CN1263080C - 离子源 - Google Patents
离子源 Download PDFInfo
- Publication number
- CN1263080C CN1263080C CNB031232329A CN03123232A CN1263080C CN 1263080 C CN1263080 C CN 1263080C CN B031232329 A CNB031232329 A CN B031232329A CN 03123232 A CN03123232 A CN 03123232A CN 1263080 C CN1263080 C CN 1263080C
- Authority
- CN
- China
- Prior art keywords
- long filament
- ion source
- mentioned
- coating member
- unstripped gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP120072/02 | 2002-04-23 | ||
JP120072/2002 | 2002-04-23 | ||
JP2002120072A JP3575472B2 (ja) | 2002-04-23 | 2002-04-23 | イオン源 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1453818A CN1453818A (zh) | 2003-11-05 |
CN1263080C true CN1263080C (zh) | 2006-07-05 |
Family
ID=29267353
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB031232329A Expired - Fee Related CN1263080C (zh) | 2002-04-23 | 2003-04-22 | 离子源 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP3575472B2 (ja) |
KR (1) | KR100548930B1 (ja) |
CN (1) | CN1263080C (ja) |
TW (1) | TWI225658B (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8110814B2 (en) | 2003-10-16 | 2012-02-07 | Alis Corporation | Ion sources, systems and methods |
WO2007067296A2 (en) * | 2005-12-02 | 2007-06-14 | Alis Corporation | Ion sources, systems and methods |
US8028653B2 (en) | 2007-12-06 | 2011-10-04 | Hitachi Global Storage Technologies Netherlands, B.V. | System, method and apparatus for filament and support used in plasma-enhanced chemical vapor deposition for reducing carbon voids on media disks in disk drives |
US7999479B2 (en) * | 2009-04-16 | 2011-08-16 | Varian Semiconductor Equipment Associates, Inc. | Conjugated ICP and ECR plasma sources for wide ribbon ion beam generation and control |
JP7197245B2 (ja) * | 2017-01-12 | 2022-12-27 | キヤノン電子管デバイス株式会社 | X線管及びx線管の製造方法 |
JP7197927B2 (ja) * | 2020-02-20 | 2022-12-28 | 株式会社 プラズマテック | 電子ビーム発生装置及びアタッチメント部材 |
-
2002
- 2002-04-23 JP JP2002120072A patent/JP3575472B2/ja not_active Expired - Lifetime
-
2003
- 2003-04-21 KR KR1020030024993A patent/KR100548930B1/ko active IP Right Grant
- 2003-04-22 CN CNB031232329A patent/CN1263080C/zh not_active Expired - Fee Related
- 2003-04-23 TW TW092109457A patent/TWI225658B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW200402749A (en) | 2004-02-16 |
KR20030084630A (ko) | 2003-11-01 |
CN1453818A (zh) | 2003-11-05 |
TWI225658B (en) | 2004-12-21 |
KR100548930B1 (ko) | 2006-02-02 |
JP3575472B2 (ja) | 2004-10-13 |
JP2003317640A (ja) | 2003-11-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C17 | Cessation of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20060705 Termination date: 20140422 |