CN1301413C - Manufacturing method of substrate with photochromic filter - Google Patents
Manufacturing method of substrate with photochromic filter Download PDFInfo
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- CN1301413C CN1301413C CNB031573681A CN03157368A CN1301413C CN 1301413 C CN1301413 C CN 1301413C CN B031573681 A CNB031573681 A CN B031573681A CN 03157368 A CN03157368 A CN 03157368A CN 1301413 C CN1301413 C CN 1301413C
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Abstract
The present invention relates to a method for manufacturing a basal plate which is provided with color filters, which is applicable to half-inverse-penetration type liquid crystal display panels. The method comprises the following steps: providing a basal plate which is provided with a corresponding reflecting region and a penetration region; forming a color filter on the basal plate, wherein the color filter comprises a color part, an opening part and a light shading part; covering a flattening layer on the basal plate and filling the flattening layer in the opening part; roundly grinding the flattening and partial color part in order to obtain a flattened surface; finally, forming an electrode layer on the color filter.
Description
Technical field
The invention relates to and a kind ofly have colored filter (color filter, the method for making of substrate CF) are particularly to a kind of lapping mode that utilizes to reduce the method for making of half-inversed type (transflective) colored filter gold-tinted processing procedure.
Background technology
Typical case's half-inversed type LCD (transflective liquid crystal display) device comprises a upper substrate and an infrabasal plate of mutual subtend, and is clipped in the liquid crystal layer between the upper and lower base plate.(Color filter, CF) substrate, infrabasal plate are commonly referred to array (array) substrate and upper substrate is commonly referred to colored filter.Colored filter has many method for makings, as pigment dispersing method, decoration method, electricity method, print process etc.Wherein do in the processing procedure of CF with the pigment dispersing legal system, because colored filter has the design of echo area corresponding to multiple substrate, just have part and do not cover the photoresistance of enameling (shown in Figure 1A) in R, G, B chromatic photoresist zone, and known a kind of practice is to utilize the whole face of mode of coating to be covered with the layer of transparent photoresist, owing to be comprehensive coating, contact area is big, so that is easy to generate particulate in the processing procedure (particle) and cause yield to descend.The known another kind of practice is to utilize many one gold-tinted processing procedures, and the transparent photoresist of similar negative photoresistance function on the echo area covers only optionally uses that to reduce section poor, and it is very high to have more this road desired degree of accuracy of light shield processing procedure, the height that cost is also relative.No matter but be optionally transparent photoresistance on the echo area covers of comprehensive coating (over-coating) or the mode of utilizing the gold-tinted processing procedure, all there is yield to descend or increases the shortcoming of light shield fabrication steps.Below utilize Figure 1A-Figure 1B, known method for making synoptic diagram with substrate of colored filter is described.
At first, see also Figure 1A, one substrate 10 is provided, be defined as colored filter substrate, be commonly referred to upper substrate, substrate 10 has an echo area and a penetrating region corresponding to multiple substrate (infrabasal plate), then, form a colored filter on substrate 10, wherein this colored filter comprises red, blue, green chromatic photoresist part 12, one opening portions 14 and a black matrix" (black matrix) shading light part 16.
Then, see also Figure 1B, in known method for making, comprehensive covering one transparent optical resistance layer 18 on substrate 10 to insert above-mentioned opening portion 14, because the coating of doing whole covers (over-coating), and without exposure manufacture process, so on red, blue, green chromatic photoresist part 12 and opening portion 14 and black matrix" (black matrix) shading light part 16, this transparent optical resistance layer 18 is arranged all.
Below utilize Fig. 1 C-Fig. 1 D again, illustrate that known another kind has the method for making synoptic diagram of the substrate of colored filter.
At first, see also Fig. 1 C, the processing procedure of its Figure 1B that continues after the coating of finishing transparent optical resistance layer 18, carries out optionally exposure manufacture process 22 with light shield 20 again, and in other words, only the opening portion 14 with colored filter exposes.
Secondly, see also Fig. 1 D, utilize the mode of developing that opening portion 14 is removed with the transparent optical resistance layer 18 of exterior domain, and only opening portion 14 stays transparent photoresist.
Yet, the known whole face of mode of comprehensive coating that utilizes is covered with the layer of transparent photoresist, the general higher material of viscosity ratio that all uses may quality excessive because of spreading area and coating material itself causes to be easy to generate in the processing procedure that particulate (particle) pollutes or color inequality (Mura) phenomenon causes yield decline.Or only staying transparent photoresist in the reflection fate in the mode of gold-tinted processing procedure, gold-tinted mode making meeting increases by one gold-tinted processing procedure and utilize, and therefore increases the processing procedure cost, and because increase the relation of one processing procedure, also can impact yield.
Summary of the invention
In view of this, the purpose of this invention is to provide a kind of method for making with substrate of colored filter, is to utilize the mode of grinding to reduce the method for making of half-inversed type colored filter gold-tinted processing procedure.
The invention is characterized in and utilize the mode of grinding (polishing) that unwanted transparent photoresist on R, G, the B colour is removed, not only can save the gold-tinted processing procedure one, more can use and improve yield and have the effect of planarization because of the particulate (particle) that the mode of grinding is removed original transparent photoresist; Also can improve section difference phenomenon that coincide (overlap) between R, G, the B chromatic photoresist caused and then the optical characteristics of improving display because of the mode of grinding.
In order to achieve the above object, the invention provides a kind of method for making with substrate of colored filter, be applicable to the half-inversed type panel of LCD, it comprises the following steps:
At first, provide a substrate, have echo area and penetrating region.Then, form a colored filter on substrate, wherein colored filter comprises a chrominance section, and an opening portion and a shading light part, this chrominance section are corresponding to the penetrating region of this substrate, and this opening portion is corresponding to the echo area of this substrate.Afterwards, cover a transparent optical resistance layer on substrate and insert above-mentioned opening portion.Then, grind this transparent optical resistance layer.At last, form an electrode layer on colored filter.
Description of drawings
Figure 1A to Fig. 1 D figure shows known method for making synoptic diagram with substrate of colored filter.
Fig. 2 A to Fig. 2 E shows the method for making synoptic diagram with substrate of colored filter of the present invention.
Symbol description:
Known part (Figure 1A-Fig. 1 D)
The 10-substrate; Red, blue, the green chromatic photoresist part of 12-;
The 14-opening portion; 16-black matrix" shading light part;
The 18-flatness layer; The 20-light shield;
The 22-exposure manufacture process;
This case part (Fig. 2 A-Fig. 2 E)
The 30-substrate; Red, blue, the green chromatic photoresist part of 32-;
The 34-opening portion; 36-black matrix" shading light part;
The 38-penetrating region; The 40-echo area;
The 42-flatness layer; Coinciding between the 44-picture element (Fig.2C-1)
45-electrode layer (Fig.2E); The 46-sept;
Embodiment
Fig. 2 A to Fig. 2 E shows the method for making synoptic diagram with substrate of colored filter of the present invention.
At first, please consult side view Fig. 2 A and top view Fig. 2 B simultaneously, one substrate 30 is provided, it for example is an insulation transparent substrate, and be defined as colored filter substrate, be commonly referred to upper substrate, substrate 30 has an echo area and a penetrating region corresponding to multiple substrate (infrabasal plate), then, form a colored filter on substrate 30, wherein this colored filter comprises one red, blue, green chromatic photoresist part 32, one opening portion 34 and a black matrix" (black matrix) shading light part 36, wherein red, blue, green chromatic photoresist part 32 is corresponding to the penetrating region 38 of substrate 30, and opening portion 34 is corresponding to the echo area 40 of substrate 30, shown in top view Fig. 2 B.The material of black matrix" shading light part 36 can be black resin or crome metal, for example make the about 1.2 microns black resin of thickness in gold-tinted processing procedure mode, be preferably the macromolecular material that acryl is mixed with carbon, also or equally make the about 0.15 micron crome metal of thickness in the gold-tinted mode, the phenomenon of (overlap) owing to might not can coincide between thinner thickness so that R, G, the B chromatic photoresist is shown in Fig. 2 A.The chromatic photoresist part 32 that wherein colored filter comprised is to utilize spin coating (spin coating) mode to form a red pigment photoresistance on substrate 30 surfaces, again in the mode of exposure imaging, stay the about 1.7 microns red pigment photoresistance of thickness in the picture element fate of redness, and remove the red pigment photoresistance of all the other positions.Afterwards, form about 1.7 microns blueness of thickness and viridine green photoresistance more in regular turn in the same way.
Then, see also Fig. 2 C, deposit a transparent optical resistance layer 42 on substrate 30 and colored filter and insert opening portion 34 in the spin coating mode, the thickness that is deposited is about substrate 30 above 5 microns, and wherein transparent optical resistance layer 42 is transparent sensitization or sensible heat material.
Then, see also Fig. 2 D, grind the surface of transparent optical resistance layer 42 to colored filter, make that R, G, the transparent photoresist on the B chromatic photoresist of colored filter are therefore worn, since the mode of use grinding not be etc. to, the higher place of thickness can comparatively fast and be easier to be removed, and because reflection fate opening portion 34 thickness that will cover are lower, but after through whole grinding, the thickness of reflection fate opening portion 34 will reach unanimity with the thickness of R, G, B chromatic photoresist part 32, and forms a smooth surface shown in Fig. 2 D.And as the overlap that coincides between R, G, the B chromatic photoresist) when 44 phenomenons take place, shown in Fig. 2 C-1, more can be poor to reduce section because of the part of 44 projectioies that coincide between the comprehensive worn R of mode, G that grinds, the B chromatic photoresist, to reach the effect of planarization.It should be noted, the invention is characterized in and utilize the mode of grinding that unwanted transparent photoresist on R, G, the B chromatic photoresist is removed, not only can save the gold-tinted processing procedure one compared to known techniques, can use the raising yield because of the particulate (particle) that the mode of grinding is removed original transparent photoresist again, have more the effect of planarization.And no matter whether have between the chromatic photoresist to coincide so that the phenomenon of section difference, all will reach the effect of planarization when grinding transparent optical resistance layer 42.
Then, see also Fig. 2 E, after grinding, the surface of CF can be more smooth comprehensively, deposit an electrode layer 45 on colored filter in order to later use sputter (sputtering) mode, wherein above-mentioned electrode layer 45 is one for example to be the nesa coating of tin indium oxide (ITO).
At last, please consult Fig. 2 E again, the coating one earlier for example negative photoresist of acryl stays the sept 46 of similar column again through a gold-tinted processing procedure on electrode layer 45, be used for withstanding the LCD spacing of two plate bases up and down.It should be noted that because of more smooth CF surface after grinding, can obtain the preferable sept of film thickness uniformity 46, shown in Fig. 2 E.
Feature of the present invention and advantage:
Utilize the whole face of mode of comprehensive coating to be covered with the layer of transparent photoresist compared to known techniques, may quality excessive because of spreading area and coating material itself cause to be easy to generate in the processing procedure that particulate (particle) pollutes or color inequality (Mura) phenomenon causes yield to descend; Or optionally only stay transparent photoresist in the reflection fate in the mode of gold-tinted processing procedure, thereby can increase by one gold-tinted processing procedure more, increase the processing procedure cost, also because increase the relation of one processing procedure, yield is impacted simultaneously.
The inventive method is to utilize the mode of comprehensive grinding that unwanted transparent photoresist on R, G, the B chromatic photoresist is removed, not only can save the gold-tinted processing procedure one, more can use and improve yield and have the effect of planarization because of the particulate (particle) that the mode of grinding is removed original transparent photoresist; Also can to improve between R, G, the B chromatic photoresist presumable coinciding (overlap) phenomenon poor to reduce section because of the mode of grinding, and then improve the optical characteristics of display.
Claims (9)
1. the method for making with substrate of colored filter is applicable to the half-inversed type panel of LCD, comprises the following steps:
(a) provide a substrate, have echo area and penetrating region;
(b) form a colored filter on this substrate, wherein this colored filter comprises a chrominance section, and an opening portion and a shading light part, this chrominance section are corresponding to the penetrating region of this substrate, and this opening portion is corresponding to the echo area of this substrate;
(c) cover a flatness layer on this substrate and insert this opening portion;
(d) grind this flatness layer;
(e) form the electrode layer of a nesa coating on this colored filter in the spin coating mode; And
(f) make a sept on this electrode layer.
2. the method for making with substrate of colored filter according to claim 1, wherein this chrominance section comprises redness, blueness and green.
3. the method for making with substrate of colored filter according to claim 1, wherein the material of this shading light part is crome metal or black resin.
4. the method for making with substrate of colored filter according to claim 1, wherein this chrominance section is to utilize the spin coating mode to form a red pigment photoresistance at this substrate surface, again in the mode of exposure imaging, stay the red pigment photoresistance in the picture element fate of redness, and remove the red pigment photoresistance of all the other positions.
5. the method for making with substrate of colored filter according to claim 4, wherein this chrominance section more comprises the pigment photoresistor that forms blueness and green with the same manner in regular turn.
6. the method for making with substrate of colored filter according to claim 1, wherein this flatness layer is a transparent optical resistance layer.
7. the method for making with substrate of colored filter according to claim 1, wherein this step (d) more comprises this chrominance section of means of abrasion.
8. the method for making with substrate of colored filter according to claim 1, wherein this nesa coating is a tin indium oxide.
9. the method for making with substrate of colored filter according to claim 1, wherein this sept is to be coated with a negative photoresist again through the sept of the left similar column of a gold-tinted processing procedure, is used for withstanding the LCD spacing of two plate bases up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031573681A CN1301413C (en) | 2003-09-18 | 2003-09-18 | Manufacturing method of substrate with photochromic filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031573681A CN1301413C (en) | 2003-09-18 | 2003-09-18 | Manufacturing method of substrate with photochromic filter |
Publications (2)
| Publication Number | Publication Date |
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| CN1598623A CN1598623A (en) | 2005-03-23 |
| CN1301413C true CN1301413C (en) | 2007-02-21 |
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| CNB031573681A Expired - Fee Related CN1301413C (en) | 2003-09-18 | 2003-09-18 | Manufacturing method of substrate with photochromic filter |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI268370B (en) | 2005-07-01 | 2006-12-11 | Chunghwa Picture Tubes Ltd | Color filter substrate and fabricating method thereof |
| CN101086576B (en) * | 2006-06-05 | 2010-05-12 | 统宝光电股份有限公司 | Image display system substrate structure and image display system |
| US7924373B2 (en) * | 2007-07-19 | 2011-04-12 | Chimei Innolux Corporation | Display panel and method for the same |
| CN102654593B (en) * | 2012-02-29 | 2014-09-10 | 京东方科技集团股份有限公司 | Color filter, display device and preparation method of color filter |
| CN103033981B (en) * | 2013-01-09 | 2016-05-11 | 深圳市华星光电技术有限公司 | Colored filter substrate and manufacture method thereof and liquid crystal panel |
| CN103235443B (en) * | 2013-04-24 | 2015-07-01 | 京东方科技集团股份有限公司 | Display substrate, display device and manufacturing method of display substrate |
| CN104391349B (en) * | 2014-12-01 | 2017-04-19 | 深圳市华星光电技术有限公司 | Method for producing color filter, color filter and liquid crystal display panel |
| CN104678639A (en) * | 2014-12-30 | 2015-06-03 | 深圳市华星光电技术有限公司 | Method for manufacturing color filter substrate |
| CN109491131B (en) * | 2018-12-12 | 2021-08-24 | 惠科股份有限公司 | Preparation method of optical filter, optical filter and display panel |
| CN113126358A (en) * | 2021-04-25 | 2021-07-16 | 昆山龙腾光电股份有限公司 | Double-sided display panel |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1124208A (en) * | 1997-07-01 | 1999-01-29 | Fuji Photo Film Co Ltd | Film unit with lens |
| JP2002071928A (en) * | 2000-08-23 | 2002-03-12 | Fuji Photo Film Co Ltd | Method for manufacturing color filter |
| CN1374551A (en) * | 2001-03-07 | 2002-10-16 | 夏普株式会社 | Reflecting & transmitting two-purpose colourful liquid crystal display device |
| CN1397820A (en) * | 2001-07-13 | 2003-02-19 | 精工爱普生株式会社 | Color filter base plate and electrooptical device, its mfg. method and electronic device |
| CN1405607A (en) * | 2001-09-19 | 2003-03-26 | 精工爱普生株式会社 | Colour filter baseplate, its producing method, liquid-crystal device and electronic apparatus |
-
2003
- 2003-09-18 CN CNB031573681A patent/CN1301413C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1124208A (en) * | 1997-07-01 | 1999-01-29 | Fuji Photo Film Co Ltd | Film unit with lens |
| JP2002071928A (en) * | 2000-08-23 | 2002-03-12 | Fuji Photo Film Co Ltd | Method for manufacturing color filter |
| CN1374551A (en) * | 2001-03-07 | 2002-10-16 | 夏普株式会社 | Reflecting & transmitting two-purpose colourful liquid crystal display device |
| CN1397820A (en) * | 2001-07-13 | 2003-02-19 | 精工爱普生株式会社 | Color filter base plate and electrooptical device, its mfg. method and electronic device |
| CN1405607A (en) * | 2001-09-19 | 2003-03-26 | 精工爱普生株式会社 | Colour filter baseplate, its producing method, liquid-crystal device and electronic apparatus |
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| CN1598623A (en) | 2005-03-23 |
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Granted publication date: 20070221 Termination date: 20160918 |