CN1416020A - Double-bulb exposure device - Google Patents
Double-bulb exposure device Download PDFInfo
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- CN1416020A CN1416020A CN 02154556 CN02154556A CN1416020A CN 1416020 A CN1416020 A CN 1416020A CN 02154556 CN02154556 CN 02154556 CN 02154556 A CN02154556 A CN 02154556A CN 1416020 A CN1416020 A CN 1416020A
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- bulb
- fly
- exposure device
- light beam
- double
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
Abstract
To provide a dual lamp exposure device capable of decreasing the loss of light structurally, which is a tilted lamp device to prevent the light from irradiating onto a panel coated with photosensitive material. In this exposure device equipped with an optical system for radiating light onto a panel coated with photosensitive material in order to form a pattern, the optical system comprises: two lamps arranged perpendicularly to the surface of the earth and radiating the light; elliptical mirrors respectively installed in the lamps and reflecting the radiated light, so as to irradiate it onto an upper side or a lower side; a 1st path adjusting system for adjusting the path of the light irradiated from the lamps and the elliptical mirrors; a fly-eye lens for diverging the incident light as the light having uniform intensity; a collimating mirror for reflecting the light diverged with the lens perpendicularly to an exposure surface; and a two-angle mirror arranged orthogonally to the said fly-lens and reflecting the light whose path is adjusted with the 1st path adjusting system to the said fly-lens.
Description
Technical field
The present invention relates to use two bulbs to form the exposure device of pattern, more particularly, the present invention relates to by preventing that the bulb tilted configuration at the panel illumination beam that is coated with photosensitive material from increasing the illumination of bulb, and can reduce the double-bulb exposure device of light loss from structure.
Background technology
In general, for forming impressing pattern on the panel of using in the electronic installation loop, currently used main manufacture is after described panel coating photosensitive material is again with light beam irradiates, forms the P.e.c. that is pattern-like by postprocessing working procedures again.Yet, along with densification, the maximization of electronic installation in recent years, encircle, using the goods of large tracts of land panel just being developed as one of this trend such as organic electroluminescence fluorescent illuminating device (ElectroLuminescent), liquid crystal indicator (LCD:Liquid Crystal Display) and plasma display system (PDP:Plasma Display Panel) etc., so obtain to be applicable to light source this large tracts of land panel, stable and high illumination, be very important problem.
Exposure device of the prior art adopts high-power bulb in order to ensure high illumination with to large tracts of land panel illumination beam, yet the power of increase bulb is not unconfined, and light loss also can be along with increase when bulb power increases.
The schematic pie graph that Fig. 1 uses for expression a kind of double-bulb exposure device of the prior art, it shows by the disclosed a kind of system that uses two exposure lamps of TOHKEMY 2000-250223 communique with the form of giving an example.This exposure device of the prior art, have: constitute by several rectangular lens assemblies that disposing side by side respectively along direction in length and breadth, fly's eye type lens 1 (Fly EyeLens) as compound lens, along the long side direction of described fly's eye type lens 1 disposing first, the second bulb 2a, 2b, respectively with first, the second bulb 2a, the corresponding mode of 2b is provided with, will be by described first, the second bulb 2a, the beam reflection that 2b sends to described fly's eye type lens 1 place use first, the second ellipse mirror 3a, 3b, to by described first, the second bulb 2a, 2b and first, the second ellipse mirror 3a, the path adjustment of the light beam that 3b sends is so that the described light beam that sends is incident to first catoptron 4 that described fly's eye type lens 1 place uses, will be by the light beam irradiates behind the described fly's eye type lens 1 to being placed in plane of exposure 9 places, be coated with photosensitive material panel P place second, the 3rd catoptron 5,6.
Yet, this double-bulb exposure device of the prior art, in order to eliminate the mutual interference that two bulbs produce, described first, second bulb is obliquely installed, when bulb is this being obliquely installed, because the bulb that at this moment uses is extra-high-pressure mercury vapour lamp and reduction of service life, and when making described bulb tilt to surpass certain angle in order to obtain good illumination, have also that considerable light beam can leak to outside the irradiation area and problems such as generation light loss.
In order to solve the light loss problem, exposure device of the prior art adopts spherical mirror as described second catoptron and the 3rd catoptron, yet adopts this scheme can not solve the problem of described light loss at all.
Summary of the invention
Problem proposes in the above-mentioned prior art in order to solve in the present invention, and its purpose just provides a kind of double-bulb exposure device.This device disposes two bulbs to improve the serviceable life of bulb in not inclination mode, and can reduce to expose to from structure and form the light loss that is the panel that pattern uses, thereby can produce the large tracts of land panel, and by making the photosensitive material shortening manufacturing time that hardens at short notice.
In order to realize above-mentioned purpose, double-bulb exposure device provided by the invention, have light beam irradiates to being coated with the optical system of printing the panel place be the photosensitive material that pattern uses, above-mentioned optical system comprises: be the vertical mode configuration, can launch two bulbs of light beam with respect to ground; Be separately positioned on described each bulb place so that the mode that illumination beam exposes to upside place or downside place is implemented the ellipse mirror of reflection to light beam; The path of the light beam that provided by each bulb and ellipse mirror implemented the first light path Adjustment System adjusted; Incident beam is dispersed the fly's eye type lens of using for the uniform strength light beam; The collimation mirror that light beam vertical reflection to plane of exposure place after will being dispersed by described fly's eye type lens uses; And dispose with the orthogonal thereto mode of described fly's eye type lens, will adjust two jiaos of type catoptrons that beam reflection to the described fly's eye type lens place of light path uses by the described first light path Adjustment System.
Description of drawings
Fig. 1 is the schematic pie graph of expression a kind of double-bulb exposure device of the prior art;
Fig. 2 is the schematic pie graph of expression a kind of double-bulb exposure device of the present invention;
The schematic pie graph of the beam path that Fig. 3 a launches for two jiaos of type catoptrons of expression in the double-bulb exposure device of the present invention;
The schematic pie graph of the beam path that Fig. 3 b goes out for the lamps emission of expression in the double-bulb exposure device of the present invention;
Fig. 4 is the schematic pie graph of a part of inscape in the expression second embodiment of the invention;
Fig. 5 is the schematic pie graph of the double-bulb exposure device of expression third embodiment of the invention;
The schematic pie graph of the beam path that Fig. 6 a is launched by two jiaos of type catoptrons in the double-bulb exposure device of third embodiment of the invention for expression;
The schematic pie graph of the beam path that Fig. 6 b is gone out by the lamps emission in the double-bulb exposure device of third embodiment of the invention for expression;
Fig. 7 is the schematic pie graph of the double-bulb exposure device of expression fourth embodiment of the invention;
Fig. 8 is for representing the schematic plan pie graph after the amplification of the part among Fig. 7;
Fig. 9 a is the schematic pie graph of the double-bulb exposure device of expression fifth embodiment of the invention;
The schematic pie graph of the beam path that Fig. 9 b is gone out by the lamps emission in the double-bulb exposure device of fifth embodiment of the invention for expression.
Embodiment
Below with reference to accompanying drawing, the desirable embodiment that the present invention is constituted is elaborated.
Fig. 2 is the schematic pie graph of the double-bulb exposure device of expression first embodiment of the invention.
Double-bulb exposure device of the present invention as shown in Figure 2, has the plane of exposure 20 of laying the panel P that is coated with photosensitive material and can be with the optical system of light beam irradiates to described plane of exposure 20 places, at this, described photosensitive material is exposed by the light beam that exposes to described plane of exposure 20 places, hardens.
Optical system of the present invention is being used two bulbs from high illumination light beam to the large tracts of land panel that can supply with, and these two first, second bulb 10a, 10b are configured on the same line, and is vertical mode with respect to ground concurrent outgoing beam is set.
Disposing first, second ellipse mirror 11a, 11b respectively at two bulb places, it to the upside place or the mode at downside place, will expose to the beam reflection located around rear or the side etc. to the upside place or the downside place with beam condenser that bulb irradiation is gone out.On the beam path that provides by described first, second bulb 10a, 10b and first, second ellipse mirror 11a, 11b, also dispose the first light path Adjustment System that to adjust optical path.
And, side place in described optical system, also dispose and incident beam can be dispersed for having the fly's eye type lens 13 of uniform strength light beam, and be positioned at the collimation mirror 16 that light beam vertical reflection on the divergent beams path that is provided by described fly's eye type lens 13, after will being implemented disperse by described fly's eye type lens 13 is used to plane of exposure 20 places.
Described collimation mirror 16 can be spherical mirror, thereby can implement reflected in parallel to the light beam by described fly's eye type lens 13, and vertical irradiation is to described panel 20 places.
Between described fly's eye type lens 13 and the described first light path Adjustment System, also dispose mode, will adjust the two jiao type catoptrons 12 of the beam reflection of light path by the described first light path Adjustment System to fly's eye type lens 13 according to light beam irradiates to fly's eye type lens 13 place that will provide by described first, second bulb 10a, 10b, and this moment, described two jiaos of type catoptrons 12 can be provided with described fly's eye type lens 13 orthogonal thereto modes.
The described first light path Adjustment System can be by the exposure device inner structure, according to the mode of the light beam total reflection that will be provided by described first, second bulb 10a, 10b and first, second ellipse mirror 11a, 11b to described two jiaos of type catoptron 12 places, at least more than one the completely reflecting mirror that is configured between bulb and the two jiaos of type catoptrons 12 constitutes, and this completely reflecting mirror is made of first, second catoptron 30a, 30b in the present embodiment.
In the present invention, described first, second catoptron 30a, 30b can be made of level crossing, and described first, second catoptron 30a, 30b can be with the light beam irradiates of being launched by described first, second bulb 10a, 10b and first, second ellipse mirror 11a, the 11b reflecting surface places to described two jiaos of type catoptrons 12.
Shown in Fig. 3 a, described two jiaos of type catoptrons 12 can be made of two catoptrons that one of them limit combines each other, and this catoptron can be made of level crossing, so that light beam is implemented total reflection.In order to guarantee that the light beam that is incident to described fly's eye type lens 13 places by described two jiaos of type catoptrons 12 has high illumination, preferably makes the incident angle θ of light beam
11Smaller.
At this, shown in Fig. 3 b, can make the beam incident angle degree θ that is incident to described fly's eye type lens 13 places by described two jiaos of type catoptrons 12
11Enforcement has the light beam that provided by the described first bulb 10a and by the angle θ between the light beam after the described first ellipse mirror 11a reflection
R1The angle configurations below 1.5 times.
Promptly be to be incident to the beam incident angle degree θ at described fly's eye type lens 13 places by described two jiaos of type catoptrons 12
11 'And the angle θ between light beam that provides by the described first bulb 10a and the light beam that provides by the described first ellipse mirror 11a
R1Between, satisfy following relationship 1.
[relationship 1] θ
11≤ 1.5 θ
R1
Described fly's eye type lens 13 can be respectively the lens subassembly of a, b by length in length and breadth, constitute by two-dimensional structure.Therefore, the aspect ratio of a and b is identical substantially with the aspect ratio of the irradiation area that exposes to described panel P place.Be decided to be 16: 9 if promptly will expose to the aspect ratio in the light beam irradiates zone at described panel P place, the aspect ratio of described fly's eye type lens 13 also should for 16: 9 similar values.Therefore, have good illumination, should implement incident by the longitudinal direction of the lens subassembly that constitutes fly's eye type lens 13 usually in order to guarantee the light beam that is incident to described fly's eye type lens 13 places by described first, second bulb 10a, 10b.
Therefore, in this embodiment of the invention, can be with the long limit that constitutes in the lens subassembly of fly's eye type lens 13, according to the collocation form of described first, second bulb 10a, 10b, can make incident beam be configured in longitudinal and transverse direction along the long side direction incident of lens subassembly.
Described fly's eye type lens 13 and described looking between the Huaihe River mirror 16, can also dispose the second light path Adjustment System in the divergent beams path that adjustment provides by described fly's eye type lens 13.
The described second light path Adjustment System can by be configured on the divergent beams path that provides by fly's eye type lens 13, at least more than one the completely reflecting mirror 15 of beam reflection to described collimation Jing16Chu can be constituted, its number can be adjusted according to actual needs.
In order to reduce to be incident to the beam incident angle degree of described fly's eye type lens 13 or described collimation Jing16Chu, the completely reflecting mirror in described first light path Adjustment System and the described second light path Adjustment System all can use spherical mirror.
Fig. 4 is the schematic plan view of a part of inscape of expression in the second embodiment of the invention, its expression be synoptic diagram during from two jiaos of type catoptrons 12 of top observation, first, second catoptron 30a, 30b and fly's eye type lens 13.
At this, be incident to the beam angle θ at described fly's eye type lens 13 places by described two jiaos of type catoptrons 12
11, satisfy the relationship 1 among described first embodiment equally.
The first light path Adjustment System can be by the exposure device inner structure, according to the mode of the light beam total reflection that will be provided by described bulb and ellipse mirror to described two jiaos of type catoptron 12 places, at least more than one the completely reflecting mirror that is configured between bulb and the two jiaos of type catoptrons 12 constitutes, and can be according to making by the final folded light beam angle θ of described completely reflecting mirror to described two jiaos of type catoptron 12 places
21The mode that is positioned within 0～45 ° the scope is implemented configuration.
Promptly be, described completely reflecting mirror among the present invention can be made of first, second catoptron 30a, 30b, and be incident to the Z-axis of the beam center axle at described fly's eye type lens 13 places, and the angle θ between the beam direction that provides by the described first catoptron 30a by described two jiaos of type catoptrons 12
21Between, perhaps and the angle θ between the beam direction that provides by the described second catoptron 30b
22Between, satisfy following relationship 2.
[relationship 2] 0≤θ
21, θ
22＜45 °
In the present invention, the angle θ between the beam direction that preferably provides according to the Z-axis that makes the beam center axle and by the described first catoptron 30a
21, and and the beam direction that provides by the described second catoptron 30b between angle θ
22, the mode that remains equal angular is implemented configuration.
Be not configured in occasion on the same line for the described first bulb 10a and the second bulb 10b, in order to prevent that described two jiaos of type catoptrons 12 from causing light loss in the process of light beam being implemented reflection, can also be with the configuration of described first, second catoptron 30a, 30b, by to constituting described two jiaos of type catoptron 12 medial surfaces and described fly's eye type lens 13 two angle θ on the line of quadrature mutually
31, θ
32Implement to adjust, make θ
12Remain certain value.
Certainly, described first, second catoptron 30a, 30b also can be made of the spherical mirror of the beam incident angle that can reduce to be incident to described fly's eye type lens 13 places.
Fig. 5 is the schematic pie graph of the double-bulb exposure device of expression third embodiment of the invention.
As shown in Figure 5, this double-bulb exposure device of the present invention has the plane of exposure 60 of laying the panel P that applies photosensitive material, and the optical system that light beam irradiates to described plane of exposure 60 places can be used, described photosensitive material is exposed by the light beam that exposes to described plane of exposure 60 places, hardens.
Described optical system has: be configured on the same line, with respect to ground be that vertical mode is provided with that concurrent outgoing beam uses first, the second bulb 50a, 50b, be separately positioned on described first, the second bulb 50a, the 50b place, be used for according to described first, the second bulb 50a, the light beam irradiates that 50b provides to the upside place or the mode at downside place implement first of reflection usefulness to reflexing to the light beam of locating around rear or the side, the second ellipse mirror 51a, 51b, be configured in by described first, the second bulb 50a, 50b and first, the second ellipse mirror 51a, on the beam path that 51b provides, adjust the first light path Adjustment System that optical path is used, incident beam is dispersed fly's eye type lens 54 for the uniform strength light beam, the collimation mirror 56 that light beam vertical reflection after will being dispersed by described fly's eye type lens 54 is used to plane of exposure 60 places, according to disposing with described fly's eye type lens 54 orthogonal manner, be used for beam reflection that each bulb and ellipse mirror are provided two jiaos of type catoptrons 52, and be configured between described two jiaos of type catoptrons 52 and the fly's eye type lens 54 to described fly's eye type lens 54 places, the mode that can be incident to described fly's eye type lens 54 places according to the light beam that described ellipse mirror and bulb are provided is implemented the prism 53 of warpage etc. to light beam.
The described first light path Adjustment System can be by the exposure device inner structure, according to the mode of the light beam total reflection that will be provided by described bulb and ellipse mirror to described two jiaos of type catoptron 52 places, at least more than one the completely reflecting mirror that is configured between bulb and the two jiaos of type catoptrons 52 constitutes, and this completely reflecting mirror is made of first, second catoptron 70a, 70b in the present embodiment.
Described first, second catoptron 70a, 70b can be made of level crossing, and described first, second catoptron 70a, 70b can be with the light beam irradiates of being launched by described first, second bulb 50a, 50b and first, second ellipse mirror 51a, the 51b reflecting surface places to described two jiaos of type catoptrons 52.
The schematic pie graph of the beam path that the schematic pie graph of the beam path that Fig. 6 a is launched by two jiaos of type catoptrons in the double-bulb exposure device of third embodiment of the invention for expression, Fig. 6 b are gone out by the lamps emission in the double-bulb exposure device of third embodiment of the invention for expression.
Shown in Fig. 6 a, described two jiaos of type catoptrons 52 are made of two catoptrons that one of them limit mutually combines, and can be according to making the beam incident angle degree θ that is incident to described fly's eye type lens 54 places by described two jiaos of type catoptrons 52
13Greater than the beam incident angle degree θ that is incident to described fly's eye type lens 54 places by described prism 53
23Mode implement the configuration.
Promptly be, if will be taken as θ by 52 reflections of described two jiaos of type catoptrons and the beam incident angle degree that is incident to described fly's eye type lens 53 places
13, will be taken as θ by the beam incident angle degree that described prism 53 is incident to fly's eye type lens 54 places
23, then satisfy following relationship 3 between them.
[relationship 3] θ
23＜θ
13
At this, described angle θ
23Should be as much as possible little.Promptly be, for described angle θ
23Get the occasion of minimum value, the light loss minimum that described two jiaos of type catoptrons 52 are produced, thus can effectively guarantee light beam illumination.
Shown in Fig. 6 b, be incident to the beam incident angle degree θ at described fly's eye type lens 54 places by described two jiaos of type catoptrons 52
13, can be according to the angle θ between the light beam that makes the light beam that provides by described bulb 50a, 50b and provide by described ellipse mirror 51a, 51b
R3The mode more than 0.5 times implement the configuration.
Promptly be the light beam that provides by described bulb and by the angle θ between the light beam after the described ellipse mirror reflection
R3, with the incident angle θ that is incident to described fly's eye type lens 54 places by described two jiaos of type catoptrons 52
13Between, satisfy following relationship 4.
[relationship 4] θ
13＞1/2 θ
R3
The light beam that is incident to described fly's eye type lens 54 places, provides by described first, second bulb 50a, 50b and described first, second ellipse mirror 51a, 51b, its difference should be 1/2 of described fly's eye type lens 54 sizes, and under possible condition, preferably be incident to the center of described fly's eye type lens 54 simultaneously.And in third embodiment of the invention, described difference should be below 1/2 of lateral length of described fly's eye type lens 54.
Described fly's eye type lens 54 and described looking between the Huaihe River mirror 56, can also dispose the second light path Adjustment System in the divergent beams path that adjustment provides by described fly's eye type lens 54, and the described second light path Adjustment System can be by being configured on the divergent beams the evolving path that is provided by described fly's eye type lens 54, at least more than one the completely reflecting mirror of beam reflection to described collimation Jing56Chu can being constituted.
Fig. 7 is the schematic pie graph of the double-bulb exposure device of expression fourth embodiment of the invention.
As shown in Figure 7, the double-bulb exposure device of fourth embodiment of the invention has: configuration perpendicular to the ground, can upwards launch first of light beam, the second bulb 80a, 80b, can be to described first, the second bulb 80a, the light beam that 80b provides is implemented first of optically focused, the second ellipse mirror 81a, 81b, and can adjust by described first, the second bulb 80a, 80b and first, the second ellipse mirror 81a, the light beam that 81b provides is incident to the beam path of two jiaos of type catoptrons 82, as first of first optical path adjustment device, the second catoptron 100a, 100b or the like.
The light beam that provides by described first, second bulb 80a, 80b and first, second ellipse mirror 81a, 81b, can be incident to described two jiaos of type catoptron 82 places by described first, second catoptron 100a, 100b, and described two jiaos of type catoptrons 82 are identical with like among described the 3rd embodiment, can to the light beam that is incident to described prism 83 places implement reflection and with described light beam irradiates to panel 90 places.
And, described first, second bulb 80a, 80b are the vertical mode configuration with respect to ground, and, the long edge longitudinal direction that constitutes the lens subassembly of described fly's eye type lens 84 is implemented to be provided with for making the light beam of launching necessarily incide the long side direction of described fly's eye type lens 84.
Fig. 8 is the schematic plan pie graph after expression is amplified the part among Fig. 7, its expression be a schematic plan view that example is used from top viewing prism 83.
Can be identical for this occasion with third embodiment of the invention, by relative to one another and the light beam that provides of first, second bulb 80a, the 80b that are provided with parallel to the groundly and first, second ellipse mirror 81a, 81b, can be 45 ° of incidents and can be with two jiaos of type catoptrons 82 by described fly's eye type lens 84 vertical reflections.When the light beam by described two jiaos of type catoptron 82 incidents was implemented vertical reflection, it was minimum can making the light loss that is produced by described two jiaos of type catoptrons 82.And, reduce described incident angle θ if be incident to described fly's eye type lens 84 by the light beam that provides by described prism 83 described two jiaos of type catoptrons 82
24, can easily guarantee light beam illumination.
Fig. 9 a is the schematic pie graph of double-bulb exposure device of expression fifth embodiment of the invention, the schematic pie graph of the beam path that Fig. 9 b goes out for the lamps emission in the double-bulb exposure device of expression fifth embodiment of the invention.
Double-bulb exposure device as fifth embodiment of the invention can be shown in Fig. 9 a and Fig. 9 b, with described first, second bulb 150a, when 150b is configured in position closer to each other, may be owing to first, second ellipse mirror 151a, 151b produce interference region, illumination is descended, so adopted in the present embodiment the part that is positioned at first, second ellipse mirror 151a, the 151b that produce interference region is implemented to cut off, subsequently once more in conjunction with and form mating type ellipse mirror 151, thereby can solve the described problem that interference region occurs.Described mating type ellipse mirror 151 can be implemented optically focused, and along inclined direction implement reflection first, second bulb 150a that is being disposed by mode perpendicular to the ground respectively, the light beam that 150b provides.
And, be taken as θ at light beam that will provide and the angle that provides between the light beam by the first bulb 150a by the side of described mating type ellipse mirror 151
40The time, be θ with respect to the angle of inclination of the described first bulb 150a orientating reflex mirror 160 promptly at the described first ellipse mirror 151a
40The time, can also be shown in Fig. 9 b, the beam angle θ that provides from the ellipse mirror 111c that does not tilt with light source 110c
R5, with described angle θ
40Between satisfy following relationship 5.
[relationship 5] θ
40≤ 1.5 θ
R5
As described angle θ
40When too small, the zone of described the one the second catoptron 151a, the 151b can be bigger, so the interference that forms between them can produce light loss, therefore should implement to cut off the light loss that produced and analyze the described angle θ of suitable selection the ellipse mirror towards the beam incident angle degree that fly's eye type lens are implemented incident
40
According to embodiment and accompanying drawing, the double-bulb exposure device that constitutes according to the present invention is illustrated, yet the present invention is not limited to this above, those of ordinary skill in the art can also carry out various distortion.
Double-bulb exposure device of the present invention with above-mentioned form of the composition, because by using the light source of configuration perpendicular to the ground, the light beam that described light source is provided is implemented the ellipse mirror of optically focused and is formed the mode that is the panel place that pattern uses is implemented adjustment usefulness to optical path two jiaos of type catoptrons according to being guided to by the light beam that described light source and ellipse mirror provide, can light source not implemented to be obliquely installed, the light beam that described light source is provided can be radiated at described panel place, thereby can guarantee good illumination, and can prolong the serviceable life of the extra-high-pressure mercury vapour lamp that uses as light source, therefore can be radiated at the mode that the panel place forms the loss of light source that is the light beam that pattern uses by reduction, produce the large tracts of land panel, in addition, can shorten in the flat display apparatus manufacturing process and implement the needed time of exposure according to making light beam irradiation area on the panel have the mode of good illumination.
Claims (15)
1. a double-bulb exposure device has the optical system of light beam irradiates to the panel place that is coated with photosensitive material that is used for impressing pattern, it is characterized in that described optical system comprises:
Configuration perpendicular to the ground, can launch two bulbs of light beam;
Be separately positioned on described each bulb place, make the ellipse mirror of illumination beam reflection in the mode that exposes to upside place or downside place;
The beam path that is provided by each bulb and ellipse mirror is implemented to adjust the first light path Adjustment System of usefulness;
Incident beam is dispersed the fly's eye type lens of using for the uniform strength light beam;
Light beam vertical reflection after will being dispersed by described fly's eye type lens is looked the Huaihe River mirror to plane of exposure;
And according to disposing with described fly's eye type lens orthogonal manner, will adjusting the two jiao type catoptrons of the beam reflection of light path by the described first light path Adjustment System to described fly's eye type lens.
2. double-bulb exposure device as claimed in claim 1 is characterized in that, described two jiaos of type catoptrons are made of the catoptron that two one limits mutually combine;
Described two jiaos of type catoptrons are incident to the beam incident angle degree at described fly's eye type lens place, below 1.5 times of angle between the light beam that provides for the light beam that provided by described bulb with by described ellipse mirror.
3. double-bulb exposure device as claimed in claim 2 is characterized in that, described two jiaos of type catoptrons are made of level crossing.
4. double-bulb exposure device as claimed in claim 2 is characterized in that, described two jiaos of type catoptrons are made of spherical mirror.
5. double-bulb exposure device as claimed in claim 1, it is characterized in that described double-bulb exposure device also further comprises and is configured in the mode that can be incident to described fly's eye type lens place between described two jiaos of type catoptrons and the fly's eye type lens, according to the light beam that described ellipse mirror and bulb are provided is implemented warpage to light beam prism.
6. double-bulb exposure device as claimed in claim 5 is characterized in that, is incident to the beam incident angle degree at described fly's eye type lens place by described two jiaos of type catoptrons, greater than the beam incident angle degree that is incident to fly's eye type lens place by described prism.
7. double-bulb exposure device as claimed in claim 5, it is characterized in that, be incident to the beam incident angle degree at described fly's eye type lens place by described two jiaos of type catoptrons, 0.5 times of the angle between the light beam that provides greater than the light beam that provides by described bulb and by described ellipse mirror.
8. double-bulb exposure device as claimed in claim 5 is characterized in that, and is poor by the beam center that described two jiaos of type catoptrons and prism are incident to described fly's eye type lens place by each bulb, is below 1/2 of described fly's eye type lens sizes.
9. double-bulb exposure device as claimed in claim 1, it is characterized in that the described first light path Adjustment System is made of at least more than one the completely reflecting mirror of the light beam total reflection that is configured between described bulb and the two jiaos of type catoptrons, will be provided by described bulb and ellipse mirror to described two jiaos of type catoptrons.
10. double-bulb exposure device as claimed in claim 9 is characterized in that, is positioned at by described completely reflecting mirror to the final folded light beam angle at described two jiaos of type catoptron places within 0～45 ° the scope.
11. double-bulb exposure device as claimed in claim 1, it is characterized in that, described double-bulb exposure device also further have be configured in described fly's eye type lens and described look between the mirror of Huaihe River, to described mode of looking Huaihe River Jing Chu light path is implemented the second light path Adjustment System adjusted according to the light beam total reflection that described fly's eye type lens are exhaled.
12. double-bulb exposure device as claimed in claim 11, it is characterized in that, the described second light path Adjustment System by be configured on the divergent beams the evolving path that provides by described fly's eye type lens, at least more than one the completely reflecting mirror of beam reflection to described collimation Jing Chu can be constituted.
13. double-bulb exposure device as claimed in claim 1 is characterized in that, described ellipse mirror disposes towards described two jiaos of type mirror tilts according to the mode that can be added to the light beam that is incident upon described fly's eye type lens place.
14. double-bulb exposure device as claimed in claim 13 is characterized in that, the configuration closer to each other of each ellipse mirror, and for preventing that producing mutual interference implements to cut off and combination to an overlapping end.
15. double-bulb exposure device as claimed in claim 14, it is characterized in that, angle between light beam that is provided by described joint portion and the light beam that provided by bulb is under 1.5 times of the angle between the illumination beam when not implementing to be obliquely installed for the light beam that provided by described bulb and described ellipse mirror.
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR60343/2001 | 2001-09-28 | ||
| KR60344/2001 | 2001-09-28 | ||
| KR10-2001-0060342A KR100437020B1 (en) | 2001-09-28 | 2001-09-28 | Exposer with a Non-Leaned Light Source |
| KR60342/2001 | 2001-09-28 | ||
| KR10-2001-0060343A KR100437021B1 (en) | 2001-09-28 | 2001-09-28 | Exposer with a Non-Leaned Light Source |
| KR10-2001-0060344A KR100437022B1 (en) | 2001-09-28 | 2001-09-28 | Exposer with a Non-Leaned Light Source |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1416020A true CN1416020A (en) | 2003-05-07 |
| CN1211837C CN1211837C (en) | 2005-07-20 |
Family
ID=27350528
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 02154556 Expired - Fee Related CN1211837C (en) | 2001-09-28 | 2002-09-28 | Double-bulb exposure device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP3849017B2 (en) |
| CN (1) | CN1211837C (en) |
| TW (1) | TW556051B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103353710A (en) * | 2013-06-26 | 2013-10-16 | 京东方科技集团股份有限公司 | Exposure device, system and method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4936873B2 (en) * | 2005-12-29 | 2012-05-23 | エルジー ディスプレイ カンパニー リミテッド | Light irradiation device and method for manufacturing liquid crystal display device |
-
2002
- 2002-09-23 TW TW91121720A patent/TW556051B/en not_active IP Right Cessation
- 2002-09-27 JP JP2002283645A patent/JP3849017B2/en not_active Expired - Fee Related
- 2002-09-28 CN CN 02154556 patent/CN1211837C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103353710A (en) * | 2013-06-26 | 2013-10-16 | 京东方科技集团股份有限公司 | Exposure device, system and method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003149828A (en) | 2003-05-21 |
| CN1211837C (en) | 2005-07-20 |
| JP3849017B2 (en) | 2006-11-22 |
| TW556051B (en) | 2003-10-01 |
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