CN1530706A - Masking external frame structure of liquid-crystal displaying panel and producing method thereof - Google Patents

Masking external frame structure of liquid-crystal displaying panel and producing method thereof Download PDF

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Publication number
CN1530706A
CN1530706A CNA031217001A CN03121700A CN1530706A CN 1530706 A CN1530706 A CN 1530706A CN A031217001 A CNA031217001 A CN A031217001A CN 03121700 A CN03121700 A CN 03121700A CN 1530706 A CN1530706 A CN 1530706A
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China
Prior art keywords
transistor array
film transistor
array base
plate
thin
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CNA031217001A
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Chinese (zh)
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CN1294449C (en
Inventor
叶圣修
吴逸蔚
丁岱良
温志坚
郭光埌
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TPO Displays Corp
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Toppoly Optoelectronics Corp
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Priority to CNB031217001A priority Critical patent/CN1294449C/en
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Abstract

A shading outer frame comprises a film transistor array base plate which consists of a display region and a outer frame region positioned around the display region, as well as a colour layer which is positioned on the outer frame region of film transistor array base plate. The colour layer is used for shading to avoid outer frame region frame direct lighting and as clearance object to control gap evenly between the film transistor array base plate and a base plate facing to it as well as the colour layer has also a flat layer which is used to control evenly the gap between the same two base plates.

Description

The structure and the manufacture method thereof of the shading housing of display panels
Technical field
The present invention relates to a kind of structure and manufacture method thereof of shading housing, relate in particular to a kind of structure and manufacture method thereof that is applied to the shading housing on the display panels, it can simplify the manufacture process of display panels effectively, and reduces the manufacturing cost of display panels.
Background technology
Display panels is that liquid crystal molecule is flow between two glass substrates that have electrode respectively (be thin-film transistor array base-plate and with respect to the subtend substrate of thin-film transistor array base-plate), keep necessarily in order to make thin-film transistor array base-plate and subtend substrate gap between the two, must spill the evenly big or small resin particle (plastic beads) of cloth and between two substrates or with lithographic process, make separation material (spacer), to improve the display quality of display panels.
Please refer to Fig. 1, on the subtend substrate, be formed with the cross-sectional view of three-decker separation material for prior art.Prior art is to form three-decker separation material and chromatic filter layer simultaneously with lithographic process and decoration method on subtend substrate 1.In other words, promptly be the red stack layer 311 and red chromatic filter layer 21 that on subtend substrate 1, is formed with separation material 31 with lithographic process simultaneously; On subtend substrate 1, be formed with the green stack layer 322 and green tint color filtering optical layer 22 of separation material 32 simultaneously with lithographic process; And the blue stack layer 333 and blue color color filtering optical layer 23 that on subtend substrate 1, are formed with separation material 33 with lithographic process simultaneously.Subtend substrate 1 and thin-film transistor array base-plate 5 aim at fit after then as shown in Figure 2,31,32,33 of formed separation materials are in order to the gap between even control subtend substrate 1 and the thin-film transistor array base-plate 5.Certainly, as shown in Figure 3, as long as can reach the purpose in even control subtend substrate 1 and thin-film transistor array base-plate 5 gap between the two, also can form simultaneously only has two-layer structure separation material (spacer) 31 and chromatic filter layer.
In addition, also can form the shading housing on thin-film transistor array base-plate or subtend substrate, the purpose that forms the shading housing is in order evenly to control subtend substrate and thin-film transistor array base-plate gap between the two equally.The shading housing is except in order to the even control, also be in order to reach the shading effect, especially for a low temperature polycrystalline silicon display panels (Low temperature poly-silicon liquid crystaldisplay panel), more need a shading housing to avoid the driving element (driver) of light direct irradiation to the thin-film transistor array base-plate.
At present, generally with rotation Tu cloth black light resistance layer on the subtend substrate and carry out lithographic process and form the shading housing, the mode that forms the shading housing with sticking His-Wife frame glue on the subtend substrate is also arranged in addition, yet, these modes all need extra manufacture process to form the shading housing, not only make the manufacture process of display panels become complicated time-consuming, also make manufacturing cost improve.
Summary of the invention
Defective at above-mentioned prior art, the object of the present invention is to provide a kind of structure and manufacture method thereof that is applied to the shading housing on the display panels, in order to simplifying the manufacture process of display panels effectively, and be minimized the manufacturing cost of display panels.
According to above-mentioned purpose, the invention provides a kind of structure that is used for the shading housing of display panels.The structure of shading housing comprises a kind of structure that is used for the shading housing of display panels at least, comprises a thin-film transistor array base-plate at least, and it includes a viewing area and is positioned at a housing district on every side, this viewing area; And at least one color layer, be positioned in this housing district of this thin-film transistor array base-plate.Wherein, this color layer in order to shading avoiding this housing district of light direct irradiation, and as separation material with this thin-film transistor array base-plate of even control and with respect to the gap between the subtend substrate of this thin-film transistor array base-plate.Also include a flatness layer on the color layer, with this thin-film transistor array base-plate of even control and this subtend substrate gap between the two.
The described structure that is used for the shading housing of display panels, wherein this viewing area forms the transistor array pattern.
The described structure that is used for the shading housing of display panels wherein also includes a flatness layer on this color layer, and with this thin-film transistor array base-plate of even control and this subtend substrate gap between the two, wherein the material of this flatness layer is a translucent resin.
The described structure that is used for the shading housing of display panels, wherein this display panels is a low temperature polycrystalline silicon display panels, forms the driving element pattern in this housing district of this thin-film transistor array base-plate.
The described structure that is used for the shading housing of display panels, wherein this color layer is selected from one of red color layer, green tint chromatograph and blue color chromatograph group.
According to above-mentioned purpose, the present invention provides a kind of manufacture method of display panels on the other hand, display panels includes a thin-film transistor array base-plate, this thin-film transistor array base-plate has a viewing area and is positioned at a housing district on every side, this viewing area, and this manufacture method comprises the following steps: at least
(a) in this viewing area of this thin-film transistor array base-plate and this housing district, form a chromatic filter layer and at least one color layer respectively synchronously;
(b) this thin-film transistor array base-plate and a subtend base plate alignment that will be formed with chromatic filter layer and color layer fitted; And
(c) inject liquid crystal molecule in aiming between this thin-film transistor array base-plate and this subtend substrate of fitting.
The manufacture method of described display panels, wherein step (a) forms this chromatic filter layer and this color layer with lithographic process and decoration method.
The manufacture method of described display panels, wherein step (a) also is included in and forms a separation material on this viewing area of this thin-film transistor array base-plate synchronously, and this separation material comprises a stack layer at least.
The manufacture method of described display panels, wherein also include a step (a1) afterwards in step (a): form a flatness layer on this thin-film transistor array base-plate that is formed with chromatic filter layer and color layer, the material of this flatness layer is little to be translucent resin.
The manufacture method of described display panels, wherein also include a step (a2) afterwards: grind the default thickness of this flatness layer to one in the cmp mode, wherein also include a step (a3) afterwards: evenly spill a plurality of resin particles of cloth on this viewing area of this thin-film transistor array base-plate in step (a1) in step (a1).
The present invention in the viewing area of thin-film transistor array base-plate and housing district, form synchronously respectively with chromatic filter layer with at least with color layer, therefore can reduce the manufacture process of extra manufacturing shading housing, not only simplify the manufacture process of display panels effectively, and be minimized the manufacturing cost of display panels.
Brief Description Of Drawings
Below in conjunction with accompanying drawing,, will make technical scheme of the present invention and beneficial effect apparent by detailed description to preferred embodiment of the present invention.
In the accompanying drawing,
Fig. 1 is prior art is formed with the three-decker separation material on the subtend substrate a cross-sectional view;
Fig. 2 is the display panels cross-sectional view that prior art forms;
Fig. 3 is prior art is formed with the two-layer structure separation material on the subtend substrate a cross-sectional view;
Fig. 4 is the cross-sectional view of the formed display panels according to the present invention;
Fig. 5 A~5D is the diagrammatic cross-section of low temperature polycrystalline silicon display panels manufacture process according to a preferred embodiment of the present invention.
Embodiment
Please refer to Fig. 4, be the cross-sectional view of formed display panels according to the present invention.The formed shading housing of the present invention includes a thin-film transistor array base-plate 61 and at least one color layer 66 (for example including three layers of red color layer 66a, green tint chromatograph 66b or blue color chromatograph 66c etc.).Thin-film transistor array base-plate 61 includes a viewing area 63 and a housing district 64 that is positioned at around the viewing area 63, is formed with transistor array element 65 with as switch on viewing area 63.Color layer 66 is positioned in the housing district 64 of thin-film transistor array base-plate 61, in order to shading to avoid light direct irradiation housing district 64, especially for a low temperature polycrystalline silicon display panels, color layer 66 can be avoided the driving element 69 of light direct irradiation to the housing district 64 of thin-film transistor array base-plate 61.Color layer 66 also is used as separation material with even control TFT array base palte 61 and with respect to the gap d between the subtend substrate 62 of thin-film transistor array base-plate 61.
The present invention forms chromatic filter layer 67 and color layer 66 respectively synchronously in the viewing area 63 of thin-film transistor array base-plate 61 and housing district 64, wherein the manufacture process of chromatic filter layer then as known technology general, for example lithographic process and decoration method.Because the present invention forms chromatic filter layer 67 and color layer 66 synchronously, therefore can reduce the manufacture process of extra manufacturing shading housing, not only simplify the manufacture process of display panels effectively, and be minimized the manufacturing cost of display panels.Certainly, as long as can reach the purpose in the gap between even control TFT array base palte 61 and the subtend substrate 62, also can form simultaneously only has two layers of (or one deck) structure color layer 66 and chromatic filter layer 67.
According to the present invention, on color layer 66, also can include a flatness layer 68, be by first comprehensively Tu cloth translucent resin after being formed with the surface of chromatic filter layer 67 and the thin-film transistor array base-plate 61 of color layer 66, carry out heat hardening, again with cmp (Chemical-mechanical polishing, CMP) mode is ground the default thickness of translucent resin to of this sclerosis, then form flatness layer 68, it is also in order to the gap d between even control TFT array base palte 61 and the subtend substrate 62, and process is ground the qualification rate that can obtain good flatness and promote display panels.
Preferable, the present invention forms respectively in the viewing area 63 of thin-film transistor array base-plate 61 and housing district 64 in chromatic filter layer 67 and the color layer 66 synchronously, also form the separation material 7 of one deck stack layer (for example including three layers of red stack layer 71, green stack layer 72 or blue stack layers 73 etc.) at least on the viewing area 63 of thin-film transistor array base-plate 61 synchronously, separation material 7 is also in order to the gap d between even control TFT array base palte 61 and the subtend substrate 62.Certainly, as long as can reach the purpose in even control TFT array base palte 61 and subtend substrate 62 gap between the two, also can form the separation material 7 that two layers of (or one deck) stack layer structure are only arranged.If on the viewing area, do not form separation material 7, then also can spill the cloth resin particle on viewing area 63, also can be in order to the gap d between even control TFT array base palte 61 and the subtend substrate 62.
Then, the present invention will lift a preferable process steps, and the manufacture method of a display panels is described.Please refer to Fig. 5 A~5D, be the diagrammatic cross-section of according to a preferred embodiment of the present invention low temperature polycrystalline silicon display panels (Low temperature poly-silicon liquid crystal display panel) manufacture process.
At first, please refer to Fig. 5 A, on a glass substrate 81, make transistor array element 82 with the technology of generally knowing, and be manufactured with driving element pattern 83.The zone that forms transistor array element 82 is viewing area 84, and the zone that forms driving element pattern 83 is housing district 85.This glass substrate that is formed with transistor array 82 and driving element pattern 83 is a thin-film transistor array base-plate 8.
Please refer to Fig. 5 B, in the viewing area 84 of thin-film transistor array base-plate 8 and housing district 85, form a chromatic filter layer 91 and the color layer 92 that includes redness, green and blueness respectively synchronously with lithographic process and decoration method, when forming chromatic filter layer 91 and color layer 92 synchronously, form separation material 93 synchronously with lithographic process and decoration method on the viewing area 84 of thin-film transistor array base-plate 8 too, separation material 93 includes red stack layer 93a, green stack layer 93b and blue stack layer 93c.
Please refer to Fig. 5 C, with a translucent resin Tu cloth after being formed with the surface of chromatic filter layer 91 and the thin-film transistor array base-plate 8 of color layer 92, carry out heat hardening, again with cmp (Chemical-mechanical polishing, CMP) mode is ground the default thickness of translucent resin to of this sclerosis, then forms flatness layer 96.
Please refer to Fig. 5 D, a glass substrate 951 is provided earlier, and (Indium tin oxide, ITO) with as transparency conductive electrode layer 94, this glass substrate 951 that is formed with transparency conductive electrode layer 94 is subtend substrate 95 to plate tin indium oxide.After sealant 98 is coated at thin-film transistor array base-plate 8 edges, aim at applying with this subtend substrate 95 that is formed with transparency conductive electrode layer 94 again, inject liquid crystal molecule 97 afterwards between thin-film transistor array base-plate 8 and subtend substrate 95.
In sum, because the present invention formation chromatic filter layer and at least one color layer synchronously respectively in the viewing area of thin-film transistor array base-plate and housing district, therefore can reduce the manufacture process of extra manufacturing shading housing, not only simplify the manufacture process of display panels effectively, and be minimized the manufacturing cost of display panels.And, if on color layer, form a flatness layer again, flatness layer also can be in order to even control TFT array base palte and subtend substrate gap between the two, and process cmp (Chemical-mechanical polishing when forming flatness layer, CMP), can obtain good flatness and promote the qualification rate of display panels.
Be understandable that; for the person of ordinary skill of the art; can make various corresponding changes and distortion according to technical scheme of the present invention and technical conceive, and these all changes and distortion all should belong to the protection domain of accompanying Claim of the present invention.

Claims (10)

1, a kind of structure that is used for the shading housing of display panels comprises at least:
One thin-film transistor array base-plate, it includes a viewing area and is positioned at a housing district on every side, this viewing area; And
At least one color layer is positioned in this housing district of this thin-film transistor array base-plate;
Wherein, this color layer in order to shading avoiding this housing district of light direct irradiation, and as separation material with this thin-film transistor array base-plate of even control and with respect to the gap between the subtend substrate of this thin-film transistor array base-plate.
2, the structure that is used for the shading housing of display panels according to claim 1, wherein this viewing area forms the transistor array pattern.
3, the structure that is used for the shading housing of display panels according to claim 1, wherein also include a flatness layer on this color layer, with the gap between this thin-film transistor array base-plate of even control and this subtend substrate, wherein the material of this flatness layer is a translucent resin.
4, the structure that is used for the shading housing of display panels according to claim 1, wherein this display panels is a low temperature polycrystalline silicon display panels, forms the driving element pattern in this housing district of this thin-film transistor array base-plate.
5, the structure that is used for the shading housing of display panels according to claim 1, wherein this color layer is selected from one of red color layer, green tint chromatograph and blue color chromatograph group.
6, a kind of manufacture method of display panels, this display panels includes a thin-film transistor array base-plate, this thin-film transistor array base-plate has a viewing area and is positioned at a housing district on every side, this viewing area, and this manufacture method comprises the following steps: at least
(a) in this viewing area of this thin-film transistor array base-plate and this housing district, form a chromatic filter layer and at least one color layer respectively synchronously;
(b) this thin-film transistor array base-plate and a subtend base plate alignment that will be formed with chromatic filter layer and color layer fitted; And
(c) inject liquid crystal molecule in aiming between this thin-film transistor array base-plate and this subtend substrate of fitting.
7, the manufacture method of display panels according to claim 6, wherein step (a) forms this chromatic filter layer and this color layer with lithographic process and decoration method.
8, the manufacture method of display panels according to claim 6, wherein step (a) also is included in and forms a separation material on this viewing area of this thin-film transistor array base-plate synchronously, and this separation material comprises a stack layer at least.
9, the manufacture method of display panels according to claim 6, wherein also include a step (a1) afterwards in step (a): form a flatness layer on this thin-film transistor array base-plate that is formed with chromatic filter layer and color layer, the material of this flatness layer is a translucent resin.
10, the manufacture method of display panels according to claim 9, wherein also include a step (a2) afterwards: grind the default thickness of this flatness layer to one in the cmp mode, wherein also include a step (a3) afterwards: evenly spill a plurality of resin particles of cloth on this viewing area of this thin-film transistor array base-plate in step (a1) in step (a1).
CNB031217001A 2003-03-17 2003-03-17 Masking external frame structure of liquid-crystal displaying panel and producing method thereof Expired - Fee Related CN1294449C (en)

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CN1320396C (en) * 2004-10-14 2007-06-06 友达光电股份有限公司 Method of mfg, LCD device and LCD panel
CN101676783A (en) * 2008-08-11 2010-03-24 三星电子株式会社 Thin film transistor display panel, liquid crystal display having the same, and method of manufacturing liquid crystal display
CN103091905A (en) * 2011-10-31 2013-05-08 京东方科技集团股份有限公司 Color film substrate and manufacturing method thereof
CN103293746A (en) * 2012-06-29 2013-09-11 上海中航光电子有限公司 Liquid crystal display and manufacturing method thereof
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WO2021082095A1 (en) * 2019-10-31 2021-05-06 深圳市华星光电半导体显示技术有限公司 Oled display panel and manufacturing method therefor
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JPH10239513A (en) * 1997-02-27 1998-09-11 Toppan Printing Co Ltd Color filter for liquid crystal display device, manufacture thereof, and liquid crystal display device
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CN101676783A (en) * 2008-08-11 2010-03-24 三星电子株式会社 Thin film transistor display panel, liquid crystal display having the same, and method of manufacturing liquid crystal display
CN101676783B (en) * 2008-08-11 2013-11-06 三星显示有限公司 Thin film transistor display panel, liquid crystal display having the same, and method of manufacturing liquid crystal display
CN103091905A (en) * 2011-10-31 2013-05-08 京东方科技集团股份有限公司 Color film substrate and manufacturing method thereof
CN103293746A (en) * 2012-06-29 2013-09-11 上海中航光电子有限公司 Liquid crystal display and manufacturing method thereof
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