CN105112865A - Manufacturing method of novel photocatalyst board - Google Patents
Manufacturing method of novel photocatalyst board Download PDFInfo
- Publication number
- CN105112865A CN105112865A CN201510505177.1A CN201510505177A CN105112865A CN 105112865 A CN105112865 A CN 105112865A CN 201510505177 A CN201510505177 A CN 201510505177A CN 105112865 A CN105112865 A CN 105112865A
- Authority
- CN
- China
- Prior art keywords
- photocatalyst
- board
- honeycomb
- film
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention relates to and belongs to the field of application of waste gas treatment engineering, and particularly relates to a manufacturing method of a novel photocatalyst board. The manufacturing method comprises the steps that an aluminum material is firstly selected as a base material for manufacturing the photocatalyst board, and then the aluminum base material is processed and manufactured into an aluminum honeycomb board with a thickness of 10 mm, wherein honeycomb holes are formed in the surface of the aluminum honeycomb board; then the aluminum honeycomb board of the proper size is selected to be placed in a direct-current reaction magnetic control film plating machine to be plated with a film; and the aluminum honeycomb board plated with the film is cooled, the size of the photocatalyst board is adjusted according to the parameter of photocatalysis equipment after cooling, and an aluminum alloy frame is arranged around the photocatalyst board obtained after size adjustment. The photocatalyst board is produced based on a magnetron sputtering technology, the deposition efficiency of a film layer is high, and production efficiency is high. Meanwhile, the produced photocatalyst board is smooth, clean and dense in film plated surface, and the film layer has the beneficial effects of being high in hardness and wear resistance and the like. The bonding force of the film plated layer and the surface of a workpiece is high, corrosion resistance and chemical stability are excellent, and the service life of the photocatalyst board can be 3-5 years.
Description
Technical field
The present invention relates to and belong to waste gas treatment engineering Application Areas, relate to a kind of photocatalyst plate being applied to UV treating organic waste gas through photocatalysis, be specifically related to a kind of manufacture method of Novel photocatalyst plate.
Background technology
Air is the prerequisite that the mankind depend on for existence and development, and along with industrial development, the factors such as the growth of the size of population, the quantity discharged of waste gas is also increasing year by year.The difference of countries in the world on industrial development degree and environmental protection industry drop into makes atmospheric issues present area differentiation, but along with the continuous consumption of earth resources, topsoil has become a global difficult problem.Present stage China's topsoil is relatively more serious, and meanwhile, it is all the more serious that the discharge wantonly due to production, life waste gas makes the atmospheric environment of China worsen, and China is just being shrouded in topsoil crisis.
In today that industry days reaches increasingly, the discharge kind of waste gas and quantity discharged increasing, composition is also more complicated, often containing being difficult to biodegradable organism in a large number in waste gas.Topsoil phenomenon becomes a difficult problem urgently to be resolved hurrily, becomes the bottleneck of Chinese society and Economic development.About the emission standard of " three wastes " and laws and regulations also stricter, country has been listed air contaminant treatment in the middle of " 12 " planning in, therefore develops good reliability, study hotspot that waste gas processing method that processing efficiency is high has become environmental protection industry (epi).
In the moiety of waste gas, foul gas and volatile organic compounds (VOC) occupy very large proportion, wherein foul gas mainly comprises hydrogen sulfide, ammonia, mercaptan and dimethyl sulphide etc., and volatile organic compounds mainly comprises benzene,toluene,xylene, formaldehyde, hexane, heptane, methyl ethyl ketone, acetone, tetracol phenixin, vinyl acetic monomer etc.These gases, if effectively do not processed, to the quality of life of atmospheric environment, the mankind and healthyly will cause very large harm.
And the process of UV photocatalytic method to foul gas and VOC waste gas has following several large advantage: (1) is efficiently except stench: efficiently can remove the principal pollutant such as volatile organic matter (VOC), inorganics, hydrogen sulfide, ammonia, thio-alcohol, and various foul smell, deodorization efficiency can reach more than 95%, and deodorising effect reaches odorant pollutant discharge primary standard (GB14554-93) that country promulgates; (2) without the need to adding any material: only need to arrange corresponding exhaust duct and air draft power, make pending gas carry out oxygenolysis purification by this equipment, chemical reaction is participated in without the need to adding any material; (3) strong adaptability: can high density be adapted to, atm number, the deodorization purifying treatment of different foul gas material, can every day 24 continuous throughout the twenty-four hour24, stable and reliable operation; (4) running cost is low: this equipment without any mechanical action, noiselessness, without the need to personal management and routine maintenance, only need make regular check on, this equipment energy consumption is low, and the extremely low < 700pa of equipment windage, can save a large amount of air draft power consumption; (5) applied widely: photochemical catalysis is applicable to the deodorization purifying treatment of the organic and inorganics foul gas of refinery, rubber plant, tannery, printing house, chemical plant, pharmaceutical factory, metal foundry, plastic reclaimed factory, spraying solvent etc.; Spray paint (painting) workshop, chemical industry, medicine, rubber, food, printing and dyeing, papermaking, the toxic harmful exhaust gas produced in production process such as to brewage and also can use photocatalysis treatment.
And the light-catalysed core technology of UV is the parts such as UV and photocatalyst, during operation, UV photophore and the built in light catalyst plate of device interior act synergistically, and carry out catalytic oxidation treatment to the waste gas through equipment body; So research and develop a kind of built in light catalyst plate of excellent performance.
Summary of the invention
For the deficiencies in the prior art, the present invention aims to provide a kind of manufacture method of Novel photocatalyst plate.
For solving the problem, the invention provides following technical scheme:
A manufacture method for Novel photocatalyst plate, concrete steps are as follows:
Step 1: first choose aluminium as the base material making photocatalyst plate, then manufactures thickness and is 10mm and surface has the honeycomb aluminum plate of honeycomb hole by aluminium base;
Step 2: the honeycomb aluminum plate choosing applicable size is placed in direct current reaction magnetic control film coating machine and carries out plated film, setting machined parameters is as follows: state: vacuum; Ar flow: 50ml/min; O
2flow: 18ml/min; Target-substrate distance: 100mm; Substrate bias: 55V; Sputtering current: 3.2A; Substrate temperature: 250 DEG C; Depositing time: 15min; After plated film completes, honeycomb aluminum plate surface being coated with TiO2 film takes out from direct current reaction magnetic control film coating machine and properly lays;
Step 3: cool completing the honeycomb aluminum plate after plated film in step 2, photocatalyst plate is obtained after having cooled, and then according to the size of photochemical catalysis equipment and design variable, size adjusting is carried out to photocatalyst plate, after completing size adjusting, on four limits of photocatalyst plate, aluminum alloy frame is installed, namely obtains the finished product of photocatalyst plate.
Further, the thick honeycomb aluminum plate of the 10mm in described step 1 is made up of the aluminium flake that 10 pieces of 1mm are thick, and described honeycomb aluminum plate surface is provided with the regular hexagon honeycomb hole that some length of sides are 3mm, and described every square metre, honeycomb aluminum plate surface is distributed with 4.28 ten thousand honeycomb holes.
Further, the direct current reaction magnetic control film coating machine in described step 2 adopts the extremely pure titanium target with 99.99% purity as negative electrode.
Beneficial effect: present invention employs magnetron sputtering technique and produce photocatalyst plate, film deposition efficiency is fast, production efficiency is high, the coated surface of the photocatalyst plate simultaneously produced is smooth, bright and clean, fine and close, rete has the advantage such as high rigidity, high-wearing feature, and the bonding force of coatings and workpiece surface is strong, its erosion resistance and chemical stability excellence, and make to reach 3 to 5 years the work-ing life of photocatalyst plate.
Accompanying drawing explanation
Fig. 1 is the structural representation of the photocatalyst plate of specific embodiments of the invention.
Description of reference numerals: honeycomb aluminum plate 1, aluminum alloy frame 2.
Embodiment
Specific embodiments of the invention are described in detail below according to Figure of description:
A kind of manufacture method of Novel photocatalyst plate, concrete steps are as follows: step 1: first choose aluminium as the base material making photocatalyst plate, then aluminium base is manufactured thickness and be 10mm and surface has the honeycomb aluminum plate 1 of honeycomb hole, the thick honeycomb aluminum plate 1 of its 10mm is made up of the aluminium flake that 10 pieces of 1mm are thick, described honeycomb aluminum plate 1 surface is provided with the regular hexagon honeycomb hole that some length of sides are 3mm, and described every square metre, honeycomb aluminum plate 1 surface is distributed with 4.28 ten thousand honeycomb holes; Step 2: the honeycomb aluminum plate 1 choosing applicable size is placed in direct current reaction magnetic control film coating machine and carries out plated film, setting machined parameters is as follows: state: vacuum; Ar flow: 50ml/min; O
2flow: 18ml/min; Target-substrate distance: 100mm; Substrate bias: 55V; Sputtering current: 3.2A; Substrate temperature: 250 DEG C; Depositing time: 15min; After plated film completes, the honeycomb aluminum plate 1 surface being coated with TiO2 film takes out from direct current reaction magnetic control film coating machine and properly lays; Direct current reaction magnetic control film coating machine in above-mentioned steps adopts the extremely pure titanium target with 99.99% purity as negative electrode; Step 3: cool completing the honeycomb aluminum plate after plated film 1 in step 2, photocatalyst plate is obtained after having cooled, and then according to the size of photochemical catalysis equipment and design variable, size adjusting is carried out to photocatalyst plate, after completing size adjusting, on four limits of photocatalyst plate, aluminum alloy frame 2 is installed, namely obtains the finished product of photocatalyst plate.
It should be noted that: present invention employs magnetron sputtering technique and produce photocatalyst plate, film deposition efficiency is fast, production efficiency is high, the coated surface of the photocatalyst plate simultaneously produced is smooth, bright and clean, fine and close, rete has the advantage such as high rigidity, high-wearing feature, and the bonding force of coatings and workpiece surface is strong, its erosion resistance and chemical stability excellence, and make to reach 3 to 5 years the work-ing life of photocatalyst plate.
The above, it is only preferred embodiment of the present invention, not any restriction is made to technical scope of the present invention, thus every above embodiment is done according to technical spirit of the present invention any trickle amendment, equivalent variations and modification, all still belong in the scope of technical scheme of the present invention.
Claims (3)
1. a manufacture method for Novel photocatalyst plate, is characterized in that: concrete steps are as follows:
Step 1: first choose aluminium as the base material making photocatalyst plate, then manufactures thickness and is 10mm and surface has the honeycomb aluminum plate of honeycomb hole by aluminium base;
Step 2: the honeycomb aluminum plate choosing applicable size is placed in direct current reaction magnetic control film coating machine and carries out plated film, setting machined parameters is as follows: state: vacuum; Ar flow: 50ml/min; O
2flow: 18ml/min; Target-substrate distance: 100mm; Substrate bias: 55V; Sputtering current: 3.2A; Substrate temperature: 250 DEG C; Depositing time: 15min; After plated film completes, honeycomb aluminum plate surface being coated with TiO2 film takes out from direct current reaction magnetic control film coating machine and properly lays;
Step 3: cool completing the honeycomb aluminum plate after plated film in step 2, photocatalyst plate is obtained after having cooled, and then according to the size of photochemical catalysis equipment and design variable, size adjusting is carried out to photocatalyst plate, after completing size adjusting, on four limits of photocatalyst plate, aluminum alloy frame is installed, namely obtains the finished product of photocatalyst plate.
2. the manufacture method of a kind of Novel photocatalyst plate according to claim 1, it is characterized in that: the thick honeycomb aluminum plate of the 10mm in described step 1 is made up of the aluminium flake that 10 pieces of 1mm are thick, described honeycomb aluminum plate surface is provided with the regular hexagon honeycomb hole that some length of sides are 3mm, and described every square metre, honeycomb aluminum plate surface is distributed with 4.28 ten thousand honeycomb holes.
3. the manufacture method of a kind of Novel photocatalyst plate according to claim 1, is characterized in that: the direct current reaction magnetic control film coating machine in described step 2 adopts the extremely pure titanium target with 99.99% purity as negative electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510505177.1A CN105112865A (en) | 2015-08-17 | 2015-08-17 | Manufacturing method of novel photocatalyst board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510505177.1A CN105112865A (en) | 2015-08-17 | 2015-08-17 | Manufacturing method of novel photocatalyst board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN105112865A true CN105112865A (en) | 2015-12-02 |
Family
ID=54660962
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510505177.1A Pending CN105112865A (en) | 2015-08-17 | 2015-08-17 | Manufacturing method of novel photocatalyst board |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105112865A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105671472A (en) * | 2016-01-23 | 2016-06-15 | 苏州月辉环保科技有限公司 | Manufacturing method of novel photocatalytic plate |
| CN109603794A (en) * | 2019-01-10 | 2019-04-12 | 北京中环嘉诚环境工程有限公司 | Purify water photoactivation net and its preparation and application |
| CN110318027A (en) * | 2019-08-15 | 2019-10-11 | 河南科技大学 | A method of low reflection silver-molybdenum alloy film is prepared on silver strip surface |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1354042A (en) * | 2001-10-31 | 2002-06-19 | 清华大学 | Titanium dioxide photocatalysis air-cleaning film and its preparation method |
| CN101591745A (en) * | 2008-05-30 | 2009-12-02 | 鸿富锦精密工业（深圳）有限公司 | Aluminum products and preparation method thereof |
-
2015
- 2015-08-17 CN CN201510505177.1A patent/CN105112865A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1354042A (en) * | 2001-10-31 | 2002-06-19 | 清华大学 | Titanium dioxide photocatalysis air-cleaning film and its preparation method |
| CN101591745A (en) * | 2008-05-30 | 2009-12-02 | 鸿富锦精密工业（深圳）有限公司 | Aluminum products and preparation method thereof |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105671472A (en) * | 2016-01-23 | 2016-06-15 | 苏州月辉环保科技有限公司 | Manufacturing method of novel photocatalytic plate |
| CN109603794A (en) * | 2019-01-10 | 2019-04-12 | 北京中环嘉诚环境工程有限公司 | Purify water photoactivation net and its preparation and application |
| CN109603794B (en) * | 2019-01-10 | 2021-10-29 | 北京中环达生态科技有限公司 | Photocatalysis net for purifying water quality and preparation and application thereof |
| CN110318027A (en) * | 2019-08-15 | 2019-10-11 | 河南科技大学 | A method of low reflection silver-molybdenum alloy film is prepared on silver strip surface |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105112865A (en) | Manufacturing method of novel photocatalyst board | |
| CN101240423A (en) | Automobile wheel hub surface vacuum coating treatment technique | |
| CN110668556B (en) | Visible light catalysis coupling bioelectrochemical wetland system and application thereof | |
| Fiameni et al. | Implementing sustainability in laboratory activities: A case study on aluminum titanium nitride based thin film magnetron sputtering deposition onto commercial laminated steel | |
| CN107837675B (en) | High-temperature waste gas purification treatment method, microorganism substrate filler and equipment thereof | |
| CN105951043A (en) | Manufacturing method of novel photocatalysis board | |
| Shao et al. | Disposal characteristics of sludge resulted from the treatment of municipal wastewater by heterogeneous photocatalytic technology. | |
| CN201791471U (en) | Deodorization device | |
| CN1236105C (en) | Induction heating method for alloying surface of Mg alloy | |
| CN104028443A (en) | Steel structure anti-corrosion method and anti-corrosion device for steel structure | |
| CN104647854A (en) | Material surface decoration protective layer capable of replacing electroplating and preparation method of material surface decoration protective layer | |
| DE502006008861D1 (en) | METHOD AND DEVICE FOR SEPARATING A NON-METALLIC COATING BY COLD GAS SPRAYING | |
| CN105671472A (en) | Manufacturing method of novel photocatalytic plate | |
| CN102876093B (en) | A kind of composite metal coated, Its Preparation Method And Use | |
| CN101377006B (en) | Method for preparing high catalytic activity titania thin film on plastic workpiece surface | |
| Panomsuwan et al. | Non-thermal plasma technology for abatement of pollutant emission from marine diesel engine | |
| CN1876229A (en) | Amorphous metal ion doped titanium dioxide photocatalytic material and its preparation process | |
| CN110304735A (en) | A kind of fuel cell system for the treatment of of Coking Wastewater | |
| CN107805796A (en) | A kind of ALD novel reactions room | |
| CN209309004U (en) | A kind of corrosion resistant impeller | |
| CN204488163U (en) | A kind of material surface decoration overcoat that can replace electroplating | |
| CN209082896U (en) | Ceramic tile containing rub resistance visible light photocatalyst layer | |
| CN101961601B (en) | Waste gas purification system of photocatalytic filter tower | |
| CN107935187A (en) | A kind of city river comprehensive regulation and ecological restoring method and its system | |
| CN212982566U (en) | Ozone oxidation device |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| CB02 | Change of applicant information |
Address after: 215155 Huayang village, Hope Town, Suzhou, Jiangsu, Xiangcheng District Applicant after: SUZHOU YUEHUI ENVIRONMENTAL PROTECTION TECHNOLOGY CO., LTD. Address before: Xiangcheng District Wong Tai town bridge in Suzhou city Jiangsu province 215000 long Kang Road No. 9 Applicant before: SUZHOU YUEHUI ENVIRONMENTAL PROTECTION TECHNOLOGY CO., LTD. |
|
| COR | Change of bibliographic data | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20151202 |