CN1277457A - 薄膜制造方法和装置、带薄膜的旋转椭圆体及应用它的电灯 - Google Patents
薄膜制造方法和装置、带薄膜的旋转椭圆体及应用它的电灯 Download PDFInfo
- Publication number
- CN1277457A CN1277457A CN00106537A CN00106537A CN1277457A CN 1277457 A CN1277457 A CN 1277457A CN 00106537 A CN00106537 A CN 00106537A CN 00106537 A CN00106537 A CN 00106537A CN 1277457 A CN1277457 A CN 1277457A
- Authority
- CN
- China
- Prior art keywords
- mentioned
- film
- revolution
- ellipsoid
- rotating shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 53
- 239000010409 thin film Substances 0.000 title abstract 6
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 238000004544 sputter deposition Methods 0.000 claims abstract description 21
- 239000002245 particle Substances 0.000 claims abstract description 14
- 230000010355 oscillation Effects 0.000 claims abstract description 9
- 238000000151 deposition Methods 0.000 claims description 32
- 230000008021 deposition Effects 0.000 claims description 22
- 238000009826 distribution Methods 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 8
- 230000004888 barrier function Effects 0.000 claims description 7
- 238000009792 diffusion process Methods 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 abstract description 2
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 238000005477 sputtering target Methods 0.000 description 4
- 230000001788 irregular Effects 0.000 description 3
- 238000004804 winding Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005266 casting Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/20—Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01K—ELECTRIC INCANDESCENT LAMPS
- H01K3/00—Apparatus or processes adapted to the manufacture, installing, removal, or maintenance of incandescent lamps or parts thereof
- H01K3/005—Methods for coating the surface of the envelope
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
- Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
- Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
- Y10T428/2991—Coated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/8305—Miscellaneous [e.g., treated surfaces, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Abstract
Description
Claims (19)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP102442/1999 | 1999-04-09 | ||
JP10244299A JP3506949B2 (ja) | 1999-04-09 | 1999-04-09 | 薄膜の製造方法、薄膜が形成された回転楕円体、及びこれを用いた電球と薄膜形成装置。 |
JP102442/99 | 1999-04-09 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1277457A true CN1277457A (zh) | 2000-12-20 |
CN100334684C CN100334684C (zh) | 2007-08-29 |
Family
ID=14327592
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB001065378A Expired - Fee Related CN100334684C (zh) | 1999-04-09 | 2000-04-07 | 薄膜制造方法和装置、带薄膜的旋转椭圆体及应用它的电灯 |
Country Status (5)
Country | Link |
---|---|
US (3) | US6472022B1 (zh) |
EP (1) | EP1043418A3 (zh) |
JP (1) | JP3506949B2 (zh) |
CN (1) | CN100334684C (zh) |
CA (1) | CA2304028A1 (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107723675A (zh) * | 2017-11-17 | 2018-02-23 | 东莞颠覆产品设计有限公司 | 物理气相沉积设备和物理气相沉积方法 |
CN109234695A (zh) * | 2018-11-15 | 2019-01-18 | 杭州电子科技大学 | 一种纳米金属间化合物储氢材料的制备方法 |
CN114555856A (zh) * | 2019-10-15 | 2022-05-27 | Santec株式会社 | 基板旋转装置 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3506949B2 (ja) * | 1999-04-09 | 2004-03-15 | 松下電器産業株式会社 | 薄膜の製造方法、薄膜が形成された回転楕円体、及びこれを用いた電球と薄膜形成装置。 |
US6911125B2 (en) * | 2000-09-07 | 2005-06-28 | Matsushita Electric Industrial Co., Ltd. | Thin film producing method and light bulb having such thin film |
US8035285B2 (en) * | 2009-07-08 | 2011-10-11 | General Electric Company | Hybrid interference coatings, lamps, and methods |
CN102555130A (zh) * | 2010-12-17 | 2012-07-11 | 中国科学院理化技术研究所 | 一种通过旋转容器成膜制备聚合物膜的方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2946697A (en) * | 1957-12-31 | 1960-07-26 | Westinghouse Electric Corp | Masking method and apparatus |
GB1208528A (en) * | 1968-07-01 | 1970-10-14 | Sylvania Electric Prod | Shatter-proof electric lamp |
DE2813180C2 (de) * | 1978-03-25 | 1985-12-19 | Leybold-Heraeus GmbH, 5000 Köln | Vakuumbeschichtungsanlage zum allseitigen Beschichten von Substraten durch Rotation der Substrate im Materialstrom |
US4851095A (en) | 1988-02-08 | 1989-07-25 | Optical Coating Laboratory, Inc. | Magnetron sputtering apparatus and process |
JPH03232963A (ja) | 1990-02-08 | 1991-10-16 | Nippon Steel Corp | セラミックス膜被覆方法 |
JPH07122132B2 (ja) * | 1990-11-01 | 1995-12-25 | 松下電器産業株式会社 | 薄膜形成方法および薄膜形成装置 |
ATE147890T1 (de) | 1991-05-31 | 1997-02-15 | Deposition Sciences Inc | Sputteranlage |
JPH06181048A (ja) | 1992-08-31 | 1994-06-28 | Toshiba Lighting & Technol Corp | 管球および管球への被膜形成方法 |
US5616224A (en) | 1995-05-09 | 1997-04-01 | Deposition Sciences, Inc. | Apparatus for reducing the intensity and frequency of arcs which occur during a sputtering process |
CA2243388A1 (en) * | 1996-01-22 | 1997-07-31 | Chugai Ro Co., Ltd. | Method of and apparatus for applying coating liquid to base plate by die coater and apparatus for supplying coating liquid to die coater |
EP0854210B1 (en) * | 1996-12-19 | 2002-03-27 | Toshiba Ceramics Co., Ltd. | Vapor deposition apparatus for forming thin film |
US5925410A (en) * | 1997-05-06 | 1999-07-20 | Micron Technology, Inc. | Vibration-enhanced spin-on film techniques for semiconductor device processing |
JP3424516B2 (ja) * | 1997-07-30 | 2003-07-07 | 松下電器産業株式会社 | ハロゲン電球およびその製造方法 |
US6183810B1 (en) * | 1998-01-21 | 2001-02-06 | Tokyo Electron Limited | Coating film forming method and coating apparatus |
US6159290A (en) * | 1998-10-02 | 2000-12-12 | Shamrock Technology Corp. | Apparatus for, and method of, providing controlled depositions on substrates |
JP4187323B2 (ja) * | 1998-10-13 | 2008-11-26 | Tdk株式会社 | 真空成膜処理装置および方法 |
US6352747B1 (en) * | 1999-03-31 | 2002-03-05 | Ppg Industries Ohio, Inc. | Spin and spray coating process for curved surfaces |
JP3506949B2 (ja) * | 1999-04-09 | 2004-03-15 | 松下電器産業株式会社 | 薄膜の製造方法、薄膜が形成された回転楕円体、及びこれを用いた電球と薄膜形成装置。 |
US6485616B1 (en) * | 1999-12-29 | 2002-11-26 | Deposition Sciences, Inc. | System and method for coating substrates with improved capacity and uniformity |
US6303008B1 (en) * | 2000-09-21 | 2001-10-16 | Delphi Technologies, Inc. | Rotating film carrier and aperture for precision deposition of sputtered alloy films |
US6395156B1 (en) * | 2001-06-29 | 2002-05-28 | Super Light Wave Corp. | Sputtering chamber with moving table producing orbital motion of target for improved uniformity |
-
1999
- 1999-04-09 JP JP10244299A patent/JP3506949B2/ja not_active Expired - Fee Related
-
2000
- 2000-03-29 US US09/537,622 patent/US6472022B1/en not_active Expired - Fee Related
- 2000-04-05 CA CA002304028A patent/CA2304028A1/en not_active Abandoned
- 2000-04-06 EP EP00107104A patent/EP1043418A3/en not_active Withdrawn
- 2000-04-07 CN CNB001065378A patent/CN100334684C/zh not_active Expired - Fee Related
-
2002
- 2002-09-09 US US10/238,087 patent/US6635330B2/en not_active Expired - Fee Related
- 2002-09-09 US US10/238,092 patent/US6726816B2/en not_active Expired - Fee Related
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107723675A (zh) * | 2017-11-17 | 2018-02-23 | 东莞颠覆产品设计有限公司 | 物理气相沉积设备和物理气相沉积方法 |
CN109234695A (zh) * | 2018-11-15 | 2019-01-18 | 杭州电子科技大学 | 一种纳米金属间化合物储氢材料的制备方法 |
CN114555856A (zh) * | 2019-10-15 | 2022-05-27 | Santec株式会社 | 基板旋转装置 |
CN114555856B (zh) * | 2019-10-15 | 2023-12-19 | santec Holdings株式会社 | 基板旋转装置 |
Also Published As
Publication number | Publication date |
---|---|
US20030012886A1 (en) | 2003-01-16 |
CA2304028A1 (en) | 2000-10-09 |
EP1043418A3 (en) | 2003-03-12 |
US6635330B2 (en) | 2003-10-21 |
CN100334684C (zh) | 2007-08-29 |
EP1043418A2 (en) | 2000-10-11 |
JP2000294200A (ja) | 2000-10-20 |
US6472022B1 (en) | 2002-10-29 |
US6726816B2 (en) | 2004-04-27 |
JP3506949B2 (ja) | 2004-03-15 |
US20030008146A1 (en) | 2003-01-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: PANASONIC ELECTRIC EQUIPMENT INDUSTRIAL CO.,LTD. Free format text: FORMER OWNER: PANASONIC ELECTRIC EQUIPMENT INDUSTRIAL CO.,LTD.; MATSUSHITA ELECTRONICS CORP. Effective date: 20010831 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20010831 Applicant after: Matsushita Electric Industrial Co., Ltd. Applicant before: Matsushita Electric Industrial Co., Ltd. Applicant before: Matsushita Electronics Corp. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20070829 |