CN1722347A - Glass substrate for panel display device - Google Patents

Glass substrate for panel display device Download PDF

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Publication number
CN1722347A
CN1722347A CNA2005100842871A CN200510084287A CN1722347A CN 1722347 A CN1722347 A CN 1722347A CN A2005100842871 A CNA2005100842871 A CN A2005100842871A CN 200510084287 A CN200510084287 A CN 200510084287A CN 1722347 A CN1722347 A CN 1722347A
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Prior art keywords
glass
glass substrate
content
difficult
display device
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长寿研
高濑宽典
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Nippon Electric Glass Co Ltd
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Nippon Electric Glass Co Ltd
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Glass Compositions (AREA)
  • Electroluminescent Light Sources (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)

Abstract

To provide a glass substrate for a flat panel display device with which the power consumption of the device can be reduced.The glass substrate for the flat panel display device is characterized in that the dielectric constant at 25DEG C and 1 MHz is <=7.0.

Description

Glass substrate for panel display device
Technical field
The present invention relates to a kind of glass substrate that is applicable to that flat display apparatus, particularly plasm display device are used.
Background technology
Flat display apparatus such as following making.At first, film forming applies dielectric substance in the above by the transparency electrode that ITO film or nesa coating etc. constitute on above-mentioned glass baseplate surface, burns till under the temperature about 500～600 ℃, forms dielectric layer.In addition, by coating back side dielectric substance on the back side glass substrate that forms the electrode that constitutes by Al, Ag, Ni etc., under the temperature about 500～600 ℃, burn till, form dielectric layer, apply the next door material more in the above, under the temperature about 500～600 ℃, burn till, form the next door, form circuit thus.Then, make front glass substrate and back side glass substrate subtend, corresponding with the position of electrode etc., by under the temperature about 500～600 ℃ will around frit seal, make flat display apparatus.
At present, as glass substrate, usually using forming thicknesses such as utilizing float glass process is that (thermal coefficient of expansion is about 84 * 10 for the soda-lime glass of 1.8～3.0mm -7/ ℃).In addition, for example the thermal coefficient of expansion of the periphery material of insulating paste, flange cream (リ Block ペ one ス ト), frit seal agent is also corresponding with soda-lime glass, is adjusted at 70～90 * 10 -7/ ℃ scope in.
But the strain point of soda-lime glass is low to moderate about 500 ℃, so when heat-treating, cause thermal deformation or thermal contraction under 570～600 ℃ temperature, size has significant change.Consequently when making front glass substrate and back side glass substrate subtend, be difficult to realize the coupling of electrode position, particularly can making generation difficulty on the meticulous flat display apparatus of large-scale height with good accuracy.
Moreover the specific insulation (log p) of soda-lime glass under 150 ℃ is lower, is 8.4 Ω cm, and the degree of excursion of the alkali composition in the glass is big.Therefore also have following problem: alkali composition in the glass and reaction such as the membrane electrode of ITO film or nesa coating etc. change the resistance value of electrode material.
According to these situations, have the thermal coefficient of expansion equal, have than the high specific insulation of soda-lime glass and the glass of strain point and be applied on the glass substrate with soda-lime glass, make the meticulous flat display apparatus of large-scale height.
, flat display apparatus is compared with other display unit, has the big problem of electric power that expends.In recent years, from the viewpoint of the protection environment or the saving energy, require to reduce the electric power that expends of display unit, therefore, expectation can obtain reducing the glass substrate that expends electric power.
Patent documentation 1: the spy opens flat 8-290938 communique
Patent documentation 2: the spy opens flat 8-290939 communique
Summary of the invention
The object of the present invention is to provide a kind of glass substrate for panel display device that expends electric power that reduces display unit.
The inventor carries out found that of various researchs: the permittivity that reduces glass substrate can reduce the electric power that expends of display unit, thus motion the present invention.
That is, glass substrate for panel display device of the present invention is characterized in that, the permittivity under 25 ℃, 1MHz is below 7.0.
The permittivity of glass substrate of the present invention is low, can reduce the electric power that expends of display unit, so preferably as the flat display apparatus glass substrate of plasm display device particularly.
Embodiment
The permittivity of glass substrate for panel display device of the present invention under 25 ℃, 1MHz is lower, below 7.0, therefore can reduce the electric power that expends of display unit.When the permittivity of glass substrate uprises, be difficult to reduce the electric power that expends of display unit.The preferred value of the permittivity of glass substrate is below 6.9, more preferably below 6.8, further preferably below 6.7.
In addition, the inventor thinks: the reason that expends electric power that can reduce display unit by the permittivity that reduces glass substrate is: when the permittivity of glass substrate was hanged down, in order to make element (cell) once luminous, the magnitude of current that needs diminished.
In addition, in glass substrate of the present invention, in the thermal technology's preface when making display unit, produce thermal deformation or thermal contraction in order to suppress glass substrate, the strain point of glass is preferably at (more preferably more than 585 ℃, further preferably more than 595 ℃) more than 580 ℃.
In addition, when being tabular,, be shaped easily, be equivalent to 10 for making not burden of building mortion at forming of glass that will fusing 4The temperature of the glass melting liquid of the viscosity of dPas is preferably at (more preferably below 1180 ℃, further preferably below 1170 ℃) below 1200 ℃.
And, in order to obtain and for example matching of the thermal coefficient of expansion of the periphery material of insulating paste, flange cream, frit seal agent, simultaneously under chilling, also can obtain the glass substrate of the resistance to sudden heating excellence that is difficult to break, the thermal coefficient of expansion of glass is preferably 60～80 * 10 -7/ ℃ (more preferably 65～75 * 10 -7/ ℃, more preferably 67～73 * 10 -7/ ℃).
In addition, for the permittivity that makes glass substrate below 7.0, can adjust SiO 2Contain quantitative change and greatly maybe can adjust the content of MgO, CaO, SrO, BaO and tail off, particularly, in Quality Percentage, can in following scope, suitably select, that is, SiO 250～75%, Al 2O 30～20%, B 2O 30～20%, MgO 0～15%, CaO 0～15%, SrO 0～15%, BaO 0～15%, ZnO 0～5%, Li 2O 0～5%, Na 2O 0～15%, K 2O0～15%, ZrO 20～10%.
In addition, for obtain having permittivity below 7.0, more than 580 ℃ strain point, be equivalent to 10 below 1180 ℃ 4The temperature and 60～80 * 10 of the glass melting liquid of the viscosity of dPas -7/ ℃ the glass substrate of thermal coefficient of expansion, in above-mentioned compositing range, in Quality Percentage, preferably (compositing range A or compositing range B) selects suitable glass to form in following scope.Compositing range A is: SiO 255～74%, Al 2O 30.5 B～4%, 2O 30～20%, MgO 1～15%, CaO 0～8%, SrO 1～15%, BaO 0～5%, MgO+CaO+SrO+BaO 15～27%, ZnO 0～5%, Li 2O 0～5%, Na 2O0～8%, K 2O 2～12%, ZrO 20～7%.Compositing range B is: SiO 255～74%, Al 2O 3More than or equal to 0 less than 2.5%, B 2O 30～20%, MgO 1～15%, CaO 0～8%, SrO 1～15%, BaO 0～5%, MgO+CaO+SrO+BaO15～27%, ZnO 0～5%, Li 2O 0～5%, Na 2O 0～8%, K 2O 2～12%, ZrO 2Greater than 1% smaller or equal to 7%, ZrO 2Content is greater than Al 2O 3Content.
Particularly when selecting to form, obtain having permittivity below 6.9, the strain point more than 595 ℃ easily, be equivalent to 10 below 1170 ℃ from the glass of compositing range B 4The temperature and 67～73 * 10 of the glass melting liquid of the viscosity of dPas -7/ ℃ the glass substrate of thermal coefficient of expansion.
In glass substrate for panel display device of the present invention, the composition of glass is limited to the reasons are as follows of compositing range A.
SiO 2Be the permittivity that reduces glass, the composition that forms the network former (networkformer) of glass.Its content is 55～74%, is preferably 56～70%, more preferably 58～70%.Work as SiO 2Content for a long time, can reduce the permittivity of glass, but the high temperature viscosity of glass uprises, be difficult to fusion, shaping, thermal coefficient of expansion becomes too small and is difficult to obtain matching with periphery material.On the other hand, when content was very few, the permittivity of glass uprised, and was difficult to reduce the electric power that expends of display unit.In addition, thermal coefficient of expansion becomes the resistance to sudden heating that has glass greatly and reduces, the tendency that the strain point of glass reduces; In thermal technology's preface when making display unit, glass substrate is easy to generate the crack, causes thermal deformation or thermal contraction easily.
Al 2O 3It is the composition that improves the strain point of glass.Its content is 0.5～4%, is preferably 1～4%, more preferably 1～3.5%.Work as Al 2O 3Content for a long time, the high temperature viscosity of glass uprises, and is difficult to fusion, shaping, thermal coefficient of expansion diminishes, and is difficult to obtain the matching with periphery material.On the other hand, when content was very few, it is big that thermal coefficient of expansion becomes, and has the resistance to sudden heating of glass to reduce the tendency that the strain point of glass reduces; In thermal technology's preface when making display unit, glass substrate is easy to generate the crack, causes thermal deformation or thermal contraction easily.
B 2O 3It is the composition that reduces permittivity.Its content is 0～20%, is preferably 0～10%, more preferably 0～5%.Work as B 2O 3Contain quantitative change for a long time, the tendency that has the strain point of glass to reduce, in the thermal technology's preface when making display unit, glass substrate is easy to generate the crack, causes thermal deformation or thermal contraction easily.
MgO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 1～15%, is preferably 2～13%, more preferably 3～12%.When the content of MgO for a long time, the permittivity of glass has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.Moreover glass has the tendency of easy devitrification (devitrification) and is difficult to be shaped.On the other hand, when content after a little while, the high temperature viscosity of glass rises, and is difficult to fusion, shaping.
CaO is the same with MgO, is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 0～8%, is preferably 1～8%, more preferably 1～7%.When the content of CaO for a long time, the permittivity of glass has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.Moreover glass has the tendency of easy devitrification and is difficult to be shaped.
SrO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 1～15%, is preferably 3～15%, more preferably 4～13%.When the content of SrO for a long time, the permittivity of glass significantly raises, and is difficult to reduce the electric power that expends of display unit.On the other hand, when content after a little while, the high temperature viscosity of glass rises, and is difficult to fusion, shaping.
BaO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 0～5%, is preferably 0～4%, more preferably 0～3%.When the content of BaO for a long time, the permittivity of glass significantly uprises, and is difficult to make the electric power that expends of display unit to reduce.Moreover glass has the tendency of easy devitrification and is difficult to be shaped.
In addition, for the devitrification of reinforcing glass not, reduce the high temperature viscosity of glass and improve meltbility and formability, the total content of MgO, CaO, SrO and BaO is preferably 15～27% (more preferably 16.8～27%, more preferably greater than 18% smaller or equal to 27%).When the total amount of these compositions for a long time, the easy devitrification of glass.Moreover, when the total amount of these compositions after a little while, the high temperature viscosity of glass rises, and is difficult to fusion, shaping.
ZnO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 0～5%, is preferably 0～3%, more preferably 0～1%.When the content of ZnO for a long time, the permittivity of glass has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.
Li 2O is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Still adjust the composition of the thermal coefficient of expansion of glass.Its content is 0～5%, is preferably 0～3%, more preferably 0～1%.Work as Li 2When the content of O was too much, the strain point of glass had significantly reduced tendency; In thermal technology's preface when making display unit, cause thermal deformation or thermal contraction easily.Moreover it is excessive that thermal coefficient of expansion becomes, and the resistance to sudden heating of glass reduces, and is difficult to the matched coefficients of thermal expansion with periphery material.
Na 2O is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Still adjust the composition of the thermal coefficient of expansion of glass.Its content is 0～8%, is preferably 0～6%, more preferably 0.5～5%.Work as Na 2The content of O for a long time, the strain point of glass has the tendency of reduction; In thermal technology's preface when making display unit, cause thermal deformation or thermal contraction easily.Moreover it is excessive that thermal coefficient of expansion becomes, and the resistance to sudden heating of glass reduces, and is difficult to the matched coefficients of thermal expansion with periphery material.
K 2O and Na 2O is the same, is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Still adjust the composition of the thermal coefficient of expansion of glass.Its content is 2～12%, is preferably 2～11%, more preferably 2～10%.Work as K 2When the content of O was too much, the strain point of glass had the tendency of reduction; In thermal technology's preface when making display unit, cause thermal deformation or thermal contraction easily.Moreover it is excessive that thermal coefficient of expansion becomes, and the resistance to sudden heating of glass reduces, and is difficult to the matched coefficients of thermal expansion with periphery material.On the other hand, when content was too small, the high temperature viscosity of glass rose, and is difficult to fusion, shaping.Moreover it is too small that thermal coefficient of expansion becomes, and is difficult to the matched coefficients of thermal expansion with periphery material.
ZrO 2It is the composition that improves the strain point of glass.Its content is 0～7%, is preferably 0～3%, more preferably 0～1%.Work as ZrO 2Content for a long time, permittivity has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.Moreover, the tendency that produces the devitrification material is arranged, be difficult to be shaped.
In addition, containing 1% above Al 2O 3Compositional system in, contain ZrO 2Have more and result from ZrO 2The tendency of generation devitrification material, so ZrO 2Content be preferably limited to below 1%.
In addition, in glass substrate for panel display device of the present invention, the composition of glass is limited to the reasons are as follows of compositing range B.
SiO 2Be that the permittivity that reduces glass, the grid of formation glass form the composition of thing (net workformer).Its content is 55～74%, is preferably 56～70%, more preferably 58～70%.Work as SiO 2Content for a long time, can reduce the permittivity of glass, but the high temperature viscosity of glass uprises, be difficult to fusion, shaping, thermal coefficient of expansion becomes too small and is difficult to obtain matching with periphery material.On the other hand, when content after a little while, the permittivity of glass uprises, and is difficult to reduce the electric power that expends of display unit.Moreover it is big that thermal coefficient of expansion becomes, the tendency that have the resistance to sudden heating of glass to reduce, the strain point of glass reduces; In thermal technology's preface when making display unit, glass substrate is easy to generate the crack, causes thermal deformation or thermal contraction easily.
Al 2O 3It is the composition that improves the strain point of glass.Its content for more than or equal to 0 less than 2.5%, be preferably 0～1.5%, more preferably more than or equal to 0 less than 1%.Work as Al 2O 3Content when too much, the high temperature viscosity of glass significantly improves, and is difficult to fusion, shaping, thermal coefficient of expansion diminishes, and is difficult to obtain the matching with periphery material.
B 2O 3It is the composition that reduces permittivity.Its content is 0～20%, is preferably 0～10%, more preferably 0～5%.Work as B 2O 3Content for a long time, the tendency that has the strain point of glass to reduce, in the thermal technology's preface when making display unit, glass substrate is easy to generate the crack, causes thermal deformation or thermal contraction easily.
MgO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 1～l5%, is preferably 6.5～11%, more preferably 7.5～11%.When the content of MgO for a long time, the permittivity of glass has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.Moreover glass has the tendency of easy devitrification, is difficult to be shaped.On the other hand, when content after a little while, the high temperature viscosity of glass rises, and is difficult to fusion, shaping.
CaO is the same with MgO, is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 0～8%, is preferably 0～5%, more preferably 1～3.5%.When the content of CaO for a long time, the permittivity of glass has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.In addition, glass has the tendency of easy devitrification and is difficult to be shaped.
SrO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 1～15%, is preferably 7～13%, more preferably 7.5～13%.When the content of SrO for a long time, the permittivity of glass significantly uprises, and is difficult to reduce the electric power that expends of display unit.On the other hand, when content after a little while, the high temperature viscosity of glass rises, and is difficult to fusion, shaping.
BaO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 0～5%, is preferably 0～4%, more preferably 0～2.5%.When the content of BaO for a long time, the permittivity of glass significantly uprises, and is difficult to reduce the electric power that expends of display unit.Moreover glass has the tendency of easy devitrification and is difficult to be shaped.
In addition, for the devitrification of reinforcing glass not and reduce the high temperature viscosity of glass and improve meltbility and formability, the total content of MgO, CaO, SrO and BaO is preferably 15～27% (more preferably 16.8～27%, more preferably greater than 18% smaller or equal to 27%).When the total amount of these compositions for a long time, the easy devitrification of glass.Moreover, when the total amount of these compositions after a little while, the high temperature viscosity of glass rises, and is difficult to fusion, shaping.
ZnO is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Its content is 0～5%, is preferably 0～3%, more preferably 0～1%.When the content of ZnO for a long time, the permittivity of glass has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.
Li 2O is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Still adjust the composition of the thermal coefficient of expansion of glass.Its content is 0～5%, is preferably 0～3%, more preferably 0～1%.Work as Li 2The content of O for a long time, the strain point of glass has significantly reduced tendency; In thermal technology's preface when making display unit, cause thermal deformation or thermal contraction easily.Moreover it is excessive that thermal coefficient of expansion becomes, and the resistance to sudden heating of glass reduces, and is difficult to the matched coefficients of thermal expansion with periphery material.
Na 2O is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Still adjust the composition of the thermal coefficient of expansion of glass.Its content is 0～8%, is preferably 1～5%, more preferably 1～3%.Work as Na 2The content of O for a long time, the strain point of glass has the tendency of reduction; In thermal technology's preface when making display unit, cause thermal deformation or thermal contraction easily.Moreover it is excessive that thermal coefficient of expansion becomes, and the resistance to sudden heating of glass reduces, and is difficult to the matched coefficients of thermal expansion with periphery material.
K 2O and Na 2O is the same, is the composition that makes the high temperature viscosity reduction of glass and improve meltbility or formability.Still adjust the composition of the thermal coefficient of expansion of glass.Its content is 2～12%, is preferably 3～10%, more preferably 4～7%.Work as K 2The content of O for a long time, the strain point of glass has the tendency of reduction; In thermal technology's preface when making display unit, cause thermal deformation or thermal contraction easily.Moreover it is excessive that thermal coefficient of expansion becomes, and the resistance to sudden heating of glass reduces, and is difficult to the matched coefficients of thermal expansion with periphery material.On the other hand, when content was too small, the high temperature viscosity of glass rose, and is difficult to fusion, shaping.Moreover it is too small that thermal coefficient of expansion becomes, and is difficult to the matched coefficients of thermal expansion with periphery material.
ZrO 2Be not improve the high temperature viscosity of glass and the composition that significantly improves the strain point of glass.Its content for greater than 1% smaller or equal to 7%, be preferably more than 1% smaller or equal to 5%, more preferably greater than 1% smaller or equal to 3%.Work as ZrO 2Contain quantitative change for a long time, permittivity has the tendency that uprises, and is difficult to reduce the electric power that expends of display unit.Moreover, the tendency that produces the devitrification material is arranged, be difficult to be shaped.On the other hand, when content after a little while, the effect of the strain point of the glass that is difficult to be improved.
In addition, only significantly improve the strain point of glass for the high temperature viscosity that does not significantly improve glass, can make ZrO 2Content compare Al 2O 3Content many.
In addition, for high temperature viscosity and the shaping easily that reduces glass, at Al 2O 3Content less than in 1% the composition system, in order to improve the strain point of glass, preferably make ZrO 2Content greater than 1%.
In addition, for example painted except that the composition of in above-mentioned compositing range A and B, being put down in writing in the present invention in order to prevent ultraviolet ray, can add TiO 2To 5%; In order to improve anti-cracking, can add P 2O 5To 4%; In order to reduce liquidus temperature and to improve formability, can add Y 2O 3, La 2O 3, Nb 2O 3Respectively to 3%; Can add Fe 2O 3, CoO, NiO, Cr 2O 3, Nd 2O 3Respectively to 2% as colouring agent; Can add As 2O 3, Sb 2O 3, SnO 2, SO 3, F, Cl wait until that the total amount is 1% as cleanser.But, when using float forming, As 2O 3, Sb 2O 3In the groove that floats, be reduced and become metallic foreign body, so should avoid importing.
The manufacture method of glass substrate for panel display device of the present invention then, is described.
At first, concoct frit in the mode that becomes above-mentioned glass compositing range.Then, the frit of blending is put in the continuous fusion stove, heating and melting after the deaeration, is supplied with building mortion, is configured as tabular and slowly cooling, can obtain glass substrate.
In addition, as the manufacturing process of glass substrate, having to draw under float glass process, the discharge orifice and draw method (overflow down draw), redrawing method various manufacturing process such as (redraw) under method (slot downdraw), the overflow, is tabular but be preferably with float forming.Because its price comparison cheaply and easily obtains large-scale glass substrate.
Embodiment
Below, explain glass substrate for panel display device of the present invention based on embodiment.
Table 1～4 expression embodiments of the invention (test portion No.1～20) and comparative examples (test portion No.21).In addition, test portion No.21 is the high strain-point glass that commercially available flat display apparatus is used.
Table 1
Embodiment
No.1 No.2 No.3 No.4 No.5 No.6
Form (quality %) SiO 2 Al 2O 3 MgO CaO SrO BaO Na 2O K 2O ZrO 2 SO 3 P 2O 5 65.2 3.3 7.0 3.3 12.5 - 3.5 5.0 0.2 - - 67.5 1.5 7.0 3.0 12.5 - 3.5 5.0 - - - 67.4 2.2 6.5 2.8 12.5 - 2.5 6.0 0.1 - - 66.5 3.0 7.0 3.0 12.4 - 2.0 6.0 - 0.1 - 68.5 1.0 6.9 3.1 12.4 - 2.0 6.0 - 0.1 - 67.7 1.0 6.9 3.1 12.4 0.2 1.0 7.5 - 0.2 -
Permittivity 6.8 6.7 6.8 6.7 6.6 6.8
Strain point (℃) 585 580 590 595 590 605
10 4(℃) 1140 1140 1145 1160 1165 1180
Thermal coefficient of expansion [30-380 ℃] (* 10 -7/℃) 74.0 75.0 70.0 71.0 71.0 71.0
Table 2
Embodiment
No.7 No.8 No.9 No.10 No.11 No.12
Form (quality %) SiO 2 Al 2O 3 MgO CaO SrO BaO Na 2O K 2O ZrO 2 SO 3 P 2O 5 66.9 1.0 6.9 5.6 10.0 0.1 0.3 9.0 - 0.2 - 68.8 1.0 8.0 2.8 12.4 - 4.0 2.8 - 0.2 - 64.7 4.6 6.6 2.5 7.7 0.1 4.0 5.9 3.7 0.2 - 67.4 - 8.2 2.8 9.3 2.2 2.1 5.8 2.0 0.2 - 67.4 - 8.2 2.8 11.3 0.2 2.1 5.8 2.0 0.2 - 67.4 0.5 8.2 2.8 10.8 0.7 2.1 5.8 1.5 0.2 -
Permittivity 6.9 6.5 7.0 6.7 6.7 6.7
Strain point (℃) 620 580 600 600 600 600
10 4(℃) 1170 1150 1190 1165 1160 1160
Thermal coefficient of expansion [30-380 ℃] (* 10 -7/℃) 73.0 70.0 73.0 69.0 69.0 69.0
Table 3
Embodiment
No.13 No.14 No.15 No.16 No.17 No.18
Form (quality %) SiO 2 Al 2O 3 MgO CaO SrO BaO Na 2O K 2O ZrO 2 SO 3 P 2O 5 67.4 - 8.2 4.8 9.3 0.2 2.1 5.8 2.0 0.2 - 66.4 - 8.2 4.8 9.3 0.2 2.1 5.8 3.0 0.2 - 66.4 - 8.2 4.8 9.3 0.2 2.1 5.8 4.0 0.2 - 67.4 - 10.2 2.8 9.3 0.2 2.1 5.8 2.0 0.2 - 66.5 0.9 8.2 4.8 9.3 0.2 2.1 5.8 2.0 0.2 - 65.5 0.9 8.2 4.8 9.3 0.2 2.1 5.8 3.0 0.2 -
Permittivity 6.8 6.9 6.9 6.7 6.8 6.9
Strain point (℃) 605 610 615 610 605 615
10 4(℃) 1150 1150 1150 1160 1155 1150
Thermal coefficient of expansion [30-380 ℃] (* 10 -7/℃) 70.0 70.0 69.0 67.0 70.0 70.0
Table 4
Embodiment Comparative example
No.19 No.20 No.21
Form (quality %) SiO 2 Al 2O 3 MgO CaO SrO BaO Na 2O K 2O ZrO 2 SO 3 P 2O 5 62.3 7.3 6.8 2.3 10.0 0.2 2.0 8.0 1.0 0.1 - 67.6 6.5 4.6 2.8 6.5 0.2 3.3 6.9 0.5 0.1 1.0 55.0 7.0 2.0 2.0 9.0 9.0 4.0 7.0 5.0 - -
Permittivity 7.0 6.7 7.5
Strain point (℃) 615 595 580
10 4(℃) 1210 1250 1150
Thermal coefficient of expansion [30-380 ℃] (* 10 7/℃) 72.0 70.0 85.0
Each test portion in the table such as following making.
At first, to form the mode of the composition of showing, the blending frit uses the platinum kettle, 1450～1600 ℃ of following fusions 4 hours.Then, flowing out melten glass and be configured as tabularly on carbon plate, after slowly turning cold, is that the mode of 2.8mm is ground the two sides with the thickness of slab, the glass sheet that obtains is cut off be processed into the size at 200mm angle, makes test portion glass.
For each test portion that obtains like this, measure permittivity, strain point, be equivalent to 10 4The temperature and the thermal coefficient of expansion of the glass melting liquid of the viscosity of dPas.It is as shown in the table for its result.
It is as shown in the table, and the permittivity of each test portion of test portion No.1～20 of embodiment is lower, 7.0 when following, can suppress the electric power that expends of display unit.In addition, strain point is 580 ℃, can suppress the thermal deformation or the thermal contraction of the glass substrate in the heat treatment step.And thermal coefficient of expansion is 67.0～75.0 * 10 -7/ ℃, the resistance to sudden heating excellence has the thermal coefficient of expansion with the periphery material matched well.Moreover, in each test portion of test portion No.1～18, when being equivalent to 10 4The temperature of the glass melting liquid of the viscosity of dPas is lower, and below 1190 ℃ the time, formability is also excellent.
With respect to this, the permittivity of the test portion No.21 of comparative example is too high, is 7.5.
In addition, permittivity is based on ASTM D150-87, the value of measuring at 25 ℃, 1MHz.
In addition, strain point is based on ASTM C336-71 mensuration.In addition, this temperature is high more, can be suppressed at the thermal deformation or the thermal contraction of the glass substrate in the thermal technology's preface when making display unit more.
In addition, the viscosity that is equivalent to glass is 10 4The temperature of the glass melting liquid of dPas is measured by platinum ball pulling method.Standard when being tabular with this temperature as forming of glass, when this temperature was hanged down, formability was good.
For thermal coefficient of expansion, make the cylindric test portion of diameter 5.0mm, long 20mm, with the mean thermal expansion coefficients of dilatometer measurement at 30～380 ℃.
Glass substrate for panel display device of the present invention is not limited to this purposes of plasma display system, for example also can be used for field emission escope, electroluminescent display.

Claims (8)

1. glass substrate for panel display device is characterized in that:
Permittivity under 25 ℃, 1MHz is below 7.0.
2. glass substrate for panel display device as claimed in claim 1 is characterized in that:
Strain point is more than 580 ℃.
3. glass substrate for panel display device as claimed in claim 1 or 2 is characterized in that:
Be equivalent to 10 4The temperature of the glass melting liquid of the viscosity of dPas is below 1200 ℃.
4. as each described glass substrate for panel display device of claim 1～3, it is characterized in that:
At 30～380 ℃ thermal coefficient of expansions is 60～80 * 10 -7/ ℃.
5. as each described glass substrate for panel display device of claim 1～4, it is characterized in that:
In Quality Percentage, SiO 250～75%, Al 2O 30～20%, B 2O 30～20%, MgO 0～15%, CaO 0～15%, SrO 0～15%, BaO 0～15%, ZnO 0～5%, Li 2O 0～5%, Na 2O 0～15%, K 2O 0～15%, ZrO 20～10%.
6. as each described glass substrate for panel display device of claim 1～5, it is characterized in that:
In Quality Percentage, SiO 255～74%, Al 2O 30.5 B～4%, 2O 30～20%, MgO 1～15%, CaO 0～8%, SrO 1～15%, BaO 0～5%, MgO+CaO+SrO+BaO 15～27%, ZnO 0～5%, Li 2O 0～5%, Na 2O 0～8%, K 2O 2～12%, ZrO 20～7%.
7. as each described glass substrate for panel display device of claim 1～5, it is characterized in that:
In Quality Percentage, SiO 255～74%, Al 2O 3More than or equal to 0 less than 2.5%, B 2O 30～20%, MgO 1～15%, CaO 0～8%, SrO 1～15%, BaO0～5%, MgO+CaO+SrO+BaO 15～27%, ZnO 0～5%, Li 2O 0～5%, Na 2O 0～8%, K 2O 2～12%, ZrO 2Greater than 1% smaller or equal to 7%, ZrO 2Content is greater than Al 2O 3Content.
8. as each described glass substrate for panel display device of claim 1～7, it is characterized in that:
Use with glass substrate as plasma display system.
CNA2005100842871A 2004-07-15 2005-07-15 Glass substrate for panel display device Pending CN1722347A (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011113305A1 (en) * 2010-03-18 2011-09-22 Yang Dening Plate glass with colorful glaze layer and manufacuring process thereof
WO2011113302A1 (en) * 2010-03-18 2011-09-22 Yang Dening Plate glass and manufacturing process thereof
CN102414136A (en) * 2009-04-28 2012-04-11 旭硝子株式会社 Glass plate for substrate
CN102923953A (en) * 2012-11-20 2013-02-13 蚌埠玻璃工业设计研究院 Low dielectric constant glass plate and preparation method thereof
CN103420608A (en) * 2010-03-18 2013-12-04 杨德宁 Manufacturing technology of glass and glass product
RU2583393C2 (en) * 2011-03-15 2016-05-10 Дэнин ЯН Flat glass and method for production thereof and lcd display and solar photovoltaic devices

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102414136A (en) * 2009-04-28 2012-04-11 旭硝子株式会社 Glass plate for substrate
CN102414136B (en) * 2009-04-28 2015-05-06 旭硝子株式会社 Glass plate for substrate
WO2011113305A1 (en) * 2010-03-18 2011-09-22 Yang Dening Plate glass with colorful glaze layer and manufacuring process thereof
WO2011113302A1 (en) * 2010-03-18 2011-09-22 Yang Dening Plate glass and manufacturing process thereof
CN103420608A (en) * 2010-03-18 2013-12-04 杨德宁 Manufacturing technology of glass and glass product
US9108878B2 (en) 2010-03-18 2015-08-18 Dening Yang Plate glass and manufacturing process thereof
CN103420608B (en) * 2010-03-18 2016-12-28 杨德宁 The preparation technology of glass and the application of glass
RU2583393C2 (en) * 2011-03-15 2016-05-10 Дэнин ЯН Flat glass and method for production thereof and lcd display and solar photovoltaic devices
CN102923953A (en) * 2012-11-20 2013-02-13 蚌埠玻璃工业设计研究院 Low dielectric constant glass plate and preparation method thereof

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