CN102534695B - Metal substrate for flexible display and preparation method for metal substrate - Google Patents
Metal substrate for flexible display and preparation method for metal substrate Download PDFInfo
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- CN102534695B CN102534695B CN201010612953.5A CN201010612953A CN102534695B CN 102534695 B CN102534695 B CN 102534695B CN 201010612953 A CN201010612953 A CN 201010612953A CN 102534695 B CN102534695 B CN 102534695B
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/04—Wires; Strips; Foils
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
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Abstract
The invention discloses a metal substrate for a flexible display, and a preparation method for the metal substrate, and relates to the technical field of flexible display manufacture to make the metal substrate for the flexible display have low surface roughness. The preparation method for the metal substrate for the flexible display comprises the following steps of: preparing a core model matched with the metal substrate for the flexible display; immersing the core model and an electroformed metal together in an electroforming solution for electroforming to form an electroformed metal layer on the surface of the core model by taking the core model as a cathode, the electroformed metal for the metal substrate for the flexible display as an anode and a salt solution of the electroformed metal as the electroforming solution; and peeling the electroformed metal layer from the core model, and using the peeled electroformed metal layer as the metal substrate for the flexible display. The invention can be used for preparing metal substrates for flexible displays.
Description
Technical field
The present invention relates to flexible display manufacturing technology field, particularly relate to a kind of preparation method and metal substrate thereof of flexible display metal substrate.
Background technology
Organic electroluminescence device (OLED, Organic Light Emitting Diode) not only have active illuminating, visual angle wide, respond the advantages such as fast, and maximum feature is to realize Flexible Displays.Usually use glass substrate in traditional OLED, glass substrate suppleness is inadequate, easily broken.If use flexible substrate to replace existing glass substrate, then make OLED become FOLED (flexible organic electroluminescent device, Flexible Organic Light Emitting Diode), thus can flexible display be made.Flexible display can be out of shape or bend, and is applicable to the occasion that some are special or important, as the indicating meter in aircraft cockpit, uses the flexible material design of non-glass, can not have influence on security during ejection bailout.
Polymer matrix film (as plastic substrate) and metal substrate etc. are mainly contained at present for the flexible substrate making flexible display.But polymer matrix film obtained in prior art or the surfaceness of metal substrate very large, even if the rootmean-square of the surfaceness of the metal substrate such as after surface finish process (RMS) is also up to 1000 dusts, so large surfaceness makes directly to prepare display device at polymer matrix film or metal substrate surface.
For improving surfaceness, no matter be for polymer matrix film or to metal substrate in prior art, all need to adopt planarization to reduce its surfaceness, such as conventional is at its surface-coated organic materials (polyimide) film, inorganic materials (SiOx) film or composite membrane.But these planarization method are but difficult to obtain desirable effect because the surfaceness of polymer matrix film or metal substrate is excessive, especially some spikes of substrate surface can puncture the film layer structure made at this substrate surface, thus affect stability and the life-span of whole flexible display, and the integral thickness of polymer matrix film or metal substrate after coated film layer, can be increased.
Summary of the invention
Embodiments of the invention provide a kind of preparation method and metal substrate thereof of flexible display metal substrate, have less surfaceness to make flexible display metal substrate.
For achieving the above object, embodiments of the invention adopt following technical scheme:
The embodiment of the present invention provides a kind of preparation method of flexible display metal substrate, and described method comprises:
The core that preparation and flexible display metal substrate adapt;
Using described core as negative electrode, flexible display metal substrate electroforming metal used as the salts solution of anode, described electroforming metal as electroforming solution, described core and electroforming metal are together immersed in described electroforming solution and carry out electroforming to form electroforming metal layer at described mandrel surface;
Described electroforming metal layer is peeled off from described core, and using the electroforming metal layer that obtains after peeling off as flexible display metal substrate.
The embodiment of the present invention also provides a kind of flexible display metal substrate, and described flexible display metal substrate is the flexible display metal substrate prepared by above-mentioned flexible display preparation method.
The preparation method of the flexible display metal substrate that the embodiment of the present invention provides and metal substrate thereof, electroforming is carried out to form electroforming metal layer at described mandrel surface by described core and electroforming metal together being immersed in described electroforming solution, and carry out the demoulding, then using the electroforming metal layer that obtains after the demoulding as flexible display metal substrate, the surfaceness of flexible display metal substrate obtained like this obtains great reduction, it is right that such as surfaceness rootmean-square RMS can be reduced to 100 dust to 50 Izods, decrease the destruction of surface peek to the film layer structure made at this flexible display metal substrate surface, improve stability and the yield rate of flexible display device.
Accompanying drawing explanation
In order to be illustrated more clearly in the embodiment of the present invention or technical scheme of the prior art, be briefly described to the accompanying drawing used required in embodiment or description of the prior art below, apparently, accompanying drawing in the following describes is some embodiments of the present invention, for those of ordinary skill in the art, under the prerequisite not paying creative work, other accompanying drawing can also be obtained according to these accompanying drawings.
Fig. 1 is the schematic diagram of embodiment of the present invention flexible display metal substrate preparation method;
Fig. 2 is all processes schematic diagram of the metal substrate of flexible display shown in Fig. 1 preparation method;
Fig. 3 is the surfaceness result figure of the flexible display metal substrate obtained in the embodiment of the present invention 1;
Fig. 4 is the surfaceness result figure of the flexible display metal substrate obtained in the embodiment of the present invention 2;
Fig. 5 is the surfaceness result figure of the flexible display metal substrate obtained in the embodiment of the present invention 3;
Fig. 6 is the surfaceness result figure of the flexible display metal substrate obtained in comparative example.
Embodiment
Below in conjunction with accompanying drawing, the preparation method of embodiment of the present invention flexible display metal substrate and metal substrate thereof are described in detail.Should be clear and definite, described embodiment is only a part of embodiment of the present invention, instead of whole embodiments.Based on the embodiment in the present invention, those of ordinary skill in the art, not making other embodiments all obtained under creative work prerequisite, belong to the scope of protection of the invention.
As shown in Figure 1, be the preparation method of flexible display metal substrate of the present invention.Described preparation method comprises:
Step 11, the core that preparation and flexible display metal substrate adapt;
Step 12, using described core as negative electrode, flexible display metal substrate electroforming metal used as the salts solution of anode, described electroforming metal as electroforming solution, described core and electroforming metal are together immersed in described electroforming solution and carry out electroforming to form electroforming metal layer at described mandrel surface;
Step 13, peels off described electroforming metal layer from described core, and using the electroforming metal layer that obtains after peeling off as flexible display metal substrate.
The preparation method of the flexible display metal substrate in the present embodiment, electroforming is carried out to form electroforming metal layer at described mandrel surface by described core and electroforming metal together being immersed in described electroforming solution, and carry out the demoulding, then using the electroforming metal layer that obtains after the demoulding as flexible display metal substrate, the surfaceness of flexible display metal substrate obtained like this obtains great reduction, it is right that such as surfaceness rootmean-square RMS can be reduced to 100 dust to 50 Izods, decrease the destruction of surface peek to the film layer structure made at this flexible display metal substrate surface, improve stability and the yield rate of flexible display device.
Illustrate all processes of the preparation method of described flexible display metal substrate below.As shown in Figure 2, this all processes comprises:
Step 21, provides the core substrate adapted with flexible display metal substrate.
The described core substrate adapted with flexible display metal substrate refers to the core substrate that the aspect such as size dimension or material adapts with it.Size such as can be selected identical or slightly larger than the core substrate of flexible display metal substrate.Described core substrate can select thickness to be the stainless steel substrate of 0.04 millimeter in an embodiment of the present invention.Wherein the material of this stainless steel substrate can select the trade mark to be the stainless steel of SUS304.
Step 22, is immersed in described core substrate in degreaser and carries out electrochemical deoiling.
For enabling electroforming metal be deposited on described core substrate surface better, needing to keep described core substrate surface totally to clean, there is no greasy impurity, described core substrate can be immersed in degreaser for this reason and carry out electrochemical deoiling.Be specifically as follows: described core substrate is immersed in the degreaser of 50 DEG C 30 minutes and carries out oil removing.Described degreaser comprises following component and weight ratio content: sodium hydroxide: sodium carbonate: tertiary sodium phosphate=10: 5: 4.
Step 23, cleans the described core substrate after electrochemical deoiling.
In this step, water can be used to clean the described core substrate after electrochemical deoiling, clean so that degreaser residual on described core substrate surface is removed.Such as, this step can comprise:
Step 231, is first immersed in the described core substrate after electrochemical deoiling in 50 DEG C and above hot water and carries out hot water rinsing.Generally speaking, the dissolving power of hot water to material that temperature is high is better than the low cold water of temperature to the dissolving power of material, therefore uses hot water also to have cleaning effect better.
Step 232, then carries out cold rinse by the cold water at room temperature of the described core substrate submergence after hot water rinsing, with clean described core substrate further.
Need clear and definite, be not limited thereto the step 23 described in place in other embodiments of the present invention, such as described step 23 only can comprise and uses hot water to carry out the step cleaned, or only can comprise and use cold water to carry out the step cleaned.
Step 24, dry cleaned described core substrate, obtain the core adapted with described flexible display metal substrate.
In this step, multiple drying means can be used to carry out dry cleaned described core substrate.Such as can use air-dry method, or the method etc. of thermal evaporation can be used.
By above-mentioned steps 21-24, prepare the core adapted with flexible display metal substrate.Illustrate below and how become electroforming metal layer at the described core cast that powers on.
Step 25, using described core as negative electrode, flexible display metal substrate electroforming metal used as the salts solution of anode, described electroforming metal as electroforming solution, described core and electroforming metal are together immersed in described electroforming solution and carry out electroforming to form electroforming metal layer at described mandrel surface.
Specifically, in order to make there is around described core larger electroforming solution concentration and improve speed of response, after together immersing in described electroforming solution by described core and electroforming metal, and described electroforming solution can be sprayed to described mandrel surface in the process of carrying out electroforming.Such as, in the electrotyping bath holding electroforming solution, constantly can supply electroforming solution by liquid conducting pipes, liquid conducting pipes can be made in the process to arrange described electroforming solution to be injected directly on described mandrel surface towards described core.
While spraying described electroforming solution to described mandrel surface, the electroforming solution around described core can also be stirred.By stirring the electroforming solution around described core, the polarization of electroforming solution around described core can be improved, and the concentration of electroforming solution around described core is kept evenly.For example, can to make the mode of described core movement to stir the electroforming solution around described core in this step.Certainly, independent poking bar etc. also can be used to stir.
Need clear and definite, in other embodiments of the invention, be not limited to the electroforming solution stirred while spraying described electroforming solution to described mandrel surface around described core, and improve electroforming effect with this.By means of only spraying described electroforming solution to described mandrel surface to improve electroforming effect, or electroforming effect can also be improved by means of only the electroforming solution stirred around described core in the process of electroforming.
In addition it should be noted that, in the various embodiments of the invention, the metals such as nickel, copper, iron can be used as electroforming metal, the flexible display metal substrate formed like this can be nickel matter metal substrate, copper metal substrate and ferrous metal substrate.The nickel sulfamic acid electroforming solution used for electroformed nickel in this step is to illustrate the composition of described electroforming solution.For example, described electroforming solution comprises following component and content:
Nickel sulfamic acid 54.0g/l ~ 63.0g/l
Nickelous chloride 140.0g/l ~ 180.0g/l
O-benzoic sulfimide 0.5g/l ~ 1.0g/l
Sodium lauryl sulfate 0.05g/l ~ 1.0g/l
Isosorbide-5-Nitrae butyleneglycol 0.2g/l ~ 0.6g/l
Boric acid 30.0g/l ~ 45.0g/l
Nickel sulfamic acid in described electroforming solution can be provided by the nickel sulfamic acid concentrated solution of 180g/l, and the amount of now required in described electroforming solution nickel sulfamic acid concentrated solution can be 300.0ml/l ~ 350.0ml/l.Or the nickel sulfamic acid in described electroforming solution can be reacted by thionamic acid and nickel or nickel compound and obtain.In addition described nickel sulfamic acid concentrated solution can be the nickel sulfamic acid aqueous solution or ethanolic soln.Similarly, the nickelous chloride in described electroforming solution can be provided by the nickelous chloride concentrated solution of 500g/l, and the amount of now required in described electroforming solution nickelous chloride concentrated solution can be 28.0ml/l ~ 36.0ml/l.Or the nickelous chloride in described electroforming solution can react obtained by other muriates and nickel compound.In addition described nickelous chloride concentrated solution can be nickel chloride aqueous solution or ethanolic soln.
In order to improve electroforming effect further, the electroforming metal making to be deposited on described mandrel surface is pure does not have impurity, can use the electroforming solution after filtering.Specifically this electroforming solution after filtering refers to the electroforming solution that obtains after the filtration core of 1 micron filters.
The pH value of described electroforming solution is 4.5-5.5.
The temperature of described electroforming solution is 45 DEG C-60 DEG C.
The electric current used in electroforming process is the electric current of current density for 2-10 peace/square decimeter.
The power supply used in electroforming process is the high frequency pulse power supply of pulse-repetition for 10-5000 hertz.Preferably, the power supply used in electroforming process is the high frequency pulse power supply of pulse-repetition for 3500-5000 hertz.
Described core and electroforming metal are together immersed after in described electroforming solution, the distance between described core and described electroforming metal is remained between 30-40 centimetre.Preferably, the distance between described core and described electroforming metal is made to remain on 38 centimetres.
By above-mentioned step 25, define electroforming metal layer in the surface electrical casting of described core, carry out afterwards:
Step 26, described core surface being formed with electroforming metal layer takes out from described electroforming solution, is peeled off by described electroforming metal layer afterwards from described core, and using the electroforming metal layer that obtains after peeling off as flexible display metal substrate.
The surfaceness of the flexible display metal substrate obtained obtains great reduction, it is right that such as surfaceness rootmean-square RMS can be reduced to 100 dust to 50 Izods, decrease the destruction of surface peek to the film layer structure made at this flexible display metal substrate surface, improve stability and the yield rate of flexible display device.
The preparation of flexible display metal substrate is described below by specific embodiment.
embodiment 1
Select thickness is 0.04 millimeter, the trade mark is SUS304 stainless steel substrate as core substrate, through electrochemical deoiling, hot water cleaning, cold water cleaning and air-dry step before electroforming, obtain the core adapted with flexible display metal substrate.
Using described core as negative electrode, nickel metal as anode, nickel sulfamic acid electroforming solution as electroforming solution, described core and nickel metal are together immersed in described electroforming solution and carry out electroforming to form nickel metal layer at described mandrel surface.Component and the content of wherein said electroforming solution are respectively:
Nickel sulfamic acid concentrated solution (180g/l) 340.0ml/l
Nickelous chloride concentrated solution (500g/l) 30.0ml/l
O-benzoic sulfimide 0.8g/l
Sodium lauryl sulfate 0.5g/l
Isosorbide-5-Nitrae butyleneglycol 0.4g/l
Boric acid 40.0g/l
Wherein, in electroforming solution, content is that to be equivalent to content in electroforming solution be the nickel sulfamic acid of 61.2g/l for the nickel sulfamic acid concentrated solution (180g/l) of 340.0ml/l.In electroforming solution, content is that to be equivalent to content in electroforming solution be the nickelous chloride of 150g/l for the nickelous chloride concentrated solution (500g/l) of 30.0ml/l.
Described electroforming solution is the electroforming solution obtained after the filtration core filtration of 1 micron.
The pH value of described electroforming solution is 5.2.
The temperature of described electroforming solution 55 DEG C.
The electric current of the electric current used in electroforming process to be current density be 6 peaces/square decimeter.
The power supply used in electroforming process is the high frequency pulse power supply of pulse-repetition for 3500-5000 hertz.
Distance between described core and described electroforming metal remains on 38 centimetres.
After electroforming end of processing, described core surface being formed with electroforming metal layer takes out from described electroforming solution, carries out the demoulding, and using the electroforming metal layer that obtains after the demoulding as flexible display metal substrate.
The test result of surfaceness acquisition after atomic force microscope test of the flexible display metal substrate obtained as shown in Figure 3.Wherein said atomic force microscope is the instrument of Measuring Object surfaceness conventional in prior art.As seen from Figure 3, in one section of cross section of described flexible display metal substrate, the height at its surperficial maximum sharpness place is rice in (31.74-21.66)=10.08 (1 nanometer=10 dust).
embodiment 2
Select thickness is 0.04 millimeter, the trade mark is SUS304 stainless steel substrate as core substrate, through electrochemical deoiling, hot water cleaning, cold water cleaning and air-dry step before electroforming, obtain the core adapted with flexible display metal substrate.
Using described core as negative electrode, nickel metal as anode, nickel sulfamic acid electroforming solution as electroforming solution, described core and nickel metal are together immersed in described electroforming solution and carry out electroforming to form nickel metal layer at described mandrel surface.Component and the content of wherein said electroforming solution are respectively:
Nickel sulfamic acid concentrated solution (180g/l) 330.0ml/l
Nickelous chloride concentrated solution (500g/l) 28.0ml/l
O-benzoic sulfimide 0.6g/l
Sodium lauryl sulfate 0.5g/l
Isosorbide-5-Nitrae butyleneglycol 0.2g/l
Boric acid 35.0g/l
Wherein, in electroforming solution, content is that to be equivalent to content in electroforming solution be the nickel sulfamic acid of 59.4g/l for the nickel sulfamic acid concentrated solution (180g/l) of 330.0ml/l.In electroforming solution, content is that to be equivalent to content in electroforming solution be the nickelous chloride of 140g/l for the nickelous chloride concentrated solution (500g/l) of 28.0ml/l.
Described electroforming solution is the electroforming solution obtained after the filtration core filtration of 1 micron.
The pH value of described electroforming solution is 5.0.
The temperature of described electroforming solution 55 DEG C.
The electric current of the electric current used in electroforming process to be current density be 6 peaces/square decimeter.
The power supply used in electroforming process is the high frequency pulse power supply of pulse-repetition for 3500-5000 hertz.
Distance between described core and described electroforming metal remains on 38 centimetres.
After electroforming end of processing, described core surface being formed with electroforming metal layer takes out from described electroforming solution, carries out the demoulding, and using the electroforming metal layer that obtains after the demoulding as flexible display metal substrate.
The test result of surfaceness acquisition after atomic force microscope test of the flexible display metal substrate obtained as shown in Figure 4.Wherein said atomic force microscope is the instrument of Measuring Object surfaceness conventional in prior art.As seen from Figure 4, in one section of cross section of described flexible display metal substrate, the height at its surperficial maximum sharpness place is rice in (13.39-3.13)=10.26 (1 nanometer=10 dust).
embodiment 3
Select thickness is 0.04 millimeter, the trade mark is SUS304 stainless steel substrate as core substrate, through electrochemical deoiling, hot water cleaning, cold water cleaning and air-dry step before electroforming, obtain the core adapted with flexible display metal substrate.
Using described core as negative electrode, nickel metal as anode, nickel sulfamic acid electroforming solution as electroforming solution, described core and nickel metal are together immersed in described electroforming solution and carry out electroforming to form nickel metal layer at described mandrel surface.Component and the content of wherein said electroforming solution are respectively:
Nickel sulfamic acid concentrated solution (180g/l) 345.0ml/l
Nickelous chloride concentrated solution (500g/l) 35.0ml/l
O-benzoic sulfimide 1.0g/l
Sodium lauryl sulfate 0.8g/l
Isosorbide-5-Nitrae butyleneglycol 0.5g/l
Boric acid 45.0g/l
Wherein, in electroforming solution, content is that to be equivalent to content in electroforming solution be the nickel sulfamic acid of 62.1g/l for the nickel sulfamic acid concentrated solution (180g/l) of 345.0ml/l.In electroforming solution, content is that to be equivalent to content in electroforming solution be the nickelous chloride of 175g/l for the nickelous chloride concentrated solution (500g/l) of 35.0ml/l.
Described electroforming solution is the electroforming solution obtained after the filtration core filtration of 1 micron.
The pH value of described electroforming solution is 4.8.
The temperature of described electroforming solution 55 DEG C.
The electric current of the electric current used in electroforming process to be current density be 6 peaces/square decimeter.
The power supply used in electroforming process is the high frequency pulse power supply of pulse-repetition for 3500-5000 hertz.
Distance between described core and described electroforming metal remains on 38 centimetres.
After electroforming end of processing, described core surface being formed with electroforming metal layer takes out from described electroforming solution, carries out the demoulding, and using the electroforming metal layer that obtains after the demoulding as flexible display metal substrate.
The test result of surfaceness acquisition after atomic force microscope test of the flexible display metal substrate obtained as shown in Figure 5.Wherein said atomic force microscope is the instrument of Measuring Object surfaceness conventional in prior art.As seen from Figure 5, in one section of cross section of described flexible display metal substrate, the height at its surperficial maximum sharpness place is (11.13-3.92)=7.21 nanometer (1 nanometer=10 dust).
comparative example
Select that thickness is 0.04 millimeter, the trade mark is the stainless steel substrate of SUS304, carry out electrochemical deoiling, hot water cleaning, cold water cleaning and dry.On stainless steel substrate after the drying, coating polyimide is in order to improve the surfaceness of stainless steel substrate, and the thickness of polyimide is 2 microns.Polyimide closely bonds with stainless steel metal paper tinsel after 250 DEG C of high bake temperature, obtains flexible display metal substrate.
The test result of surfaceness acquisition after atomic force microscope test of the flexible display metal substrate obtained as shown in Figure 6.Wherein said atomic force microscope is the instrument of Measuring Object surfaceness conventional in prior art.As seen from Figure 6, in one section of cross section of described flexible display metal substrate, the height at its surperficial maximum sharpness place is (90.78-18.55)=72.23 nanometer (1 nanometer=10 dust).
The result obtained as can be seen from the various embodiments described above and comparative example, relative in prior art by the flexible display metal substrate that obtains of coating organic materials (polyimide) film, inorganic materials (SiOx) film or composite membrane, the surfaceness of the flexible display metal substrate obtained in the embodiment of the present invention has had great reduction, decrease the destruction of surface peek to the film layer structure made at this flexible display metal substrate surface, improve stability and the yield rate of flexible display device.
The flexible display that the flexible display metal substrate utilizing aforesaid method to prepare can be used for manufacturing includes but not limited to, the flexible display devices such as Thin Film Transistor-LCD (TFT-LCD), passive organic electroluminescent device, active organic electroluminescent device, thin film transistor static RAM (TFT-SRAM), flexible electrophoretic display (Flexible electrophoretic display).
In addition, the embodiment of the present invention additionally provides a kind of flexible display metal substrate, this flexible display metal substrate is the flexible display metal substrate obtained by the preparation method of above-mentioned flexible display metal substrate, it has lower surfaceness, decrease the destruction of surface peek to the film layer structure made at this flexible display metal substrate surface, improve stability and the yield rate of flexible display device.
The above; be only the specific embodiment of the present invention, but protection scope of the present invention is not limited thereto, is anyly familiar with those skilled in the art in the technical scope that the present invention discloses; change can be expected easily or replace, all should be encompassed within protection scope of the present invention.Therefore, protection scope of the present invention should be as the criterion with the protection domain of described claim.
Claims (10)
1. a preparation method for flexible display metal substrate, is characterized in that, comprising:
The core that preparation and flexible display metal substrate adapt;
Using described core as negative electrode, flexible display metal substrate electroforming metal used is as the salts solution of anode, described electroforming metal as electroforming solution, described core and electroforming metal are together immersed in described electroforming solution and carries out electroforming, described electroforming solution is sprayed to described mandrel surface, and the electroforming solution simultaneously stirred around described core, to form electroforming metal layer at described mandrel surface;
Described electroforming metal layer is peeled off from described core, and using the electroforming metal layer that obtains after peeling off as flexible display metal substrate.
2. the preparation method of flexible display metal substrate according to claim 1; it is characterized in that; the component of described electroforming solution and content are: nickel sulfamic acid 54.0g/l ~ 63.0g/l, nickelous chloride 140.0g/l ~ 180.0g/l, o-benzoic sulfimide 0.5g/l ~ 1.0g/l, sodium lauryl sulfate 0.05g/l ~ 1.0g/l, BDO 0.2g/l ~ 0.6g/l, boric acid 30.0g/l ~ 45.0g/l.
3. the preparation method of flexible display metal substrate according to claim 2, is characterized in that, described electroforming solution is the electroforming solution obtained after the filtration core filtration of 1 micron; The pH value of described electroforming solution is 4.5-5.5; The temperature of described electroforming solution is 45 DEG C-60 DEG C.
4. the preparation method of flexible display metal substrate according to claim 1, it is characterized in that, the electric current used in electroforming process is the electric current of current density for 2-10 peace/square decimeter, and the power supply used in electroforming process is the high frequency pulse power supply of pulse-repetition for 10-5000 hertz.
5. the preparation method of flexible display metal substrate according to claim 1, it is characterized in that, described core and electroforming metal are together immersed after in described electroforming solution, the distance between described core and described electroforming metal is remained between 30-40 centimetre.
6. the preparation method of flexible display metal substrate according to claim 1, is characterized in that, the core that described preparation and flexible display metal substrate adapt comprises:
The core substrate adapted with flexible display metal substrate is provided;
Described core substrate is immersed in degreaser and carries out electrochemical deoiling;
The described core substrate of cleaning after electrochemical deoiling;
Dry cleaned described core substrate, obtains the core adapted with described flexible display metal substrate.
7. the preparation method of flexible display metal substrate according to claim 6, is characterized in that, is immersed in degreaser by described core substrate to carry out electrochemical deoiling and be specially:
Described core substrate is immersed in the degreaser of 50 DEG C 30 minutes and carries out oil removing.
8. the preparation method of flexible display metal substrate according to claim 7, is characterized in that, described degreaser comprises following component and weight ratio content: sodium hydroxide: sodium carbonate: tertiary sodium phosphate=10:5:4.
9. the preparation method of flexible display metal substrate according to claim 8, is characterized in that, described core substrate to be thickness the be stainless steel substrate of 0.04 millimeter.
10. a flexible display metal substrate, is characterized in that, the flexible display metal substrate of described flexible display metal substrate prepared by the flexible display preparation method according to any one of the claims 1-9.
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| CN201010612953.5A CN102534695B (en) | 2010-12-29 | 2010-12-29 | Metal substrate for flexible display and preparation method for metal substrate |
| US13/337,606 US20120168315A1 (en) | 2010-12-29 | 2011-12-27 | Metal substrate for flexible display and method of manufacturing the same |
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| CN103215620A (en) * | 2013-04-15 | 2013-07-24 | 北京航空航天大学 | Method for preparing electroforming nickel layer with high elongation rate |
| CN105543918A (en) * | 2016-01-21 | 2016-05-04 | 燕山大学 | Method for preparing nickel plating steel strip by utilizing sulfamate pulse electronickelling |
| CN108364853A (en) * | 2018-01-30 | 2018-08-03 | 中国科学院物理研究所 | A kind of flexible metal substrate and its preparation method and application |
| CN108376648A (en) * | 2018-01-30 | 2018-08-07 | 中国科学院物理研究所 | A kind of flexible metal substrate and its preparation method and application |
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| CN1804138A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Mask electro-forming method for vaporization coating of organic light-emitting display |
| CN1804139A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Nickel electrotyping method for production of plane electrotyping plate |
| WO2006123049A2 (en) * | 2005-05-18 | 2006-11-23 | Centre National De La Recherche Scientifique | Method for the electrolytic production of self-supporting conductive nanocomposite elements |
| CN101319338A (en) * | 2007-06-04 | 2008-12-10 | 武济群 | Method for manufacturing pressure container with metallic nickel electrocasting |
| CN101864584A (en) * | 2010-05-26 | 2010-10-20 | 上海金杨金属表面处理有限公司 | Plating solution for tumble-plating and tumble-plating method of steel battery shell |
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| US5352266A (en) * | 1992-11-30 | 1994-10-04 | Queen'university At Kingston | Nanocrystalline metals and process of producing the same |
| JP2006193822A (en) * | 2004-12-16 | 2006-07-27 | Sharp Corp | Plating apparatus, plating method, semiconductor device, and method for manufacturing the semiconductor device |
| CN101545126B (en) * | 2008-03-24 | 2010-12-15 | 宝山钢铁股份有限公司 | Method for preparing surface coating of high chrome steel |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006123049A2 (en) * | 2005-05-18 | 2006-11-23 | Centre National De La Recherche Scientifique | Method for the electrolytic production of self-supporting conductive nanocomposite elements |
| CN1804138A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Mask electro-forming method for vaporization coating of organic light-emitting display |
| CN1804139A (en) * | 2005-11-14 | 2006-07-19 | 深圳市允升吉电子有限公司 | Nickel electrotyping method for production of plane electrotyping plate |
| CN101319338A (en) * | 2007-06-04 | 2008-12-10 | 武济群 | Method for manufacturing pressure container with metallic nickel electrocasting |
| CN101864584A (en) * | 2010-05-26 | 2010-10-20 | 上海金杨金属表面处理有限公司 | Plating solution for tumble-plating and tumble-plating method of steel battery shell |
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| CN102534695A (en) | 2012-07-04 |
| US20120168315A1 (en) | 2012-07-05 |
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