CN1467513A - Method for manufacturing optical element - Google Patents
Method for manufacturing optical element Download PDFInfo
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- CN1467513A CN1467513A CNA021410224A CN02141022A CN1467513A CN 1467513 A CN1467513 A CN 1467513A CN A021410224 A CNA021410224 A CN A021410224A CN 02141022 A CN02141022 A CN 02141022A CN 1467513 A CN1467513 A CN 1467513A
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Abstract
The invention provides a process for making optical element, comprising adhering a heat-proof glue layer on a glass substrate, dividing the heat-proof glue layer into a plurality of sections, removing at least one section of the heat-proof glue layer, and coating a first color film onto the removed section of the heat-proof glue layer wherein dividing the heat-proof glue layer into a plurality of sections is to define the pattern on the optical element.
Description
Technical field
The present invention relates to a kind of optical element manufacture method, particularly a kind of optical element manufacture method of making optical filter.
Background technology
Colored filter is the key element of LCD (LCD) colorize, can make the LCD of high gray reach full-colorization because see through colored filter.In more detail, the effect of colored filter is to utilize the mode of optical filtering to produce red (R), green (G), blue (B) three primary colors, then three primary colors is mixed with different strong and weak ratios again, so that present various colors, and then it is full-color that liquid crystal display displays is gone out.
Generally speaking, colored filter is to produce many red, blue, green pixels on glass substrate.Therefore, after white backlight passes through these pixels, can become red, blue, green glow, and then constitute primaries.Existing common method for manufacturing colored filtering substrate comprise print process, decoration method, pigment dispersing method, electricity method, dry film method or the like, wherein be topmost method for making in the market with the pigment dispersing method.To be example below, the existing method of making colored filter will be described with the pigment dispersing method.
Please refer to shown in Figure 1ly, existing manufacturing method of color filters comprises following several steps:
At first, existing method for manufacturing colored filtering substrate provides a glass substrate (glass substrate) 11, and the action that utilizes the cleaning machine (not shown) that the surface of glass substrate is cleaned.Wherein, the glass substrate 11 that is usually used in making thin film transistor (TFT) (TFT) is alkali-free glass; In addition, common cleaning way is that ultraviolet ray (UV) is cleaned, it utilizes ultraviolet light that airborne oxygen molecule is transformed into ozone molecule, so that utilize ozone molecule with residual organic qualitative response on the glass substrate 11 and decomposition, and the method that ultraviolet ray is cleaned approximately can be removed the organic substance that thickness is 100 .Above-mentioned ultraviolet ray is cleaned and is called the dry type cleaning again, and other has the cleaning way that adds lotion or deionized water then to be called wet-cleaned.
Secondly, and the photoresistance of coating required color on washed glass substrate 11 (photo-resist, PR) 12, for example be red photoresistance.Wherein, the material of photoresistance 12 comprises that (photo active compound PAC), and solvent (solvent), and can be divided into photoresistance 12 positive photoresistance and negative photoresistance according to meeting light characteristic for resin (resin), emulsion; The characteristic of positive photoresistance is to dissolve in developer solution behind the irradiation, and it is generally used in the technology of high-resolution products (as TFT-Array), and the characteristic of negative photoresistance is to be insoluble to developer solution behind the irradiation, and it is generally used in the above technology of 3 μ m, as colored filter.In addition, photoresistance 12 is for utilizing coating process coating on the glass substrate 11, and coating process mainly is to utilize tubular type (tube) from the glass substrate 11 central authorities photoresistance 12 that drips, or utilizes slit (slit) coating one deck photoresistance 12 on glass substrate 11; After being coated with photoresistance 12, utilize rotation (spin) mode rotary glass substrate 11 again, so that allow photoresistance 12 coat uniformly on the glass substrate 11.
Then carry out lithography process, so that form as light shield (mask) 60 designed pattern on the photoresistance 12.In detail, in this step be with on the glass substrate 11 of intact photoresistance 12 deliver in the exposure bench (not shown), in exposure bench, carry out prealignment (pre-alignment), Proximity Gap measurement then in regular turn, aim at (alignment, Mask Pattern), reach exposure technologies such as (exposure).
(development) technology of developing then so that utilize developing machine platform (developer) to develop through the photoresistance 12 of exposure, allows photoresistance 12 form required pattern.
From the above, on the existing colored filter photoresistance that is coated with multiple different colours, for example Lv Se photoresistance 13 and blue photoresistance 14.Wherein, the formation step of photoresistance 13 and photoresistance 14 repeats aforesaid coating process, lithography process and developing process and gets final product.
At last, carry out roasting firmly (post-bake) technology photoresistance 12～14 is hardened fully, so that when carrying out subsequent technique, photoresistance 12～14 can not come off easily.
In addition, also a protective seam (over coat layer) need be on photoresistance 12～14, formed in addition, in order to making the surface of colored filter more smooth, and photoresistance 12～14 can be protected at some specific productss.
Yet, because aforementioned existing manufacturing method of color filters is to utilize light shield 60 to carry out lithography process, therefore must make light shield 60 according to required pattern, and need that exposure bench is aimed at and technology such as exposure, and these all are one of cost sources of manufacturer.
Therefore, how providing a kind of optical element manufacture method of can not need utilizing light shield to carry out lithography process, is one of important topic of current manufacturing optical element in fact.
Summary of the invention
At the problems referred to above, purpose of the present invention is for providing a kind of optical element manufacture method of can not need utilizing light shield to carry out lithography process.
For achieving the above object, be included on the glass substrate according to optical element manufacture method of the present invention and glutinously put a heat-resisting glue-line, heat-resisting glue-line cutting is divided into a plurality of zones, removes a zone of heat-resisting glue-line and be coated with one first colour film in the zone that removes heat-resisting glue-line at least.In the present invention, heat-resisting glue-line is cut and is divided into a plurality of zones, so that define the pattern on the optical element.
In addition, comprise also that according to optical element manufacture method of the present invention coating one first diaphragm (over coat film) is on first colour film, remove another zone of heat-resisting glue-line and be coated with one second colour film in another zone that removes heat-resisting glue-line at least.
In sum, owing to according to required pattern heat-resisting glue-line cutting is divided into a plurality of zones according to optical element manufacture method of the present invention, so that define the zone of coating chromatic rete, so do not use light shield to carry out lithography process, therefore can save the cost of light shield and exposure bench to define required pattern.
Description of drawings
Fig. 1 is a synoptic diagram, shows the synoptic diagram of existing full-color filter production method.
Fig. 2 is a synoptic diagram, shows the synoptic diagram according to the full-color filter production method of preferred embodiment of the present invention.
Fig. 3 A is a synoptic diagram, is shown in the full-color filter production method of preferred embodiment of the present invention, cuts out the synoptic diagram of required pattern on heat-resisting glue-line.
Fig. 3 B is a synoptic diagram, is shown in the full-color filter production method of preferred embodiment of the present invention, forms the synoptic diagram of first colour film.
Fig. 3 C is a synoptic diagram, is shown in the full-color filter production method of preferred embodiment of the present invention the synoptic diagram of prepared full-color optical filter.[figure number explanation] 11: glass substrate 12: photoresistance 13: photoresistance 14: photoresistance 21: glass substrate 22: heat-resisting glue-line 221: 25: the three colour films 60 of long arc shape zone 231: the first diaphragm 241: the second diaphragms of 24: the second colour films of 23: the first colour films: light shield
Embodiment
Hereinafter with reference to relevant drawings, the optical element manufacture method according to preferred embodiment of the present invention is described, wherein components identical will be illustrated with identical reference marks.
Please refer to shown in Figure 2ly, comprise following several steps according to the optical element manufacture method of preferred embodiment of the present invention:
At first, provide a glass substrate 21 according to the optical element manufacture method of preferred embodiment of the present invention, and the action that utilizes the cleaning machine (not shown) that the surface of glass substrate 21 is cleaned.In addition, in this step, can also toast cleaning glass substrate 21 later, so as to remove on the glass substrate 21 residual moisture, and then increase its adhesion.Described in the detailed description of this step system as prior art, so no longer elaboration.
Secondly, the glutinous heat-resisting glue-line 22 of putting on washed glass substrate 21.In the present embodiment, the material of employed heat-resisting glue-line 22 is that thermal expansivity is little, and can heated denaturalization (can stand the maximum temperature in the technology at least).In addition, when putting heat-resisting glue-line 22, can utilize the air discharge of roller, glutinous to avoid producing bad optical element because of residual air with 22 of glass substrate 21 and heat-resisting glue-lines.
Then heat-resisting glue-line 22 cuttings are divided into a plurality of zones, so that define the pattern of optical element.In the present embodiment, heat-resisting glue-line 22 utilizes special-shaped cutting machine to cut, and all understands and be familiar with this operator, utilizes special-shaped cutting machine to cut out required pattern easily on heat-resisting glue-line 22.As shown in Figure 3A, heat-resisting glue-line 22 is square, and its central authorities are cut to two concentric circless, and the zone in the middle of concentric circles cuts into a plurality of long arc shapes zone.
Then, referring again to shown in Figure 2, remove a zone of heat-resisting glue-line 22 at least.In the present embodiment, shown in Fig. 3 B, several long arc shape zones 221 in the pattern of heat-resisting glue-line 22 are equally spaced torn off.
At last, as shown in Figure 2, coating (coating) one first colour film 23 is in the zone that removes heat-resisting glue-line 22.In the present embodiment, first colour film 23 is red, and it is coated in the aforesaid long arc shape zone 221 (shown in Fig. 3 B).
As mentioned above, can be used for making full-color optical filter according to the optical element manufacture method of preferred embodiment of the present invention, it is the colour film that forms other color on the optical element that forms first colour film 23 again.And when forming the colour film of other color, polluted, so must be prior to forming a diaphragm (over coat film) on first colour film 23 for fear of first colour film.
As shown in Figure 2, one first diaphragm 231 is formed on first colour film 23.In the present embodiment, first diaphragm 231 is photoresist layers, and its material can be resin, emulsion or solvent etc.
In the present embodiment, then carry out soft roasting (soft baking) technology,, and then increase the adhesion on 231 pairs first colour film 23 surfaces of first diaphragm so that first diaphragm 231 is transformed into solid-state by liquid state.And conditions such as employed heating-up temperature of soft curing process and heat time heating time are according to the material of employed first diaphragm 231 and fixed, for example, can utilize 100 ℃, heating that the diaphragm 231 of winning is solidified.
After the soft curing process of finishing first diaphragm 231, then to carry out the exposure and the developing process of first diaphragm 231, so that first colour film 23 that protection has been coated with, and avoid first colour film 23 in follow-up technology, to sustain damage.
As shown in Figure 2, then will be coated with the technology of one second colour film 24, it is to repeat aforesaid another zone that removes heat-resisting glue-line 22, coating second colour film 24 in another zone that removes heat-resisting glue-line 22; In addition, in follow-up technology, sustain damage for fear of second colour film 24, thus to be coated with one second diaphragm 241 on second colour film 24, its detailed step as previously mentioned, so no longer set forth.
According to aforesaid technology, then can be coated with one the 3rd colour film 25; Wherein, because the colour film of three kinds of colors of present embodiment coating, so need on the 3rd colour film 25, not form diaphragm.In the present embodiment, aforesaid second colour film 24 is green, and the 3rd colour film 25 is blue.
Refer again to shown in Figure 2ly, after being coated with three layers of colour film, then is to utilize etch process that first diaphragm 231 and second diaphragm 241 are divested (strip).
At last, peel off according to required unnecessary part, so just can make required optical element glass substrate 21.As shown in Figure 3A, be to define a pie chart case on the optical element, therefore in the present embodiment, the part in the pie chart case outside is stripped from, just therefore can access the full-color optical filter (RGB filter) of the circle shown in Fig. 3 C.In addition, allly be familiar with this operator and should understand, can make the optical element of other kind, for example dichroic mirror (Dichroic Mirror) equally according to aforementioned technology.
In sum, because the optical element manufacture method according to preferred embodiment of the present invention is divided into a plurality of zones for according to required pattern heat-resisting glue-line 22 being cut, so that define the zone of coating chromatic rete (as first colour film 23, second colour film 24 and the 3rd colour film 25), so need not use light shield to carry out lithography process, therefore can save the cost of light shield and exposure bench.In addition, when being coated with each rete, can utilize identical umbrella stand (pin) need not change according to the optical element manufacture method of preferred embodiment of the present invention, and can easily change required pattern, so that make the optical element of arbitrary shape.
The above only is exemplary, rather than restrictive.Anyly do not break away from spirit of the present invention and category, and, all should be contained in the protection domain of claim of the present invention its equivalent modifications of carrying out or change.
Claims (9)
1, a kind of optical element manufacture method is characterized in that, comprises:
Go up the glutinous heat-resisting glue-line of putting in a glass substrate (glass substrate);
Should heat-resisting glue-line cutting be divided into a plurality of zones, so that define the pattern of an optical element;
At least remove a zone of this heat-resisting glue-line; And
Coating (coating) one first colour film is in this zone that removes this heat-resisting glue-line.
2, optical element manufacture method as claimed in claim 1 is characterized in that: clean this glass substrate glutinous earlier before putting this heat-resisting glue-line.
3, optical element manufacture method as claimed in claim 1 is characterized in that, also comprises:
Be coated with one first diaphragm (over coat film) on this first colour film;
At least remove another zone of this heat-resisting glue-line; And
Be coated with one second colour film in another zone that removes this heat-resisting glue-line.
4, optical element manufacture method as claimed in claim 3 is characterized in that, also comprises: divest (strip) this first diaphragm.
5, optical element manufacture method as claimed in claim 3 is characterized in that: this first diaphragm is a photoresist layer.
6, optical element manufacture method as claimed in claim 5 is characterized in that, also comprises:
After this photoresist layer of coating, soft roasting (soft baking) this optical element is to solidify this photoresist layer; And
Expose this optical element with this photoresist layer that develops.
7, optical element manufacture method as claimed in claim 1 is characterized in that, also comprises: the scope that pattern defined this glass substrate in addition of peeling off this optical element.
8, optical element manufacture method as claimed in claim 1 is characterized in that: this optical element is a full-color optical filter (RGB filter).
9, optical element manufacture method as claimed in claim 1 is characterized in that: this optical element is a dichroic mirror (Dichroic Mirror).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02141022 CN1249462C (en) | 2002-07-11 | 2002-07-11 | Method for manufacturing optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 02141022 CN1249462C (en) | 2002-07-11 | 2002-07-11 | Method for manufacturing optical element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1467513A true CN1467513A (en) | 2004-01-14 |
| CN1249462C CN1249462C (en) | 2006-04-05 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02141022 Expired - Fee Related CN1249462C (en) | 2002-07-11 | 2002-07-11 | Method for manufacturing optical element |
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| Country | Link |
|---|---|
| CN (1) | CN1249462C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101551545B (en) * | 2008-04-03 | 2012-07-18 | 北京京东方光电科技有限公司 | Method for manufacturing color film substrate |
| WO2016101350A1 (en) * | 2014-12-26 | 2016-06-30 | 深圳市华星光电技术有限公司 | Manufacturing method of color filter |
| CN106450027A (en) * | 2016-10-31 | 2017-02-22 | 昆山维信诺科技有限公司 | Flexible organic light-emitting display screen and preparation method thereof |
-
2002
- 2002-07-11 CN CN 02141022 patent/CN1249462C/en not_active Expired - Fee Related
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101551545B (en) * | 2008-04-03 | 2012-07-18 | 北京京东方光电科技有限公司 | Method for manufacturing color film substrate |
| WO2016101350A1 (en) * | 2014-12-26 | 2016-06-30 | 深圳市华星光电技术有限公司 | Manufacturing method of color filter |
| CN106450027A (en) * | 2016-10-31 | 2017-02-22 | 昆山维信诺科技有限公司 | Flexible organic light-emitting display screen and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1249462C (en) | 2006-04-05 |
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Granted publication date: 20060405 |