CN1131327A

CN1131327A - Protective screen of display device and preparation method thereof

Info

Publication number: CN1131327A
Application number: CN95113367A
Authority: CN
Inventors: 王明利; 范正修
Original assignee: Shanghai Institute of Optics and Fine Mechanics of CAS
Current assignee: Shanghai Institute of Optics and Fine Mechanics of CAS
Priority date: 1995-12-21
Filing date: 1995-12-21
Publication date: 1996-09-18
Anticipated expiration: 2015-12-21
Also published as: CN1063869C

Abstract

The present invention relates to a protective screen for display device and its preparation method. It is a film including conductive absorbing layers and matching layers, which are deposited by layers on the visible transparent background by using film-depositing method, and its film layer number is more than 2. The protective screen of said invention can resist static electricity, resist bright light, resist UV ray and resist glare, and its wave range of absorbing UV-light is wide, and can regulate the absorbing capacity of visible zone.

Description

Protecting screen of display device and preparation method thereof

The invention belongs to a kind of protecting screen and preparation method thereof, be mainly used in the screen of display device before.

Prior art:

1. adopt the glass that contains heavy metal material to make protecting screen.

2. the protecting screen of wire gauze.

3. having antifog and anti-infrared ray selects the film of transmitted light as protecting screen such as United States Patent (USP) U.S.Patent 4828345.

4. the protecting screen such as the United States Patent (USP) U.S.Patent 473 2454 that contain the antireflective film of four-layer structure.

5. the protecting screen such as the United States Patent (USP) U.S.Patent 4784467 that are used for the film of the electromagnetic transmitted ray of barrier.

Above-mentioned prior art exists weak point to be: technology 1 surface has reflection, can not electrostatic prevention, technology 2 has just reduced the intensity of light, do not change of the reception of human eye unit area to ultraviolet and visible light, technology 3 is used for automobile or building trade, before can not being used for the screen of display device, technology 4 is a kind of simple anti-reflection films, technology 5 deposits ito thin film in substrate, but the absorption to the visible light power can not change, must finish ultraviolet and visible absorption by the absorption of substrate, shorter to the absorbing wavelength of ultraviolet.Purpose of the present invention overcomes the weak point of above-mentioned several technology, employing deposits the multilayer film with conduction absorption layer on transparent substrates, make protecting screen electrostatic prevention, anti glare anti static coatings, preventing ultraviolet, anti-dazzle, and the absorption bands of ultraviolet can change the absorption to visible light as required than broad.

The formation of protecting screen of the present invention constitutes (accompanying drawing 1) by substrate 1 and suprabasil film 2 two parts, substrate is to visible transparent, can be glass or plastics, the rete of film is counted N 〉=2, film is to constitute by

conduction absorption layer

3,5 with the overlapping layer by layer institute of the matching

layer

4,6 of its coupling, the conduction absorption layer is that metal oxide and metallic atom constitute, and can be TiO ₂Contain Ti, or Pb ₂O ₃Contain Pb, or Ta ₂O ₅Contain retes such as Ta, matching layer can be SiO ₂Or Al ₂O ₃Etc. non-conductive rete.

Film prepare the method that adopts at ply ground, substrate 1 upper strata deposit film, it can be the reaction magnetocontrol sputtering deposition, the thermal evaporation deposition, several different methods such as ion beam sputter depositing, substrate is before deposit film, need carry out cleaning to substrate with chemical method and physical method, making has good adhesion between film and the substrate.

Deposit film need be controlled the thickness of film, to reach the control film to the absorption of visible light and ultraviolet light and the purpose that visible light is reduced reflection, need to control sputtering condition simultaneously, make the metal incomplete oxidation in the conduction absorption layer, be to contain metallic atom in the film, film just has conductive characteristic like this, and the visible region has certain absorption, and the ultraviolet light zone has very big absorption.

When the film of depositing electrically conductive absorption layer, can regulate the amount of incomplete oxidation according to the absorption size of visible region, for example, when protecting screen is used for colour television set, need be the flow control of oxygen at 0.8cm ³/ M, the flow of gas is controlled with gas-flow rate controller, and air pressure is controlled with automatic pressure controller, and the thickness of film adopts the control of quartz crystal controller.

Advantage of the present invention:

The present invention can prepare the display device protecting screen on the transparent float glass of white, once can realize four kinds of functions, can electrostatic prevention, anti glare anti static coatings, preventing ultraviolet, anti-dazzle, and the absorption of visible region can be regulated on demand by the thickness of film, to the absorption bands broad of ultraviolet light.

Description of drawings:

Fig. 1 is the structural representation of the protecting screen of the present invention when working as N=4

1 is substrate among the figure

The 2nd, film

3, the 5th, the conduction absorption layer

4, the 6th, matching layer

Fig. 2 is the transmittance graph figure of protecting screen

Fig. 3 is the reflectance curve figure of protecting screen

Fig. 4 is three-decker when being film N=3 protecting screen constitutes synoptic diagram

7 is matching layers among the figure

The 8th, the conduction absorption layer

The 9th, matching layer

Embodiment 1:

The structure of film 2 when N=4 as shown in Figure 1, the absorption layer 3 of wherein conducting electricity is TiO ₂Contain Ti, matching layer 4 is SiO ₂, conduction absorption layer 5 is TiO ₂Contain Ti, matching layer 6 is SiO ₂, substrate 1 is the float glass of white.

The deposition process of reactive sputtering is adopted in the preparation of film 2, and reacting gas is an oxygen, and sputter gas is an argon gas, and the flow of oxygen is controlled by gas flow meter.Conduction absorption layer 3TiO ₂Depositing of thin film is to charge into reacting gas oxygen, and the flow control of oxygen is 0.6cm ³/ M (25 ℃, 1atm), sputtering power is 400W, and sputter rate is 2.5 /S, and operating air pressure is 2Pa, TiO ₂The thickness of film is 190 , TiO ₂Film does not have complete oxidation, contains TiO in the film ₂And metal Ti.

Matching layer 4SiO ₂Deposition, be direct sputter SiO ₂Material, operating air pressure are 2Pa, and sputtering power is 900W, and rate of sedimentation is 5 /S, and thickness is 270 .

Conduction absorption layer 5TiO ₂Film thickness is 1200 , and condition is identical with rete 3.

Matching layer 6SiO ₂The thickness of film is 900 , and condition is identical with rete 4.

Because TiO ₂The absorption of film contains the existence of metallic atom again in the film, so film has absorption at visible region, very big in the absorption of ultraviolet region.

The transmittance graph of film 2 is an accompanying drawing 2

The reflectance curve of film 2 is an accompanying drawing 3

The electric conductivity of film 2 is: 2500 Ω/

Embodiment 2:

Film 2 is the film of three-decker when N=3, and matching layer 7 is Al ₂O ₃, conduction absorption layer 8 is TiO ₂Contain Ti, matching layer 9 is SiO ₂, what substrate was adopted is transparent plastic.As shown in Figure 4.

Employing thermal evaporation deposition, matching layer 7Al ₂O ₃The thickness of film is 1200 , conduction absorption layer 8TiO ₂Thickness be 2400 , matching layer 9SiO ₂Thickness be 1200 , contain the Ti material with electron gun evaporation TiO, vacuum tightness rises to 1 * 10 ^-5Torr evaporates above-mentioned material, the TiO that obtains under the condition of not oxygenation ₂The film that contains Ti has absorption and electric action, and evaporation current is 1A, and high pressure is 2000V, Al ₂O ₃And SiO ₂Film is according to the depositing operation deposition of routine, with the thickness of optics extremum method control film.

Claims

1. the protecting screen of a display device, comprise substrate (1) and film (2), it is characterized in that by the film (2) that the substrate (1) of visible transparent and film (2) two parts are constituted be by conduction absorption layer (3), (5) and matching layer (4), (6), both are overlapping layer by layer and constitute.

2. according to the protecting screen of claim 1, it is characterized in that the rete of film (2) is counted N 〉=2.

3. according to the protecting screen of claim 1, the absorption layer that it is characterized in that conducting electricity is the rete that contains metal oxide and metallic atom.

4. according to the protecting screen of claim 1 or 4, the absorption layer that it is characterized in that conducting electricity can be TiO ₂Contain Ti, or Pb ₂O ₃Contain Pb, or Ta ₂O ₅The rete that contains Ta.

5. the protecting screen preparation method of a display device is the method that adopts at a substrate (1) upper strata ply deposit film.

6. according to the protecting screen preparation method of claim 5, the method that it is characterized in that deposit film can be the reaction magnetocontrol sputtering deposition, or the thermal evaporation deposition, or ion beam sputter depositing.