CN1557012A - 用来统调离子注入机的方法和装置 - Google Patents
用来统调离子注入机的方法和装置 Download PDFInfo
- Publication number
- CN1557012A CN1557012A CNA028185714A CN02818571A CN1557012A CN 1557012 A CN1557012 A CN 1557012A CN A028185714 A CNA028185714 A CN A028185714A CN 02818571 A CN02818571 A CN 02818571A CN 1557012 A CN1557012 A CN 1557012A
- Authority
- CN
- China
- Prior art keywords
- target component
- tracking
- beam current
- control parameter
- charged particle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
- H01J2237/31703—Dosimetry
Abstract
Description
Claims (72)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/943,625 | 2001-08-30 | ||
US09/943,625 US7282721B2 (en) | 2001-08-30 | 2001-08-30 | Method and apparatus for tuning ion implanters |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1557012A true CN1557012A (zh) | 2004-12-22 |
CN100456416C CN100456416C (zh) | 2009-01-28 |
Family
ID=25479965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB028185714A Expired - Fee Related CN100456416C (zh) | 2001-08-30 | 2002-07-10 | 用来统调离子注入机的方法和装置 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7282721B2 (zh) |
EP (1) | EP1421598A1 (zh) |
JP (1) | JP2005502174A (zh) |
KR (1) | KR20040029140A (zh) |
CN (1) | CN100456416C (zh) |
TW (1) | TW571351B (zh) |
WO (1) | WO2003021630A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102347193A (zh) * | 2010-08-02 | 2012-02-08 | 北京中科信电子装备有限公司 | 一种大角度离子注入机快速调束的优化算法 |
CN111175569A (zh) * | 2020-02-20 | 2020-05-19 | 中国科学院上海应用物理研究所 | 一种基于宽带串行化的极窄束流信号峰值幅度提取方法 |
CN113571401A (zh) * | 2021-07-19 | 2021-10-29 | 广州粤芯半导体技术有限公司 | 狭缝组件及离子注入机台 |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6960774B2 (en) * | 2003-11-03 | 2005-11-01 | Advanced Micro Devices, Inc. | Fault detection and control methodologies for ion implantation processes, and system for performing same |
GB2432039B (en) * | 2004-01-09 | 2009-03-11 | Applied Materials Inc | Improvements relating to ion implantation |
US6903350B1 (en) * | 2004-06-10 | 2005-06-07 | Axcelis Technologies, Inc. | Ion beam scanning systems and methods for improved ion implantation uniformity |
US7442944B2 (en) | 2004-10-07 | 2008-10-28 | Varian Semiconductor Equipment Associates, Inc. | Ion beam implant current, spot width and position tuning |
US6992311B1 (en) * | 2005-01-18 | 2006-01-31 | Axcelis Technologies, Inc. | In-situ cleaning of beam defining apertures in an ion implanter |
US7397047B2 (en) * | 2005-05-06 | 2008-07-08 | Varian Semiconductor Equipment Associates, Inc. | Technique for tuning an ion implanter system |
KR100755069B1 (ko) * | 2006-04-28 | 2007-09-06 | 주식회사 하이닉스반도체 | 불균일한 이온주입에너지를 갖도록 하는 이온주입장치 및방법 |
GB2438893B (en) * | 2006-06-09 | 2010-10-27 | Applied Materials Inc | Ion beams in an ion implanter |
US7227160B1 (en) * | 2006-09-13 | 2007-06-05 | Axcelis Technologies, Inc. | Systems and methods for beam angle adjustment in ion implanters |
US20080245957A1 (en) * | 2007-04-03 | 2008-10-09 | Atul Gupta | Tuning an ion implanter for optimal performance |
US9234932B2 (en) * | 2013-03-13 | 2016-01-12 | Thermo Finnigan Llc | Method and apparatus for monitoring ion lens connections |
US9006692B2 (en) * | 2013-05-03 | 2015-04-14 | Varian Semiconductor Equipment Associates, Inc. | Apparatus and techniques for controlling ion implantation uniformity |
US9870896B2 (en) * | 2013-12-06 | 2018-01-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method for controlling ion implanter |
US9423635B1 (en) * | 2014-01-31 | 2016-08-23 | The University Of Toledo | Integrated magneto-optic modulator/compensator system, methods of making, and methods of using the same |
JP6588323B2 (ja) * | 2015-12-10 | 2019-10-09 | 住友重機械イオンテクノロジー株式会社 | イオン注入方法およびイオン注入装置 |
JP6644596B2 (ja) | 2016-03-18 | 2020-02-12 | 住友重機械イオンテクノロジー株式会社 | イオン注入方法およびイオン注入装置 |
US10515780B1 (en) * | 2018-12-19 | 2019-12-24 | Axcelis Technologies, Inc. | System and method of arc detection using dynamic threshold |
JP2022122112A (ja) * | 2021-02-09 | 2022-08-22 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置およびイオン注入方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4595837A (en) * | 1983-09-16 | 1986-06-17 | Rca Corporation | Method for preventing arcing in a device during ion-implantation |
US5653811A (en) * | 1995-07-19 | 1997-08-05 | Chan; Chung | System for the plasma treatment of large area substrates |
CN1155152A (zh) * | 1995-12-11 | 1997-07-23 | 株式会社日立制作所 | 带电粒子束装置及其操作方法 |
JPH10134745A (ja) | 1996-10-29 | 1998-05-22 | Jeol Ltd | 電子ビームの電流密度制御方法および装置 |
US5861632A (en) * | 1997-08-05 | 1999-01-19 | Advanced Micro Devices, Inc. | Method for monitoring the performance of an ion implanter using reusable wafers |
US6137112A (en) | 1998-09-10 | 2000-10-24 | Eaton Corporation | Time of flight energy measurement apparatus for an ion beam implanter |
BE1012358A5 (fr) * | 1998-12-21 | 2000-10-03 | Ion Beam Applic Sa | Procede de variation de l'energie d'un faisceau de particules extraites d'un accelerateur et dispositif a cet effet. |
US7309997B1 (en) | 2000-09-15 | 2007-12-18 | Varian Semiconductor Equipment Associates, Inc. | Monitor system and method for semiconductor processes |
US6774378B1 (en) * | 2003-10-08 | 2004-08-10 | Axcelis Technologies, Inc. | Method of tuning electrostatic quadrupole electrodes of an ion beam implanter |
-
2001
- 2001-08-30 US US09/943,625 patent/US7282721B2/en active Active
-
2002
- 2002-07-10 WO PCT/US2002/021751 patent/WO2003021630A1/en not_active Application Discontinuation
- 2002-07-10 JP JP2003525879A patent/JP2005502174A/ja active Pending
- 2002-07-10 KR KR10-2004-7003143A patent/KR20040029140A/ko not_active Application Discontinuation
- 2002-07-10 CN CNB028185714A patent/CN100456416C/zh not_active Expired - Fee Related
- 2002-07-10 EP EP02749890A patent/EP1421598A1/en not_active Withdrawn
- 2002-07-16 TW TW091115804A patent/TW571351B/zh not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102347193A (zh) * | 2010-08-02 | 2012-02-08 | 北京中科信电子装备有限公司 | 一种大角度离子注入机快速调束的优化算法 |
CN102347193B (zh) * | 2010-08-02 | 2015-09-30 | 北京中科信电子装备有限公司 | 一种大角度离子注入机快速调束的优化算法 |
CN111175569A (zh) * | 2020-02-20 | 2020-05-19 | 中国科学院上海应用物理研究所 | 一种基于宽带串行化的极窄束流信号峰值幅度提取方法 |
CN113571401A (zh) * | 2021-07-19 | 2021-10-29 | 广州粤芯半导体技术有限公司 | 狭缝组件及离子注入机台 |
Also Published As
Publication number | Publication date |
---|---|
EP1421598A1 (en) | 2004-05-26 |
TW571351B (en) | 2004-01-11 |
JP2005502174A (ja) | 2005-01-20 |
US7282721B2 (en) | 2007-10-16 |
US20030042427A1 (en) | 2003-03-06 |
CN100456416C (zh) | 2009-01-28 |
WO2003021630A1 (en) | 2003-03-13 |
KR20040029140A (ko) | 2004-04-03 |
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CI01 | Correction of invention patent gazette |
Correction item: Inventor Correct: Sullivan Terence Sean False: Sullivan Terence Sean Number: 51 Volume: 20 |
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CI02 | Correction of invention patent application |
Correction item: Inventor Correct: Sullivan Terence Sean False: Sullivan Terence Sean Number: 51 Page: The title page Volume: 20 |
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Free format text: CORRECT: INVENTOR; FROM: SULLIVAN TERENCE SEAN TO: PHILIP MR ROBERT MAK |
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ERR | Gazette correction |
Free format text: CORRECT: INVENTOR; FROM: SULLIVAN TERENCE SEAN TO: PHILIP MR ROBERT MAK |
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CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090128 Termination date: 20150710 |
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EXPY | Termination of patent right or utility model |