CN1063869C - Protective screen of display device and preparation method thereof - Google Patents
Protective screen of display device and preparation method thereof Download PDFInfo
- Publication number
- CN1063869C CN1063869C CN95113367A CN95113367A CN1063869C CN 1063869 C CN1063869 C CN 1063869C CN 95113367 A CN95113367 A CN 95113367A CN 95113367 A CN95113367 A CN 95113367A CN 1063869 C CN1063869 C CN 1063869C
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- China
- Prior art keywords
- film
- layer
- absorption
- protective screen
- display device
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Abstract
The present invention relates to a protective screen of a display component used at the front of the screen of a display component, and a preparation method thereof. A pair of transparent substrates of visual light are overlapped and deposited by at least two films of an electric conduction absorption layer and a matching layer by the film deposition method. The protective screen of the present invention can prevent static electricity, strong light, ultraviolet light and glare; the protective screen which has wide wave band absorption to ultraviolet light can regulate the absorption strength to visible regions.
Description
The invention belongs to a kind of protecting screen and preparation method thereof, be mainly used in the screen of display device before.
Prior art:
1. adopt the glass that contains heavy metal material to make protecting screen.
2. the protecting screen of woven wire.
3. having antifog and anti-infrared ray selects the film of transmitted light as protecting screen such as United States Patent (USP) U.S.Patent 4828345.
4. the protecting screen such as the United States Patent (USP) U.S.Patent4732454 that contain the antireflective film of four-layer structure.
5. the protecting screen such as the United States Patent (USP) U.S.Patent 4784467 that are used for the film of the electromagnetic transmitted ray of barrier.
Above-mentioned prior art exists weak point to be: technology 1 surface has reflection, can not antistatic, technology 2 has just reduced the intensity of light, do not change of the reception of human eye unit are to ultraviolet and visible light, technology 3 is used for automobile or building trade, before can not being used for the screen of display device, technology 4 is a kind of simple anti-reflection films, technology 5 deposits ito thin film in substrate, but the absorption to the visible light power can not change, must finish ultraviolet and visible absorption by the absorption of substrate, shorter to the absorbing wavelength of ultraviolet.Purpose of the present invention overcomes the weak point of above-mentioned several technology, employing deposits the plural layers with conduction absorbed layer on transparent substrates, make protecting screen antistatic, anti glare anti static coatings, preventing ultraviolet, anti-dazzle, and the absorption bands of ultraviolet can change the absorption to visible light as required than broad.
The formation of protecting screen of the present invention constitutes (accompanying drawing 1) by substrate 1 and suprabasil film 2 two parts, substrate is to visible transparent, can be glass or plastics, the rete of film is counted N 〉=2, film is to constitute by conduction absorbed layer 3,5 with the overlapping layer by layer institute of the matching layer 4,6 of its coupling, the conduction absorbed layer is that metal oxide and metallic atom constitute, and can be TiO
2Contain Ti, or Pb
2O
3Contain Pb, or Ta
2O
5Contain retes such as Ta, matching layer can be SiO
2Or Al
2O
3Etc. non-conductive rete.
Film prepare the method that adopts at ply ground, substrate 1 upper strata deposit film, it can be the reaction magnetocontrol sputtering deposition, the thermal evaporation deposition, several different methods such as ion beam sputter depositing, substrate is before deposit film, need carry out clean to substrate with chemical method and physical method, making has good adhesive force between film and the substrate.
Deposit film need be controlled the thickness of film, to reach the control film to the absorption of visible light and ultraviolet light and the purpose that visible light is reduced reflection, need to control sputtering condition simultaneously, make the metal incomplete oxidation in the conduction absorbed layer, be to contain metallic atom in the film, film just has conductive characteristic like this, and the visible region has certain absorption, and the ultraviolet light zone has very big absorption.
When the film of depositing electrically conductive absorbed layer, can regulate the amount of incomplete oxidation according to the absorption size of visible region, for example, when protecting screen is used for color television set, need be the flow control of oxygen at 0.8cm
3/ M, the flow of gas is controlled with gas-flow rate controller, and air pressure is controlled with automatic pressure controller, and the thickness of film adopts the control of quartz crystal controller.
Advantage of the present invention:
The present invention can prepare the display device protecting screen on the transparent float glass of white, once can realize four kinds of functions, can antistatic, anti glare anti static coatings, preventing ultraviolet, anti-dazzle, and the absorption of visible region can be regulated on demand by the thickness of film, to the absorption bands broad of ultraviolet light.
Description of drawings:
Fig. 1 is the structural representation of the protecting screen of the present invention when working as N=4
1 is substrate among the figure
The 2nd, film
3, the 5th, the conduction absorbed layer
4, the 6th, matching layer
Fig. 2 is the transmittance graph figure of protecting screen
Fig. 3 is the reflectance curve figure of protecting screen
Fig. 4 is three-decker when being film N=3 protecting screen constitutes schematic diagram
7 is matching layers among the figure
The 8th, the conduction absorbed layer
The 9th, matching layer
Embodiment 1:
The structure of film 2 when N=4 as shown in Figure 1, the absorbed layer 3 of wherein conducting electricity is TiO
2Contain Ti, matching layer 4 is SiO
2, conduction absorbed layer 5 is TiO
2Contain Ti, matching layer 6 is SiO
2, substrate 1 is the float glass of white.
The deposition process of reactive sputtering is adopted in the preparation of film 2, and reacting gas is an oxygen, and sputter gas is an argon gas, and the flow of oxygen is controlled by gas flow meter.Conduction absorbed layer 3TiO
2Depositing of thin film is to charge into reacting gas oxygen, and the flow control of oxygen is 0.6cm
3/ M (25 ℃, latm), sputtering power is 400W, and sputter rate is 2.5 /S, and operating air pressure is 2Pa, TiO
2The thickness of film is 190 , TiO
2Film does not have complete oxidation, contains TiO in the film
2And metal Ti.
Matching layer 4SiO
2Deposition, be direct sputter SiO
2Material, operating air pressure are 2Pa, and sputtering power is 900W, and deposition rate is 5 /S, and thickness is 270 .
Conduction absorbed layer 5TiO
2Film thickness is 1200 , and condition is identical with rete 3.
Matching layer 6SiO
2The thickness of film is 900 , and condition is identical with rete 4.
Because TiO
2The absorption of film contains the existence of metallic atom again in the film, so film has absorption at visible region, very big in the absorption of ultraviolet region.
The transmittance graph of film 2 is an accompanying drawing 2
The reflectance curve of film 2 is an accompanying drawing 3
The conductivity of film 2 is: 2500 Ω/
Embodiment 2:
Employing thermal evaporation deposition, matching layer 7Al
2O
3The thickness of film is 1200 , conduction absorbed layer 8TiO
2Thickness be 2400 , matching layer 9SiO
2Thickness be 1200 , contain the Ti material with electron gun evaporation TiO, vacuum degree rises to 1 * 10
-5Torr evaporates above-mentioned material, the TiO that obtains under the condition of not oxygenation
2The film that contains Ti has absorption and electric action, and evaporation current is 1A, and high pressure is 2000V, Al
2O
3And SiO
2Film is according to the depositing operation deposition of routine, with the thickness of optics extremum method control film.
Claims (2)
1. the protecting screen of a display device is made of substrate (1) and film (2) two parts to visible transparent, it is characterized in that film (2) is by TiO
2Contain Ti, or Pb
2O
3Contain Pb, or Ta
2O
5The conduction absorbed layer (3,5) and the SiO that contain Ta
2Or Al
2O
3Matching layer (4,6), both are overlapping layer by layer and constitute.
2. the used preparation method of the protecting screen of display device according to claim 1, it is the magnetron sputtering deposition method, it is characterized in that it being that to adopt sputter gas be argon gas, reacting gas is an oxygen, and the flow of oxygen is with the method for the reaction magnetocontrol sputtering deposition of gas measurement instrument control.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN95113367A CN1063869C (en) | 1995-12-21 | 1995-12-21 | Protective screen of display device and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN95113367A CN1063869C (en) | 1995-12-21 | 1995-12-21 | Protective screen of display device and preparation method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1131327A CN1131327A (en) | 1996-09-18 |
| CN1063869C true CN1063869C (en) | 2001-03-28 |
Family
ID=5079978
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN95113367A Expired - Fee Related CN1063869C (en) | 1995-12-21 | 1995-12-21 | Protective screen of display device and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1063869C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008110072A1 (en) * | 2007-03-09 | 2008-09-18 | Shenzhen Pchood Technology Co., Ltd. | Lens hood for display |
| DE102010048089B4 (en) * | 2010-10-01 | 2016-09-01 | Carl Zeiss Vision International Gmbh | A method of producing a multilayer antistatic coating for a lens element |
| CN104733056B (en) * | 2015-04-08 | 2017-08-08 | 哈尔滨理工大学 | A kind of ultra wide band absorber based on cascade structure Meta Materials |
| CN105047080A (en) * | 2015-08-14 | 2015-11-11 | 河南镀邦光电股份有限公司 | Reflection-eliminating and anti-dazzle panel of display screen |
-
1995
- 1995-12-21 CN CN95113367A patent/CN1063869C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1131327A (en) | 1996-09-18 |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |