TW582060B - A reticle transferring support and transferring method thereof - Google Patents

Abstract

A reticle transferring support is provided. The reticle transferring support includes a supporting base for containing a reticle, a plurality of braces for supporting the reticle, and a plurality of holders for fixing the position of the reticle. The braces are spheroids composed of soft plastic, and the position of the braces is adjustable so that the reticle will not be damaged. The holders have an inclined plane so that the position of the reticle will be fixed automatically.

Description

582060 V. Description of the invention (1) Technical field to which the invention belongs The present invention provides a reticle transferring support, especially a reticle transferring support which can avoid abrasion of the reticle. '' Prior technology Photolithography can be said to be one of the most important steps in the entire semiconductor process. For example, the structure related to the MOS device, such as the pattern of each layer of film and the dopant area, are determined through the lithography process. The basic step of the lithography process is to cover the surface of the semiconductor wafer with a layer of phot-sensitive material, and then use a parallel light to pass through a glass-based reticle. 'Irradiate on photosensitive material. Since the photomask has a layout pattern of the base circuit, the photosensitive material can perform a selective photoreaction to transfer the pattern on the photomask to the semiconductor wafer. Generally speaking, 'the photomask includes a flat and transparent glass or quartz as a substrate, and a chrome film with a thickness of about 1000 A covering the surface of the photomask.' The chromium film is etched to 'form the surface of the photomask to include a light-transmissive region and an opaque region.

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V. Description of the invention (2) lay out the pattern so that the pattern transfer can be performed later using the lithography process. Therefore, in order to protect the layout pattern, most of the masks are currently placed in a mask box, and the robot box is used to transfer the mask box to a machine such as an exposure apparatus to avoid scratches on the surface of the mask. produce. Figures 1 and 2 are top and sectional views of a mask support base 10 of a conventional mask box. As shown in FIG. 1, the photomask support base 10 includes a support base 12 having four rectangular support points 14 for supporting a photomask 16. In order to comply with the sEMI (semiconductor equipment & material international) standard, a space of 0.95 mm (for example, SMIF pod) must be reserved on the left and right sides of the mask support base 10 to facilitate loading / unloading operations of the mask. However, this distance makes it difficult for the operator to fix the position of the photomask 16 after manually placing the photomask 16 by using the photomask clamp j. Especially if the placement position is too large, it will affect the subsequent exposure machine to use a robotic arm to absorb light. The operation of the cover, so the operator must cover 16 to the appropriate position. ^ ^ And recruit = ΐ L human stomach adjusts the 16 position of the mask, but the position of the mask 16 may be misaligned because of artificial sparseness, and it will also be affected by light during adjustment}

The friction between the back surface and the contact points 14 causes scratches on the back surface of the photomask, and problems such as tilting the image surface during light exposure, which seriously affect the normal operation of the photomask. As shown in FIG. 2, the supporting point 14 of the conventional photomask support base 10 is a rectangular structure, and the contact area with the photomask 16 is relatively large.

Description of the invention on page 6 (3) ί H creates light / pollution, and I can cause damage to the single-edged bar code area (not shown) and the attached area (not shown). A conventional method is to place a photomask into a photomask. The flow chart of the transmission method. As shown in FIG. 3, the conventional photodiscrimination method includes the following steps: Step 30: Start; Step 32: Use A photomask opener opens the photomask box. Inside, a photomask is used to manually place the photomask on the support in the photomask box; Step 36 Step 38 Step 40 Adjust the position of the photomask; Use The photomask opening device closes the photomask box. In the conventional photomask transfer method, you must first use a photomask ^^ such as Asyst ALU pener, open the photomask box, and then use the adjustment type to place the photomask The support seat inside the mask box is closed and closed. However, as mentioned earlier, the pedestal will be especially good | The bracket is in accordance with the SEMI standard ^ method because of the distance between the branches in the mask box, and the support points 丨 4 For the left and right sides of the support seat, 0.95 mm must be reserved. It is easy to cause the bottom of the mask to reach the p-square shape. , The contact area with the mask is too large, which will cause problems when the subsequent exposure machine is planted, the position of the mask is misaligned, or the mask is tilted to make the mask. 582060 V. Description of the invention ? Friction on the support, when the mask is loaded, it will be loaded with a U support position. The arc surface is set. The patent application of the present invention can automatically fix the mark of the mask, and can be matched with a light later. In the mask box, the artificial artifacts used to accommodate and fix the photomask within a plurality of fixing frames may support the photomask of the base. Among these designs, the position is exposed in the enclosure to avoid the photomask storage machine to eliminate It ’s a mistake. The light is a light mask, a complex fixed frame, and a kind of light mask is used to convey the supporting surface. The friction arm is used to support the artificial square pedestal support points. The light mask is an inclined back cover. In the machine technology, the cover transfers several supports to fix the side as an inclined plane or fix the photomask on the right of the support base k. The inner cover of the cover transfer support swing invented by the _ inside ί:; ΓΓΓ, so Using photomask Clip the reticle to adjust the reticle: the movement of the reticle is fixed, which can be omitted in the conventional technology-reticle storage machine = 2 hood transfer support base can be further used-so it can solve the problem In the photomask box, the light caused by manually loading the photomask in the η technology page 8 582060 5. Description of the invention (5) The problem of the position deviation of the photomask. For implementation, please refer to FIG. 4 and FIG. It is a top view and a cross-sectional view of a mask transfer support base 50 of a mask box according to the present invention. As shown in FIGS. 4 and 5 'the mask transfer support base 50 according to the present invention includes a support base 52 for receiving a The photomask 58, a plurality of support points 54, are used for supporting the photomask 58 'and a plurality of fixing frames 56 for fixing the positions of the photomask 56. It is worth noting that the support point 54 provided on the photomask transmission support base 50 of the present invention has an oval structure, so the contact area with the photomask is small, and the position of the support point 54 can be adjusted appropriately. , So that the positions of the support points 54 are kept away from the barcode area (not shown) and the vacuum suction area (not shown) on the photomask 5 8 ', thereby preventing the photomask from being damaged due to the friction between the above area and the support points. The support points 5 and 4 are made of a softer material (such as plastic), which can also prevent the back of the mask 58 from being damaged. In addition, since the shape of the frame 56 of the photomask transmission support base 50 of the present invention is an inclined surface or an inclined circular arc surface = juice, the photomask 58 will be placed when it is placed on the support base 52. : 12 on 6 is fixed in close contact and is automatically fixed. The position of the photomask will not be generated. Please refer to FIG. 6, which is a drawing of the present invention. As shown in Figure 6, the photomask transmission method of the present invention is as follows: Step 1 of the early search method includes the following steps: $ 9, page 582060 5. Description of the invention (6) Step 1 0 0 ·· Start; Machine step 1〇 2: Place the reticle transfer support and reticle box on both sides of the load port on the stage; Storing step 1 04: Use the reticle clip to place the reticle in the step 1 0 6 ·· Open the photomask box; in the special support base; f Step 1 08 Use the robot to store the photomask with the photomask. Step 1 1 ··· Use the mechanical arm to load the photomask and remove it. Step 1 1 2: Close the photomask. Box; + μ T 'Step 1 1 4 ·· End. It can be known from this that the mask transfer t 4 ^ | mask transfer support base of the present invention is used as a mask transfer interface, and 2 = 2 the optical stage of the present invention to complete the action of transferring the mask. As on the eve, a photomask storage machine first combines the photomask transfer support with the photomask box; placing two = the first is for the storage of photomasks, but because the machine / storage machine itself is used for photomask delivery Function, so in this hair; Robot arm has the purpose of transporting and transmitting photomask. Then, using the sending method, the mask J can be placed on the mask of the present invention manually, and the mask J is set to swing = = when the mask is transferred to J; the mask box is used to mechanically arm the mask :: 2 Clever. Followed by 1 'and then take the mask out of the mask box towel holder. Page 582060 Five-year-old, uninventive, description of the invention (7) The method of transferring the mask is to use the mask clip and mask to load the mask directly. In the box, the operator adjusts the hood to the appropriate position when loading. 'This transmission method is not. When: = double loss' ... issued when the subsequent exposure machine transmits the reticle = in the conventional technology. The present invention utilizes-reticle transmission. The support base is used as a transmission; 丨 the surface of which 因 π π & the sloped surface of the fixed frame and the elliptical flexible support mask position can be quickly and automatically. Cooperate with the setting of the mask storage machine ':: The mechanical arm accurately loads the mask into the proper position in the mask box. In the method, the dome surface of the mask is scratched due to manual adjustment of the mask position. The problem. The above description is only a preferred embodiment of the present invention, and any equivalent changes and modifications made in applying for a patent in accordance with the present invention shall fall within the scope of the patent of the present invention.

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Brief description of the drawings: Figure 1 is a conventional mask; Figure 2 is a conventional mask; Figure 3 is a conventional mask; Figure 4 is a light of the invention; Figure 5 is a light of the invention; Figure 6 is a light of the invention; Symbols of the drawings illustrate the top view of the transfer tower. Sectional view of the teleportation pedestal. Flow chart of transmission method. Top view of hood transfer support. Sectional view of the hood transfer support. Flow chart of hood transfer method. 10 14 30 ～ 40 50 54 58 Photomask support base Support points Conventional photomask transfer steps Photomask support base Support point Photomask 12 16 52 56 Support base Photomask Support base Fixture

1 0 0 ~ 1 1 4 Mask transfer step of the present invention

$ 12 pages

Claims (1)

582060 6. Scope of patent application 1. A reticle transferring support (reticle transferring support), including: a supporting base for accommodating a reticle; a plurality of support points (brace) provided at The support base is used to support the photomask; and a plurality of holders are provided on the edge portion of the support base to fix the position of the photomask; / wherein the holders are used to make the After the photomask is loaded into the support base, it can be in contact with some end points on the inner side of the fixing frames to generate a horizontal displacement by the photomask. The reticle transfer support of item 1, of which 2 · As in the first scope of the patent application, the solid ‘inside is an inclined plane 4 · Incline the circular arc surface as in the reticle transfer support of W item 1. Among them 4. The supporting point is the contact area of the ellipsoidal structure as described in the patent application. Item 1 of the reticle transfer support base, where these are used to reduce the number of support points and the reticle. Photomask transfer support for item 1 of which 582060 6. Scope of Patent Application • If the mask transfer support base of item 丨 of the patent application range, where i Ϊ 5 ΐ is located at the corner of the support base and the position of the support points; adjust S i to avoid contact with the mask One of the above barcode area and the real mask transmission is carried out by one machine 8. The machine casing is carried 9. The seat bag is provided in plural and the photo transmission support base of item 1 of the patent scope is required, wherein the light = support base is located at A reticle stocker (μίί, (load port)), and the reticle stocker includes f (r〇b〇t) to transfer the reticle into a support base and transfer it to a Photomask transfer box (SMIF pod). A method of photomask transfer, including a manned platform (i〇ad p〇) where a transfer pedestal and a photo mask box are placed on a photo mask storage device. Use a clip to place a photomask into the photomask support support; a robot arm on the photomask storage machine will take the light out of the photomask support support; and use 4 robotic arms to The reticle is transferred to the reticle box. Contains: The method of item 8 of the patent, "The reticle transfer support base A base for accommodating the photomask; a support point ’is placed on the base of the supporting building with g to support the photomask; Page 14 582060 VI. Scope of patent application A plurality of fixing frames are arranged on the edge portion of the supporting base for fixing the position of the photomask. 10. The method according to item 8 of the scope of patent application, wherein the method further comprises the steps of using the photomask storage machine to open and close the photomask box. -1 1. The method according to item 8 of the patent application scope, wherein the method further includes' removing the photomask from the photomask box using the robot arm, and transferring the photomask back to the photomask transmission support base The steps. Page 15