CN1693322A - Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD - Google Patents
Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD Download PDFInfo
- Publication number
- CN1693322A CN1693322A CNA200510071269XA CN200510071269A CN1693322A CN 1693322 A CN1693322 A CN 1693322A CN A200510071269X A CNA200510071269X A CN A200510071269XA CN 200510071269 A CN200510071269 A CN 200510071269A CN 1693322 A CN1693322 A CN 1693322A
- Authority
- CN
- China
- Prior art keywords
- acid
- ester
- methyl
- tft
- copolymer resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/04—Polymerisation in solution
- C08F2/06—Organic solvent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F216/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F216/12—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F216/14—Monomers containing only one unsaturated aliphatic radical
- C08F216/1416—Monomers containing oxygen in addition to the ether oxygen, e.g. allyl glycidyl ether
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/32—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals
- C08F220/325—Esters containing oxygen in addition to the carboxy oxygen containing epoxy radicals containing glycidyl radical, e.g. glycidyl (meth)acrylate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/44—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins
- H01B3/447—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes vinyl resins; acrylic resins from acrylic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Liquid Crystal (AREA)
- Formation Of Insulating Films (AREA)
- Materials For Photolithography (AREA)
Abstract
The method for producing the acrylic copolymer resin for the interlayer insulating film of the TFT-LCD comprises a step for purifying a copolymer solution produced by polymerizing, in the presence of a solvent, (i) an unsaturated carboxylic acid, an unsaturated carboxylic anhydride or a mixture thereof, (ii) a styrenic monomer, (iii) an epoxy-based monomer, (iv) an isobornyl-based monomer, and (v) a dicyclopentadiene-based monomer. The acrylic copolymer resin for the interlayer insulating film of the TFT-LCD is produced by using the method and the interlayer insulating film of the TFT-LCD is obtained by applying the acrylic copolymer resin. The developing properties and the heat resistance of the film can be improved and the transmittance also can be improved by applying the acrylic copolymer resin produced by the above method to a positive interlayer insulating film for the TFT-LCD.
Description
Technical field
The present invention relates to Thin Film Transistor-LCD (be called for short TFT-LCD) with the manufacture method of interlayer organic insulating film with acrylic copolymer resin, so specifically relate to TFT-LCD that the interlayer organic insulating film that can be applied to TFT-LCD improves the video picture and the thermotolerance of film and improve transmitance with the interlayer organic insulating film with the manufacture method of acrylic copolymer resin, with the TFT-LCD of aforesaid method manufacturing with the interlayer organic insulating film with acrylic copolymer resin and the TFT-LCD interlayer organic insulating film of having used aforesaid propylene acid copolymer resin.
Background technology
In the past, the TFT-LCD that uses with the interlayer organic insulating film with acrylic copolymer resin owing to not having high thermostability, be not adopted as the process for purification of removing lower-molecular substance, thereby the problem that exists is, stability when speed in the time of not only can not guaranteeing to take a picture operation and coating characteristics and subsequent handling, and video picture, thermotolerance and transmitance are low.
In general, when acrylic copolymer resin did not have the thermostability of certain level, the hot-fluid moment that obtains after the coating also can produce sublimate thus sometimes when subsequent handlings such as high temperature sputter.Moreover, also there are the following problems: produce detrimentally affect because the above-mentioned sublimate that produces also can form the pattern of photo-resist sometimes, also can reduce the transmitance of organic insulating film self simultaneously sometimes; Because thermostability reduces, implement subsequent handling and can produce difficulty etc.
Refining is that a kind of lower-molecular substance etc. removed is so that acrylic copolymer resin has single method of disperseing (mono-disperse) molecular weight distribution of certain level.
In general, the synthetic acrylic copolymer resin is carried out classification so that it has single dispersing molecule amount distribution, can guarantee the speed of the photograph operation of same level, though can guarantee whole productivity thus, but for the situation that does not have the acrylic copolymer resin that single dispersing molecule amount distributes, the stability in the time of can not guaranteeing the speed of the photograph operation expected and coating characteristics and subsequent handling.Moreover, when use comprises the process for purification of classification step and does not remove low molecular weight substance, sometimes also can be created in soft baking and curing (curing) thus produce in a large amount of sublimate operations the problem such as aging that produces stink, causes equipping in the operation, and transmitance also can reduce sometimes when subsequent handlings such as tin indium oxide (ITO) sputter, exists to be difficult to stable maintenance equipment and to guarantee problem such as reliability.
Summary of the invention
In order to solve above-mentioned prior art problems, the purpose of this invention is to provide the TFT-LCD manufacture method of interlayer organic insulating film that the interlayer organic insulating film that is applicable to TFT-LCD can improve the video picture and the thermotolerance of film and can improve transmitance with acrylic copolymer resin.
It is superior and have TFT-LCD that single dispersing molecule amount distributes with the manufacture method of interlayer organic insulating film with acrylic copolymer resin that another purpose of the present invention provides thermostability.
Another purpose of the present invention provides and can improve TFT-LCD that TFT-LCD with the video picture of interlayer organic insulating film and thermotolerance, particularly can significantly improve transmitance with interlayer organic insulating film acrylic copolymer resin.
Another purpose of the present invention provides has used the TFT-LCD interlayer organic insulating film of above-mentioned interlayer organic insulating film with acrylic copolymer resin.
To achieve these goals, the invention provides TFT-LCD, use in the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, comprise the steps: at this TFT-LCD with the manufacture method of interlayer organic insulating film with acrylic copolymer resin
Step (a), the following component of polymerization under solvent:
I) 5 mass parts～35 mass parts unsaturated carboxylic acids, unsaturated carboxylic acid anhydrides or their mixture,
Ii) 5 mass parts～40 mass parts styrene monomers,
Iii) 5 mass parts～40 mass parts epoxies monomers,
Iv) 5 mass parts～30 mass parts iso-borneol base class monomers,
V) 5 mass parts～40 mass parts dicyclopentadiene class monomers and
Vi) 0.01 mass parts～15 mass parts initiators;
Step (b) adds 0.001 mass parts～1 mass parts stopper and finishes polymerization in the reactant of above-mentioned steps (a), thereby makes copolymer solution; And
Step (c) is made with extra care the copolymer solution of making in above-mentioned steps (b).
And, the invention provides with the TFT-LCD of aforesaid method manufacturing with interlayer organic insulating film acrylic copolymer resin.
And then, the invention provides and used the TFT-LCD interlayer organic insulating film of above-mentioned interlayer organic insulating film with acrylic copolymer resin.
Below explain the present invention.
TFT-LCD of the present invention is characterized in that with interlayer organic insulating film acrylic copolymer resin, makes as follows:
Step (a), the following component of polymerization under solvent:
I) 5 mass parts～35 mass parts unsaturated carboxylic acids, unsaturated carboxylic acid anhydrides or their mixture,
Ii) 5 mass parts～40 mass parts styrene monomers,
Iii) 5 mass parts～40 mass parts epoxies monomers,
Iv) 5 mass parts～30 mass parts iso-borneol base class monomers,
V) 5 mass parts～40 mass parts dicyclopentadiene class monomers and
Vi) 0.01 mass parts～15 mass parts initiators;
Step (b) adds 0.001 mass parts～1 mass parts stopper and finishes polymerization in the reactant of above-mentioned steps (a), thereby makes copolymer solution; And
Step (c) is made with extra care the copolymer solution of making in above-mentioned steps (b).
I in the above-mentioned steps of using among the present invention (a)) unsaturated carboxylic acid, unsaturated carboxylic acid anhydrides or their mixture can use unsaturated monocarboxylics such as vinylformic acid, methacrylic acid; Unsaturated dicarboxylic acids such as toxilic acid, fumaric acid, citraconic acid, methylfumaric acid, methylene-succinic acid; The perhaps acid anhydrides of these unsaturated dicarboxylic acids etc., they can use separately or mix more than 2 kinds or 2 kinds and use.Particularly, more preferably use vinylformic acid, methacrylic acid or maleic anhydride in copolyreaction with to aspect the solvability of the alkaline aqueous solution of image-developing liquor.
With respect to the whole monomers of 100 weight parts, preferably contain 5 mass parts～described unsaturated carboxylic acid of 35 weight parts, unsaturated carboxylic acid anhydrides or their mixture.Its content is in above-mentioned scope the time, in copolyreaction with to more preferred aspect the solvability of alkaline aqueous solution.
Ii) styrene monomer in the above-mentioned steps of using among the present invention (a) preferably use can and i) the styrene monomer of unsaturated carboxylic acid, unsaturated carboxylic acid anhydrides or their mixture copolymerization, can use vinylbenzene, alpha-methyl styrene, a vinyl toluene, p-methylstyrene, Vinyl toluene or p-methylstyrene etc. specifically.
With respect to the whole monomers of 100 weight parts, preferably contain 5 mass parts～described styrene monomer of 40 weight parts.Its content is in above-mentioned scope the time, and is more preferred aspect copolyreaction.
Iii) epoxies monomer in the above-mentioned steps of using among the present invention (a) preferably use can and i) the epoxies monomer of unsaturated carboxylic acid, unsaturated carboxylic acid anhydrides or their mixture copolymerization.
Specifically, described epoxies monomer can use glycidyl acrylate, glycidyl methacrylate, vinylformic acid α-ethyl glycidyl ester, vinylformic acid α-n-propyl glycidyl ester, vinylformic acid α-normal-butyl glycidyl ester, senecioate-ethyl glycidyl ester, methacrylic acid-β-ethyl glycidyl ester, vinylformic acid-3,4-epoxy butyl ester, methacrylic acid-3,4-epoxy butyl ester, methacrylic acid-β-ethyl glycidyl ester, methacrylic acid-6,7-epoxy heptyl ester, adjacent vinyl benzyl glycidyl ether, between vinyl benzyl glycidyl ether or to the vinyl benzyl glycidyl ether etc., they can use separately or mix more than 2 kinds or 2 kinds and use.
In the whole monomers of 100 weight parts, preferably contain the described epoxies monomer of 5 mass parts～40 weight parts.Its content is in above-mentioned scope the time, and is more preferred aspect cohesive force that improves copolyreaction and gained pattern and thermotolerance.
In the present invention the iv) iso-borneol base class monomer in the above-mentioned steps of Shi Yonging (a) preferably use can with the iso-borneol base class monomer of unsaturated carboxylic acid, unsaturated carboxylic acid anhydrides or their mixture copolymerization.
Described iso-borneol base class monomer can use isobornyl acrylate, isobornyl methacrylate, cyclohexyl acrylate, vinylformic acid 2-methyl cyclohexane ester, vinylformic acid two rings penta 2-ethoxyethyl acetate, phenyl methacrylate, phenyl acrylate, benzyl acrylate or methacrylic acid 2-hydroxyl ethyl ester etc., and they can use separately or mix more than 2 kinds or 2 kinds and use.
In the whole monomers of 100 weight parts, preferably contain the 5 mass parts～above-mentioned iso-borneol base class of 30 weight parts monomer.Its content is in above-mentioned scope the time, improve aspect the thermotolerance more preferred.
V) dicyclopentadiene class monomer in the above-mentioned steps of using among the present invention (a) preferably use can with the dicyclopentadiene class monomer of unsaturated carboxylic acid, unsaturated carboxylic acid anhydrides or their mixture copolymerization.
Described dicyclopentadiene class monomer also can use vinylformic acid two cyclopentenes 2-ethoxyethyl acetates, vinylformic acid two ring pentyl esters (ヅ サ イ Network ロ ペ ソ ニ Le ア Network リ レ one ト), three-2-propylene oxygen ethyl isocyanuric acid ester, methacrylic acid two ring pentyl ester, pentamethyl-PVC Off ア リ ジ Le methacrylic ester or oxyethane dihydroxyphenyl propane methacrylic esters etc.
In the whole monomers of 100 weight parts, preferably contain the 5 mass parts～described dicyclopentadiene class of 40 weight parts monomer.Its content is in above-mentioned scope the time, improve aspect the thermotolerance more preferred.
Vi) initiator in the above-mentioned steps of using among the present invention (a) can use normally used superoxide or azo compound, particularly more preferably uses azo compound.
Specifically, can use 2,2 '-azo two (2-amidine propane) dihydrochloride, 2,2 '-azo two (2-methylbutyronitrile), 2,2 '-Diisopropyl azodicarboxylate, 2,2 '-azo two (2, the 4-methyl pentane nitrile), 2,2 '-azo two (4-methoxyl group-2, the 4-methyl pentane nitrile), 4,4 '-azo two (4-cyanopentanoic acid) or dimethyl-2,2 '-azo-bis-isobutyrate etc., they can use separately or mix more than 2 kinds or 2 kinds and use.
With respect to the whole monomers of 100 weight parts, preferably contain 0.01 mass parts～described initiator of 15 weight parts.When it contains quantity not sufficient 0.01 weight part, the problem that exists molecular weight to increase; When surpassing 15 weight parts, the problem of existence is, molecular weight is low excessively, and sensitivity is reduced, and perhaps the shape of pattern can reduce and video picture and residual film ratio are reduced.
And then, can in the reactant of above-mentioned steps of the present invention (a), append as required and contain vii) chain-transfer agent.
Vi) initiator in described chain-transfer agent and the step (a) uses simultaneously, the effect of the molecular weight of performance telomerized polymer, specifically, can use n-dodecyl mercaptan, uncle's lauryl mercaptan, methyl mercaptan, methyl mercaptan sodium, ethanethio, uncle's nonyl mercaptan, n-octyl mercaptan, tert-butyl mercaptan, Octadecane base mercaptan, n-tetradecane base mercaptan, positive decyl mercaptan, benzyne mercaptan, n-hexyl mercaptan, tert-butyl mercaptan, cyclohexyl mercaptan or isopropyl mercaptan etc.
Can regulate the content of above-mentioned chain-transfer agent as required, particularly preferably contain 0.1 mass parts～10 weight part chain-transfer agents with respect to the whole monomers of 100 weight parts.Its content is in above-mentioned scope the time, owing to can make low-molecular-weight polymkeric substance, thus more preferred.
Be used for aforesaid monomer polymerization is become the solvent of acrylic copolymer, can use methyl alcohol, tetrahydrofuran (THF), ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl Cellosolve acetic ester, ethyl Cellosolve acetic ester, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol methyl ether, dihydroxypropane single-ether, propylene glycol monomethyl ether, propylene glycol propyl ether, propylene glycol propyl ether, the propylene glycol butyl ether, propylene glycol methyl ether acetate, the propylene-glycol ethyl ether acetic ester, the propylene glycol propyl ether acetic ester, propylene glycol butyl ether acetic ester, propylene glycol monomethyl ether acetate, the propylene-glycol ethyl ether propionic ester, the propylene glycol propyl ether propionic ester, propylene glycol butyl ether propionic ester, methyl-3-methoxy propyl acid esters, toluene, dimethylbenzene, methylethylketone, pimelinketone, 4-hydroxy-4-methyl-2 pentanone, methyl acetate, ethyl acetate, propyl acetate, butylacetate, the 2 hydroxy propanoic acid ethyl ester, 2-hydroxy-2-methyl methyl propionate, 2-hydroxy-2-methyl ethyl propionate, hydroxy methyl acetate, hydroxyl ethyl acetate, the oxyacetic acid butyl ester, methyl lactate, ethyl lactate, propyl lactate, n-Butyl lactate, the 3-hydroxy methyl propionate, 3-hydroxy-propionic acid ethyl ester, 3-hydroxy-propionic acid propyl ester, 3-hydroxy-propionic acid butyl ester, 2-hydroxy-3-methyl methyl-butyrate, methoxy menthyl acetate, the methoxyacetic acid ethyl ester, the methoxyacetic acid propyl ester, the methoxyacetic acid butyl ester, ethoxy acetate, ethoxy ethyl acetate, the ethoxyacetic acid propyl ester, the ethoxyacetic acid butyl ester, the propoxy-methyl acetate, the propoxy-ethyl acetate, the propoxy-propyl acetate, the propoxy-butylacetate, the butoxy acetic acid methyl esters, the butoxy acetic acid ethyl ester, the butoxy acetic acid propyl ester, the butoxy acetic acid butyl ester, 2-methoxypropionic acid methyl esters, 2-methoxy propyl acetoacetic ester, 2-methoxy propyl propyl propionate, 2-methoxy propyl acid butyl ester, 2-ethoxy-propionic acid methyl esters, the 2-ethoxyl ethyl propionate, 2-ethoxy-c propyl propionate, 2-ethoxy-c acid butyl ester, 2-butoxy methyl propionate, 2-butoxy ethyl propionate, 2-butoxy propyl propionate, 2-butoxy butyl propionate, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-methoxy propyl propyl propionate, 3-methoxy propyl acid butyl ester, 3-ethoxy-propionic acid methyl esters, the 3-ethoxyl ethyl propionate, 3-ethoxy-c propyl propionate, 3-ethoxy-c acid butyl ester, 3-propoxy-methyl propionate, 3-propoxy-ethyl propionate, 3-propoxy-propyl propionate, 3-propoxy-butyl propionate, 3-butoxy methyl propionate, 3-butoxy ethyl propionate, the ethers that 3-butoxy propyl propionate or 3-butoxy butyl propionate etc. are such etc., above-claimed cpd can use separately or mix more than 2 kinds or 2 kinds and use.
Though the content of above-mentioned solvent is not particularly limited, preferably contain 100 mass parts～1000 weight parts with respect to the whole monomers of 100 weight parts.
The fluid composition that forms with above-mentioned such composition carries out solution polymerization, adds stopper and finish polymerization when polymerization proceeds to a certain degree, thereby make copolymer solution.
Stopper in the above-mentioned steps (b) has the effect of the discolouration, thermostability and the keeping stability that improve acrylic copolymer resin, can use lactone, phosphite (phosphite) or the phosphinate (phosphonite) etc. of no phenol specifically.
With respect to the whole monomers of 100 weight parts, preferably contain 0.001 weight part～described stopper of 1 weight part.Its content is in above-mentioned scope the time, and is more preferred aspect the discolouration that improves acrylic copolymer resin, thermostability and keeping stability.
Polymerization temperature is preferably 40 ℃～80 ℃ when carrying out above-mentioned solution polymerization, more preferably 45 ℃～75 ℃.Particularly, more preferably be higher than the temperature enforcement polymerization of 10 hours half life temperatures of initiator azo compound at described polymerization temperature in order to reduce the content of unreacted monomer in final copolymer and to realize high polymerization yield.
When carrying out above-mentioned solution polymerization polymerization time be preferably 4 hours～48 hours, more preferably implemented 12 hours～36 hours.
And then speed of response is preferably 100rpm～500rpm during above-mentioned solution polymerization, more preferably 150rpm～400rpm.
Carry out solution polymerization and the acrylic copolymer solution preferred polymeric transformation efficiency made is 45%～80% with above-mentioned such condition.
Polymeric acrylic copolymer solution is by making final acrylic copolymer resin as mentioned above.Can remove the unreacted monomer that remains in the acrylic copolymer solution, polymerization starter etc. by described purification step, be important aspect the copolymer resin of making single dispersing molecule amount particularly.
Above-mentioned can be used in refining make its evaporable method under the high vacuum, with the method for organic oxygen compound class hyperergy radical initiator reaction or in a large amount of insoluble solvents, drip copolymer solution and separate out sedimentary method, remove in above-mentioned steps (a) various additives such as unreacted monomer, organic solvent in the acrylic copolymer solution of making, particularly preferably use dropping copolymer solution in a large amount of insoluble solvents and separate out sedimentary method.
Above-mentioned dropping copolymer solution and separate out sedimentary method and can followingly implement drips copolymer solution in insoluble solvent, separate out polymkeric substance after, carry out filtering separation, can append the step that is dissolved in the solvent as required.
Above-mentioned insoluble solvent can use heptane, hexane, methyl alcohol, water or their mixture etc.
Above-mentioned solvent can use propionic ester, methyl alcohol, propylene glycol monoethyl ether acetate, dihydroxypropane single-ether propionic ester, butylacetate, ethyl lactate, Trivalin SF, propylene glycol methyl ethyl ether or their mixture etc.
And, the invention provides the TFT-LCD that makes with aforesaid method interlayer organic insulating film acrylic copolymer resin, aforesaid propylene acid copolymer resin has single dispersing molecule amount and distributes, preferable weight-average molecular weight is 6000～12000, and the ratio of preferable weight-average molecular weight and number-average molecular weight is 1.5～2.5.Moreover, the polymer areas (polymer area) of preferred aforesaid propylene acid copolymer resin is 40%～70%, and preferred solid component content is 25.0%～35.0%.
And then the second-order transition temperature (Tg) of aforesaid propylene acid copolymer resin is preferably 60 ℃～140 ℃, more preferably 80 ℃～130 ℃.During 60 ℃ of above-mentioned second-order transition temperature less thaies, exist the TFT-LCD that used above-mentioned copolymer resin with problems such as the thermotolerance of interlayer organic insulating film can reduce significantly; When surpassing 140 ℃, exist TFT-LCD with problems such as the video picture of interlayer dielectric can reduce.
In addition, the invention provides and used the TFT-LCD interlayer organic insulating film of above-mentioned interlayer organic insulating film with acrylic copolymer resin, the above-mentioned TFT-LCD video picture and the superior for heat resistance of interlayer organic insulating film, particularly transmitance is superior.
Embodiment
Below preferred embodiment is provided in order to understand the present invention, but following embodiment only illustration the present invention, scope of the present invention is not limited to following embodiment.
Embodiment
Embodiment 1
In having the 1L container of reactor and condenser, drop into the mixing solutions of 400 weight part tetrahydrofuran (THF)s, 35 weight part methacrylic acids, 40 parts by weight of styrene, 15 weight part glycidyl methacrylate, 5 weight part isobornyl methacrylates and 5 parts by weight of acrylic acid, two cyclopentenes 2-ethoxyethyl acetates.In mixing vessel with behind the above-mentioned mixing solutions of 400rpm thorough mixing, to wherein adding 15 weight parts as 2 of initiator, 2 '-azo two (2, the 4-methyl pentane nitrile).The container that will fill with above-mentioned mixing solutions lentamente is warmed up to 58 ℃, keeps this temperature 28 hours to make copolymer solution, adds 0.5 weight part then and finishes polymerization as the phosphite of stopper.
Subsequently, Dropwise 5 000 weight part hexane is separated out precipitation in above-mentioned copolymer solution, after the filtering separation to wherein adding 100 weight part propionic esters and be heated to 30 ℃, thereby make acrylic copolymer resin.
Embodiment 2～11
Except in the foregoing description 1, use composition identical and composition with following table 1 than and make temperature of reaction different with the reaction times, implement to make copolymer solution, then to make acrylic copolymer resin with the foregoing description 1 same method with the foregoing description 1 identical method.
Table 1
| Project | Embodiment | ||||||||||
| ????1 | ????2 | ????3 | ????4 | ????5 | ????6 | ????7 | ????8 | ????9 | ????10 | ???11 | |
| Tetrahydrofuran (THF) | ??400 | ??400 | ??400 | ??400 | ??400 | ??400 | ??400 | ??400 | ??400 | ??400 | ??400 |
| Methacrylic acid | ??35 | ??35 | ??30 | ??25 | ??15 | ??15 | ??25 | ??25 | ??25 | ??25 | ??25 |
| Vinylbenzene | ??40 | ??30 | ??30 | ??20 | ??5 | ??5 | ??10 | ??10 | ??10 | ??10 | ??10 |
| Glycidyl methacrylate | ??15 | ??20 | ??20 | ??25 | ??20 | ??20 | ??25 | ??25 | ??25 | ??25 | ??25 |
| Isobornyl methacrylate | ??5 | ??10 | ??10 | ??15 | ??30 | ??20 | ??20 | ??20 | ??20 | ??20 | ??20 |
| Vinylformic acid two cyclopentenes oxygen base ethyl esters | ??5 | ??5 | ??10 | ??15 | ??30 | ??20 | ??20 | ??20 | ??20 | ??20 | ??20 |
| 2,2 '-azo two (2, the 4-methyl pentane nitrile) | ??15 | ??10 | ??10 | ??10 | ??5 | ??8 | ??5 | ??1 | ??3 | ??3 | ??1 |
| Lauryl mercaptan | ??- | ??- | ??- | ??- | ??- | ??- | ??- | ??10 | ??3 | ??2 | ??10 |
| Reaction times (hr) | ??28 | ??28 | ??28 | ??24 | ??20 | ??12 | ??28 | ??28 | ??28 | ??28 | ??28 |
| Temperature of reaction (℃) | ??58 | ??58 | ??58 | ??58 | ??58 | ??58 | ??58 | ??58 | ??58 | ??50 | ??45 |
In the foregoing description 1～11, utilize gel permeation chromatography (GPC, standard material: polystyrene) measure the content (TS) of ratio (Mw/Mn), the zone of convergency and the solids component of weight-average molecular weight (Mw), weight-average molecular weight and number-average molecular weight at the acrylic copolymer resin of making, it the results are shown in the table 2.
Table 2
| Project | Embodiment | ||||||||||
| ????1 | ????2 | ????3 | ????4 | ????5 | ????6 | ????7 | ????8 | ????9 | ????10 | ???11 | |
| Mw | ?5,500 | ?7,600 | ?7,340 | ?7,100 | ?9,200 | ?8,400 | ?7,200 | ?6,950 | ?8,100 | ?9,500 | ?6,600 |
| Mw/Mn | ?1.68 | ?1.71 | ?1.75 | ?1.81 | ?2.14 | ?2.45 | ?1.82 | ?1.86 | ?1.99 | ?2.23 | ?2.05 |
| The zone of convergency (%) | ?66 | ?64 | ?63 | ?59 | ?53 | ?44 | ?55 | ?56 | ?51 | ?49 | ?52 |
| TS(％) | ?34.4 | ?33.2 | ?33.1 | ?32.6 | ?30.3 | ?28.2 | ?30.8 | ?31.2 | ?30.1 | ?29.7 | ?30.3 |
Can confirm by above-mentioned table 2, the acrylic copolymer resin of making according to the present invention and in embodiment 1～11, its weight-average molecular weight is in 6000～12000 scope, the ratio of weight-average molecular weight and number-average molecular weight is 1.5～2.5, the zone of convergency is 40%～70%, and solid component content is 25.0～35.0 scope.
And then the acrylic copolymer resin that will make in the foregoing description 1～11 by method of spin coating is coated on the substrate surface, bakes in advance to remove in 1 minute at 100 ℃ and desolvates, thereby form coated film.
To the above-mentioned film irradiation visible rays that obtains, ultraviolet ray etc., form pattern with the image-developing liquor video picture.
Light such as patterned illumination ultraviolet ray to above-mentioned formation, and with baking oven 250 ℃ of heat treated 30 minutes, obtain final pattern film, measure video picture, transmitance and the thermotolerance of pattern film then with following method, will the results are shown in the table 3 based on following metewand.
1) video picture
In order to measure the coating homogeneity of the film that obtains after the video picture as mentioned above, utilize Elipsomet to measure Flatness.At this moment, Flatness was expressed as at zero, 95%～90% o'clock above 95% o'clock and is expressed as △, be expressed as during less than 90% *.
2) transmitance
In order to measure transmitance, on glass substrate, form pattern with aforesaid method after the formation film, utilize ultraviolet-visible pectrophotometer to measure transmitance then with 400nm.At this moment, transmitance was expressed as at zero, 95%～90% o'clock above 95% o'clock and is expressed as △, be expressed as during less than 90% *.
3) thermotolerance
Measure the upper and lower and left and right width of the pattern film of above-mentioned formation.At this moment, velocity of variation separately is that 0～20% o'clock of the preceding benchmark of middle roasting (midbake) is expressed as at zero, 20%～40% o'clock and is expressed as △, surpass at 40% o'clock to be expressed as *.
Table 3
| Project | Embodiment | ||||||||||
| ????1 | ????2 | ????3 | ????4 | ????5 | ????6 | ????7 | ????8 | ????9 | ????10 | ????11 | |
| Video picture | ????△ | ????△ | ????○ | ????○ | ????○ | ????○ | ????○ | ????○ | ????○ | ????○ | ????○ |
| Transmitance | ????○ | ????△ | ????△ | ????○ | ????△ | ????△ | ????○ | ????○ | ????○ | ????○ | ????○ |
| Thermotolerance | ????△ | ????○ | ????○ | ????△ | ????○ | ????○ | ????△ | ????△ | ????△ | ????△ | ????△ |
Can confirm by above-mentioned table 3, use the acrylic copolymer resin of embodiment 1～11 of manufacturing of the present invention and the pattern film that obtains, its video picture, transmitance and superior for heat resistance.
The invention effect
TFT-LCD of the present invention uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, can make the video picture and the thermotolerance that can not only be applied to TFT-LCD positive electricity type interlayer organic insulating film raising film and improve transmitance, and its thermostability is superior and have TFT-LCD that single dispersing molecule amount distributes with interlayer organic insulating film acrylic copolymer resin, moreover, the TFT-LCD that has used aforesaid propylene acid copolymer resin has superior video picture and thermotolerance and transmitance with the interlayer organic insulating film.
Claims (18)
1, a kind of TFT-LCD uses in the manufacture method of acrylic copolymer resin with the interlayer organic insulating film at this TFT-LCD with the manufacture method of interlayer organic insulating film with acrylic copolymer resin, comprises the steps:
Step (a), the following component of polymerization under solvent:
I) 5 mass parts～35 mass parts unsaturated carboxylic acids, unsaturated carboxylic acid anhydrides or their mixture,
Ii) 5 mass parts～40 mass parts styrene monomers,
Iii) 5 mass parts～40 mass parts epoxies monomers,
Iv) 5 mass parts～30 mass parts iso-borneol base class monomers,
V) 5 mass parts～40 mass parts dicyclopentadiene class monomers and
Vi) 0.01 mass parts～15 mass parts initiators;
Step (b) adds 0.001 mass parts～1 mass parts stopper and finishes polymerization in the reactant of described step (a), thereby makes copolymer solution; And
Step (c) is made with extra care the copolymer solution of making in described step (b).
2, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that the i in the described step (a)) unsaturated carboxylic acid, unsaturated carboxylic acid anhydrides or their mixture be to be selected from a kind of in the group of being made up of the acid anhydrides of vinylformic acid, methacrylic acid, toxilic acid, fumaric acid, citraconic acid, middle furancarboxylic acid, methylene-succinic acid and these unsaturated dicarboxylic acids or more than one.
3, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that the ii) styrene monomer in the described step (a) is to be selected from a kind of in the group of being made up of vinylbenzene, alpha-methyl styrene, a vinyl toluene, p-methylstyrene, Vinyl toluene and p-methylstyrene or more than one.
4, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that, iii) epoxies monomer in the described step (a) is for being selected from by glycidyl acrylate, glycidyl methacrylate, vinylformic acid α-ethyl glycidyl ester, vinylformic acid α-n-propyl glycidyl ester, vinylformic acid α-normal-butyl glycidyl ester, senecioate-ethyl glycidyl ester, methacrylic acid-β-ethyl glycidyl ester, vinylformic acid-3,4-epoxy butyl ester, methacrylic acid-3,4-epoxy butyl ester, methacrylic acid-β-ethyl glycidyl ester, methacrylic acid-6,7-epoxy heptyl ester, adjacent vinyl benzyl glycidyl ether, between a kind of in vinyl benzyl glycidyl ether or the group that the vinyl benzyl glycidyl ether is formed or more than one.
5, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that the iv) iso-borneol base class monomer in the described step (a) is to be selected from a kind of in the group of being made up of isobornyl acrylate, isobornyl methacrylate, cyclohexyl acrylate, vinylformic acid 2-methyl cyclohexane ester, vinylformic acid two cyclopentyloxy ethyl esters, phenyl methacrylate, phenyl acrylate, benzyl acrylate or methacrylic acid 2-hydroxyl ethyl ester or more than one.
6, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that the v) dicyclopentadiene class monomer in the described step (a) is to be selected from a kind of in the group of being made up of vinylformic acid two cyclopentenes oxygen base ethyl esters, vinylformic acid two ring pentyl esters, three-2-propenyloxy group ethyl isocyanuric acid ester, methacrylic acid two ring pentyl esters, pentamethyl-ピ Off ァ リ ジ Le methacrylic acid ester or oxyethane dihydroxyphenyl propane methacrylic ester or more than one.
7, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that, vi) initiator in the described step (a) is for being selected from by 2,2 '-azo two (2-amidine propane) dihydrochloride, 2,2 '-azo two (2-methylbutyronitrile), 2,2 '-Diisopropyl azodicarboxylate, 2,2 '-azo two (2, the 4-methyl pentane nitrile), 2,2 '-azo two (4-methoxyl group-2, the 4-methyl pentane nitrile), 4, a kind of in the group that 4 '-azo two (4-cyanopentanoic acid) or dimethyl-2,2 '-azo-bis-iso-butyl are formed or more than one.
8, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that, append in the reactant of described step (a) that to contain with respect to the whole monomers of 100 weight parts be the vii) chain-transfer agent of 0.1 mass parts～10 weight parts, described vii) chain-transfer agent is for being selected from by n-dodecyl mercaptan, uncle's lauryl mercaptan, methyl mercaptan, methyl mercaptan sodium, ethanethio, uncle's nonyl mercaptan, n-octyl mercaptan, tert-butyl mercaptan, Octadecane base mercaptan, n-tetradecane base mercaptan, positive decyl mercaptan, benzyne mercaptan, n-hexyl mercaptan, tert-butyl mercaptan, a kind of in the group that cyclohexyl mercaptan or isopropyl mercaptan are formed or more than one.
9, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that, contain 100～1000 parts by weight solvent with respect to the whole monomers of 100 weight parts in the reactant of described step (a), described solvent is for being selected from by methyl alcohol, tetrahydrofuran (THF), ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl Cellosolve acetic ester, ethyl Cellosolve acetic ester, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol methyl ether, dihydroxypropane single-ether, propylene glycol monomethyl ether, propylene glycol propyl ether, propylene glycol propyl ether, the propylene glycol butyl ether, propylene glycol methyl ether acetate, the propylene-glycol ethyl ether acetic ester, the propylene glycol propyl ether acetic ester, propylene glycol butyl ether acetic ester, propylene glycol monomethyl ether acetate, the propylene-glycol ethyl ether propionic ester, the propylene glycol propyl ether propionic ester, propylene glycol butyl ether propionic ester, methyl-3-methoxy propyl acid esters, toluene, dimethylbenzene, methylethylketone, pimelinketone, 4-hydroxy-4-methyl-2 pentanone, methyl acetate, ethyl acetate, propyl acetate, butylacetate, the 2 hydroxy propanoic acid ethyl ester, 2-hydroxy-2-methyl methyl propionate, 2-hydroxy-2-methyl ethyl propionate, hydroxy methyl acetate, hydroxyl ethyl acetate, the oxyacetic acid butyl ester, methyl lactate, ethyl lactate, propyl lactate, n-Butyl lactate, the 3-hydroxy methyl propionate, 3-hydroxy-propionic acid ethyl ester, 3-hydroxy-propionic acid propyl ester, 3-hydroxy-propionic acid butyl ester, 2-hydroxy-3-methyl methyl-butyrate, methoxy menthyl acetate, the methoxyacetic acid ethyl ester, the methoxyacetic acid propyl ester, the methoxyacetic acid butyl ester, ethoxy acetate, ethoxy ethyl acetate, the ethoxyacetic acid propyl ester, the ethoxyacetic acid butyl ester, the propoxy-methyl acetate, the propoxy-ethyl acetate, the propoxy-propyl acetate, the propoxy-butylacetate, the butoxy acetic acid methyl esters, the butoxy acetic acid ethyl ester, the butoxy acetic acid propyl ester, the butoxy acetic acid butyl ester, 2-methoxypropionic acid methyl esters, 2-methoxy propyl acetoacetic ester, 2-methoxy propyl propyl propionate, 2-methoxy propyl acid butyl ester, 2-ethoxy-propionic acid methyl esters, the 2-ethoxyl ethyl propionate, 2-ethoxy-c propyl propionate, 2-ethoxy-c acid butyl ester, 2-butoxy methyl propionate, 2-butoxy ethyl propionate, 2-butoxy propyl propionate, 2-butoxy butyl propionate, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-methoxy propyl propyl propionate, 3-methoxy propyl acid butyl ester, 3-ethoxy-propionic acid methyl esters, the 3-ethoxyl ethyl propionate, 3-ethoxy-c propyl propionate, 3-ethoxy-c acid butyl ester, 3-propoxy-methyl propionate, 3-propoxy-ethyl propionate, 3-propoxy-propyl propionate, 3-propoxy-butyl propionate, 3-butoxy methyl propionate, 3-butoxy ethyl propionate, a kind of in the group that 3-butoxy propyl propionate or 3-butoxy butyl propionate are formed or more than one.
10, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that the polymerization of described step (a) is carried out solution polymerization with 40 ℃～80 ℃ temperature, 4 hours～48 hours, the speed of 100rpm～500rpm.
11, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that the stopper in the described step (b) is to be selected from a kind of in the group of being made up of lactone, phosphite or the phosphinate of non-phenol or more than one.
12, TFT-LCD according to claim 1 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that, described step (c) refining by drip the copolymer solution of manufacturing in described step (b) to insoluble solvent separated out and carried out filtering separation again behind the polymkeric substance and implement.
13, TFT-LCD according to claim 12 is characterized in that with the manufacture method of interlayer organic insulating film with acrylic copolymer resin, appends enforcement described acrylic copolymer resin is dissolved in step in the solvent.
14, TFT-LCD according to claim 12 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that described insoluble solvent is to be selected from a kind of in the group of being made up of heptane, hexane, first alcohol and water or more than one.
15, TFT-LCD according to claim 13 uses the manufacture method of acrylic copolymer resin with the interlayer organic insulating film, it is characterized in that described solvent is to be selected from a kind of in the group of being made up of propionic ester, methyl alcohol, propylene glycol monoethyl ether acetate, dihydroxypropane single-ether propionic ester, butylacetate, ethyl lactate, Trivalin SF and propylene glycol methyl ethyl ether or more than one.
16, with the TFT-LCD of the described method manufacturing of claim 1 with interlayer organic insulating film acrylic copolymer resin.
17, TFT-LCD according to claim 16 interlayer organic insulating film acrylic copolymer resin, it is characterized in that the weight-average molecular weight of described acrylic copolymer resin is 6000～12000, the ratio of weight-average molecular weight and number-average molecular weight is 1.5～2.5.
18, used the described TFT-LCD of the claim 16 TFT-LCD interlayer organic insulating film of interlayer organic insulating film with acrylic copolymer resin.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR10-2004-0031832 | 2004-05-06 | ||
| KR1020040031832 | 2004-05-06 | ||
| KR20040031832 | 2004-05-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1693322A true CN1693322A (en) | 2005-11-09 |
| CN100429248C CN100429248C (en) | 2008-10-29 |
Family
ID=35352465
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200510071269XA Expired - Fee Related CN100429248C (en) | 2004-05-06 | 2005-05-08 | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5062504B2 (en) |
| KR (1) | KR101215426B1 (en) |
| CN (1) | CN100429248C (en) |
| TW (1) | TWI386714B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7879961B2 (en) | 2006-02-03 | 2011-02-01 | Samsung Electronics Co., Ltd. | Resin composition for organic insulating layer, method of manufacturing resin composition, and display panel including resin composition |
| CN101256356B (en) * | 2006-12-28 | 2012-06-20 | Jsr株式会社 | Radiation sensitive composition, color filter, and liquid crystal display device |
| WO2019084895A1 (en) * | 2017-11-03 | 2019-05-09 | Dow Global Technologies Llc | Solvents for agricultural applications and pesticide formulations |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101482561B1 (en) * | 2008-04-25 | 2015-01-16 | 주식회사 동진쎄미켐 | A producing method for acryl polymer |
| KR101317601B1 (en) * | 2008-08-29 | 2013-10-11 | 주식회사 엘지화학 | Acrylic based resin and photosensitive composition comprising the same |
| KR20100099048A (en) * | 2009-03-02 | 2010-09-10 | 주식회사 동진쎄미켐 | Photosensitive resin composition |
| KR101969151B1 (en) * | 2017-11-17 | 2019-04-16 | 에스케이씨하이테크앤마케팅(주) | Pigment dispersion and colored photosensitive resin composition comprising same |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10316721A (en) * | 1997-05-15 | 1998-12-02 | Nippon Steel Chem Co Ltd | Alkali-soluble resin and image-forming material using the same |
| JP2000327875A (en) * | 1999-05-21 | 2000-11-28 | Jsr Corp | Radiation-sensitive resin composition for spacer united with color filter protection film or tft interlayer insulation film |
| JP2000347397A (en) * | 1999-06-04 | 2000-12-15 | Jsr Corp | Radiation sensitive resin composition and its use for interlayer dielectric |
| JP3743490B2 (en) * | 2000-02-16 | 2006-02-08 | 信越化学工業株式会社 | Thermosetting photosensitive material |
| JP2001254002A (en) * | 2000-03-10 | 2001-09-18 | Nippon Kayaku Co Ltd | Resin composition, its film and its cured product |
| JP3965868B2 (en) * | 2000-06-12 | 2007-08-29 | Ｊｓｒ株式会社 | Interlayer insulation film and microlens |
| JP4524944B2 (en) * | 2001-03-28 | 2010-08-18 | Ｊｓｒ株式会社 | Radiation sensitive resin composition, its use for forming interlayer insulating film and microlens, and interlayer insulating film and microlens |
| TWI266146B (en) * | 2001-03-31 | 2006-11-11 | Samyang Ems Co Ltd | Resist composition for column spacer of liquid crystal display element |
| KR100784672B1 (en) * | 2001-08-20 | 2007-12-12 | 주식회사 동진쎄미켐 | Photosensitive resin composition |
| KR100809544B1 (en) * | 2001-10-24 | 2008-03-04 | 주식회사 동진쎄미켐 | Photosensitive resin composition comprising quinonediazide sulfate ester compound |
| JP2003307847A (en) * | 2002-04-16 | 2003-10-31 | Jsr Corp | Composition for forming interlayer insulating film by ink jet system |
-
2005
- 2005-04-28 TW TW094113683A patent/TWI386714B/en not_active IP Right Cessation
- 2005-05-02 JP JP2005134172A patent/JP5062504B2/en active Active
- 2005-05-06 KR KR1020050037981A patent/KR101215426B1/en active IP Right Grant
- 2005-05-08 CN CNB200510071269XA patent/CN100429248C/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7879961B2 (en) | 2006-02-03 | 2011-02-01 | Samsung Electronics Co., Ltd. | Resin composition for organic insulating layer, method of manufacturing resin composition, and display panel including resin composition |
| CN101058618B (en) * | 2006-02-03 | 2011-10-26 | 三星电子株式会社 | Resin composition, method of manufacturing the same, and display panel including the same |
| CN101256356B (en) * | 2006-12-28 | 2012-06-20 | Jsr株式会社 | Radiation sensitive composition, color filter, and liquid crystal display device |
| WO2019084895A1 (en) * | 2017-11-03 | 2019-05-09 | Dow Global Technologies Llc | Solvents for agricultural applications and pesticide formulations |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005320542A (en) | 2005-11-17 |
| KR20060045923A (en) | 2006-05-17 |
| KR101215426B1 (en) | 2012-12-26 |
| JP5062504B2 (en) | 2012-10-31 |
| TW200617502A (en) | 2006-06-01 |
| TWI386714B (en) | 2013-02-21 |
| CN100429248C (en) | 2008-10-29 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN1693322A (en) | Manufacturing method of acrylic copolymer resin for layer insulation film for TFT-LCD | |
| JP5279703B2 (en) | Light and / or thermosetting copolymer, curable resin composition, and cured product | |
| US8945815B2 (en) | Alkaline soluble resin and light sensible resin composition comprising same and use thereof | |
| TWI439475B (en) | Curable copolymer and curable resin composition | |
| CN1261822C (en) | Photosensitive resin composition for photoresist | |
| CN101051186A (en) | Negative photosensitive resin composition | |
| CN1877449A (en) | Negative light-sensitive resin composition | |
| CN1885163A (en) | Negative resist composition | |
| CN1306336C (en) | Photoresist composite and pattern forming process with it | |
| CN1784633A (en) | Photosensitive resin composition and dry film resist using the same | |
| CN104231148A (en) | Hydroxyl acrylic resin and preparation method thereof | |
| CN101311215A (en) | Organic protective film composition | |
| CN1842743A (en) | Photosensitive resin composition and LCD using the same | |
| CN101334587A (en) | Photosensitive resin composition for organic film transistor | |
| KR20100053090A (en) | Alkali soluble resin polymer with fluorene group, method of manufacturing the polymer and negative photosensitive resin composition including the polymer | |
| JP5650857B2 (en) | Compact | |
| CN105622834B (en) | A kind of preparation method of photocuring low dielectric constant fluorine polyacrylate acrylate | |
| TWI710855B (en) | Photosensitive resin composition and photo-cured pattern prepared from the same | |
| CN1320007C (en) | Film formed resin with copolymer of containing silicon coupling agent and 193 nm photoetching gule | |
| TWI483955B (en) | Α-allyloxymethyl methacrylate copolymer, resin composition and use thereof | |
| JP5471579B2 (en) | (Meth) acrylate derivative composition and method for producing the same | |
| KR101224261B1 (en) | Thermosetting ink composition for color filter, color filter using the composition and lcd comprising the color filter | |
| JP2006089528A (en) | Led sealant, light emitting diode including the same and curable composition | |
| TWI809178B (en) | Thermosetting compositions, cured film, and color filter | |
| JP2008291198A (en) | Acrylic resin composition and molded article from the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: CO., LTD. DONGJIN SEMICHEM Free format text: FORMER NAME: DONG JIN SHI-MEI KEN CO., LTD. |
|
| CP01 | Change in the name or title of a patent holder |
Address after: Inchon, Korea Patentee after: DONGJIN SEMICHEM Co.,Ltd. Address before: Inchon, Korea Patentee before: DONGJIN SEMICHEM Co.,Ltd. |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20081029 Termination date: 20210508 |