CN1628341A - 防止压电微致动器中的操作和制造缺陷的系统和方法 - Google Patents
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Abstract
用于通过物理和电气隔离压电材料的导电层来防止压电微致动器中的操作和制造缺陷的方法和系统。
Description
技术领域
本发明涉及磁硬盘驱动器。更具体地,本发明涉及一种防止压电微致动器制造和操作缺陷的系统和方法。
现有技术中,使用不同的方法提高硬盘驱动器的记录密度。图1示出用于读写磁硬盘的典型驱动臂。典型地,音圈电机(VCM)102用于控制硬驱动器的臂104在磁硬盘106上的运动。由于仅由VCM102定位记录头108时所存在的固有公差(动态移动),现在用微致动器110“微调”头108的位置,如美国专利6,198,606中所述。VCM 102用于粗调,然后微致动器以更小的刻度矫正定位以补偿VCM 102(与臂104)的公差。这样可以获得较小的可记录轨迹宽度,增加硬驱动器的“每英寸轨迹”(TPI)值(增加记录密度)。
图2提供了现有技术中所用的微致动器的示例。典型地,滑块202(包含一个读写磁头,未示出)用于在磁盘表面106上方保持预定的飞行高度(见图1)。微致动器可以具有柔性桁条204,将支撑器件206与滑块容纳单元208连接,使得滑块202可以独立于驱动臂104运动(见图1)。电磁组件或电磁/铁磁组件(未示出)可以用来提供相对于臂104对滑块/头202的方向/位置的微调(见图1)。
利用诸如压电体的致动装置(见图3),会存在诸如电火花和由微粒导致的短路等问题。因此,期望有一种系统进行组件处理,其除了其它优点外,还防止上述问题的发生。
附图说明
图1示出现有技术中用于读写磁盘的驱动臂;
图2示出现有技术中所用的微致动器;
图3示出利用多层压电转换器(PZT)提供滑块致动的U形微致动器;
图4示出压电层之间由微粒引起的短路的潜在问题;
图5示出影响PZT性能的各种问题;
图6示出微致动器没有分离时微致动器臂的截面图和微致动器分离后微致动器臂的截面图;
图7示出根据本发明的原理,微致动器没有分离时微致动器臂的截面图和微致动器分离后微致动器臂的截面图;
图8示出根据本发明的原理,微致动器没有分离时微致动器臂的截面图和微致动器分离后,并且用PZT层应用端接时微致动器臂的截面图;
图9示出根据本发明的原理的微致动器的一个指截面图。
具体实施方式
图3示出利用多层压电转换器(PZT)提供滑块致动的U形微致动器。滑块(未示出)在两个连接点306、308附加在微致动器301的两个臂302、304之间。PZT材料,如象铅锆酸盐钛酸盐(lead zirconatetitanate)的压电陶瓷材料的层310结合到每个臂(致动器指)302、304的外面。PZT材料具有各向异性结构,从而正负离子之间的电荷分离提供了电偶极子特性。当在极化的压电材料两端施加电压时,外斯域的排列与电压成正比增加,导致PZT材料的结构变形(即,区域扩展/收缩)。当PZT结构310弯曲时(一致地),臂302、304(结合在PZT结构310上)也弯曲,导致滑块(未示出)调整其相对于微致动器301的位置(以便进行磁头微调)。
图4示出压电层之间由微粒引起的短路的潜在问题。在制造和/或操作过程中,微粒可能沉积,微粒404可能导致导电层406桥接。相对湿度可能导致微粒从空气中吸收湿气,使PZT层之间能够导电。压电结构406中的该短路404可能妨碍其正常操作,对微致动器402的性能产生不利影响。
图5示出影响PZT性能的各种问题。图5a示出杂散微粒504桥接(并潜在短路)压电层502的图像。如上所述,潮湿可能导致微粒504吸收潮湿并变得导电。图5b示出由压电层508之间的电弧506导致的损坏的图像。在合适的电压和空气湿度条件下,压电层508之间可能发生电弧,导致损坏和变形506。图5c示出层512之间的“污点”510(和潜在短路)的图像。在制造过程中切割微致动器以便分离时,可能发生污点(见图6和7)。当切割工具经过被切割而暴露的表面时,不同的层512的材料相互污染。
图6示出微致动器没有分离时微致动器臂的截面图和微致动器分离后微致动器臂的截面图。图6a示出微致动器块结构的部分602的截面图604。截面图604示出由导电材料622和PZT(绝缘)材料624交替构成的层628。图6b示出将微致动器610与其它微致动器分离后微致动器臂606的截面图608。在一个实施例中,分离可以通过机械装置进行(如转轮刀具或直线刀口刀具)。其它实施例涉及用电气工具进行微致动器分离(如电气溅射或离子铣削)。此外,化学手段也可使用(如化学气相沉积(CVD))。注意,微致动器臂(指)的侧面暴露压电层,包括导电层622。
图7示出根据本发明的原理,微致动器没有分离时微致动器臂的截面图和微致动器分离后,并且用导电层应用端接时微致动器臂的截面图。图7a示出微致动器块结构的部分702的截面图704。图7b示出将微致动器710与其它微致动器分离后微致动器臂706的截面图708。在本发明的一个实施例中,在微致动器臂706上放置一组导体条(导体材料)712如金、铂或铜后,在导体条712之上和之间施加PZT层(绝缘层)714,从而在物理上和电气上隔离导体条712。另一组导体条712和PZT层714也被施加,重复这一过程,直到层数和厚度适合微致动器的应用和性能。在一个实施例中,最后施加的层是导体条712,然后在压电层上(并且在微致动器指706的相对端上,又见附图9)放置焊盘716。在一个实施例中,运用4-6个PZT层(5-7个导体层)。
在一个实施例中,分开微致动器710后,PZT层714将导体条712彼此物理隔离,从而防止“污染”(和潜在的短路)。此外,PZT层714电气绝缘压电层的侧面,防止电弧损坏和微粒污染(电气桥接/短路)。
图8示出根据本发明的原理,微致动器没有分离时微致动器臂的截面图和微致动器分离后,并且用PZT层应用端接时微致动器臂的截面图。图8a示出微致动器块结构的部分802的截面图804。图8b示出将微致动器810与其它微致动器分离后微致动器臂806的截面图808。在本发明的一个实施例中,在微致动器臂806上放置一组导体条(导体材料)812如金、铂或铜后,在导体条812之上和之间施加PZT层(绝缘层)814,从而在物理上和电气上隔离导体条812。另一组导体条812和PZT层814也被施加,重复这一过程,直到层数和厚度适合微致动器的应用和性能。在一个实施例中,最后施加的层是PZT层815。在一个实施例中,最后的PZT层815提供一个“窗口”(绝缘间隙),供焊盘816附加在其中(见图8)。在一个实施例中,运用4-6个PZT层和4-6个导体层。
在一个实施例中,分开微致动器810后,PZT层814、815将导体条812彼此物理隔离,从而防止“污染”(和潜在的短路)。此外,PZT层814、815电气绝缘压电层的侧面,防止电弧损坏和微粒污染(电气桥接/短路)。
图9示出根据本发明的原理的微致动器的一个指截面图。在一个实施例中,在最后的PZT层915中提供一个窗口902,以提供顶部导体层(条)904与焊盘906之间的导电路径。
尽管此处具体描述了几个实施例,但应当理解,对本发明的修改和变化由以上的说明所覆盖,并落入所附权利要求的范围内,而不偏离本发明的精神和范围。
Claims (28)
1.一种制造致动器的方法,包括:
将至少一个导电材料层和至少一个电绝缘材料层施加到一个致动器指上,其中
所述导电材料和所述绝缘材料以交替方式逐层施加;且
所述绝缘材料层的面积大于所述导电材料层,从而一个绝缘层-该绝缘层施加到所述致动器指,并且在该绝缘层与所述致动器指之间夹着一个导体层-至少部分封闭并电气绝缘所述导电层。
2.如权利要求1所述的方法,其中所述导电材料和所述绝缘材料以交替方式逐层施加,所述导电材料是最后施加的层。
3.如权利要求1所述的方法,其中所述导电材料和所述绝缘材料以交替方式逐层施加,所述绝缘材料是最后施加的层。
4.如权利要求3所述的方法,其中在最后的绝缘层中提供一个窗口,用于放置焊盘。
5.如权利要求1所述的方法,其中所述导电材料是金属。
6.如权利要求5所述的方法,其中所述导电材料选自下面的组,该组包括:金、铂、和铜。
7.如权利要求1所述的方法,其中所述绝缘材料是压电陶瓷材料。
8.如权利要求7所述的方法,其中所述绝缘材料是铅锆酸盐钛酸盐。
9.如权利要求1所述的方法,其中所述致动器指是硬盘驱动微致动器指。
10.一种致动器组件,包括:
至少一个导电材料层;和
至少一个电绝缘材料层;其中
所述导电材料和所述绝缘材料以交替方式逐层施加到一个致动器指;且
所述绝缘材料层的面积大于所述导电材料层,从而一个绝缘层-该绝缘层施加到所述致动器指,并且在该绝缘层与所述致动器指之间夹着一个导体层-至少部分封闭并电气绝缘所述导电层。
11.如权利要求10所述的系统,其中所述导电材料是金属。
12.如权利要求11所述的系统,其中所述导电材料选自下面的组,该组包括:金、铂、和铜。
13.如权利要求10所述的系统,其中所述绝缘材料是压电陶瓷材料。
14.如权利要求13所述的系统,其中所述绝缘材料是铅锆酸盐钛酸盐。
15.如权利要求10所述的系统,其中所述致动器指是硬盘驱动微致动器指。
16.一种压电致动器,包括:
一个致动器指,用于接受至少一个导电材料层和至少一个电绝缘材料层的施加,所述施加是以交替方式逐层施加的,其中
所述绝缘材料层的面积大于所述导电材料层,从而一个绝缘层-该绝缘层施加到所述致动器指,并且在该绝缘层与所述致动器指之间夹着一个导体层-至少部分封闭并电气绝缘所述导电层。
17.如权利要求16所述的系统,其中所述导电材料是金属。
18.如权利要求17所述的系统,其中所述导电材料选自下面的组,该组包括:金、铂、和铜。
19.如权利要求16所述的系统,其中所述绝缘材料是压电陶瓷材料。
20.如权利要求19所述的系统,其中所述绝缘材料是铅锆酸盐钛酸盐。
21.如权利要求16所述的系统,其中所述致动器指是硬盘驱动微致动器指。
22.一种制造致动器的方法,包括:
将至少一个导电材料层和至少一个电绝缘材料层施加到一个致动器块上,其中
所述导电材料和所述绝缘材料在至少一个致动器指位置中以交替方式逐层施加到所述致动器块;且
所述绝缘材料层的面积大于所述导电材料层,从而一个绝缘层-该绝缘层施加到所述致动器区,并且在该绝缘层与所述致动器区之间夹着一个导体层-至少部分封闭并电气绝缘所述导电层;和
将所述致动器块分离为多个致动器,每个致动器至少具有一个致动器指。
23.如权利要求22所述的方法,其中所述分离是利用下面的组中的一种切割工具进行的,该组包括:转轮刀具、直线刀口刀具、电气溅射、离子铣削、和化学气相沉积。
24.如权利要求22所述的方法,其中所述导电材料是金属。
25.如权利要求23所述的方法,其中所述导电材料选自下面的组,该组包括:金、铂、和铜。
26.如权利要求22所述的方法,其中所述绝缘材料是压电陶瓷材料。
27.如权利要求26所述的方法,其中所述绝缘材料是铅锆酸盐钛酸盐。
28.如权利要求22所述的方法,其中所述致动器指是硬盘驱动微致动器指。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/CN2002/000392 WO2003105131A1 (en) | 2002-06-05 | 2002-06-05 | A system and method for preventing operational and manufacturing imperfections in piezoelectric micro-actuators |
Publications (2)
Publication Number | Publication Date |
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CN1628341A true CN1628341A (zh) | 2005-06-15 |
CN1288631C CN1288631C (zh) | 2006-12-06 |
Family
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CN02829081.XA Expired - Fee Related CN1288631C (zh) | 2002-06-05 | 2002-06-05 | 防止压电微致动器中的操作和制造缺陷的系统和方法 |
Country Status (3)
Country | Link |
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US (3) | US7065845B2 (zh) |
CN (1) | CN1288631C (zh) |
WO (1) | WO2003105131A1 (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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EP1717874B1 (en) * | 2005-04-28 | 2010-05-05 | Brother Kogyo Kabushiki Kaisha | Method of producing piezoelectric actuator |
US7796363B2 (en) * | 2006-05-25 | 2010-09-14 | Sae Magnetics (H.K.) Ltd. | PZT element, head gimbal assembly, and disk drive unit with same |
US8085508B2 (en) | 2008-03-28 | 2011-12-27 | Hitachi Global Storage Technologies Netherlands B.V. | System, method and apparatus for flexure-integrated microactuator |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2657320A (en) * | 1948-12-30 | 1953-10-27 | Bell Telephone Labor Inc | Piezoelectric crystal unit |
US4056654A (en) * | 1975-07-24 | 1977-11-01 | Kkf Corporation | Coating compositions, processes for depositing the same, and articles resulting therefrom |
JPS58133672A (ja) * | 1982-02-04 | 1983-08-09 | Olympus Optical Co Ltd | トラツキング制御装置 |
JPS6411382A (en) * | 1987-07-03 | 1989-01-13 | Kuraray Co | Manufacture of piezoelectric and pyroelectric polymer material |
US4891723A (en) * | 1988-09-22 | 1990-01-02 | Magnetic Peripherals Inc. | Multiple stage heat shielding for transducer support arm |
JP3064336B2 (ja) * | 1989-06-28 | 2000-07-12 | 株式会社日立製作所 | 情報取扱い装置およびデイスク装置 |
JPH03203384A (ja) * | 1989-12-29 | 1991-09-05 | Nec Corp | 電歪効果素子の製造方法 |
US5305168A (en) * | 1992-03-05 | 1994-04-19 | Magnex Corporation | Thin film transducer suspension assembly with flexuro mounted booster element |
WO1996030916A2 (en) * | 1995-03-27 | 1996-10-03 | Philips Electronics N.V. | Method of manufacturing an electronic multilayer component |
US6108175A (en) * | 1996-12-16 | 2000-08-22 | Seagate Technology, Inc. | Bimorph piezoelectric microactuator head and flexure assembly |
JPH1126834A (ja) * | 1997-07-04 | 1999-01-29 | Toshio Fukuda | Pzt薄膜バイモルフ形の平行平板構造体、及びその製造方法 |
US6198606B1 (en) * | 1999-07-28 | 2001-03-06 | Seagate Technology Llc | Disc drive actuation system having an injection molded magnetic micro-actuator with metal beam inserts and its method of fabrication |
US6498419B1 (en) * | 1999-10-01 | 2002-12-24 | Ngk Insulators, Ltd. | Piezoelectric/electrostrictive device having mutually opposing end surfaces and method of manufacturing the same |
JP4058223B2 (ja) * | 1999-10-01 | 2008-03-05 | 日本碍子株式会社 | 圧電/電歪デバイス及びその製造方法 |
US6617762B2 (en) * | 2000-08-03 | 2003-09-09 | Nec Tokin Ceramics Corporation | Microactuator device with a countermeasure for particles on a cut face thereof |
JP3675315B2 (ja) * | 2000-08-24 | 2005-07-27 | Tdk株式会社 | ヘッド素子の微小位置決め用アクチュエータを備えたヘッドジンバルアセンブリ及び該ヘッドジンバルアセンブリを備えたディスク装置 |
US7068473B2 (en) * | 2001-01-22 | 2006-06-27 | Kinetic Ceramics, Inc. | Piezoelectric microactuator for improved tracking control of disk drive read/write heads |
WO2003067575A1 (en) * | 2002-02-02 | 2003-08-14 | Sae Magnetics (H. K.) Ltd. | Head gimbal assembly with precise positioning actuator for head element and disk drive apparatus with the head gimbal assembly |
-
2002
- 2002-06-05 CN CN02829081.XA patent/CN1288631C/zh not_active Expired - Fee Related
- 2002-06-05 WO PCT/CN2002/000392 patent/WO2003105131A1/en active Application Filing
- 2002-10-28 US US10/282,999 patent/US7065845B2/en not_active Expired - Fee Related
-
2004
- 2004-01-23 US US10/763,727 patent/US20040174093A1/en not_active Abandoned
- 2004-05-24 US US10/852,886 patent/US7225513B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
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CN1288631C (zh) | 2006-12-06 |
US7225513B2 (en) | 2007-06-05 |
WO2003105131A1 (en) | 2003-12-18 |
US20040174093A1 (en) | 2004-09-09 |
US20040211048A1 (en) | 2004-10-28 |
US20030227235A1 (en) | 2003-12-11 |
US7065845B2 (en) | 2006-06-27 |
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