CN1354042A - Titanium dioxide photocatalysis air-cleaning film and its preparation method - Google Patents
Titanium dioxide photocatalysis air-cleaning film and its preparation method Download PDFInfo
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- CN1354042A CN1354042A CN 01134335 CN01134335A CN1354042A CN 1354042 A CN1354042 A CN 1354042A CN 01134335 CN01134335 CN 01134335 CN 01134335 A CN01134335 A CN 01134335A CN 1354042 A CN1354042 A CN 1354042A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
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Abstract
The present invention relates to a titanium dioxide photocatalysis air-cleaning film and its preparation method. It is characterized by that it utilizes the megnetron sputtering to form titanium dioxide photocatalysis air-cleaning film on the carriers of glass, metal and ceramics. It uses the direct synthesis of pure metal titanium target material and oxygen gas and utilzies are controlling power supply to prevent pure metal target material from poisoning, in which the crystal grains formed by titanium dioxide film can be grown along the vertical direction or horizontal direction of carrier. The grain size is 10-100 nano, and the thickness of the film is 20-100 nano. Said titanium dioxide film is formed from single anatase phase or single rutile phase or their mixed phase, in which the anatase content is 50%-98% and rutile phase content is 2%-50%. Said film can effectively degrade harmful gases of formaldehyde and phenol, etc.
Description
Technical field
The present invention relates to a kind of titanium dioxide photocatalysis air-cleaning film and preparation method thereof, belong to the conductor photocatalysis technical field.
Background technology
The modern also inevitably is subjected to the influence of some side effect when enjoying current science and technology and material progress and develop the benefit of being brought." air pollution " is exactly one of the most serious problem of facing of people.
Along with quickening of urbanization process, a large amount of life discharge waste and toxic emission of vehicle or the like have caused the deterioration degree of urban air-quality from indoor to outdoor comprehensive deterioration, particularly room air to reach 5～10 times of outdoor air usually.The development of industrial technology, a large amount of oil products, chemical products, electric equipment products and the commodity and the ornament materials that can produce volatile organic matter have been brought into people's room, these products have destroyed indoor air quality constantly generating various polluters and harmful substance.Scientists has been listed room air pollution in now to one of 5 kinds of maximum environmental factors of public health harm, and reminds people, after having experienced " coal-smoke pollution " and " pollution of photochemical fog type " that the industrial revolution brings, it is the 3rd pollution period of sign that the modern is just entering with " room air pollution ".
Investigation test work has been done to the decorations situation of some city dweller's households by China relevant department in the recent period, found that, the harmful substance that can measure in the modern room has kind more than 500, kind surplus wherein volatile organic matter reaches 300, even carcinogenic kind more than 20 just arranged, as easy as rolling off a log human body is caused damage.Confirm that after deliberation construction material and ornament materials are main potential room air pollution sources, room air pollution is very serious, most of content of harmful severe overweights.Surpass China indoor air sanitary standard (0.08mg/m as concentration of formaldehyde in the room
3) more than 10 times; The concentration of aromatic compounds such as benzene, toluene and dimethylbenzene surpasses the guidance standard (0.05mg/m of the World Health Organization
3) 2～10 times, their total amount then surpasses more than 30 times of World Health Organization's guidance standard; The concentration of ammonia surpasses the threshold limit value (0.2mg/m of harmful substance in China's residential area atmosphere
3) more than 7 times; Total number of bacteria surpasses sanitary standard setting (2500cfu/m
3) more than 1 times; Oxygen demand surpasses the sanitary standard (6mg/m of the former Soviet Union
3) more than 50%.This serious room air pollution has caused the rising of China city dweller cancer illness rate, the increase of the leukemia of children incidence of disease.
In sum, the pollution situation of room air is very serious, all is applicable to the equipment that indoor air purification is handled in active research both at home and abroad.It is the development today direction that photocatalysis technology is applied to the indoor air purification processing.
Chinese patent 97198095.0, this patent provides a kind of preparation method of photocatalysis film, and this film is used for multiple utensil.This photocatalysis film is to utilize the solid particle with photo-catalysis function to be scattered in the middle formation of filming.Chinese patent 98802590.6, this patent provide a kind of monoclinic titanium dioxide class photochemical catalyst, and are to make in titanium dioxide hydrates.Chinese patent 99111496.5 provides a kind of photocatalysis air purifying device, and it is to make an inorganic porous carrier of photocatalyst earlier, utilizes photocatalyst solution and sticker film forming on carrier then, makes the photocatalysis assembly, makes air purifier again.Chinese patent 96194224.X provides a kind of photocatalysis odor filtration device, and the photochemical catalyst of use is a titania powder.Chinese patent 99236007.2, the employed photochemical catalyst of this patent is the solid particle sprills.Chinese patent 99116885.2 provides a kind of preparation method of photocatalytic air-purifying net, and it is carrier of photocatalyst to be immersed in the solution of photocatalyst granular obtain.Chinese patent 99229554.8 provides a kind of photocatalysis air cleaning device, is to utilize ultrafine titanium oxide powder as photochemical catalyst.Chinese patent 95223245.6 provides a kind of photocatalysis air purifying device, is to use the method for coating that photochemical catalyst is fixed on the carrier.
The applied catalyst of above-mentioned all kinds of patents is two kinds basically, and a kind of is to utilize the titanium dioxide pressed powder, and another kind is to utilize titania solution.Though these two kinds of photochemical catalysts have catharsis to air, but all because the limitation of technology makes actual the use be difficult to realize.First method is very high to the requirement of powder, and needs the carrier of porous, and powder is immobilized on carrier, cost height not only, and since the limitation of carrier photocatalytic process is affected, thereby has influence on effect air cleaning.Second method is used solution, and photochemical catalyst is adhered to carrier, and many other materials and photochemical catalyst acting in conjunction are arranged in the solution, has influenced the carrying out of light-catalyzed reaction, thereby has also influenced the clean-up effect to air.
Summary of the invention
The invention provides a kind of titanium dioxide photocatalysis air-cleaning film and preparation method thereof, purpose is directly to generate the titanium dioxide optical catalyst film with good effect of photochemical catalyst air purification on carrier, this photocatalyst film has to be removed in the air peculiar smell and pernicious gas in the air is degraded into the effect of innocuous substance, thereby can carry out purified treatment to air.
For achieving the above object, titanium dioxide photocatalysis air-cleaning film that the present invention proposes and preparation method thereof, this method is carried out successively as follows:
(1) carrier that at first will be used to prepare film carries out cleaning;
(2) above-mentioned cleaning is good carrier is sent into vacuum pressure smaller or equal to 5.0 * 10
-3Pa, be provided with in the vacuum equipment of pure metallic titanium target;
(3) utilize the pure titanium target of midfrequent AC magnetically controlled sputter method sputter, the air pressure that is adopted is 0.5Pa～2.0Pa, and operating voltage is 200v～600v, and current density is 2.0mA/cm
2～10mA/cm
2, oxygen partial pressure is 0.08Pa～0.8Pa, pure metallic titanium target and oxygen directly generate optically catalytic TiO 2 film on carrier under the condition of magnetron sputtering.
In above-mentioned preparation method, use the midfrequent AC arc to suppress power supply, its frequency range is 15KHz～60KHz.
In above-mentioned preparation method, the accompanying carrier of described film can be glass, metal or pottery, and thin-film carrier temperature in the film preparation process is 150 ℃～500 ℃.
Utilize the optically catalytic TiO 2 film of the method for the invention preparation, its photocatalysis film is by single anatase phase composition or by single rutile phase composition or by anatase phase and rutile mixing phase composition mutually, wherein anatase accounts for 50%～98% mutually, and rutile accounts for 2%～50% mutually.Film forming crystal grain can be along bearer plane vertical direction and the growth of bearer plane horizontal direction, size of microcrystal 10～100 nanometers, thickness 20～100 nanometers of film.
Description of drawings
Fig. 1 is the optically catalytic TiO 2 film structural representation.
The specific embodiment
Carrier of the present invention is glass, metal or pottery, and the carrier that at first will be used to prepare film cleans processing, then sends into vacuum equipment.The pure metallic titanium target is set in the vacuum equipment, utilizes the pure titanium target of midfrequent AC magnetically controlled sputter method sputter.Used power supply suppresses power supply for the midfrequent AC arc, and its frequency range is 15KHz～60KHz, and air pressure is 0.5Pa～2.0Pa, and base vacuum pressure is smaller or equal to 5.0 * 10
-3Pa, operating voltage is 200v～600v, current density is 2.0mA/cm
2～10mA/cm
2, working gas is an argon gas, and the purity of argon gas is 99.99%, and reacting gas is an oxygen, and the purity of oxygen is 99.99%, and oxygen partial pressure is 0.08～0.8Pa, and the temperature of carrier is 150 ℃～500 ℃.
Implement magnetron sputtering under these conditions, can utilize pure metallic titanium target and oxygen directly to generate titanium dioxide photocatalysis air-cleaning film.As shown in Figure 1,1 is carrier, and 2 is optically catalytic TiO 2 film.The optically catalytic TiO 2 film that is obtained is by single anatase phase composition or single rutile phase composition or anatase phase and rutile mixing phase composition mutually, film forming crystal grain can generate along the vertical direction and the horizontal direction of bearer plane, size of microcrystal is 10～100 nanometers, and thin layer thickness is 20～100 nanometers.
Embodiment
Embodiment one
With glass is carrier, puts into vacuum coating equipment after cleaning, utilizes the midfrequent AC magnetically controlled sputter method, and the frequency range that the midfrequent AC arc suppresses power supply is 15KHz, base vacuum pressure 3.0 * 10
-3Pa, working gas are argon gas, and purity is 99.99%; Working gas 0.5Pa; Reacting gas is an oxygen, and purity is 99.99%, and the dividing potential drop of oxygen is 0.1Pa; 150 ℃ of the temperature of carrier during thin film deposition; 40 minutes magnetron sputtering time.
Under these conditions, the titanium deoxid film that is obtained is that anatase phase, rutile phase and a small amount of amorphous are formed, wherein the anatase relative scale that accounts for anatase and rutile mutually is about 88%, the relative scale that rutile accounts for anatase and rutile mutually is 12%, the about 45nm of film thickness, crystallite size 30～40nm.Record this film with ultraviolet specrophotometer uv absorption rate is reached 95%.
Recording this film with spectrophotometer is under the ultraviolet light irradiation condition of 260nm ± 60nm at wavelength, and the DDVP solution that to concentration is 10mg/L was through degraded in 6.0 hours, and degradation rate reaches 92%; This film is under ultraviolet light conditions, and PARA FORMALDEHYDE PRILLS(91,95) concentration is 1.0mg/M
3Air through 10 hours the degraded, degradation rate reaches 90%.
Embodiment two
With the glass ceramics is carrier, puts into vacuum coating equipment after cleaning, utilizes the midfrequent AC magnetically controlled sputter method, and the frequency range that the midfrequent AC arc suppresses power supply is 20KHz, base vacuum pressure 3.0 * 10
-3Pa, working gas are argon gas, and purity is 99.99%; Working gas 1.2Pa; Reacting gas is an oxygen, and purity is 99.99%, the dividing potential drop 0.12Pa of oxygen; 300 ℃ of the temperature of carrier during thin film deposition; 40 minutes magnetron sputtering time.
Under these conditions, the titanium deoxid film that is obtained is that anatase mixes phase composition mutually with rutile mutually, wherein the anatase relative scale that accounts for anatase and rutile mutually is about 92%, the relative scale that rutile accounts for anatase and rutile mutually is 8%, the about 500nm of film thickness, crystallite size 30～40nm.Record this film with ultraviolet specrophotometer uv absorption rate is reached 97%.
Recording this film with spectrophotometer is under the ultraviolet light irradiation condition of 260nm ± 60nm at wavelength, and the DDVP solution that to concentration is 10mg/L was through degraded in 4.0 hours, and degradation rate reaches 92%; This film is under ultraviolet light conditions, and PARA FORMALDEHYDE PRILLS(91,95) concentration is 1.0mg/M
3Air through 10 hours the degraded, degradation rate reaches 90%.
Embodiment three
With the metallic aluminium is carrier, puts into vacuum coating equipment after cleaning, utilizes the midfrequent AC magnetically controlled sputter method, and the frequency range that the midfrequent AC arc suppresses power supply is 40KHz, base vacuum pressure 4.0 * 10
-3Pa, working gas are argon gas, and purity is 99.99%; Working gas 2.0Pa; Reacting gas is an oxygen, and purity is 99.99%, the dividing potential drop Pa of oxygen; 400 ℃ of the temperature of carrier during thin film deposition; 40 minutes magnetron sputtering time.
Under these conditions, the titanium deoxid film that is obtained is that anatase mixes phase composition mutually with rutile mutually, wherein to account for the relative scale of anatase and rutile mutually be 95% to anatase, the relative scale that rutile accounts for anatase and rutile mutually is 5%, the about 55nm of film thickness, crystallite size～40nm.Record this film with ultraviolet specrophotometer uv absorption rate is reached 98%.
Recording this film with spectrophotometer is under the ultraviolet light irradiation condition of 260nm ± 60nm at wavelength, and the DDVP solution that to concentration is 10mg/L was through degraded in 4.0 hours, and degradation rate reaches 96%; This film is under ultraviolet light conditions, and PARA FORMALDEHYDE PRILLS(91,95) concentration is 1.0mg/M
3Air through 10 hours the degraded, degradation rate reaches 94%.
Embodiment four
With Al
2O
3Pottery is a carrier, puts into vacuum coating equipment after cleaning, utilizes the midfrequent AC magnetically controlled sputter method, and the frequency range that the midfrequent AC arc suppresses power supply is 40KHz, base vacuum pressure 3.0 * 10
-3Pa, working gas are argon gas, and purity is 99.99%; Working gas 2.0Pa; Reacting gas is an oxygen, and purity is 99.99%, the dividing potential drop 0.8Pa of oxygen; 500 ℃ of the temperature of carrier during thin film deposition; 40 minutes magnetron sputtering time.
Under these conditions, the titanium deoxid film that is obtained is that anatase mixes phase composition mutually with rutile mutually, wherein to account for the relative scale of anatase and rutile mutually be 96% to anatase, the relative scale that rutile accounts for anatase and rutile mutually is 4%, the about 60nm of film thickness, crystallite size 50nm.Record this film with ultraviolet specrophotometer uv absorption rate is reached 100%.
Recording this film with spectrophotometer is under the ultraviolet light irradiation condition of 260nm ± 60nm at wavelength, and the DDVP solution that to concentration is 10mg/L was through degraded in 4.0 hours, and degradation rate reaches 100%; This film is under ultraviolet light conditions, and PARA FORMALDEHYDE PRILLS(91,95) concentration is that the air of 1.0mg/M3 was degraded through 8 hours, and degradation rate reaches 94%.
Embodiment five
With Al
2O
3Pottery is a carrier, puts into vacuum coating equipment after cleaning, utilizes the midfrequent AC magnetically controlled sputter method, and the frequency range that the midfrequent AC arc suppresses power supply is 60KHz, base vacuum pressure 3.0 * 10
-3Pa, working gas are argon gas, and purity is 99.99%; Working gas 1.8Pa; Reacting gas is an oxygen, and purity is 99.99%, the dividing potential drop 0.15Pa of oxygen; 450 ℃ of the temperature of carrier during thin film deposition; 50 minutes magnetron sputtering time.
Under these conditions, the titanium deoxid film that is obtained is that anatase is formed the about 42nm of film thickness, crystallite size 20～30nm with a small amount of amorphous mutually.Record this film with ultraviolet specrophotometer uv absorption rate is reached 100%.
Recording this film with spectrophotometer is under the ultraviolet light irradiation condition of 260nm ± 60nm at wavelength, and the DDVP solution that to concentration is 10mg/L was through degraded in 4.0 hours, and degradation rate reaches 96.5%; This film is under ultraviolet light conditions, and PARA FORMALDEHYDE PRILLS(91,95) concentration is 1.0mg/M
3Air through 10 hours the degraded, degradation rate reaches 92%.
Claims (6)
1. titanium dioxide photocatalysis air-cleaning film and preparation method thereof, this method in turn includes the following steps:
(1) carrier that at first will be used to prepare film carries out cleaning;
(2) to place vacuum pressure be smaller or equal to 5.0 * 10 for carrier that above-mentioned cleaning is good
-3Pa, be provided with in the vacuum equipment of pure metallic titanium target;
(3) utilize the pure titanium target of midfrequent AC magnetically controlled sputter method sputter, the air pressure that is adopted is 0.5Pa～2.0Pa, and operating voltage is 200v～600v, and current density is 2.0mA/cm
2～10mA/cm
2, oxygen partial pressure is 0.08Pa～0.8Pa, pure metallic titanium target and oxygen directly generate optically catalytic TiO 2 film on carrier under the condition of magnetron sputtering.
2. in accordance with the method for claim 1, it is characterized in that it is 15KHz～60KHz that employed midfrequent AC arc suppresses the supply frequency scope.
3. according to claim 1 or 2 described methods, it is characterized in that the accompanying carrier of film can be glass, metal or pottery.
4. in accordance with the method for claim 3, it is characterized in that thin-film carrier temperature in the process of film preparation is 150 ℃～500 ℃.
5. adopt the optically catalytic TiO 2 film of method preparation according to claim 1, it is characterized in that described photocatalysis film is by single anatase phase composition or by single rutile phase composition or by anatase phase and rutile mixing phase composition mutually, wherein anatase accounts for 50%～98% mutually, and rutile accounts for 2%～50% mutually.
6. according to the described optically catalytic TiO 2 film of claim 5, it is characterized in that described photocatalysis film crystal grain can be along bearer plane vertical direction and the growth of bearer plane horizontal direction, size of microcrystal is less than 10～100 nanometers, and the thickness of film is less than 20～100 nanometers.
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|---|---|---|---|
| CNB011343354A CN1141178C (en) | 2001-10-31 | 2001-10-31 | Titanium dioxide photocatalysis air-cleaning film and its preparation method |
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|---|---|---|---|
| CNB011343354A CN1141178C (en) | 2001-10-31 | 2001-10-31 | Titanium dioxide photocatalysis air-cleaning film and its preparation method |
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|---|---|
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| CN1141178C CN1141178C (en) | 2004-03-10 |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1298883C (en) * | 2004-01-16 | 2007-02-07 | 清华大学 | Ag/TiO2 composite film with adjustable contact angle and preparation method thereof |
| CN100345599C (en) * | 2005-08-11 | 2007-10-31 | 上海交通大学 | Prepn process of biomedical active TiO2 film |
| CN100400702C (en) * | 2005-07-15 | 2008-07-09 | 深圳市豪威光电子设备有限公司 | Method and system of preparing ITO film using medium frequency reaction magnetic controlled sputtering indium tin alloy target |
| CN100431995C (en) * | 2003-01-28 | 2008-11-12 | 皇家飞利浦电子股份有限公司 | Method of producing transparent titanium oxide coatings having a rutile structure |
| CN101892460A (en) * | 2010-06-22 | 2010-11-24 | 浙江大学 | Method for preparing titanium dioxide porous membrane |
| CN102294234A (en) * | 2011-07-15 | 2011-12-28 | 刘凡新 | Composite titanium dioxide photocatalyst and preparation method thereof |
| CN101722000B (en) * | 2008-10-29 | 2012-01-11 | 中国科学院苏州纳米技术与纳米仿生研究所 | Preparation method of high-efficiency composite catalyst film for overlength carbon nano tube growth |
| CN104826625A (en) * | 2015-04-09 | 2015-08-12 | 上海理工大学 | Double-layer TiO2/Au porous structure catalyst and preparation method thereof |
| CN104928640A (en) * | 2015-07-05 | 2015-09-23 | 林志苹 | Porous activated carbon particle and titanium dioxide thin film composite method |
| CN104947059A (en) * | 2015-06-30 | 2015-09-30 | 成都易胜科生物科技有限公司 | Electronic device shell with nanometer titanium dioxide film covering surface and processing method thereof |
| CN105112865A (en) * | 2015-08-17 | 2015-12-02 | 苏州月辉环保科技有限公司 | Manufacturing method of novel photocatalyst board |
| CN105177516A (en) * | 2015-06-30 | 2015-12-23 | 成都易胜科生物科技有限公司 | Electronic device shell with surface covered with TiN-nanometer TiO<2> film and processing method for electronic device shell |
| CN113198442A (en) * | 2021-05-28 | 2021-08-03 | 齐鲁工业大学 | Method for growing nano titanium dioxide photocatalyst on surface of filler by bombarding titanium target material with vacuum plasma oxygen |
-
2001
- 2001-10-31 CN CNB011343354A patent/CN1141178C/en not_active Expired - Fee Related
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100431995C (en) * | 2003-01-28 | 2008-11-12 | 皇家飞利浦电子股份有限公司 | Method of producing transparent titanium oxide coatings having a rutile structure |
| CN1298883C (en) * | 2004-01-16 | 2007-02-07 | 清华大学 | Ag/TiO2 composite film with adjustable contact angle and preparation method thereof |
| CN100400702C (en) * | 2005-07-15 | 2008-07-09 | 深圳市豪威光电子设备有限公司 | Method and system of preparing ITO film using medium frequency reaction magnetic controlled sputtering indium tin alloy target |
| CN100345599C (en) * | 2005-08-11 | 2007-10-31 | 上海交通大学 | Prepn process of biomedical active TiO2 film |
| CN101722000B (en) * | 2008-10-29 | 2012-01-11 | 中国科学院苏州纳米技术与纳米仿生研究所 | Preparation method of high-efficiency composite catalyst film for overlength carbon nano tube growth |
| CN101892460A (en) * | 2010-06-22 | 2010-11-24 | 浙江大学 | Method for preparing titanium dioxide porous membrane |
| CN102294234A (en) * | 2011-07-15 | 2011-12-28 | 刘凡新 | Composite titanium dioxide photocatalyst and preparation method thereof |
| CN104826625A (en) * | 2015-04-09 | 2015-08-12 | 上海理工大学 | Double-layer TiO2/Au porous structure catalyst and preparation method thereof |
| CN104947059A (en) * | 2015-06-30 | 2015-09-30 | 成都易胜科生物科技有限公司 | Electronic device shell with nanometer titanium dioxide film covering surface and processing method thereof |
| CN105177516A (en) * | 2015-06-30 | 2015-12-23 | 成都易胜科生物科技有限公司 | Electronic device shell with surface covered with TiN-nanometer TiO<2> film and processing method for electronic device shell |
| CN105177516B (en) * | 2015-06-30 | 2017-12-12 | 温州市科泓机器人科技有限公司 | Surface covers TiN nano-TiOs2The case of electronic device and its processing method of film |
| CN104928640A (en) * | 2015-07-05 | 2015-09-23 | 林志苹 | Porous activated carbon particle and titanium dioxide thin film composite method |
| CN104928640B (en) * | 2015-07-05 | 2017-11-07 | 林志苹 | A kind of method that porous activated carbon particle is combined with titanium deoxid film |
| CN105112865A (en) * | 2015-08-17 | 2015-12-02 | 苏州月辉环保科技有限公司 | Manufacturing method of novel photocatalyst board |
| CN113198442A (en) * | 2021-05-28 | 2021-08-03 | 齐鲁工业大学 | Method for growing nano titanium dioxide photocatalyst on surface of filler by bombarding titanium target material with vacuum plasma oxygen |
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| Publication number | Publication date |
|---|---|
| CN1141178C (en) | 2004-03-10 |
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