CN1623900A - Ammonia refining method and refining device - Google Patents
Ammonia refining method and refining device Download PDFInfo
- Publication number
- CN1623900A CN1623900A CNA2004100617629A CN200410061762A CN1623900A CN 1623900 A CN1623900 A CN 1623900A CN A2004100617629 A CNA2004100617629 A CN A2004100617629A CN 200410061762 A CN200410061762 A CN 200410061762A CN 1623900 A CN1623900 A CN 1623900A
- Authority
- CN
- China
- Prior art keywords
- ammonia
- gas
- aforementioned
- moisture
- refining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 title claims abstract description 642
- 229910021529 ammonia Inorganic materials 0.000 title claims abstract description 232
- 238000007670 refining Methods 0.000 title claims abstract description 126
- 238000000034 method Methods 0.000 title claims abstract description 78
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 113
- 239000001301 oxygen Substances 0.000 claims abstract description 113
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 113
- 239000012535 impurity Substances 0.000 claims abstract description 101
- 239000003054 catalyst Substances 0.000 claims abstract description 91
- 238000004821 distillation Methods 0.000 claims abstract description 75
- 238000001179 sorption measurement Methods 0.000 claims abstract description 68
- 238000009835 boiling Methods 0.000 claims abstract description 61
- 238000001816 cooling Methods 0.000 claims abstract description 13
- 239000007789 gas Substances 0.000 claims description 168
- 238000000746 purification Methods 0.000 claims description 55
- 230000008929 regeneration Effects 0.000 claims description 49
- 238000011069 regeneration method Methods 0.000 claims description 49
- 238000003860 storage Methods 0.000 claims description 41
- 238000002309 gasification Methods 0.000 claims description 28
- 239000012071 phase Substances 0.000 claims description 25
- 238000010438 heat treatment Methods 0.000 claims description 20
- 239000007791 liquid phase Substances 0.000 claims description 16
- 230000008016 vaporization Effects 0.000 claims description 6
- 230000008676 import Effects 0.000 claims 1
- 238000011946 reduction process Methods 0.000 claims 1
- 239000002994 raw material Substances 0.000 abstract description 15
- 230000000694 effects Effects 0.000 abstract description 11
- 239000006200 vaporizer Substances 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 77
- 229910001868 water Inorganic materials 0.000 description 77
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 57
- 229910002091 carbon monoxide Inorganic materials 0.000 description 57
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 17
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 15
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 14
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 10
- 239000002808 molecular sieve Substances 0.000 description 9
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000001569 carbon dioxide Substances 0.000 description 7
- 229910002092 carbon dioxide Inorganic materials 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 150000002431 hydrogen Chemical class 0.000 description 6
- 239000003507 refrigerant Substances 0.000 description 6
- 239000003463 adsorbent Substances 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000007792 gaseous phase Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01C—AMMONIA; CYANOGEN; COMPOUNDS THEREOF
- C01C1/00—Ammonia; Compounds thereof
- C01C1/02—Preparation, purification or separation of ammonia
- C01C1/024—Purification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D1/00—Evaporating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D5/00—Condensation of vapours; Recovering volatile solvents by condensation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/26—Drying gases or vapours
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Drying Of Gases (AREA)
- Separation By Low-Temperature Treatments (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Separation Of Gases By Adsorption (AREA)
- Industrial Gases (AREA)
Abstract
Description
技术领域technical field
本发明涉及对含有各种杂质的粗氨气体进行精制的精制方法,更详细地讲,涉及提供半导体工业、化学工业、研究单位等必需的高纯度氨气的氨精制方法及其精制装置。The invention relates to a refining method for refining crude ammonia gas containing various impurities, and more specifically, relates to an ammonia refining method and a refining device for providing high-purity ammonia necessary for the semiconductor industry, chemical industry, and research institutes.
背景技术Background technique
氨一般经常用于半导体制造工业等,在制造现场使用由原料氨精制的氨。原料氨是氨生产厂合成的氨、或从使用现场回收的回收氨等。该原料氨中除了金属类外,还含有水、氢、氧、一氧化碳、二氧化碳、甲烷等的非金属杂质,为了在半导体制造等中使用,必须精制成高纯度的氨。Ammonia is generally used frequently in the semiconductor manufacturing industry and the like, and ammonia refined from raw material ammonia is used at the manufacturing site. Raw ammonia is ammonia synthesized by an ammonia production plant, or recycled ammonia recovered from the site of use, etc. This raw material ammonia contains non-metallic impurities such as water, hydrogen, oxygen, carbon monoxide, carbon dioxide, and methane in addition to metals, and must be refined into high-purity ammonia for use in semiconductor manufacturing and the like.
过去,已进行了各种除去上述原料氨中所含杂质的研究。例如,有关除去水分,专利文献1-特开平9-142833号公报公开了使氨与氧化钡接触而除去的方法。另外,对一氧化碳与二氧化碳,专利文献2-特开平6-107412号公报公开了使氨与镍催化剂接触而除去的方法。In the past, various studies have been conducted on the removal of impurities contained in the above raw material ammonia. For example, regarding the removal of water, Patent Document 1-JP-A-9-142833 discloses a method of removing water by bringing ammonia into contact with barium oxide. In addition, regarding carbon monoxide and carbon dioxide, Patent Document 2-JP-A-6-107412 discloses a method of removing ammonia by contacting it with a nickel catalyst.
然而,如上所述,因为原料氨中含有多种杂质,必须实施专利文献1或专利文献2等中提出的个别的物质除去方法。因此,产生精制氨需要许多精制工序的问题。即,为了高效率地得到大量的高纯度氨,必须连续进行精制。个别的精制工序多时,存在连续精制需要大规模精制设备的问题。However, as described above, since raw material ammonia contains many kinds of impurities, it is necessary to carry out the individual substance removal methods proposed in
发明内容Contents of the invention
本发明的第1个目的是提供不用多步的精制工序而可以高效率地除去原料氨中所含多种非金属杂质的氨精制方法及其精制装置。另外,第2个目的是提供尤其可以高效率地除去水与氧的杂质、有助于高效进行连续精制的氨精制方法及其精制装置。此外,第3个目的是提供高效率地除去多种的非金属杂质、可精制高纯度氨且可简化连续精制工序的氨精制方法及精制装置。A first object of the present invention is to provide an ammonia purification method and a purification apparatus thereof capable of efficiently removing various non-metallic impurities contained in raw ammonia without a multi-step purification process. In addition, the second object is to provide an ammonia purification method and a purification apparatus thereof which can efficiently remove impurities of water and oxygen and contribute to efficient continuous purification. In addition, a third object is to provide an ammonia purification method and a purification device that can efficiently remove various non-metallic impurities, can purify high-purity ammonia, and can simplify a continuous purification process.
本发明是为解决前述问题而完成的,本发明的第1方案是对含沸点比氨低的低沸点杂质气体的粗氨气体进行精制的方法,包括:在热交换器构成的蒸馏部导入前述粗氨气体后,利用前述热交换器的冷却作用将氨气液化,从前述蒸馏部将前述低沸点杂质气体直接进行气体状态排气,从前述粗氨气体中除去前述低沸点杂质气体。The present invention is completed in order to solve the aforementioned problems. The first scheme of the present invention is a method for refining crude ammonia gas containing low-boiling impurity gases with a boiling point lower than ammonia, including: introducing the aforementioned After the crude ammonia gas, the ammonia gas is liquefied by the cooling effect of the heat exchanger, and the low-boiling impurity gas is directly exhausted in a gaseous state from the distillation unit, and the low-boiling impurity gas is removed from the crude ammonia gas.
本发明的第2方案是前述第1方案的氨气精制方法,其中,在前述蒸馏部设置贮存液化的氨的液化氨贮存部,通过对该液化氨贮存部内的液化氨进行加热而排气除去残留于液化氨中的低沸点杂质。A second aspect of the present invention is the method for refining ammonia gas according to the first aspect, wherein a liquefied ammonia storage section for storing liquefied ammonia is provided in the distillation section, and the liquefied ammonia in the liquefied ammonia storage section is heated to exhaust and remove the liquefied ammonia. Low-boiling impurities remaining in liquefied ammonia.
本发明的第3方案是前述第1或2方案的氨气精制方法,其中,通过从前述液化氨贮存部排出液化氨并通过加热部而进行气化。A third aspect of the present invention is the method for purifying ammonia according to the first or second aspect, wherein the liquefied ammonia is discharged from the liquefied ammonia storage unit and passed through a heating unit to be vaporized.
本发明的第4方案是对至少含水分与氧的粗氨气体进行精制的方法,包括在吸附水分的水分吸附部和分离氧的催化剂部导入前述粗氨气体,从前述粗氨气体中除去水分与氧。A fourth aspect of the present invention is a method for purifying crude ammonia gas containing at least moisture and oxygen, comprising introducing the crude ammonia gas into a moisture adsorption unit that absorbs moisture and a catalyst unit that separates oxygen, and removing moisture from the crude ammonia gas. with oxygen.
本发明的第5方案是对至少含水分与氧的粗氨气体进行精制的方法,包括设置至少一对吸附水分的水分吸附部与分离氧的催化剂部,一方面,在一方的前述水分吸附部与前述催化剂部导入前述粗氨气体,从前述粗氨气体中除去水分与氧,另一方面,在另一方的前述水分吸附部与前述催化剂部通入还原气体进行再生。A fifth aspect of the present invention is a method for refining crude ammonia gas containing at least moisture and oxygen, including setting at least a pair of moisture adsorption parts for adsorbing moisture and a catalyst part for separating oxygen. The crude ammonia gas is introduced into the catalyst part, moisture and oxygen are removed from the crude ammonia gas, and on the other hand, a reducing gas is passed into the other moisture adsorption part and the catalyst part for regeneration.
本发明的第6方案是前述第5方案的氨气精制方法,其中,对于一对的前述水分吸附部与前述催化剂部的各部分,交替地反复进行前述粗氨气体的水分与氧的除去、和利用通入前述还原气体的再生而进行连续精制。A sixth aspect of the present invention is the method for purifying ammonia gas according to the aforementioned fifth aspect, wherein the removal of moisture and oxygen from the crude ammonia gas, And the continuous refining is carried out by the regeneration by feeding the aforementioned reducing gas.
本发明的第7方案,是对含水分、和沸点比氨低的低沸点杂质气体的粗氨气体进行精制的方法,包括第一除去工序、气化工序和第二除去工序,在所述第一除去工序中,在热交换器构成的蒸馏部导入前述粗氨气体,利用前述热交换器的冷却作用将氨气液化,从前述蒸馏部将前述低沸点杂质气体直接进行气体状态的排气,从前述粗氨气体中除去前述低沸点杂质气体,在所述气化工序中,从前述蒸馏部排出在前述蒸馏部液化的氨,通过加热部,使之气化,在所述第二除去工序中,在吸附水分的水分吸附部与分离氧的催化剂部导入前述气化工序中气化的氨气,从该氨气中除去水分与氧。The seventh aspect of the present invention is a method for refining crude ammonia gas containing moisture and a low-boiling impurity gas having a lower boiling point than ammonia, including a first removal step, a gasification step, and a second removal step. In a removal process, the aforementioned crude ammonia gas is introduced into the distillation section composed of a heat exchanger, the ammonia gas is liquefied by the cooling effect of the heat exchanger, and the aforementioned low-boiling point impurity gas is directly exhausted in a gaseous state from the aforementioned distillation section, The low-boiling-point impurity gas is removed from the crude ammonia gas. In the gasification step, the ammonia liquefied in the distillation part is discharged from the distillation part, passed through the heating part, and gasified. In the second removal step In the process, the ammonia gas gasified in the gasification step is introduced into the moisture adsorption part that absorbs moisture and the catalyst part that separates oxygen, and moisture and oxygen are removed from the ammonia gas.
本发明的第8方案是前述第7方案的氨气精制方法,其中包括第三除去工序,在所述第三除去工序中,设置贮存在前述第一除去工序已液化的氨的液化氨贮存部,通过对该液化氨贮存部内的液化氨进行加热而排气除去液化氨中残留的低沸点杂质,通过前述第三除去工序将液化氨导入前述气化工序,使之气化。An eighth aspect of the present invention is the ammonia gas purification method of the aforementioned seventh aspect, which includes a third removal step, and in the third removal step, a liquefied ammonia storage unit for storing ammonia liquefied in the first removal step is provided. , by heating the liquefied ammonia in the liquefied ammonia storage part and exhausting the gas to remove remaining low-boiling impurities in the liquefied ammonia, and introducing the liquefied ammonia into the aforementioned gasification step through the aforementioned third removal step to be vaporized.
本发明的第9方案是前述第7或第8方案的氨气精制方法,其中,前述第二除去工序包括除去处理和再生处理,在所述除去处理中,在至少设一对的前述水分吸附部与前述催化剂部的一方的前述水分吸附部与前述催化剂部导入前述气体工序中气化的氨气,从该氨气中除去水分与氧,在所述再生处理中,在另一方的前述水分吸附部与前述催化剂部通入还原气体进行再生。The ninth aspect of the present invention is the ammonia purification method of the aforementioned seventh or eighth aspect, wherein the aforementioned second removal process includes removal treatment and regeneration treatment, and in the removal treatment, at least one pair of aforementioned moisture adsorption The moisture adsorbing portion and the catalyst portion of one of the catalyst portion and the catalyst portion introduce the ammonia gas vaporized in the gas step to remove moisture and oxygen from the ammonia gas. The adsorption part and the aforementioned catalyst part are regenerated by introducing reducing gas.
本发明的第10方案是前述第9方案的氨气精制方法,其中,对于前述一对的前述水分吸附部与前述催化剂部的各部,交替地反复进行水分与氧的前述除去处理、和通入前述还原气体的前述再生处理而进行连续精制。A tenth aspect of the present invention is the method for purifying ammonia gas according to the ninth aspect, wherein the removal of moisture and oxygen and the introduction of the oxygen are alternately repeated for each of the pair of the aforementioned moisture adsorption section and the aforementioned catalyst section. Continuous refining is carried out in conjunction with the aforementioned regeneration treatment of the aforementioned reducing gas.
本发明的第11方案是前述第1~10任一种方案的氨气精制方法,其中,前述粗氨气体是将原料氨分离成液相与气相而得到的气相成分气体。An eleventh aspect of the present invention is the ammonia purification method according to any one of the first to tenth aspects, wherein the crude ammonia gas is a gaseous component gas obtained by separating raw ammonia into a liquid phase and a gaseous phase.
本发明的第12方案是对含沸点比氨低的低沸点杂质气体的粗氨气体进行精制的精制装置,具有导入前述粗氨气体后、利用冷却作用将氨气液化的热交换器构成的蒸馏部,在前述蒸馏部设将前述低沸点杂质气体直接进行气体状态排气的排气通路。A twelfth aspect of the present invention is a refining device for refining crude ammonia gas containing a low-boiling impurity gas having a boiling point lower than that of ammonia, and has a distillation unit composed of a heat exchanger that liquefies the ammonia gas by cooling after introducing the crude ammonia gas. In the distillation section, an exhaust passage for directly exhausting the low-boiling point impurity gas in a gaseous state is provided in the distillation section.
本发明的第13方案是前述第12方案的氨气精制装置,其中,前述蒸馏部包括贮存已液化的粗氨的液化氨贮存部和从前述液化氨贮存部内的液化氨中分离前述低沸点杂质气体的加热装置。A thirteenth aspect of the present invention is the ammonia purification device according to the twelfth aspect, wherein the distillation unit includes a liquefied ammonia storage unit for storing liquefied crude ammonia and separates the low-boiling-point impurities from the liquefied ammonia in the liquefied ammonia storage unit. Gas heating device.
本发明的第14方案是前述第12或13的方案的氨气精制装置,其中,具有使前述蒸馏部排出的液化氨气化的气化装置。A fourteenth aspect of the present invention is the ammonia purification device according to the twelfth or thirteenth aspect, further comprising a vaporizer for vaporizing the liquefied ammonia discharged from the distillation unit.
本发明的第15方案是对至少含水分与氧的粗氨气体进行精制的精制装置,具有吸附水分的水分吸附部和分离氧的催化剂部,在前述水分吸附部与前述催化剂部导入前述粗氨气体,从前述粗氨气体中除去水分与氧。A fifteenth aspect of the present invention is a refining device for refining crude ammonia gas containing at least moisture and oxygen, comprising a moisture adsorption unit for absorbing moisture and a catalyst unit for separating oxygen, and the crude ammonia is introduced into the moisture adsorption unit and the catalyst unit. Gas, remove moisture and oxygen from the aforementioned crude ammonia gas.
本发明的第16方案是对至少含水分与氧的粗氨气体进行精制的精制装置,具有至少一对吸附水分的水分吸附部与分离氧的催化剂部,设有向各个的前述水分吸附部与前述催化剂部导入前述粗氨气体的粗氨气体导入通路和向各个的前述水分吸附部与前述催化剂部导入还原气体的还原气体导入通路,在一方的前述水分吸附部与前述催化剂部通过前述粗氨气体导入通路导入前述粗氨气体,从前述粗氨气体中除去水分与氧,另一方面,在另一方的前述水分吸附部与前述催化剂部通过前述还原气体导入通路通入还原气体进行再生。A sixteenth aspect of the present invention is a refining device for refining crude ammonia gas containing at least moisture and oxygen, which has at least a pair of moisture adsorption parts for adsorbing moisture and a catalyst part for separating oxygen, and is provided with an The catalyst part introduces a crude ammonia gas introduction passage for introducing the crude ammonia gas, and a reducing gas introduction passage for introducing a reducing gas into each of the moisture adsorption part and the catalyst part, and the crude ammonia passes through one of the moisture adsorption part and the catalyst part. The crude ammonia gas is introduced into the gas introduction passage to remove moisture and oxygen from the crude ammonia gas, and on the other hand, a reducing gas is introduced into the other moisture adsorption part and the catalyst part through the reducing gas introduction passage for regeneration.
本发明的第17方案是前述第16方案的氨气精制装置,具有控制前述粗氨气体导入通路与还原气体导入通路的开关的连续精制控制部,使得对于一对的前述水分吸附部与前述催化剂部的各部交替地反复进行前述粗氨气体的水分与氧的除去、和通入前述还原气体的再生。A seventeenth aspect of the present invention is the ammonia purification device according to the sixteenth aspect, which has a continuous refining control unit that controls the switching of the crude ammonia gas introduction passage and the reducing gas introduction passage, so that the pair of the moisture adsorption unit and the catalyst Removal of moisture and oxygen from the crude ammonia gas and regeneration by introducing the reducing gas are repeated alternately in each part.
本发明的第18方案是对含水分以及沸点比氨低的低沸点杂质气体的粗氨气体进行精制的精制装置,具有导入前述粗氨气体后利用冷却作用将氨气进行液化的热交换器构成的蒸馏部、设在前述蒸馏部的将前述低沸点杂质气体直接进行气体状态排气的排气通路、使前述蒸馏部排出的液化氨气化的气化装置、吸附水分的水分吸附部、分离氧的催化剂部、和将利用前述气化装置气化的氨气导入前述水分吸附部与前述催化剂部的氨气导入通路。An eighteenth aspect of the present invention is a refining device for refining crude ammonia gas containing moisture and a low-boiling impurity gas having a lower boiling point than ammonia, and has a heat exchanger configuration for liquefying the ammonia gas by cooling after introducing the crude ammonia gas. The distillation section of the distillation section, the exhaust passage provided in the distillation section to directly exhaust the low-boiling impurity gas in a gaseous state, the gasification device for vaporizing the liquefied ammonia discharged from the distillation section, the moisture adsorption section for absorbing moisture, and the separation A catalyst part for oxygen, and an ammonia gas introduction passage for introducing ammonia gas vaporized by the gasification device into the moisture adsorption part and the catalyst part.
本发明的第19方案是前述第18方案的氨气精制装置,其中,在前述蒸馏部设置贮存前述蒸馏部液化的粗氨的液化氨贮存部,前述液化氨贮存部包括用于分离残留于前述液化氨贮存部内的液化氨中的低沸点杂质的加热装置。A nineteenth aspect of the present invention is the ammonia purification device according to the eighteenth aspect, wherein a liquefied ammonia storage section for storing the crude ammonia liquefied in the distillation section is provided in the distillation section, and the liquefied ammonia storage section includes A heating device for low-boiling-point impurities in liquefied ammonia in the liquefied ammonia storage unit.
本发明的第20方案是前述第18或19方案的氨气精制装置,其中,具有至少一对前述水分吸附部与前述催化剂部,在各个的前述水分吸附部与前述催化剂部设置导入用前述气化装置气化的氨气的前述氨气导入通路,且在各个的前述水分吸附部与前述催化剂部设置导入还原气体的还原气体导入通路,在一方的前述水分吸附部与前述催化剂部通过前述氨气导入通路导入前述气化的氨气,从该氨气中除去水分与氧,另一方面在另一方的前述水分吸附部与前述催化剂部通过前述还原气体导入通路通入还原气体进行再生。A twentieth aspect of the present invention is the ammonia purification device according to the eighteenth or nineteenth aspect, wherein at least one pair of the aforementioned moisture adsorption unit and the aforementioned catalyst unit are provided, and the aforementioned gas for introduction is provided in each of the aforementioned moisture adsorption unit and the aforementioned catalyst unit. The ammonia gas introduction passage for the ammonia gas vaporized by the gasification device is provided, and a reducing gas introduction passage for introducing a reducing gas is provided in each of the moisture adsorption part and the catalyst part, and the ammonia is passed through one of the moisture adsorption part and the catalyst part. The gas introduction passage introduces the vaporized ammonia gas, removes moisture and oxygen from the ammonia gas, and regenerates the other moisture adsorbing part and the catalyst part by passing a reducing gas through the reducing gas introduction passage.
本发明的第21方案是前述第20方案的氨气精制装置,其中,具有控制前述氨气导入通路与前述还原气体导入通路的开关的连续精制控制部,使得对于一对的前述水分吸附部与前述催化剂部的各部交替地反复进行前述粗氨气体的水分与氧的除去、和通入前述还原气体的再生。A twenty-first aspect of the present invention is the ammonia purification device according to the twenty-first aspect, wherein a continuous purification control unit for controlling the switching of the ammonia gas introduction passage and the reducing gas introduction passage is provided so that the pair of the moisture adsorption unit and the Removal of moisture and oxygen from the crude ammonia gas and regeneration by passing the reducing gas are alternately repeated in each part of the catalyst part.
本发明的第22方案是前述第12~21方案的任一项的氨气精制装置,其中,前述粗氨气体是通过将原料氨分离成液相与气相得到的气相成分气体。A twenty-second aspect of the present invention is the ammonia purification device according to any one of the twelfth to twenty-first aspects, wherein the crude ammonia gas is a gas-phase component gas obtained by separating raw ammonia into a liquid phase and a gas phase.
若采用本发明第1方案的氨气精制方法,则可在热交换器构成的蒸馏部导入粗氨气体后,利用前述热交换器的冷却作用将氨气液化,通过从前述蒸馏部将沸点比氨低的低沸点杂质气体直接进行气体状态的排气,从前述粗氨气体中除去前述低沸点杂质气体。If adopt the ammonia purification method of the first scheme of the present invention, then can after the distillation part that heat exchanger constitutes introduces crude ammonia gas, utilize the cooling action of aforementioned heat exchanger to ammonia gas is liquefied, by boiling point ratio from the aforementioned distillation part The low-boiling-point impurity gas low in ammonia is directly exhausted in a gaseous state, and the low-boiling-point impurity gas is removed from the crude ammonia gas.
此外,本发明中的粗氨气体是气体状态的原料氨。另外,上述沸点比氨低的低沸点杂质气体是含在粗氨气中的氢(H2)、氧(O2)、一氧化碳(CO)、二氧化碳(CO2)、氮(N2)、甲烷(CH4)等。In addition, the rough ammonia gas in this invention is raw material ammonia of a gaseous state. In addition, the above-mentioned low-boiling impurity gas having a boiling point lower than that of ammonia is hydrogen (H 2 ), oxygen (O 2 ), carbon monoxide (CO), carbon dioxide (CO 2 ), nitrogen (N 2 ), methane (CH 4 ) etc.
若采用本发明第2方案的精制方法,可在前述第1方案中,在前述蒸馏部设贮存液化了的氨的液化氨贮存部,通过对该液化氨贮存部内的液化氨进行加热,可以排气除去残留于液化氨中的低沸点杂质,可以精制更高纯度的氨。If the refining method of the second aspect of the present invention is adopted, in the aforementioned first aspect, a liquefied ammonia storage part for storing liquefied ammonia can be set in the aforementioned distillation part, and the liquefied ammonia in the liquefied ammonia storage part can be heated to discharge the liquefied ammonia. The low-boiling impurities remaining in the liquefied ammonia can be removed by using gas, so that higher-purity ammonia can be refined.
若采用本发明第3方案的精制方法,在前述第1或第2方案中,由于从前述液化氨贮存部排出液化氨后,再通过加热部使之气化,故可以呈气体状态排出前述第1或第2方案中高纯度精制的氨,供给连续工序。If the refining method of the third aspect of the present invention is adopted, in the aforementioned first or second aspect, after the liquefied ammonia is discharged from the aforementioned liquefied ammonia storage part, it is then gasified by the heating part, so the aforementioned first ammonia can be discharged in a gaseous state. The high-purity refined ammonia in the 1st or 2nd scheme is supplied to the continuous process.
若采用本发明第4方案的精制方法,可以在吸附水分的水分吸附部和分离氧的催化剂部导入粗氨气体,从前述粗氨气体中至少除去作为非金属杂质的水分与氧。此外,本发明的催化剂部,例如若使用镍催化剂,不仅除去氧,而且也可以除去一氧化碳(CO)。该镍催化剂的使用在以下本发明的实施方案的催化剂部也发挥同样的除去效果。另外,作为用于本发明水分吸附部的水分吸附剂,优选是分子筛、活性氧化铝等。According to the purification method according to the fourth aspect of the present invention, crude ammonia gas can be introduced into the moisture adsorption section for absorbing moisture and the catalyst section for separating oxygen, and at least moisture and oxygen as non-metallic impurities can be removed from the crude ammonia gas. In addition, in the catalyst part of the present invention, for example, if a nickel catalyst is used, not only oxygen but also carbon monoxide (CO) can be removed. The use of this nickel catalyst exhibits the same removal effect also in the catalyst part of the following embodiment of the present invention. In addition, molecular sieves, activated alumina, and the like are preferable as the moisture adsorbent used in the moisture adsorbing portion of the present invention.
若采用本发明第5方案的精制方法,由于设至少一对吸附水分的水分吸附部与分离氧的催化剂部,在一方的前述水分吸附部与前述催化剂部导入粗氨气体,从前述粗氨气体中至少除去作为非金属杂质的水分与氧,另一方面,在另一方的前述水分吸附部与前述催化剂部通入还原气体进行再生,因此可以利用再生作业不中断地、连续进行水分与氧的除去处理,可以提高高纯度氨的精制效率。作为再生使用的还原气体,使用氢与氮的混合气或氢与自精制氨气的混合气。If the refining method of the fifth aspect of the present invention is adopted, since at least one pair of moisture adsorption section for absorbing moisture and a catalyst section for separating oxygen are set, crude ammonia gas is introduced into one of the aforementioned moisture adsorption section and the aforementioned catalyst section, and the crude ammonia gas is obtained from the aforementioned crude ammonia gas. At least moisture and oxygen as non-metallic impurities are removed in the medium, and on the other hand, a reducing gas is passed through the other aforementioned moisture adsorption portion and the aforementioned catalyst portion for regeneration, so the regeneration of moisture and oxygen can be performed continuously without interruption. Removing the treatment can improve the refining efficiency of high-purity ammonia. As the reducing gas used for regeneration, a mixed gas of hydrogen and nitrogen or a mixed gas of hydrogen and self-refined ammonia is used.
若采用本发明第6方案的精制方法,由于在前述第5方案中对一对的前述水分吸附部与前述催化剂部的各部交替地反复进行前述粗氨气体的水分与氧的除去、和前述通入还原气体的再生进行连续精制,故可以大量精制高纯度氨。If the purification method of the sixth aspect of the present invention is adopted, in the aforementioned fifth aspect, the removal of moisture and oxygen of the aforementioned crude ammonia gas and the aforementioned passage are repeated alternately to each part of the pair of the aforementioned moisture adsorption portions and the aforementioned catalyst portions. Continuous refining is carried out through the regeneration of the incoming reducing gas, so a large amount of high-purity ammonia can be refined.
若采用本发明第7方案的精制方法,由于包括第一除去工序、气化工序和第二除去工序,在所述第一除去工序中,在热交换器构成的蒸馏部导入含有水分以及沸点比氨低的低沸点杂质气体的粗氨气体,利用前述热交换器的冷却作用将氨气液化,从前述蒸馏部对前述低沸点杂质气体直接进行气体状态的排气,从前述粗氨气体中除去前述低沸点杂质气体,在所述气化工序中,从前述蒸馏部排出在前述蒸馏部液化的氨,使之通过加热部而气化,在所述第二除去工序中,在吸附水分的水分吸附部与分离氧的催化剂部导入前述气化工序气化的氨气,从该氨气中除去水分与氧,故可以利用前述第一除去工序除去沸点比氨低的低沸点杂质气体,又可以经前述气化工序利用前述第二除去工序除去水分与氧,可实现杂质的连续处理工序,精制更高纯度的氨。If the refining method of the seventh aspect of the present invention is adopted, since the first removal step, the gasification step and the second removal step are included, in the first removal step, the distillation part containing water and boiling point ratio is introduced into the distillation part composed of a heat exchanger. The crude ammonia gas of the low-boiling point impurity gas with low ammonia is liquefied by the cooling effect of the heat exchanger, and the low-boiling impurity gas is directly exhausted in a gaseous state from the distillation part to remove it from the crude ammonia gas. In the gasification step, the low-boiling point impurity gas is discharged from the distillation unit to discharge ammonia liquefied in the distillation unit, and is vaporized by passing through the heating unit. The adsorption part and the catalyst part for separating oxygen introduce the ammonia gas gasified in the aforementioned gasification step, and remove moisture and oxygen from the ammonia gas, so that the first removal step can be used to remove low-boiling impurity gases with a lower boiling point than ammonia, or Water and oxygen are removed by the second removal step through the aforementioned gasification step, and the continuous treatment of impurities can be realized to refine higher-purity ammonia.
若采用本发明第8方案的精制方法,由于在前述第7方案中包括设置贮存在前述第一除去工序中液化的氨的液化氨贮存部、通过将该液化氨贮存部内的液化氨进行加热而排气除去残留于液化氨中的低沸点杂质的第三除去工序,通过前述第三除去工序将液化氨导入前述气化工序而使之气化,故也可以利用前述第三除去工序除去经前述第一除去工序而残留的低沸点杂质,还可以提高精制纯度。If the purification method according to the eighth aspect of the present invention is adopted, since the above-mentioned seventh aspect includes providing a liquefied ammonia storage part for storing the ammonia liquefied in the first removal step, and heating the liquefied ammonia in the liquefied ammonia storage part. The third removal process of removing the low-boiling point impurities remaining in the liquefied ammonia by exhaust gas, the liquefied ammonia is introduced into the aforementioned gasification process through the aforementioned third removal process to make it gasified, so the aforementioned third removal process can also be used to remove the The low-boiling point impurities remaining in the first removal step can also improve the purification purity.
若采用本发明第9方案的精制方法,在前述第7或8的方案中,前述第二除去工序包括在至少设一对的前述水分吸附部与前述催化剂部的一方的前述水分吸附部与前述催化剂部导入前述气化工序气化的氨气并从该氨气中除去水分与氧的除去处理、和在另一方的前述水分吸附部与前述催化剂部通入还原气体进行再生的再生处理,故前述第二除去工序中,通过进行至少一方的前述水分吸附部与前述催化剂部的再生处理,利用再生作业不中断从前述第1到第二除去工序的连续工序,可连续精制。According to the purification method according to the ninth aspect of the present invention, in the aforementioned seventh or eighth aspect, the aforementioned second removal step includes at least one pair of the aforementioned moisture adsorbing portion and the aforementioned catalyst portion being provided in the aforementioned moisture adsorbing portion and the aforementioned The catalyst part introduces the ammonia gas gasified in the gasification step to remove moisture and oxygen from the ammonia gas, and the regeneration process passes a reducing gas into the other moisture adsorption part and the catalyst part to regenerate. In the second removal step, by regenerating at least one of the moisture adsorption unit and the catalyst unit, continuous purification is possible without interrupting the continuous steps from the first to second removal steps by the regeneration operation.
若采用本发明第10方案的精制方法,由于在前述第9方案中对前述一对的前述水分吸附部与前述催化剂部的各部交替地反复进行水分与氧的前述除去处理和前述通入还原气体的前述再生处理而进行连续精制,故可大量精制高纯度氨。If the purification method according to the tenth aspect of the present invention is adopted, in the aforementioned ninth aspect, the aforementioned removal of moisture and oxygen and the aforementioned introduction of the reducing gas are repeated alternately to each part of the aforementioned pair of the aforementioned moisture adsorption portions and the aforementioned catalyst portions. Continuous refining is carried out through the aforementioned regeneration treatment, so a large amount of high-purity ammonia can be refined.
若采用本发明第11方案的精制方法,由于前述粗氨气体使用将原料氨分离成液相与气相得到的气相成分气体,故利用液相大量含水分与金属类杂质的性质,以水分与金属类杂质部分含量极少的气相氨作为精制起始原料,通过实施前述第1~10任一种方案的精制方法进行精制处理,可以精制更高纯度的氨。If the refining method of the eleventh scheme of the present invention is adopted, since the aforementioned crude ammonia gas uses the gaseous phase component gas obtained by separating the raw material ammonia into a liquid phase and a gaseous phase, the liquid phase contains a large amount of water and metal impurities, and the water and metal Gas-phase ammonia with a very small content of quasi-impurity parts is used as the starting material for refining, and ammonia with higher purity can be refined by implementing the refining method of any one of the above-mentioned
若采用本发明第12方案的氨气精制装置,在热交换器构成的蒸馏部导入粗氨气体后,利用前述热交换器的冷却作用将氨气液化,通过前述排气通路从前述蒸馏部将沸点比氨低的低沸点杂质气体直接进行气体状态的排气,可以从前述粗氨气体中除去低沸点杂质气体。If the ammonia refining device of the twelfth aspect of the present invention is adopted, after the crude ammonia gas is introduced into the distillation part constituted by the heat exchanger, the ammonia gas is liquefied by the cooling action of the heat exchanger, and the ammonia gas is liquefied from the distillation part through the exhaust passage. The low-boiling impurity gas having a boiling point lower than that of ammonia is directly exhausted in a gaseous state, and the low-boiling impurity gas can be removed from the crude ammonia gas.
若采用本发明第13方案的精制装置,在前述第12方案中,在前述蒸馏部设贮存已液化氨的液化氨贮存部,通过使用前述加热装置对该液化氨贮存部内的液化氨进行加热,可以排气除去残留于液化氨中的低沸点杂质,精制更高纯度的氨。According to the refining device according to the thirteenth aspect of the present invention, in the aforementioned twelfth aspect, a liquefied ammonia storage section for storing liquefied ammonia is provided in the distillation section, and the liquefied ammonia in the liquefied ammonia storage section is heated by using the heating device, The low-boiling impurities remaining in the liquefied ammonia can be removed by exhaust gas, and higher-purity ammonia can be refined.
若采用本发明第14方案的精制装置,由于从前述液化氨贮存部排出液化氨后,使用前述气化装置使液化氨气化,故前述第12或13的方案可以采用气体状态排出高纯度精制的氨,可供给连续工序。If the refining device of the fourteenth aspect of the present invention is adopted, after the liquefied ammonia is discharged from the aforementioned liquefied ammonia storage part, the aforementioned gasification device is used to gasify the liquefied ammonia, so the aforementioned twelfth or thirteenth aspect can be used to discharge high-purity refined ammonia in a gaseous state. The ammonia can be supplied to the continuous process.
若采用本发明第15方案的精制装置,可以在吸附水分的水分吸附部与分离氧的催化剂部导入粗氨气体,从前述粗氨气体中至少除去作为非金属杂质的水分与氧。According to the purification device according to the fifteenth aspect of the present invention, the crude ammonia gas can be introduced into the moisture adsorption part for absorbing moisture and the catalyst part for separating oxygen, and at least moisture and oxygen as non-metallic impurities can be removed from the crude ammonia gas.
若采用本发明第16方案的精制装置,设至少一对吸附水分的水分吸附部与分离氧的催化剂部,在一方的前述水分吸附部与前述催化剂部通过前述粗氨气体导入通路导入粗氨气体,从前述粗氨气体中至少除去作为非金属杂质的水分与氧,另一方面在另一方的前述水分吸附部与前述催化剂部通过前述还原气体导入通路通入还原气体进行再生,故可利用再生作业不中断地连续进行水分与氧的除去处理,提高高纯度氨的精制效率。According to the refining device according to the sixteenth aspect of the present invention, at least one pair of moisture adsorption unit for absorbing moisture and catalyst unit for separating oxygen are provided, and crude ammonia gas is introduced into one of the moisture adsorption unit and the catalyst unit through the crude ammonia gas introduction passage. , remove at least moisture and oxygen as non-metallic impurities from the aforementioned crude ammonia gas, and on the other hand, regenerate by passing a reducing gas into the other aforementioned moisture adsorbing part and the aforementioned catalyst part through the aforementioned reducing gas introduction path, so regeneration can be used. The removal of moisture and oxygen is carried out continuously without interruption, improving the efficiency of refining high-purity ammonia.
若采用本发明第17方案的精制装置,在前述第16方案中,通过利用前述连续精制控制部控制前述粗氨气体导入通路与前述还原气体导入通路的开关,可以对一对的前述水分吸附部与前述催化剂部的各部,交替地反复进行前述粗氨气体的水分与氧的除去和通入前述还原气体的再生而连续进行精制,实现高纯度氨的大量精制。According to the refining device according to the 17th aspect of the present invention, in the aforementioned 16th aspect, by using the aforementioned continuous refining control section to control the switching of the aforementioned rough ammonia gas introduction passage and the aforementioned reducing gas introduction passage, the pair of aforementioned moisture adsorption sections can Removal of moisture and oxygen from the crude ammonia gas and regeneration by passing the reducing gas are repeated alternately with each part of the catalyst part, and continuous purification is carried out to realize large-scale purification of high-purity ammonia.
若采用本发明第18方案的精制装置,通过前述蒸馏部、和设于前述蒸馏部的将前述低沸点杂质气体直接进行气体状态排气的前述排气通路,将含水分与沸点比氨低的低沸点杂质气体的粗氨气体液化,可以从前述蒸馏部将前述低沸点杂质气体直接进行气体状态的排气除去,另外,由于通过前述氨气导入通路将使用前述气化装置将液化氨气化的氨气导入前述水分吸附部与前述催化剂部,可以从该氨气中除去水分与氧,因此可实现杂质的连续处理工序,可以精制更高纯度的氨。If the refining device according to the eighteenth aspect of the present invention is adopted, through the aforementioned distillation section and the aforementioned exhaust passage provided in the aforementioned distillation section, the aforementioned low-boiling point impurity gas is directly exhausted in a gaseous state, and the gas containing moisture and a boiling point lower than ammonia is exhausted. Crude ammonia gas liquefaction of low-boiling point impurity gas can directly remove the above-mentioned low-boiling point impurity gas from the gaseous state from the above-mentioned distillation part. In addition, since the liquefied ammonia is vaporized by using the above-mentioned gasification device through the above-mentioned ammonia gas introduction passage The ammonia gas is introduced into the moisture adsorption part and the catalyst part, and moisture and oxygen can be removed from the ammonia gas, so that the continuous treatment process of impurities can be realized, and higher purity ammonia can be refined.
若采用本发明第19方案的精制装置,在前述第18方案中,设置贮存已液化的氨的液化氨贮存部,通过使用前述加热装置对该液化氨贮存部内的液化氨进行加热,可以分离除去残留于液化氨中的低沸点杂质,故可以提高精制纯度。According to the refining device according to the nineteenth aspect of the present invention, in the above-mentioned eighteenth aspect, a liquefied ammonia storage part for storing liquefied ammonia is provided, and the liquefied ammonia in the liquefied ammonia storage part can be separated and removed by using the aforementioned heating device. Low-boiling impurities remaining in liquefied ammonia, so it can improve the purity of refining.
若采用本发明第20方案的精制装置,在前述第18或19方案中,由于在至少设一对的前述水分吸附部与前述催化剂部的一方的前述水分吸附部与前述催化剂部通过前述氨气导入通路导入前述气化装置气化的氨气,从该氨气中除去水分与氧,在另一方的前述水分吸附部与前述催化剂部通过前述还原气体导入通路通入还原气体进行再生,因此可以与利用一方的前述水分吸附部与前述催化剂部的除去处理并行地,进行另一方的前述水分吸附部与前述催化剂部的再生处理,可以不中断采用再生作业的除去工序而连续精制。According to the refining device according to the twentieth aspect of the present invention, in the aforementioned eighteenth or nineteenth aspect, since the aforementioned moisture adsorption portion and the aforementioned catalyst portion of one of the at least one pair of the aforementioned moisture adsorption portion and the aforementioned catalyst portion are provided with the aforementioned ammonia gas The introduction passage introduces the ammonia gas vaporized by the gasification device, removes moisture and oxygen from the ammonia gas, and regenerates the other moisture adsorption part and the catalyst part by passing a reducing gas through the reducing gas introduction passage. In parallel with the removal treatment by one of the moisture adsorption unit and the catalyst unit, the regeneration treatment of the other moisture adsorption unit and the catalyst unit is performed, so that continuous purification can be performed without interrupting the removal process by regeneration.
若采用本发明第21方案的精制装置,前述第20方案中,通过利用前述连续精制控制部控制前述粗氨气体导入通路与前述还原气体导入通路的开关,可以对一对的前述水分吸附部与前述催化剂部的各部,交替地反复进行前述粗氨气体的水分与氧的除去和通入前述还原气体的再生而连续进行精制,可以实现高纯度氨的大量精制。According to the refining device according to the twenty-first aspect of the present invention, in the twenty-first aspect, by using the continuous refining control section to control the switch of the crude ammonia gas introduction passage and the reduction gas introduction passage, it is possible to control the pair of the moisture adsorption section and the reducing gas introduction passage. Each part of the catalyst part alternately repeats the removal of moisture and oxygen from the crude ammonia gas and the regeneration by passing the reducing gas into it for continuous purification, so that a large amount of high-purity ammonia can be purified.
本发明的第22方案,由于前述粗氨气体使用将原料氨分离成液相与气相得到的气相成分气体,故利用液相大量含水分与金属类杂质的性质,以水分与金属类杂质部分含量极少的气相氨作为精制起始原料,通过实施前述第12~21任一种方案的精制方法进行精制处理,可以精制更高纯度的氨。In the 22nd scheme of the present invention, since the above-mentioned crude ammonia gas uses the gas phase component gas obtained by separating the raw material ammonia into a liquid phase and a gas phase, it utilizes the property that the liquid phase contains a large amount of water and metal impurities, and the partial content of water and metal impurities Very little gas-phase ammonia is used as a refining starting material, and ammonia of higher purity can be refined by implementing the refining method of any one of the aforementioned 12th to 21st schemes for refining treatment.
附图说明Description of drawings
图1是本发明精制装置的简要构成图。Fig. 1 is a schematic configuration diagram of a refining apparatus of the present invention.
图2是本发明另一个精制装置的简要构成图。Fig. 2 is a schematic configuration diagram of another refining device of the present invention.
图3是本发明又一个精制装置的简要构成图。Fig. 3 is a schematic configuration diagram of still another refining device of the present invention.
图4是说明本发明精制效果用的杂质浓度分析图。Fig. 4 is an analysis chart of impurity concentration for illustrating the refining effect of the present invention.
图5是说明图3的精制装置中的适宜氨使用状态的氨用量-气相水分浓度分布图。Fig. 5 is a distribution diagram of ammonia usage amount-gas phase water concentration for explaining an appropriate ammonia usage state in the refining apparatus of Fig. 3 .
具体实施方式Detailed ways
以下,根据附图对本发明的氨精制方法与精制装置的实施方案详细地进行说明。Hereinafter, embodiments of the ammonia purification method and purification apparatus of the present invention will be described in detail with reference to the drawings.
根据图1对本发明的从粗氨中除去低沸点杂质的精制装置及其精制方法进行说明。图1是本实施方案精制装置的简要构成图。原料氨装在液体氨容器1中,其气相部12的氨气成为被精制用粗氨气。该原料氨分离成液相部11与气相部12,由于该液相、气相分离,故含于原料氨中的水分与金属类杂质基本上残留在液相部11中。因此,该液相、气相分离得到的气相部12的氨,由于水分与金属类杂质成为预除去的状态,故在这种状态下转移到精制工序,作为起始原料氨,是适合于更高纯度精制使用的原料。Referring to FIG. 1 , a refining device and a refining method for removing low-boiling impurities from crude ammonia according to the present invention will be described. Fig. 1 is a schematic configuration diagram of a refining apparatus according to this embodiment. The raw material ammonia is contained in the
除去含于粗氨气体中的多种非金属杂质用的蒸馏塔2,由设在该塔上部的热交换器31构成的蒸馏部3、设于中间部的气体流入部7及设于下部的液化氨贮存部8构成。蒸馏部3的热交换器31通过冷媒供给循环路41、42连接冷媒循环装置4,向热交换器31循环供给冷媒。冷媒使用乙二醇等,使用设于冷媒循环装置4上的温度传感器监测系统(没有图示),将热交换器31内保持在-5℃~+10℃。热交换器31的许多气体通路32在气体流入部7与蒸馏塔2最上部空间6之间连通形成。气体流入部7通过气体供给通路9与液体氨容器1的气相部12连通,通过气体供给通路9供给来自气相部12的粗氨气体。由于供给气体流入部7的粗氨气体进入气体通路32,利用热交换器31与冷媒循环装置4的冷却作用被液化,故在蒸馏塔2最下部的液化氨贮存部8形成液滴落下,液化氨被贮存下来。另一方面,在最上部空间6,蒸馏部3的粗氨液化时,沸点低的杂质气体与一部分氨气一起堆积,通过设于最上部空间6的排气通路10,利用排气装置(没图示)进行排气,所以可排出杂质气体。此时,堆积在最上部空间6的杂质气体主要是氢(H2)、氧(O2)、一氧化碳(CO)、二氧化碳(CO2)、氮(N2)、甲烷(CH4)等。A
若采用上述的蒸馏部3,由于将粗氨气体液化,边使液化氨81贮存在液化氨贮存部8,边使沸点比氨低的含非金属杂质作为气体进行分离,因此最上部空间6可以分离回收杂质气体,可以一次除去多种的杂质。所以不需要对氢、氧、一氧化碳、二氧化碳、氮、甲烷等的杂质的分别的除去工序,可以采用单一的蒸馏塔2简单且高效率地实现氨的高纯化。If the above-mentioned
蒸馏塔2还具有实现氨高纯化的残留杂质排气功能。即,液化氨贮存部8中内设使温水循环装置5供给的温水在贮存部内循环的温水循环配管13。利用设于温水循环装置5的温度传感器监测系统(没图示)将温水保持在30℃-50℃,利用该温水循环在温水循环配管13表面产生沸腾(气化)。因此,蒸馏部3中的粗氨液化时残留的杂质与液体氨分离后,排到气体流入部7侧,最后在最上部空间6被回收。The
由于把利用上述的温水循环装置5与温水循环配管13构成的加热装置的加热功能赋予液化氨贮存部8,因此也可以除去残留于被蒸馏部3液化的氨中的杂质,可进一步提高氨的精制纯度。Since the heating function of the heating device composed of the above-mentioned warm
贮存在液化氨贮存部8的液体氨通过排出通路14排到气化部15侧。气化部15配设在温水槽16内。温水槽16中内设加热器18,利用恒温控制部17控制在30℃~100℃的温水状态。因此,通过排出通路14排出的液体氨在气化部15,受到温水槽16构成的气化装置的气化作用,返回气体状态。可利用排气装置(没图示)经气化部15将该再气化的精制后的氨气排出,得到高纯度的氨气。The liquid ammonia stored in the liquefied
以下,根据图2对可高效地除去含于粗氨中的水分与氧的精制装置及其精制方法进行说明。图2是本实施方案精制装置的简要构成图。本实施方案的精制装置由一对的水、氧、一氧化碳除去部20、21构成。水、氧、一氧化碳除去部20、21分别具有水分除去部22与催化剂部23、水分除去部24与催化剂部25。水分除去部22、24中填充吸附水分的结晶性沸石组成的分子筛。水分除去部22、24利用分子筛的吸附作用进行水分的除去。作为水分吸附剂,除了分子筛以外,也可以使用活性氧化铝等的水分吸附剂。催化剂部23、25中填充镍催化剂。催化剂部23、25中利用镍催化剂的化学吸附作用吸附除去氧与一氧化碳。利用镍催化剂除去氧与一氧化碳杂质通过以下的化学反应进行。Hereinafter, a refining device capable of efficiently removing moisture and oxygen contained in crude ammonia and a refining method thereof will be described with reference to FIG. 2 . Fig. 2 is a schematic configuration diagram of a refining device according to this embodiment. The refining device of this embodiment is constituted by a pair of water, oxygen, and carbon
各水、氧、一氧化碳除去部20、21形成水分除去部与催化剂部的2层分离结构。例如,使氨精制量为3N(标准状态)m3/h时,内径43mm的筒内,在各水分除去部填充分子筛0.3kg(填充高度:300mm)。而,在各催化剂部填充镍催化剂0.8kg(填充高度:500mm)。另外,在这些分子筛与镍催化剂的填充状态下按0.17m/s的流速通入氨气时,与催化剂部、水分除去部中各吸附剂的接触时间是约3秒、1.77秒。此外,将水、氧、一氧化碳除去部20、21制成使水分吸附剂与镍催化剂混合的单一混成结构,也可得到同样的吸附效果。Each of the water, oxygen, and carbon
各水、氧、一氧化碳除去部20、21,通过粗氨气体导入通路51,分别由导入通路29、30,导入来自液体氨容器50的气相氨气。液体氨容器50是与图1实施方案中使用的液体氨容器1同样的结构,将原料氨进行液相、气相分离得到的水分与金属类杂质少的气相氨气作为被精制气体使用。The respective water, oxygen, and carbon
本装置中,精制工序(下部→上部)与再生工序(上部→下部)的气体的流动方向设计成逆向。但,再生工序也可与精制工序同样地采用下部→上部进行。符号56、58、59表示通往水、氧、一氧化碳除去部20、21的氨气的气体导入侧开关阀。另外,由再生气体供给装置54、55供给的氢还原气体组成的再生气体,通过再生气体导入通路,由再生气体导入侧开关阀61、64供给各水、氧、一氧化碳除去部20、21。In this device, the flow direction of the gas in the refining process (lower part → upper part) and the regeneration process (upper part → lower part) is designed to be reversed. However, the regeneration step can also be performed from the lower part to the upper part in the same manner as the refining step. Reference numerals 56 , 58 , and 59 denote on-off valves for introducing ammonia gas to the water, oxygen, and carbon
来自各水、氧、一氧化碳除去部20、21的气体排出通路26、27上连接设有排气通路28,另外该气体排出通路上设气体排出侧开关阀62、63。此外,设置从再生气体供给装置54、55向水、氧、一氧化碳除去部通入再生气体,然后回收该再生气体的再生气体回收装置52、53。在该回收侧通路上配置回收再生气体用的开关阀57、60。An exhaust passage 28 is connected to the gas discharge passages 26 and 27 from the respective water, oxygen and carbon
作为再生气体,镍催化剂用还原气体使用氢,而分子筛的水分除去使用干燥氮气。因此通入氢气与氮气作为再生气体。各水、氧、一氧化碳除去部设加热器70、71,用于再生时的加热处理。作为再生处理的一个例子,首先,边由再生气体供给装置54、或55向水、氧、一氧化碳除去部供给干燥氮气,进行水分的清除1小时,边用加热器70、71将水、氧、一氧化碳除去部加热到大约200℃。接着,在该加热状态下,除了从再生气体供给装置54、或55供给干燥氮气外,也供给氢气,进行镍催化剂的还原处理3小时。镍催化剂的还原处理通过如下的化学反应进行。As the regenerating gas, hydrogen was used as a reducing gas for the nickel catalyst, and dry nitrogen was used to remove moisture from the molecular sieve. Therefore, hydrogen and nitrogen are introduced as regeneration gases. Heaters 70 and 71 are provided in each water, oxygen, and carbon monoxide removal section for heat treatment during regeneration. As an example of the regeneration process, at first, dry nitrogen gas is supplied to the water, oxygen, and carbon monoxide removal part by the regeneration gas supply device 54 or 55, and water, oxygen, and carbon monoxide are removed for 1 hour, and the water, oxygen, and carbon monoxide are removed by the heaters 70, 71 The carbon monoxide removal part is heated to about 200°C. Next, in this heated state, in addition to supplying dry nitrogen gas from the regeneration gas supply device 54 or 55, hydrogen gas was also supplied, and the reduction treatment of the nickel catalyst was performed for 3 hours. The reduction treatment of the nickel catalyst is performed by the following chemical reaction.
然后,切换成只供给干燥氮气,进行吸附水分的除去2小时。最后,边通入干燥氮气,边慢慢减少加热器70、71的加热,大约经5小时恢复到常温。此外,再生气体的供给,例如使氨精制量为3N(标准状态)m3/h时,在干燥氮气量为200N(标准状态)L/h下,也可以使还原氢气量为4N(标准状态)L/h。另外,再生处理结束后,如果不立即转移到精制,在精制前流通一定时间的精制氨气,则吸附效果好。Then, it was switched to supplying only dry nitrogen gas, and the removal of adsorbed moisture was performed for 2 hours. Finally, the heating of the heaters 70 and 71 was gradually reduced while passing dry nitrogen gas, and the temperature returned to normal temperature in about 5 hours. In addition, for the supply of regeneration gas, for example, when the amount of ammonia purification is 3N (standard state) m 3 /h, the amount of reduced hydrogen gas can also be 4N (standard state) L/h when the dry nitrogen gas amount is 200N (standard state) L/h. )L/h. In addition, after the regeneration treatment is completed, if the purified ammonia gas is circulated for a certain period of time before refining without immediately transferring to refining, the adsorption effect will be good.
采用上述构成,由于使用一对的水、氧、一氧化碳除去部20、21,故将一方用于杂质除去处理,另一方则可进行再生处理。使用精制管理控制装置(没有图示),例如,从关闭全部阀的状态打开气体导入侧阀56、58,再打开排气侧的阀62,将粗氨导入水、氧、一氧化碳除去部20。由于粗氨的导入,在催化剂部23利用镍催化剂除去氧与一氧化碳杂质,又在水分除去部22利用分子筛吸附水分进行水分杂质的除去,连续除去水、氧与一氧化碳得到的精制氨气通过排气通路28被排出。With the above configuration, since a pair of water, oxygen, and carbon
此外,水、氧、一氧化碳除去部20侧的精制处理结束时,关闭阀58、62。再打开阀59、63,向水、氧、一氧化碳除去部21导入粗氨,可用催化剂部25与水分除去部24接着进行精制处理。另一方面,对完成精制处理的水、氧、一氧化碳除去部20,通过打开阀57、61进行上述的再生处理。这样,通过交替地将各水、氧、一氧化碳除去部切换成精制、再生的处理,可以利用水、氧的杂质除去实现高纯度氨气的连续精制,使大量精制成为可能。In addition, when the purification process on the side of the water, oxygen, and carbon
以下,根据图3对可高效率地除去含于粗氨中的多种杂质的精制装置及其精制方法进行说明。图3是本实施方案精制装置的简要构成图。此外,本实施方案中,对与图1及图2的实施方案相同的结构使用相同符号。Hereinafter, a refining apparatus capable of efficiently removing various impurities contained in crude ammonia and a refining method thereof will be described with reference to FIG. 3 . Fig. 3 is a schematic configuration diagram of a refining device according to this embodiment. In addition, in this embodiment, the same code|symbol is used for the same structure as embodiment of FIG.1 and FIG.2.
本实施方案的精制装置由除去含于粗氨气体中的多种非金属杂质用的蒸馏塔2、和用于除去水分、氧与一氧化碳杂质的一对水、氧、一氧化碳除去部20、21构成。蒸馏塔2与水、氧、一氧化碳除去部20、21,分别是与图1、图2所说明的结构同样的结构。另外,本实施方案也是在液体氨容器1将原料氨分离成液相部11与气相部12,从该气相部12将气相氨排气,作为粗氨气体导入蒸馏塔2。19是气相部12与气体供给通路9和气体流入部7之间的开关阀。The refining device of this embodiment is composed of a
如前所述,蒸馏塔2由蒸馏部3、设于中间部的气体流入部7及设于下部的液化氨贮存部8构成。由于边利用蒸馏部3的液化功能将粗氨气体液化,使液化氨贮存在液化氨贮存部8中,边将沸点比氨低的含非金属杂质作为气体进行分离,因此在蒸馏塔2的最上部空间6可以分离回收杂质气体,可通过排气通路10利用排气一次除去多种的杂质气体G1。堆积在最上部空间6的杂质气体主要是氢(H2)、氧(O2)、一氧化碳(CO)、二氧化碳(CO2)、氮(N2)、甲烷(CH4)等。此外,利用设于蒸馏塔2下部的液化氨贮存部8的温水循环装置5的加热作用,蒸馏部3中粗氨液化时残留的杂质也从液体氨中分离,排到气体流入部7侧,最后在最上部空间6被回收,可以进一步提高精制纯度。As described above, the
贮存于液化氨贮存部8的液体氨通过排出通路14,经温水槽16导入水、氧、一氧化碳除去部20、21侧。液体氨通过温水槽16而被再次气化,作为二次被精制气体导入水、氧、一氧化碳除去部20、21侧。各水、氧、一氧化碳除去部20、21分别具有水分除去部22与催化剂部23、水分除去部24与催化剂部25。在水分除去部22、24利用所填充的分子筛的吸附作用进行水分除去。催化剂部23、25利用所填充的镍催化剂的化学吸附作用吸附除去氧与一氧化碳。因此,在各水、氧、一氧化碳除去部20、21可以进一步除去蒸馏塔2中没有处理干净的水、氧、一氧化碳杂质,最后采用两步通过排气通路28得到更多地除去多种杂质中、尤其是水、氧与一氧化碳杂质的高纯度的精制氨气G2。The liquefied ammonia stored in the liquefied
如上所述,本实施方案的精制装置,通过将蒸馏塔2与水、氧、一氧化碳除去部20、21连接作为精制体系,可以实现更简单的高纯度精制工序。此外,如前所述,由于使用一对的水、氧、一氧化碳除去部20、21交替地切换成精制、再生,总是可以使一方进行精制处理运转,因此可以避免使用水、氧、一氧化碳除去部20、21时的再生时的精制处理的中断,而且可连续精制运转,故有助于大量精制的低成本化。As described above, in the purification apparatus of this embodiment, a simpler high-purity purification process can be realized by connecting the
图4表示体现上述精制装置精制效果的杂质浓度分布测定例。首先,气相部12的粗氨气体大量含有ppm级浓度单位的氢(H2)、氧(O2)、一氧化碳(CO)、二氧化碳(CO2)、氮(N2)、甲烷(CH4)等的低沸点杂质和水(H2O)(参照图4的(1))。通过蒸馏塔2精制该粗氨气体时,如图4的(3)所示,除了水(H2O)之外的大多数杂质都减少到ppb级的浓度单位。此外,由于再把通过蒸馏塔2的一次精制气体导入水、氧、一氧化碳除去部20、21,故如图4的(4)所示,水也减少到ppb级的浓度单位。因此,若采用使用本实施方案精制装置的精制方法,可以得到极高纯度的精制氨。此外,根据该测定例,在蒸馏塔2基本上除去氧、一氧化碳杂质,在水、氧、一氧化碳除去部20、21阶段除去的量极少。Fig. 4 shows an example of measurement of impurity concentration distribution showing the refining effect of the above-mentioned refining device. First, the crude ammonia gas in the
此外,如图4的(2)所示,最初由于水分大量含在液相中,气相氨中的水比液相少,但在实施连续精制的过程中氨逐渐减少时,产生气相中的水分含量急剧增多的现象。把本实施方案精制装置的测定例示于图5。由图5可以看出,液体氨容器1的氨使用率达85%左右时,气相中的水分急剧地增加。因此,85%左右的使用通常是精制极限,如采用本实施方案的精制装置,可以说达到氨使用率85%的连续精制是可能的。In addition, as shown in (2) of Fig. 4, at first, since a large amount of water is contained in the liquid phase, the water in the gaseous ammonia is less than that in the liquid phase, but when the ammonia gradually decreases during continuous refining, water in the gaseous phase occurs A dramatic increase in content. Fig. 5 shows an example of measurement performed by the refining device of this embodiment. It can be seen from FIG. 5 that when the ammonia usage rate of the
如上所述,采用本发明的精制方法与精制装置,可以高纯度地精制工业用原料氨等,并且不使用复杂的精制工序,可将精制工序简单化,而且也可以简易地形成连续精制工序。As mentioned above, with the refining method and refining device of the present invention, industrial raw material ammonia and the like can be refined with high purity, and the refining process can be simplified without using complicated refining steps, and a continuous refining process can also be easily formed.
Claims (22)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003404852 | 2003-12-03 | ||
JP2003404852A JP4062710B2 (en) | 2003-12-03 | 2003-12-03 | Method and apparatus for purifying ammonia |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1623900A true CN1623900A (en) | 2005-06-08 |
CN1330573C CN1330573C (en) | 2007-08-08 |
Family
ID=34727739
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100617629A Expired - Fee Related CN1330573C (en) | 2003-12-03 | 2004-06-30 | Refining method and device for ammonia |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4062710B2 (en) |
KR (1) | KR100650010B1 (en) |
CN (1) | CN1330573C (en) |
TW (1) | TWI261574B (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102145899A (en) * | 2010-02-05 | 2011-08-10 | 跨特株式会社 | Producing method and device of high purity ammonia |
CN102464341A (en) * | 2010-11-02 | 2012-05-23 | 住友精化株式会社 | System for purifying ammonia |
CN103153861A (en) * | 2011-01-25 | 2013-06-12 | 住友精化株式会社 | Ammonia purification system and method for purifying ammonia |
CN103269980A (en) * | 2011-03-31 | 2013-08-28 | 住友精化株式会社 | Method for purifying ammonia and ammonia purification system |
CN103691255A (en) * | 2012-09-27 | 2014-04-02 | 古明见 | Waste gas recovery and regeneration method of organic metal chemical vapor deposition method |
CN104709925A (en) * | 2013-12-12 | 2015-06-17 | 湖南高安新材料有限公司 | High-purity ammonia production device |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7297181B2 (en) * | 2004-07-07 | 2007-11-20 | Air Liquide America L.P. | Purification and transfilling of ammonia |
JP5234880B2 (en) * | 2006-03-14 | 2013-07-10 | 大陽日酸株式会社 | Regeneration method of ammonia purification equipment |
JP4744336B2 (en) * | 2006-03-30 | 2011-08-10 | 大陽日酸株式会社 | Liquefied gas concentration analyzer |
JP5456312B2 (en) * | 2006-07-04 | 2014-03-26 | 東芝三菱電機産業システム株式会社 | Specific gas concentrating / diluting device and specific gas concentrating / diluting method |
JP5665953B2 (en) * | 2006-07-04 | 2015-02-04 | 東芝三菱電機産業システム株式会社 | Concentration / dilution device for specific gas and method for concentration / dilution of specific gas |
KR100925813B1 (en) * | 2008-01-14 | 2009-11-06 | 대성산업가스 주식회사 | Ammonia Gas Water Purification Apparatus and Method |
JP2012153545A (en) * | 2011-01-21 | 2012-08-16 | Sumitomo Seika Chem Co Ltd | Ammonia purification system and ammonia purification method |
JP5815968B2 (en) * | 2011-03-31 | 2015-11-17 | 住友精化株式会社 | Ammonia purification system and ammonia purification method |
KR101309118B1 (en) * | 2011-04-04 | 2013-09-16 | (주)원익머트리얼즈 | The high purity ammonia recovery apparatus and it uses high purity ammonia recovery system |
KR101358675B1 (en) * | 2012-06-28 | 2014-02-10 | 한밭대학교 산학협력단 | Purification method of high purity ammonia |
JP2014162662A (en) * | 2013-02-21 | 2014-09-08 | Mitsubishi Heavy Ind Ltd | System and method for ammonia synthesis |
JP6150066B2 (en) * | 2013-10-08 | 2017-06-21 | 大陽日酸株式会社 | Ammonia purification apparatus and ammonia purification method |
JP2016188154A (en) * | 2015-03-30 | 2016-11-04 | 大陽日酸株式会社 | Method for purifying ammonia |
CN106430243B (en) * | 2016-11-07 | 2019-02-12 | 广东华特气体股份有限公司 | A kind of purification system of ammonia |
CN106673013B (en) * | 2016-11-17 | 2018-10-09 | 天津大学 | The reprocessing process and system of unqualified liquefied ammonia in refinery(waste) water production |
KR102170114B1 (en) * | 2018-06-25 | 2020-10-26 | 주식회사 포스코 | Adsoption apparatus and for adsoption apparatus |
CN109340578A (en) * | 2018-12-05 | 2019-02-15 | 上海正帆科技股份有限公司 | A liquefied gas purification device and method |
TWI734084B (en) * | 2019-03-12 | 2021-07-21 | 巫協森 | Method for purifying primary liquid ammonia into high-purity liquid ammonia |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IL70596A (en) * | 1984-01-02 | 1987-11-30 | Israel State | Level based on moire effect with ambient light |
JPH09142883A (en) * | 1995-11-17 | 1997-06-03 | Central Glass Co Ltd | Radio wave transmitting heat-shielding glass and its production |
-
2003
- 2003-12-03 JP JP2003404852A patent/JP4062710B2/en not_active Expired - Fee Related
-
2004
- 2004-04-27 KR KR1020040029027A patent/KR100650010B1/en not_active Expired - Fee Related
- 2004-04-27 TW TW093111722A patent/TWI261574B/en not_active IP Right Cessation
- 2004-06-30 CN CNB2004100617629A patent/CN1330573C/en not_active Expired - Fee Related
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102145899A (en) * | 2010-02-05 | 2011-08-10 | 跨特株式会社 | Producing method and device of high purity ammonia |
CN102145899B (en) * | 2010-02-05 | 2013-07-31 | 跨特株式会社 | Producing method and device of high purity ammonia |
CN102464341A (en) * | 2010-11-02 | 2012-05-23 | 住友精化株式会社 | System for purifying ammonia |
CN102464341B (en) * | 2010-11-02 | 2015-01-21 | 住友精化株式会社 | System for purifying ammonia |
CN103153861A (en) * | 2011-01-25 | 2013-06-12 | 住友精化株式会社 | Ammonia purification system and method for purifying ammonia |
CN103153861B (en) * | 2011-01-25 | 2015-04-22 | 住友精化株式会社 | Ammonia purification system and method for purifying ammonia |
TWI491558B (en) * | 2011-01-25 | 2015-07-11 | Sumitomo Seika Chemicals | Ammonia purification system and ammonia purification method |
CN103269980A (en) * | 2011-03-31 | 2013-08-28 | 住友精化株式会社 | Method for purifying ammonia and ammonia purification system |
CN103691255A (en) * | 2012-09-27 | 2014-04-02 | 古明见 | Waste gas recovery and regeneration method of organic metal chemical vapor deposition method |
CN104709925A (en) * | 2013-12-12 | 2015-06-17 | 湖南高安新材料有限公司 | High-purity ammonia production device |
CN104709925B (en) * | 2013-12-12 | 2017-08-08 | 湖南高安新材料有限公司 | A kind of high-purity ammon process units |
Also Published As
Publication number | Publication date |
---|---|
KR20050053474A (en) | 2005-06-08 |
JP2005162546A (en) | 2005-06-23 |
CN1330573C (en) | 2007-08-08 |
KR100650010B1 (en) | 2006-11-24 |
TW200519039A (en) | 2005-06-16 |
JP4062710B2 (en) | 2008-03-19 |
TWI261574B (en) | 2006-09-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1623900A (en) | Ammonia refining method and refining device | |
CN1176736C (en) | Gas separation and purification method and device thereof | |
CN1266037C (en) | Method and apparatus for purifying CO2 material flow | |
TWI521056B (en) | Methane recovery method and methane recovery unit | |
CN107848796B (en) | Hydrogen recovery system and hydrogen separation and recovery method | |
WO2011045880A1 (en) | Hydrogen gas recovery system and hydrogen gas separation and recovery method | |
CN1420078A (en) | Process for purifying synthetic gas | |
CN1196273A (en) | Method for production of nitrogen using oxygen selective adsorbents | |
CN1872390A (en) | Design and operation methods for pressure swing adsorption systems | |
CN102471056B (en) | The reuse method of hydrogen | |
JP6659717B2 (en) | Hydrogen recovery method | |
CN1223164A (en) | PSA process and system using simultaneous top and bottom evacuation of adsorbent bed | |
KR101244129B1 (en) | Mrthod for separating blast furnace gas | |
CN1420079A (en) | Method and adsorbent for recovering kryptsn and xenon from gas stream or liquid stream | |
CN101978234A (en) | Separation method for blast furnace gas | |
JP2008537720A (en) | Purification of nitrogen trifluoride | |
CN113416151A (en) | Preparation method of pure acetonitrile for chromatographic analysis and production equipment thereof | |
CN1590279A (en) | Method for separating and recovering chlorine from service gas containing chlorine | |
JP4869671B2 (en) | Method for producing silicon | |
CN1040069C (en) | Purification of fluids by adsorption | |
JPS62119104A (en) | Method for recovering high-purity argon from exhaust gas from single crystal production furnaces | |
JP2000312824A (en) | Molecular sieving carbon for separating methane from mixed gas of methane and nitrogen | |
CN1074448C (en) | Pressure swing adsorption process for concentration and purification of carbon monooxide in blast furnace gas | |
CN1633325A (en) | Treatment of hydrogen/hydrocarbon mixtures on adsorbents regenerated at high pressure | |
CN1559001A (en) | A process and apparatus for purifying hydrogen bromide |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: TAIYO NIPPON SANSO CO., LTD. Free format text: FORMER NAME OR ADDRESS: DAIYO TOYO ACID CO., LTD. |
|
CP03 | Change of name, title or address |
Address after: Tokyo, Japan Patentee after: Daiyo Acid Co., Ltd. Address before: Osaka Japan Patentee before: Taiyo Toyo Sanso K. K. |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070808 Termination date: 20210630 |