CN1589276A - 酰基膦及其衍生物的多聚体 - Google Patents

酰基膦及其衍生物的多聚体 Download PDF

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Publication number
CN1589276A
CN1589276A CNA028229142A CN02822914A CN1589276A CN 1589276 A CN1589276 A CN 1589276A CN A028229142 A CNA028229142 A CN A028229142A CN 02822914 A CN02822914 A CN 02822914A CN 1589276 A CN1589276 A CN 1589276A
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CN
China
Prior art keywords
alkyl
unsubstituted
substituted
phenyl
interrupted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA028229142A
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English (en)
Chinese (zh)
Inventor
J·-P·沃尔夫
G·休
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of CN1589276A publication Critical patent/CN1589276A/zh
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/553—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having one nitrogen atom as the only ring hetero atom
    • C07F9/576—Six-membered rings
    • C07F9/58—Pyridine rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Cosmetics (AREA)
CNA028229142A 2001-11-20 2002-11-13 酰基膦及其衍生物的多聚体 Pending CN1589276A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01811113 2001-11-20
EP01811113.8 2001-11-20

Publications (1)

Publication Number Publication Date
CN1589276A true CN1589276A (zh) 2005-03-02

Family

ID=8184252

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA028229142A Pending CN1589276A (zh) 2001-11-20 2002-11-13 酰基膦及其衍生物的多聚体

Country Status (10)

Country Link
US (1) US7109250B2 (OSRAM)
EP (1) EP1446410A1 (OSRAM)
JP (1) JP2005509685A (OSRAM)
KR (1) KR20050044549A (OSRAM)
CN (1) CN1589276A (OSRAM)
AU (1) AU2002366198A1 (OSRAM)
BR (1) BR0214324A (OSRAM)
CA (1) CA2467576A1 (OSRAM)
MX (1) MXPA04004729A (OSRAM)
WO (1) WO2003044030A1 (OSRAM)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104703995A (zh) * 2012-10-01 2015-06-10 瑞士联邦苏黎世技术大学 用于制备酰基磷烷的方法
WO2017096647A1 (zh) * 2015-12-08 2017-06-15 深圳市华星光电技术有限公司 光刻胶组合物及彩色滤光片的制作方法
CN110621682A (zh) * 2017-05-30 2019-12-27 Igm集团私人有限公司 通过无反应活性金属磷化物活化合成双(酰基)膦

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7196228B2 (en) * 2002-06-11 2007-03-27 Ciba Specialty Chemicals Corporation Multimer forms of mono-and bis-acylphosphine oxides
CN1842504B (zh) * 2003-08-29 2010-12-08 西巴特殊化学品控股有限公司 光纤涂料
CN101065388B (zh) * 2004-11-23 2011-12-21 西巴特殊化学品控股有限公司 制备酰基磷烷及其衍生物的方法
US7547735B1 (en) * 2006-12-04 2009-06-16 Henkel Corporation UV curable compositions
US10106629B2 (en) * 2014-05-30 2018-10-23 Igm Resins Italia S.R.L. Multifunctional acylphosphine oxide photoinitiators
CN118717533A (zh) * 2015-12-08 2024-10-01 舒万诺知识产权公司 两组分自粘合牙科用组合物，储存稳定的引发剂体系以及它们的用途

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4265723A (en) * 1979-07-06 1981-05-05 Basf Aktiengesellschaft Photocurable molding, impregnating and coating compositions
DE3034697A1 (de) * 1980-09-15 1982-05-06 Basf Ag, 6700 Ludwigshafen Acylphosphinsulfidverbindungen, ihre herstellung und verwendung
DE59010615D1 (de) * 1989-08-04 1997-02-06 Ciba Geigy Ag Mono- und Diacylphosphinoxide
US5218009A (en) 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
TW303379B (OSRAM) * 1994-03-02 1997-04-21 Ciba Sc Holding Ag
DE19618720A1 (de) * 1995-05-12 1996-11-14 Ciba Geigy Ag Bisacyl-bisphosphine, -oxide und -sulfide
US6075065A (en) * 1996-12-20 2000-06-13 Takeda Chemical Industries, Ltd. Photocurable resin composition and a method for producing the same
AU7084798A (en) * 1997-04-22 1998-11-13 Dsm N.V. Liquid curable resin composition
JP2001200007A (ja) * 2000-01-19 2001-07-24 Shin Etsu Chem Co Ltd 光硬化性樹脂組成物及び光ファイバー用被覆材
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
CA2456229A1 (en) * 2001-08-03 2003-02-13 Diversa Corporation Epoxide hydrolases, nucleic acids encoding them and methods for making and using them

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104703995A (zh) * 2012-10-01 2015-06-10 瑞士联邦苏黎世技术大学 用于制备酰基磷烷的方法
US10273258B2 (en) 2012-10-01 2019-04-30 Eth Zuerich Process for the preparation of acylphosphanes
WO2017096647A1 (zh) * 2015-12-08 2017-06-15 深圳市华星光电技术有限公司 光刻胶组合物及彩色滤光片的制作方法
CN110621682A (zh) * 2017-05-30 2019-12-27 Igm集团私人有限公司 通过无反应活性金属磷化物活化合成双(酰基)膦

Also Published As

Publication number Publication date
US20050004247A1 (en) 2005-01-06
JP2005509685A (ja) 2005-04-14
US7109250B2 (en) 2006-09-19
AU2002366198A1 (en) 2003-06-10
WO2003044030A1 (en) 2003-05-30
EP1446410A1 (en) 2004-08-18
CA2467576A1 (en) 2003-05-30
MXPA04004729A (es) 2004-07-30
BR0214324A (pt) 2004-11-03
KR20050044549A (ko) 2005-05-12

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication