CN1572748A - 具有金属合金膜的太阳光控制涂层 - Google Patents
具有金属合金膜的太阳光控制涂层 Download PDFInfo
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Abstract
一种太阳光控制涂层,用于施涂到底材上,并且具有夹在一对透明绝缘层如介电层之间的红外反射层。该红外反射层包括反射金属的合金,在该反射层中,成合金元素比反射金属优先氧化。
Description
发明背景
发明领域
本发明总体上涉及太阳光控制涂层(solar control coatings),具体来说,本发明涉及用于被涂布的透明制品的具有金属合金红外反射膜的太阳光控制涂层,以及施涂了该涂层的制品。
现有技术描述
众所周知,在用于建筑、交通工具和其它结构的玻璃板上使用高透射率、低发射率的涂层是为了控制穿过玻璃板的太阳辐射量。低发射率的涂层可以使诸如可见光这样的短波能量穿过涂层,但会反射诸如红外能这样的长波能量。这类涂层对于建筑和交通工具的应用来说是有吸引力的,因为它们降低了供暖和/或致冷的成本,进而节约了能源。
这些已知涂层可包括夹在用以降低可见光反射率的两层金属氧化物介电层之间的红外反射金属层。例如,美国专利No.4,898,790公开了一种两层锡酸锌膜之间夹有金属银膜的多层高透射率、低发射率的涂层。美国专利No.4,898,789公开了一种两层红外反射金属膜与三层金属氧化物防反射膜交替组合在一起的多层高透射率、低发射率的涂膜。举例来说,低发射率涂层的实例可见美国专利No.4,952,423和4,504,109以及英国参考文献GB2,302,102。
已知涂层的化学耐久性部分取决于红外反射膜中的反射金属抗氧化的能力。例如,反射金属的这种氧化可能会发生在金属氧化物层沉积到反射金属膜上的涂装加工期间,如在常规的磁控溅射气相沉积(MSVD)加工期间。这种氧化对涂层的性能是不利的,如提高其电导率和/或降低透射率。防止反射金属氧化的一种解决办法是在红外反射膜和其上的介电层之间加入牺牲层。该牺牲层一般是金属,如钛,它比其下层的反射金属优先氧化。但是,在生产涂层时加入牺牲层会另外增加一个加工步骤。此外,牺牲层可影响被涂布制品的透射性。
在美国专利No.5,763,063中描述了耐久性得到提高的另一种涂层。该涂层具有主要由银和/或铜构成的金属层,其中可含少量的金或另一种贵金属。在该金属层上沉积一个保护双层。该保护双层具有混合锡/铟型介电外层和锌和/或铟型介电内层。这种保护双层使生产涂层的成本增加。
尽管这些已知涂层对于传统的汽车和建筑应用来说是适当的,但有利的是提供一种使已知涂层的至少一些特性得到改进的低发射率或太阳光控制涂层。例如,有利的是提供一种在最少层数的情况下具有可接受的耐久性,同时保持所需程度的太阳光控制活度的低发射率涂层。另外,有利的是提供在其上沉积氧化物层的红外反应层,而不需要单独的牺牲层。
发明概述
本发明的多层涂层可以满足这种需求。该涂层可施涂到底材上,它可包括至少三层,如沉积到底材上的第一透明绝缘层(如介电层)、沉积在第一介电层上的红外反射层,以及沉积在红外反射层上的第二透明绝缘层(如介电层)。在本发明的实践中,红外反射层可包括反射金属与至少一种成合金元素的合金。第一和第二介电层可各自包括至少一种金属氧化物,如选自锌、钛、铝、锡、硅、钇、锆、铌、铋、钨,以及它们的组合或固溶体。在一个实施方案中,第一和第二介电层各自包括含锌的氧化物,而反射金属包括银。成合金元素比红外反射层中的反射金属优先氧化,而且在一个实施方案中,成合金元素可选自铜、金、铝、钛、锆、铪,以及它们的组合。在一个非限制性的具体实施方案中,反射层的合金可包括85原子%的银和15原子%的铜。该涂层可具有大于或等于0.05的发射率及小于或等于20Ω/sq.的电阻率。
该涂层可在第二透明绝缘层之上包括透明绝缘材料与红外反射材料构成的多个交替层。该涂层还可在透明绝缘材料构成的最上层之上包括一个保护涂层。
本发明还包括包含底材和本发明涂层的涂布制品。底材的施涂步骤如下:把第一介电层沉积在底材的至少一部分上;在第一介电层上沉积包括金属合金的红外反射层;并把第二介电层沉积在红外反射层上。
通过以下结合附图的描述将会更全面地理解本发明,在附图中,相似的参考字符始终指代相似的部分。
附图简述
图1所示为具有结合了本发明特征的涂层的涂布制品的截面图(未按比例);以及
图2所示为具有结合了本发明特征的涂层的另一个涂布制品的截面图(未按比例)。
优选实施方案的描述
本文使用的诸如“内”、“外”、“左”、“右”、“上”、“下”、“水平”、“垂直”等等这样的空间或方向用语在本发明中就如在附图中所示出的那样。但是应当理解,本发明可采用各种其它定向方式,因而这些用语不应被看作是对本发明的限制。而且,在说明书和权利要求书中使用的表示维度、物理特性等的所有数字在任何情况下都应被理解为利用术语“约”来限定其意义。因此,除非另有说明,在说明书以下部分和权利要求书中提及的数值可根据本发明要实现的所需性能而变化。每个数值参数丝毫都不会限制与权利要求书的范围等同的教导的应用,它们应当至少被看作是所记录的有效位并且使用了普通的化整方法的数。而且,在此公开的所有范围应被理解为包括其中所含的任何和所有从属范围。例如,所规定的范围“1-10”应当被认为是包括在最小值1和最大值10之间(含边界值)的任何和所有从属范围;即,从最小值1或大于1开始并以最大值10或小于10结束的所有从属范围,如1-7.6,或3.1-8.7,或5.5-10。另外,本文使用的术语“在……上沉积”、“在……上施涂”,或者“在……上提供”指的是在表面上沉积、施涂或提供,但并不一定必须与之接触。例如,一种材料“沉积到”底材上并不排除在沉积材料和底材之间存在一种或多种具有相同或不同组成的其它材料。另外,被指为“引入本文”的任何参考文献应被理解为其全部引入本文。
图1示出了涂布制品10,它具有底材12,在底材12上沉积了本发明的多层涂层叠层或涂层14。在本发明广义的实践中,底材12可以是由具有任何所需光学特性的任何所需材料构成的底材。例如,底材12可以是对可见光透明的。“透明的”是指通过底材12的透射率大于0%,且最高可达100%。“可见光”是指在390nm-800nm范围内的电磁能。另外,底材12可以是半透明或不透明的。“半透明的”是指允许电磁能(如可见光)通过,但使其漫射,使得在另一侧的物体不能被清楚地看到。“不透明的”是指其可见光透射率为0%。透明材料的适合的非限制性实例包括塑料(如聚甲基丙烯酸甲酯、聚碳酸酯、聚氨酯、聚对苯二甲酸乙二醇酯(PET)、或者用于制备上述物质的任意单体的共聚物,或者它们的混合物)、陶瓷或玻璃。玻璃可以为任何类型,如浮法玻璃或平板玻璃,并且可以是具有任何光学特性(如任意值的可见光、紫外、红外和/或总的太阳能透射量)的任意组成的玻璃。“浮法玻璃”是指通过常规的浮法加工形成的玻璃,在这种方法中,熔融玻璃被沉积到熔融金属浴上,并被可控地冷却,形成浮法玻璃条板。随后根据需要对该条板进行切割和/或成形和/或热处理。浮法玻璃加工的例子在美国专利No.4,466,562和No.4,671,155中公开。举例来说,玻璃可以是钠钙玻璃、硼硅玻璃或铅玻璃。玻璃可以是“透明玻璃”,即未着色或无色玻璃。另外,玻璃也可以是着色或有色玻璃。玻璃可以是未回火、热处理或热强化玻璃。在此使用的术语“热强化”指的是退火、回火或者至少部分回火。尽管并不限制本发明,但适合底材12的玻璃实例可见美国专利No.4,746,347;No.4,792,536;No.5,240,886;No.5,385,872和No.5,393,593,这些专利由本文引用以供参考。底材12可具有任何所需的维度,如长、宽、形状或厚度。对于常规的汽车透明度来说,底材12一般可达10mm厚,如1mm-10mm厚,如小于10mm厚,如1mm-5mm厚,如1.5mm-2.5mm,如1.6mm-2.3mm。
涂层14可改进其所沉积的底材的一种或多种物理性能,如光、热、化学或机械性能。本文使用的术语“层”或“膜”指的是所需或所选涂料组合物的涂布区域。“涂层”或“涂层叠层”包括一道或多道涂膜或层。
涂层14可以是导电涂层,如在美国专利No.5,653,903和No.5,028,759中所公开的用于制作可加热窗的导电涂层,或者是用作天线的单膜或多膜涂层。同样,涂层14可以是太阳光控制涂层。这里使用的术语“太阳光控制涂层”指的是由影响涂布制品的太阳光性能的一道或多道层或膜所组成的涂层,例如,太阳光性能包括但不限于入射到涂布制品的太阳光的可见、红外、紫外辐射的反射、吸收和/或透射的辐射量,以及热辐射量,如室温,发射率、遮蔽系数等。太阳光控制涂层可吸收、反射、或透射太阳光谱的所选区域,如包括但不限于IR、UV和/或可见光谱。
涂层14可以是低发射率涂层,允许可见波长能量如400nm-800nm透射通过涂层,但反射更长波长太阳光红外能。“低发射率”是指发射率低于0.4,如低于0.3,如低于0.2,如低于0.1,如低于或等于0.05。
如图1所示,涂层14可以是多层涂层或涂层叠层。在一个非限制性实施方案中,涂层14包括沉积在底材上的第一透明绝缘层16、沉积在第一透明绝缘层16上的红外反射层18,以及沉积在红外反射层18上的第二透明绝缘层20。透明绝缘层是指由透明不导电的含金属的材料如防反射介电材料或非金属透明材料构成的层。层16和20在下文中分别被称作第一和第二介电层,但这并不意味着限制。
保护涂层22可沉积在第二介电层20的至少一部分外表面上,而且在一个非限制性实施方案中,保护涂层22可沉积在第二介电层20的整个外表面上。保护涂层22可以由任何所需的材料构成。在一个示例性实施方案中,保护涂层22可包括一种或多种金属氧化物质,如包括但不限于氧化铝、氧化硅,或者它们的组合。例如,该保护涂层可含有35wt%-100wt%的氧化铝和65wt%-0wt%的二氧化硅,如70wt%-90wt%的氧化铝和10wt%-30wt%的二氧化硅,如75wt%-85wt%的氧化铝和15wt%-25wt%的二氧化硅,如88wt%的氧化铝和12wt%的二氧化硅,如65wt%-75wt%的氧化铝和25wt%-35wt%的二氧化硅,如70wt%的氧化铝和30wt%的二氧化硅。可含有其它物质,如铝、铬、铪、钇、镍、硼、磷、钛、锆,以及它们的氧化物,以及它们的组合,以用于影响保护涂层22的折射率。在本文的范围内使用的术语“组合”包括但不限于混合物、合金以及一种或多种这些材料的其它任意的物理或化学组合。
第一和第二介电层16和20的组成可以彼此相同或不同。这些介电层可包括一层或多层介电材料或防反射材料的膜,这些材料可以是金属氧化物、金属合金氧化物、氮化物、氧氮化物,或者它们的组合。介电层可以是透明的或基本上透明的。用于介电层的适合的金属氧化物的非限制性实例包括钛、铪、铝、硅、钇、钨、锆、铌、锌、铋、铅、铟、锡的氧化物,或者它们的组合。这些金属氧化物可含有少量的其它物质,如氧化铋中含的锰,氧化锡中含的铟等等。另外,可使用金属合金或金属混合物的氧化物,如包括但不限于含锌和锡的氧化物(如锡酸锌)、铟-锡合金的氧化物、氮化硅、氮化硅铝或者氮化铝。另外,可使用掺杂金属氧化物,如锑或铟掺杂锡氧化物,或镍或硼掺杂硅氧化物。介电层可基本上是单相膜,如金属合金氧化物膜,如锡酸锌,或者可以是由锌和锡氧化物构成的相的组合,或者可由多个金属氧化物膜组成,如在美国专利No.5,821,001;No.4,898,789;和No.4,898,790中所公开的那些,这些专利被全部引入本文以供参考。
在一个非限制性实施方案中,介电层16和20由氧化锌构成。第一和第二介电层16和20各自可具有的总厚度为小于或等于500,如小于或等于300,如小于或等于280。例如,金属氧化物膜16和20可具有的厚度范围是100-500,如150-400,如200-250。
红外反射层18由反射金属如贵金属(如包括但不限于银)构成,并且可与另一种金属或成合金元素(如包括但不限于铜、金、铝、钛、锆,以及它们的组合)形成合金。其它金属或成合金元素可优先分离到层18的表面,或者使合金更耐氧化。一个或多种成合金元素可具有比反射金属更大的扩散系数。“更大的扩散系数”是指成合金元素扩散和分离到红外反射层18的外露面的可能性更大,并形成可防止红外反射层18中的合金在上层20的沉积期间发生氧化降解的阻挡层,其中上层20的沉积是在活性等离子气氛中进行的。在一个非限制性实施方案中,反射金属是金,而成合金元素是铜。在红外反射层18中的成合金元素的浓度范围是5-30原子%,如10-25原子%,如15原子%。反射层18可具有的厚度范围是50-250,如75-150,如100。
图2所示为具有在底材12上沉积的涂层24的涂布制品10’。涂层24与涂层14类似,但包括分别为透明绝缘材料和红外反射材料的另外的交替层20(或16)和18。保护层22可沉积到由透明绝缘材料构成的最上层上。在涂层24中还可包括透明绝缘层20(或16)和红外反射层18(未示出)的另外的交替层。
本发明的太阳光控制涂层14和24可以按照任何常规方法沉积到底材12上,例如,这些常规方法包括但不限于喷涂热解、化学气相沉积(CVD)、电子束蒸发或者磁控溅射气相沉积(MSVD)。在一个实施方案中,涂层14通过MSVD法沉积。MSVD涂布装置和方法的实例对于本领域普通技术人员来说是很好理解的,其描述可见美国专利No.4,379,040;No.4,861,669;No.4,898,789;No.4,898,790;No.4,900,633;No.4,920,006;No.4,938,857;No.5,328,768;以及No.5,492,750。在MSVD法中,金属或金属合金氧化物的沉积步骤如下,在含氧气氛中溅射含金属或金属合金的阴极,以把金属氧化物或金属合金氧化物膜沉积到底材的表面上。
以下的实施例将用于说明本发明,但它们不应被看作是把本发明局限于细节。在以下的实施例以及整个说明书中,除非另作说明,所有份数或百分数均为原子百分数。
实施例
如表1所示,在2.3mm厚的普通钠钙玻璃底材上制备和涂布涂层。实施例1所示的本发明涂层没有常规的底漆层。实施例2包括具有底漆层的本发明金属合金IR反射层。对比例是没有底漆层的传统涂层叠层。在每个实施例中,氧化锌层的沉积是在Airco ILS 1600 MSVD涂布机中通过中频、双极、脉冲调节(dial)磁控活性溅射Zn来进行的。把玻璃底材放入具有氧活性氧/氩气氛的涂布机中。锌阴极被溅射,产生氧化锌层(第一介电层)。对于IR反射层来说,通过在氩气氛中溅射银-铜合金靶来沉积银-铜合金(15原子%的铜)层。钛和银层是通过在氩气氛中溅射钛和银靶而沉积的。测试所产生的涂层的电阻率、发射率和散光雾度。机械耐久性(耐磨性)试验如下:在涂布底材之后立即用铅笔擦磨擦样品,并记录样品外观的任何明显变化。
表1
实施例 | 涂层 | 电阻率Ω/sq. | 发射率 | 雾度 | 耐磨性 |
1 | 玻璃/ZnO/Ag-Cu/ZnO | 9.8 | 0.134 | B | 好 |
2 | 玻璃ZnO/Ag-Cu/Ti/ZnO | 6.34 | 0.10 | B | 好 |
对比例 | 玻璃/ZnO/Ag/ZnO | ∞ | 0.91 | C+ | 差 |
表1的数据表明,把ZnO层溅射到银层上而不使用钛牺牲层(对比例)则具有不可接受(可以忽略)的电阻率。使用银-铜层(甚至没有常规的底漆层)的实施例1具有可接受的电阻率、发射率、雾度和耐磨性。在实施例2中,在实施例1的涂层中增加钛牺牲层可最低限度地增加电阻率和发射率。本发明涂层的电阻率可小于大约20Ω/sq。
尽管本发明的一些示例性的实施方案和应用已经在上文中公开,但本领域普通技术人员将很容易理解,在不背离以上描述中所公开的概念的情况下可以对本发明进行改进。因而,在此详细描述的具体实施方案只是示例性的,并不限制本发明的范围,本发明的范围由所附的权利要求书以及其任意和全部的等效部分的全部范围来限定。
本领域普通技术人员将很容易理解,在不背离以上描述中所公开的概念的情况下可以对本发明进行改进。这种改进被认为是包含在下述的权利要求书的范围内,除非权利要求书中另有说明。因此,在此详细描述的具体实施例只是示例性的,并不限制本发明的范围,本发明的范围由所附的权利要求书以及其任意和全部的等效部分的全部范围来限定。
Claims (37)
1.多层涂层,包括一组下述层:
第一透明绝缘层;
沉积在第一透明绝缘层上的红外反射层,该红外反射层包括反射金属和至少一种成合金元素的合金;以及
沉积在红外反射层上的第二透明绝缘层。
2.权利要求1的涂层,其中第一和第二透明绝缘层各自包括介电层。
3.权利要求2的涂层,其中每个介电层包括至少一种选自锌、钛、铝、锡、硅、钇、锆、铌、铋、钨的氧化物的金属氧化物,以及它们的组合。
4.权利要求2的涂层,其中第一和第二介电层各自包括氧化锌。
5.权利要求2的涂层,其中反射金属包括银。
6.权利要求5的涂层,其中成合金元素比红外反射层中的银优先氧化。
7.权利要求6的涂层,其中成合金元素选自铜、金、铝、钛、锆、铪,以及它们的组合。
8.权利要求7的涂层,其中成合金元素是铜。
9.权利要求8的涂层,其中合金包括85原子%的银和15原子%的铜。
10.权利要求5的涂层,其中涂层的发射率大于或等于0.05。
11.权利要求5的涂层,其中涂层的电阻率小于或等于20Ω/sq。
12.权利要求1的涂层,还包括沉积在第二透明绝缘层上的保护层。
13.权利要求1的涂层,还包括沉积在第二透明绝缘层上的第二红外反射层和沉积在第二红外反射层上的第三透明绝缘层,其中第二红外反射层包括反射金属和至少一种成合金元素的合金。
14.权利要求1的涂层,还包括红外反射材料和透明绝缘材料的多个交替层,多个交替层沉积在第二透明绝缘层上,其中红外反射材料包括反射金属和至少一种成合金元素的合金。
15.涂布制品,包括:
底材;
沉积在底材上的第一透明绝缘层;
沉积在第一透明绝缘层上的红外反射层,该红外反射层包括反射金属和至少一种成合金元素的合金;以及
沉积在红外反射层上的第二透明绝缘层。
16.权利要求15的涂布制品,其中第一和第二透明绝缘层各自包括介电层。
17.权利要求16的涂布制品,其中第一和第二介电层各自包括至少一种选自锌、钛、铝、锡、硅、钇、锆、铌、铋、钨的氧化物的金属氧化物,以及它们的组合。
18.权利要求17的涂布制品,其中第一和第二介电层各自包括氧化锌。
19.权利要求17的涂布制品,其中反射金属包括银。
20.权利要求19的涂布制品,其中成合金元素比红外反射层中的银优先氧化。
21.权利要求19的涂布制品,其中成合金元素选自铜、金、铝、钛、锆、铪,以及它们的组合。
22.权利要求20的涂布制品,其中成合金元素是铜。
23.权利要求22的涂布制品,其中合金包括85原子%的银和15原子%的铜。
24.权利要求17的涂布制品,其中涂层的发射率大于或等于0.05。
25.权利要求17的涂布制品,其中涂层的电阻率小于或等于20Ω/sq。
26.权利要求15的涂布制品,还包括沉积在第二透明绝缘层上的保护层。
27.权利要求15的涂布制品,还包括沉积在第二透明绝缘层上的第二红外反射层和沉积在第二红外反射层上的第三透明绝缘层,其中第二红外反射层包括反射金属和至少一种成合金元素的合金。
28.权利要求15的涂布制品,还包括红外反射材料和透明绝缘材料的多个交替层,这些交替层沉积在第二功能透明绝缘层上,其中红外反射材料包括反射金属和至少一种成合金元素的合金。
29.涂布底材的方法,包括以下步骤:
把第一透明绝缘层沉积到底材的至少一部分上;
把包括反射金属和至少一种成合金元素的合金的红外反射层沉积在第一透明绝缘层上;以及
把第二透明绝缘层沉积在红外反射层上。
30.权利要求29的方法,其中第一和第二透明绝缘层各自包括介电层。
31.权利要求30的方法,其中第一和第二介电层各自包括至少一种选自锌、钛、铝、锡、硅、钇、锆、铌、铋、钨的氧化物的金属氧化物,以及它们的组合。
32.权利要求32的方法,其中第一和第二介电层各自包括氧化锌。
33.权利要求32的方法,其中反射金属包括银。
34.权利要求33的方法,其中成合金元素比红外反射层中的银优先氧化。
35.权利要求34的方法,其中成合金元素选自铜、金、铝、钛、锆、铪,以及它们的组合。
36.权利要求35的方法,其中成合金元素是铜。
37.权利要求36的方法,其中合金包括85原子%的银和15原子%的铜。
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US10/463,740 | 2003-06-17 | ||
US10/463,740 US20040258928A1 (en) | 2003-06-17 | 2003-06-17 | Solar control coating with metal alloy film |
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US (1) | US20040258928A1 (zh) |
EP (1) | EP1489054A1 (zh) |
CN (1) | CN1572748A (zh) |
Cited By (5)
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CN102557479A (zh) * | 2011-12-26 | 2012-07-11 | 李德杰 | 非互易型遮阳低辐射玻璃 |
CN101367620B (zh) * | 2007-08-14 | 2012-12-26 | 卡迪奈尔镀膜玻璃公司 | 日照控制低辐射涂层 |
CN103635756A (zh) * | 2010-12-09 | 2014-03-12 | Ppg工业俄亥俄公司 | 耐腐蚀太阳能镜 |
CN105599365A (zh) * | 2015-12-28 | 2016-05-25 | 太仓耀华玻璃有限公司 | 一种可调光的复合真空玻璃及其制备方法 |
CN111656226A (zh) * | 2018-01-30 | 2020-09-11 | 富士胶片株式会社 | 光学薄膜、光学元件及光学系统 |
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CN1899992A (zh) * | 2005-07-19 | 2007-01-24 | 鸿富锦精密工业(深圳)有限公司 | 模仁及其制备方法 |
EP1975274B1 (de) * | 2007-03-14 | 2012-05-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung eines wärmedämmenden, hoch transparenten Schichtsystems und mit diesem Verfahren hergestelltes Schichtsystem |
US9416049B2 (en) * | 2014-06-23 | 2016-08-16 | Intermolecular, Inc. | Low-e panels and methods for forming the same |
TWI593651B (zh) * | 2014-09-30 | 2017-08-01 | 鴻海精密工業股份有限公司 | 鍍膜玻璃及其製造方法、應用該鍍膜玻璃之電子裝置 |
KR101999706B1 (ko) * | 2015-03-16 | 2019-07-12 | 주식회사 엘지화학 | 전도성 구조체 및 이를 포함하는 전자 소자 |
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JPS5944993B2 (ja) * | 1978-07-11 | 1984-11-02 | 帝人株式会社 | 積層体 |
JPS5662229A (en) * | 1979-10-25 | 1981-05-28 | Asahi Glass Co Ltd | Electro-optical dimming panel |
EP0035906B2 (en) * | 1980-03-10 | 1989-11-08 | Teijin Limited | Selectively light-transmitting laminated structure |
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US5071206A (en) * | 1986-06-30 | 1991-12-10 | Southwall Technologies Inc. | Color-corrected heat-reflecting composite films and glazing products containing the same |
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DE19807930B4 (de) * | 1998-02-25 | 2009-04-30 | Interpane Entwicklungs- Und Beratungsgesellschaft Mbh & Co.Kg | Herstellung eines thermisch hochbelastbaren wärmereflektierenden Belags |
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2003
- 2003-06-17 US US10/463,740 patent/US20040258928A1/en not_active Abandoned
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- 2004-06-16 EP EP04014083A patent/EP1489054A1/en not_active Ceased
- 2004-06-16 CN CNA2004100592852A patent/CN1572748A/zh active Pending
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CN102557479A (zh) * | 2011-12-26 | 2012-07-11 | 李德杰 | 非互易型遮阳低辐射玻璃 |
CN105599365A (zh) * | 2015-12-28 | 2016-05-25 | 太仓耀华玻璃有限公司 | 一种可调光的复合真空玻璃及其制备方法 |
CN111656226A (zh) * | 2018-01-30 | 2020-09-11 | 富士胶片株式会社 | 光学薄膜、光学元件及光学系统 |
CN111656226B (zh) * | 2018-01-30 | 2021-12-24 | 富士胶片株式会社 | 光学薄膜、光学元件及光学系统 |
US11747520B2 (en) | 2018-01-30 | 2023-09-05 | Fujifilm Corporation | Optical thin film having metal layer containing silver and high standard electrode potential metal |
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US20040258928A1 (en) | 2004-12-23 |
EP1489054A1 (en) | 2004-12-22 |
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