CN105671472A - Manufacturing method of novel photocatalytic plate - Google Patents

Manufacturing method of novel photocatalytic plate Download PDF

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Publication number
CN105671472A
CN105671472A CN201610045619.3A CN201610045619A CN105671472A CN 105671472 A CN105671472 A CN 105671472A CN 201610045619 A CN201610045619 A CN 201610045619A CN 105671472 A CN105671472 A CN 105671472A
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China
Prior art keywords
aluminium sheet
aluminum substrate
tio2
sheet matrix
manufacturing
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CN201610045619.3A
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Chinese (zh)
Inventor
江悌坤
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Suzhou Yuehui Environmental Protection Technology Co Ltd
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Suzhou Yuehui Environmental Protection Technology Co Ltd
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Priority to CN201610045619.3A priority Critical patent/CN105671472A/en
Publication of CN105671472A publication Critical patent/CN105671472A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D53/00Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34Chemical or biological purification of waste gases
    • B01D53/74General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86Catalytic processes
    • B01D53/88Handling or mounting catalysts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01DSEPARATION
    • B01D2255/00Catalysts
    • B01D2255/20Metals or compounds thereof
    • B01D2255/207Transition metals
    • B01D2255/20707Titanium

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  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Catalysts (AREA)

Abstract

The invention relates to the field of waste gas treatment engineering applications, and particularly relates to a manufacturing method of a novel photocatalytic plate. The manufacturing method specifically comprises the following steps of (1) processing and manufacturing an alveolate transparent aluminum substrate; (2) cutting the alveolate transparent aluminum substrate, putting in a powder spraying coating machine, and coating a TiO2 film on the alveolate transparent aluminum substrate by the powder spraying coating machine; (3) cooling the coated aluminum substrate after the aluminum substrate is coated, regulating the size of the coated aluminum substrate according to the size and design parameters of photocatalytic equipment, and finally, installing an aluminum alloy frame around the coated aluminum substrate after regulation, so as to obtain the novel photocatalytic plate. The particle size of TiO2 particles on the novel photocatalytic plate prepared by using the manufacturing method can reach the nanoscale, so that the thickness and stability of the TiO2 particles on the aluminum substrate are guaranteed, and the problem of low waste gas purification efficiency due to the falling of the TiO2 particles as a catalyst during use is avoided.

Description

The manufacture method of a kind of Novel photocatalyst plate
Technical field
The present invention relates to off gas treatment engineer applied field, specifically refer to the manufacture method of a kind of Novel photocatalyst plate.
Background technology
Air is the prerequisite that the mankind depend on for existence and development, and along with the development of industrial production, the factors such as the growth of the size of population, the quantity discharged of waste gas is also increasing year by year. The difference that countries in the world are dropped in industry development degree and environmental protection industry makes air problem present area differentiation, but the continuous consumption along with earth resources, topsoil has become a worldwide difficult problem. Present stage China's topsoil is relatively more serious, and meanwhile, owing to the discharge wantonly of production, life waste gas makes the atmospheric environment of China worsen all the more seriously, China is just being shrouded in topsoil crisis.
In today that industry days reaches increasingly, the discharge kind of waste gas and quantity discharged increase day by day, and composition is also more complicated, often containing the organism being difficult to biological degradation in a large number in waste gas. Topsoil phenomenon becomes a difficult problem urgently to be resolved hurrily, becomes the bottleneck of Chinese society and Economic development. Emission standard and laws and regulations about " three wastes " are also stricter, country has been listed air contaminant treatment in the middle of " 12 " planning in, therefore develops good reliability, research focus that waste gas processing method that processing efficiency is high has become environmental protection industry (epi).
In waste gas is formed, foul gas and volatile organic compounds (VOC) occupy very big proportion, wherein foul gas mainly comprises hydrogen sulfide, ammonia, mercaptan and dimethyl sulphide etc., and volatile organic compounds mainly comprises benzene, toluene, dimethylbenzene, formaldehyde, hexane, heptane, methyl ethyl ketone, acetone, tetracol phenixin, vinyl acetic monomer etc. These gases, if effectively do not processed, to the quality of life of atmospheric environment, the mankind and healthy will cause very big harm.
Traditional waste gas treatment process mainly comprises the combination process of physics method, chemical method, biological process and these three kinds of methods. Common physical method has electrostatic trapping, washing, absorption and sorption, condensation etc., and these methods have been widely used in off gas treatment field, and often kind of method all has its feature and the scope of application. Common chemical process has burning, catalyticcombustion etc., the organic exhaust gas that these methods are applicable to the big air quantity of process usually, volatile organic content is high. Also develop some biological treatment technology for waste gas both at home and abroad in recent years: such as biological process, membrane separation process etc., the current sewage plant waste gas pollution control and treatment at home of this method has a small amount of utilization, little for the utilization administered in industrial gaseous waste. The waste gas complicated for character, processing requirements is high, often to be taked the combination process of above three kinds of methods, waste gas could carry out the process of economical and effective.
But industrial much waste gas contains more than one pollutents, and pollutent character complexity, concentration height, processing requirements are sternly, now adopt traditional waste gas treatment process to be just difficult to reach process object cost-effectively.Therefore, need the exhaust gas treatment technology of development of new, and UV photodissociation catalytic oxidation is a kind of novel exhaust gas treatment technology being developed in recent years, its principle is in photocatalyst cleaner, high energy ultraviolet beam and air, the ozone that TiO2 reaction produces, stench organic gas is carried out collaborative decomposition oxidizing reaction by OH (hydroxyl radical free radical), macromole organic gas makes its chain structure rupture under action of ultraviolet radiation simultaneously, stench organic gas material is made to be converted into low molecular compound or the complete oxidation of odorless, generate water and CO2, whole decomposition oxidising process completed in 1 second, photocatalytic method only needs consuming electric power, stench organic gas is carried out Synergistic degradation reaction by high energy ultraviolet beam and air, the ozone of TiO2 reaction generation, OH (hydroxyl radical free radical) in tower, can be discharged in air after being effectively decomposed into CO2 and H2O, both qualified discharge, also eliminates the stench of gas.
The process of foul gas and VOC waste gas is had following several big advantage by UV photocatalytic method:
(1) efficiently except stench: can efficiently remove the principal pollutant such as volatile organic matter (VOC), inorganics, hydrogen sulfide, ammonia, thio-alcohol, and various stench taste, deodorization efficiency can reach more than 95%, and deodorising effect reaches odorant pollutant discharge primary standard (GB14554-93) of country's promulgation.
(2) without the need to adding any material: only need to arrange corresponding air draft pipeline and air draft power, make pending gas carry out oxygenolysis purification by this equipment, it is not necessary to add any material and participate in chemical reaction.
(3) strong adaptability: high density can be adapted to, atm number, the deodorization purifying treatment of different foul gas material, can every day 24 continuous throughout the twenty-four hour24, stable and reliable operation.
(4) running cost is low: this equipment, without the action of any machinery, without noise, it is not necessary to personal management and routine maintenance, only need to be made regular check on, and this equipment energy consumption is low, and the extremely low < 700pa of equipment windage, can save a large amount of air draft power consumption.
(5) applied widely: photochemical catalysis is applicable to that refinery, rubber plant, tannery, printing house, chemical plant, pharmaceutical factory, metal foundry, plastic reclaimed factory, spraying solvent etc. be organic and the deodorization purifying treatment of inorganics foul gas; Spray paint (painting) workshop, chemical industry, medicine, rubber, food, printing and dyeing, papermaking, the production process such as brewage in the toxic harmful exhaust gas that produces also can use photocatalysis treatment.
The core technology of UV photochemical catalysis is research and development and the application of the parts such as UV and photocatalyst, during operation, the UV photophore of device interior needs to act synergistically with built in light catalyst plate, waste gas through equipment body is carried out catalytic oxidation treatment, so needing a kind of Novel photocatalyst plate that can carry out well acting synergistically with UV photophore.
Summary of the invention
For the deficiencies in the prior art, it is desirable to provide the manufacture method of a kind of Novel photocatalyst plate, on Novel photocatalyst plate obtained by present method, the particle diameter of TiO2 particle can reach nano level, ensure that the thickness on TiO2 particle is at the bottom of aluminum plate foundation and stability, avoid in use because of the problem come off and cause exhaust purification efficiency to reduce of catalyzer TiO2 particle.
For solving the problem, the present invention provides following technical scheme:
A manufacture method for Novel photocatalyst plate, described Novel photocatalyst plate is applied on photochemical catalysis equipment, and concrete steps are as follows:
Step one: first choose the aluminium sheet that 10mm is thick, and be processed into that the positive hexagonal hole that surface is 3mm by the length of side forms in cellular penetrating aluminium sheet matrix;
Step 2: cut carrying out sanction in cellular penetrating aluminium sheet matrix, and making it be placed in, powder is molten penetrates in coating equipment, melt the TiO2 powder spray volume penetrating coating equipment at powder be 20~30g/min, projected area is under the processing condition that 10~18m2/h, spray efficiency are 75%, is melted by powder and penetrates coating equipment in cellular penetrating aluminum plate foundation external plating one layer of TiO2 film;
Step 3: after the aluminium sheet matrix plated film in step 2 completes, the aluminium sheet matrix completed by plated film cools, again according to size and the design variable of described photochemical catalysis equipment, plated film aluminium sheet matrix after cooling is carried out size adjusting, last plated film aluminium sheet matrix surrounding after the adjustment installs aluminum alloy frame, obtains Novel photocatalyst plate;
Finally the Novel photocatalyst plate completed in step 3 is placed in the reserved slot in photochemical catalysis equipment, can complete to install.
Further, the thick coating of described TiO2 film 35 μm.
Further, the density of the positive hexagonal hole of the aluminum plate foundation surface in described step one about 5.95 ten thousand/square metre.
Useful effect: the particle diameter of the TiO2 particle on Novel photocatalyst plate obtained by the present invention can reach nano level, ensure that the thickness on TiO2 particle is at the bottom of aluminum plate foundation and stability, avoid in use because of the problem come off and cause exhaust purification efficiency to reduce of catalyzer TiO2 particle.
Embodiment
The manufacture method of a kind of Novel photocatalyst plate provided by the invention, described Novel photocatalyst plate is applied on photochemical catalysis equipment, and concrete steps are as follows:
Step one: first choose the aluminium sheet that 10mm is thick, and be processed into that the positive hexagonal hole that surface is 3mm by the length of side forms in cellular penetrating aluminium sheet matrix, the density of its positive hexagonal hole in aluminum plate foundation surface about 5.95 ten thousand/square metre;
Step 2: cut carrying out sanction in cellular penetrating aluminium sheet matrix, and making it be placed in, powder is molten penetrates in coating equipment, melt the TiO2 powder spray volume penetrating coating equipment at powder be 20~30g/min, projected area is under the processing condition that 10~18m2/h, spray efficiency are 75%, is melted by powder and penetrates coating equipment at the TiO2 film in cellular external plating a layer thickness of penetrating aluminum plate foundation being 35 μm;
Step 3: after the aluminium sheet matrix plated film in step 2 completes, the aluminium sheet matrix completed by plated film cools, again according to size and the design variable of described photochemical catalysis equipment, plated film aluminium sheet matrix after cooling is carried out size adjusting, last plated film aluminium sheet matrix surrounding after the adjustment installs aluminum alloy frame, obtains Novel photocatalyst plate.
Finally the Novel photocatalyst plate completed in step 3 is placed in the reserved slot in photochemical catalysis equipment, can complete to install.
The particle diameter of the TiO2 particle on Novel photocatalyst plate obtained by the present invention can reach nano level, ensure that the thickness on TiO2 particle is at the bottom of aluminum plate foundation and stability, avoid in use because of the problem come off and cause exhaust purification efficiency to reduce of catalyzer TiO2 particle.
The above, it it is only the better embodiment of the present invention, not the technical scope of the present invention is made any restriction, therefore every any trickle amendment, equivalent variations and modification above embodiment done according to the technical spirit of the present invention, all still belong in the scope of technical scheme of the present invention.

Claims (3)

1. a manufacture method for Novel photocatalyst plate, described Novel photocatalyst plate is applied on photochemical catalysis equipment, it is characterised in that: concrete steps are as follows:
Step one: first choose the aluminium sheet that 10mm is thick, and be processed into that the positive hexagonal hole that surface is 3mm by the length of side forms in cellular penetrating aluminium sheet matrix;
Step 2: cut carrying out sanction in cellular penetrating aluminium sheet matrix, and making it be placed in, powder is molten penetrates in coating equipment, melt the TiO2 powder spray volume penetrating coating equipment at powder be 20~30g/min, projected area is under the processing condition that 10~18m2/h, spray efficiency are 75%, is melted by powder and penetrates coating equipment in cellular penetrating aluminum plate foundation external plating one layer of TiO2 film;
Step 3: after the aluminium sheet matrix plated film in step 2 completes, the aluminium sheet matrix completed by plated film cools, again according to size and the design variable of described photochemical catalysis equipment, plated film aluminium sheet matrix after cooling is carried out size adjusting, last plated film aluminium sheet matrix surrounding after the adjustment installs aluminum alloy frame, obtains Novel photocatalyst plate.
2. the manufacture method of a kind of Novel photocatalyst plate according to claim 1, it is characterised in that: the thick coating of described TiO2 film 35 μm.
3. the manufacture method of a kind of Novel photocatalyst plate according to claim 1, it is characterised in that: the density of the positive hexagonal hole of the aluminum plate foundation surface in described step one about 5.95 ten thousand/square metre.
CN201610045619.3A 2016-01-23 2016-01-23 Manufacturing method of novel photocatalytic plate Pending CN105671472A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610045619.3A CN105671472A (en) 2016-01-23 2016-01-23 Manufacturing method of novel photocatalytic plate

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Application Number Priority Date Filing Date Title
CN201610045619.3A CN105671472A (en) 2016-01-23 2016-01-23 Manufacturing method of novel photocatalytic plate

Publications (1)

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CN105671472A true CN105671472A (en) 2016-06-15

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1491753A (en) * 2002-10-23 2004-04-28 中国科学院化学研究所 Method for forming nano TiO2 light catalystic active agenbt coating on substrate
CN2745646Y (en) * 2004-06-16 2005-12-14 林立 Photocatalytic filtering net
CN105112865A (en) * 2015-08-17 2015-12-02 苏州月辉环保科技有限公司 Manufacturing method of novel photocatalyst board

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1491753A (en) * 2002-10-23 2004-04-28 中国科学院化学研究所 Method for forming nano TiO2 light catalystic active agenbt coating on substrate
CN2745646Y (en) * 2004-06-16 2005-12-14 林立 Photocatalytic filtering net
CN105112865A (en) * 2015-08-17 2015-12-02 苏州月辉环保科技有限公司 Manufacturing method of novel photocatalyst board

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Address after: 215143 Huayang village, Hope Town, Suzhou, Jiangsu, Xiangcheng District

Applicant after: SUZHOU YUEHUI ENVIRONMENTAL PROTECTION TECHNOLOGY Co.,Ltd.

Address before: Xiangcheng District Wong Tai town bridge in Suzhou city Jiangsu province 215000 long Kang Road No. 9

Applicant before: SUZHOU YUEHUI ENVIRONMENTAL PROTECTION TECHNOLOGY Co.,Ltd.

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Application publication date: 20160615