CN1297854C - Reticle transfering suport and reticle transfering method - Google Patents
Reticle transfering suport and reticle transfering method Download PDFInfo
- Publication number
- CN1297854C CN1297854C CNB031101666A CN03110166A CN1297854C CN 1297854 C CN1297854 C CN 1297854C CN B031101666 A CNB031101666 A CN B031101666A CN 03110166 A CN03110166 A CN 03110166A CN 1297854 C CN1297854 C CN 1297854C
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- China
- Prior art keywords
- photomask
- supporting seat
- reticle
- box
- utilize
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 17
- 238000012546 transfer Methods 0.000 claims description 14
- 238000013459 approach Methods 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 9
- 239000000463 material Substances 0.000 abstract description 7
- 229920002457 flexible plastic Polymers 0.000 abstract 1
- 238000013461 design Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000001259 photo etching Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000012940 design transfer Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 101000873785 Homo sapiens mRNA-decapping enzyme 1A Proteins 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 102100035856 mRNA-decapping enzyme 1A Human genes 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000007779 soft material Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Images
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a reticle transferring support which comprises a support base used for containing a reticle, a plurality of supporting points used for supporting the reticle, and a plurality of fixing racks used for fixing the reticle, wherein each supporting point is an ellipsoidal structure composed of flexible plastic materials, and the supporting point can adjust a position so as to avoid scratch caused on the back surface of the reticle; the inner side of each fixing rack is an oblique plane, which can automatically fix the position of the reticle when the reticle is loaded.
Description
Technical field
The present invention relates to a kind of photomask and transmit supporting seat (reticle transferring support), particularly relate to a kind of photomask of photomask wearing and tearing of avoiding and transmit supporting seat and method.
Background technology
Photoetching making technology (photolithography) can be described as in the whole semiconductor fabrication process, quite one of Ju Zuqingchong step.For example with the structurally associated of MOS element,, all decide via this step of photoetching making technology as the zone of the pattern (pattern) and the admixture (dopant) of each layer film.The basic step of photoetching making technology, be to be covered with one deck photosensitive material (photo-sensitive material) prior to semiconductor wafer (wafer) surface, after then utilizing a directional light to pass a photomask based on glass (reticle), be radiated on the photosensitive material.Owing to have layout (layout) pattern of a matrix circuit on the photomask, so photosensitive material is just carried out the photoresponse of selectivity (selective), with the design transfer on the photomask (transfer) to semiconductor wafer.
Generally speaking, photomask includes a smooth and transparent glass or a quartz and is used as substrate, and the chromium film of a layer thickness about 1000 covers on the surface of photomask, utilize an etching process that this chromium film is carried out etching when making photomask, make this photomask surface form one and include layout (layout) pattern in light-permeable district and light tight district, so that can utilize photoetching making technology to carry out design transfer afterwards.Therefore in order to protect layout patterns, be that photomask is placed in the photomask box at present mostly, utilize mechanical arm (robot) that the photomask box is sent to exposure machine boards such as (exposure apparatus), to avoid the generation of photomask surface scratch.
Fig. 1 and Fig. 2 are the top view and the cut-open view of the photomask supporting seat 10 of an existing photomask box.As shown in Figure 1, photomask supporting seat 10 includes a supporting base 12, has the strong point 14 of four rectangles on it, in order to support a photomask 16.For meeting SEMI (semiconductor equipment﹠amp; Material international) standard, photomask supporting seat 10 left and right sides must keep the spacing (for example SMIF pod) of 0.95mm, be beneficial to operations such as being written into of photomask/carry, yet this spacing but makes operating personnel utilize photomask folder to insert the position that is difficult for stationary photomask 16 behind the photomask 16 with manual mode, when especially too big as if the placement location deviation, the action of post-exposure board with mechanical arm vacuum suction photomask can be influenced, so operating personnel must adjust photomask 16 to the appropriate location.
Yet utilize manpower to adjust photomask 16 positions, may cause photomask 16 position deviations because of artificial careless mistake, and being in course of adjustment also can make the photomask back side produce scratch because of the friction of 14 of photomask 16 back sides and contact points and produce problem such as image planes inclination when exposure, has a strong impact on the photomask normal operation.As shown in Figure 2, the strong point 14 of existing photomask supporting seat 10 is a rectangle structure, the contact area of itself and photomask 16 is bigger, not only when adjusting the photomask position, cause photomask to pollute easily, and may cause the damage of photomask edge bar code district (not shown) and vacuum suction district (not shown).
Please refer to Fig. 3, Fig. 3 inserts a photomask for existing method the process flow diagram of the photomask transfer approach in the one photomask box.As shown in Figure 3, existing photomask transfer approach includes the following step:
Step 30: beginning;
Step 34: utilize a photomask to drive entire device the photomask box is opened;
Step 34: utilize a photomask folder photomask to be positioned on the supporting seat in the photomask box with manual type;
Step 36: adjust the photomask position;
Step 38: utilize photomask to drive entire device the photomask box is closed;
Step 40: finish.
In existing photomask transfer approach, at first must utilize a photomask to drive entire device, AsystALU opener for example, the photomask box is opened, utilize photomask folder with manual type photomask to be put on the supporting seat of photomask box then and adjust photomask, utilize photomask to drive entire device at last again the photomask box is closed to the appropriate location.Yet as previously mentioned, in the conventional method since the photomask box in supporting seat in order to meet the SEMI standard, the supporting seat left and right sides need keep the spacing of 0.95mm, and the strong point 14 is a rectangle, excessive with the photomask contact area, very easily cause scratch, photomask position deviation or the photomask of photomask bottom to tilt to cause the post-exposure board when being written into photomask, to have problems.
Summary of the invention
Fundamental purpose of the present invention is to provide a kind of photomask to transmit supporting seat, and the friction because of the photomask back side and supporting seat causes the photomask surface to produce scratch in the above-mentioned prior art to solve, and reaches problems such as photomask position deviation.
The object of the present invention is achieved like this, and a kind of photomask transfer approach promptly is provided, and includes: a photomask transmission supporting seat and a photomask box are positioned over being written on the platform (load port) of a photomask storage machine station (reticlestocker); Wherein this photomask transmission supporting seat comprises a plurality of fixed mounts, and the inboard of this each fixed mount is a dip plane, and this each fixed mount all is arranged at the marginal portion of this supporting base, in order to fix the lateral location of this photomask; Utilize photomask folder that one photomask is inserted this photomask and transmit on the supporting seat in supporting seat, limits, can fix automatically rapidly so that insert the position of this photomask by side, the inboard of these a plurality of fixed mounts with photomask; Utilize a mechanical arm that is arranged on this photomask storage machine station that this photomask is carried out this photomask transmission supporting seat; And utilize this mechanical arm that this photomask is sent in this photomask box.
Furtherly, a kind of photomask of the present invention transmits supporting seat, automatically the position of stationary photomask, avoid the photomask back side to produce scratch because of friction, also can cooperate the mechanical arm of a photomask storage machine station automatically photomask to be written in the photomask box afterwards, be written into issuable artificial carelessness of photomask and loss with manual type to get rid of in the prior art.This photomask transmits supporting seat and includes a supporting base, is used for holding a photomask, and a plurality of strong points in order to supporting this photomask, and a plurality of fixed mount, are used for fixing the position of this photomask.Wherein the inboard of this each fixed mount is the design of a clinoplane or an inclination arc surface, can effectively fix the position of this photomask on supporting seat.
Because transmitting the fixed mount inboard that is provided with on the supporting seat, photomask of the present invention has dip plane design, therefore the photomask position promptly is fixed automatically when utilizing the photomask folder to insert photomask in the supporting seat, can omit the step of adjusting the photomask position in the prior art, and the scratch of avoiding the photomask back side to be produced because of friction.In addition, photomask of the present invention transmits supporting seat and can further utilize the mechanical arm of a photomask storage machine station exactly photomask to be written in the photomask box, therefore can solve in the prior art and be written into the photomask position deviation problem that photomask is caused with manual type.
Description of drawings
Fig. 1 transmits the top view of supporting seat for an existing photomask;
Fig. 2 transmits the cut-open view of supporting seat for an existing photomask;
Fig. 3 is the process flow diagram of an existing photomask transfer approach;
Fig. 4 transmits the top view of supporting seat for the present invention's one photomask;
Fig. 5 transmits the cut-open view of supporting seat for the present invention's one photomask;
Fig. 6 is the process flow diagram of the present invention's one photomask transfer approach.
Embodiment
Please refer to Fig. 4 and Fig. 5.Fig. 4 and Fig. 5 transmit the top view and the cut-open view of supporting seat 50 for the photomask of the present invention's one photomask box.As Fig. 4 and shown in Figure 5, photomask of the present invention transmits supporting seat 50 and includes a supporting base 52, in order to holding a photomask 58, and a plurality of strong points 54, in order to supporting photomask 58, and a plurality of fixed mount 56, in order to the position of stationary photomask 58.It should be noted that, the set strong point 54 has an oval-shaped structure on the photomask transmission supporting seat 50 of the present invention, therefore less with the contact area of photomask, and appropriateness adjustment can be done in the position of the strong point 54, make the position of the strong point 54 avoid bar code district (not shown) and vacuum suction district (not shown) on the photomask 58, and then avoid the friction between the above-mentioned zone and the strong point to cause photomask to damage.The strong point 54 by soft material (as plastic cement) formation, also can avoid injuring photomask 58 back sides.In addition because photomask of the present invention transmits the design that the inboard of the fixed mount 56 of supporting seat 50 is shaped as a dip plane or an inclination arc surface; therefore photomask can closely contact with fixed mount 56 and be fixed automatically when photomask 58 is placed on the supporting base 52, can not produce the problem of photomask position deviation.
Please refer to Fig. 6, Fig. 6 is the process flow diagram of photomask transfer approach of the present invention.As shown in Figure 6, photomask transfer approach of the present invention includes the following step:
Step 100: beginning;
Step 102: photomask is transmitted the both sides on the platform (load port) of being written into that supporting seat and photomask box are positioned over the photomask storage machine station;
Step 104: utilize the photomask folder that photomask is placed on photomask and transmit in the supporting seat;
Step 106: open the photomask box;
Step 108: utilize the mechanical arm of photomask storage machine station that photomask is taken out;
Step 110: utilize mechanical arm that photomask is written in the photomask box;
Step 112: close the photomask box;
Step 114: finish.
Hence one can see that, and photomask transfer approach of the present invention utilizes photomask transmission supporting seat of the present invention to transmit interface as photomask, and cooperates a photomask storage machine station to finish the action that transmits photomask.Photomask transmits flow process as the aforementioned, at first photomask is transmitted supporting seat and photomask box and is positioned over being written on the platform (load port) of photomask storage machine station side by side.Wherein photomask storage machine station itself is as the usefulness that stores photomask, but because the mechanical arm of installing on the board has the function that transmits photomask, so in photomask transfer approach of the present invention, can be used as the purposes that carrying transmits photomask.Then utilizing the photomask folder with manual type photomask to be positioned over photomask of the present invention transmits in the supporting seat, be provided with the fixed mount automatically position of stationary photomask because photomask transmits supporting seat this moment, and the strong point also is the softer ellipsoidal structure of material, can prevent that photomask is impaired.Open the photomask box subsequently, photomask is taken out in photomask transmits supporting seat, again photomask is written in the photomask box and closes the photomask box with mechanical arm.
Because the transfer approach of photomask is written into photomask in the photomask box with manual type for directly utilizing the photomask folder in the prior art, operating personnel must be adjusted to the appropriate location with photomask when being written into photomask, this kind load mode not only accurately easily causes the photomask deviation inadequately, and photomask is impaired because of rubbing in adjusting the process of position most probably, and the situation that crashes takes place when causing the post-exposure board to transmit photomask.
Compared with prior art, the present invention utilizes a photomask to transmit supporting seat as transmitting interface, when wherein the design of the dip plane of fixed mount uses operating personnel in photomask being inserted photomask transmission supporting seat with the oval soft strong point, the photomask position can be fixing automatically rapidly, then cooperate the use of photomask storage machine station, utilize mechanical arm accurately photomask to be written into appropriate location in the photomask box, can avoid causing because of artificial adjustment photomask position in the existing method problem of photomask back side scratch.
The above only is preferred embodiment of the present invention, and all equalizations of doing according to claims of the present invention change and modify, and all should belong to the covering scope of patent of the present invention.
Claims (4)
1. photomask transfer approach includes:
An one photomask transmission supporting seat and a photomask box are positioned over being written on the platform (load port) of a photomask storage machine station (reticlestocker); Wherein this photomask transmission supporting seat comprises a plurality of fixed mounts, and the inboard of this each fixed mount is a dip plane, and this each fixed mount all is arranged at the marginal portion of this supporting base, in order to fix the lateral location of this photomask;
Utilize photomask folder that one photomask is inserted this photomask and transmit on the supporting seat in supporting seat, limits, can fix automatically rapidly so that insert the position of this photomask by side, the inboard of these a plurality of fixed mounts with photomask;
Utilize a mechanical arm that is arranged on this photomask storage machine station that this photomask is carried out this photomask transmission supporting seat; And
Utilize this mechanical arm that this photomask is sent in this photomask box.
2. the method for claim 1, wherein this photomask transmits supporting seat and includes:
One supporting base is in order to hold this photomask;
A plurality of strong points are arranged on this supporting base in order to support this photomask.
3. the method for claim 1, wherein this method includes in addition and utilizes this photomask storage machine station to open and close the step of this photomask box.
4. the method for claim 1, wherein this method include in addition utilize this mechanical arm with this photomask by taking out in this photomask box, and this photomask is sent back the step that this photomask transmits supporting seat.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031101666A CN1297854C (en) | 2003-04-15 | 2003-04-15 | Reticle transfering suport and reticle transfering method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB031101666A CN1297854C (en) | 2003-04-15 | 2003-04-15 | Reticle transfering suport and reticle transfering method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1538239A CN1538239A (en) | 2004-10-20 |
| CN1297854C true CN1297854C (en) | 2007-01-31 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB031101666A Expired - Fee Related CN1297854C (en) | 2003-04-15 | 2003-04-15 | Reticle transfering suport and reticle transfering method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1297854C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI522292B (en) * | 2007-11-15 | 2016-02-21 | 尼康股份有限公司 | A mask case, a conveyance device, an exposure apparatus, a mask transfer method, and a device manufacturing method |
| CN101625528B (en) * | 2008-07-08 | 2010-09-29 | 中芯国际集成电路制造(上海)有限公司 | Mask clamp |
| CN102445124B (en) * | 2011-08-29 | 2013-10-02 | 上海华力微电子有限公司 | Tool and method for measuring mask plate protecting film |
| US20220102177A1 (en) * | 2020-09-30 | 2022-03-31 | Gudeng Precision Industrial Co., Ltd. | Reticle pod with antistatic capability |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4248508A (en) * | 1979-08-03 | 1981-02-03 | The Perkin-Elmer Corporation | Projection mask storage and carrier system |
| JPS59124721A (en) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Plate supporting means |
| US5239863A (en) * | 1990-05-16 | 1993-08-31 | Matsushita Electric Industrial Co., Ltd. | Cantilever stylus for use in an atomic force microscope and method of making same |
| WO1999049366A1 (en) * | 1998-03-20 | 1999-09-30 | Nikon Corporation | Photomask and projection exposure system |
| US6251543B1 (en) * | 1999-06-14 | 2001-06-26 | Agere Systems Guardian Corp. | Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein |
-
2003
- 2003-04-15 CN CNB031101666A patent/CN1297854C/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4248508A (en) * | 1979-08-03 | 1981-02-03 | The Perkin-Elmer Corporation | Projection mask storage and carrier system |
| JPS59124721A (en) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Plate supporting means |
| US5239863A (en) * | 1990-05-16 | 1993-08-31 | Matsushita Electric Industrial Co., Ltd. | Cantilever stylus for use in an atomic force microscope and method of making same |
| WO1999049366A1 (en) * | 1998-03-20 | 1999-09-30 | Nikon Corporation | Photomask and projection exposure system |
| US6251543B1 (en) * | 1999-06-14 | 2001-06-26 | Agere Systems Guardian Corp. | Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1538239A (en) | 2004-10-20 |
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Granted publication date: 20070131 Termination date: 20100415 |