CN1308651C - 对单一特征的光学度量 - Google Patents

对单一特征的光学度量 Download PDF

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Publication number
CN1308651C
CN1308651C CNB038141531A CN03814153A CN1308651C CN 1308651 C CN1308651 C CN 1308651C CN B038141531 A CNB038141531 A CN B038141531A CN 03814153 A CN03814153 A CN 03814153A CN 1308651 C CN1308651 C CN 1308651C
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CN
China
Prior art keywords
single feature
optical signature
distribution
diffracted
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB038141531A
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English (en)
Chinese (zh)
Other versions
CN1662789A (zh
Inventor
乔尔格·比肖夫
牛新辉
鲍君威
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Tel Sound Quality Technology
Tokyo Yili Kechuang Co In United States
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TEL Timbre Technologies Inc
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Publication of CN1662789A publication Critical patent/CN1662789A/zh
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Publication of CN1308651C publication Critical patent/CN1308651C/zh
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
CNB038141531A 2002-06-18 2003-06-09 对单一特征的光学度量 Expired - Fee Related CN1308651C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/175,207 US6775015B2 (en) 2002-06-18 2002-06-18 Optical metrology of single features
US10/175,207 2002-06-18

Publications (2)

Publication Number Publication Date
CN1662789A CN1662789A (zh) 2005-08-31
CN1308651C true CN1308651C (zh) 2007-04-04

Family

ID=29733802

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038141531A Expired - Fee Related CN1308651C (zh) 2002-06-18 2003-06-09 对单一特征的光学度量

Country Status (7)

Country Link
US (4) US6775015B2 (https=)
JP (1) JP2005530144A (https=)
KR (1) KR100796112B1 (https=)
CN (1) CN1308651C (https=)
AU (1) AU2003248651A1 (https=)
TW (1) TW587158B (https=)
WO (1) WO2003106916A2 (https=)

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US8564780B2 (en) 2003-01-16 2013-10-22 Jordan Valley Semiconductors Ltd. Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces
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EP1817322A2 (fr) * 2004-11-16 2007-08-15 Commissariat A L'energie Atomique Agents de silanisation a groupement saccharidique terminal et leurs utilisations, notamment pour la fonctionnalisation de supports solides
US7315384B2 (en) * 2005-05-10 2008-01-01 Asml Netherlands B.V. Inspection apparatus and method of inspection
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US7525672B1 (en) * 2005-12-16 2009-04-28 N&K Technology, Inc. Efficient characterization of symmetrically illuminated symmetric 2-D gratings
US7505147B1 (en) * 2006-05-26 2009-03-17 N&K Technology, Inc. Efficient calculation of grating matrix elements for 2-D diffraction
US7518740B2 (en) * 2006-07-10 2009-04-14 Tokyo Electron Limited Evaluating a profile model to characterize a structure to be examined using optical metrology
US20080013107A1 (en) * 2006-07-11 2008-01-17 Tokyo Electron Limited Generating a profile model to characterize a structure to be examined using optical metrology
US7515283B2 (en) * 2006-07-11 2009-04-07 Tokyo Electron, Ltd. Parallel profile determination in optical metrology
US7469192B2 (en) * 2006-07-11 2008-12-23 Tokyo Electron Ltd. Parallel profile determination for an optical metrology system
US20080129986A1 (en) * 2006-11-30 2008-06-05 Phillip Walsh Method and apparatus for optically measuring periodic structures using orthogonal azimuthal sample orientations
US20080135774A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Scatterometer, a lithographic apparatus and a focus analysis method
CN101359611B (zh) * 2007-07-30 2011-11-09 东京毅力科创株式会社 对光学计量系统的选定变量进行优化
CN101359612B (zh) * 2007-07-30 2012-07-04 东京毅力科创株式会社 晶片图案结构的检查装置及其计量数据管理方法
KR101274517B1 (ko) * 2007-11-13 2013-06-13 지고 코포레이션 편광 스캐닝을 이용한 간섭계
NL1036468A1 (nl) * 2008-02-27 2009-08-31 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
US8126694B2 (en) * 2008-05-02 2012-02-28 Nanometrics Incorporated Modeling conductive patterns using an effective model
JP4834706B2 (ja) * 2008-09-22 2011-12-14 株式会社東芝 構造検査方法
US8560270B2 (en) * 2008-12-09 2013-10-15 Tokyo Electron Limited Rational approximation and continued-fraction approximation approaches for computation efficiency of diffraction signals
US8441639B2 (en) 2009-09-03 2013-05-14 Kla-Tencor Corp. Metrology systems and methods
US8867041B2 (en) 2011-01-18 2014-10-21 Jordan Valley Semiconductor Ltd Optical vacuum ultra-violet wavelength nanoimprint metrology
US8565379B2 (en) 2011-03-14 2013-10-22 Jordan Valley Semiconductors Ltd. Combining X-ray and VUV analysis of thin film layers
TWI585880B (zh) * 2011-11-10 2017-06-01 應用材料股份有限公司 透過雷射繞射測量３ｄ半導體結構之溫度的設備及方法
EP3221897A1 (en) 2014-09-08 2017-09-27 The Research Foundation Of State University Of New York Metallic gratings and measurement methods thereof
US9482519B2 (en) 2014-12-04 2016-11-01 Globalfoundries Inc. Measuring semiconductor device features using stepwise optical metrology
US10216098B2 (en) 2014-12-10 2019-02-26 Nova Measuring Instruments Ltd. Test structure for use in metrology measurements of patterns
US9970863B2 (en) * 2015-02-22 2018-05-15 Kla-Tencor Corporation Optical metrology with reduced focus error sensitivity
US11054508B2 (en) 2017-01-05 2021-07-06 Innovusion Ireland Limited High resolution LiDAR using high frequency pulse firing
JP6918418B2 (ja) 2017-09-08 2021-08-11 株式会社ディスコ ウェーハの加工方法
CN113302515B (zh) 2019-01-10 2024-09-24 图达通智能美国有限公司 具有光束转向和广角信号检测的lidar系统和方法
US12013350B2 (en) 2021-05-05 2024-06-18 Onto Innovation Inc. Effective cell approximation model for logic structures
DE102021205328B3 (de) 2021-05-26 2022-09-29 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Abbildungsqualität eines optischen Systems bei Beleuchtung mit Beleuchtungslicht innerhalb einer zu vermessenden Pupille und Metrologiesystem dafür
US12461041B2 (en) 2022-04-20 2025-11-04 Kla Corporation Measurement of thick films and high aspect ratio structures

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Also Published As

Publication number Publication date
US20040212812A1 (en) 2004-10-28
US7379192B2 (en) 2008-05-27
TW587158B (en) 2004-05-11
WO2003106916A2 (en) 2003-12-24
TW200402529A (en) 2004-02-16
CN1662789A (zh) 2005-08-31
AU2003248651A1 (en) 2003-12-31
JP2005530144A (ja) 2005-10-06
US20060187468A1 (en) 2006-08-24
US6775015B2 (en) 2004-08-10
WO2003106916A3 (en) 2004-04-15
KR100796112B1 (ko) 2008-01-21
US20080259357A1 (en) 2008-10-23
US7030999B2 (en) 2006-04-18
AU2003248651A8 (en) 2003-12-31
KR20050010919A (ko) 2005-01-28
US7586623B2 (en) 2009-09-08
US20030232454A1 (en) 2003-12-18

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Owner name: TOKYO YILI KECHUANG USA INC.

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Effective date: 20140423

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Address after: California, USA

Patentee after: TEL sound quality technology

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Patentee before: Timbre Technologies, Inc.

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Patentee after: Tokyo Yili Kechuang company in the United States

Address before: California, USA

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Granted publication date: 20070404

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