CN104928640A - Porous activated carbon particle and titanium dioxide thin film composite method - Google Patents
Porous activated carbon particle and titanium dioxide thin film composite method Download PDFInfo
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- CN104928640A CN104928640A CN201510384987.6A CN201510384987A CN104928640A CN 104928640 A CN104928640 A CN 104928640A CN 201510384987 A CN201510384987 A CN 201510384987A CN 104928640 A CN104928640 A CN 104928640A
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- activated carbon
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Abstract
The invention provides a porous activated carbon particle and titanium dioxide thin film composite device because the air pollutants can be effectively absorbed and processed after activated carbon particles and titanium dioxide are composited. The device comprises a supporting frame, a porous sieve, a motor, a permanent magnet and a magnetic stirrer. The porous sieve is fixed below the supporting frame through a screw, and the lower end face of the porous sieve is full of sieve holes. The permanent magnet is connected below the motor. The magnetic stirrer is located in the porous sieve. By means of the method, titanium dioxide thin films are evenly prepared on the porous activated carbon particles stirred continuously. The preparing method is simple, deposition efficiency is high, uniformity is good, and higher absorption and decomposition efficiency is achieved for the air pollutants; furthermore, when the titanium dioxide thin films are consumed, the porous activated carbon particles can be input into the porous sieve, the titanium dioxide thin films are prepared again, and the device has the advantage of being capable of being used repeatedly.
Description
Technical field
The present invention relates to air purification field, relate in particular to a kind of method of porous activated carbon particle and titanium deoxid film compound.
Background technology
Along with the progress of science and technology, the standard of living of people is improving constantly, but the Air quality of indoor is in continuous decline.First, along with the raising of building level, the stopping property in house is become better and better, and the circulation of air becomes worse and worse; Secondly, new chemical industry synthetic raw material is due to its superior performance, cheap, and by a large amount of application under construction, they can discharge harmful gas, such as: formaldehyde, organic volatile etc.; In addition, all can release obnoxious flavour, particulate matter etc. in various degree during more and more advanced in electrical equipment miscellaneous, kitchen in room equipment work.These above reasons directly cause IAQ (indoor air quality) to worsen, and then affect the healthy of people, effectively carry out the problem that purifying air is people's general concern.
Activated carbon granule is the particulate state of porous, and hole is flourishing, and specific surface area is large, the specific surface area of every gram of gac can reach more than 1000 square metres, be good sorbing material, cost performance is high, is to carry out atmospheric pollution absorption, make the requisite material of healthy Green Home.But activated carbon granule can only pollutent in absorbed air, but activated carbon granule can not process pollutent.Titanium dioxide is a kind of photocatalyst, and under the irradiation of UV-light, titanium dioxide surface can excite and produce electronics and hole, and catalytic air pollutent (such as: formaldehyde) reaction generates carbonic acid gas and water.Want titanium dioxide effectively to purify air, first air pollutant effectively must be adsorbed onto above titanium dioxide, it is a kind of efficient manner that activated carbon granule and titanium dioxide are carried out compound, utilize the effective absorbed air pollutent of activated carbon granule, utilize titanium dioxide to carry out the decomposition of pollutent.How activated carbon granule and titanium dioxide being carried out compound is people's questions of common concern.
Summary of the invention
The present invention is directed to the Complex Problem of activated carbon granule and titanium dioxide, a kind of method of porous activated carbon particle and titanium deoxid film compound is provided, the method adopts the method for magnetron sputtering to prepare titanium deoxid film uniformly on porous activated carbon particle, the titanium dioxide of porous membrane state considerably increases the utilization ratio of titanium dioxide, there is high Adsorption and decomposition efficiency, meanwhile, the method has the advantages that preparation is simple, porous activated carbon particle can reuse.
To achieve these goals, first the present invention provides the device of a kind of porous activated carbon particle and titanium deoxid film compound, comprise protective guard, bracing frame, porous sieve, well heater, motor, fixed link, permanent magnet, magnetic stirring, wherein, protective guard is fixed on the top of bracing frame, porous sieve is screwed in the below of bracing frame, porous sieve is for cylindrical, and lower surface has been covered with sieve aperture; Fixed link is arranged on bracing frame, and motor is connected with fixed link, and the below of motor is connected with permanent magnet, and permanent magnet faces porous sieve; Well heater is arranged on bracing frame, faces porous sieve; Magnetic stirring is positioned at porous sieve.
The overall dimension of the sieve aperture of described porous sieve is less than the minimum size of porous activated carbon particle;
Described bracing frame adopts electro-conductive material, and is connected with the earth.
The method of a kind of porous activated carbon particle provided by the invention and titanium deoxid film compound is:
Step 1: taken off from bracing frame by porous sieve, puts into porous sieve by porous activated carbon particle, and is arranged on bracing frame by the porous sieve that porous activated carbon particle is housed;
Step 2: the device of porous activated carbon particle and titanium deoxid film compound is loaded in the vacuum chamber of magnetic control sputtering system;
Step 3: at vacuum chamber indoor location titanium or the titanium dioxide target of magnetron sputtering;
Step 4: the air pressure of vacuum chamber is extracted into and is less than 10
-5pa, then according to argon gas: the ratio of oxygen=1 ~ 5:1 passes into the mixed gas of argon gas and oxygen in vacuum chamber, makes the air pressure of vacuum chamber at 0.1 ~ 1 Pa, the temperature of well heater is adjusted to room temperature to 400 degree;
Step 5: starter motor, drives permanent magnet rotating, and then drives magnetic stirring to stir porous activated carbon particle;
Step 6: the power supply starting magnetron sputtering, sputter titanium or titanium dioxide target, the titanium dioxide atomic group sputtered deposits to above porous activated carbon particle by the sieve aperture that porous is sieved, and forms titanium deoxid film.
In sum, the invention provides the device of a kind of porous activated carbon particle and titanium deoxid film compound, on this basis, this device is put into the vacuum chamber of magnetron sputtering, the invention provides a kind of method of porous activated carbon particle and titanium deoxid film compound.The gac prepared with existing chemical process and the method for titanium dioxide compare, the present invention adopts the method for physical deposition, constantly prepared titanium deoxid film uniformly by the porous activated carbon particle that stirs, the method preparation is simple, sedimentation effect is high, good evenness, the activated carbon granule of porous makes air pollutant more effective at titanium deoxid film surface aggregation, and the titanium dioxide of filminess considerably increases the utilization ratio of titanium dioxide, there is high Adsorption and decomposition efficiency, in addition, when titanium deoxid film to some extent loss time, porous activated carbon particle can be loaded in porous sieve, re-start the preparation of titanium deoxid film, there is the feature of recycling.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the method for a kind of porous activated carbon particle of the present invention and titanium deoxid film compound.
In figure: 1 magnetron sputtering pedestal, 2 magnet steel, 3 titaniums or titanium dioxide target, 4 electronics, 5 argon ions, 6 titanium dioxide atomic groups, 7 protective guards, 8 bracing frames, 9 porous sieves, 10 sieve apertures, 11, well heater, 12 motors, 13 fixed links, 14 permanent magnets, 15 magnetic stirrings, 16 porous activated carbon particles.
Embodiment
Below in conjunction with accompanying drawing embodiment, the present invention is described in further detail.
Fig. 1 is the schematic diagram of a kind of method of porous activated carbon particle and titanium deoxid film compound, in figure, magnetron sputtering pedestal 1, magnet steel 2, titanium or titanium dioxide target 3, electronics 4, argon ion 5, titanium dioxide atomic group 6, protective guard 7, bracing frame 8, porous sieve 9, sieve aperture 10, well heater 11, motor 12, fixed link 13, permanent magnet 14, magnetic stirring 15, porous activated carbon particle 16, wherein, protective guard 7 is screwed in the top of bracing frame 8, porous sieve 9 is screwed in the below of bracing frame 8, porous sieve 9 is cylindrical, and lower surface has been covered with sieve aperture 10, fixed link 13 is arranged on bracing frame 8, and motor 12 is connected with fixed link 13, and the below of motor 12 is connected with permanent magnet 14, and permanent magnet 14 faces porous sieve 9, well heater 11 is arranged on bracing frame 8, faces porous sieve 9, magnetic stirring 15 is positioned at porous sieve 9, the overall dimension of the sieve aperture 10 of above-mentioned porous sieve 9 is less than the minimum size of porous activated carbon particle 16, in the present embodiment, porous activated carbon particle 16 sieves with 40 object sieves by we, screen out the porous activated carbon particle 16 that particle size is less than 0.42 mm, the size of the sieve aperture 10 of porous sieve 9 is set to 0.35 mm, ensure that porous activated carbon particle 16 can not sieve in 9 from porous and drops, above-mentioned bracing frame 8 adopts the stainless material of conduction, and is connected with the earth.
A kind of porous activated carbon particle 16 provided by the invention with the method for titanium deoxid film compound is:
Step 1: taken off from bracing frame 8 by porous sieve 9, puts into porous sieve 9 by porous activated carbon particle 16, and is arranged on bracing frame 8 by the porous sieve 9 that porous activated carbon particle 16 is housed;
Step 2: porous activated carbon particle 16 and the device of titanium deoxid film compound are loaded in the vacuum chamber of magnetic control sputtering system;
Step 3: at vacuum chamber indoor location titanium or the titanium dioxide target 3 of magnetron sputtering;
Step 4: the air pressure of vacuum chamber is extracted into 0.8 × 10
-5pa, then according to argon gas: the ratio of oxygen=2:1 passes into the mixed gas of argon gas and oxygen in vacuum chamber, makes the air pressure of vacuum chamber at 0.5 Pa, the temperature of well heater is adjusted to room temperature;
Step 5: starter motor 12, drives permanent magnet 14 to rotate, and then drives magnetic stirring 15 pairs of porous activated carbon particles 16 to stir;
Step 6: the power supply starting magnetron sputtering, electronics 4 is owing to being positioned at the effect of the magnet steel 2 of magnetron sputtering pedestal 1, be bound in around titanium or titanium dioxide target 3, argon gas is ionized to argon ion 5, because titanium or titanium dioxide target 3 are connected with power cathode, argon ion 5 accelerates to move to titanium or titanium dioxide target 3, and is sputtered out by titanium dioxide atomic group 6, deposit to above porous activated carbon particle 16 by the sieve aperture 10 of porous sieve 9, form titanium deoxid film.
In sum, the invention provides the device of a kind of porous activated carbon particle 16 and titanium deoxid film compound, on this basis, this device is put into the vacuum chamber of magnetron sputtering, the invention provides a kind of method of porous activated carbon particle 16 and titanium deoxid film compound.The gac prepared with existing chemical process and the method for titanium dioxide compare, the present invention adopts the method for physical deposition, constantly prepared titanium deoxid film uniformly by the porous activated carbon particle 16 that stirs, the method preparation is simple, sedimentation effect is high, good evenness, the activated carbon granule 16 of porous makes air pollutant more effective at titanium deoxid film surface aggregation, and the titanium dioxide of filminess considerably increases the utilization ratio of titanium dioxide, there is high Adsorption and decomposition efficiency, in addition, when titanium deoxid film to some extent loss time, porous activated carbon particle 16 can be loaded in porous sieve 9, re-start the preparation of titanium deoxid film, there is the feature of recycling.
Above-described embodiment has been described in detail technical scheme of the present invention and beneficial effect; be understood that and the foregoing is only specific embodiments of the invention; be not limited to the present invention; all any amendments and improvement etc. made in spirit of the present invention, all should be included within protection scope of the present invention.
Claims (2)
1. a device for porous activated carbon particle and titanium deoxid film compound, comprises protective guard, bracing frame, porous sieve, well heater, motor, fixed link, permanent magnet, magnetic stirring, it is characterized in that: described protective guard is fixed on the top of bracing frame; Described porous sieve is screwed in the below of bracing frame, and porous sieve is for cylindrical, and lower surface has been covered with sieve aperture; Described fixed link is arranged on bracing frame, and motor is connected with fixed link, and the below of motor is connected with permanent magnet, and permanent magnet faces porous sieve; Described well heater is arranged on bracing frame, faces porous sieve; Described magnetic stirring is positioned at porous sieve;
Porous activated carbon particle described in utilization and the device of titanium deoxid film compound, a kind of method of porous activated carbon particle and titanium deoxid film compound is:
Step 1: taken off from bracing frame by porous sieve, puts into porous sieve by porous activated carbon particle, and is arranged on bracing frame by the porous sieve that porous activated carbon particle is housed;
Step 2: the device of porous activated carbon particle and titanium deoxid film compound is loaded in the vacuum chamber of magnetic control sputtering system;
Step 3: at vacuum chamber indoor location titanium or the titanium dioxide target of magnetron sputtering;
Step 4: the air pressure of vacuum chamber is extracted into and is less than 10
-5pa, then according to argon gas: the ratio of oxygen=1 ~ 5:1 passes into the mixed gas of argon gas and oxygen in vacuum chamber, makes the air pressure of vacuum chamber at 0.1 ~ 1 Pa, the temperature of well heater is adjusted to room temperature to 400 degree;
Step 5: starter motor, drives permanent magnet rotating, and then drives magnetic stirring to stir porous activated carbon particle;
Step 6: the power supply starting magnetron sputtering, sputter titanium or titanium dioxide target, the titanium dioxide atomic group sputtered deposits to above porous activated carbon particle by the sieve aperture that porous is sieved, and forms titanium deoxid film.
2. the device of a kind of porous activated carbon particle according to claim 1 and titanium deoxid film compound, is characterized in that: the overall dimension of the sieve aperture of described porous sieve is less than the minimum size of porous activated carbon particle; Described bracing frame adopts electro-conductive material, and is connected with the earth.
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| CN201510384987.6A CN104928640B (en) | 2015-07-05 | 2015-07-05 | A kind of method that porous activated carbon particle is combined with titanium deoxid film |
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| CN201510384987.6A CN104928640B (en) | 2015-07-05 | 2015-07-05 | A kind of method that porous activated carbon particle is combined with titanium deoxid film |
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| CN104928640B CN104928640B (en) | 2017-11-07 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110578127A (en) * | 2019-10-31 | 2019-12-17 | 浙江工业大学 | Device for increasing deposition rate of magnetron sputtering coating |
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|---|---|---|---|---|
| CN1354042A (en) * | 2001-10-31 | 2002-06-19 | 清华大学 | Titanium dioxide photocatalysis air-cleaning film and its preparation method |
| CN101275218A (en) * | 2008-05-21 | 2008-10-01 | 兰州大学 | Film preparation device and observation method for film growth |
| CN101294279A (en) * | 2007-04-29 | 2008-10-29 | 中国科学院理化技术研究所 | Plasma film coating apparatus for particle surface modification |
| CN101802249A (en) * | 2007-08-20 | 2010-08-11 | 3M创新有限公司 | Method for preparing catalyst |
| CN103046010A (en) * | 2011-10-17 | 2013-04-17 | 王钜 | Equipment and method for producing surface modified active carbon |
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- 2015-07-05 CN CN201510384987.6A patent/CN104928640B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1354042A (en) * | 2001-10-31 | 2002-06-19 | 清华大学 | Titanium dioxide photocatalysis air-cleaning film and its preparation method |
| CN101294279A (en) * | 2007-04-29 | 2008-10-29 | 中国科学院理化技术研究所 | Plasma film coating apparatus for particle surface modification |
| CN101802249A (en) * | 2007-08-20 | 2010-08-11 | 3M创新有限公司 | Method for preparing catalyst |
| CN101275218A (en) * | 2008-05-21 | 2008-10-01 | 兰州大学 | Film preparation device and observation method for film growth |
| CN103046010A (en) * | 2011-10-17 | 2013-04-17 | 王钜 | Equipment and method for producing surface modified active carbon |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110578127A (en) * | 2019-10-31 | 2019-12-17 | 浙江工业大学 | Device for increasing deposition rate of magnetron sputtering coating |
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Effective date of registration: 20190604 Address after: 037043 Beicun Village, Xihanling Township, Southern Suburb of Datong City, Shanxi Province Patentee after: Datong Jinsheng Haoda Carbon Industry Co.,Ltd. Address before: Room 701, No. 18, Zhoumeng Community, 52 Yonggang South Road, Jiangdong District, Ningbo City, Zhejiang Province, 315000 Patentee before: Lin Zhiping |