CN1330262A - 刀具 - Google Patents

刀具 Download PDF

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Publication number
CN1330262A
CN1330262A CN01121289A CN01121289A CN1330262A CN 1330262 A CN1330262 A CN 1330262A CN 01121289 A CN01121289 A CN 01121289A CN 01121289 A CN01121289 A CN 01121289A CN 1330262 A CN1330262 A CN 1330262A
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CN
China
Prior art keywords
blade
cutter
substrate
anchor clamps
deposition
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Pending
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CN01121289A
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English (en)
Inventor
D·格劳普纳
C·劳伯尔
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Leica Biosystems Nussloch GmbH
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Leica Microsystems Nussloch GmbH
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Publication of CN1330262A publication Critical patent/CN1330262A/zh
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N1/00Sampling; Preparing specimens for investigation
    • G01N1/02Devices for withdrawing samples
    • G01N1/04Devices for withdrawing samples in the solid state, e.g. by cutting
    • G01N1/06Devices for withdrawing samples in the solid state, e.g. by cutting providing a thin slice, e.g. microtome
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • C23C16/27Diamond only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4418Methods for making free-standing articles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Biochemistry (AREA)
  • Pathology (AREA)
  • Inorganic Chemistry (AREA)
  • Immunology (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

本发明涉及一种刀具,用于制备各种样品的切片和/或用于制成最高质量的表面,特别涉及借助带有刀片及其夹具的检镜用切片机或超薄切片机制备适于用电子显微镜研究的薄切片和半薄切片,其特征在于,该刀片是由人造金刚石制造的。

Description

刀具
本发明涉及一种刀具,用于制备各种样品的切片和/或用于制成最高质量的表面,特别涉及借助带有刀片及其夹具的检镜用切片机或超薄切片机制备适于用电子显微镜研究的薄切片和半薄切片。
多年来由实践中已知形成类别的刀具,并用于切割不同的材料。该形成类别的刀具主要用于切割生物样品和工业样品,即特别是借助检镜用切片机来制备薄片和半薄片,其中涉及各种不同器具,例如超薄片机、低温超薄片机、组织薄片机、组织低温薄片机或同类刀具。
已知的种类型刀具包括完全特殊的刀片,即由天然金刚石构成的刀片。为了得到最高的精密度,要选用具有最大纯度的单晶金刚石。由此要特别重视晶格的最佳切割方位和最精密的预切割。通常天然金刚石要在其主轴(择优取向)方向进行切割,因为这是其最大硬度的方向,由此得到特别锋利的、无缺口的和耐用的刀刃。
但在实践中已知的带有天然金刚石刀片的刀具仍有问题,即为得到所需的刀具的精密度,其加工是特别耗时和昂贵。这样其价格也高。
本发明的目的是提供和改进一种刀具,用于制备各种样品的切片和/或用于制成最高质的表面,特别定借助检镜用切片机或超薄切片机制备薄切片和半薄切片,以用简单的工业工具成本低的满足最高的质量要求或严格的质量标准,并且不需要材料的昂贵后处理。
前述目的是通过权利要求1的特征部分解决的。照此,该刀具的刀片是由人造金刚石制成的。
由本发明可知,为了得到所需精密度,不需要由天然金刚石经昂贵加工制出刀具的刀片。更确切地说,毫无困难可由人造金刚石来制造刀片,其在形状上和满足所需质量标准上已经与由天然金刚石制造的刀片相当,与采用天然金刚石相比,人造金刚石的后加工是不需要的。此外,本发明方法与天然金刚石无关。
具体地说,该刀片可直接通过碳的气相原子淀积来制造或成形,这时等离子体-CVD-方法特别适用。该方法被认为是已知的,所以不需进一步描述。原则上有可能直接在基片上沉积来自碳的气相、来自含碳气体混合物的气相或来自含碳化合物如烃(C2H34)的气相的原子/离子,或使人造金刚石在基片上生长,其中基片是作为刀片的芯体。这时基片承担稳定或延深的任务,该基片可由硅构成,它特别适于构造人造金刚石。
还可设想制造无芯体刀片,即在不使用基片的条件下通过人造金刚石合成生长来实现。
通过应用人造金刚石作为本发明要求的刀具的刃片,就是在刀片上有目的的沉积原子。它特别适于刀刃和切削角,以致刀片整个以人造金刚石制造来界定。例如可毫无困难地在35度-55度间调整切削角,而不需刀片的后处理。
还可界定表面特性,即通过有目的地沉积碳原子可调节刀片表面的亲水性和疏水性。
在另一有利的方式中,由人造金刚石制成的刀片可在夹具中扦接、夹紧、旋紧或在夹具中呈固定态。还可设想,刀片在夹具中安置成可转动的或可折叠的,并且可按切割设备的需要来设计。
最后,该刀片或夹具是可冷却或可加热的,其优选方式是刀片所需的操作温度通过夹具来传递。
要强调的是,前面的方案是用于本申请的阐述,但不限于前面的方案。

Claims (13)

1.一种刀具,用于制备各种样品的切片和/或用于制成最高质量的表面,特别涉及借助带有刀片及其夹具的检镜用切片机或超薄切片机制备适于用电子显微镜研究的薄切片和半薄切片,其特征在于,该刀片是由人造金刚石制成的。
2.权利要求1的刀具,其特征在于,该刀片直接通过碳气相中的原子的沉积,特别是按等离子体-CVD-方法制备的。
3.权利要求1或2的刀具,其特征在于,人造金刚石的原子在基片上沉积或在基片上生长,该基片作为刀片的芯体。
4.权利要求3的刀具,其特征在于,基片由硅构成。
5.权利要求1或2的刀具,其特征在于,该刀片是以无芯体制造的。
6.权利要求1-5的刀具,其特征在于,该刀片的表面,特别是刀刃是由有目的的原子沉积确定的。
7.权利要求6的刀具,其特征在于,通过有目的的原子沉积可调整整刀片表面的亲水性或疏水性。
8.权利要求1-6中之一的刀具,其特征在于,其切削角通过有目的的原子沉积来确定。
9.权利要求7的刀具,其特征在于切削角为35度-55度。
10.权利要求1-9中之一的刀具,其特征在于,该刀片可在夹具中扦接、夹紧、旋紧或在夹具中呈固定态。
11.权利要求1-10中之一的刀具,其特征在于,该刀片在夹具中是可转动的或可折叠的。
12.权利要求1-11中之一的刀具,其特征在于,该刀片或刀具是可冷却的或可加热的。
13.以形状、表面结构和壳面特性所规定的制造的金刚石作为刀具的刀片的应用,用于制备各种样品的切片和/或用于制成高质量的表面,特别是借助检镜用切片机或超薄切片机制备薄切片和半薄切片。
CN01121289A 2000-06-15 2001-06-13 刀具 Pending CN1330262A (zh)

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DE10028792A DE10028792A1 (de) 2000-06-15 2000-06-15 Messer
DE10028792.1 2000-06-15

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CN1330262A true CN1330262A (zh) 2002-01-09

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US (1) US20020014013A1 (zh)
JP (1) JP2002082024A (zh)
CN (1) CN1330262A (zh)
DE (1) DE10028792A1 (zh)
GB (1) GB2363390B (zh)

Cited By (1)

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CN112113811A (zh) * 2020-08-28 2020-12-22 中国科学院金属研究所 一种三维纳米x射线显微镜专用样品的制备方法

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US20050028389A1 (en) * 2001-06-12 2005-02-10 Wort Christopher John Howard Cvd diamond cutting insert
JP2004227842A (ja) 2003-01-21 2004-08-12 Canon Inc プローブ保持装置、試料の取得装置、試料加工装置、試料加工方法、および試料評価方法
KR101853720B1 (ko) * 2017-05-31 2018-05-02 한국기초과학지원연구원 연속 절단을 위한 울트라마이크로톰용 다이아몬드 나이프의 제조 방법
CN111185942B (zh) * 2020-02-25 2023-10-27 深圳市誉和光学精密刀具有限公司 切刀及其加工方法

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Publication number Priority date Publication date Assignee Title
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CN112113811B (zh) * 2020-08-28 2021-09-24 中国科学院金属研究所 一种三维纳米x射线显微镜专用样品的制备方法

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Publication number Publication date
US20020014013A1 (en) 2002-02-07
JP2002082024A (ja) 2002-03-22
GB0108067D0 (en) 2001-05-23
DE10028792A1 (de) 2001-12-20
GB2363390A (en) 2001-12-19
GB2363390B (en) 2003-01-22

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