CN1609637A - Optical filter structure and producing method thereof - Google Patents
Optical filter structure and producing method thereof Download PDFInfo
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- CN1609637A CN1609637A CN 200310102745 CN200310102745A CN1609637A CN 1609637 A CN1609637 A CN 1609637A CN 200310102745 CN200310102745 CN 200310102745 CN 200310102745 A CN200310102745 A CN 200310102745A CN 1609637 A CN1609637 A CN 1609637A
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- 230000015572 biosynthetic process Effects 0.000 claims description 4
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Abstract
The present invention discloses one optical filter structure and its making process. The optical filter structure includes several optical filters embedded mutually on the surface of one substrate. Each of the optical filters has some superposed area with adjacent optical filters, and the superposed areas have aligned surfaces with other areas.
Description
Technical field
The present invention relates to a kind of filter sheet structure and preparation method thereof, relate in particular to a kind of LCD (liquid crystal liquid, colorful filter structure LCD) and preparation method thereof of being applied to.
Background technology
Because LCD has that external form is frivolous, power consumption is few and characteristic such as radiationless pollution, so be widely used on the portable communications products such as notebook computer, PDA(Personal Digital Assistant).
The colored filter of existing Thin Film Transistor-LCD (TFT-LCD) (color filter) structure and TFT element are to be made in respectively on the two different glass substrates.Wherein, the TFT element utilizes multiple tracks photoetching and etching (PEP) technology to be made in the lower glass substrate surface, colorful filter structure then is to utilize photoetching process or directly printing technology is made in the top glass substrate surface, enriches beautiful color so that each pixel of LCD presents.In addition, existing Thin Film Transistor-LCD technology in addition can be provided with black matrix (black matrix) layer in two adjacent colored filters, contrast to promote LCD, and then prevent that the TFT element from producing light leakage current, and it is bad to cover the oblique light leak that is produced when LCD shows.
But when the upper and lower glass substrate of combination, often adhere to unlike material separately because of upper and lower two glass substrates, the also dispar cause of thermal expansivity, just may Yin Gaowen when carrying out process for pressing and produce bit errors, cause light leakage phenomena, therefore the method for making Thin Film Transistor-LCD at present is to utilize colorful filter structure directly is made in (color filter on array on the thin film transistor (TFT) mostly, COA) new technology is to avoid the black matrix layer in the colorful filter structure and the bit errors of data line (data line).And when increase of glass substrate size and liquid crystal display resolution raising, the number of pixels on the substrate also can increase, and the contraposition of colorful filter structure this moment on pixel will become more important.
Please refer to Fig. 1 to Fig. 3, Fig. 1 to Fig. 3 is the existing method synoptic diagram of making a colorful filter structure 22.As shown in Figure 1, at first on a glass substrate 10, form the photic resist layer of a black (not being shown among Fig. 1), and carry out a photoetching process to form black matrix (black matrix) layer 12, general black matrix layer 12 is that light-proofness is strong, the chromium that reflectivity is low and good with the tack of glass (Cr) metal or black resin layer.Then on glass substrate 10, form a red filter layer 14, and carry out a photoetching process to form a red filter array (color filter array, CFA) 16.Wherein red filter layer 14 is one to contain the positive photo anti-corrosion agent material layer of about 10% to 50% orchil of part by weight (dry weight), or a photosensitive resin (photosensitive resin) layer.
Then, for filter effect and the fiduciary level of strengthening filter array, after forming red filter array 16, can be about 320 nanometers (nm) with a wavelength again, energy is about 20J/cm
2Following ultraviolet light shines, and helps with an inert gasses, carries out a heating process as nitrogen, and is oxidized to avoid photo anti-corrosion agent material.Wherein Jia Re initial temperature scope is 60 to 140 ℃, and the speed with 1.5 ℃/sec improves temperature, about 160 to 220 ℃ of finishing temperature scope afterwards.Repeat above-mentioned steps afterwards, form a green filter array 18 and a blue filter array 20 in glass substrate 10 tops in regular turn, make that be positioned on the glass substrate 10 red filter array 16, green filter array 18 constitutes a R/G/B colorful filter structure 22 with blue filter array 20.
When yet existing colorful filter structure is deceived matrix layer in formation, might come off because of the chromium membrane portions, chromium residues or black matrix layer contraposition skew and produce light leakage phenomena, and make black matrix layer can't effectively cover the TFT element, produce light leakage current, and along with the demand of LCD high image quality and high-res, the wire spoke of black matrix layer must be dwindled, and makes its contraposition degree of accuracy become more important.In addition; existing utilization repeatedly photoetching process to obtain the method for R/G/B colorful filter structure; usually can be because of the contraposition problem of photoetching process and the existence of black matrix layer; and cause the side projection (side lobe) of adjacent two colorful filter structures; and then influence the orientation of liquid crystal molecule among the LCD; and seriously disturb the normal operation of LCD, can't present the color scheme in the ideal.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of colorful filter structure and preparation method thereof, to avoid the negative effect that is caused with photoetching process contraposition out of true that exists because of black matrix layer.
Another object of the present invention is to provide a kind of method of utilizing the decrescendo photomask to make colorful filter structure.
For realizing above purpose of the present invention, a kind of optical filter (color filter) structure of LCD is provided, this filter sheet structure includes a substrate, and a plurality of chimeric optical filters mutually are located at this substrate surface, wherein have an overlapping region between the optical filter that respectively this optical filter is adjacent, and this overlapping region has the surface that respectively this optical filter surface outside rough and this overlapping region trims mutually.
The colorful filter structure that is applied to LCD among the present invention does not need the extra black matrix layer that forms, and just can effectively reach light and cover effect, more avoids the contraposition of black matrix layer and the problem of light leak.Colorful filter structure of the present invention again has a flat surface, not only can the planarization transparency electrode, improve the aperture opening ratio (aperture ratio) of LCD, increase pixel electrode overlapping region rate, more can reduce pixel coupling effect to each other, and can not influence the normal alignment of liquid crystal molecule, increase the fiduciary level of LCD operation, present with the color that obtains in the ideal.
Description of drawings
Fig. 1 to Fig. 3 is the existing method synoptic diagram of making colorful filter structure;
Fig. 4 is the diagrammatic cross-section of colorful filter structure of the present invention;
Fig. 5 to Figure 10 makes the method synoptic diagram of colorful filter structure for the present invention;
Fig. 5 (A) and Fig. 5 (B) are the part top view of decrescendo photomask of the present invention;
Figure 11 is applied to the part top view of a LCD for colorful filter structure of the present invention; And
Figure 12 is the diagrammatic cross-section of Figure 11 along tangent line I-I '.
Description of reference numerals
10 glass substrates, 12 black matrix layer
14 red filter layer, 16 red filter arrays
18 green filter array 20 blue filter arrays
22 colorful filter structures, 30 transparent glass substrates
32 Red lightscreening plates, 34 green color filters
36 blue color filters, 38 colorful filter structures
40 red filter layer 42 decrescendo photomask
44 transparent regions, 46 translucent areas
48 green filter layer 49 blue filter
50 glass substrates, 52 picture element matrix arrays
54 pixel regions, 56 low-temperature polysilicon film transistors
Grid conducting layer on 58 polysilicon layers 60
62 gate dielectrics, 64 channel layers
66 source electrodes, 68 drain electrodes
69 flatness layers, 70 transparency conducting layers
72 contact plungers, 74 alignment films
76 glass substrates, 78 transparency conducting layers
80 alignment films, 82 liquid crystal
90 low-temperature polysilicon film transistor LCD
Embodiment
Please refer to Fig. 4, Fig. 4 is the diagrammatic cross-section of colored filter of the present invention (color filter) structure 38.As shown in Figure 4, colorful filter structure 38 of the present invention includes and a plurality ofly is arrayed and mutually chimeric red/green/blue (R/G/B) colored filters 32,34,36 are located at a transparent glass substrate 30 surfaces.Two adjacent optical filters wherein, for example has an overlapping region A between Red lightscreening plate 32 and the green color filter 34, and the thickness of being located at the Red lightscreening plate 32 of lower floor in the A of overlapping region is at least is located at each outer optical filter 32 of overlapping region A, 34, half of 36 thickness has a flat surface so that colorful filter structure 38 is rough.
Please refer to Fig. 5 to Figure 10, Fig. 5 to Figure 10 makes the method synoptic diagram of colorful filter structure 38 for the present invention, and Fig. 5 (A) is the part top view of decrescendo photomask 42 of the present invention with Fig. 5 (B).As shown in Figure 5, at first on glass substrate 30, form a ruddiness filter layer 40, utilize a decrescendo photomask 42 to carry out one first photoetching process then, in red filter layer 40, to form a plurality of Red lightscreening plates 32.Wherein, decrescendo photomask 42 includes at least one transparent region 44, at least one translucent area 46 and zone of opacity 45.Shown in Fig. 5 (A) and Fig. 5 (B), translucent area 46 can be the clear glass that a translucent glass or has the density opening, so the present invention can make decrescendo photomask 42 or the GENERAL TYPE photomask with different transmittances according to colorful filter structure and actual process demand, in a preferred embodiment of the invention, the transmittance of translucent area 46 is 6%, and transparent region 44 has a width B, and translucent area 46 has a width C.As shown in Figure 6, because the transmittance of decrescendo photomask 42 each several parts is also inequality, therefore formed Red lightscreening plate 32 is a convex, and include one with the transparent region 44 corresponding 32A of first, and one and translucent area 46 corresponding second portion 32B.
Then as shown in Figure 7, on glass substrate 30, form a green filter layer 48, owing to be provided with a plurality of Red lightscreening plates 32 on the glass substrate 30, therefore the surface and the out-of-flatness of formed green filter layer 48, then same decrescendo photomask 42 is turned right and move a distance (B+C), or utilize another to include a decrescendo photomask of pattern that moves to right (B+C) distance, move on the second portion 32B of Red lightscreening plate so that originally be positioned at the translucent area 46 of the decrescendo photomask 42 on the 32A of first of Red lightscreening plate 32, and carry out one second photoetching process.Second photoetching process is utilized identical technological parameter with first photoetching process, in green filter layer 48, to form a plurality of green color filters 34, each green color filter 34 has a stairstepping, and partially overlap the surface of each corresponding Red lightscreening plate 32, the width of its lap A is the width C of translucent area, each Red lightscreening plate 32 is a flat surface with the upper surface of the green color filter 34 of its tabling again, and the problem that does not therefore have existing optical filter side projection produces.In a preferred embodiment of the invention, the transmittance of the translucent area 46 of decrescendo photomask 42 is 6%, therefore the thickness of the Red lightscreening plate 32 of lower floor is thickness over half of being located at outer green color filter 34 of overlapping region A or Red lightscreening plate 32 in the resulting overlapping region A, as shown in Figure 8.
Then as Fig. 9 and shown in Figure 10, on glass substrate 30, form a blue filter layer 49, owing to be provided with a plurality of Red lightscreening plates 32 and a plurality of green color filters 34 on the glass substrate 30, therefore the surface and the out-of-flatness of formed blue filter layer 49, then same decrescendo photomask 42 is turned right again and move a distance (B+C), and carry out one the 3rd photoetching process, in blue filter layer 49, to form a plurality of blue color filters 36 and the pattern with convex of putting upside down of each blue color filter 36.Wherein, the 3rd photoetching process is utilized identical technological parameter with second photoetching process, and each blue color filter 36 is overlapped on adjacent Red lightscreening plate 32 and the green color filter 34, and the surface of each blue color filter 36 trims mutually with each Red lightscreening plate 32 and the surperficial rough of each green color filter 34, and is mutual chimeric and have a colorful filter structure 38 of a flat surface to obtain one.In addition, for filter effect and the fiduciary level of strengthening colored filter,, after 36, can shine with ultraviolet light again, and help and carry out a heating process with an inert gasses forming each optical filter 32,34, oxidized to avoid photo anti-corrosion agent material.
In a preferred embodiment of the invention, be that colorful filter structure 38 directly is made in a transparent glass substrate 30 surfaces, this transparent glass substrate 30 can be considered the top glass substrate of Thin Film Transistor-LCD (TFT-LCD).Yet the present invention is not limited thereto, colorful filter structure 38 of the present invention also can be applicable in the LCD of other patterns, for example being applied to one has in the low-temperature polysilicon film transistor LCD (low temperature polysiliconthin film transistor LCD, LTPS TFT-LCD) of last grid (topgate) structure.
Now promptly (color filter on array, LCD COA) as an illustration with picture element matrix array top pattern.Please refer to Figure 11 and Figure 12, Figure 11 is the part top view that colorful filter structure 38 of the present invention is applied to a LCD, and Figure 12 is the diagrammatic cross-section of Figure 11 along tangent line I-I '.As Figure 11 and shown in Figure 12, colorful filter structure 38 of the present invention is made on the glass substrate 50, and glass substrate 50 includes a picture element matrix array 52 and is provided with thereon, and picture element matrix array 52 includes a plurality of adjacent pixel region 54.The method for making of LTPS TFT-LCD 90 of the present invention is a corner that is positioned at each pixel region 54 prior to the low-temperature polycrystalline silicon thin film transistor structure 56 that forms grid (top gate) on the glass substrate 50, and wherein LTPS TFT structure 56 includes grid conducting layer 60, a gate dielectric 62, a channel layer 64, one source pole electrode 66 and a drain electrode 68 on the polysilicon layer 58.Then form a flatness layer 62 on LTPS TFT structure 56, be to form a mutual chimeric colorful filter structure on the flatness layer 62, present embodiment is an example with colored filter 38.Wherein, red/green/blue the optical filter 32 of colorful filter structure 38,34,36 correspond respectively on the different pixel region 54, and the overlapping region A of two adjacent optical filters corresponds on the LTPS TFT structure 56, at this moment, overlapping region A is the black matrix layer that is used for being used as LCD, to reach the effect of shield lights.And for the transparency conducting layer 70 that connects follow-up formation drain electrode 68 with LTPS TFT structure 56, can be in XianCheng's one opening (not being shown among Figure 12) before the deposit transparent conductive layer 70, deposit a transparency conducting layer 70 again, as indium oxide antimony (ITO), to form a contact plunger 72, on glass substrate 50, form an alignment film (orientation film) 74 then.
Then, on another glass substrate 76, form a transparency electrode 78 and an alignment film 80 in regular turn.Then that glass substrate 50 and glass substrate 76 is staggered relatively, then between two glass substrates 50 and 76, inject a liquid crystal 82, finish the making of LTPS TFT-LCD 90 of the present invention.
In brief, colorful filter structure of the present invention utilizes same decrescendo photomask with respectively to red, green and blue filter layer, carry out having for three times the photoetching process of same process parameter, to obtain the R/G/B colorful filter structure of chimeric mutually and surfacing, not only can simplify technology, and the overlapping region of adjacent two colorful filter structures more can be used to be used as the black matrix layer of available liquid crystal display, to reach the transistorized function of shielding film, avoids producing the phenomenon of light leakage current.In addition, the present invention can also suitably be applied in the LCD that is provided with black matrix layer structure.
Compared to prior art, the colorful filter structure that is applied to LCD among the present invention does not need the extra black matrix layer that forms, and just can effectively reach light and cover effect, more avoids the contraposition of black matrix layer and the problem of light leak.Colorful filter structure of the present invention again has a flat surface, not only can the planarization transparency electrode, avoid the problem of the side projection of existing filter sheet structure, improve the aperture opening ratio (aperture ratio) of LCD, increase pixel electrode overlapping region rate, more can reduce pixel coupling effect to each other, and can not influence the normal alignment of liquid crystal molecule, increase the fiduciary level of LCD operation, present with the color that obtains in the ideal.
The above only is the preferred embodiments of the present invention, and all equalizations of doing according to claim of the present invention change and modify, and all should belong to the covering scope of patent of the present invention.
Claims (16)
1. the filter sheet structure of a flat-panel screens, this filter sheet structure includes a substrate, and a plurality of chimeric optical filters mutually are located at this substrate surface, wherein have an overlapping region between this optical filter that respectively this optical filter is adjacent, and this overlapping region has the surface that respectively this optical filter surface outside rough and this overlapping region trims mutually.
2. filter sheet structure as claimed in claim 1, wherein this flat-panel screens is a LCD, can be a low-temperature polysilicon film transistor LCD.
3. filter sheet structure as claimed in claim 1, wherein this substrate also include a picture element matrix array be located at respectively should be chimeric mutually optical filter below, and one transparency conducting layer be located at respectively should be chimeric mutually optical filter top, wherein this filter sheet structure includes a contact plunger, be used for connecting this transparency conducting layer and this picture element matrix array, wherein this substrate is a transparent glass substrate.
4. filter sheet structure as claimed in claim 3, wherein this flat-panel screens is the LCD that an optical filter is stacked in picture element matrix array top pattern.
5. filter sheet structure as claimed in claim 1, the thickness of wherein being located at respectively this optical filter of lower floor in this overlapping region are at least half of the thickness of being located at respectively this optical filter outside this overlapping region.
6. filter sheet structure as claimed in claim 1, wherein this overlapping region is to be used for being used as a black matrix layer.
7. filter sheet structure as claimed in claim 1, wherein this substrate comprises a black matrix layer in addition and is located at respectively this optical filter and the adjacent zone of other optical filters.
8. filter sheet structure as claimed in claim 1, wherein those optical filters include one first optical filter, one second optical filter and one the 3rd optical filter at least, wherein the pattern of this first optical filter is a convex, the pattern of this second optical filter is a stairstepping, and the pattern of the 3rd optical filter is the convex of putting upside down, to become this chimeric optical filter mutually, wherein those optical filters include a red/green/blue optical filter at least.
9. color filter making method that is applied to a flat-panel screens, this method for making includes the following step:
One glass substrate is provided;
On this glass substrate, form one first optical filter; And
Second optical filter of formation one and this first optical filter tabling on this glass substrate, wherein have an overlapping region between this first optical filter and this second optical filter, and this overlapping region has the surface that this first optical filter outside rough and this overlapping region and this second optical filter surface trim mutually.
10. method for making as claimed in claim 9, wherein this flat-panel screens is a LCD, can be a low-temperature polysilicon film transistor LCD.
11. method for making as claimed in claim 9, wherein this method for making utilizes a decrescendo photomask to define the pattern of this first optical filter and this second optical filter, and wherein this decrescendo photomask comprises an at least one transparent region and a translucent area.
12. method for making as claimed in claim 9, the method that wherein forms this first optical filter comprises the following step:
On this glass substrate, form one first filter layer;
One decrescendo photomask is provided, and this decrescendo photomask comprises an at least one transparent region and a translucent area; And
Carry out one first photoetching process, with formation one and corresponding first pattern of this transparent region on this first filter layer, and on this first filter layer, form one with corresponding second pattern of this translucent area, and this first pattern and this second pattern have different-thickness.
13. as the method for making of claim 12, the method that wherein forms this second optical filter comprises the following step:
On this glass substrate, form one second filter layer, and this second filter layer segment is overlapped in this first filter laminar surface; And
Utilize this decrescendo photomask to carry out one second photoetching process, on this second filter layer, to form one the 3rd pattern overlapping in this second patterned surfaces of this first filter layer, and on this second filter layer, form one and have the 4th pattern of different-thickness with the 3rd pattern, and the 3rd pattern trims mutually with the surperficial rough of the 4th pattern, and wherein this first photoetching process can select to utilize identical technological parameter or different technological parameters with this second photoetching process.
14. method for making as claimed in claim 9, wherein this second optical filter in this overlapping region is covered in the surface of this first optical filter in this overlapping region, and the thickness of this first optical filter in this overlapping region is at least the thickness of being located at this first optical filter outside this overlapping region half.
15. method for making as claimed in claim 9, wherein this overlapping region is to be used for being used as a black matrix layer.
16. method for making as claimed in claim 9, wherein this glass substrate also comprises a black matrix layer and is located at this first optical filter and the adjacent zone of this second optical filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2003101027450A CN1301412C (en) | 2003-10-23 | 2003-10-23 | Optical filter structure and producing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2003101027450A CN1301412C (en) | 2003-10-23 | 2003-10-23 | Optical filter structure and producing method thereof |
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| Publication Number | Publication Date |
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| CN1609637A true CN1609637A (en) | 2005-04-27 |
| CN1301412C CN1301412C (en) | 2007-02-21 |
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| CNB2003101027450A Expired - Lifetime CN1301412C (en) | 2003-10-23 | 2003-10-23 | Optical filter structure and producing method thereof |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102854656A (en) * | 2012-09-29 | 2013-01-02 | 深圳市华星光电技术有限公司 | Colored light filtering substrate and relative manufacturing method thereof |
| WO2013166735A1 (en) * | 2012-05-11 | 2013-11-14 | 深圳市华星光电技术有限公司 | Color filter and manufacturing method thereof |
| US8724057B2 (en) | 2009-07-06 | 2014-05-13 | Au Optronics Corporation | Color filter array on pixel array substrate and display panel |
| CN104503128A (en) * | 2014-12-19 | 2015-04-08 | 深圳市华星光电技术有限公司 | Color film substrate for display, method for manufacturing color film substrate and light mask thereof |
| CN104991371A (en) * | 2015-07-16 | 2015-10-21 | 深圳市华星光电技术有限公司 | Display panel and manufacturing method for same |
| CN105511173A (en) * | 2016-01-05 | 2016-04-20 | 京东方科技集团股份有限公司 | Display substrate and manufacture method thereof as well as display panel and manufacture method thereof |
| CN106501989A (en) * | 2016-11-10 | 2017-03-15 | 深圳市华星光电技术有限公司 | A kind of substrate and preparation method thereof |
| WO2017107439A1 (en) * | 2015-12-21 | 2017-06-29 | 京东方科技集团股份有限公司 | Colour film substrate and manufacturing method therefor, and display device |
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| JPS6382405A (en) * | 1986-09-27 | 1988-04-13 | Canon Inc | Ferroelectric liquid crystal element |
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| CN106501989A (en) * | 2016-11-10 | 2017-03-15 | 深圳市华星光电技术有限公司 | A kind of substrate and preparation method thereof |
| WO2019019316A1 (en) * | 2017-07-27 | 2019-01-31 | 深圳市华星光电技术有限公司 | Display panel, array substrate and manufacturing method therefor |
| US10466547B2 (en) | 2017-07-27 | 2019-11-05 | Shenzhen China Star Optoelectronics Technology Co., Ltd | Display panel, array substrate and manufacturing method for the same |
| CN108287443A (en) * | 2017-12-05 | 2018-07-17 | 友达光电股份有限公司 | Display panel |
| CN108287443B (en) * | 2017-12-05 | 2021-01-01 | 友达光电股份有限公司 | Display panel |
| CN109887931A (en) * | 2019-02-21 | 2019-06-14 | 深圳市华星光电半导体显示技术有限公司 | Array substrate and preparation method thereof |
| WO2022088083A1 (en) * | 2020-10-30 | 2022-05-05 | 京东方科技集团股份有限公司 | Display substrate, manufacturing method for display substrate, and display device |
| US12016234B2 (en) | 2020-10-30 | 2024-06-18 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Display substrate, method of manufacturing display substrate, and display device having monochromatic filter layer |
| CN113448118A (en) * | 2021-06-30 | 2021-09-28 | Tcl华星光电技术有限公司 | Display panel and electronic device |
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