CN1814361A - Cleaning method and device using laser exciting gas - Google Patents
Cleaning method and device using laser exciting gas Download PDFInfo
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- CN1814361A CN1814361A CN 200510006256 CN200510006256A CN1814361A CN 1814361 A CN1814361 A CN 1814361A CN 200510006256 CN200510006256 CN 200510006256 CN 200510006256 A CN200510006256 A CN 200510006256A CN 1814361 A CN1814361 A CN 1814361A
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Abstract
This invention is a cleaning method and device of using laser activate gas. the device first provides a cleaning base board procedures, then grasps the base with surface pollution , then spaying gas on base surface procedure is done. Solid gas molecular snowflake is generated by gas generating device, and is sprayed to the base surface. Laser irradiation the cleaning base surface procedure is done when the snowflake on the surface volatilizes to gas. the snowflake accelerates its sublimation and expands to explosion when the base it irritated by laser to drive the surface pollution separated from the base. Finally, the base surface is cleared up.
Description
Technical field
The present invention relates to a kind of cleaning method and device that uses laser exciting gas, especially a kind of method and device that is applied to the cleaning base plate surface.
Background technology
Relevant known application is in the technology of cleaning base plate, and the device that removes the substrate surface pollutant, it is the device that utilization one produces suspended material, cooperate a substrate holding apparatus that can rotate at a high speed again, by suspension is sprayed at substrate surface, and substrate holding apparatus clamping to be cleaned substrate to be cleaned rotated, when the rotating speed of substrate is increased to when rotating at a high speed, the high speed swirling eddy of substrate surface to be cleaned and the centrifugal force that rotates are at a high speed skimmed in utilization, remove the pollutant of substrate surface, reach the effect of cleaning substrate to be cleaned, in addition, known cleaning device can again be set up a heating lamp more, to carry out radiation heating for substrate, temperature-compensating when cleaning base plate to be provided is to avoid producing condensate water.
Yet, above-mentioned known cleaning base plate technology and be applied to the device of cleaning base plate, mainly be that utilization clamping board device reaches the mode that substrate is rotated at a high speed, also therefore the device of known cleaning base plate need increase purchasing of whirligig and builds and maintenance cost, moreover, the known technology that reaches cleaning base plate is rotated in utilization at a high speed, be not suitable for large substrate, because of the cleaning effect of substrate surface is directly proportional with distance apart from the pivot of clamping board device, the cleaning performance that is substrate surface is inhomogeneous, in addition, the heater of this cleaning base plate, known use heating lamp is via the photothermal mode heated substrates of the generation of heating lamp surface, hardly realize that it is relatively poor that known technology utilizes the heating power of heating lamp and effect, can't reach the requirement of effective heating of cleaning base plate.
Summary of the invention
The object of the present invention is to provide a kind of cleaning method and device that uses laser exciting gas, when applying to cleaning base plate in order to solve known cleaning method and device, the uneven defective of poor effect and substrate surface, and the too high shortcoming of cost of improving known cleaning base plate device, and overcome the defective that known cleaning base plate device can't be applicable to the cleaning large substrate.
To achieve the above object, the invention provides a kind of cleaning method and device that uses laser exciting gas, this cleaning device provides a substrate step to be cleaned earlier, provide a surface distributed that the substrate to be cleaned of surface contaminant is arranged, and should substrate clamping to be cleaned and finish and be fixed on this clamping fixture, carry out spray gas again in substrate surface step to be cleaned, utilize gas generation apparatus to produce solid state gas molecule snowflake, and erupt in this substrate surface to be cleaned, when the snowflake volatilization distillation of this substrate surface to be cleaned is gas, carry out laser again and shine substrate surface step to be cleaned, the laser beam that utilizes this laser generator to produce, laser beam is shone in substrate surface to be cleaned, and the snowflake of substrate surface to be cleaned, after being subjected to the laser irradiation, this substrate surface to be cleaned can quicken the snowflake distillation and the blast of expanding, and then order about this surface contaminant that is attached on the substrate and break away from this substrate, at last, for finishing substrate surface cleaning step to be cleaned, this substrate surface to be cleaned obtains cleaning surface contaminant, in addition, for avoiding in the snowflake distillation on this substrate surface, heat around the absorptive substrate, make substrate surface temperature descend and produce condensate water, the present invention is shone behind substrate surface via laser beam, the temperature-compensating of substrate surface luminous energy and heat energy can further be provided, and then avoid producing condensate water.
That is to say, the invention provides a kind of cleaning method of laser exciting gas, in order to carry out cleaning base plate, wherein comprise: a substrate to be cleaned is provided, and this substrate surface to be cleaned is distributed with surface contaminant; Carry out spray gas in substrate surface to be cleaned, solid state gas molecule snowflake is erupted in substrate surface to be cleaned; And carry out laser and shine substrate surface to be cleaned, laser beam is shone in the solid state gas molecule snowflake on this substrate surface to be cleaned and surface, quicken the solid state gas molecule snowflake distillation of this substrate surface to be cleaned and the blast of expanding, order about this surface contaminant and break away from this substrate to be cleaned.
According to design of the present invention, this carries out spray gas and carries out laser in substrate surface step to be cleaned and this and shine substrate surface step to be cleaned and also can carry out simultaneously.
According to design of the present invention, this substrate to be cleaned comprises semiconductor, liquid crystal flat panel display, printed circuit board (PCB), optical glass, light shield, eyeglass or chip.
According to design of the present invention, this gas is carbon dioxide, nitrogen or argon gas.
According to design of the present invention, this carries out laser and shines substrate surface to be cleaned, is the temperature-compensating that substrate surface luminous energy to be cleaned and heat energy further are provided, and then avoids producing condensate water.
Another invention according to the present invention provides a kind of cleaning device of laser exciting gas, in order to carry out cleaning base plate, wherein comprises: a clamping fixture, in order to grip this substrate to be cleaned thereon; One gas generation apparatus, this gas generation apparatus produce solid state gas molecule snowflake, and this gas generation apparatus is arranged at this substrate to be cleaned and is cleaned on the face and with substrate to be cleaned and is an angle; And a laser generator, being arranged on this substrate to be cleaned, this laser generator produces laser beam.
According to design of the present invention, this substrate to be cleaned comprises semiconductor, liquid crystal flat panel display, printed circuit board (PCB), optical glass, light shield, eyeglass or chip.
The nozzle of this gas generation apparatus, eruption solid state gas molecule snowflake is when substrate surface, gush out the high velocity air of solid state gas molecule snowflake by combination, the air force tractive force that is produced, strike against the kinetic energy conversion of substrate surface to be cleaned when reaching eruption solid state gas molecule snowflake, overcome the adhesion of the surface contaminant of substrate surface to be cleaned, to finish the cleaning cleaning of substrate.
Content that relevant the present invention is more detailed and feasible embodiment are described as follows with reference to the accompanying drawings:
Description of drawings
Fig. 1 is the cleaning method flow chart of laser exciting gas of the present invention;
Fig. 2 is the cleaning device schematic diagram of laser exciting gas of the present invention.
Wherein, description of reference numerals is as follows:
The cleaning method of S1-laser exciting gas; Step S10-provides a substrate to be cleaned;
Step S20-carries out spray gas in substrate surface to be cleaned;
Step S30-carries out laser and shines substrate surface to be cleaned;
Step S40-finishes substrate surface and cleans; The cleaning device of 1-laser exciting gas;
The 10-clamping fixture; 20-substrate to be cleaned; The 21-surface contaminant;
The 30-gas generation apparatus; 31-carbon dioxide snowflake;
The 40-laser generator; The 41-laser beam.
The specific embodiment
Below for the assembling mode of preferred embodiment of the present invention and implementation step, conjunction with figs. is elaborated now.
At first, see also Fig. 1, a kind of cleaning method S1 that uses laser exciting gas of the present invention, it is the method that is applied to carry out cleaning base plate, the cleaning method S1 of this laser exciting gas comprises, and a substrate step S10 to be cleaned is provided, and carries out spray gas in substrate surface step S20 to be cleaned, carry out laser and shine substrate surface step S30 to be cleaned, finish substrate surface cleaning step S40.
Moreover, see also Fig. 2, a kind of cleaning device 1 that uses laser exciting gas of the present invention, it is the device that is applied to carry out cleaning base plate, the cleaning device 1 of this laser exciting gas, comprise a clamping fixture 10, one substrate 20, one gas generation apparatus 30, one laser generators 40 to be cleaned, wherein, the surface distributed surface contaminant 21 of this substrate 20, this gas generation apparatus 30 comprises a nozzle (not shown), the nozzle of this gas generation apparatus 30 again, be arranged at this substrate 20 to be cleaned and be cleaned the appropriate location of face top, and being an eruption angle with this substrate 20 to be cleaned, this gas generation apparatus 30 is in order to gushing out solid state gas molecule snowflake 31, and is same, this laser generator 40 also is arranged at the appropriate location of substrate surface to be cleaned top, in order to produce laser beam 41.
A kind of cleaning device that uses laser exciting gas of the present invention in order to carrying out cleaning base plate, describes the implementation feature and the embodiment of the preferred embodiment of the cleaning device of this laser exciting gas.
At first, please consult Fig. 1 and Fig. 2 again, the present invention is a kind of to use the cleaning method S1 of laser exciting gas and installs 1, one substrate step S10 to be cleaned is provided earlier, one substrate 20 to be cleaned is provided, these substrate 20 surface distributed to be cleaned have surface contaminant 21, and should pass through a clamping fixture 10 by substrate 20 to be cleaned, clamping and finishing is fixed on this clamping fixture 10, carry out spray gas again in substrate surface step S20 to be cleaned, utilize this gas generation apparatus 30 to produce solid state gas molecule snowflake, in the present embodiment, this gas is carbon dioxide, this solid state gas molecule snowflake is a carbon dioxide snowflake 31, and gush out carbon dioxide snowflake 31 in these substrate to be cleaned 20 surfaces by nozzle, when this carbon dioxide snowflake 31 erupts behind these substrate to be cleaned 20 surfaces, these carbon dioxide snowflake 31 volatilization distillations are gas, at this moment, carry out laser again and shine substrate surface step S30 to be cleaned, the laser beam 41 that utilizes this laser generator 40 to be produced, shine in substrate to be cleaned 20 surfaces, when reaching the carbon dioxide snowflake 31 on substrate to be cleaned 20 surfaces, when 31 distillations of carbon dioxide snowflake and the blast of expanding can be quickened because of after being subjected to laser 41 irradiations in these substrate to be cleaned 20 surfaces, and then order about this surface contaminant 21 that is attached on the substrate 20 and break away from these substrates 20 to be cleaned, at last, be to finish substrate surface cleaning step S40, this substrate surface to be cleaned is cleaned, in addition, in these substrate 20 lip-deep carbon dioxide snowflake 31 distillations, the also heat around the absorptive substrate 20, make substrate 20 surface temperatures descend, this moment, substrate 20 surfaces can produce condensate water, but the present invention is shone behind substrate 20 surfaces via laser beam 41, the temperature-compensating of substrate 20 surperficial luminous energy and heat energy can further be provided, and then avoid producing condensate water.
The present invention is a kind of cleaning method that uses laser exciting gas, said method has disclosed this to carry out spray gas and carries out laser in substrate surface step to be cleaned and this and shine substrate surface step to be cleaned for successively carrying out, but and in order to restriction the present invention, this carries out spray gas and carries out laser in substrate surface step to be cleaned and this and shine substrate surface step to be cleaned and also can carry out simultaneously.
A kind of cleaning method and device that uses laser exciting gas of the present invention, above-mentioned this thing substrate to be cleaned comprises semiconductor, liquid crystal flat panel display, printed circuit board (PCB), optical glass, light shield, eyeglass or core six.
A kind of cleaning method and device that uses laser exciting gas of the present invention, above-mentioned this gas comprises, carbon dioxide, nitrogen or argon gas.
A kind of cleaning method and device that uses laser exciting gas of the present invention, above-mentioned this pollutant comprises, greasy dirt, scaling powder, dust or particulate.
Though the present invention is disclosed in preferred embodiment; right its is not in order to qualification the present invention, any personnel that are familiar with this technology, without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is when with being as the criterion that claims were defined.
Claims (7)
1. the cleaning method of a laser exciting gas in order to carry out cleaning base plate, wherein comprises:
One substrate to be cleaned is provided, and this substrate surface to be cleaned is distributed with surface contaminant;
Carry out spray gas in substrate surface to be cleaned, solid state gas molecule snowflake is erupted in substrate surface to be cleaned; And
Carry out laser and shine substrate surface to be cleaned, laser beam is shone in the solid state gas molecule snowflake on this substrate surface to be cleaned and surface, quicken the solid state gas molecule snowflake distillation of this substrate surface to be cleaned and the blast of expanding, order about this surface contaminant and break away from this substrate to be cleaned.
2. the method for claim 1 is characterized in that, this carries out spray gas and carries out laser in substrate surface step to be cleaned and this and shine substrate surface step to be cleaned and also can carry out simultaneously.
3. the method for claim 1 is characterized in that, this substrate to be cleaned comprises semiconductor, liquid crystal flat panel display, printed circuit board (PCB), optical glass, light shield, eyeglass or chip.
4. the method for claim 1 is characterized in that, this gas is carbon dioxide, nitrogen or argon gas.
5. the method for claim 1 is characterized in that, this carries out laser and shines substrate surface to be cleaned, is the temperature-compensating that substrate surface luminous energy to be cleaned and heat energy further are provided, and then avoids producing condensate water.
6. the cleaning device of a laser exciting gas in order to carry out cleaning base plate, wherein comprises:
One clamping fixture is in order to grip this substrate to be cleaned thereon;
One gas generation apparatus, this gas generation apparatus produce solid state gas molecule snowflake, and this gas generation apparatus is arranged at this substrate to be cleaned and is cleaned on the face and with substrate to be cleaned and is an angle; And
One laser generator is arranged on this substrate to be cleaned, and this laser generator produces laser beam.
7. device as claimed in claim 6 is characterized in that, this substrate to be cleaned comprises semiconductor, liquid crystal flat panel display, printed circuit board (PCB), optical glass, light shield, eyeglass or chip.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510006256 CN1814361A (en) | 2005-02-01 | 2005-02-01 | Cleaning method and device using laser exciting gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510006256 CN1814361A (en) | 2005-02-01 | 2005-02-01 | Cleaning method and device using laser exciting gas |
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| Publication Number | Publication Date |
|---|---|
| CN1814361A true CN1814361A (en) | 2006-08-09 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200510006256 Pending CN1814361A (en) | 2005-02-01 | 2005-02-01 | Cleaning method and device using laser exciting gas |
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| CN (1) | CN1814361A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102441546A (en) * | 2010-10-14 | 2012-05-09 | 刘忠炯 | Method for washing surface of plastic housing of electronic device |
| CN103170481A (en) * | 2011-12-26 | 2013-06-26 | 财团法人金属工业研究发展中心 | Surface cleaning method of electric discharge machining mold |
| CN104853854A (en) * | 2012-12-18 | 2015-08-19 | 浦项工科大学校产学协力团 | Method for removing liquid membrane using high-speed particle beam |
| CN106269719A (en) * | 2016-09-30 | 2017-01-04 | 京东方科技集团股份有限公司 | A kind of cleaning equipment |
-
2005
- 2005-02-01 CN CN 200510006256 patent/CN1814361A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102441546A (en) * | 2010-10-14 | 2012-05-09 | 刘忠炯 | Method for washing surface of plastic housing of electronic device |
| CN103170481A (en) * | 2011-12-26 | 2013-06-26 | 财团法人金属工业研究发展中心 | Surface cleaning method of electric discharge machining mold |
| CN104853854A (en) * | 2012-12-18 | 2015-08-19 | 浦项工科大学校产学协力团 | Method for removing liquid membrane using high-speed particle beam |
| CN104853854B (en) * | 2012-12-18 | 2016-08-17 | 浦项工科大学校产学协力团 | Utilize the liquid film minimizing technology of high velocity beam |
| CN106269719A (en) * | 2016-09-30 | 2017-01-04 | 京东方科技集团股份有限公司 | A kind of cleaning equipment |
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