CN1275634A - 用于平基片的真空室 - Google Patents

用于平基片的真空室 Download PDF

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Publication number
CN1275634A
CN1275634A CN00118721A CN00118721A CN1275634A CN 1275634 A CN1275634 A CN 1275634A CN 00118721 A CN00118721 A CN 00118721A CN 00118721 A CN00118721 A CN 00118721A CN 1275634 A CN1275634 A CN 1275634A
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Prior art keywords
vacuum chamber
conveying roller
base plate
plummer
block
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CN00118721A
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CN1229513C (zh
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T·格贝勒
G·雷德林
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Leybold Systems GmbH
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)
  • Physical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

一种用于平基片的真空室(2),具有用于输送基片的输送辊。输送辊(4)的两侧保持在轴承(3)内,在两轴承(3)之间,输送辊由至少一个中间轴承(5)辅助地支撑。中间轴承(5)分别设置在一支柱(8)上,该支柱密封地穿过真空室(2)的底板(1)上的一通孔(10),并支撑在底板(1)下的一基座(9)上。

Description

用于平基片的真空室
本发明涉及一种用于平基片的真空室，为了输送基片，在该真空室装有输送辊，输送辊设置在真空室的底板的上方，其两端分别由一个轴承所支撑。
上述真空室特别是用于平板玻璃涂层装置的闸门室，并且是公知的。为了在这种装置中达到就可能高的操作速度，要就可能快地对真空室抽真空。人们通过使真空室就可能地小并采用高效泵组对真空室抽真空来达到这一目的。
目前公知的减小真空室容积的手段有插入式真空室盖、输送辊之间的压出器体和真空密封的输送辊。通过这些手段将真空室的体积减小了很多。如果使用小直径的输送辊，则还可明显地将真空室容积减小。然而，与此相矛盾的是，输送辊只在其端部受到支撑，而且输送辊往往必需有几米的长度。为了可靠并且方向稳定地输送平基片，只允许输送辊出现非常有限的弯曲，因此，输送辊的很长的无支撑段要求其必需有较大的直径，在当今的这种装置中输送辊直径常常超过10cm。在真空室的中部辅助地支撑输送辊在目前的解决手段中还是不可能的，因为真空室的底板的作用就向一个薄膜，在抽真空和通风时要移动1mm以上。
本发明的基本任务是这样来设计本说明书开头所称的那种真空室，使其在一预定的基片尺寸下具有尽可能小的真空室容积。
按照本发明，这一任务是这样完成的，在两个外轴承之间至少再用一个中间轴承辅助地支撑输送辊，各中间轴承设置在一个支柱上，该支柱密封地穿过真空室的底板上的一个通孔，并被支撑在底板下的一支座上。
通过按照本发明的在输送辊的两外轴承之间对输送辊提供的辅助支撑，可以将输送辊的直径减小大约一半，而不会产生不希望出现的很大的弯曲。由于中间轴承通过支柱不是支撑在真空室的底板上，而是支撑在真空室的外部，例如支撑在基础上，所以，真空室的底板的移动不会导致中间轴承的位移，因此，人们可以一如既往地设计底板，而不必采取会使成本提高的加强措施。
中间轴承的支柱与真空室的底板之间的密封可以用通常的密封手段实现。如果按照本发明的一个优选实施例，通过一波纹管在支柱与真空室的底板之间提供密封，则可以完全无磨损的并且成本合理的方式实现这种密封。
如果用弹簧钢制造波纹管，则可以实现非常好的气体密封。
从制造上考虑有利的是，分别用两个彼此对正的输送辊来代替各贯穿真空室的整个宽度的输送辊。本发明使这种替代得以实现，因为可以将外轴承之间的输送辊在中间轴承的区域内分开。为此，在支柱上的中间轴承可以用两个彼此相邻的轴承垫圈，一输送辊的轴颈伸入各轴承垫圈中。
本发明可以有不同的实施例，为了更清楚地了解其基本原理，附图中示出穿过一真空室的一部分的一截面，下面对该附图作描述。
图中示出一真空室2的一底板1。真空室2中有一外轴承3，其支撑一输送辊支撑4的一端。在看不到的输送辊4的另一端上，输送辊4由另一相同的轴承支撑。在输送辊4的下面设置一个中间轴承5，该轴承是一立式止推轴承，其以两个支撑辊6和7在外轴承3之间支撑着输送辊4。
对于本发明重要的是一个立柱8，该立柱支撑在一支座9上，支座9指的是地基。立柱8穿过真空室2的底板1上的一通孔10，其上端支撑着中间轴承5。为了防止空气穿过通孔10进入真空室2，在底板1与支座9之间设置了一个围绕着立柱8的钢制波纹管11。
未示出的是，在支柱8的中间区域还可以设置两个轴承，每个轴承支撑着一分开的输送辊的一端。

Claims (5)

1.用于平基片的真空室，其内设有用于输送基片的输送辊，输送辊的两端分别由一轴承支撑，并设置在真空辊的一底板的上方，其特征在于：在两外轴承(3)之间，输送辊(4)至少由一个中间轴承(5)辅助地支撑着，各中间轴承设置在一个支柱(8)上，该支柱密封地穿过真空室(2)的底板(1)上的一个通孔(10)，并支撑在底板(1)下面的一个支座(9)上。
2.如权利要求1的真空室，其特征在于：支柱(8)通过一个波纹管(11)与真空室(2)的底板(1)连接。
3.如权利要求2的真空室，其特征在于：波纹管(11)由弹簧钢制成。
4.如前述任一权利要求的真空室，其特征在于：中间轴承(5)设计成立式止推轴承，并带具有两个支撑着各输送辊(4)的下侧的支撑辊(6、7)。
5.如前述任一权利要求的真空室，其特征在于：在两外轴承(3)之间的输送辊在中间轴承的区域(5)内被断开。
CNB00118721XA 1999-04-14 2000-04-14 用于平基片的真空室 Expired - Fee Related CN1229513C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19916666.8 1999-04-14
DE19916666A DE19916666C2 (de) 1999-04-14 1999-04-14 Vakuumkammer für flache Substrate

Publications (2)

Publication Number Publication Date
CN1275634A true CN1275634A (zh) 2000-12-06
CN1229513C CN1229513C (zh) 2005-11-30

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CNB00118721XA Expired - Fee Related CN1229513C (zh) 1999-04-14 2000-04-14 用于平基片的真空室

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US (1) US6332525B1 (zh)
JP (1) JP2000327131A (zh)
CN (1) CN1229513C (zh)
DE (1) DE19916666C2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100398692C (zh) * 2004-07-30 2008-07-02 财团法人工业技术研究院 用于平板基材的镀膜装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007073613A (ja) * 2005-09-05 2007-03-22 Shimada Phys & Chem Ind Co Ltd 基板搬送装置
DE102014004323B4 (de) 2014-03-25 2021-11-11 Gottfried Wilhelm Leibniz Universität Hannover Beschichtungseinrichtung zum zumindest teilweisen Beschichten einer Oberfläche

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3807546A (en) * 1972-09-05 1974-04-30 Ppg Industries Inc Apparatus for conveying heat treated flat or shaped glass sheets
US4300937A (en) * 1979-05-29 1981-11-17 Tgs Systems, Inc. Quench devices, glass tempering furnaces, and methods of utilizing same
DE3623970A1 (de) * 1986-07-16 1988-01-28 Leybold Heraeus Gmbh & Co Kg Transporteinrichtung mit rollensystemen fuer vakuum-beschichtungsanlagen
DD254398B5 (de) * 1986-12-09 1994-01-20 Rossendorf Forschzent Vakuumschleuse fuer folienband
FR2655629B1 (fr) * 1989-12-11 1992-03-06 Cassou Robert Dispositif d'impression a jet d'encre pour paillettes de conditionnement de liquides biologiques.
DE4303462C2 (de) * 1992-03-30 1994-03-31 Leybold Ag Mehrkammerbeschichtungsanlage

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100398692C (zh) * 2004-07-30 2008-07-02 财团法人工业技术研究院 用于平板基材的镀膜装置

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Publication number Publication date
DE19916666C2 (de) 2001-06-21
US6332525B1 (en) 2001-12-25
CN1229513C (zh) 2005-11-30
DE19916666A1 (de) 2000-10-19
JP2000327131A (ja) 2000-11-28

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