CN1464014A - Ultraprecise polished film and method for manufacturing the same - Google Patents
Ultraprecise polished film and method for manufacturing the same Download PDFInfo
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- CN1464014A CN1464014A CN 02124006 CN02124006A CN1464014A CN 1464014 A CN1464014 A CN 1464014A CN 02124006 CN02124006 CN 02124006 CN 02124006 A CN02124006 A CN 02124006A CN 1464014 A CN1464014 A CN 1464014A
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Abstract
The present invention is one super-precise polishing film and its making process, and features that nano level or submicron diamond and organic resin or inorganic binder solution are mixed to form homogeneous paint, and the paint is painted to the surface of plastic film or other base belt and dried to form the nano level polishing diamond film. The present invention has the features of high hardness and fine granularity, and has high polish efficiency to ceramic and other superhard material and high smoothness. The polishing needs no polishing liquid, and this can reduce pollution to polished machine and environment and makes clean treatment simple.
Description
Technical field the present invention relates to polished film, is called pouncing paper again, abrasive belt, and the polishing band more particularly, is a kind of high-accuracy diamond polishing film.
The precision sizing of many high-tech components and parts all be unable to do without grinding and polishing, wherein characteristics such as easy to use and working (machining) efficiency height are subject to people's attention the application type polished film with it, Application Areas is tending towards increasing, be mainly used in mechanically resistant materials such as metal, pottery, plastics, glass, for example, the precision optics eyeglass, the recording disk of various audio-visual datas, tape, magnetic card, magnetic head, the joints of optical fibre, coupling apparatus, losser, monocrystalline silicon piece, micromotor axle and reverser, high technology ceramics device, jewel and other accurate hard device; Polished film not only has the function of grinding and polishing, but also foreign matter that can the cleaning device surface, as the test probe of semi-conductor silicon chip, the clean of integrated package test jack and liquid crystal display surface etc. is all used polished film.
The surface smoothness of accurate devices such as the general optical communication device of background technology, optical mirror slip, disk, semiconductor monocrystal silicon chip all requires very high, if there is convex-concave on the surface, scratches or adheres to foreign matter, designed accuracy and performance will can not get guaranteeing.So final surface finish is the important course of processing of left and right sides accurate device performance.
For example, telecommunication optical fiber replaces communications net and the various computer network system that copper cash is used in communication trunk, communication circuit, cable television network, cell communication net, office block in a large number, and when setting up these communication systems, generally use the joints of optical fibre that optical fiber and optical fiber, optical fiber and equipment and equipment and equipment are coupled together.The most frequently used joints of optical fibre are ceramic insertion core junctors, optical fiber passes from the mesopore of columniform ceramic insertion core, with hot setting adhesive fixing after, re-use various abrasive polishing materials the end of lock pin and optical fiber grinding and polishing together, with avoid owing to the end uneven, scratch or adhere to optical signal that foreign matter causes cross multiple scattering and reflection, guarantee the signal transmission quality of communication system.The general grinding and polishing in the end of the joints of optical fibre becomes smooth finish very high protruding sphere or tapered plane.
Reach high like this surface smoothness, can use the lapping liquid that contains abrasive material, perhaps use abrasive material to be fixed on polished film on the film, divide the numbers steps such as corase grind, middle mill, correct grinding, polishing to carry out, also can combine the intersection use to lapping liquid and polished film.But,, not only need the means of redispersion, and influence nonferromagnetic substance easily because lapping liquid is easy to generate the gathering of precipitation or abrasive grain in put procedure.In addition, lapping liquid usually has detrimentally affects such as corrosive nature to grinding machinery, and liquid waste disposal also becomes the problem that people pay close attention to gradually.So, use polished film to become main flow gradually.
Polished film commonly used is to be coated after evenly by abrasive material and wedding agent blending dispersion on the tape base such as plastics, and drying or curing form.General abrasive material uses granularity to be micro mists such as the silicon carbide of 0.5-40 μ m, aluminum oxide, chromic oxide, ferric oxide, silicon oxide, cerium oxide, diamond, and wedding agent uses synthetic or natural resin, materials such as tape base use polyester (PET) film.
Using the grinding and polishing process of polished film processing precise device to be divided into numbers such as corase grind, middle mill, correct grinding, polishing usually goes on foot and carries out, and the quality of the final direct left and right sides of bright finished precision accurate device is exactly like this such as the attrition process of the joints of optical fibre and semiconductor monocrystal silicon chip.Final polishing is generally polishing fluid and joins polishing cloth (fine hair cloth etc.), and perhaps polishing fluid is joined the polished film that surfaceness is a submicron order.The manufacturing technology difficulty of polished film that is used alone as final polishing is bigger, the nano level silicon oxide polished film that has only Japan to produce at present, as the FOS-01 of Nippon Telegraph and Telephone etc., but performance issue such as this class polished film still has the polishing low precision, working (machining) efficiency is low, wearing quality is not enough.
The objective of the invention is to overcome the shortcoming of prior art, propose a kind of final polishing performance good nano-diamond polished film and manufacture method thereof.
Summary of the invention is realized the main technical schemes of the object of the invention: with nano-diamond micro mist and Resin adhesive or inorganic bonding agent thorough mixing commonly used, be uniformly dispersed, then it is coated on the tape base that comprises plastics film equably, promptly makes the nano-diamond polished film after drying and the solidification treatment.
Polished film provided by the invention is to be made by following method:
Powdery, granular or blocky resin are dissolved in organic solvent or the water, make the Resin adhesive that solid content is 10-90%, again the nano-diamond micro mist is mixed with the weight ratio of 1-9: 9-1 with Resin adhesive, and add enough solvents, it is uniformly dispersed, coating thickness then is the tape base surface of 25-500 μ m, promptly obtains required nano-diamond polished film after drying.
The manufacture method of polished film provided by the invention may further comprise the steps:
(1) powdery, granular or blocky resin are dissolved in organic solvent or the water, make solid content and be
The Resin adhesive of 10-90%,
(2) diadust is mixed with the weight ratio of 1-9: 9-1 with the Resin adhesive that step (1) obtains, and add foot
Enough solvents use ball mill, sand mill or ultrasonic dispersing machine fully to disperse, and make coating,
(3) coating that step (2) is made is coated thickness equably with roll coater or spraying machine and is
The tape base surface of 25-500 μ m, coat-thickness are controlled at 0.1-10 μ m, are promptly received after drying
Meter level diamond polishing film.
Used diamond abrasive is a synthetic diamond micropowder in the method for the present invention, for example, the nanometer monocrystalline diadust that explosive detonation method makes, the perhaps polycrystalline diamond micro mist that makes of graphite explosion method, granularity is 1-200nm.
In the method for the present invention used resinoid bond comprise that polyester, urethane, polyethers, polyvinyl chloride, poly-acetic acid second are rare, a kind of or two or more mixtures of polyvinyl alcohol, polymeric amide, poly-phenol, Resins, epoxy, polyacrylic, starch, nitro-cotton etc.; Perhaps polymer multipolymers such as the rare multipolymer of vinylchlorid acetic acid second, polyester-polyurethane multipolymer; Perhaps use the wedding agent that contains the inorganic silicon polymkeric substance.
In addition, can in coating, add softening agent as required, as stearate etc.; Also can add and promote dispersed and anlistatig tensio-active agent (anionic, cationic, both sexes or non-ionic type), as sulphonate, amine, phosphoric acid ester, polyol ester.
Used tape base is to have higher tensile strength in the method for the present invention, and good thermotolerance and solvent resistance arranged, comprise various plastics films, as polyester, nylon, polyethylene, polypropylene, polyvinyl chloride, polyvinyl alcohol, polyacrylic ester, cellulose acetate, polycarbonate, urethane, and material such as cloth, paper, leather.Particularly from physical strength, coating homogeneity, post-treatment adaptability and grinding operation, thickness is that the biaxially oriented film of the polyester of 25-200 μ m or nylon is the most suitable.
Used solvent comprises ketones such as acetone, butanone, first isobutyl ketone, pimelinketone in the method for the present invention, alcohols such as methyl alcohol, ethanol, Virahol, butanols, isopropylcarbinol, ester classes such as ethyl acetate, propyl acetate, isopropyl acetate, ethyl lactate, ethers such as diethyl ether, tetrahydrofuran (THF), glycol dimethyl ether, carbohydrate such as benzene,toluene,xylene, vinylbenzene, hexanaphthene, chlorination carbohydrate such as chloromethane, Narcotile, chloroform, tetracol phenixin, wherein any or two or more mixtures.Beyond these organic solvents, water solvent or aqueous ethanol, acetone-inso series solvent also can use.
The used dispersing apparatus of method of the present invention comprises stirrer, ball mill, sand mill and ultrasonic dispersing machine etc.Should control dispersion condition and time, make the abrasive grain homodisperse, not produce bad being advisable such as aggregated particles during with coating.
The used coating machine of method of the present invention comprises pulley type coating machine and jet printing type coating machine.The pulley type coating machine is further divided into coating methods such as anti-roll-type, intaglio plate formula.During coating, can regulate conditions such as dope viscosity, roller speed, linear speed, the thickness 0.1-10 μ m of control coating.Can also as required, can pass through drying oven to the polished film that drying is crossed again by regulating rate of drying and the chemical reaction velocity that linear speed and kiln temperatures are regulated coating, carry out redrying.
As required, can also be placed on polished film in thermostat container or the thermostatic chamber, design temperature 40-100 ℃, be incubated 10-100 hour, regulate suitable temperature and time, curing reaction is carried out fully.
According to purposes and service requirements, polished film can be processed into shapes such as the disk of various size, square sheet, winding.
Provided by the present invention is the good nano-diamond polished film of a kind of final polishing performance.Because the granularity of diadust is very little, can reach accurate polishing minute surface.Compare with other abrasive materials simultaneously, diadust has the highest hardness, so polishing efficiency is very high.Especially has unique polishing effect for ultra hard ceramic, jewel etc.On the other hand, compare with common polishing fluid, polishing efficiency height not only, and do not have the problems such as pollution of waste liquid to machinery and environment.
Further specify characteristics of the present invention below by specific examples.
Embodiment
Example 1
Take by weighing artificial single crystal's diadust (Gansu reach the clouds nano material company limited goods) 200g of mean particle size 10nm, add among polyurethane adhesive (the new photochemical manufactured product in the Shanghai) 1600g of nonvolatile component content 30%, add mixed solvent (toluene: butanone: 500g pimelinketone=2: 1: 1) again, after tentatively disperseing by stirrer, change the ball mill dispersion tank over to, utilize ball mill that said mixture is fully disperseed promptly to form in 120 hours coating fluid.Then, coating fluid is transferred to charging tank, add polyurethane adhesive solidifying agent 200Kg again, dope viscosity is approximately 50cp.Utilize reverse rollers cartridge type coating machine, above-mentioned coating fluid is coated on the polyester film tape base that thickness is 75 μ m equably, regulate coating thickness and make it after 120 ℃ of warm air dryings, form the thick coating of 3 μ m, promptly make nano-diamond polished film of the present invention.This polished film overall average thickness is 78 μ m, the surface on average slightly degree of making be 0.07 μ m.
Example 2
Take by weighing man-made polycrystalline diamond micro mist (Inst. of Mechanics, CAS's goods) 2Kg of average apparent granularity 150nm, add among polyester glue (the Japanese fuji description film Co., Ltd. goods) 14Kg of nonvolatile component content 40%, add mixed solvent (toluene: butanone: ethyl acetate=1: 1: 1) 3Kg again, after tentatively disperseing by stirrer, change the ball mill dispersion tank over to, utilize ball mill that said mixture is fully disperseed promptly to form in 100 hours coating fluid.Then, coating fluid is transferred to charging tank, and suitably add mixed solvent viscosity adjustment to 100cp.Utilize reverse rollers cartridge type coating machine, above-mentioned coating fluid is coated on the polyester film tape base that thickness is 75 μ m equably, regulate coating thickness and make it after 120 ℃ of warm air dryings, form the thick coating of 5 μ m, promptly make submicron order diamond polishing film of the present invention.This polished film overall average thickness is 80 μ m, the surface on average slightly degree of making be 0.12 μ m.
Example 3
Use the brilliant hard rock micro mist of artificial single crystal of mean particle size 20nm, adopt the batching and the coating process of example 1, can make the nano-diamond polished film of total thickness 79 μ m, surface average roughness 0.08 μ m.
Example 4
This example is an application examples.
The nano-diamond polished film that above-mentioned example 1 is made is cut into the disk of diameter 127mm, utilizes the NSK skill to grind the SFP-550 shredder that Co., Ltd. makes, and carries out the polishing experiments of the joints of optical fibre (PC) under condition shown in the subordinate list 1.Grind 12 SC connector heads, the average reflection loss is-48dB that insertion loss-0.1dB meets the specification requirement of telecommunication optical fiber junctor.Subordinate list 1
| The grinding stage | Remove photoresist | Sphere forms | Corase grind | Middle mill | Correct grinding | Polishing |
| Pouncing paper | SC30μm | With a left side | D9μm | D3μm | D1μm | Example 1 polished film |
| Rotating speed (rpm) | 70 | 70 | 70 | 70 | 70 | 70 |
| Pressure (g) | 10 change and do not pressurize, and then add to 4800 | 4800 | 4800 | 4800 | 4800 | 4800 |
| Time (Sec) | 45 | 60 | 30 | 30 | 30 | 60 |
| The mill rubber cushion | Thick 5mm hardness 80duro | With a left side | With a left side | With a left side | With a left side | With a left side |
Annotate: wherein pouncing papers such as SC30, D9, D3, D1 are Beijing Guorui Science and Technology Co.,Ltd.'s product.
Claims (5)
1. Ultraprecise polished film, it is characterized in that this polished film is prepared by following method: nano level or submicron order diadust and organic resin or inorganic wedding agent solution are mixed make coating, then coating is coated equably tape base surfaces such as plastics film, drying promptly obtains the nano-diamond polished film.
2. the preparation method of polished film according to claim 1 may further comprise the steps:
(1) powdery, granular or blocky resin are dissolved in organic solvent or the water, make the Resin adhesive that solid content is 10-90%,
(2) again the nano-diamond micro mist is mixed with the weight ratio of 1-9: 9-1 with the Resin adhesive that step (1) obtains, and adds enough solvents, use ball mill, sand mill or ultrasonic dispersing machine fully to disperse, make coating,
(3) coating that step (2) is made is coated the tape base surface that thickness is 25-500 μ m equably with roll coater or spraying machine, and coat-thickness is controlled at 0.1-10 μ m, promptly obtains the nano-diamond polished film after drying.
3. according to the preparation method of right 1 described polished film, the granularity that it is characterized in that described diadust is 1-200nm.
4. according to the preparation method of right 1 described polished film, it is characterized in that the described a kind of or two or more mixtures that comprise polyester, urethane, polyethers, polyvinyl chloride, Resins, epoxy, polyacrylic, starch, nitro-cotton, polyvinyl alcohol etc.; Also comprise the wedding agent that contains the inorganic silicon polymkeric substance.
5. according to the preparation method of right 1 described polished film, it is characterized in that described solvent comprises a kind of or two or more mixtures of acetone, ethanol, water, toluene, dimethylbenzene, methylethylketone, ethyl acetate, first isobutyl ketone, pimelinketone, tetrahydrofuran (THF) etc.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB02124006XA CN100357342C (en) | 2002-06-14 | 2002-06-14 | Ultraprecise polished film and method for manufacturing the same |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB02124006XA CN100357342C (en) | 2002-06-14 | 2002-06-14 | Ultraprecise polished film and method for manufacturing the same |
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| CN1464014A true CN1464014A (en) | 2003-12-31 |
| CN100357342C CN100357342C (en) | 2007-12-26 |
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| CN101607384B (en) * | 2009-07-10 | 2010-09-22 | 湖北玉立砂带集团股份有限公司 | Preparation method of UEA116 ultraprecise ground belt |
| CN102211319A (en) * | 2010-04-08 | 2011-10-12 | 三芳化学工业股份有限公司 | Polishing pad manufacturing method and polishing pad |
| CN101225281B (en) * | 2007-12-17 | 2012-02-22 | 河南省联合磨料磨具有限公司 | Polishing film and method for making same |
| CN102528648A (en) * | 2012-02-10 | 2012-07-04 | 安徽工业大学 | Nano diamond-macromolecular composite abrasive for solidifying abrasive polishing pad |
| CN103756572A (en) * | 2013-12-25 | 2014-04-30 | 佛山市凌晖化工有限公司 | Stone surface polishing coating agent, and preparation method and application thereof |
| CN104128896A (en) * | 2014-07-23 | 2014-11-05 | 上虞市自远磨具有限公司 | Nanometer silicon dioxide thin film base polished section and preparation method thereof |
| CN104275651A (en) * | 2014-09-26 | 2015-01-14 | 河南省联合磨料磨具有限公司 | Diamond polishing film production method |
| WO2015176639A1 (en) * | 2014-05-21 | 2015-11-26 | 华侨大学 | Superfine abrasive biomacromolecule flexible polishing film and preparation method therefor |
| CN105313033A (en) * | 2014-08-05 | 2016-02-10 | 东莞金太阳研磨股份有限公司 | Elastic TPU (Thermoplastic Polyurethane) polishing composite membrane |
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| US9862071B2 (en) | 2009-09-22 | 2018-01-09 | San Fang Chemical Industry Co., Ltd. | Method for manufacturing polishing pad and polishing pad |
| CN108908142A (en) * | 2018-08-04 | 2018-11-30 | 乔斌 | Wear-resistant grinder |
| CN108927740A (en) * | 2018-08-03 | 2018-12-04 | 柴德维 | A kind of abrasive sheet and preparation method thereof |
| CN111015535A (en) * | 2019-12-04 | 2020-04-17 | 东莞金太阳研磨股份有限公司 | Precise polishing film with special structure and preparation method thereof |
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| CN101767318B (en) * | 2010-02-11 | 2011-11-02 | 北京国瑞升科技有限公司 | Granulation polishing film, preparing method thereof and application thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP3045396B2 (en) * | 1990-04-27 | 2000-05-29 | 東京磁気印刷株式会社 | Diamond polishing film |
| US5152917B1 (en) * | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| US5203884A (en) * | 1992-06-04 | 1993-04-20 | Minnesota Mining And Manufacturing Company | Abrasive article having vanadium oxide incorporated therein |
| JPH11114837A (en) * | 1997-10-15 | 1999-04-27 | Fuji Photo Film Co Ltd | Polishing body and manufacture thereof |
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- 2002-06-14 CN CNB02124006XA patent/CN100357342C/en not_active Expired - Fee Related
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| CN101607384B (en) * | 2009-07-10 | 2010-09-22 | 湖北玉立砂带集团股份有限公司 | Preparation method of UEA116 ultraprecise ground belt |
| US9862071B2 (en) | 2009-09-22 | 2018-01-09 | San Fang Chemical Industry Co., Ltd. | Method for manufacturing polishing pad and polishing pad |
| CN102211319A (en) * | 2010-04-08 | 2011-10-12 | 三芳化学工业股份有限公司 | Polishing pad manufacturing method and polishing pad |
| CN102528648A (en) * | 2012-02-10 | 2012-07-04 | 安徽工业大学 | Nano diamond-macromolecular composite abrasive for solidifying abrasive polishing pad |
| CN103756572A (en) * | 2013-12-25 | 2014-04-30 | 佛山市凌晖化工有限公司 | Stone surface polishing coating agent, and preparation method and application thereof |
| US10286524B2 (en) | 2014-05-21 | 2019-05-14 | Huaqiao University | Ultrafine abrasive biopolymer soft polishing film and manufacturing method thereof |
| WO2015176639A1 (en) * | 2014-05-21 | 2015-11-26 | 华侨大学 | Superfine abrasive biomacromolecule flexible polishing film and preparation method therefor |
| CN104128896B (en) * | 2014-07-23 | 2017-02-01 | 上虞市自远磨具有限公司 | Nanometer silicon dioxide thin film base polished section and preparation method thereof |
| CN104128896A (en) * | 2014-07-23 | 2014-11-05 | 上虞市自远磨具有限公司 | Nanometer silicon dioxide thin film base polished section and preparation method thereof |
| CN105313033A (en) * | 2014-08-05 | 2016-02-10 | 东莞金太阳研磨股份有限公司 | Elastic TPU (Thermoplastic Polyurethane) polishing composite membrane |
| CN104275651A (en) * | 2014-09-26 | 2015-01-14 | 河南省联合磨料磨具有限公司 | Diamond polishing film production method |
| CN105985737A (en) * | 2015-02-02 | 2016-10-05 | 南京紫金立德电子有限公司 | PVC three-dimensional model polishing solution |
| CN108927740A (en) * | 2018-08-03 | 2018-12-04 | 柴德维 | A kind of abrasive sheet and preparation method thereof |
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| CN111015535A (en) * | 2019-12-04 | 2020-04-17 | 东莞金太阳研磨股份有限公司 | Precise polishing film with special structure and preparation method thereof |
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Address after: 100085 Beijing, Haidian District, on the road to information on the ground floor, building 12, C402, C406 room, No. 1 Patentee after: BEIJING GRISH HITECH CO., LTD. Address before: 100085, Beijing, Haidian District on the road No. 26, Zhongguancun venture building, room 1017 Patentee before: Beijing Grish Hitech Co., Ltd. |
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