CN1307461C - Method of making aspheric surface lens - Google Patents
Method of making aspheric surface lens Download PDFInfo
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- CN1307461C CN1307461C CNB031268633A CN03126863A CN1307461C CN 1307461 C CN1307461 C CN 1307461C CN B031268633 A CNB031268633 A CN B031268633A CN 03126863 A CN03126863 A CN 03126863A CN 1307461 C CN1307461 C CN 1307461C
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- spherical lens
- mask
- flat surface
- exposure
- manufacture method
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Abstract
The present invention relates to a method for manufacturing an aspheric lens with a grating, which comprises the following steps that an aspheric lens is provided and comprises an aspheric curve surface and an opposite flat surface; a multi-step grating is formed on the flat surface of the aspheric lens through a photoetching technique. The multi-step grating manufactured by the method can decreases lens aberration, formed images are clear, and the size and the weight of an optical system composed of the present invention are decreased.
Description
[technical field]
The present invention relates to a kind of manufacture method of optical element, relate in particular to a kind of manufacture method of non-spherical lens.
[background technology]
Non-spherical lens is a kind of optical element commonly used, is widely used in camera lenses such as video camera, digital camera.
Non-spherical lens is used for the optical system of camera lens, image quality in the time of can increasing substantially large aperture, reduce the corner distortion of wide-angle lens, and, a slice non-spherical lens can substitute several pieces spherical lens aberration for compensation, the optical design of camera lens be can significantly simplify, its height, area, volume and weight reduced.
The aspheric lens of general camera is made up of a plurality of non-spherical lens groups, and each lens combination generally is made up of two non-spherical lenses, and a space is arranged between two non-spherical lenses, by regulating the imaging aberration of this space this lens combination of scalable.
But the characteristic of above-mentioned non-spherical lens group all is that it is still undesirable that aberration is eliminated effect by the geometrical optics decision; In addition, above-mentioned aspheric lens height, area, volume and weight are still bigger.
So, provide that a kind of aberration is littler, more to help reducing the manufacture method of non-spherical lens of its optical system height of forming, area, volume and weight real in necessary.
[summary of the invention]
The object of the present invention is to provide and a kind ofly make that aberration is little, the method for the non-spherical lens that helps reducing its optical system height of forming, area, volume and weight.
For realizing the object of the invention, the invention provides a kind of manufacture method with non-spherical lens of grating, comprise the following steps: to provide a non-spherical lens, this non-spherical lens comprises a non-spherical surface and flat surface on the other side; Flat surface at described non-spherical lens forms a multistage ladder type grating by photoetching technique.
Compare with prior art, use the present invention's manufacture method that grating and lens are organically combined, can utilize the grating control phase, further reduce the aberration of non-spherical lens; The effect of the non-spherical lens of a grating belt is equivalent to a common non-spherical lens group, thereby can significantly reduce height, area, the volume and weight of the optical system that non-spherical lens forms.
[description of drawings]
Fig. 1 is the side schematic view of first embodiment, one non-spherical lens.
Fig. 2 is the side schematic view of mask in the photoetching for the first time.
Fig. 3 is the side schematic view that non-spherical lens applies photoresist layer.
Fig. 4 to Fig. 6 be that non-spherical lens exposes for the first time, development, etched step synoptic diagram.
Fig. 7 is the side schematic view of a depth unit of non-spherical lens etching.
Fig. 8 is the side schematic view of the mask of photoetching for the second time.
Fig. 9 is the side schematic view that applies photoresist layer at the non-spherical lens of Fig. 7.
Figure 10 to Figure 12 be that non-spherical lens exposes for the second time, development, etched step synoptic diagram.
Figure 13 is the side schematic view of three depth unit of non-spherical lens etching.
Figure 14 provides a mask synoptic diagram among second embodiment.
Figure 15 is that non-spherical lens applies the photoresist layer synoptic diagram among second embodiment.
Figure 16 is non-spherical lens exposure among second embodiment, development, etched step synoptic diagram to Figure 18.
Figure 19 is the side schematic view of non-spherical lens etching symmetry step.
[embodiment]
To Figure 13, the first embodiment of the present invention is described below in conjunction with Fig. 1.
See also Fig. 1, a non-spherical lens 10 at first is provided, this non-spherical lens 10 has two surfaces 101,102.Surface 101 is a non-spherical surface; Surface 102 is a flat surface.
For the surface 102 that makes non-spherical lens forms a flat surface, can make that surface 102 is smooth by methods such as mechanical buffing or chemical polishings.Its flatness is the smaller the better, attaches on it easily in order to the subsequent step photoresist layer.
See also Fig. 2, a mask 111 is provided, its resolution is 100lines/mm.This mask size is identical with surface 102.Because the binary optical elements position is worth mutually and is quantified as N grade, generally gets N=2n, for producing the grating with N position phase quantification gradation, mask is necessary for and can produces n binary amplitude type mask, the phase pattern of these mask 111 record bivariate distribution.
See also Fig. 3, on aspherical lens surface 102, form one deck photoresist layer 121.
See also Fig. 4, above-mentioned photoresist layer 121 is exposed.Put mask 111 on photoresist layer 121 surfaces and aim at exposure.Aiming at exposure can go up with UV-irradiation at exposure machine (Aligner) or stepper (Stepper); Also can be directly with electron beam writing machine (E-beam writer), photograph bit by bit exposes to the sun.
See also Fig. 5, again with the photoresist layer flush away of exposure area, remaining photoresistance figure can be used as down together etched cover curtain (Masking) and uses after drying.
See also Fig. 6, on the aspherical lens surface 102 of having developed, carry out photoetch or low-light and develop.At the dissolved position of photoresist layer 121, non-spherical lens flat surface 102 is down etched groove, etch depth is according to required etched ladder number decision, by computer control.
See also Fig. 7,, remove photoresist layer 121, obtain having only the surface 102 of a step grating with solution corrosion aspherical lens surface 102 such as potassium cyanide.
See also Fig. 8,, provide second mask 112 for manufacturing multistage ladder type grating surface.These mask 112 resolution are 200lines/mm.
See also Fig. 9 to shown in Figure 12, on the non-spherical surface 102 that the 7th figure makes, repeat steps such as above coating photoresist layer 122, exposure, development, etching and removal residue photoresist layer 122 again, wherein etch depth is half of etch depth for the first time, can make non-spherical lens, as shown in figure 13 with a plurality of even step grating surfaces 102.
The circulation above-mentioned steps can be carried out repeatedly photoetching, and for the first time mask resolution is R, and mask resolution is 2R next time, and etch depth is half of a preceding etch depth each time.It is inferior to repeat photoetching n (n＞0, natural number), and wherein the resolution of each mask that uses is 2
n *R, the grating that can correspondingly obtain is 2
N+1The rank grating.
Second embodiment of the invention mainly comprises following step:
See also Fig. 1 to Fig. 7,, make non-spherical lens with single order grating surface 102 ' with the first embodiment step.
Then as shown in figure 14, provide a mask 113 ', its resolution is three times of mask 111 '.
Arrive shown in Figure 180 as Figure 15, go up steps such as repetitive coatings photoresist layer 123 ', exposure, development, etching and removal residue photoresist layer 123 ' on the surface 102 ' of the non-spherical lens of Fig. 7 gained, wherein etch depth is half of etch depth for the first time, can make non-spherical lens, see also Figure 19 with a plurality of symmetrical step grating surfaces 102 '.
Claims (6)
1. the manufacture method of a non-spherical lens comprises the following steps:
One non-spherical lens is provided, and this non-spherical lens comprises a non-spherical surface and flat surface on the other side;
Form one deck photoresist layer at above-mentioned flat surface;
One mask is arranged at this photoresist layer top, and the resolution of this mask is R;
Through overexposure, etching forms one 1 rank gratings on the flat surface of non-spherical lens;
It is inferior to repeat to manufacture mask, exposure, etching n (n＞0, natural number), and wherein each mask resolution of using is 2
n* R, the corresponding grating that obtains is 2
N+1The rank grating.
2. the manufacture method of non-spherical lens as claimed in claim 1 is characterized in that exposure is to expose with ultraviolet photoetching or electron beam writing machine with exposure machine or stepper.
3. the manufacture method of non-spherical lens as claimed in claim 1 is characterized in that etching is with photoetch or low-light developing technique.
4. the manufacture method with non-spherical lens of phase grating comprises the following steps:
One non-spherical lens is provided, and this non-spherical lens comprises a non-spherical surface and flat surface on the other side;
Form one deck photoresist layer at above-mentioned flat surface;
One mask is arranged at this photoresist layer top, and the resolution of this mask is R;
Through overexposure, etching forms one 1 rank gratings on the flat surface of non-spherical lens;
Repeat to manufacture mask, exposure, etching, the resolution of use therein mask is 3R, and etch depth is half of a preceding etch depth, and the corresponding grating that obtains is 4 rank symmetrical expression gratings.
5. the manufacture method of non-spherical lens as claimed in claim 4 is characterized in that exposure is to expose with ultraviolet photoetching or electron beam writing machine with exposure machine or stepper.
6. the manufacture method of non-spherical lens as claimed in claim 4 is characterized in that described etching is with photoetch or low-light developing technique.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031268633A CN1307461C (en) | 2003-06-10 | 2003-06-10 | Method of making aspheric surface lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031268633A CN1307461C (en) | 2003-06-10 | 2003-06-10 | Method of making aspheric surface lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1567017A CN1567017A (en) | 2005-01-19 |
| CN1307461C true CN1307461C (en) | 2007-03-28 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031268633A Expired - Fee Related CN1307461C (en) | 2003-06-10 | 2003-06-10 | Method of making aspheric surface lens |
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| Country | Link |
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| CN (1) | CN1307461C (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112099114B (en) * | 2020-09-29 | 2021-12-21 | 烟台睿创微纳技术股份有限公司 | Composite lens, manufacturing method thereof and infrared detector |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5044706A (en) * | 1990-02-06 | 1991-09-03 | Hughes Aircraft Company | Optical element employing aspherical and binary grating optical surfaces |
| US5078513A (en) * | 1990-11-08 | 1992-01-07 | The University Of Rochester | Achromatic waveguide lenses |
| US5208701A (en) * | 1991-12-24 | 1993-05-04 | Xerox Corporation | Wobble correction lens with binary diffractive optic surface and refractive cylindrical surface |
| US5638212A (en) * | 1993-12-29 | 1997-06-10 | Eastman Kodak Company | Method of manufacturing a diffractive surface profile |
| CN1402047A (en) * | 2002-07-13 | 2003-03-12 | 华中科技大学 | Process for mfg. multi-phase diffraction optic element |
-
2003
- 2003-06-10 CN CNB031268633A patent/CN1307461C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5044706A (en) * | 1990-02-06 | 1991-09-03 | Hughes Aircraft Company | Optical element employing aspherical and binary grating optical surfaces |
| US5078513A (en) * | 1990-11-08 | 1992-01-07 | The University Of Rochester | Achromatic waveguide lenses |
| US5208701A (en) * | 1991-12-24 | 1993-05-04 | Xerox Corporation | Wobble correction lens with binary diffractive optic surface and refractive cylindrical surface |
| US5638212A (en) * | 1993-12-29 | 1997-06-10 | Eastman Kodak Company | Method of manufacturing a diffractive surface profile |
| CN1402047A (en) * | 2002-07-13 | 2003-03-12 | 华中科技大学 | Process for mfg. multi-phase diffraction optic element |
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| Publication number | Publication date |
|---|---|
| CN1567017A (en) | 2005-01-19 |
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