CN1649069A - Method for producing plasma display panel member and duplicating film - Google Patents

Method for producing plasma display panel member and duplicating film Download PDF

Info

Publication number
CN1649069A
CN1649069A CNA2005100070630A CN200510007063A CN1649069A CN 1649069 A CN1649069 A CN 1649069A CN A2005100070630 A CNA2005100070630 A CN A2005100070630A CN 200510007063 A CN200510007063 A CN 200510007063A CN 1649069 A CN1649069 A CN 1649069A
Authority
CN
China
Prior art keywords
layer
soluble resin
alkali soluble
contained
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005100070630A
Other languages
Chinese (zh)
Inventor
迎居浩昭
高桥至郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
JSR Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2004017464A external-priority patent/JP2005209588A/en
Priority claimed from JP2004017465A external-priority patent/JP2005209589A/en
Priority claimed from JP2004019813A external-priority patent/JP2005216604A/en
Application filed by JSR Corp filed Critical JSR Corp
Publication of CN1649069A publication Critical patent/CN1649069A/en
Pending legal-status Critical Current

Links

Classifications

    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01F—ADDITIONAL WORK, SUCH AS EQUIPPING ROADS OR THE CONSTRUCTION OF PLATFORMS, HELICOPTER LANDING STAGES, SIGNS, SNOW FENCES, OR THE LIKE
    • E01F9/00—Arrangement of road signs or traffic signals; Arrangements for enforcing caution
    • E01F9/50—Road surface markings; Kerbs or road edgings, specially adapted for alerting road users
    • E01F9/553—Low discrete bodies, e.g. marking blocks, studs or flexible vehicle-striking members
    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01F—ADDITIONAL WORK, SUCH AS EQUIPPING ROADS OR THE CONSTRUCTION OF PLATFORMS, HELICOPTER LANDING STAGES, SIGNS, SNOW FENCES, OR THE LIKE
    • E01F9/00—Arrangement of road signs or traffic signals; Arrangements for enforcing caution
    • E01F9/50—Road surface markings; Kerbs or road edgings, specially adapted for alerting road users
    • E01F9/576—Traffic lines
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/12—Reflex reflectors
    • G02B5/126—Reflex reflectors including curved refracting surface

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Materials For Photolithography (AREA)

Abstract

The invention provides a method of manufacturing a plasma display component excellent in shaping a pattern and transfer film suitably used for this method. The PDP component is manufactured by forming a photosensitive layer or a resist layer containing specific alkali soluble resin and specific inorganic powder on a non-photosensitive layer containing specific alkali soluble resin and specific inorganic powder, and then exposing, developing and sintering it. Further, a photosensitive layer or a resist layer containing specific alkali soluble resin and specific inorganic powder is formed on a supporting film, and a non-photosensitive layer containing specific alkali soluble resin and specific inorganic powder is formed on the formed layer, thereby obtaining a transfer film suitably used for manufacturing the PDP component.

Description

The manufacture method of plasma display panel member and duplicating film
Technical field
The present invention relates to the manufacture method of plasma display panel member, and be fit to the duplicating film that this manufacture method is used.
Background technology
In recent years, show body as flat fluorescence, Plasma Display is noticeable.Fig. 1 is the schematic diagram of AC plasma display panel (hereinafter to be referred as " PDP ") cross sectional shape.In the figure, 1 and 2 is glass substrates of relative preparation, the 3rd, and the next door forms each unit (cell) by glass substrate 1, glass substrate 2 and next door 3 divisions.The 4th, be fixed on the transparency electrode on the glass substrate 1; the 5th, be used to reduce the resistance of transparency electrode 4 and the bus electrode (bus electrode) that on this transparency electrode 4, forms; the 6th, be fixed in the address electrode (address electrode) on the glass substrate 2; the 7th, remain on the fluorescent material in the unit; the 8th, form and the dielectric layer of covering transparent electrode 4 and bus electrode 5 on glass substrate 1 surface; the 9th, form and the dielectric layer of overlay address electrode 6 on glass substrate 2 surface, the 10th, the diaphragm of forming by magnesium oxide for example.And be to obtain the high picture of contrast, in color PDP, between glass substrate and dielectric layer, be provided with colour filter (red, green, blueness) and black matrix (black matrix) etc. sometimes.
The PDP member comprises the formation method of next door, electrode, resistance, fluorophor, colour filter and black matrix etc., and is better with photoetching process.Here, photoetching process is to form the layer that is made of the pasty state sensibility composition that contains inorganic particle and carrier on the surface of substrate etc., by with its exposure, developing forms pattern, then with this pattern roasting, remove organic substance and make the method for inorganic particle sintering.Particularly be characterised in that and use duplicating film and the photoetching process that is replicated in surfaces such as substrate with the layer that constitutes by photosensitive composite, owing to can obtain the good film of thickness homogeneity, and can improve operating efficiency, very desirable.
In said method, owing to for example when forming the next door, remove organic substance through calcining process, thickness diminishes, and duplicating layer must be set about 1.3～2.0 times of thickness in the next door that should form.For example, for the thickness that makes the next door is 100～150 μ m, the thickness of duplicating layer must reach about 130～300 μ m.Go out the viewpoint of good electrical characteristics from the surface, wish to constitute next door asperratio height, the shape homogeneous of PDP.But become big as replication layer thickness, pattern sidewalls becomes the shape that is cut out easily during development, is difficult to obtain pattern form homogeneous and good next door.And as the sidewall of pattern is cut out when developing state carry out calcination process, pattern is stripped from or be out of shape seriously sometimes.
In order to address these problems, for example in the manufacture method in the next door that is used for PDP, disclosed the invention of manufacture method in the next door of the relevant PDP of being used for, it is characterized in that being used to form the film of the composition in next door, the structure (for example, with reference to patent documentation 1 and 2) that has the composition lamination used of the formation next door more than 2 kinds that will dissolubility is different in developer solution and form.
Yet, in the said method that is disclosed, but be to change the copolymerization ratio of components of said composition and dissolubility is changed, deliquescent sometimes difference may not be enough, also has problems on pattern form homogeneous and good this aspect of next door obtaining.
Patent documentation 1: open the flat 9-92137 of communique number of Japan's special permission
Patent documentation 2: open communique 2000-228143 number of Japan's special permission
Summary of the invention
Problem of the present invention provides the manufacture method of the PDP member of pattern form excellence, and the duplicating film that is applicable to this manufacture method.
First manufacture method of PDP member of the present invention (following also claim " PDP method for manufacturing component I ") is the manufacture method that comprises the plasma display panel member of following operation: (1) forms non-photosensitive layer (A1) and the operation that contains inorganic particle and alkali soluble resin on substrate; (2) formation contains the operation that inorganic particle, alkali soluble resin and radiativity are responded to the photosensitive layer (B1) of composition (the property composition is combined in the sense radiation) on the A1 layer; (3) the B1 layer is made the operation that exposure-processed forms the pattern sub-image; (4) form the operation of the pattern of B1 layer through development treatment; (5) across the pattern of B1 layer,, form the operation of the pattern of A1 layer, and (6) are with the operation of gained pattern calcination process through development treatment selective dissolution A1 layer; It is characterized in that, A1 layer and B1 layer satisfy one of condition shown in following (i)～(iii) at least: (i) weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of A1 layer, less than the weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of B1 layer; (ii) the contained alkali soluble resin of A1 layer is the resin that has from acrylic acid construction unit, the contained alkali soluble resin of B1 layer is the resin that has from the construction unit of methacrylic acid, (iii) the A1 layer also contains dissolution accelerator, the contained dissolution accelerator of A1 layer with respect to the content of A1 layer total weight than the content height of the contained dissolution accelerator of B1 layer with respect to B1 layer total weight.
Second manufacture method of PDP member of the present invention (following also claim " PDP method for manufacturing component II "), be the manufacture method that comprises the plasma display panel member of following operation: (1) forms the operation of the non-photosensitive layer (A2) that contains inorganic particle and alkali soluble resin on substrate; (2) on the A2 layer, form the operation of the non-photosensitive layer (A3) contain inorganic particle and alkali soluble resin; (3) on the A3 layer, form the operation of protective layer (resist layer); (4) protective layer is carried out the operation that exposure-processed forms the pattern sub-image; (5) form the operation of the pattern of protective layer through development treatment; (6) across the pattern of protective layer,, form the operation of A3 layer and A2 layer pattern through development treatment selective dissolution A3 layer and A2 layer; And (7) carry out the operation of calcination process to the gained pattern; It is characterized in that, that A2 layer and A3 layer satisfy at least is (iv) following～(one of condition vi): the (iv) weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of A2 layer, less than the weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of A3 layer; (v) the contained alkali soluble resin of A2 layer is the resin that has from acrylic acid construction unit, and the contained alkali soluble resin of A3 layer is the resin that has from the structure of methacrylic acid; (vi) the A2 layer also contains dissolution accelerator, and the contained dissolution accelerator of A2 layer measured the content height of contained dissolution accelerator with respect to A3 layer total weight with respect to the content of A2 layer total weight than A3.
Duplicating film of the present invention, it is the duplicating film at the layer that forms the photonasty composition that contains inorganic particle, alkali soluble resin and also contain as required more than two layers on the supporting film, it is characterized in that, at least satisfy one of the condition of following (a)～(c): contained alkali soluble resin is converted into the weight average molecular weight of polystyrene in any one deck (I) that (a) forms on the supporting film, greater than the weight average molecular weight that is converted into polystyrene of contained alkali soluble resin in another layer (II) that forms on this (I) layer; (b) soluble resin of contained alkali is the resin that has from the construction unit of methacrylic acid in any one deck (III) that forms on the supporting film, and contained alkali soluble resin is the resin that has from acrylic acid construction unit in another layer (IV) that forms on this (III) layer; (c) any one deck (V) that forms on supporting film is gone up and is formed another layer (VI), at least in this (VI) layer, also contain dissolution accelerator, be somebody's turn to do the content of dissolution accelerator contained in (VI) layer, be higher than the content of dissolution accelerator contained in this (V) layer with respect to (V) layer total weight with respect to (VI) layer total weight.
The manufacture method of PDP member of the present invention, it is good especially to be used to make the next door.And the contained inorganic particle of above-mentioned duplicating film better is a glass powder.
PDP method for manufacturing component of the present invention can form the good member of pattern form.And use duplicating film of the present invention, and can form the PDP member of thickness homogeneous, and in fact can improve operating efficiency, reduce process number.
Description of drawings
Fig. 1: the schematic cross-section of the explanation usefulness of general PDP.
Symbol description
1 glass substrate
2 glass substrates
3 next doors
4 transparency electrodes
5 bus electrodes
6 address electrodes
7 fluorophor
8 dielectric layers
9 dielectric layers
10 diaphragms
Embodiment
Below, the present invention is elaborated.
The manufacture method of＜PDP member 〉
The manufacture method I of PDP member of the present invention comprises that [1] forms developing procedure and [5] calcining process of exposure process, [4] B1 layer and the A1 layer of the operation of the operation of non-photosensitive layer (A1), [2] formation photosensitive layers (B1), [3] B1 layer.According to this manufacture method I, can form a kind of PDP member that is selected from next door, electrode, resistance, fluorophor, colour filter and black matrix at least.It is good especially that the manufacture method of PDP member of the present invention is used to form the next door.
Below, the be fabricated to example of each operation of the present invention with the next door described.
[1] the formation operation of non-photosensitive layer (A1)
On substrate, form non-photosensitive layer (A1) through this operation.The composition (following also claim " composition a1 ") that constitutes the A1 layer is identical with the constituent of the non-photosensitive layer (A1) that following duplicating film of the present invention has.Behind the whole bag of tricks coating composition a1 such as the available silk screen print method of A1 layer, cylinder rubbing method, method of spin coating, hydrostomia rubbing method, transfer printing, dried coating film is formed.And from the bed thickness homogeneity and the efficiency of operation of gained, also available duplicating film forms the A1 layer on substrate.
Here used duplicating film is the film that forms the A1 layer on supporting film.And this duplicating film also can have diaphragm on the A1 layer.In addition, the constituent of the supporting film that has of used here supporting film and following duplicating film of the present invention is identical.
One example of copy process is expressed as follows: after the protective film of used duplicating film is peeled off as required, duplicating film is overlapped substrate surface, its surface with the A1 layer is contacted., use warm-up mill hot pressing, peel off and remove supporting film thereafter.Make the A1 layer be replicated in substrate surface thus, form and be close to state.Copy condition can be set at 80～140 ℃ of warm-up mill surface temperatures, and roll-in is 1-5kg/cm 2, translational speed 0.1-10.0m/ branch.And substrate can preheating, and preheat temperature for example is 40～100 ℃.
The thickness of A1 layer, and different, the occasion of next door is generally 50～150 μ m, is preferably 70～120 μ m according to the member that forms.
[2] the formation operation of photosensitive layer (B1)
Form photosensitive layer (B1) through this project on the A1 layer, the composition (following also claim " composition b1 ") that constitutes the B1 layer is identical with the constituent of the following photosensitive layer that duplicating film of the present invention had (B1).
The B1 layer can be through the method formation same with the A1 layer.Therefore, the also available duplicating film of B1 layer forms on the A1 layer.The good layer of thickness homogeneity can be formed by this law, and operating efficiency can be improved.
The thickness of B1 layer can be with the member that forms difference, but the occasion of next door is generally 50～150 μ m, is preferably 70～120 μ m.
Operation [1] and operation [2] can be carried out respectively, but from the thickness homogeneity, improve the viewpoint of operating efficiency, use duplicating film of the present invention, and the method that operation [1] and operation [2] are carried out together is good especially.
[3] exposure process of B1 layer
In this operation, on the surface that is formed on the B1 layer on the A1 layer,, optionally use ultraviolet israds, irradiation (exposure), the sub-image of formation B1 layer pattern across exposure mask.
Do not have special restriction for the irradiation with radiation device, can use the used ultraviolet lamp of common photoetching process, or used exposure device when making semiconductor or liquid crystal indicator.
[4] B1 layer and A1 layer developing procedure
In this operation, by the B1 layer after the exposure is carried out development treatment sub-image is appeared, form the pattern of B1 layer.Across formed B1 layer pattern,, form the pattern of A1 layer then through development treatment selective dissolution A1 layer.
Development conditions such as the kind of developer solution, composition, concentration, developing time, development temperature can be according to the suitably selections such as kind of resin in B1 layer and the A1 layer.
And various developing methods such as available infusion process, jolting method, spray process, spray-on process, slurry method develop.Developing apparatus does not have special restriction yet.
By this developing procedure, formed the pattern (corresponding to the pattern of exposed mask) of the B1 layer that constitutes by residual of B1 layer and the B1 layer portion of removing.This pattern plays a part the mask of continuous development A1 layer.Promptly allow the A1 layer segment of removing portion corresponding to the B1 layer be dissolved in developer solution and optionally removed.As further proceeding development treatment, can make with substrate surface that the B1 layer is removed the corresponding part of portion and expose.Thus, under the pattern of B1 layer, form A1 layer pattern corresponding to the B1 layer pattern.
[5] calcination process operation
In this operation, the layer of pattern with formation is carried out calcination process.Thus, the organic substance burning in the layer is removed, form the layer of forming by inorganic substances, can obtain being formed at the PDP member of substrate surface.
The temperature of calcination process must be the temperature that organic substance in the layer is removed in burning, normally 400～600 ℃.And roasting time normally 10～90 minutes.
The relation of A1 layer and B1 layer
Among the above-mentioned manufacture method I, A1 layer and B1 layer must satisfy one of condition shown in following (i)～(iii) at least.By satisfying one of condition shown in following (i)～(iii) at least, make the A1 layer easily be dissolved in developer solution than B1 layer.Therefore the sidewall of pattern is difficult for being cut out in the time of can making development treatment, obtains the good PDP member of pattern form.
(a) condition (i)
Condition (i) is that the contained alkali soluble resin of the A1 layer weight average molecular weight that is converted into polystyrene (following also claim " Mw ") is less than the contained alkali soluble resin Mw of B1 layer.The weight average molecular weight (Mw) that is converted into polystyrene among the present invention is the weight average molecular weight of being measured by GPC that is converted into polystyrene.For making effect of the present invention more remarkable, better be that the difference of the Mw of the contained alkali soluble resin of the Mw of the contained alkali soluble resin of B1 layer and A1 layer is 5000～60000, be more preferably 10000～40000.
(b) condition (ii)
Condition (ii), the contained alkali soluble resin of A1 layer is the resin that has from acrylic acid construction unit, the contained alkali soluble resin of B1 layer is the resin that has from the construction unit of methacrylic acid.For making effect of the present invention remarkable, in the contained alkali soluble resin of A1 layer from the ratio of acrylic acid construction unit, in all repetitives, the scope of 5～50 weight % normally, better be 10～40 weight %, good especially is the scope of 15～30 weight %.And for making effect of the present invention remarkable, in the contained alkali soluble resin of B1 layer from the ratio of the construction unit of methacrylic acid, in all repetitives, the scope of 5～50 weight % normally, better be 10～40 weight %, good especially is the scope of 15～30 weight %.For making more remarkable effect of the present invention, better be that A1 layer and B1 layer satisfy above-mentioned main points simultaneously.
(c) condition (iii)
Condition (iii) is that the A1 layer also contains dissolution accelerator, and the B1 layer does not contain dissolution accelerator usually, if contain sometimes as any composition, the contained dissolution accelerator of A1 layer must be than the content height of the contained dissolution accelerator of B1 layer with respect to B1 layer total weight with respect to the content of A1 layer total weight.
The manufacture method II of＜PDP member 〉
The manufacture method II of PDP member of the present invention comprises that [1] forms the operation of non-photosensitive layer (A2); [2] operation of formation non-photosensitive layer (A3), developing procedure and [5] calcining process of the operation of [2 '] formation protective layer, exposure process, [4] protective layer, A3 layer and the A2 layer of [3] protective layer.According to this manufacture method II, can form at least a board member that is selected from next door, electrode, resistance, fluorophor, colour filter and black matrix.PDP method for manufacturing component of the present invention, it is good especially to be used to form the next door.
Each each operation with the manufacture method I of PDP member of above-mentioned each operation is as the criterion.And above-mentioned operation [1], operation [2] and operation [2 '] also can be carried out respectively, but from the thickness homogeneity, improve the viewpoint of operating efficiency, use duplicating film of the present invention, the method that operation [1], operation [2] and operation [2 '] are carried out together is good especially.
The relation of A2 layer and B2 layer
Among the above-mentioned manufacture method II, that A2 layer and A3 layer must satisfy at least is (iv) following～(one of condition vi), (iv) following by satisfying at least～(one of condition vi) can make the A2 layer than the easier developer solution that is dissolved in of A3 layer.Therefore, when development treatment, can make the sidewall of pattern be difficult for being cut out, obtain the good PDP member of pattern form.
(a) condition (iv)
Condition (iv) is the Mw of the Mw of the contained alkali soluble resin of A2 layer less than the contained alkali soluble resin of A3 layer, for making effect of the present invention more remarkable, the difference that better is the Mw of the Mw of the contained alkali soluble resin of A3 layer and the contained alkali soluble resin of A2 layer is 5000～60000, is more preferably 10000～40000.
(b) condition (v)
(v) be that the contained alkali soluble resin of A2 layer is the resin that has from acrylic acid construction unit, the contained alkali soluble resin of A3 layer is the resin that has from the construction unit of methacrylic acid to condition.For making effect of the present invention remarkable, in the contained alkali soluble resin of A2 layer from the ratio of acrylic acid construction unit, in all repetitives, the scope of 5～50 weight % normally, better be 10～40 weight %, good especially is the scope of 15～30 weight %.And for making effect of the present invention remarkable, in the contained alkali soluble resin of A3 layer from the ratio of the construction unit of methacrylic acid, in all repetitives, the scope of 5～50 weight % normally, better be 10～40 weight %, good especially is the scope of 15～30 weight %.For making more remarkable effect of the present invention, better be that A2 layer and A3 layer satisfy above-mentioned main points simultaneously.
(c) condition (vi)
Condition (vi) is that the A2 layer also contains dissolution accelerator.And the A3 layer does not contain dissolution accelerator usually, if contain sometimes as any composition, the contained dissolution accelerator of A2 layer must be higher with respect to the content of A3 layer total weight than the contained dissolution accelerator of A3 layer with respect to the content of A2 layer total weight.
Below, the material of each operation of the manufacture method I that is used for above-mentioned PDP member and II, various conditions etc. are described.
Substrate
Baseplate material is insulating material such as glass, silicon, aluminium oxide for example.This substrate surface, available silane coupler etc. carries out medicine and handles as required; Plasma treatment; Pre-treatment is carried out in films such as ion plating method, metallikon, gas-phase reaction method, vacuum vapour deposition formation processing etc.
Exposure mask
The exposing patterns that is used for the exposure mask of exposure process according to purpose and different, for example can use the wide striped of 10～500 μ m.
Developer solution
The developer solution that the present invention is used better is an alkaline-based developer.The active ingredient of alkaline-based developer can be enumerated for example inorganic alkaline compounds such as lithium hydroxide, NaOH, potassium hydroxide, dibastic sodium phosphate, diammonium hydrogen phosphate, dipotassium hydrogen phosphate, sodium hydrogen phosphate, ammonium dihydrogen phosphate, potassium dihydrogen phosphate, sodium dihydrogen phosphate, lithium metasilicate, sodium metasilicate, potassium silicate, lithium bicarbonate, dibastic sodium phosphate, saleratus, lithium carbonate, sodium carbonate, potash, lithium borate, Boratex, potassium borate, ammonia; Organic basic compounds such as tetramethylammonium hydroxide, hydroxide trimethyl hydroxyethyl ammonium, single methylamine, dimethylamine, trimethylamine, mono aminoethane, diethylamine, triethylamine, single isopropylamine, diisopropylamine, monoethanolamine etc.
Alkaline-based developer can be regulated by above-mentioned alkali compounds more than a kind or 2 kinds being dissolved in water etc.Alkaline-based developer neutral and alkali compound concentrations, normally 0.001～10 weight % better is 0.01～5 weight %.After alkaline-based developer carries out development treatment, wash processing usually.
＜duplicating film 〉
Duplicating film of the present invention is at the multilayer film of the layer that forms the photonasty composition that contains inorganic particle, alkali soluble resin and contain as required more than 2 layers on the supporting film, can have diaphragm on this multilayer film.Duplicating film can be coated with the composition of the photonasty composition that contains inorganic particle, alkali soluble resin and contain as required on supporting film, with dried coating film, remove part or all solvent, repeatable operation and making.Also can be as required, coating protection composition forms protective layer with dried coating film on supporting film, is coated with above-mentioned composition, drying again and makes duplicating film on this protective layer.
The present invention is the form of duplicating film preferably, and is as described below:
1. be applicable to the duplicating film of the manufacture method I of PDP member
It is to have the photosensitive layer (B1) that comprises inorganic particle, alkali soluble resin and radiativity induction composition on supporting film, and the duplicating film that contains the non-photosensitive layer (A1) of inorganic particle and alkali soluble resin, it is characterized in that, the A1 layer is arranged on the B1 layer, and A1 layer and B1 layer satisfy one of condition shown in following (i)～(iii) at least:
(i) Mw of the contained alkali soluble resin of A1 layer is less than the Mw of the contained alkali soluble resin of B1 layer.
(ii) the contained alkali soluble resin of B1 layer is the resin that has from the construction unit of methacrylic acid, and the contained alkali soluble resin of A1 layer is the resin that has from acrylic acid construction unit.
(iii) the A1 layer also contains dissolution accelerator, and the contained dissolution accelerator of A1 layer is higher than the content of the contained dissolution accelerator of B1 layer with respect to B1 layer total weight with respect to the content of A1 layer total weight.
2. be applicable to the duplicating film of the manufacture method II of PDP member
It is to have the non-photosensitive layer (A3) that contains inorganic particle and alkali soluble resin and comprise inorganic particle and the film of the non-photosensitive layer of alkali soluble resin (A2) on supporting film, it is characterized in that, the A2 layer is arranged on the A3 layer, that A2 layer and A3 layer satisfy at least is (iv) following～(one of condition vi):
The (iv) Mw of the contained alkali soluble resin of A2 layer is less than the Mw of the contained alkali soluble resin of A3 layer.
(v) the contained alkali soluble resin of A3 layer is the resin that has from the construction unit of methacrylic acid, and the contained alkali soluble resin of A2 layer is the resin that has from acrylic acid construction unit.
(vi) A2 also contains dissolution accelerator, and the contained dissolution accelerator of A2 layer be with respect to the content of A2 layer total weight, than the content height of the contained dissolution accelerator of A3 layer with respect to A3 layer total weight.
It is on supporting film matcoveredn, comprise the non-photosensitive layer (A3) of inorganic particle and alkali soluble resin and comprise inorganic particle and the non-photosensitive layer of alkali soluble resin (A2); it is characterized in that; the A3 layer is arranged on protective layer; the A2 layer is arranged on the A3 layer, that A2 layer and A3 layer satisfy at least is (iv) above-mentioned～(one of condition vi) is comparatively desirable:
Below each element of duplicating film of the present invention is specifically described.
Supporting film
Supporting film better is to have flexible resin molding when having thermal endurance and solvent resistance.Because supporting film has flexibility, available roll coater coating paste composition, the next door forms the state that material layer can the cylinder shape rolls and preserves, supplies with.Form the resin of supporting film, can enumerate fluorine resins such as polyester, polyethylene, polypropylene, polystyrene, polyimides, polyvinyl alcohol, polyvinyl chloride, polyvinyl fluoride, nylon, celluloses etc. such as polyethyleneterephthalate.The thickness of supporting film for example is 20～100 μ m.
The surface of supporting film is better carried out the demoulding and is handled.Handle in above-mentioned copy process through this, carry out the strip operation of supporting film easily.
The A1 layer
The A1 layer can contain inorganic particle, alkali soluble resin, solvent and contained as required dissolution accelerator and the pasty state non-photosensitive composition that forms (following also claim " composition a1 "), dried coating film formed to remove part or all solvent through coating.
(1) inorganic particle
The inorganic particle that is used for present composition a1, different according to the kind of formed material.
Be used for the inorganic particle that the PDP next door forms material, can enumerate glass powder, for example the low-melting glass material.This low-melting glass material can be enumerated (1) zinc oxide, boron oxide, silica-based (ZnO-B 2O 3-SiO 2System), (2) lead oxide, boron oxide, silica-based (PbO-B 2O 3-SiO 2System), (3) lead oxide, boron oxide, the silicon dioxide, (PbO-B of lead oxide system 2O 3-SiO 2-Al 2O 3System), (4) lead oxide, zinc oxide, boron oxide, silica-based (PbO-ZnO-B 2O 3-SiO 2System), (5) bismuth oxide, the boron oxide, (Bi of silica system 2O 3-B 2O 3-SiO 2System), (6) bismuth oxide, boron oxide, silicon dioxide, alumina series (Bi 2O 3-B 2O 3-SiO 2-Al 2O 3System) etc.Other inorganic particles, for example alumina powder also can suitably add.
The electrode that is used for PDP forms the inorganic particle of material, can enumerate Ag, Au, Al, Ni, Ag-Pd alloy, metal powders such as Cu, Cr.Be used for the inorganic particle that transparency electrode forms material, can enumerate indium oxide, tin oxide, stanniferous indium oxide (ITO), contain antimony oxidation tin (ATO), fluoridize indium oxide (FIO), add fluorine tin oxide (FTO), fluoridize zinc oxide (FZO) and contain the powder that the metal oxides such as zinc oxide of one or two or more kinds metal that is selected from Al, Co, Fe, In, Sn and Ti are formed.
The resistance that is used for PDP forms the inorganic particle of material, can enumerate RuO 2Powder etc.
The fluorophor that is used for PDP forms the inorganic particle of material, is used for red enumerated Y 2O 3: Eu 3+, Y 2SiO 5: Eu 3+, Y 3A L5O 12: Eu 3+, YVO 4: Eu 3+, (Y, Gd) BO 3: Eu 3+, Zn 3(PO 4) 2: Mn etc. are used for green enumerated Zn 2SiO 4: Mn, BaAl 12O 19: Mn, BaMgAl 14O 23: Mn, LaPO 4: (Ce, Tb), Y 3(Al, Ga) 5O 12: Tb etc. are used for blue enumerated Y 2SiO 5: Ce, BaMgAl 10O 17: Eu 2+, BaMgAl 14O 23: Eu 2+, (Ca, Sr, Ba) 10(PO 4) 6Cl 2: Eu 2+, (Zn, Cd) S:Ag etc.
The colour filter of PDP, LCD, organic EL etc. forms the used inorganic particle of material, is used for red enumerated Fe 2O 3Deng, be used for green enumerated Cr 2O 3Deng, be used for blue enumerated CoOAl 2O 3Deng.
The black matrix of PDP, LCD, organic EL etc. forms the used inorganic particle of material, can enumerate metal powder, CuO-Cr such as Mn, Fe, Cr 2O 3, CuO-Fe 2O 3-Mn 2O 3, CuO-Cr 2O 3-Mn 2O 3, CoO-Fe 2O 3-Cr 2O 3Powder Deng composite oxides.
The formation materials of electrode, resistance, fluorophor, colour filter, black matrix etc. when using the inorganic particle beyond the low-melting glass material, also can and be used for the low-melting glass material of next door formation material.The content of these low-melting glass material, different according to purposes, but usually with respect to inorganic particle total amount 100 weight portions that comprise the low-melting glass material, below 50 weight portions.
(2) alkali soluble resin
As the alkali soluble resin that is used for composition a1, can use all resins, be resin with effect of binding resin.Here, " alkali-soluble " is meant the character that is dissolved in above-mentioned alkaline-based developer on the degree possible as the development treatment of target.As this alkali soluble resin, can use according to the condition (i)～(iii) that A1 layer among the manufacture method I of PDP member and B1 layer must satisfy.Below, the occasion of for example satisfy condition among the manufacture method I with the PDP member (i) is called for short manufacture method I (i).
(2-a) occasion of manufacture method I (i)
Among the manufacture method I (i), being used for the alkali soluble resin of composition a1, better is the monomer that is selected from following monomer (A), the copolymer that is selected from the unit of monomer (B) and/or monomer (C).By making monomer (A) copolymerization, can make resin have alkali-soluble.
Monomer (A):
Acrylic acid, methacrylic acid, maleic acid, fumaric acid, butenoic acid, itaconic acid, citraconic acid, mesaconic acid, cinnamic acid, mono succinate (2-(methyl) acryloxy ethyl ester), ω-carboxylic monomer classes such as hydroxyl polycaprolactone list (methyl) acrylate;
The monomer class of hydroxyls such as (methyl) acrylic acid 2-hydroxyl ethyl ester, (methyl) acrylic acid 2-hydroxypropyl acrylate, (methyl) acrylic acid 3-hydroxypropyl acrylate, acrylic acid (alpha-hydroxymethyl) ester;
O-hydroxy ethene, a hydroxy styrenes, para hydroxybenzene ethene etc. contain the monomer class that contains alkali-soluble functional group of the representatives such as monomer class of phenol hydroxyl.
Monomer (B):
Monomer (A) (methyl) esters of acrylic acids in addition such as (methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) n-butyl acrylate, (methyl) benzyl acrylate, (methyl) acrylic acid glycidyl esters, (methyl) acrylic acid two cyclopentyl esters; Aromatic vinyl such as styrene, AMS base class monomer class; Butadiene, isoprene equiconjugate dienes etc. for representative can with monomer (A) copolymerization and monomer class.
Monomer (C):
One end of polymer chains such as polystyrene, poly-(methyl) methyl acrylate, poly-(methyl) ethyl acrylate, poly-(methyl) benzyl acrylate has the macromonomer of polymerism unsaturated group such as (methyl) acryloyl group etc. to be the macromonomer class of representative.
Good especially monomer (A) can be enumerated acrylic acid, methacrylic acid etc.In all repetitives, be generally 5～50 weight % from the content of the construction unit of monomer (A), be preferably 10～40 weight %, good especially is 15～30 weight %.The copolymer composition (B) of above-mentioned monomer (A) and (C) in, good especially monomer can be enumerated n-BMA.
(2-b) manufacture method I occasion (ii)
Manufacture method I (ii) in, the alkali soluble resin that is used for composition a1 can be used all resins, but must be to have from acrylic acid construction unit, be about to acrylic acid (be total to) polymerization and must resin.And what above-mentioned alkali soluble resin contained in all repetitives is above-mentioned from acrylic acid construction unit, usually at 5～50 weight %, is preferably 10～40 weight %, and good especially is 15～30 weight %.
In the occasion of acrylic acid and other monomer copolymerizations, better be the monomer that is selected from following monomer (A ')～(C ') as acrylic acid copolymer composition, that good especially is monomer (B ').
Monomer (A ')
Carboxylic monomer class beyond maleic acid, fumaric acid, butenoic acid, itaconic acid, citraconic acid, mesaconic acid, cinnamic acid, mono succinate (2-(methyl) acryloxy ethyl ester), the ω-acrylic acid such as carboxyl polycaprolactone list (methyl) acrylate;
The monomer class of hydroxyls such as (methyl) acrylic acid 2-hydroxyl ethyl ester, (methyl) acrylic acid 2-hydroxypropyl acrylate, (methyl) acrylic acid 3-hydroxypropyl acrylate, acrylic acid (alpha-hydroxymethyl) ester;
O-hydroxy ethene, a hydroxy styrenes, para hydroxybenzene ethene etc. contain monomer class of phenol hydroxyl etc. and are the monomer class that contains alkali-soluble functional group of representative.
Monomer (B ')
Monomer (A) (methyl) esters of acrylic acids in addition such as (methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) n-butyl acrylate, (methyl) benzyl acrylate, (methyl) acrylic acid glycidyl esters, (methyl) acrylic acid two cyclopentyl esters; Aromatic vinyl such as styrene, AMS base class monomer class; Butadiene, isoprene equiconjugate dienes etc. for representative may with the monomer class of monomer (A) copolymerization.
Monomer (C ')
An end of polymer chains such as polystyrene, poly-(methyl) methyl acrylate, poly-(methyl) ethyl acrylate, poly-(methyl) benzyl acrylate has the macromonomer of polymerism unsaturated group such as (methyl) acryloyl group etc. to be the macromonomer class of representative.
(2-c) manufacture method I situation (iii)
Be used for the alkali soluble resin of composition a1 in (iii) at manufacture method I, identical with the resin that is used for composition a1 among the above-mentioned manufacture method I (i).
(2-d) polymerization, condition and molecular weight etc.
The polymerization of above-mentioned alkali soluble resin for example can be undertaken by radical polymerization.The initator of radical polymerization, available azodiisobutyronitrile, benzoyl peroxide etc.The solvent of radical polymerization, available propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether etc.Polymerization temperature is generally 50～100 ℃, and polymerization time is generally 30～600 fens.
The Mw of alkali soluble resin 5000～500000 better is 10000～200000 normally.
The Mw of alkali soluble resin for example can be by the control recently of monomer and polymerization initiator.
The content of alkali soluble resin among the composition a1, with respect to inorganic particle 100 weight portions, normally 1～500 weight portion better is 5～100 weight portions, good especially is 15～40 weight portions.
(3) dissolution accelerator
Above-mentioned manufacture method I (iii) in, in composition a1, also contain solvent promoter.Contain dissolution accelerator among the composition a1, can improve the developing powder of the A1 layer of composition a1 composition.In above-mentioned manufacture method I (i) and I arbitrary occasion (ii), can in composition a1, contain dissolution accelerator as any composition.
These dissolution accelerators are not particularly limited, and can enumerate
PAGs such as polyethylene glycol, polypropylene glycol, polytetramethylene glycol;
Cellulose families such as ethyl cellulose, hyetellose, L-HPC, carboxymethyl cellulose, carboxymethylethylcellulose;
Amphiphilic compounds such as polyvinyl alcohol, starch, glucan, dextrin, shitosan, collagen, gelatin, bromelain;
Senior aliphatic acid such as oleic acid, linoleic acid, leukotrienes, stearic acid, palmitic acid, laurate;
Nonionic surfactants such as polyoxyethylene alkyl ether, polyoxyalkylene alkyl ether, polyoxy alkylidene nonylplenyl ether, alcohol ethoxylate, fatty acid glyceride, polyoxyethylene fatty acid ester, Crodaret, polyoxyethylene alkyl amine, alkyl chain triacontanol acid amides, fatty acid esters of sorbitan etc.
Wherein amphiphilic compound and nonionic surfactant are better, and the combustible viewpoint of the material layer of the formation member of polyalkylene glycols when forming duplicating film sees that better good especially is polyethylene glycol and polypropylene glycol.
(4) solvent
For making said composition a1 have mobile plasticity, or make it to form good film, can comprise the solvent that constitutes composition a1.
Constitute the solvent of composition a1, be not particularly limited, for example can exemplify ethers, ester class, ether-ether class, ketone, ketone ester class, amide-type, carboxylic acid amide esters class, lactams, lactone, sulfoxide class, sulfone class, hydro carbons, halogenated hydrocarbon etc.
The object lesson of such solvent, can enumerate oxolane, methyl phenyl ethers anisole diox, the ethylene glycol monoalkyl ether class, the diethylene glycol dialkyl ether class, the propylene-glycol monoalky lether class, the propylene glycol dialkyl ether, acetates, hydroxacetic acid ester class, alkoxyl aldehyde esters of gallic acid, propionic acid ester, the hydroxy propionate class, the alkoxyl propionic ester class, lactic acid ester, the ethylene glycol monoalkyl ether acetates, the cyclic ketones class, non-ring type ketone, acetoacetic ester, the pyruvate class, N, N-dialkylformamide class, N, N-dialkyl acetamides class, N-alkyl pyrrolidine ketone, the Y-lactone, the dialkyl sulphoxide class, the dialkyl sulfone class, terpineol, N-N-methyl-2-2-pyrrolidone N-etc., they can be singly with or share more than 2 kinds.
The content of solvent among the composition a1 can suitably be selected in the scope that obtains good film formation property (flowability or plasticity).
Can contain various additives such as plasticizer, bonding agent, anti-clouding agent, preserving stabilizer, defoamer, antioxidant, ultra-violet absorber, filler, low-melting glass among the composition a1, as any composition.
The B1 layer
The B1 layer can contain inorganic particle, alkali soluble resin, solvent and photonasty composition by coating and make the pasty state photosensitive composite of essential composition (following also claim " composition b1 "), with dried coating film, removes part or all of solvent, and forms.
Constitute inorganic particle and the solvent of composition b1, can use the composition identical with the constituent of above-mentioned composition a1.
(1) alkali soluble resin
The alkali soluble resin that is used for composition b1 can use all resins, is the resin with effect of binding resin.This alkali soluble resin, the condition (i) that can must satisfy according to A1 layer among the manufacture method I of PDP member and B1 layer～(iii) use.
(1-a) situation of manufacture method I (i)
Among the manufacture method I (i), be used for the alkali soluble resin of composition b1, can use the identical resin of putting down in writing with the constituent of the middle compositions for use a1 of above-mentioned manufacture method I (i) of resin.
But the Mw that is used for the alkali soluble resin of composition b1 among the manufacture method I (i) must be greater than the Mw of the alkali soluble resin that constitutes composition a1.And for making more remarkable effect of the present invention, the Mw of the alkali soluble resin of formation composition b1 better is 5000～60000 with the difference of the Mw of the alkali soluble resin that constitutes composition a1, is more preferably 10000～40000.Mw can be by constituting composition a1 the identical method of occasion of alkali soluble resin controlled.
The Mw that is used for the alkali soluble resin of composition b1 among the manufacture method I (i), normally 5000～500000, better be 10000～200000.
The content of above-mentioned alkali soluble resin among the composition b1, with respect to inorganic particle 100 weight portions, normally 1～500 weight portion better is 5～100 weight portions, good especially is 15～40 weight portions.
(1-b) manufacture method I occasion (ii)
Manufacture method I (ii) in, the alkali soluble resin that is used for composition b1 can be used all resins, but must be the resin that has from the structural units of methacrylic acid, be about to methacrylic acid (be total to) polymerization and must resin.And in the above-mentioned alkali soluble resin, above-mentioned construction unit from methacrylic acid in all repetitives, contain usually 5～50 weight %, better be 10～40 weight %, good especially be the scope of 15～30 weight %.
When methacrylic acid and other monomer copolymerizations, the copolymer composition of methacrylic acid better is to be selected from the unit that above-mentioned manufacture method I is used for monomer (A ')～(C ') of composition a1 in (ii), and that good especially is monomer (B ').
Manufacture method I (ii) in, be used for the Mw of the alkali soluble resin of composition b1, normally 5000～500000, better be 10000～200000.
The content of above-mentioned alkali soluble resin among the composition b1, with respect to inorganic particle 100 weight portions, normally 1～500 weight portion better is 5～100 weight portions, good especially is 15～40 weight portions.
(1-c) manufacture method I occasion (iii)
Manufacture method I (iii) in, be used for the alkali soluble resin of composition b1, the available identical resin of putting down in writing with the constituent that is used for above-mentioned manufacture method I composition a1 (iii) of resin.
Manufacture method I is used for the Mw of the alkali soluble resin of composition b1 in (iii), and normally 5000～500000, better be 10000～200000.
The content of above-mentioned alkali soluble resin among the composition b1, with respect to 100 weight portions of inorganic particle, normally 1～500 weight portion better is 5～100 weight portions.Good especially is 15～40 weight portions.
(2) photonasty composition
Constitute the photonasty composition of composition b1, the for example combination of (A) polyfunctional group monomer and radiation polymerization initator, (B) melamine resin and form the combination of photo-acid generator of acid through radiation irradiation better, as the combination of above-mentioned (A), the combination of polyfunctional group (methyl) acrylate and radiation polymerization initator is good especially.
Constitute the concrete example of polyfunctional group (methyl) acrylate of photonasty composition, can exemplify two (methyl) esters of acrylic acid of aklylene glycols such as ethylene glycol, propylene glycol;
Two (methyl) esters of acrylic acid of PAG such as polyethylene glycol, polypropylene glycol; Two (methyl) esters of acrylic acid of two terminal hydroxyl fluidized polymers such as two terminal hydroxyl polybutadiene, two terminal hydroxyl polyisoprene, two terminal hydroxyl polycaprolactones;
Glycerine, 1,2, many (methyl) esters of acrylic acid of the polyalcohols more than 3 yuan such as 4-butantriol, trimethylolalkane, tetra methylol alkane, pentaerythrite, dipentaerythritol;
Many (methyl) esters of acrylic acid of the PAG addition product of the polyalcohol more than 3 yuan; 1,4-cyclohexanediol, 1, many (methyl) esters of acrylic acid of the cyclic polyols of 4-benzenediol class;
Oligomeric (methyl) esters of acrylic acids such as polyester (methyl) acrylate, epoxy (methyl) acrylate, polyurethane (methyl) acrylate, alkyd resins (methyl) acrylate, silicone resin (methyl) acrylate, spirane resin (methyl) acrylate etc.They can be singly with or be used in combination more than 2 kinds.
And the width of cloth that constitutes the photonasty composition is penetrated the object lesson of polymerization initiator, can enumerate benzil, benzoin, benzophenone, camphoral, 2-hydroxy-2-methyl-1-phenyl-propane-1-ketone, 1-hydroxycyclohexylphenylketone, 2,2-dimethoxy-2-phenyl acetophenone, 2-methyl-[4 '-(methyl mercapto) phenyl]-2-morpholinyl-1-acetone, 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl)-Ding-carbonyls such as 1-ketone; Azo-compound or triazo-compounds such as azo isobutyronitrile, 4-triazobenzene formaldehyde; Organosulfur compounds such as mercaptan disulphide;
Organic peroxides such as benzoyl peroxide, di-t-butyl peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, hydroperoxidation;
1, two (the trichloromethyl)-5-of 3-(2 '-chlorphenyl)-1,3,5-triazines, 2-[2-(2-furyl) ethyl base]-4, two (the trichloromethyl)-haloform classes such as 1,3,5-triazines of 6-;
2,2 '-two (2-chlorphenyl)-4,5,4 ', 5 '-tetraphenyl-1,2 '-imidazole dimers such as bisglyoxaline etc.They can be singly with or be used in combination more than 2 kinds.
The content of photonasty composition among the composition b1, with respect to inorganic particle 100 weight portions, normally the 10-60 weight portion better is 20～40 weight portions.When particularly being used in combination polyfunctional group monomer and radiation polymerization initator as the photonasty composition, the polyfunctional group monomer is with respect to inorganic particle 100 weight portions, 5～40 weight portions normally, better be 10～30 weight portions, the radiation polymerization initator is with respect to polyfunctional group monomer 100 weight portions, normally 1～20 weight portion better is 5～15 weight portions.
(3) other compositions such as dissolution accelerator
Above-mentioned manufacture method I occasion does not (iii) contain dissolution accelerator usually in composition b1, contain and can be used as any composition.Even but in composition b1, containing the occasion of dissolution accelerator, this dissolution accelerator must be less than contained dissolution accelerator among the composition a1 with respect to the content of composition a1 total weight with respect to the content of the total weight of composition b1.
In above-mentioned in addition manufacture method I (i) and the occasion (ii), in composition b1, do not contain dissolution accelerator usually yet, contain and can be used as any composition.But big as containing of dissolution accelerator of proportional change, B1 layer that constitutes because of composition b1 and A1 layer diminish to the difference of developer solution and solubility sometimes, and be undesirable.Therefore, the contained dissolution accelerator of composition b1 is proportional to containing of composition b1 total weight, has the tendency surface proportional better to containing of composition a1 total weight less than the contained dissolution accelerator of composition a1.
And, among the composition b1, can contain plasticizer, bonding agent, anti-clouding agent, preserving stabilizer.Various additives such as defoamer, antioxidant, ultra-violet absorber, filler, low-melting glass are as any composition.
The A2 layer
The A2 layer can be coated with the pasty state non-photosensitive composition (following also claim " composition a2 ") of the dissolution accelerator that contains inorganic particle, alkali soluble resin and contain as required, dried coating film is removed part or all of solvent and forms.
Constitute inorganic particle and the solvent of composition a2, can use and the described identical composition of the constituent of above-mentioned composition a1.
(1) alkali soluble resin
The employed alkali soluble resin of composition a2 can use all resins, is the resin with effect of binding resin.This alkali soluble resin, the condition that can must satisfy according to A2 layer among the manufacture method II of PDP member and A2 layer (iv)～(vi) use.
(iv) the occasion of must satisfying condition among the manufacture method II of PDP member (below be also referred to as " manufacture method II (iv) ") is used for the alkali soluble resin of composition a2, and the alkali soluble resin used with the composition a1 of manufacture method I (i) is identical.Equally, manufacture method II (occasion v), the alkali soluble resin that is used for composition a2, the alkali soluble resin used with manufacture method I composition a1 (ii) is identical, manufacture method II (occasion vi), the alkali soluble resin that is used for composition a2, the alkali soluble resin used with manufacture method I composition a1 (iii) is identical.
(2) dissolution accelerator
(occasion vi) also contains dissolution accelerator to above-mentioned manufacture method II in composition a2.A2 contains dissolution accelerator as composition, and the developing powder of the A2 layer that is made of composition a2 can be enhanced.This manufacture method II (dissolution accelerator that uses vi), identical with the dissolution accelerator that is used for above-mentioned manufacture method I composition a1 (iii).
And above-mentioned manufacture method II (iv) and II (each occasion v), composition a2 can contain dissolution accelerator as any composition.
Can contain various additives such as plasticizer, bonding agent, anti-clouding agent, preserving stabilizer, defoamer, antioxidant, ultra-violet absorber, filler, low-melting glass among the composition a2 as any composition.
The A3 layer
The A3 layer can by coating contain inorganic particle, alkali soluble resin and solvent pasty state non-photosensitive composition (following also claim " composition a3 "), dried coating film removed part or all of solvent form.
Constitute inorganic particle and the solvent of composition a3, can use the composition identical with the constituent of above-mentioned composition a1
(1) alkali soluble resin
The alkali soluble resin that is used for composition a3 can use all resins, is the resin with effect of binding resin.The above-mentioned condition that this alkali soluble resin can must satisfy according to A2 layer among the manufacture method II of PDP member and A3 layer (iv)～(vi) use.
The alkali soluble resin that manufacture method II occasion (iv) is used for composition a3 is identical with the alkali soluble resin that the occasion of manufacture method I (i) is used for composition b1.Equally, (occasion v) is used for the alkali soluble resin of composition a3 to manufacture method II, and is identical with the alkali soluble resin that is used for manufacture method I composition b1 (ii), manufacture method II (occasion vi); The alkali soluble resin that is used for composition a3 is identical with the alkali soluble resin that is used for manufacture method I composition b1 (iii).
(2) other compositions such as dissolution accelerator
(occasion does not vi) contain dissolution accelerator to above-mentioned manufacture method II usually in composition a3, contain but can be used as any composition.Even but containing the occasion of dissolution accelerator among the composition a3, this dissolution accelerator also must be less than the content of the contained dissolution accelerator of composition a2 to composition a2 total weight to the content of composition a3 total weight.
And above-mentioned manufacture method II (iv) and I (occasion does not v) contain dissolution accelerator usually in composition a3, contain but can be used as any composition yet.Yet containing of dissolution accelerator is proportional as becoming many, and the A3 layer and the poor solubility of A2 layer in developer solution of composition a3 formation diminish sometimes, and be undesirable.Thereby the contained dissolution accelerator of composition a3 is proportional to containing of composition a3 total weight, tends to less than the contained dissolution accelerator of composition a2 proportional better to containing of composition a2 total weight.
And also can contain various additives such as plasticizer, bonding agent, anti-clouding agent, preserving stabilizer, defoamer, antioxidant, ultra-violet absorber, filler, low-melting glass among the composition a3 as any composition.
Protective layer
Protective layer can contain the protection composition of alkali soluble resin, polyfunctional group monomer, radiation polymerization initator and solvent by coating, with dried coating film, removes part or all of solvent and forms.
Be used to protect each composition of composition can use the composition identical with the constituent of above-mentioned composition b1.
The formation method of duplicating film
Duplicating film of the present invention can be removed part or all of solvent with dried coating film by coating compositions for use of the present invention, so repeated multiple times and making.These better are that the drying of will film is successively carried out, but also can be according to circumstances with the primary drying of filming of lamination.And can on supporting film, be coated with the protection composition as required, and will be coated with the dry protective layer that forms of thickness, on this protective layer, be coated with above-mentioned composition again, drying is made duplicating film.
The coating process of each composition better is the thicker method of filming that can form uniform film thickness efficiently.For example can enumerate coating process, the coating process of using scraping blade, the coating process of using curtain coater of using coating roller, the coating process of using the cable coating machine.
The drying condition of filming, for example be in 50～150 ℃ about 0.5～30 minute, dried solvent survival rate (forming the containing ratio in the material layer in next door) is normally in the 2 weight %.
On be set forth in the thickness of each material layer that forms on the supporting film, and different, for example the thickness of A1 layer or A2 layer is 10～150 μ m according to the kind of inorganic particle content, member and size etc., the thickness of B1 layer or A3 layer is 10～150 μ m.And the thickness of protective layer is decided to be 5～50 μ m usually.
And also can there be diaphragm on the duplicating film surface, as such diaphragm, can enumerate polyethylene film, polyvinyl alcohol film.
Duplicating film of the present invention also is well suited for forming with following method, promptly distinguishing coating composition formation material layer (or protective layer) on the supporting film and on the diaphragm, makes the face of material layer (or protective layer) overlap, compress.Such formation method can be enumerated following example.
(1) on supporting film, forms the B1 layer, on diaphragm, form the A1 layer, the face of the face of A1 layer and B1 layer is overlapped and the method that compresses.
(2) on supporting film, form the A3 layer of protective layer, on diaphragm, form the A2 layer, the face of the face of A3 layer and A2 layer is overlapped and the method that compresses.
(3) form protective layer on supporting film, lamination forms A2 layer and A3 layer on diaphragm, with going up and method that the face coincidence face of A3 layer compresses of protective layer.
[embodiment]
Embodiments of the invention below are described, but the present invention is not limited.Represent " weight portion " and " weight % " respectively following " part " and " % ".
Mw is with eastern ソ-Co., Ltd.'s system gel permeation chromatograph (GPC) (trade name: the HLC-8220GPC) weight average molecular weight that is converted into polystyrene of Ce Dinging.The GPC condition determination is as follows.
GPC post: (eastern ソ-system TSKguardcolumn Super HZ-L)
Solvent: THF
Measure temperature: 40 ℃
(synthesis example 1)
In the autoclave of mixer is housed, add 2 parts of 200 parts of propylene glycol monomethyl ether acetate, 70 parts of n-BMAs, 30 parts of methacrylic acids and azodiisobutyronitriles, under blanket of nitrogen in stirring at room to evenly.At 80 ℃ of polyase 13s hour, continue at 100 ℃ of polymerization reactions again after 1 hour then, cool to room temperature obtains polymer solution.Aggregate rate is 98%, and the Mw of the copolymer (to call " polymer (1) " in the following text) of separating out from this polymer solvent is 40000.
(synthesis example 2)
Except that in autoclave, adding 1 part of 200 parts of propylene glycol monomethyl ether acetate, 70 parts of n-BMAs, 30 parts of methacrylic acids and azodiisobutyronitrile, obtain polymer solution equally with synthesis example 1.Aggregate rate is 97%, and the Mw of the copolymer (to call " polymer (2) " in the following text) of separating out from this polymer solution is 70000.
(synthesis example 3)
In the autoclave of mixer is housed, add 1 part of 200 parts of propylene glycol monomethyl ether acetate, 70 parts of n-BMAs, 30 parts in acrylic acid and azodiisobutyronitrile, under blanket of nitrogen, in stirring at room to homogeneous, in 80 ℃ of polyase 13s hour, continue at 100 ℃ of polymerization reactions again after 1 hour, cool to room temperature obtains polymer solution.Here aggregate rate is 98%, and the Mw of the copolymer (to call " polymer (3) " in the following text) of separating out from this polymer solution is 70000.
(modulation example 1)
With inorganic particle frit (Bi 2O 3-B 2O 3-SiO 2-Al 2O 3System; Hereinafter to be referred as " frit ") 50 parts of the propylene glycol monomethyl ether acetate of 100 parts, 2 parts of the di 2-ethylhexyl azelates of (1) 30 part in the polymer of alkali soluble resin, plasticizer and solvent are mixing, the non-photosensitive composition (to call " non-photosensitive composition (a-1) " in the following text) of modulation pasty state.
(modulation example 2)
2 parts of the di 2-ethylhexyl azelates and 50 parts of the solvent propylene glycol monomethyl ether acetate of (2) 30 parts in the polymer of 100 parts of the frits of inorganic particle, alkali soluble resin, plasticizer is mixing, the non-photosensitive composition (to call " non-photosensitive composition (a-2) " in the following text) of modulation pasty state.
(modulation example 3)
50 parts of the propylene glycol monomethyl ether acetate of 2 parts of the di 2-ethylhexyl azelates of (3) 30 parts in 100 parts of frits, the alkali soluble resin polymer of inorganic particle, plasticizer and solvent is mixing, the non-photosensitive composition (to call " non-photosensitive composition (a-3) " in the following text) of modulation pasty state.
(modulation example 4)
50 parts of the propylene glycol monomethyl ether acetate of 5 parts of the polypropylene glycols (molecular weight 400) of 2 parts of the di 2-ethylhexyl azelates of (2) 30 parts in the polymer of 100 parts of the frits of inorganic particle, alkali soluble resin, plasticizer, dissolution accelerator and solvent are mixing, the non-photosensitive composition (to call " non-photosensitive composition (a-4) " in the following text) of modulation pasty state.
(modulation example 5)
Fourth-2 parts of 1-ketone are mixing with 10 parts of the trimethylolpropane triacrylates of 50 parts of the propylene glycol monomethyl ether acetate of 2 parts of the di 2-ethylhexyl azelates of (1) 30 part in the polymer of 100 parts of the frits of inorganic particle, alkali soluble resin, plasticizer, solvent, radiativity induction composition and 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl), the photosensitive composite (to call " photosensitive composite (b-1) " in the following text) of modulation pasty state.
(modulation example 6)
Fourth-2 parts of 1-ketone are mixing with (2) 30 parts in polymer, 2 parts of plasticizer di 2-ethylhexyl azelates, 50 parts of solvent propylene glycol monomethyl ether acetate, 10 parts of radiativity induction composition trimethylolpropane triacrylates and the 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) of 100 parts of the frits of inorganic particle, alkali soluble resin, the photosensitive composite of modulation pasty state (below, claim " photosensitive composite (b-2) ").
(modulation example 7)
Fourth-2 parts of 1-ketone are mixing with 10 parts of the trimethylolpropane triacrylates of 100 parts of inorganic particle frits, (3) 30 parts in alkali soluble resin polymer, 2 parts of plasticizer di 2-ethylhexyl azelates, 100 parts of solvent propylene glycol monomethyl ether acetate and photonasty composition and 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl), the photosensitive composite of modulation pasty state (below, claim " photosensitive composite (b-3) ").
(modulation example 8)
Fourth-2 parts of 1-ketone are mixing with 100 parts of the propylene glycol monomethyl ether acetate of 5 parts of the polypropylene glycols (molecular weight 400) of 100 parts of inorganic particle frits, (2) 30 parts in alkali soluble resin polymer, 2 parts of plasticizer di 2-ethylhexyl azelates, dissolution accelerator, solvent and 10 parts of radiativity induction composition trimethylolpropane triacrylates and 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl), the photosensitive composite (to call " photosensitive composite (b-4) " in the following text) of modulation pasty state.
(modulation example 9)
150 parts of the propylene glycol monomethyl ether acetate of 2-benzyl-2-dimethylamino-1-(4-morpholinyl phenyl) fourth-1 5 parts of the 1-ketone of 50 parts of the trimethylolpropane triacrylates of (1) 100 part in the polymer of alkali soluble resin, polyfunctional group monomer, radiation polymerization initator and solvent is mixing, modulate protective layer used composition (hereinafter referred to as " protection composition (r-1) ").
(modulation example 10)
150 parts of the 3-ethoxyl ethyl propionates of 1-hydroxycyclohexylphenylketone 10 weight portions of 40 parts of the tetramethylol methane tetraacrylates of (1) 50 part in the polymer of alkali soluble resin, polyfunctional group monomer, radiation polymerization initator and solvent is mixing, modulate protective layer used composition (to call " protection composition (r-2) " in the following text).
(developing powder evaluation method)
On the surface of soda-lime glass substrate (15cm rectangle, thick 1.1mm), be coated with machine coating with rod and form the composition that the next door is used, in 110 ℃ of dryings 5 minutes, solvent is removed fully, make the test film of the material layer in formation next door with thick 100 μ m.
The gained test film floods in the potassium hydroxide aqueous solution of 0.2 weight %, uses the magnetic stirring bar agitating solution, simultaneously viewing test sheet surface.According to the surperficial dissolving that forms the material layer in next door of test film, the mensuration substrate surface exposes the time of half as the solvent time, calculates dissolution velocity by following formula, and result of calculation is represented in table 1.
Formula: dissolution velocity (μ m/ second)=thickness (μ m)/dissolution time (second)
(embodiment 1)
(making of duplicating film)
Go up the photosensitive composite (b-2) that is coated with gained with coating roller at the supporting film (wide 200mm, long 30m, thick 38 μ m) that PETG (PET) film of handling through the demoulding in advance constitutes, formation is filmed, with filming of forming in 110 ℃ of dryings 5 minutes, remove and desolvate, form the photosensitive layer (b) of thick 100 μ m.Use coating roller to go up coating non-photosensitive composition (a-1) at photosensitive layer (b) then, formation is filmed, and filming of forming 110 ℃ of dryings 5 minutes, removed and desolvated, and forms the non-photosensitive layer (a) of thick 100 μ m.Form thick 200 μ m thus, by the two-layer material layer of forming that forms the next door, make duplicating film of the present invention (to call " duplicating film (1) " in the following text).
(the PDP manufacturing in next door)
＜copy process 〉
At 6 inches display panel used glass baseplate surfaces, overlapping duplicating film (1) makes it contact the surface of non-photosensitive layer (a), and this duplicating film (1) is used warm-up mill hot pressing.Pressing conditions is 120 ℃ of warm-up mill surface temperatures, roll-in 4kg/cm 2, warm-up mill translational speed 0.5m/ branch.The surface that is formed on glass substrate thus has duplicating layer to duplicate and bonding state.Measure the thickness of this duplicating layer (non-photosensitive layer (a)+photosensitive layer (b)), in the scope of 200 μ m ± 5 μ m.
The exposure process of＜photosensitive layer (b) 〉
To photosensitive layer (b), across exposure mask (the striped demi-mousseline pattern that 40 μ m are wide), use ultrahigh pressure mercury lamp, irradiation i line (ultraviolet ray of wavelength 365nm), exposure is decided to be 400mJ/cm 2
＜developing procedure 〉
Photosensitive layer (b) after exposure process finishes is peeled off and is removed after the supporting film, to the photosensitive layer (b) through exposure-processed, makes developer solution with the potassium hydroxide aqueous solution (25 ℃) of 0.2 weight %, carries out development treatment with spray process.Remove thus and be not subjected to ultraviolet irradiation and uncured photosensitive layer (b) part is done the development that pattern carries out non-photosensitive layer (a) continuously with it again.Next carries out washing processing and dried with ultra-pure water.Thereby be formed for forming the pattern of the layer in next door.
＜calcining process 〉
The glass substrate that the layer that has formed pattern will be arranged in baking furnace under 600 ℃ temperature atmosphere calcination process 30 minutes.Obtain thus glass baseplate surface form the next door and the display panel material.
In the display panel material of gained, observe the cross sectional shape in next door with scanning electron microscope, measure bottom surface wide and high of this cross sectional shape.As a result, the wide of bottom surface is 40 μ m ± 3 μ m, and height is 200 μ m ± 5 μ m, and dimensional accuracy improves, and can form the sharp-pointed pattern in edge, next door.And do not observe peeling off, being out of shape of relic and pattern.Evaluation result is shown in table 1.
(embodiment 2)
Except used non-photosensitive composition (a-1) being changed into non-photosensitive composition (a-3), make duplicating film similarly to Example 1, on glass substrate, be formed for forming the layer in next door with the duplicating film of gained, expose, development, roasting.Thus, the glass baseplate surface that obtains forms the display panel material that the next door forms.
In the display panel material of gained, observe the cross sectional shape in next door, measure bottom surface wide and high of this cross sectional shape with scanning electron microscope.As a result, the wide of bottom surface is 40 μ m ± 3 μ m, and height is 200 μ m ± 5 μ m, and dimensional accuracy is high, and can form the sharp-pointed pattern in edge, next door.And do not observe peeling off, being out of shape of relic and pattern.Evaluation result is shown in table 1.
(embodiment 3)
Except used non-photosensitive composition (a-1) being changed into non-photosensitive composition (a-4), make duplicating film similarly to Example 1, on glass substrate, be formed for forming the layer in next door with the duplicating film of gained, expose, development, roasting.Thus, the glass baseplate surface that obtains forms the display panel material that the next door forms.
In the display panel material of gained, observe the cross sectional shape in next door, measure bottom surface wide and high of this cross sectional shape with scanning electron microscope.As a result, the wide of bottom surface is 40 μ m ± 3 μ m, and height is 200 μ m ± 5 μ m, and dimensional accuracy is high, and can form the sharp-pointed pattern in edge, next door.And do not observe peeling off, being out of shape of relic and pattern.Evaluation result is shown in table 1.
[comparative example 1～9]
Comparative example except the combination of the composition that is used for 2 layers of each layer, is made duplicating film similarly to Example 1, is formed for forming the layer in next door with the gained duplicating film on glass substrate, exposes, development, roasting.Compositions for use and evaluation result are shown in table 1.
Table 1
Embodiment 1 Embodiment 2 Embodiment 3 Comparative example 1 Comparative example 2 Comparative example 3
The composition of A1 layer ??a-1 ???a-3 ????a-4 ????a-1 ????a-2 ????a-2
The composition of B1 layer ??b-2 ???b-2 ????b-2 ????b-1 ????b-2 ????b-1
The developing powder of A1 layer (μ m/ second) ??0.95 ???0.85 ????0.88 ????0.95 ????0.54 ????0.54
The developing powder of B1 layer (μ m/ second) ??0.54 ???0.49 ????0.49 ????0.90 ????0.49 ????0.90
The next door shape Well Well Well Bad Bad Bad
Comparative example 4 Comparative example 5 Comparative example 6 Comparative example 7 Comparative example 8 Comparative example 9
The composition of A1 layer ??a-3 ???a-2 ????a-2 ????a-4 ????a-2 ????a-2
The composition of B1 layer ??b-3 ???b-2 ????b-3 ????b-4 ????b-2 ????b-4
The developing powder of A1 layer (μ m/ second) ??0.85 ???0.54 ????0.54 ????0.88 ????0.54 ????0.54
The developing powder of B1 layer (μ m/ second) ??0.82 ???0.49 ????0.82 ????0.80 ????0.49 ????0.80
The next door shape Bad Bad Bad Bad Bad Bad
[embodiment 4]
(making of duplicating film)
Go up coating protection composition (r-1) with the supporting film (wide 200mm, long 30m, thick 38 μ m) that coating roller constitutes at the PET film of handling through the demoulding in advance; formation is filmed; filming of forming in 100 ℃ of dryings 5 minutes, removed and desolvated, form the protective layer of thick 15 μ m.
Be coated with non-photosensitive composition (a-2) with coating roller on protective layer then, formation is filmed, and filming of forming 100 ℃ of dryings 5 minutes, except that desolvating, formed the layer (a ') of thick 100 μ m.
Use coating roller to go up coating non-photosensitive composition (a-1) at layer (a ') again, formation is filmed, and filming of forming 100 ℃ of dryings 5 minutes, removed and desolvated, and forms the layer (a ") of thick 100 μ m.Form thus thick 215 μ m, by three layers of material layer that forms the next door of forming, make duplicating film of the present invention (to call " duplicating film (2) " in the following text).
(being used for the manufacturing in the next door of PDP)
＜copy process 〉
At 6 inches display panel used glass baseplate surfaces, overlapping duplicating film (2), (warm-up mill hot pressing is used with this duplicating film (2) in the surface of a ") to make its contact layer.Pressing conditions is identical with embodiment 1.The surface that is formed on glass substrate thus has duplicating layer to duplicate and bonding state.((thickness of a ") is in the scope of 215 μ m ± 5 μ m for protective layer+layer (a ')+layer to measure this duplicating layer.
The exposure process of＜protective layer 〉
To protective layer, across exposure mask (the striped demi-mousseline pattern that 40 μ m are wide), use ultrahigh pressure mercury lamp, irradiation i line (ultraviolet ray of wavelength 365nm).The photo amount is decided to be 400mJ/cm 2
＜developing procedure 〉
Protective layer after exposure process finishes is peeled off and is removed after the supporting film, to the protective layer through exposure-processed, makes developer solution with the potassium hydroxide aqueous solution (25 ℃) of 0.3 weight %, carries out development treatment with spray process.Remove the part of the uncured protective layer of not ultraviolet irradiation thus, do the material layer (development of a ") that pattern carries out layer (a ') continuously and forms the next door with it again.Next carries out washing processing and dried with ultra-pure water.Thereby be formed for forming the pattern of the material layer in next door, it is made of residual of material layer and the material layer portion of removing.
＜calcining process 〉
The glass substrate that the layer that has formed pattern will be arranged in baking furnace under 560 ℃ temperature atmosphere calcination process 30 minutes.Obtain thus glass baseplate surface form the next door and the display panel material.
In the display panel material of gained, observe the cross sectional shape in next door with scanning electron microscope, measure bottom surface wide and high of this cross sectional shape.As a result, the wide of bottom surface is 40 μ m ± 3 μ m, and height is 150 μ m ± 3 μ m, and dimensional accuracy is high, and can form the sharp-pointed pattern in edge, next door.And do not observe relic and pattern and peel off, be out of shape.Evaluation result is shown in table 2.
[embodiment 5]
Except used protection composition (r-1) is protected composition (r-2), used non-photosensitive composition (a-1) is changed into the non-photosensitive composition (a-3) instead; make duplicating film similarly to Example 4; on glass substrate, be formed for forming the layer in next door with the duplicating film of gained, expose, development, roasting.Thus, the glass baseplate surface that obtains forms the display panel material that the next door forms.
In the display panel material of gained, observe the cross sectional shape in next door with scanning electron microscope, measure bottom surface wide and high of this cross sectional shape.As a result, the wide of bottom surface is 40 μ m ± 3 μ m, and height is 150 μ m ± 5 μ m, and dimensional accuracy is high, and can form the sharp-pointed pattern in edge, next door.And do not observe peeling off, being out of shape of relic and pattern.Evaluation result is shown in table 2.
[embodiment 6]
Except used protection composition (r-1) is protected composition (r-2), used non-photosensitive composition (a-1) is changed into the non-photosensitive composition (a-4) instead; make duplicating film similarly to Example 4; on glass substrate, be formed for forming the layer in next door with the duplicating film of gained, expose, development, roasting.Thus, the glass baseplate surface that obtains forms the display panel material that the next door forms.
In the display panel material of gained, observe the cross sectional shape in next door with scanning electron microscope, measure bottom surface wide and high of this cross sectional shape.As a result, the wide of bottom surface is 40 μ m ± 3 μ m, and height is 150 μ m ± 5 μ m, and dimensional accuracy is high, and can form the sharp-pointed pattern in edge, next door.And do not observe peeling off, being out of shape of relic and pattern.Evaluation result is shown in table 2.
[comparative example 10～12]
As a comparative example, except the combination of the composition that is used for each layer, make duplicating film similarly to Example 4, on glass substrate, be formed for forming the layer in next door, expose, development, roasting with the gained duplicating film.Compositions for use and evaluation result are shown in table 2.
Table 2
Embodiment 4 Embodiment 5 Embodiment 6 Comparative example 10 Comparative example 11 Comparative example 12
The composition of A2 layer ????a-1 ????a-3 ????a-4 ????a-1 ????a-2 ????a-2
The composition of A3 layer ????a-2 ????a-2 ????a-2 ????a-1 ????a-2 ????a-1
The composition of protective layer ????r-1 ????r-2 ????r-2 ????r-1 ????r-1 ????r-1
The developing powder of protective layer (μ m/ second) ????0.43 ????- ????- ????0.43 ????0.43 ????0.43
The developing powder of A2 layer (μ m/ second) ????0.95 ????0.85 ????0.88 ????0.95 ????0.54 ????0.54
The developing powder of A3 layer (μ m/ second) ????0.54 ????0.54 ????0.54 ????0.95 ????0.54 ????0.95
The next door shape Well Well Well Bad Bad Bad

Claims (17)

1. the manufacture method of plasma display panel member, it comprises (1) on substrate, forms the operation of the non-photosensitive layer (A1) that contains inorganic particle and alkali soluble resin; (2) on the A1 layer, form the operation of the photosensitive layer (B1) that contains inorganic particle and alkali soluble resin and radiativity induction composition; (3) the B1 layer is carried out the operation that exposure-processed forms the pattern sub-image; (4) form the operation of B1 layer pattern through development treatment; (5) across the pattern of B1 layer,, form the operation of the pattern of A1 layer through development treatment selective dissolution A1 layer; And (6) carry out the operation of calcination process to the gained pattern; It is characterized in that, A1 layer and B1 layer satisfy at least one of condition shown in following (i)-(iii): (i) weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of A1 layer, less than the weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of B1 layer; (ii) the contained alkali soluble resin of A1 layer is the resin that has from acrylic acid construction unit, the contained alkali soluble resin of B1 layer is the resin that has from the construction unit of methacrylic acid, (iii) the A1 layer also contains dissolution accelerator, the contained dissolution accelerator of A1 layer with respect to the content of A1 layer total weight than the content height of the contained dissolution accelerator of B1 layer with respect to B1 layer total weight.
2. the manufacture method of plasma display panel member according to claim 1, it is characterized in that the contained alkali soluble resin of B1 layer is converted into the weight average molecular weight of polystyrene and difference that the contained alkali soluble resin of A1 layer is converted into the weight average molecular weight of polystyrene is 5000～60000.
3. the manufacture method of plasma display panel member according to claim 1 is characterized in that, the contained dissolution accelerator of A1 layer is PAG.
4. the manufacture method of plasma display panel member, it comprises (1) on substrate, forms the operation of the non-photosensitive layer (A2) that contains inorganic particle and alkali soluble resin; (2) on the A2 layer, form the operation of the non-photosensitive layer (A3) that contains inorganic particle and alkali soluble resin; (3) operation of formation protective layer on the A3 layer; (4) protective layer is carried out the operation that exposure-processed forms the pattern sub-image; (5) form the operation of the pattern of protective layer through development treatment; (6) across the pattern of protective layer,, form the operation of the pattern of A3 layer and A2 layer, and (7) carry out the operation of calcination process to the gained pattern through development treatment selective dissolution A3 and A2 layer; It is characterized in that, below A2 layer and A3 layer satisfy (iv)～(at least one of condition vi): the (iv) weight average molecular weight that is converted into polystyrene of the contained alkali soluble resin of A2 layer, the weight average molecular weight that is converted into polystyrene less than the contained alkali soluble resin of A3 layer, (v) the contained alkali soluble resin of A2 layer is the resin that has from acrylic acid construction unit, the contained alkali soluble resin of A3 layer is the resin that has from the construction unit of methacrylic acid, (vi) the A2 layer also contains dissolution accelerator, the contained dissolution accelerator of A2 layer with respect to the content of A2 layer total weight than the content height of the contained dissolution accelerator of A3 layer with respect to A3 layer total weight.
5. the manufacture method of plasma display panel member according to claim 4, it is characterized in that the contained alkali soluble resin of A3 layer is converted into the weight average molecular weight of polystyrene and difference that the contained alkali soluble resin of A2 layer is converted into the weight average molecular weight of polystyrene is 5000～60000.
6. the manufacture method of plasma display panel member according to claim 4 is characterized in that, the contained dissolution accelerator of A2 layer is PAG.
7. according to the manufacture method of each described plasma display panel member in the claim 1～6, it is characterized in that plasma display panel member is at least a member that is selected from next door, electrode, resistance, fluorophor, colour filter and the black matrix.
8. according to the manufacture method of each described plasma display panel member in the claim 1～6, it is characterized in that above-mentioned plasma display panel member is the next door.
9. duplicating film, it is at the duplicating film that contains inorganic particle, alkali soluble resin and contained as required photonasty composition that forms on the supporting film more than two layers, it is characterized in that, it satisfies at least one of condition shown in following (a)～(c): (a) weight average molecular weight that is converted into polystyrene of contained alkali soluble resin in formed any one deck (I) on the supporting film, greater than the weight average molecular weight that is converted into polystyrene of contained alkali soluble resin in formed another layer (II) on this (I) layer; (b) on the supporting film in formed any one deck (III) contained alkali soluble resin be the resin that has from the construction unit of methacrylic acid, on this (III) layer formed another the layer (IV) in contained alkali soluble resin be the resin that has from acrylic acid construction unit; (c) formed any one deck (V) is gone up and is formed another layer (VI) on supporting film, at least in this (VI) layer, also contain dissolution accelerator, contained dissolution accelerator is with respect to the content of (VI) layer total weight in this (VI) layer, than contained dissolution accelerator in this (V) layer with respect to the content height of (V) layer total weight.
10. duplicating film, it is to have the photosensitive layer (B1) that comprises inorganic particle and alkali soluble resin and radiativity induction composition and comprise inorganic particle and the duplicating film of the non-photosensitive layer of alkali soluble resin (A1) on supporting film, it is characterized in that, on the B1 layer, has the A1 layer, A1 layer and B1 layer satisfy at least one of the condition shown in following (i)～(iii): (i) the contained alkali soluble resin of A1 layer is converted into the weight average molecular weight of polystyrene, is converted into the weight average molecular weight of polystyrene less than the contained alkali soluble resin of B1 layer; (ii) the contained alkali soluble resin of B1 layer is the resin that has from the construction unit of methacrylic acid, and the contained alkali soluble resin of A1 layer is the resin that has from acrylic acid construction unit; (iii) the A1 layer also contains dissolution accelerator, and the contained dissolution accelerator of A1 layer is with respect to the content of A1 layer total weight, than the content height of the contained dissolution accelerator of B1 layer with respect to B1 layer total weight.
11. duplicating film according to claim 10 is characterized in that, the contained alkali soluble resin of B1 layer is converted into the weight average molecular weight of polystyrene and difference that the contained alkali soluble resin of A1 layer is converted into the weight average molecular weight of polystyrene is 5000～60000.
12. duplicating film according to claim 10 is characterized in that, the contained dissolution accelerator of A1 layer is PAG.
13. duplicating film, it is to have the non-photosensitive layer (A3) that comprises inorganic particle and alkali soluble resin and comprise inorganic particle and the film of the non-photosensitive layer of alkali soluble resin (A2) on supporting film, it is characterized in that, the A2 layer is arranged on the A3 layer, that A2 layer and A3 layer satisfy is (iv) following～and (at least one of the condition vi): (iv) the contained alkali soluble resin of A2 layer is converted into the weight average molecular weight of polystyrene, is converted into the weight average molecular weight of polystyrene less than the contained alkali soluble resin of A3 layer; (v) the contained alkali soluble resin of A3 layer is the resin that has from the construction unit of methacrylic acid, and the contained alkali soluble resin of A2 layer is the resin that has from acrylic acid construction unit; (vi) the A2 layer also contains dissolution accelerator, and the contained dissolution accelerator of A2 layer be with respect to the content of A2 layer total weight, than the content height of the contained dissolution accelerator of A3 layer with respect to A3 layer total weight.
14. duplicating film according to claim 13 is characterized in that, matcoveredn between A3 layer and the supporting film.
15. according to claim 13 or 14 described duplicating films, it is characterized in that it is 5000～60000 that the contained alkali soluble resin of A3 layer is converted into the difference that the contained alkali soluble resin of the weight average molecular weight of polystyrene and A2 layer be converted into the weight average molecular weight of polystyrene.
16., it is characterized in that the contained dissolution accelerator of A2 layer is PAG according to claim 13 or 14 described duplicating films.
17., it is characterized in that inorganic particle is a glass powder according to each described duplicating film in the claim 9～14.
CNA2005100070630A 2004-01-26 2005-01-25 Method for producing plasma display panel member and duplicating film Pending CN1649069A (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2004017464A JP2005209588A (en) 2004-01-26 2004-01-26 Method of manufacturing plasma display panel member and transfer film
JP2004017465A JP2005209589A (en) 2004-01-26 2004-01-26 Method of manufacturing plasma display panel member and transfer film
JP200417464 2004-01-26
JP200417465 2004-01-26
JP200419813 2004-01-28
JP2004019813A JP2005216604A (en) 2004-01-28 2004-01-28 Method of manufacturing plasma display panel member and transfer film

Publications (1)

Publication Number Publication Date
CN1649069A true CN1649069A (en) 2005-08-03

Family

ID=34890872

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005100070630A Pending CN1649069A (en) 2004-01-26 2005-01-25 Method for producing plasma display panel member and duplicating film

Country Status (3)

Country Link
KR (1) KR20050077024A (en)
CN (1) CN1649069A (en)
TW (1) TW200525579A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115445638A (en) * 2022-09-19 2022-12-09 重庆大学 Composite photocatalytic material Zn 0.5 Cd 0.5 Preparation method of S/BiOI

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115445638A (en) * 2022-09-19 2022-12-09 重庆大学 Composite photocatalytic material Zn 0.5 Cd 0.5 Preparation method of S/BiOI

Also Published As

Publication number Publication date
KR20050077024A (en) 2005-07-29
TW200525579A (en) 2005-08-01

Similar Documents

Publication Publication Date Title
CN1271664C (en) Plasma displaying device and its mfg. method
CN1130749C (en) Plasma display and method of mfg. the same
CN1230857C (en) Plasma display panel and method for production thereof
CN1175460C (en) Plasma display panel device and method of fabricating the same
CN1848355A (en) Black conductive thick film compositions, black electrodes, and methods of forming thereof
CN1881081A (en) Radiation sensitive composition and color filter for forming coloration layer
CN1037212C (en) Photosensitive aqueous developable ceramic coating composition
CN1138181C (en) Photosensitive composition and use thereof
CN1690735A (en) Dyed layer forming radiation linear combination, colour filter and liquid crystal display screen
CN1702553A (en) Light sensitive composition
CN1683943A (en) Radioactive ray sensitive composition for forming coloring layer, color filter and color liquid crystal display plate
CN101042532A (en) Radiation sensitive composition for forming a colored layer and color filter
CN1079958C (en) Stable ionomeric photoresist emulsion and process of preparation and use thereof
CN1758077A (en) Radiation sensitive composition and method for the preparation of the same
CN1079827A (en) The Photoenhanced diffusion patterning of organic polymer films
CN101059656A (en) Photo-sensitive resin composition containing inorganic particle, photo-sensitive film, and process of forming inorganic pattern
CN1238765C (en) Sensitive paste-like material, plasma display and mfg. method thereof
CN101044432A (en) Alkali development-type photosensitive resin composition, substrate with projections for liquid crystal division alignment control formed using the same, and liquid crystal display device
CN1232591C (en) Paint for generating insulating film and process for preparing plasma display plate with said paint
CN1282901C (en) Radioactive ray sensitive composition, black array, color filter and color liquid crystal display device
CN1654534A (en) Method for manufacturing inorganic powder contained resin composition, transfer film and components for display screen
CN1293151C (en) Resin composition, colour filter and its producing method and liquid crystal display device
CN1649069A (en) Method for producing plasma display panel member and duplicating film
CN1250478C (en) Photosensitive ceramic blank plate, ceramic package and process for producing same
CN1733845A (en) Method for manufacturing inorganic powder contained resin composition, transfer printing film and plasma display panel

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication