preferably made by titanium or stainless steel in this case, because these metallographic phase are stable for the chemical substance that routine is used for electro-plating method.Yet, in suitable ionogen, have more conductive material such as copper and can be used as the material that electricity is presented.Shell from distance that electricity is presented preferably in 0.1 to 4mm scope, make the least possible ionogen can be accumulated in that electricity is presented and shell between.
Utilization shows according to the test of electric feeding unit of the present invention, do not using near the pending material under the situation of additional plastic seal, metal deposition on the exposed electric conduction material is then average every all over about 0.005mm only, that is to say far below 0.04mm and limits.There is not the minimizing of discovery owing to the metal level on the pending material that causes in the shunting cathode effect described in introducing.
At one of the present invention is among the embodiment, described at least one shell surrounds described at least one electricity and presents, make to present to be immersed in the electrolytic solution and voltage when being applied to electricity and presenting that basic ion migration does not take place the exposed part from the outside of shell to described electric conduction material when electricity.
Description of drawings
In one embodiment of the invention, described at least one shell is presented with described at least one electricity and is separated manufacturing.
In one embodiment of the invention, described at least one shell basically form fit present to described at least one electricity.
In one embodiment of the invention, described at least one shell has the wall thickness from 0.2mm to 5mm.
In one embodiment of the invention, shell and the electricity distance of presenting be in 0.1 and 4mm between.
In one embodiment of the invention, described at least one shell is made by injection molding, deep-draw in premoulding, automatic mold cutting or selective laser sintering.
In one embodiment of the invention, described at least one shell is made by plastic material.
In one embodiment of the invention, described at least one shell is formed by at least two parts.
In one embodiment of the invention, connect by means of the sealing between described at least two parts.
In one embodiment of the invention, the interlocking section by means of described at least two parts connects at least between described two parts.
In one embodiment of the invention, described at least one shell does not have any basic flexible.
In one embodiment of the invention, described at least one shell surrounds that described at least one electricity presents is subjected to the mechanical stress section, is not subjected to mechanical stress partly to provide insulation to apply and described at least one electricity is presented.
In one embodiment of the invention, described at least one electricity is presented and is had L shaped design.
In one embodiment of the invention, be used between closed hermetically described at least one shell and the pending material intermediate space, be arranged on described at least one shell, contact device by the sealing that contact device contacted and be connected to thereon in the section that described at least one electricity presents.
In one embodiment of the invention, described at least one electricity is presented and is comprised that first electricity with first contact device is presented and second electricity with second contact device is presented, first and second electricity are presented and can relative to each other be moved, and pending material can be grasped between first and second contact devices.
In one embodiment of the invention, first electricity is presented with second electricity and is presented and can relative to each other move by spring device.
In one embodiment of the invention, described at least one electricity is presented by titanium, stainless steel or copper.
In one embodiment of the invention, described at least one electricity present do not have any basic flexible.
One embodiment of the present of invention are a kind of equipment that is used for the electrochemical treatment of pending material, and wherein this equipment comprises the above-mentioned electric feeding unit that is used for pending material.
In one embodiment of the invention, this equipment design is used to electroplate pending material.
In one embodiment of the invention, this equipment design is used for handling continuously pending material.
Below will and illustrate in greater detail the present invention with reference to the accompanying drawings by means of preferred one exemplary embodiment, in the accompanying drawings:
Fig. 1 illustrate have two shells part according to electric feeding unit of the present invention,
Fig. 2 illustrates the electric feeding unit of Fig. 1 with the view that rotates through 90 °,
Fig. 3 a-3c from the front, from the side and the preferred embodiment that the shell part among Fig. 1 and 2 the details A of Fig. 1 is shown from above as the cross section,
Fig. 4 a-c illustrates the preferred embodiment of another shell part among Fig. 1 with the view identical with Fig. 3 a-c,
Fig. 5 a-d illustrates Fig. 4 a-c of combination with one another and the shell part among Fig. 5 a-c,
Fig. 6 illustrates the details that the product of the electroplating system of vertical work supports, in this system, can use according to electric feeding unit of the present invention,
Fig. 7 is illustrated in the amplification according to electric feeding unit of the present invention of presenting as the electricity of the elongation of Fig. 6 and represents, and
Fig. 8 illustrates the electric feeding unit according to prior art.
Embodiment
Fig. 1 represents one exemplary embodiment according to electric feeding unit of the present invention with the view identical with the Fig. 8 that describes in introduction.The element that identical reference symbol is used to correspond to each other.By present by powering on or anchor clamps top 2 and down electricity present or anchor clamps lower section 3 formed anchor clamps grasp pending material 1, and electrically contact with it, wherein anchor clamps top 2 and anchor clamps lower section 3 are made of the exposed material with good conductive respectively.Bootstrap block 4 is rigidly secured to anchor clamps top 2, and spring guiding 11 is installed in the bootstrap block 4, makes it vertically to move in thorax.Anchor clamps lower section 3 has rigidity fastening spring block 5, and spring guiding 11 is firm engagement therein.Between two pieces 4 and 5, spring is set at and oppresses anchor clamps top 2 in the spring guiding 11 and with respect to anchor clamps lower section 3.Front end in anchor clamps top 2 and anchor clamps lower section 3, contact device or contact member 12 are connected to conductivity the upper and lower part of anchor clamps respectively with conduction pattern.Pending material 1 is bonded between these contact members 12, and electric current can be delivered to pending material 1 from anchor clamps top 2 and anchor clamps lower section 3.The joint of described pending material 1 also be can be used for conveying to it.
From contact member 12, with from the small distance of anchor clamps lower section 3 and the shell part 8 of surrounding anchor clamps lower section 3 is fastened to anchor clamps lower section 3.Shell part 8 is designed so that it extends to electrolytical liquid level in the electrochemical processing apparatus more than 21 at least in this case.Shell part 8 can be for example by means of plastic screw or utilize clip 10 to be fastened to anchor clamps lower section 3, clip 10 is formed on the shell part 8 and is latched in after the preglabellar field of anchor clamps lower section 3.Shell part 8 prevents that metal ion is from getting back to the outside of anchor clamps lower section 3 around the electrolyte of anchor clamps lower section 3, and as illustrated in the introduction to this description, this causes the shielding of formed electric field line between antianode (not shown) and pending material or electric the presenting simultaneously.In this example, shell part 8 is opened in the side in the face of anchor clamps top.Yet the closed design that centers on anchor clamps lower section 3 in principle fully also it is contemplated that.
In a similar manner, shell part 7 is fastened to anchor clamps top 2, and at least in the outside, promptly in the face of a side of anchor clamps lower section 3, shell part 7 is squeezed on the anchor clamps top 2 tightly, so that make electrolytical any between shell part 7 and the anchor clamps top 2 may accumulate minimum.In this example, shell part 7 is fastened to anchor clamps top by means of plastic screw 9.Push enough tightly as shell, then fastening by individual plastic screw 9 is enough.
Be similar to shell part 8, shell part 7 is being opened in the face of in the district of anchor clamps lower section 3.
When by the formed anchor clamps open and close in anchor clamps top 2 and anchor clamps lower section 3, firmly relative to each other slide at the formed sliding surface 22 of the point of contact of shell part 7 and 8, make and guarantee good electrical isolation in this case equally, prevent hydraulic seal that metal ion transport is returned and the good shielding of electric field line.The horizontal section that meets in lower section 7 and 8 forms closure surfaces 23.As long as be necessary, grasp pending material 1 and with district that it contacts in, these closure surfaces 23 forwardly cave in, so as to allow to the good fastening of described pending material 1 with contact.When anchor clamps are in closure state, the close pending material 1 of the sunk surface of shell part 7,8, but do not touch it, make to obtain good relatively sealing in this case equally.If desired, remaining little spacing also can seal by soft plastics and seal, and is as described below.Same case is applicable to other surfaces in the face of pending material of shell part 7 and 8, so that be enclosed in the intermediate space that the there is found.
Fig. 1 illustrates the electric feeding unit of Fig. 1 with the view that horizontally rotated 90 ° left, also is in closure state and is being grasped pending material 1, for example printed circuit board (PCB) by anchor clamps top 2 and anchor clamps lower section 3 formed anchor clamps.So pending material 1 is by means of compression spring 6, engage with good electrical connection by means of the contact member between anchor clamps top 2 and the anchor clamps lower section 3 12.In Fig. 2, can be clear that, at least one in shell part 7,8, have depression at front end as mentioned above, make that pending material 1 can be grasped securely.Because shell part 7,8 is fastened to clamp section 2,3, so shell part 7,8 moves with clamp section when open and close.Always sunk surface is therefore identical from the small distance of pending material, is about 0.05-0.3mm, and no matter the thickness of pending material 1.
As mentioned above, sliding surface 22 and confining surface 23 as close as possible being in the same place are to guarantee good sealing.The mode that can further improve sealing will be in following explanation.
In this case, Fig. 3 illustrates the possible configuration of shell part 7, and possible configuration and Fig. 5 that Fig. 4 illustrates shell part 8 illustrate the shell part 7 of configuration in this way and 8 interaction.Fig. 3 a, 4a and 5a with wherein represented, promptly the direction of observation in the plan of Fig. 2 illustrates the details A among Fig. 2.Fig. 3 b, 4b with 5b corresponding side-view are shown and Fig. 3 c, 4c illustrate the edge sectional view of the corresponding line B-B ' of relevant figure a, i.e. vertical view respectively with 5c.As represented in the drawings, for example, shell part 7 has mortise 18 and shell part 8 has tenon 19.These configurations can certainly be put upside down.Shown in Fig. 5 c, the tenon 19 of shell part 8 is bonded in the mortise 18 of shell part 7.This engaging one another as one man obtains near sliding surface 22.If this configuration is used for confining surface 23, then tenon 19 and mortise 18 are inserted into each other and shift out when anchor clamps are opened when anchor clamps are closed again.Realized better sealing between shell part 7 and 8 by such configuration.Therefore in fact there is not ionogen can arrive anchor clamps top 2 or anchor clamps lower section 3.
Near the next-door neighbour of contact member 12, such configuration is impossible, because pending material 1 is bonded on the there.Here, for example, sealing can be implemented shown in Fig. 5 d.In this case, shell part 7 and shell part 8 boths have mortise 18, wherein engage, cooperate or combine with adhesion plastic sealing strip 20.When anchor clamps were closed, plastic sealing strip 20 was pressed to pending material 1 and is therefore sealed surface in contact in this district, but the safety of not damaging basically with pending material 1 electrically contacts.Soft plastics, soft rubber or foam materials are suitable for this sealing.Should note guaranteeing stability about the chemical substance that exists in the ionogen.
As replaceable scheme, can in the zone of action of shell part 7 and 8, provide the sealing of the flat or circle of guaranteeing optimum sealing or shielding.
Usually, do not carry out the process of closed anchor clamps, be immersed in the ionogen up to anchor clamps.Ionogen has been filled in the inside of shell therefore.Because to the good relatively shielding and the sealing of field wire, and the migration that therefore reduces of metal ion, this only causes the less metal deposition of electrochemistry removal easily.
In principle, for example can only be provided at by shell part 7 and 8 formed shells that expection partly has in the district of damage shell when the pending material 1 of loading or unloading.In not damaging generable other district, can provide conventional plastic coatings.
Another one exemplary embodiment of the present invention will be described now.
Fig. 6 illustrates the details that the product as the frame bars 15 with product supporting rail 17 and elongation that is used to electroplate flat pending material 1 in so-called vertical impregnation bath electroplating system supports.Frame bars 15 is made by conductive material and they all provide insulation layer in all sides, and the liquid level that extends to electrolytic bath at least is more than 21.
Each frame bars 15 is equipped with terminal springs 14, and it is connected to metal frame hack lever 15 with good conductivity.Fig. 7 a illustrates the details of the imaginary circle C among Fig. 6 and amplifies.As can be seen, terminal springs 14 by twist, weldering or riveting form to the rectangular metal plate of frame bars 15.In each case, two in these spring elements 14 just in time are fastened on the frame bars 15 relative to one another, and they can engage pending material 1 at the edge 16 of pending material 1 thus.In this example, product supporting rail 17, frame bars 15 and terminal springs 14 electricity that is formed into pending material is presented.Routinely, these terminal springs also are provided with plastic coatings and only keep exposed for the transmission of electric current in the zonule of terminal position.This causes shortcoming illustrated in the introduction of this explanation once more.
Fig. 7 c illustrates along the cross section of the frame bars of the line D-D ' of Fig. 7 a.Moreover, according to the present invention, shell part 7 and 8 be provided at least terminal springs 14 near.As described in Fig. 3-5, shell part 7 and 8 can be by sealing each other or by pending material 1.
Therefore in this one exemplary embodiment, the point of contact of terminal springs is corresponding to the contact member 12 of the one exemplary embodiment of Fig. 1-5, and the rest part of terminal springs 14 presents 2 and 3 corresponding to electricity.
Because frame bars 15 has the length above 600mm usually, so can advantageously make shell part 7,8 and dispose joint (join) in aforesaid mode with a plurality of parts here.Can implement fastening by using the screw of making by non-conductive material 9 once more.
Certainly, application of the present invention is not limited to the one exemplary embodiment in this proposition.Particularly, the electricity of different shape and type is presented can mode according to the present invention to be protected and is avoided deposition.
Above case description with reference to electroplating device the present invention.Yet, also electric feeding unit according to the present invention may be used for the electrochemical treatment of other type, as the etching described in introduce.
List of numerals:
1 pending material
2 power on presents or anchor clamps top
3 times electricity is presented or the anchor clamps lower section
4 bootstrap block tops
5 spring block lower sections
6 compression springs
7 shell parts
8 shell parts
9 trip bolts
10 clips
The guiding of 11 springs
12 contact members
14 terminal springs
15 frame bars
16 edges
17 product supporting rails
18 mortises
19 tenons
20 sealings
21 liquid levels
22 sliding surfaces
23 confining surfaces.
Claims (22)
1. one kind is used for the electric feeding unit of pending material at the equipment that is used for its electrochemical treatment, comprising:
At least one electricity is presented, makes by barish at least electric conduction material,
Contact device is provided at the end that described at least one electricity is presented, is used for electrically contacting with described pending material,
Wherein said electric feeding unit comprises the removable shell of at least one electrical isolation, described removable shell surrounds described at least one electricity at the length-specific that begins from described contact device and presents, make during electrochemical treatment to described pending material, present in liquid when described electricity and to immerse when reaching this length-specific, the metal deposit greater than 0.04mm is not formed on the exposed part of described electric conduction material, and
Securing gear wherein is provided, is used for that described at least one shell is fastened to described at least one electricity and presents.
2. according to the electric feeding unit of claim 1,
Wherein said at least one shell surrounds described at least one electricity and presents, and makes to present when described electricity to be immersed in the electrolytic solution and voltage when being applied to described electricity and presenting, and basic ion migration does not take place the exposed part from the outside of described shell to described electric conduction material.
3. according to the electric feeding unit of claim 1,
Wherein said at least one shell is presented with described at least one electricity and is separated manufacturing.
4. according to the electric feeding unit of claim 1,
Wherein said at least one shell form fit is basically presented to described at least one electricity.
5. according to the electric feeding unit of claim 1,
Wherein said at least one shell has the wall thickness from 0.2mm to 5mm.
6. according to the electric feeding unit of claim 1,
The distance that wherein said shell and described electricity are presented be in 0.1 and 4mm between.
7. according to the electric feeding unit of claim 1,
Wherein said at least one shell is made by injection molding, deep-draw in premoulding, automatic mold cutting or selective laser sintering.
8. according to the electric feeding unit of claim 1,
Wherein said at least one shell is made by plastic material.
9. according to the electric feeding unit of claim 1,
Wherein said at least one shell is formed by at least two parts.
10. according to the electric feeding unit of claim 9,
Wherein connect by means of the sealing between described at least two parts.
11. according to the electric feeding unit of claim 9,
Wherein the interlocking section by means of described at least two parts connects at least between described two parts.
12. according to the electric feeding unit of claim 1,
Wherein said at least one shell does not have any basic flexible.
13. according to the electric feeding unit of claim 1,
Wherein said at least one shell surrounds that described at least one electricity presents is subjected to the mechanical stress section, is not subjected to mechanical stress partly to provide insulation to apply and described at least one electricity is presented.
14. according to the electric feeding unit of claim 1,
Wherein said at least one electricity is presented has L shaped design.
15. according to the electric feeding unit of claim 1,
Wherein be used between closed hermetically described at least one shell and the described pending material intermediate space, be arranged on described at least one shell, described contact device by the sealing that described contact device contacted and be connected to thereon in the section that described at least one electricity presents.
16. according to the electric feeding unit of claim 1,
Wherein said at least one electricity is presented and is comprised that first electricity with first contact device is presented and second electricity with second contact device is presented, described first and second electricity are presented and can relative to each other be moved, and described pending material can be grasped between described first and second contact devices.
17. according to the electric feeding unit of claim 16,
Wherein said first electricity is presented with described second electricity and is presented and can relative to each other move by spring device.
18. according to the electric feeding unit of claim 1,
Wherein said at least one electricity is presented by titanium, stainless steel or copper.
19. according to the electric feeding unit of claim 1,
Wherein said at least one electricity present do not have any basic flexible.
20. an equipment that is used for the electrochemical treatment of pending material,
Wherein said equipment comprises according to any one the electric feeding unit that is used for pending material among the claim 1-19.
21. according to the equipment of claim 20,
Wherein said equipment design is used to electroplate described pending material.
22. according to the equipment of claim 20,
Wherein said equipment design is used for handling continuously described pending material.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10340888.6 | 2003-09-04 | ||
DE10340888A DE10340888B3 (en) | 2003-09-04 | 2003-09-04 | Power supply device in a device for electrochemical treatment |
PCT/EP2004/009272 WO2005028718A2 (en) | 2003-09-04 | 2004-08-18 | Power supply device in a device for electrochemical treatment |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1839221A CN1839221A (en) | 2006-09-27 |
CN1839221B true CN1839221B (en) | 2011-12-21 |
Family
ID=34352764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004800239981A Expired - Lifetime CN1839221B (en) | 2003-09-04 | 2004-08-18 | Power supply device in a device for electrochemical treatment |
Country Status (11)
Country | Link |
---|---|
US (1) | US7815777B2 (en) |
EP (1) | EP1660701B1 (en) |
JP (1) | JP4621204B2 (en) |
KR (1) | KR101120048B1 (en) |
CN (1) | CN1839221B (en) |
BR (1) | BRPI0414090B1 (en) |
DE (1) | DE10340888B3 (en) |
HK (1) | HK1090959A1 (en) |
NO (1) | NO20060793L (en) |
TW (1) | TWI349046B (en) |
WO (1) | WO2005028718A2 (en) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL1032174C2 (en) * | 2006-07-14 | 2008-01-15 | Elsyca N V | Device suitable for electrochemically processing an object and method for manufacturing such an apparatus, method for electrochemically processing an object with such an apparatus and also object manufactured with such a method. |
NL2005480C2 (en) | 2010-10-07 | 2012-04-11 | Meco Equip Eng | DEVICE FOR SINGLE-SIDED ELECTROLYTIC TREATMENT OF A FLAT SUBSTRATE. |
CN102601470A (en) * | 2012-03-21 | 2012-07-25 | 南京航空航天大学 | Method for improving stability of electrolytic machining process of tube electrode |
US20140033762A1 (en) | 2012-08-03 | 2014-02-06 | Air Products And Chemicals, Inc. | Heavy Hydrocarbon Removal From A Natural Gas Stream |
CN104805490A (en) * | 2015-04-29 | 2015-07-29 | 广汽吉奥汽车有限公司 | Electroplating individual part, end part electroplating structure and electroplating method |
TWI692551B (en) * | 2019-03-04 | 2020-05-01 | 聯策科技股份有限公司 | Asymmetric water seal conductive clamp |
CN111485276B (en) * | 2020-06-05 | 2021-10-12 | 厦门通富微电子有限公司 | Electroplating equipment |
EP4206364A1 (en) | 2022-01-03 | 2023-07-05 | Atotech Deutschland GmbH & Co. KG | Device for gripping a workpiece, method of manufacturing the device, and conveying system and apparatus for electrochemical surface treatment comprising at least one such device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3616447A (en) * | 1969-01-21 | 1971-10-26 | Eastman Kodak Co | Apparatus for suspending a body in a corrosive solution |
DE3939256A1 (en) * | 1989-11-28 | 1991-05-29 | Schering Ag | HOLDING AND CONTACT DEVICE FOR COMPONENTS TO BE TREATED IN AN ELECTROLYSIS BATH |
US5405518A (en) * | 1994-04-26 | 1995-04-11 | Industrial Technology Research Institute | Workpiece holder apparatus |
CN1314958A (en) * | 1998-08-19 | 2001-09-26 | 阿托特德国有限公司 | Contact element |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3603856C2 (en) | 1986-02-07 | 1994-05-05 | Bosch Gmbh Robert | Method and device for galvanizing flat workpieces such as printed circuit boards |
EP0239736B2 (en) | 1986-02-28 | 1995-10-25 | Schering Aktiengesellschaft | Elongate racks for the detachable attachment of circuit boards to be galvanized, and associated circuit boards and parts |
DE58905370D1 (en) | 1988-07-07 | 1993-09-30 | Siemens Nixdorf Inf Syst | Electroplating device for plate-shaped workpieces, in particular printed circuit boards. |
DE3839972C1 (en) * | 1988-11-26 | 1989-12-28 | Deutsche Automobilgesellschaft Mbh, 3000 Hannover, De | |
JPH02118967U (en) * | 1989-03-10 | 1990-09-25 | ||
JPH0385849U (en) * | 1989-12-19 | 1991-08-30 | ||
DE4211253A1 (en) * | 1992-04-03 | 1993-10-07 | Siemens Ag | Electroplating appts. for plate-like parts esp. PCB |
AT395915B (en) * | 1991-06-27 | 1993-04-26 | Avl Verbrennungskraft Messtech | INTERNAL ELECTRODE OF A POLAROGRAPHIC ELECTRODE |
US5223116A (en) | 1992-05-11 | 1993-06-29 | Siemens Aktiengesellschaft | Apparatus for electrophoretic application of a lacquer onto plate-shaped work pieces |
DE19504517C1 (en) | 1995-02-11 | 1996-08-08 | Atotech Deutschland Gmbh | Process for electroplating plate-shaped items to be treated in horizontal continuous systems and device for carrying out the process |
JPH0931686A (en) * | 1995-07-21 | 1997-02-04 | Toshiba Corp | Electroplating device and method thereof |
US6099712A (en) * | 1997-09-30 | 2000-08-08 | Semitool, Inc. | Semiconductor plating bowl and method using anode shield |
DE19717512C3 (en) | 1997-04-25 | 2003-06-18 | Atotech Deutschland Gmbh | Device for electroplating circuit boards under constant conditions in continuous systems |
DE29708602U1 (en) * | 1997-05-14 | 1997-07-17 | Strecker, Günther, 74080 Heilbronn | Holding device for electroplating |
DE19736352C1 (en) | 1997-08-21 | 1998-12-10 | Atotech Deutschland Gmbh | Apparatus for contacting flat items in continuous galvanising installations |
DE29721741U1 (en) * | 1997-12-09 | 1998-03-05 | Strecker, Günther, 74080 Heilbronn | Bracket-like holding device for electroplating |
US6322678B1 (en) * | 1998-07-11 | 2001-11-27 | Semitool, Inc. | Electroplating reactor including back-side electrical contact apparatus |
US6294060B1 (en) | 1999-10-21 | 2001-09-25 | Ati Properties, Inc. | Conveyorized electroplating device |
DE10019720A1 (en) * | 2000-04-20 | 2001-10-31 | Atotech Deutschland Gmbh | Method and device for electrical contacting of plate-like items to be treated in electrolytic processes |
DE10040935C2 (en) * | 2000-08-19 | 2003-05-15 | Adelwitz Technologie Zentrum G | Process for the galvanic coating of high-temperature superconductors with Cu connections |
DE10043815C2 (en) * | 2000-09-06 | 2002-08-08 | Egon Huebel | Method and device for electrical contacting of material to be treated in electrolytic systems |
DE10065643C2 (en) * | 2000-12-29 | 2003-03-20 | Egon Huebel | Device and method for the electrochemical treatment of strip-like and plate-like material |
JP3677488B2 (en) * | 2002-05-14 | 2005-08-03 | 丸仲工業株式会社 | Clip-type work hanger in electroplating equipment |
DE10207941A1 (en) * | 2002-02-17 | 2003-09-04 | Egon Huebel | Method and device for electrical contacting of flat goods in electrolytic systems |
US7118658B2 (en) * | 2002-05-21 | 2006-10-10 | Semitool, Inc. | Electroplating reactor |
-
2003
- 2003-09-04 DE DE10340888A patent/DE10340888B3/en not_active Expired - Lifetime
-
2004
- 2004-08-18 BR BRPI0414090-7A patent/BRPI0414090B1/en not_active IP Right Cessation
- 2004-08-18 CN CN2004800239981A patent/CN1839221B/en not_active Expired - Lifetime
- 2004-08-18 KR KR1020067004262A patent/KR101120048B1/en active IP Right Grant
- 2004-08-18 WO PCT/EP2004/009272 patent/WO2005028718A2/en active Application Filing
- 2004-08-18 JP JP2006525062A patent/JP4621204B2/en not_active Expired - Lifetime
- 2004-08-18 EP EP04764258.2A patent/EP1660701B1/en not_active Expired - Lifetime
- 2004-08-18 US US10/570,280 patent/US7815777B2/en active Active
- 2004-08-31 TW TW093126236A patent/TWI349046B/en active
-
2006
- 2006-02-17 NO NO20060793A patent/NO20060793L/en not_active Application Discontinuation
- 2006-11-16 HK HK06112633.2A patent/HK1090959A1/en not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3616447A (en) * | 1969-01-21 | 1971-10-26 | Eastman Kodak Co | Apparatus for suspending a body in a corrosive solution |
DE3939256A1 (en) * | 1989-11-28 | 1991-05-29 | Schering Ag | HOLDING AND CONTACT DEVICE FOR COMPONENTS TO BE TREATED IN AN ELECTROLYSIS BATH |
US5405518A (en) * | 1994-04-26 | 1995-04-11 | Industrial Technology Research Institute | Workpiece holder apparatus |
CN1314958A (en) * | 1998-08-19 | 2001-09-26 | 阿托特德国有限公司 | Contact element |
Also Published As
Publication number | Publication date |
---|---|
TWI349046B (en) | 2011-09-21 |
KR101120048B1 (en) | 2012-03-23 |
TW200513547A (en) | 2005-04-16 |
WO2005028718A2 (en) | 2005-03-31 |
BRPI0414090A (en) | 2006-10-31 |
KR20060118424A (en) | 2006-11-23 |
BRPI0414090B1 (en) | 2015-08-11 |
CN1839221A (en) | 2006-09-27 |
HK1090959A1 (en) | 2007-01-05 |
JP2007504359A (en) | 2007-03-01 |
US20070039816A1 (en) | 2007-02-22 |
NO20060793L (en) | 2006-04-04 |
EP1660701B1 (en) | 2015-02-25 |
US7815777B2 (en) | 2010-10-19 |
EP1660701A2 (en) | 2006-05-31 |
DE10340888B3 (en) | 2005-04-21 |
WO2005028718A3 (en) | 2005-06-09 |
JP4621204B2 (en) | 2011-01-26 |
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