CN1804139A - Nickel electrotyping method for production of plane electrotyping plate - Google Patents
Nickel electrotyping method for production of plane electrotyping plate Download PDFInfo
- Publication number
- CN1804139A CN1804139A CN 200510101381 CN200510101381A CN1804139A CN 1804139 A CN1804139 A CN 1804139A CN 200510101381 CN200510101381 CN 200510101381 CN 200510101381 A CN200510101381 A CN 200510101381A CN 1804139 A CN1804139 A CN 1804139A
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- CN
- China
- Prior art keywords
- plane
- nickel
- electroforming
- electrotyping
- make
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 42
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title description 2
- 238000005323 electroforming Methods 0.000 claims abstract description 37
- 238000000034 method Methods 0.000 claims abstract description 31
- 230000010287 polarization Effects 0.000 claims abstract description 4
- 238000003756 stirring Methods 0.000 claims abstract description 4
- 239000000243 solution Substances 0.000 claims description 29
- DITXJPASYXFQAS-UHFFFAOYSA-N nickel;sulfamic acid Chemical compound [Ni].NS(O)(=O)=O DITXJPASYXFQAS-UHFFFAOYSA-N 0.000 claims description 9
- 239000003153 chemical reaction reagent Substances 0.000 claims description 8
- 238000001914 filtration Methods 0.000 claims description 7
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 6
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 claims description 5
- 239000004141 Sodium laurylsulphate Substances 0.000 claims description 5
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 claims description 5
- 235000019333 sodium laurylsulphate Nutrition 0.000 claims description 5
- 239000004327 boric acid Substances 0.000 claims description 4
- 125000005619 boric acid group Chemical group 0.000 claims description 3
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 abstract 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005518 electrochemistry Effects 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
The nickel electroforming method for electroformed plate comprises: with high-frequency impulse power, setting pole distance as 35-40cm; spraying directly the filtered electroforming liquid as nickel sulfamate with low-concentration and high pH value to cathode surface; moving the cathode to stir and improve concentration polarization. This invention improves the nickel layer thickness with inhomogeneity less than 10% within 600mmx600mm area.
Description
Technical field
The present invention relates to a kind of method of electroforming, particularly relate to a kind of method that is used to make the electroformed nickel of plane electrotyping plate.
Background technology
The principle of electroforming is a theory of electrodeposition in the Applied Electrochemistry, by electrodeposit metals on core, then metal plating is produced the technology of metal products from the core separation.For electroforming process, mainly be to be used for making the metal products that some is difficult to the special shape of usefulness general machining method manufacturing, such as the plane electrotyping plate that can be used for preparing large format, high thickness, prepared Electrotype thickness range is generally 0.015mm～0.300mm.
In the method for the electroformed nickel that existing preparation large format, high thickness plane electrotyping plate are used, adopt direct supply usually, the distance between the anode and cathode is traditionally arranged to be 15～18em, and the common prescription of used electroforming solution is:
Nickel sulfamic acid: 300～450g/l
Nickelous chloride: 5～24g/l
Boric acid: 30～45g/l
PH value: 3.8～4.5
But when being used to prepare large format, high thickness plane electrotyping plate with the method for above-mentioned electroformed nickel, usually electroforming appears and after, the undesirable situation of the homogeneity of thickness, ununiformity reaches 30%～40%, effect is also not fully up to expectations.
Summary of the invention
Purpose of the present invention is exactly in order to overcome the above problems, and provides a kind of when making the plane electrotyping plate of large format, high thickness, can improve the method for the inhomogeneity electroformed nickel of nickel layer thickness of institute's electroforming greatly.
For achieving the above object, the present invention has adopted following technical scheme:
The invention discloses a kind of method that is used to make the electroformed nickel of plane electrotyping plate, power supply adopts high frequency pulse power supply in the described method; And the distance between the anode and cathode is made as 35～40cm; In the electroforming process, the electroforming solution direct injection cathode surface with after filtering adopts the negative electrode move mode to stir simultaneously and improves concentration polarization; Adopt the nickel sulfamic acid electroforming solution of lower concentration, high pH value in the electroforming process, component and content that this electroforming solution comprised are respectively:
Nickel sulfamic acid concentrated solution (180g/l) 333.0ml/l～350.0ml/l
Nickelous chloride concentrated solution (500g/l) 25.0ml/l～35.0ml/l
1,4 butyleneglycol, 0.3～0.5g/l
Sodium lauryl sulphate 0.05～0.8g/l
Asccharin 0.6～1.0g/l
PH value buffer reagent 35.0g/l～45.0g/l
PH value 4.8～5.4
The pulse-repetition of described high frequency pulse power supply is 10～5000HZ.
Preferably, the pulse-repetition of described high frequency pulse power supply is 3000～5000HZ.
Preferably, the distance between the described anode and cathode is made as 38cm.
Described electroforming solution after filtering is meant through 5 μ m crosses the electroforming solution that obtains behind the filter element filtering.
In the described electroforming solution, pH value buffer reagent is a boric acid.
Owing to adopted above scheme, be that the beneficial effect that the present invention possesses is:
The method of electroformed nickel of the present invention has improved the thickness homogeneity of the nickel dam that obtains after the electroforming greatly, and such as in the specific embodiment of the present invention, the ununiformity of electroforming is less than 10% in the 600mm*600mm scope.
Embodiment
The present invention is described in further detail below by specific embodiment.
Embodiment 1
A kind of method of electroformed nickel of the plane electrotyping plate of making large format, high thickness, power supply adopts 3000～5000HZ high frequency pulse power supply; Distance between the anode and cathode is made as 38cm; Adopt the nickel sulfamic acid electroforming solution of lower concentration, high pH value in the electroforming process, the component and the content that are comprised are respectively:
Nickel sulfamic acid concentrated solution (180g/l) 340.0ml/l
Nickelous chloride concentrated solution (500g/l) 30.0ml/l
1,4 butyleneglycol 0.4g/l
Sodium lauryl sulphate 0.5g/l
Asccharin 0.8g/l
PH value buffer reagent 40.0g/l
PH value 5.2
Wherein, pH value buffer reagent is a boric acid.
In the electroforming process, use simultaneously through 5 μ m and cross electroforming solution direct injection cathode surface behind the filter element filtering, adopt the negative electrode move mode to stir simultaneously and improve concentration polarization.
Plane electrotyping plate with aforesaid method is prepared gets after testing, and the ununiformity of electroforming is less than 9% in the 600mm*600mm scope.
Embodiment 2
A kind of method of electroformed nickel of the plane electrotyping plate of making large format, high thickness, except that the prescription of used electroforming solution, other with embodiment 1 in listed identical.
Used each component and the content that electroforming solution comprised of this embodiment is as follows:
Nickel sulfamic acid concentrated solution (180g/l) 333.0ml/l
Nickelous chloride concentrated solution (500g/l) 25.0ml/l
1,4 butyleneglycol 0.3g/l
Sodium lauryl sulphate 0.1g/l
Asccharin 0.6g/l
PH value buffer reagent 35.0g/l
PH value 5.0
Plane electrotyping plate with aforesaid method is prepared gets after testing, and the ununiformity of electroforming is less than 9% in the 600mm*600mm scope.
Embodiment 3
A kind of method of electroformed nickel of the plane electrotyping plate of making large format, high thickness, except that the prescription of used electroforming solution, other with embodiment 1 in listed identical.
Used each component and the content that electroforming solution comprised of this embodiment is as follows:
Nickel sulfamic acid concentrated solution (180g/l) 350.0ml/l
Nickelous chloride concentrated solution (500g/l) 35.0ml/l
1,4 butyleneglycol 0.5g/l
Sodium lauryl sulphate 0.8g/l
Asccharin 1.0g/l
PH value buffer reagent 45.0g/l
PH value 4.8
Plane electrotyping plate with aforesaid method is prepared gets after testing, and the ununiformity of electroforming is less than 10% in the 600mm*600mm scope.
Claims (6)
1, a kind of method that is used to make the electroformed nickel of plane electrotyping plate, it is characterized in that: power supply adopts high frequency pulse power supply in the described method; And the distance between the anode and cathode is made as 35～40cm; In the electroforming process, the electroforming solution direct injection cathode surface with after filtering adopts the negative electrode move mode to stir simultaneously and improves concentration polarization; Adopt the nickel sulfamic acid electroforming solution of lower concentration, high pH value in the electroforming process, component and content that this electroforming solution comprised are respectively:
Nickel sulfamic acid concentrated solution (180g/l) 333.0ml/l～350.0ml/l
Nickelous chloride concentrated solution (500g/l) 25.0ml/l～35.0ml/l
1,4 butyleneglycol, 0.3～0.5g/l
Sodium lauryl sulphate 0.05～0.8g/l
Asccharin 0.6～1.0g/l
PH value buffer reagent 35.0g/l～45.0g/l
PH value 4.8～5.4.
2, a kind of method that is used to make the electroformed nickel of plane electrotyping plate according to claim 1, it is characterized in that: the pulse-repetition of described high frequency pulse power supply is 10～5000HZ.
3, a kind of method that is used to make the electroformed nickel of plane electrotyping plate according to claim 2, it is characterized in that: the pulse-repetition of described high frequency pulse power supply is 3000～5000HZ.
4, a kind of method that is used to make the electroformed nickel of plane electrotyping plate according to claim 1, it is characterized in that: the distance between the described anode and cathode is made as 38cm.
5, a kind of method that is used to make the electroformed nickel of plane electrotyping plate according to claim 1, it is characterized in that: described electroforming solution after filtering is meant through 5 μ m crosses the electroforming solution that obtains behind the filter element filtering.
6, a kind of method that is used to make the electroformed nickel of plane electrotyping plate according to claim 1, it is characterized in that: in the described electroforming solution, pH value buffer reagent is a boric acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101013813A CN100545320C (en) | 2005-11-14 | 2005-11-14 | A kind of method that is used to make the electroformed nickel of plane electrotyping plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005101013813A CN100545320C (en) | 2005-11-14 | 2005-11-14 | A kind of method that is used to make the electroformed nickel of plane electrotyping plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1804139A true CN1804139A (en) | 2006-07-19 |
| CN100545320C CN100545320C (en) | 2009-09-30 |
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|---|---|---|---|
| CNB2005101013813A Expired - Fee Related CN100545320C (en) | 2005-11-14 | 2005-11-14 | A kind of method that is used to make the electroformed nickel of plane electrotyping plate |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102534695A (en) * | 2010-12-29 | 2012-07-04 | 京东方科技集团股份有限公司 | Metal substrate for flexible display and preparation method for metal substrate |
| CN108221006A (en) * | 2018-02-11 | 2018-06-29 | 常德金德新材料科技股份有限公司 | A kind of efficient method for preparing nickel plate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1122601C (en) * | 2001-08-22 | 2003-10-01 | 魏志凌 | Preparation method of surface tiling and veneering technology form |
| CN1247823C (en) * | 2002-06-25 | 2006-03-29 | 首钢总公司 | Electroplating method for internal surface of crystallizer |
| CN1239752C (en) * | 2003-01-08 | 2006-02-01 | 鞍钢集团机械制造公司机电装备厂 | Method for electroforming nickel-cobalt alloy |
-
2005
- 2005-11-14 CN CNB2005101013813A patent/CN100545320C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102534695A (en) * | 2010-12-29 | 2012-07-04 | 京东方科技集团股份有限公司 | Metal substrate for flexible display and preparation method for metal substrate |
| US20120168315A1 (en) * | 2010-12-29 | 2012-07-05 | Boe Technology Group Co., Ltd. | Metal substrate for flexible display and method of manufacturing the same |
| CN102534695B (en) * | 2010-12-29 | 2015-06-17 | 京东方科技集团股份有限公司 | Metal substrate for flexible display and preparation method for metal substrate |
| CN108221006A (en) * | 2018-02-11 | 2018-06-29 | 常德金德新材料科技股份有限公司 | A kind of efficient method for preparing nickel plate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN100545320C (en) | 2009-09-30 |
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