CN1514036A - High temperature metal boat and method of plating tin doped indium oxide transparent condutive membrane - Google Patents
High temperature metal boat and method of plating tin doped indium oxide transparent condutive membrane Download PDFInfo
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- CN1514036A CN1514036A CNA03129233XA CN03129233A CN1514036A CN 1514036 A CN1514036 A CN 1514036A CN A03129233X A CNA03129233X A CN A03129233XA CN 03129233 A CN03129233 A CN 03129233A CN 1514036 A CN1514036 A CN 1514036A
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- boat
- evaporation
- indium oxide
- doped indium
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Abstract
A high-temp motel evaporator with two fins (45+/-2)X(10+/-3)X (24+/-3) mm is made of the tantalum plate and annealed at 900-1200 deg.C. A method for evaporating the transparent film of Sn-doped indium oxide features that its current for evaporating is 150-200 A, the aerated oxygen is 12+/-2 seem, its vacuum level is (0.9-1)X10 to the power -2 Pa, and its baking temp for bottom is 280+/-20 deg.C.
Description
Technical field
The present invention relates to a kind of vacuum coating technology, particularly a kind of hot metal boat and utilize this hot metal boat to be coated with the method for tin-doped indium oxide nesa coating.
Background technology
Tin-doped indium oxide (In
2O
3: Sn, i.e. ITO) oxide semiconductor thin-film has good electroconductibility, has higher visible region transmitance and infrared reflectivity, simultaneously substrate had good tack and stability.Therefore obtained using widely in its electrode materials in liquid crystal and plasma panel display spare, solar cell photoelectric plate and special window and other photoelectric field.
The preparation method of ito thin film mainly contains following several: electron beam evaporation, chemical vapor deposition, reactive ion injection and magnetron sputtering etc.Wherein sputtering method obtains to use widely owing to good controllability is particularly suitable for making big area uniform thin film in enormous quantities, but simultaneously because the limitation of sputtering technology itself, the transparent conductive film that obtains with its but has the shortcoming of high thermal resistance difference, and therefore the ito thin film in the face of some specific demands seems at a loss what to do; And first three kind mode fails to be subjected to special attention owing to the restriction of stability that is subjected to technology and film forming firm degree always by contrast.
Have characteristics flexible and with low cost for traditional thermal evaporation mode, good using value and success ratio are arranged for the preparation of small batch nesa coating.But since indium tin oxide and the boat made with conventional material lose the stability that characteristic can seriously influence the process of being coated with mutually, and also can bring a lot of uncontrollable impurity simultaneously to film.Therefore be not formed with the technical process of industrial value.
Summary of the invention
The technical problem to be solved in the present invention is to overcome the shortcoming of above-mentioned prior art, and a kind of method that is coated with the ITO nesa coating with the hot metal boat is provided.
Basic thought of the present invention is: adopt with the ITO material not mutually the hot metal of erosion evaporate ito thin film as the evaporation boat, thereby overcome the difficulty of original evaporation coating technique and technology, to obtain the processing condition of the side's of stablizing resistance and good visible light transmissivity! Thereby realize the production purpose of middle-size and small-size batch!
Technical solution of the present invention is as follows:
A kind of high temperature evaporation boat that is used to be coated with the tin-doped indium oxide nesa coating is characterized in that:
Adopt tantalum to make the evaporation boat; The evaporation boat is rectangular boat, and the pass of its size and structure is:
The total length of evaporation boat comprises that two fins are (88 ± 3) mm,
The length of boat groove: dark: wide=(45 ± 2) mm: (10 ± 3) mm: (24 ± 3) mm,
The thickness of described tantalum piece is 3mm.
Described tantalum piece is the tantalum piece after 900--1200 ℃ of The high temperature anneal.
Utilize described evaporation boat to be coated with the method for tin-doped indium oxide nesa coating, comprise the general step of vacuum plating, it is characterized in that its evaporation current is 150-200A, oxygenation capacity 12 ± 2Sccm, vacuum degree control is in 0.9-1 * 10
-2Pa, the storing temperature of substrate are 280 ± 20 ℃, and the evaporation time is controlled according to the needs of resistance.
Technique effect of the present invention:
The evaporation boat that adopts aforesaid method to be made into, warp is on probation to show to have good chemical stability, life-span length and discord thin-film material lose mutually, can also keep thermal evaporation film process processing parameter few simultaneously, advantages such as easy control.Therefore have good market outlook and using value.
Description of drawings
Fig. 1 is that the present invention is the structural representation of the high temperature evaporation boat of material making with the tantalum piece.
Fig. 2 is coated with the curve of spectrum of transparent conductive film for adopting the present invention
Fig. 3 distributes for the electrode resistance value of the sampling of the transparent conductive film that adopts the present invention and be coated with
Embodiment
See also Fig. 1 earlier, Fig. 1 is that the present invention is the structural representation of the high temperature evaporation boat of material making with the tantalum piece, and the present invention adopts the tantalum piece after 900--1200 ℃ of The high temperature anneal to make the evaporation boat; The thickness of tantalum piece is 3mm.
Adopt tantalum to make the evaporation boat; The evaporation boat is rectangular boat, and the pass of its size and structure is:
The total length of evaporation boat comprises that two fins are (88 ± 3) mm,
The length of boat groove: dark: wide=(45 ± 2) mm: 10 ± 3) mm: (24 ± 3) mm,
The thickness of described tantalum piece is 3mm.
The dimensional change scope of above boat, through experimental demonstration is valid data, experimental result according to us shows if the degree of depth is little, the heat build-up poor performance of whole boat then, therefore make material distillation (being during the indium tin oxide material filming) just need very high evaporation current, so easy damage evaporation source if obtain enough heats directly by the solid-state gaseous state that becomes; If the degree of depth is too big, the heat build-up performance is too strong, and less current changes the great variety that will cause velocity of evaporation, has brought very big error for the stability of control.
In this evaporation boat of invention, we also explore one and overlap the technical process that adapts with it.Utilize described evaporation boat to be coated with the method for tin-doped indium oxide nesa coating, comprise the general step of vacuum plating, it is characterized in that its evaporation current is 150-200A, oxygenation capacity 12 ± 2Sccm, vacuum degree control is in 0.9-1 * 10
-2Pa, the storing temperature of substrate are 280 ± 20 ℃, and the evaporation time is controlled according to the needs of resistance.
In order to verify feasibility of the present invention, we have utilized by the boat of above requirement design and have done the experiment of a large amount of evaporation ito thin films, and have obtained the film of premium properties.Below be exactly that we are at following spectrum property curve that is coated with transparent conductive film of certain process conditions, as shown in Figure 3.Its square resistance is: 30 Ω
We also have been the contrast experiment to the stability of utilizing the conductive film that this invention is coated with, conclusion is the film that we can make different resistance different optical performances according to user's different specific requirement, that is to say that we can reach controlled effect to whole processing condition.Its midpoint resistance can be controlled in ± and 5 Ω variation ranges (measure sample is the circular sample of diameter 120mm, between measurement point apart from symmetry 2 points of 100mm), spectrum property are stabilized in visible waveband and keep good transmitance.Therefore can realize small batch production, market outlook are wide!
It is a specific embodiment below: the development of the dull and stereotyped transparency conductive electrode of special window.
Require: electrode resistance 35 ± 5 Ω, 600nm-1100nm average transmittances>85%.
We adopt the Technology in the present invention to make.Experiment condition and parameter are as follows:
Boat size: X=88mm, y=10mm, z=24mm, L=45mm; Evaporation current is 180A, oxygenation capacity 11.5Sccm, and vacuum degree control is 1 * 10
-2Pa, the storing temperature of substrate are 280 ℃, and the evaporation time is 60 minutes, and result people very in addition is satisfied, and the electrode resistance value that Fig. 2, Fig. 3 are respectively its sampling distributes and its curve of spectrum.
Can find that from distribution plan the stability of whole technology is extraordinary, can keep the error of each evaporation all to be within the acceptable scope.
In sum, advantage of the present invention can be summarized as follows:
1, to the shape of thin-film material, the requirement of granular size and quantity is lower, and this is better than other any one evaporation mode.
2, it is few to be coated with in the process processing parameter, process stabilizing, and the control growth for Thin Film is easy.
3, be suitable for the development of the production-scale transparent conductive film of small batch.
4, the film that obtains has good optical performance (visible transmitance>90%), and some resistance can accurately be controlled (± 5 Ω).
5, the film that obtains because little to the dependence of the amount of charging into of oxygen, be easy to make.
Claims (4)
1, a kind of evaporation boat that is coated with the tin-doped indium oxide nesa coating is characterized in that:
(1) adopt tantalum to make the evaporation boat;
(2) the evaporation boat is rectangular boat, and the proportionlity of its size and structure is:
The total length of evaporation boat comprises that two fins are (88 ± 3) mm,
The length of boat groove: dark: wide=(45 ± 2) mm: (10 ± 3) mm: (24 ± 3) mm,
2, the evaporation boat that is coated with the tin-doped indium oxide nesa coating according to claim 1, the thickness of the described tantalum piece of its feature is 3mm.
3, the evaporation boat that is coated with the tin-doped indium oxide nesa coating according to claim 1 is characterized in that described tantalum piece is the tantalum piece after 900--1200 ℃ of The high temperature anneal.
4, evaporation boat according to claim 1 is coated with the method for tin-doped indium oxide nesa coating, comprises the general step of vacuum plating, it is characterized in that its evaporation current is 150-200A, oxygenation capacity 12 ± 2Sccm, and vacuum degree control is in 0.9--1 * 10
-2Pa, the storing temperature of substrate are 280 ± 20 ℃, and the evaporation time is controlled according to the needs of resistance.
Priority Applications (1)
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CN 03129233 CN1236101C (en) | 2003-06-13 | 2003-06-13 | High temperature metal boat and method of plating tin doped indium oxide transparent condutive membrane |
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CN 03129233 CN1236101C (en) | 2003-06-13 | 2003-06-13 | High temperature metal boat and method of plating tin doped indium oxide transparent condutive membrane |
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CN1514036A true CN1514036A (en) | 2004-07-21 |
CN1236101C CN1236101C (en) | 2006-01-11 |
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CN 03129233 Expired - Fee Related CN1236101C (en) | 2003-06-13 | 2003-06-13 | High temperature metal boat and method of plating tin doped indium oxide transparent condutive membrane |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108220886A (en) * | 2018-02-28 | 2018-06-29 | 张治国 | A kind of preparation method of ITO texture transparent conductive film |
CN113088891A (en) * | 2021-03-09 | 2021-07-09 | 中国电子科技集团公司第十一研究所 | Indium evaporation boat |
-
2003
- 2003-06-13 CN CN 03129233 patent/CN1236101C/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108220886A (en) * | 2018-02-28 | 2018-06-29 | 张治国 | A kind of preparation method of ITO texture transparent conductive film |
CN113088891A (en) * | 2021-03-09 | 2021-07-09 | 中国电子科技集团公司第十一研究所 | Indium evaporation boat |
CN113088891B (en) * | 2021-03-09 | 2023-03-03 | 中国电子科技集团公司第十一研究所 | Indium evaporation boat |
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CN1236101C (en) | 2006-01-11 |
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Granted publication date: 20060111 Termination date: 20100613 |