CN1807677A - Vacuum vapor deposition apparatus - Google Patents
Vacuum vapor deposition apparatus Download PDFInfo
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- CN1807677A CN1807677A CN 200610006228 CN200610006228A CN1807677A CN 1807677 A CN1807677 A CN 1807677A CN 200610006228 CN200610006228 CN 200610006228 CN 200610006228 A CN200610006228 A CN 200610006228A CN 1807677 A CN1807677 A CN 1807677A
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Abstract
A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.
Description
The cross reference of related application
In these whole disclosures of introducing the Japanese patent application No.2005-355652 that the Japanese patent application No.2005-013673 that submitted on January 21st, 2005, on December 9th, 2005 submit in full as a reference, each patent application in these patent applications all comprises specification sheets, claim, accompanying drawing and summary of the invention.
Technical field
The present invention relates to a kind of vacuum vapor deposition apparatus, this equipment will as the evaporation of the evaporating materials of organic material and deposit to as on the surface of the workpiece of the substrate that is used for flat-panel monitor to form film.
Background technology
In a kind of vacuum vapor deposition apparatus, evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and this evaporating materials is heated so that its vaporization by the radiant heat from the sidewall (hot wall) of this vaporizing chamber, thereby evaporating materials is deposited on the surface of workpiece to form film.
In traditional vacuum vapor deposition apparatus, adopt the crucible shown in Figure 18 A and 18B.Be to be noted that the document that the vacuum vapor deposition apparatus that adopts known crucible is carried out disclosed known correlation technique comprises for example following patent documentation 1.At the crucible 1 shown in Figure 18 A is simple box type container, and the portion within it of being used for holds the raw-material evaporating materials 2 as vacuum vapor deposition.At the crucible 3 shown in Figure 18 B are simple cylindrical containers, and are used within it that portion holds evaporating materials 2.For example about 30 millimeters of the diameter of the width of the holding portion of box type crucible 1 and the holding portion of cylinder shape crucible 3.Handle for the size increase in the zone to be coated of adopting known like this crucible 1 or 3 pairs of workpiece, need to arrange a plurality of box type crucibles 1 or a plurality of cylinder shape crucible 3.
For example, in recent years, vacuum vapor deposition apparatus not only is used for the deposition (formation metallic film) of metallic substance, but also be used for the deposition (formation organic film) of organic materials, as the codeposition (formation polymeric film) of the multiple organic materials of the organic electroluminescent device (being designated hereinafter simply as organic EL) that is used for flat-panel monitor (being designated hereinafter simply as FPD) etc.In addition, along with popularizing of recent FPD, the size of FPD substrate is increasing.Along with this increase of FPD sizes of substrate, the size of carrying out sedimentary zone to be coated in the time of the FPD substrate is also increasing (see figure 1).
Therefore, for this size increase to the zone to be coated of FPD substrate is handled, need arrange a plurality of box type crucibles 1 or a plurality of cylinder shape crucible 3 with the longitudinal direction (with the vertical direction of FPD substrate transmission direction) along the zone to be coated of FPD substrate in vaporizing chamber 4 of the dispersing mode shown in Figure 19 A or 19B.Heat by the sidewall (hot wall) 5 of electric heater (not shown) vaporizing chamber 4.Be used to radiant heat T, make evaporating materials (organic materials) 2 vaporizations that are contained in crucible 1 or 3 by radiation heating from hot wall 5.Under this situation, evaporating materials 2 is not only directly by radiation heating, but also the heat of being come by crucible 1 or 3 conduction from radiation heating heats.
Patent documentation 1: Japanese patent disclosure No.S61-73875 co-pending
Yet, the problem below shown in Figure 19 A or 19B, arranging under the situation of a plurality of known box type crucibles 1 or a plurality of known cylinder shape crucibles 3, existing.
The heating surface zone of (1) known crucible 1 or crucible 3, promptly crucible contact with evaporating materials 2 regional less.Therefore, for the evaporating capacity of the evaporating materials 2 that obtains to expect, need hot wall 5 be heated to higher temperature or arrange more crucible 1 or 3 by the power that increases electric heater.Therefore, just produce following problem, for example the size of evaporation source increases, arranges that the work of crucible increases and the cost of system increases.
(2), just tend to appear at vaporization inhomogeneous of evaporating materials 2 if arrange a plurality of crucibles 1 or 3 in the dispersive mode.It is inhomogeneous that the film thickness distribution of the film that forms on substrate as a result, just becomes.Even adopting electric heater controls the temperature of hot wall 5, also there is following situation, promptly as Figure 19 A and 19B illustrate, for example between the temperature (as 350 ℃) at the part P place of hot wall 5 and temperature (as 300 ℃), create a difference at the part Q place of hot wall 5.Under this situation, receive radiant heat T from part P with vaporization in that the evaporating materials 2 of the crucible 1 that is positioned at the front side or 3 is main, and receive radiant heat T from part Q to vaporize in that the evaporating materials 2 of the crucible 1 that is positioned at rear side or 3 is main.Therefore, the crucible 1 of front side or 3 and crucible 1 or 3 at rear side between inhomogeneous (difference) of the evaporating capacity of evaporating materials 2 appears.Therefore, for this is handled, need come to arrange a large amount of crucibles 1 or 3 by the size that reduces crucible 1 or 3 with less interval.Under this situation, also cause the problem that the work increase of for example arranging crucible and system cost increase.Especially, being used for the vacuum vapor deposition apparatus of organic EL, such problem appears easily, because the size in zone to be coated increases along with the increase of FPD sizes of substrate.
(3) under the situation of a small amount of evaporating materials 2 vaporizations, promptly under the situation that the amount of measuring 2 vaporizations of initial less evaporating materials or evaporating materials 2 reduces to become less owing to vaporization, carry out in the vaporization of evaporating materials 2 producing distance between the internal surface of comparatively faster peripheral portion and crucible 1 or 3, and become lower from crucible 1 or 3 heat conducting efficient to evaporating materials 2.Therefore, just be easy to occur evaporating capacity inhomogeneous of evaporating materials 2 in crucible 1 or 3, and film thickness distribution tends to become inhomogeneous.Therefore, for this is handled, also need to arrange a large amount of crucible 1 or 3.As a result, the problem with regard to causing that the work increase of for example arranging crucible and system cost increase.Especially, be used for the vacuum vapor deposition apparatus of organic EL, such problem appears easily, because form the extremely thin film that thickness for example is about 400 dusts, thereby the amount of host material and dopant material considerably less (for example about 2 grams), these host materials and dopant material are organic materialss and are used to form this film.
Therefore, consider above-mentioned situation, the object of the present invention is to provide a kind of vacuum vapor deposition apparatus that comprises crucible, this crucible has following structure, can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost by this structure.
Summary of the invention
The vacuum vapor deposition apparatus of realizing the first aspect present invention of above-mentioned purpose is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, and has a plurality of grooves in the crucible upper surface.These grooves have the length from an end of crucible upper surface to its other end, and play the effect of the part that is used to hold evaporating materials.
Be to be noted that by the sublimer of heating sublimation and be suitable for as the evaporating materials that is contained in described a plurality of groove with vaporization.In addition, as the groove of narrow openings, as slit groove be suitable for as described in a plurality of grooves.
The vacuum vapor deposition apparatus of second aspect present invention is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, and has groove in the crucible upper surface.This groove has the length from an end of crucible upper surface to its other end, and plays the effect of the part that is used to hold evaporating materials.
Be to be noted that by the melting material of heat fused and be suitable for as the evaporating materials that is contained in this groove with vaporization.
The vacuum vapor deposition apparatus of third aspect present invention is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of a plurality of members that bunchy is arranged to extend on the whole zone of vaporizing chamber, and has a plurality of grooves in the crucible upper surface.These grooves have the length from an end of crucible upper surface to its other end, and play the effect of the part that is used to hold evaporating materials.
The vacuum vapor deposition apparatus of fourth aspect present invention is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, and perhaps a plurality of members that are arranged to extend on the whole zone of vaporizing chamber by bunchy constitute, and have a plurality of holes in the crucible upper surface.The effect of the part that is used to hold evaporating materials is played in these holes.
The vacuum vapor deposition apparatus of fifth aspect present invention is the vacuum vapor deposition apparatus of the either side in the present invention first to fourth aspect, and wherein crucible is divided into a plurality of zones.Under the lower surface of crucible, independent heating unit is set for respective regions.Therefore, can be respective regions independent control temperature by these heating units.
The vacuum vapor deposition apparatus of sixth aspect present invention is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have at least one groove in the crucible upper surface.Described at least one groove extends along the longitudinal direction of crucible, and plays the effect of the part that is used to hold evaporating materials.
The vacuum vapor deposition apparatus of seventh aspect present invention is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have a plurality of grooves in the crucible upper surface.These grooves along and the vertical direction of the longitudinal direction of crucible extend, and play the effect of the part that is used to hold evaporating materials.
The vacuum vapor deposition apparatus of eighth aspect present invention is following vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by the radiant heat from these hot walls evaporating materials is heated so that evaporating materials vaporization (situation that also comprises distillation) as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film.This crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have a plurality of holes in the crucible upper surface.The effect of the part that is used to hold evaporating materials is played in these holes.
The vacuum vapor deposition apparatus of the vacuum vapor deposition apparatus of the ninth aspect present invention either side that is the present invention the 6th to the eight aspect, wherein crucible is divided into a plurality of zones at least in a longitudinal direction.Under the crucible lower surface, independent heating unit is set for respective regions.Therefore, can be respective regions independent control temperature by these heating units.
The vacuum vapor deposition apparatus of tenth aspect present invention is the vacuum vapor deposition apparatus of either side in the present invention the 6th to the 9th aspect, and wherein evaporating materials is an organic materials, and wherein workpiece is the substrate that is used for flat-panel monitor.Organic materials is deposited on the surface of substrate to form the film of organic electroluminescent device.
The present invention the tenth vacuum vapor deposition apparatus on the one hand is the vacuum vapor deposition apparatus of either side in the present invention the 6th to the 9th aspect, and wherein evaporating materials is an organic materials, and workpiece is the substrate that is used for means of illumination.Organic materials is deposited on the surface of substrate to form the film of organic electroluminescent device.
According to the present invention the 12 aspect that realizes aforementioned purpose, provide the vacuum vapor deposition apparatus of the either side in a kind of the present invention of employing the 5th and the 9th aspect to make the method for the film of organic electroluminescent device.Adopt organic materials as evaporating materials.Described respective regions to crucible is measured temperature, and according to the measurement temperature of described respective regions independent control is carried out in the output of those heating units, makes the temperature of described respective regions become constant.
In the vacuum vapor deposition apparatus aspect the present invention first and second, crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, and has at least one groove in the crucible upper surface.Described at least one groove has the length from an end of crucible upper surface to its other end, and plays the effect of the part that is used to hold evaporating materials.Therefore, the heating surface zone of crucible (zone that crucible contacts with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.In addition, because crucible is an one-piece construction, even there is the temperature difference in the position in hot wall, because in the part that does not form described at least one groove (bank protection part) of crucible upper surface and the thermal conduction in the part under described at least one groove, temperature also is uniform on whole crucible.Therefore, the vaporization of the material that can avoid evaporating inhomogeneous, and can make that the film thickness distribution of workpiece is even.And, also can easily handle a spot of evaporating materials by quantity and the size (width, the degree of depth etc.) of setting described at least one groove suitably.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost.Therefore can also reduce the cost of equipment.
In the vacuum vapor deposition apparatus of third aspect present invention, crucible is made of a plurality of members that bunchy is arranged to extend on the whole zone of vaporizing chamber, and has a plurality of grooves in the crucible upper surface.These grooves have the length from an end of crucible upper surface to its other end, and play the effect of the part that is used to hold evaporating materials.Therefore, for example, the big workpiece as large size substrate is being difficult to form under the situation of bigger whole crucible, is arranging that by bunchy on the whole zone of vaporizing chamber a plurality of crucibles can provide the equivalent of bigger whole crucible.Therefore, can obtain the suitable effect of effect with aforementioned first and second aspects of the present invention.
In the vacuum vapor deposition apparatus of fourth aspect present invention, crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, perhaps a plurality of members that are arranged to extend on the whole zone of vaporizing chamber by bunchy constitute, and have a plurality of holes in the crucible upper surface.The effect of the part that is used to hold evaporating materials is played in these holes.Therefore, the heating surface zone of crucible (zone that crucible contacts with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.In addition, because crucible is one-piece construction or almost is one-piece construction, even there is the temperature difference in the position in hot wall, because in the part that does not form the hole (bank protection part) of crucible upper surface and the thermal conduction in the part under these holes, temperature also is uniform on whole crucible.Therefore, it is inhomogeneous that the material that can avoid evaporating is vaporized, and can make that the film thickness distribution of workpiece is even.And, also can easily handle a spot of evaporating materials by quantity and the size (diameter, the degree of depth etc.) of setting these holes suitably.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost.Therefore can also reduce the cost of equipment.In addition, in this fourth aspect, even the amount of evaporating materials is considerably less, these holes also can be arranged on the entire upper surface of crucible in the dispersive mode.Therefore, with as situation that groove is set in above-mentioned first aspect compare, this fourth aspect is effective especially to the less situation of the amount of evaporating materials.
In the vacuum vapor deposition apparatus of fifth aspect present invention, crucible is divided into a plurality of zones, under the lower surface of crucible for respective regions is provided with independent heating unit, thereby can be respective regions independent control temperature by these heating units.Therefore, to the temperature of each regional control crucible and control the temperature of evaporating materials.Therefore, can avoid evaporating more reliably vaporization inhomogeneous of material.Thereby, can be more reliably the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. be handled.
In the vacuum vapor deposition apparatus of sixth aspect present invention, crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have at least one groove in the crucible upper surface.Described at least one groove extends along the longitudinal direction of crucible, and plays the effect of the part that is used to hold evaporating materials.Therefore, the heating surface zone of crucible (zone that crucible contacts with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.In addition, because crucible is an one-piece construction, even have the temperature difference in the position along the longitudinal direction in hot wall, because in the part that does not form described at least one groove (bank protection part) of crucible upper surface and the thermal conduction in the part under described at least one groove, temperature also is uniform on whole crucible.Therefore, in a longitudinal direction inhomogeneous of the vaporization of the material that can avoid evaporating, and can make that the film thickness distribution of workpiece is even.And, also can easily handle a spot of evaporating materials by quantity and the size (width, the degree of depth etc.) of setting described at least one groove suitably.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost.Therefore can also reduce the cost of equipment.Especially, it should be noted, under the considerably less situation of the amount of evaporating materials, if as in aspect the of the present invention the following the 7th as described in form with the vertical direction of longitudinal direction at least one groove, then in a longitudinal direction interval just becomes too big between the groove, is easy to occur vaporization inhomogeneous of evaporating materials.Yet, aspect the 6th in because form described at least one groove along the longitudinal direction, this problem does not appear.The 6th aspect also is favourable in this.
In the vacuum vapor deposition apparatus of seventh aspect present invention, crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have a plurality of grooves in the crucible upper surface.These grooves along and the vertical direction of the longitudinal direction of crucible extend, and play the effect of the part that is used to hold evaporating materials.Therefore, the heating surface zone of crucible (zone that crucible contacts with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.In addition, because crucible is an one-piece construction, even have the temperature difference in the position along the longitudinal direction in hot wall, because in the part that does not form groove (bank protection part) of crucible upper surface and the thermal conduction in the part under these grooves, temperature also is uniform on whole crucible.Therefore, in a longitudinal direction inhomogeneous of the vaporization of the material that can avoid evaporating, and can make that the film thickness distribution of workpiece is even.And, also can easily handle a spot of evaporating materials by quantity and the size (width, the degree of depth etc.) of setting these grooves suitably.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost.Therefore can also reduce the cost of equipment.
In the vacuum vapor deposition apparatus of eighth aspect present invention, crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have a plurality of holes in the crucible upper surface.The effect of the part that is used to hold evaporating materials is played in these holes.Therefore, the heating surface zone of crucible (zone that crucible contacts with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.In addition, because crucible is an one-piece construction, even in hot wall along having the temperature difference in the position of the longitudinal direction of crucible, because in the part that does not form the hole (bank protection part) of crucible upper surface and the thermal conduction in the part under these holes, temperature also is uniform on whole crucible.Therefore, in a longitudinal direction inhomogeneous of the vaporization of the material that can avoid evaporating, and can make that the film thickness distribution of workpiece is even.And, also can easily handle a spot of evaporating materials by quantity and the size (diameter, the degree of depth etc.) of setting these holes suitably.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost.Therefore can also reduce the cost of equipment.In addition, in this eight aspect, even the amount of evaporating materials is very little, these holes also can be arranged on the entire upper surface of crucible in the dispersive mode.Therefore, with as aspect the above-mentioned the 6th and the 7th in groove is set situation compare, this eight aspect is effective especially to the less situation of the amount of evaporating materials.
In the vacuum vapor deposition apparatus of ninth aspect present invention, crucible is divided into a plurality of zones at least in a longitudinal direction, under the crucible lower surface for respective regions is provided with independent heating unit, thereby can be respective regions independent control temperature by these heating units.Therefore, to the temperature of each regional control crucible and control the temperature of evaporating materials.Therefore, can avoid evaporating more reliably in a longitudinal direction inhomogeneous of vaporization of material.Thereby, can be more reliably the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. be handled.
In the present invention the tenth and the tenth vacuum vapor deposition apparatus on the one hand, evaporating materials is an organic materials, and workpiece is the substrate that is used for the substrate of flat-panel monitor or is used for means of illumination.Organic materials is deposited on the surface of substrate to form the film of organic electroluminescent device.Therefore can obtain and aforementioned the 6th to the 9th aspect in the effect similar effects of either side.Therefore, also can be easily the increase of the size of the substrate that is used for flat-panel monitor or the substrate that is used for means of illumination be handled.Especially, when the substrate that is applied to large-sized FPD of being used for or large-sized substrate that is used for means of illumination, can realize being used for the useful vacuum vapor deposition apparatus of organic EL.
The method of the 12 aspect according to the present invention, this method are to adopt organic materials to make the method for the film of organic electroluminescent device as evaporating materials in the vacuum vapor deposition apparatus of the either side in aspect the present invention the 5th and the 9th.In addition, the crucible of vacuum vapor deposition apparatus is divided into a plurality of zones.Described respective regions is measured temperature, and independent control is carried out in the output of those heating units such as well heater, make the temperature of described respective regions become constant according to the measurement temperature of described respective regions.Therefore, to the temperature of each regional control crucible and control the temperature of evaporating materials.Therefore, can avoid evaporating more reliably in a longitudinal direction inhomogeneous of vaporization of material.Thereby, can be more reliably the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. be handled.
Description of drawings
To more fully understand the present invention from following detailed description that provides and accompanying drawing, these accompanying drawings only provide by way of example, from rather than limitation of the present invention, in these accompanying drawings:
Fig. 1 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus of first embodiment of the invention;
Fig. 2 A is the view that shows another structure of Scroll shutter, and the view of Fig. 2 B for its operation is described;
Fig. 3 is the skeleton view of the A amplification partly of Fig. 1;
Fig. 4 A is as from the being seen cross-sectional view of arrow B direction (orthographic plan of crucible) of Fig. 3, and Fig. 4 B is the cross-sectional view along the amplification of the straight line C-C of Fig. 4 A;
Fig. 5 is the structure iron (orthographic plan of crucible) that edge and the vertical direction of the longitudinal direction of crucible form the situation of slit groove;
Fig. 6 A is the orthographic plan with crucible of a slit groove, and Fig. 6 B is the cross-sectional view along the amplification of straight line C '-C ' of Fig. 6 A;
Fig. 7 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus essential part of second embodiment of the invention;
Fig. 8 is as from the being seen cross-sectional view of direction (orthographic plan of electric heater) of the arrow D of Fig. 7;
The schema that Fig. 9 describes for the temperature controlled example to crucible;
Figure 10 is set to the structure iron of the situation of isolating construction for crucible and well heater stylobate;
Figure 11 is the view (orthographic plan of electric heater) that shows another example of electric heater layout;
Figure 12 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus essential part of third embodiment of the invention;
Figure 13 A is as from the being seen cross-sectional view of direction (orthographic plan of crucible) of the arrow E of Figure 12, and Figure 13 B is the cross-sectional view along the amplification of the straight line F-F of Figure 13 A;
Figure 14 is the view (orthographic plan of crucible) that shows another example of arranging in the hole;
Figure 15 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus essential part of fourth embodiment of the invention;
Figure 16 is the skeleton view that shows another structure example of crucible;
Figure 17 is the skeleton view that shows another structure example of crucible;
Figure 18 A and 18B are the skeleton view that shows the structure of traditional crucible;
Figure 19 A and 19B are the skeleton view that shows the example that is provided with a plurality of traditional crucibles.
Embodiment
Below, will describe embodiments of the invention with reference to the accompanying drawings in detail.
First embodiment
Fig. 1 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus of first embodiment of the invention.Fig. 3 is the skeleton view of the A amplification partly of Fig. 1.Fig. 4 A is as the being seen cross-sectional view of arrow B direction (orthographic plan of crucible) from Fig. 3.Fig. 4 B is the cross-sectional view along the amplification of the straight line C-C of Fig. 4 A.Be to be noted that Fig. 2 A and 2B are the view of another example of structure that shows the involute shaft type shutter of vacuum vapor deposition apparatus of first embodiment.
As shown in Figure 1, the vacuum vapor deposition apparatus of first embodiment comprises the host system 12 of vapor deposition apparatus and the substrate transmission system (not shown) in the vacuum chamber 11, and this vacuum vapor deposition apparatus is used for codeposition and organic EL.Host system 12 plays the effect of evaporation source.The substrate transmission system is arranged on the host system 12.
By the vacuum pump (not shown) with the inner sustain of vacuum chamber 11 under low-pressure state (vacuum).Therefore, inside of host system 12 etc. also maintains under the vacuum certainly.In addition, when the substrate transmission system under this vacuum when level is transmitted on by the substrate transmission direction shown in the arrow X with predetermined speed as the FPD substrate 10 (as glass substrate) of workpiece, just be absorbed on the zone to be coated on (being deposited on) these FPD substrate 10 surfaces (lower surface the accompanying drawing) from the steam of the evaporating materials of host system 12 supply, thereby form film.
Scroll is set between vaporization 16A and mixing section 15 opens and closes 19A, and Scroll shutter 19B also is set between vaporizing chamber 16B and mixing section 15.Each Scroll shutter among Scroll shutter 19A and the 19B comprises shutter piece 20 and in series rotatably inserts a plurality of shutter axles 21 in the shutter piece 20.In shutter piece 20, form the steam hole 20a that is communicated with vaporizing chamber 16A (under the situation of Scroll shutter 19A) or vaporizing chamber 16B (under the situation of Scroll shutter 19B) and mixing section 15.In shutter axle 21, steam hole 21a is formed on the position that can be communicated with the steam hole 20a of shutter piece 20.And described a plurality of steam hole 20a and described a plurality of steam hole 21a are arranged on the plate width direction.Therefore, position of rotation by regulating each shutter axle 21 is to regulate the relative position between the corresponding steam hole 20a of the steam hole 21a of each shutter axle 21 and relevant shutter piece 20, can regulate the amount of the evaporating materials steam that flows through each steam hole among steam hole 20a and the 21a, thereby the distribution of the amount of evaporating materials steam on plate width direction becomes even.
Be to be noted that and adopt a kind of Scroll shutter that has in the structure shown in Fig. 2 A and the 2B as the Scroll shutter in the vacuum vapor deposition apparatus of first embodiment.Although will illustrate and describe a vaporizing chamber 16A side here, the Scroll shutter with the structure shown in Fig. 2 A and the 2B also can be used for another vaporizing chamber 16B.
Shown in Fig. 2 A, Scroll shutter 81 contacts the upper wall with formation vaporizing chamber 16A with sidewall (hot wall) 23, and is placed on the back up pad 80, and this back up pad 80 has opening portion along the longitudinal direction in the middle body of back up pad 80.More specifically, Scroll shutter 81 comprises: plane retaining plate 82, this plane retaining plate 82 are fixed on the back up pad 80 and are placed to the opening portion that covers back up pad 80; The removable plate 83 in plane, the removable plate 83 in this plane is placed on the surface of retaining plate 82, thereby on the surface of retaining plate 82 slidably; Pressing mechanism 85, these pressing mechanisms 85 be used for removable plate 83 slidably mode 83 extruding of removable plate are resisted against retaining plate 82; And the shift assembly (not shown), this shift assembly is used to make removable plate 83 to slide along the surface of retaining plate 82.In retaining plate 82, form in a longitudinal direction spaced apart a plurality of steam hole 82a with predetermined length.On the other hand, form a plurality of steam hole 83a in removable plate 83, these steam holes 83a arranges with the interval that the interval with steam hole 82a equates, and has the port area littler than steam hole 82a.Be to be noted that retaining plate 82 and removable plate 83 are long plates, they have the length suitable with the length of FPD substrate 10 on plate width direction.
In Scroll shutter 81, described a plurality of pressing mechanism 85 is set on plate width direction.Be provided with in each pressing mechanism 85: two rollers 86, these rollers 86 are used in two ends of the removable plate 83 of extruding on the plate width direction and are used to make removable plate 83 to move on slip direction; Back shaft 87, this back shaft 87 are used for roller 86 rotatable mode supporting rolls 86; And keeper 88, these keepers 88 are fixed on the back up pad 80, and are keeping back shaft 87 in retaining plate 82 extruding back shafts 87.These keepers 88 have the spring 89 on the top that is arranged on them.The squeeze of spring 89 is to retaining plate 82 extruding back shafts 87.As a result, roller 86 can be with removable plate 83 slidable suitable squeezes to the removable plate 83 of retaining plate 82 extruding.
Therefore, in having the Scroll shutter 81 of said structure, by regulating the sliding position of removable plate 83, so that the relative position between the corresponding steam hole 83a of each the steam hole 82a of retaining plate 82 and removable plate 83 is regulated (seeing Fig. 2 B), can regulate the amount of the evaporating materials steam that flows through each steam hole among steam hole 82a and the 83a, thereby the distribution of the amount of evaporating materials steam on plate width direction becomes even.
In addition, between sediment chamber 14 and mixing section 15, perforation plate shutter 24 is set, and perforation rectification plate 27 is set in sediment chamber 14.Perforation plate shutter 24 comprises retaining plate 25, this retaining plate 25 has a plurality of through hole 25a and a plurality of removable plates 26 that form within it, these removable plates 26 are gone up series connection setting at plate width direction (direction of arrow Y), and form a plurality of through hole 26a in the position that through hole 26a can be communicated with those through holes 25a in these removable plates 26.By regulating the position of each removable plate 26 on plate width direction (direction of arrow Y), so that the relative position between the respective through hole 25a of the through hole 26a of each removable plate 26 and retaining plate 25 is regulated, thereby the flow to the gaseous mixture that flows through each through hole among through hole 25a and the 26a is regulated, and makes the distribution of flow that flow to the gaseous mixture of sediment chamber 14 from mixing section 15 become even.In perforation rectification plate 27, form than through hole 25a and the little a plurality of through hole 27a of 26a.Perforation rectification plate 27 is used for further correcting the flow distribution of gaseous mixture and flowing.
Therefore, when the radiant heat from hot wall 23 makes the dopant material 30A that is contained in crucible 22A and the 22B and host material 30B vaporization (distillation), the steam of dopant material flow in the mixing section 15 Scroll shutter 19A distributes the state of regulating to the quantity of steam on the plate width direction under, and the steam of host material flow in the mixing section 15 Scroll shutter 19B distributes the state of regulating to the quantity of steam on the plate width direction under, and these hot walls 23 are sidewalls that heated by electric heater 17 (wall of chamber 13) of vaporizing chamber 16A and 16B.In mixing section 15, the steam of dopant material and the vapor mixing of host material have the gaseous mixture of proper mixture ratio with formation.And, thereby this gaseous mixture has uniform distribution by perforation plate shutter 24 and perforation rectification plate 27, evaporation (deposition) is arrived on the surface in sediment chamber 14 (zone to be coated) of FPD substrate 10 then, thereby forms the film that thickness for example is about 400 dusts.That is, on the surface of FPD substrate 10, form the luminescent layer of organic EL.
Here, it should be noted, although the surface to FPD substrate 10 on the whole width on the plate width direction of FPD substrate 10 is coated with simultaneously, but along with of the transmission of substrate transmission system to FPD substrate 10, succeedingly is coated with the surface of FPD substrate 10 in the substrate transmission direction, thereby finally has been coated with the zone whole to be coated on FPD substrate 10 surfaces.In addition because FPD substrate 10 is plates wide (width on the arrow Y direction) for for example be not less than 0.4 meter (as, about 1 meter) large-sized substrate, also be long (as 1 meter) so the length on plate width direction in zones to be coated are gone up on FPD substrate 10 surface.The edge section on the both sides on the plate width direction that is to be noted that FPD substrate 10 is the part that roller contacted of substrate transmission system, from but not the coating part.
Therefore, consistent with the length of zone to be coated on plate width direction of FPD substrate 10, chamber 13, sediment chamber 14, perforation rectification plate 25, perforation plate shutter 24, mixing section 15, Scroll shutter 21 and vaporizing chamber 16A and 16B on plate width direction also long to the suitable degree of length in the zone to be coated of FPD substrate 10.Vaporizing chamber 16A and 16B are that for example length (width in the substrate transmission direction) is about the long and narrow space that 0.05 meter and width (width on plate width direction) are not less than 0.4 meter (as about 1 meter).
In addition, crucible 22A and 22B also are the long and narrow crucibles that as one man extends on plate width direction with the zone long and narrow to be coated of FPD substrate 10.Each crucible among crucible 22A and the 22B is an one-piece construction, and is made by the material with high thermal conductivity and heat impedance.The material that is used for these crucibles 22A and 22B comprises for example metal, pottery, silicon fluoride and silicon nitrides such as copper, aluminium and SUS304.Be to be noted that crucible 22A and 22B have similar structure, thus the following structure that will describe crucible 22A in detail.
Shown in Fig. 1,3,4A and 4B, the width of crucible 22A (at the width on the plate width direction) is bigger than its length (width in the substrate transmission direction), and crucible 22A has rectangular shape (seeing Fig. 4 A) in top view.For example, to have length be that 0.05 meter, width are not less than the elongated shape of 0.4 meter (for example 1 meter) to crucible 22A.In addition, in the upper surface 31 of crucible 22A, form a plurality of (being 5 in the example shown in the accompanying drawing) slit groove 32A.These slit groove 32A extends along the longitudinal direction (being plate width direction) of crucible 22A, and is formed on the almost whole width of crucible 22A.And these slit groove 32A is going up spaced apart with the vertical direction of the longitudinal direction of crucible 22A (being the substrate transmission direction).Part (being the part that does not form slit groove 32A of the upper surface 31 of crucible 22A) between the adjacent slots groove 32A etc. constitutes bank protection part 31a.As for the size of slit groove 32A, for example, width is about 1 to 5 millimeter, and length is not less than 0.4 meter (for example about 1 meter), and the degree of depth is about 1 to 2 millimeter.
And these slit groove 32A plays the effect of the part that is used to hold evaporating materials.That is, the slit groove 32A of crucible 22A holds dopant material 30A, and the slit groove 32A of crucible 22B holds host material 30B.Be to be noted that the physical size (width, the degree of depth and length) of slit groove 32A and quantity be actual aequum, FPD substrate 10 according to evaporating materials (dopant material, host material) zone to be coated physical size etc. and suitably be provided with.
As mentioned above, in the vacuum vapor deposition apparatus of first embodiment, each crucible among crucible 22A and the crucible 22B is one-piece construction and the long and narrow crucible for extending along plate width direction, and has described a plurality of slit groove 32A in the surface 31 thereon, these slit groove 32A extends along the longitudinal direction of crucible 22A or 22B, and these slit groove 32A plays the effect of the part that is used to hold evaporating materials (dopant material 30A, host material 30B).Therefore, the heating surface zone of crucible 22A and 22B (zone that crucible 22A and 22B contact with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.
In addition, because each crucible among crucible 22A and the 22B is an one-piece construction, even have the temperature difference in the position along the longitudinal direction in hot wall 23, because in the part that does not form slit groove 32A (bank protection part 31a) of the upper surface 31 of crucible 22A and 22B and the thermal conduction in the part under slit groove 32A, also be uniform in temperature on the whole crucible 22A and on the whole crucible 22B.Therefore, in a longitudinal direction inhomogeneous of the vaporization of the material that can avoid evaporating (dopant material 30A, host material 30B), and can make that the film thickness distribution of FPD substrate 10 is even.That is, shown in Fig. 4 B like that, not only directly be doped material 30A from the radiant heat of hot wall 23 and receive, but also received by the bank protection part 31a of crucible 22A.The thermal conduction in crucible 22A of this heat is finally to be transmitted on the dopant material 30A by the internal surface (heating surface) of slit groove 32A.Slit groove 32A and bank protection part 31a alternately are arranged to close mutually.Therefore, follow the temperature of bank protection part 31a the temperature sensitive of the dopant material 30A in the slit groove 32A.If the heat that receives from radiant heat does not fluctuate, then the temperature of dopant material 30A just keeps all even constant.Crucible 22B also has and above-mentioned effect similar effects.
And, also can easily handle a spot of evaporating materials (dopant material 30A, host material 30B) by quantity and the size (width, the degree of depth etc.) of setting slit groove 32A suitably.
Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of FPD substrate 10, a spot of evaporating materials etc. with lower cost, wherein the increase of the size in the zone to be coated of FPD substrate 10 is relevant with the increase of the size of FPD substrate 10.Therefore can also reduce the cost of equipment.
Although be to be noted that slit groove 32A is along the longitudinal direction formation of crucible 22A in above-mentioned example, the present invention must not be limited to this.As shown in Figure 5, the upper surface 31 of crucible 22A can have a plurality of slit groove 32A, these slit groove 32A along and the vertical direction of longitudinal direction extend, and play the effect of the part that is used to hold dopant material.Under this situation, also can obtain and above-mentioned effect similar effects.Yet, under this situation, the amount of the evaporating materials in will being contained in slit groove 32A very hour, the quantity of slit groove 32A diminishes, and in a longitudinal direction interval becomes too big between the slit groove 32A.Therefore, in a longitudinal direction inhomogeneous of the vaporization that occurs evaporating materials easily.In view of this situation, more advantageously form slit groove 32A as described above along the longitudinal direction.
In addition, evaporating materials be by the situation of sublimer of heating sublimation with vaporization under, being preferably a plurality of as the groove of the part of holding evaporating materials is grooves of narrow opening, i.e. above-mentioned slit groove 32A shown in Fig. 4 A to 5.This be because: adopting under the situation of sublimer as evaporating materials, in the bigger structure in the zone that contacts with sublimer, promptly in the structure of described a plurality of slit groove 32A was set, the inhomogeneous of sublimer temperature diminished.On the other hand, evaporating materials be by the situation of melting material of heat fused with vaporization under, preferably adopt the groove 32B of a broad rather than the part that described a plurality of slit groove 32A conduct is used to hold evaporating materials, the groove 32B of this broad is arranged in the upper surface of the whole crucible 22A that extends on the whole zone of vaporizing chamber 16A, and have and from the end of crucible 22A to the suitable length of the length of the other end of crucible 22A, shown in Fig. 6 A and 6B.Its reason is as follows: adopting under the situation of melting material 30C as evaporating materials, the melting material 30C that liquefies by fusing has the big surface that constant is vaporized area and contacted with groove 32B, and receives hot with vaporization from this surface in contact; Thereby, need not to adopt a plurality of slit groove, but even a slit groove just enough.Be to be noted that in Fig. 6 A and 6B, identical Reference numeral represent with Fig. 4 A and 4B in the suitable parts of parts, and will these parts be further described here.
And, for example, be difficult to form under the situation of bigger whole crucible to big workpiece as large size substrate, arrange a plurality of crucibles, these crucibles be placed on the whole zone of vaporizing chamber and form a plurality of slit groove that have from an end of crucible upper surface to the length of the other end of crucible upper surface by bunchy, can realize with above-mentioned whole crucible similarly as the big crucible of single structure.In order further to improve the homogeneity of temperature distribution, preferably, when bunchy is arranged described a plurality of crucible, with these crucibles be arranged to mutually near, on the whole zone of vaporizing chamber, to extend.
Second embodiment
Fig. 7 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus essential part of second embodiment of the invention.Fig. 8 is as from the being seen cross-sectional view of direction (orthographic plan of electric heater) of the arrow D of Fig. 7.The schema that Fig. 9 describes for the control to temperature.
In the vacuum vapor deposition apparatus of second embodiment shown in Fig. 7 and Fig. 8, electric heater 41 also is set as the heating unit in the crucible 22A of the dopant material in the vacuum vapor deposition apparatus that is used for first embodiment.Although do not illustrate, the crucible 22B that is used for host material also has as the structure of electric heater 41 is set in the crucible 22A.Except the above, the structure of the vacuum vapor deposition apparatus of second embodiment (overall structure of the overall structure of crucible and layout, vacuum vapor deposition apparatus etc.) is identical with the structure (seeing Fig. 1 to 6B) of the vacuum vapor deposition apparatus of first embodiment, thereby at this structure of the vacuum vapor deposition apparatus that also is not described in detail second embodiment will be shown.
Shown in Fig. 7 and 8, under the lower surface of crucible 22A, also be provided with and crucible 22A all-in-one-piece well heater platform 42.In the upper surface of well heater platform 42, be formed for the groove 43 of well heater.In the lower surface of crucible 22A, also be formed for the groove 44 of well heater.Those electric heaters 41 are arranged to be contained between groove 43 and 44.Longitudinal direction along crucible 22A is provided with described a plurality of electric heater 41.These electric heaters 41 are connected respectively on the independent temperature regulator 45.That is, crucible 22A is divided into a plurality of zones in a longitudinal direction, and under the lower surface of crucible 22A for respective regions is provided with independent electric heater 41, thereby can by these electric heaters 41 be respective regions independent control temperature.45 pairs of energy that will be supplied to respective electrical well heater 41 of temperature regulator are controlled, make the temperature detectable signal to respective regions (temperature probe value) of crucible 22A indicate predetermined steady temperature, the thermopair input that these temperature detectable signals for example are provided with for respective regions by temperature sensor 46.Each all has for example 1 kilowatt power to be used for electric heater that chamber 13 is heated 17, and can carry out approximately from 0 to 350 ℃ temperature regulation, and electric heater 41 each all have for example 0.01 kilowatt power, and can carry out approximately from 0 to 2 ℃ temperature regulation.
The specific examples that the schema that adopts Fig. 9 is controlled temperature regulation is described.To temperature probe value T from the temperature sensor 46 that is used for crucible 22A respective regions
i(i=1,2 ..., n-1 n) measures (step S1), and to the temperature probe value T of respective regions
iTarget temperature value Tt with respective regions
i(i=1,2 ..., n-1 n) compares (step S2).If temperature probe value T in certain zone
iThan target temperature value Tt
iLittle, then the well heater in this relevant range output is controlled to and is in on-state (step S3).On the other hand, if temperature probe value T
iBe not less than target temperature value Tt
i, then the well heater in this relevant range output is controlled to and is in trip condition (step S4).Therefore, respectively electric heater 41 is controlled, made the temperature probe value T of respective regions by temperature regulator 45
iIndicate predetermined steady temperature.
Therefore, by the vacuum vapor deposition apparatus of second embodiment, can obtain effect similar effects with above-mentioned first embodiment.
And, in the vacuum vapor deposition apparatus of second embodiment, crucible 22A is divided into a plurality of zones in a longitudinal direction, and under the lower surface of crucible 22A for respective regions is provided with independent electric heater 41, thereby can by these electric heaters 41 be respective regions independent control temperature.Therefore, to each regional temperature of finely tuning the temperature of crucible 22A and finely tuning evaporating materials (dopant material 30A).Therefore, can avoid evaporating more reliably in a longitudinal direction inhomogeneous of vaporization of material (dopant material 30A).Thereby, can be more reliably the increase of the size in the zone to be coated of FPD substrate 10, a spot of evaporating materials etc. be handled.Crucible 22B also has and above-mentioned effect similar effects.
It should be noted, although crucible 22A and well heater platform 42 are one (being that electric heater 41 belongs to embedded type) in above-mentioned example, and the electric heater 41 direct heat passage crucible 22A of arriving that contact with the lower surface of crucible 22A, but the invention is not restricted to this with electric heater 41.As shown in figure 10, make electric heater 41 separate, can crucible 22A be heated by radiant heat from electric heater 41 with crucible 22A by crucible 22A is arranged to structure separately with well heater platform 42.Under this situation, well heater platform 42 (electric heater 41) can be arranged on the inside or the outside of vaporizing chamber 16A (chamber 13).Be arranged under the inner situation of vaporizing chamber 16A (chamber 13) at well heater platform 42, advantage is that the heat passage efficient from electric heater 41 to crucible 22A is higher, because there is not the wall of vaporizing chamber 16A (chamber 13) between crucible 22A and electric heater 41.On the other hand, be arranged under the outside situation of vaporizing chamber 16A (chamber 13) at well heater platform 42, advantage is the maintenance of well heater platform 42 (electric heater 41), change etc. are easier to.
And electric heater 41 is not limited to be arranged for crucible 22A respective regions in a longitudinal direction as mentioned above like that, but can arrange more suitably.For example, as described in Figure 11, crucible 22A not only can be in a longitudinal direction but also can with the vertical direction of longitudinal direction on be divided into a plurality of zones, under the lower surface of crucible 22A,, be respective regions independent control temperature thereby can pass through these electric heaters 41 for respective regions is provided with independent electric heater 41.Under this situation because can not only regulate crucible 22A temperature distribution in a longitudinal direction, and can regulate crucible 22A with the vertical direction of longitudinal direction on temperature distribution, so can carry out the control of trickleer temperature.
The 3rd embodiment
Figure 12 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus essential part of third embodiment of the invention.Figure 13 A is as from the being seen cross-sectional view of direction (orthographic plan of crucible) of the arrow E of Figure 12.Figure 13 B is the cross-sectional view along the amplification of the straight line F-F of Figure 13 A.
Shown in Figure 12 to 13B, in the vacuum vapor deposition apparatus of the 3rd embodiment, replace slit groove, in the surface 31 of the crucible 22A of the dopant material in the vacuum vapor deposition apparatus that is used for above-mentioned first embodiment hole 51 is set.Although do not illustrate, the crucible 22B that is used for host material also has as the structure in hole 51 is set in the crucible 22A.Except the above, the structure of the vacuum vapor deposition apparatus of the 3rd embodiment (layout of crucible, the overall structure of vacuum vapor deposition apparatus etc.) is identical with the structure (seeing Fig. 1 to 6B) of the vacuum vapor deposition apparatus of above-mentioned first embodiment, thereby at this structure of the vacuum vapor deposition apparatus that also is not described in detail the 3rd embodiment will be shown.
Shown in Figure 12 to 13B, the width of crucible 22A (at the width on the plate width direction) is bigger than its length (width in the substrate transmission direction), and crucible 22A has rectangular shape (seeing Figure 13 A) in top view.For example, to have length be that 0.05 meter, width are not less than the elongated shape of 0.4 meter (for example 1 meter) to crucible 22A.In addition, in the upper surface 31 of crucible 22A, form a plurality of holes 51.These holes 51 are formed on the entire upper surface 31 of crucible 22A, and are arranged to staggered in the example shown in the accompanying drawing.These holes 51 are spaced.Part between adjacent holes 51 grades (being the part that does not form hole 51 of the upper surface 31 of crucible 22A) constitutes bank protection part 31a.As for the size in hole 51, for example, diameter is about 1 to 5 millimeter, and the degree of depth is about 0.1 to 2 millimeter.
And the effect of the part that is used to hold evaporating materials is played in these holes 51.That is, the hole 51 of crucible 22A holds dopant material 30A, and the hole 51 of crucible 22B holds host material 30B.Be to be noted that the physical size (diameter, the degree of depth etc.) in hole 51 and quantity be actual aequum, FPD substrate 10 according to evaporating materials (dopant material, host material) zone to be coated physical size etc. and suitably be provided with.And the shape of hole 51 in top view must not be limited to round-shaped as in the example shown in the accompanying drawing yet, but can be suitable shape (as rectangular shape).
As mentioned above, in the vacuum vapor deposition apparatus of the 3rd embodiment, each crucible among crucible 22A and the crucible 22B is one-piece construction and the long and narrow crucible for extending along plate width direction, and the surface has described a plurality of hole 51 in 31 thereon, and the effect of the part that is used to hold evaporating materials is played in these holes 51.Therefore, the heating surface zone of crucible 22A and 22B (zone that crucible 22A and 22B contact with evaporating materials) becomes bigger.Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can obtain desired evaporating materials evaporating capacity.
In addition, because each crucible among crucible 22A and the 22B is an one-piece construction, even in hot wall 23 along having the temperature difference in the position of the longitudinal direction of crucible 22A and 22B, because in the part that does not form hole 51 (bank protection part 31a) of the upper surface 31 of crucible 22A and crucible 22B and the thermal conduction in the part under hole 51, also be uniform in temperature on the whole crucible 22A and on the whole crucible 22B.Therefore, in a longitudinal direction inhomogeneous of the vaporization of the material that can avoid evaporating (dopant material 30A, host material 30B), and can make that the film thickness distribution of FPD substrate 10 is even.That is, shown in Figure 13 B like that, not only directly be doped material 30A from the radiant heat of hot wall 23 and receive, but also received by the bank protection part 31a of crucible 22A.The thermal conduction in crucible 22A of this heat is finally to be transmitted on the dopant material 30A by the internal surface (heating surface) in hole 51.Hole 51 and bank protection part 31a alternately are arranged to close mutually.Therefore, follow the temperature of bank protection part 31a the temperature sensitive of the dopant material 30A in the hole 51.If the radiations heat energy that receives does not fluctuate, then the temperature of dopant material 30A just keeps all even constant.Crucible 22B also has and above-mentioned effect similar effects.
And, also can easily handle a spot of evaporating materials (dopant material 30A, host material 30B) by quantity and the size (diameter, the degree of depth etc.) of setting hole 51 suitably.
Therefore, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of FPD substrate 10, a spot of evaporating materials etc. with lower cost, wherein the increase of the size in the zone to be coated of FPD substrate 10 is relevant with the increase of the size of FPD substrate 10.Therefore can also reduce the cost of equipment.And in the 3rd embodiment, even the amount of evaporating materials is very little, hole 51 also can be arranged on the entire upper surface of crucible 22A and 22B in the dispersive mode.Thereby, with as situation that slit groove is set in above-mentioned first embodiment compare, the 3rd embodiment is effective especially to the less situation of the amount of evaporating materials.
Although be to be noted that to be arranged to staggeredly that at above-mentioned example mesopore 51 layout in hole 51 must not be limited to this, but can be suitable arrangement.For example, can adopt following layout, wherein as shown in figure 14, hole 51 simply is arranged as row and arranges.Under this situation, also can obtain and above-mentioned effect similar effects.
And, for example, be difficult to form under the situation of bigger whole crucible to big workpiece as large size substrate, arrange a plurality of crucibles, these crucibles be placed on the whole zone of vaporizing chamber and in the crucible upper surface, form a plurality of holes by bunchy, can realize with above-mentioned whole crucible similarly as single structure than crucible greatly.In order further to improve the homogeneity of temperature distribution, preferably, when bunchy is arranged described a plurality of crucible, with these crucibles be arranged to mutually near, on the whole zone of vaporizing chamber, to extend.
The 4th embodiment
Figure 15 is the skeleton view that shows according to the structure of the vacuum vapor deposition apparatus essential part of fourth embodiment of the invention.
As shown in figure 15, in the vacuum vapor deposition apparatus of the 4th embodiment, electric heater 41 also is set as the heating unit in the crucible 22A of the dopant material in the vacuum vapor deposition apparatus that is used for above-mentioned the 3rd embodiment.Although do not illustrate, the crucible 22B that is used for host material also has as the structure of electric heater 41 is set in the crucible 22A.Except the above, the structure of the vacuum vapor deposition apparatus of the 4th embodiment (overall structure of the overall structure of crucible and layout, vacuum vapor deposition apparatus etc.) is identical with aforementioned first and the structure (seeing Fig. 1 to 6B and Figure 12 to 14) of the vacuum vapor deposition apparatus of the 3rd embodiment, thereby at this structure of the vacuum vapor deposition apparatus that also is not described in detail the 4th embodiment will be shown.
In addition, the layout of electric heater 41 etc. are also similar with layout of above-mentioned second embodiment (seeing Fig. 7 to 11) etc., thereby layout that also is not described in detail electric heater 41 etc. will be shown at this.
Therefore, the vacuum vapor deposition apparatus of the 4th embodiment also has the effect similar effects with the above-mentioned first and the 3rd embodiment, and also has the effect similar effects with above-mentioned second embodiment.
Other embodiment
It should be noted, although special performance effect of the present invention in according to the situation of long and narrow crucible 22A that constructs as the zone long and narrow to be coated among above-mentioned first to fourth embodiment and 22B, the present invention must not be limited to the situation that structure has the crucible of elongated shape like this.For example, as shown in Figure 16, crucible 61 has square shape (be as side edge length tens centimetres square shape) in top view, and is arranged in the vaporizing chamber 60, can form a plurality of slit groove 63 as the part that is used to hold evaporating materials 64 in the upper surface 62 of crucible 61.Replacedly, as shown in figure 17, crucible 71 has square shape (be as side edge length tens centimetres square shape) in top view, and is arranged in the vaporizing chamber 70, can form a plurality of holes 73 as the part that is used to hold evaporating materials 74 in the upper surface 72 of crucible 71.In addition, crucible 61 or 71 can be divided into a plurality of zones, under the lower surface of crucible 61 or 71 for respective regions is provided with independent heating unit (electric heater etc.), thereby can be respective regions independent control temperature by these heating units.Under this situation, also can obtain and above-mentioned effect similar effects.In addition, need not hot wall is heated to higher temperature, arranges more crucible etc., just can easily handle the increase of the size in the zone to be coated of workpiece, a spot of evaporating materials etc. with lower cost.Therefore can also reduce the cost of system.
And, in above-mentioned first to fourth embodiment, the example that crucible 22A that wherein is used for dopant material and the crucible 22B that is used for host material have similar structures is disclosed.Yet, can followingly adopt disclosed in the above-described embodiments crucible in combination: for example, adopt crucible conduct to be used for the crucible 22A of dopant material, and adopt the crucible 22B that is used for host material as the crucible conduct that in above-mentioned second embodiment, forms hole 51 as in above-mentioned first embodiment, forming slit groove 32A.
And the present invention can not only be applied to the vacuum vapor deposition apparatus that is used for codeposition, and can also be applied to and be used for independent sedimentary vacuum vapor deposition apparatus.And the present invention can also be applied to the vacuum vapor deposition apparatus different with the vacuum vapor deposition apparatus that is used for organic EL.
The present invention relates to a kind of vacuum vapor deposition apparatus.Especially, the present invention is useful in the situation that is applied on the vacuum vapor deposition apparatus that is used for organic EL, in this vacuum vapor deposition apparatus, organic materials (dopant material and host material) is deposited on the surface of large-sized FPD substrate, to form the film of organic EL.
Although described the present invention, it will be appreciated that the present invention is not limited to this, but can change or revise in other many modes by above embodiment.These variations or modification should not be considered as having departed from the spirit and scope of the present invention, and as comprising within the scope of the appended claims the conspicuous all such changes and modifications of those of skill in the art in this area.
Claims (12)
1. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, and in the crucible upper surface, have a plurality of grooves, and these grooves have the length from an end of crucible upper surface to its other end, and play the effect of the part that is used to hold evaporating materials.
2. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, and in the crucible upper surface, have groove, and this groove has the length from an end of crucible upper surface to its other end, and plays the effect of the part that is used to hold evaporating materials.
3. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of a plurality of members that bunchy is arranged to extend on the whole zone of vaporizing chamber, and in the crucible upper surface, have a plurality of grooves, and these grooves have the length from an end of crucible upper surface to its other end, and play the effect of the part that is used to hold evaporating materials.
4. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of any structure in a plurality of members that extend on the whole zone that is arranged at the one-piece construction of extending on the whole zone of vaporizing chamber and bunchy at vaporizing chamber, and have a plurality of holes in the crucible upper surface, and the effect of the part that is used to hold evaporating materials is played in these holes.
5. according to the described vacuum vapor deposition apparatus of each claim in the claim 1 to 4,
Wherein crucible is divided into a plurality of zones, under the crucible lower surface for respective regions is provided with independent heating unit, thereby can be respective regions independent control temperature by these heating units.
6. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have at least one groove in the crucible upper surface; And described at least one groove extends along the longitudinal direction of crucible, and plays the effect of the part that is used to hold evaporating materials.
7. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have a plurality of grooves in the crucible upper surface; And these grooves along and the vertical direction of the longitudinal direction of crucible extend, and play the effect of the part that is used to hold evaporating materials.
8. vacuum vapor deposition apparatus, wherein evaporating materials is contained in the crucible that is arranged in the vaporizing chamber, and by radiant heat evaporating materials is heated so that the evaporating materials vaporization from these hot walls as the hot wall of the sidewall of this vaporizing chamber, thereby evaporating materials is deposited on the workpiece surface to form film
Wherein, this crucible is made of the one-piece construction of extending on the whole zone of vaporizing chamber, has the elongated shape of extending along the width of workpiece, and have a plurality of holes in the crucible upper surface; And the effect of the part that is used to hold evaporating materials is played in these holes.
9. according to the described vacuum vapor deposition apparatus of each claim in the claim 6 to 8,
Wherein crucible is divided into a plurality of zones at least in a longitudinal direction, under the crucible lower surface for respective regions is provided with independent heating unit, thereby can be respective regions independent control temperature by these heating units.
10. according to the described vacuum vapor deposition apparatus of each claim in the claim 6 to 9,
Wherein evaporating materials is an organic materials, and
Workpiece is the substrate that is used for flat-panel monitor, and organic materials is deposited on the surface of substrate to form the film of organic electroluminescent device.
11. according to the described vacuum vapor deposition apparatus of each claim in the claim 6 to 9,
Wherein evaporating materials is an organic materials, and
Workpiece is the substrate that is used for means of illumination, and organic materials is deposited on the surface of substrate to form the film of organic electroluminescent device.
12. an employing is made the method for the film of organic electroluminescent device according to the vacuum vapor deposition apparatus of each claim in claim 5 and 9,
Wherein adopt organic materials as evaporating materials, and
Described respective regions to crucible is measured temperature, and according to the measurement temperature of described respective regions independent control is carried out in the output of those heating units, makes the temperature of described respective regions become constant.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005013673 | 2005-01-21 | ||
| JP2005013673 | 2005-01-21 | ||
| JP2005355652 | 2005-12-09 |
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| Publication Number | Publication Date |
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| CN1807677A true CN1807677A (en) | 2006-07-26 |
| CN100503881C CN100503881C (en) | 2009-06-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100062287A Expired - Fee Related CN100503881C (en) | 2005-01-21 | 2006-01-23 | Vacuum vapor deposition apparatus |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101981223B (en) * | 2008-12-24 | 2013-05-22 | 三菱重工业株式会社 | Vacuum deposition apparatus and method for adjusting temperature |
| CN105296928A (en) * | 2014-07-11 | 2016-02-03 | 圆益Ips股份有限公司 | Line source and thin film evaporation device comprising the same |
| CN107058957A (en) * | 2017-04-18 | 2017-08-18 | 武汉华星光电技术有限公司 | A kind of evaporation source |
| WO2017173875A1 (en) * | 2016-04-07 | 2017-10-12 | 京东方科技集团股份有限公司 | Linear evaporation source, evaporation source system and vapour deposition device |
-
2006
- 2006-01-23 CN CNB2006100062287A patent/CN100503881C/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101981223B (en) * | 2008-12-24 | 2013-05-22 | 三菱重工业株式会社 | Vacuum deposition apparatus and method for adjusting temperature |
| CN105296928A (en) * | 2014-07-11 | 2016-02-03 | 圆益Ips股份有限公司 | Line source and thin film evaporation device comprising the same |
| CN105296928B (en) * | 2014-07-11 | 2018-03-27 | 圆益Ips股份有限公司 | Line source and the film vapor deposition device for possessing this line source |
| WO2017173875A1 (en) * | 2016-04-07 | 2017-10-12 | 京东方科技集团股份有限公司 | Linear evaporation source, evaporation source system and vapour deposition device |
| CN107058957A (en) * | 2017-04-18 | 2017-08-18 | 武汉华星光电技术有限公司 | A kind of evaporation source |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100503881C (en) | 2009-06-24 |
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