CN1260748C - Method for cleaning harmfel gas by using gas laser and electron-beam irradiation and its equipment - Google Patents

Method for cleaning harmfel gas by using gas laser and electron-beam irradiation and its equipment Download PDF

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Publication number
CN1260748C
CN1260748C CNB031555608A CN03155560A CN1260748C CN 1260748 C CN1260748 C CN 1260748C CN B031555608 A CNB031555608 A CN B031555608A CN 03155560 A CN03155560 A CN 03155560A CN 1260748 C CN1260748 C CN 1260748C
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voltage
electron beam
output
electric capacity
coil
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CN1494942A (en
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李龙熙
朴镇圭
朴镇浩
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Fh Korea Corp
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Enex Co Ltd Korea
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/081—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing particle radiation or gamma-radiation
    • B01J19/085—Electron beams only
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/812—Electrons
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0871—Heating or cooling of the reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0875—Gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2242/00—Auxiliary systems
    • H05H2242/20—Power circuits
    • H05H2242/26—Matching networks
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/17—Exhaust gases

Abstract

An apparatus for reducing harmful ingredients in gas by irradiating the gas with an electron beam. The apparatus comprising a voltage generating unit adapted to generate a high-frequency and high voltage signal, and a reaction unit coupled to the voltage generating unit to receive the high-frequency and high voltage signal, the reaction unit including an electron beam pole having a plurality of openings along the surface of the electron beam pole, and a plurality of discharge cells for each opening, the discharge cells being disposed to face the corresponding opening for generation of the electron beam therebetween, the region between the discharge cells and the openings defining a reaction region through which the gas travels.

Description

Shine the method and apparatus of purifying harmful gas with gas laser and electron beam
The application is to be on December 11st, 1998 applying date, and application number is dividing an application of 98125266.4 Chinese patent application.
Technical field
The present invention relates to be used to purify the method and apparatus of the waste gas that dynamic power machine, industrial equipment, combustion furnace etc. produce, more specifically to passing through with gas laser and electron beam irradiation, the harmful components that comprise in the waste gas decomposition, thus the method and apparatus of this composition reduced.
Background technology
Korea S pending application application No.96-21112 has proposed a kind of traditional passing through and has shone the method and apparatus of handling waste gas with electron beam.According to this method and apparatus, the ammonia adding is mainly comprised in the waste gas of sulfur oxide (SOx) or nitrogen oxide (NOx), and then by the irradiation of electron beam, sulfur oxide and nitrogen oxide are transformed into ammonium sulfate and ammonium nitrate, thereby, from discharging gas, eliminate as SOx and NOx with harmful components.In this method of eliminating harmful components with ammonia, ammonia is discharged with discharging gas under the incomplete reaction of mentioned component easily.And this method and apparatus also have to need an independent device waste gas to be shone inhomogeneous etc. to mix ammonia and waste gas and electron beam.
U.S. Patent No. 4,915,916 proposed a kind of without ammonia by shine the method and apparatus of handling waste gas with electron beam.According to this method and apparatus, part waste gas to be processed is shone with electron beam, to form active ion, as [O] and OH -, the waste gas that will have an active ion disperses and is mixed in the remainder of exhaust gas, and the motion by active ion is with the NOx in the waste gas and SOx is transformed into vaporific or the micronic dust shape.Collect this mist or dirt with a dust catcher then.It is very low that yet the problem of this method and apparatus is to eliminate the efficient of harmful components, because the electron beam irradiated region separates with reaction zone thereby plant bulk is bigger.
The shortcoming of the method and apparatus of above-mentioned traditional use electron beam treatment pernicious gas makes the electron beam irradiated region can not cover whole exhaust passageway, and low speed and the efficient that causes eliminating harmful components of the density of electron beam is all very low.
Summary of the invention
An object of the present invention is to provide a kind of method and apparatus that is used for purifying harmful gas, its size is little, and the efficient height has determined that a zone both had been used for gas laser and electron beam irradiation, also was used to discharge the reaction of gas, and need not independently intermediate materials such as ammonia.
Another object of the present invention provides a kind of method and apparatus that is used for purifying harmful gas, and it reaches high treatment efficiency and high-speed by carry out the irradiation of high density gas laser and electron beam at whole pernicious gas path.
Another object of the present invention provides a kind of method and apparatus that is used to produce high-frequency high-voltage signal, and this high-frequency high-voltage signal can produce gas laser consistent with above-mentioned purpose and electron beam.
According to an aspect of the present invention, provide a kind of by reduce the device of harmful components with electron beam irradiation gas, this device comprises a voltage generation circuit that is used to produce high-frequency high-voltage signal, with a reaction unit that is connected to this voltage generation circuit with the reception high-frequency high-voltage signal, reaction unit comprises an electron beam magnetic pole that a plurality of perforates are arranged along its surface, a plurality of transmitter units with corresponding each perforate, transmitter unit is in the face of corresponding aperture, be used for producing betwixt electron beam, determined a reaction zone that gas passes through between transmitter unit and the perforate.
In a preferred embodiment of the invention, the electron beam electrode is an annular, and perforate is formed on the annular wall of electron beam electrode, and exhaust unit is stacked, and each unit all has an eletrode tip to point to corresponding aperture.
In the preferred embodiment of the present invention, the electron beam electrode is an annular, perforate is elongated, place on the position with respect to longitudinal axis one predetermined angular of electron beam electrode, exhaust unit is stacked, aim at the respective elongated perforate, each unit all has an eletrode tip to point to the respective elongated perforate.
Preferably, the transmitter unit of each corresponding each perforate of stacked transmitter unit all radially departs from the angle in 5 °～20 ° predetermined scopes in its adjacent transmission unit.
According to preferred embodiment, a power supply device is connected on voltage generator and the generating means to supply high-frequency high-voltage signal to the electron beam electrode, power supply device comprises a central frame that is fixed on the electron beam electrode, one is fixed on a plurality of transmitter units and around the housing of central frame and one central frame is connected to Connection Element on the housing.This Connection Element comprises an axis of centres that is fixed on the electron beam electrode, a pair of crosswise fixed is at the reinforcement axle at axis of centres two ends, a plurality of being attached to strengthened the insulator terminal that axle two ends and its outer surface are fixed in housing, with an energy input terminal, be attached to the outer surface of housing and be connected on the axis of centres with state of insulation, be used for from voltage generation circuit to electron beam electrode supply high-frequency high-voltage signal with conduction state.
Preferably, the device that is used for purifying harmful gas of the present invention also comprises a compressed air supply system, is used for to reaction zone supply compressed air.
Another aspect of the present invention, provide by reduce the cleaning harmful gas method of oxious component wherein with electron beam irradiation waste gas, this method comprises the steps: AC supply voltage is transformed into a High Level DC Voltage, a high frequency of oscillation high-voltage signal and a high-frequency and high-voltage ring waveform signal; This High Level DC Voltage, high frequency of oscillation high-voltage signal and high-frequency and high-voltage ring waveform signal are merged to produce a final high-frequency high-voltage signal; By final signal being put on electron beam magnetic pole and transmitter unit, produce an electron beam; To passing through waste gas divergent bundle by the definite reaction zone in zone between electron beam magnetic pole and transmitter unit.
Description of drawings
By with reference to the accompanying drawings, preferred embodiment is described, above-mentioned purpose of the present invention, further feature and advantage can be more obvious, wherein:
Fig. 1 is a perspective view, shows the external structure of the harmful gas purifying device of one embodiment of the invention.
Fig. 2 is a perspective view, shows the part of the reaction member of one embodiment of the invention.
Fig. 3 is the perspective view of the electron beam transmitter unit of one embodiment of the invention.
Fig. 4 a is the vertical view of the layered laminate electron beam transmitter unit of one embodiment of the invention.
Fig. 4 b is the end view of Fig. 4 a.
Fig. 5 is a perspective view, shows the electron beam electrode of one embodiment of the invention.
Fig. 6 is the circuit diagram of the high-frequency high-voltage generating unit of one embodiment of the invention.
Fig. 7 a and 7b are the oscillograms from the high-frequency high-voltage of the final output of high-frequency high-voltage generating unit of one embodiment of the invention.
Fig. 8 is the oscillogram from first High Level DC Voltage of the high-frequency high-voltage generating unit generation of one embodiment of the invention.
Fig. 9 is the oscillogram from second high-frequency high-voltage of the high-frequency high-voltage generating unit generation of one embodiment of the invention.
Figure 10 is the oscillogram from the 3rd high-frequency high-voltage of the high-frequency high-voltage generating unit generation of one embodiment of the invention.
Figure 11 is the oscillogram from the high-frequency high-voltage of the high-frequency high-voltage generating unit output of another embodiment of the present invention.
Figure 12 a and 12b are the oscillograms from the high-frequency high-voltage of the high-frequency high-voltage generating unit output of a routine.
Figure 13 is the perspective view of the power supply equipment of the present invention's one example.
Figure 14 is the perspective view of the power supply equipment of the present invention's one example, and the one partial shell is broken away.
Figure 15 is the perspective view of the power supply terminal of one embodiment of the invention.
Figure 16 is the electrode of electron beam transmitter unit of the present invention and the perspective view in electron beam electrode reaction hole.
Figure 17 is a part of cutaway view, shows a plurality of stacked reaction member that is fixed in the top and bottom of power supply equipment of the present invention.
Figure 18 is the equivalent circuit diagram of electron beam transmitter unit of the present invention.
Figure 19 is the perspective view that the combustion furnace of harmful gas purifying device of the present invention is installed.
Embodiment
Introduce the harmful gas purifying device of the preferred embodiment of the present invention below with reference to the accompanying drawings.
Harmful gas purifying device of the present invention comprises a high-frequency and high-voltage generating unit (see figure 6), is used to produce a continuous high-frequency high-voltage signal, so that produce gas laser and electron beam with industrial AC power; One reaction member (seeing Fig. 1 to 5) is used for producing and to pernicious gas radio gas laser and electron beam, to cause the chemical reaction of pernicious gas; With a power supply equipment (seeing Figure 13 to 15), be used for from the high-frequency and high-voltage generating unit to the reaction member supplying energy and be used for structurally supporting reaction member.
The structure of the reaction member of harmful gas purifying device of the present invention is described referring now to Fig. 1 to 5.
Fig. 1 is the perspective view of a reactor 10 of the present invention.With reference to figure 1, reactor 10 comprises a power supply equipment 200 and is fixed on three reaction members 100 of the upper and lower of power supply equipment 200.Also can comprise reactor 10 power supply equipment 200 and at least one are fixed in the reaction member 100 of the top or the bottom of power supply equipment.
Fig. 2 shows the internal structure of the reaction member 100 of Fig. 1.With reference to figure 2, reaction member 100 comprises an electron beam transmitter unit assembly, and wherein stacked a plurality of electron beam transmitter units 110 and an electron beam electrode 120 place the inner space of electron beam transmitter unit assembly.
Fig. 3 is the perspective view of an electron beam transmitter unit of the present invention.With reference to figure 3, electron beam transmitter unit 110 is a porous disc, and it has a circular outer periphery 113 and an inner rim, is formed with a plurality of triangular-shaped electrodes or most advanced and sophisticated 111 along its inner circumference order.Electron beam transmitter unit 110 also has fastener hole 115, is separated with certain space with neighboring 113, is used for fixing stacked electron beam transmitter unit with a securing member such as bolt.
The stepped construction of electron beam transmitter unit of the present invention is shown in Fig. 4 a and 4b.With reference to figure 4a, electron beam transmitter unit assembly 110 comprises a plurality of staggered electron beam transmitter units, they are stacked in such a way, make the respective electrode of electrode 111 and bottom electron beam transmitter unit of electron beam transmitter unit on top depart from a predetermined angular or distance along the circumferencial direction of transmitter unit, therefore, shown in Fig. 4 a, upper electrode and lower electrode partly overlap mutually.Electron beam transmitter unit assembly also comprises a packing ring 150, is used for stacked electron beam transmitter unit is spaced from each other.When electron beam transmitter unit 110 and packing ring 115 are assembled together, the fastener hole 115 of transmitter unit 110 will be aimed at the hole of packing ring 150, thereby tighten together.
Fig. 5 shows electron beam electrode 120 in the reaction member 100 of the present invention.With reference to figure 5, flange 123 is formed at the top and the bottom of the cylindrical wall 121 of electron beam electrode 120, and fastener hole 127 is formed on each flange 123, so that a plurality of electron beam electrodes 120 are tightened together.Reacting hole or groove 125 are formed on the cylindrical wall 121 of electron beam electrode 120, with the electrode in the face of electron beam transmitter unit 110.Reacting hole 125 is preferably with a predetermined angular longitudinal extension and reverse, with correspondingly in the face of the spiral electrode of stacked electron beam transmitter unit.As the back will describe in detail, for to forming the favourable consideration of highdensity gas laser and electron beam, the angle of reacting hole 125 preferably fixes between 10 °～15 °.The number of the number of stacked electron beam transmitter unit, the electrode of each electron beam transmitter unit and the interelectrode angle of adjacent electron beam transmitter unit can be determined to come consistent with the angle of reacting hole 125.
Fig. 6 is the circuit diagram of high-frequency and high-voltage generating unit 300, is used to produce the high-frequency high-voltage signal that is applicable to method and apparatus of the present invention, and it is applicable between electron beam electrode 120 and the electron beam transmitter unit 110.Fig. 7 a and 7b are oscillograms, show the high-frequency and high-voltage output OUT of the high-frequency and high-voltage generating unit of Fig. 6.This high-frequency and high-voltage output OUT is by will being shown in first to the 3rd output waveform OUT1 of Fig. 8 to 10, and OUT2 and OUT3 add and obtain together.
With reference to figure 6, high-frequency and high-voltage generating unit 300 comprises three importations that are connected to the primary side of a transformer T.First importation 310 receives one first commercial using and exchanges (AC) input voltage V IN1, comprise 1, one resistance R F1 of a capacitor C and a coil L1, as an oscillating circuit.This oscillating circuit also is used to suppress noise, and make can be from the stable output of the coil L4 acquisition one of the secondary end that is connected to transformer T.
Second importation 320 receives one second commercial using and exchanges (AC) input voltage V IN2, comprise a diac T1 (as a Zener diode-like type), a capacitor C2 and a coil L2 are as an oscillating circuit.This diac T1 is a kind of bidirectional trigger diode, and it is by only making the input voltage V that is higher than a predeterminated level IN2 by controlling cycle of oscillation, and therefore the second output voltage OUT2 has periodicity spike type waveform as shown in Figure 9.
Best, the polyester electric capacity that uses 2.5 to 3 times proof voltage with input voltage is as capacitor C in first and second importations 1 and C2, to obtain withstand voltage/capacitance characteristic preferably.Capacitor C 1 and C2 should keep electric capacity below 1 μ F, are covered by an insulation crust, and use epoxy resin pattern.Resistance R F1 determines the charge/discharge time constant of capacitor C 1, and it can be a variable resistor, to be complementary with whole high-frequency and high-voltage generating unit.Best, use ceramic resistor as resistance R F1 with variations in temperature among a small circle, the resistance value of resistance R F1 can fix on below the 1K Ω.
The 3rd input vibration section 330 receives one the 3rd industrial AC-input voltage V IN3, comprise the capacitor C 4 and the C5 that are coupled mutually, thereby determined the 3rd input voltage V INA commonality schemata G1 of 3; A switch triode Q1; A coil L3 who is connected to the collector electrode of switch triode Q1; One is connected the emitter of triode Q1 and the resistance R C between ground; With the resistance R F2 and the RF3 that are connected to triode Q1 base stage by a capacitor C 3.Resistance R F2 determines the charge/discharge time constant of capacitor C 3, and it can be a variable resistor, to be complementary with the high-frequency and high-voltage generating unit.Preferably use ceramic resistor as resistance R F with variations in temperature among a small circle 2, its resistance value can be determined below 1k Ω.Resistance R F 3Determined the multiplication factor of triode Q1, resistance R c is used to protect triode Q1, and electric capacity is a coupling capacitance.
Triode Q1 in the 3rd importation 330 for example is a bipolar npn transistor npn npn, and meeting conducting when the voltage that puts on trisome pipe Q1 by resistance R F3 surpasses its bias voltage is to produce an oscillator signal.Preferably the temperature characterisitic of triode Q1 is in-40 ℃ to 80 ℃ scopes, and provides heat abstractor.The operating temperature of triode Q1 and safeguard that temperature characterisitic is suitable for the environment for use of the high-frequency and high-voltage generating unit 300 of Fig. 1.One skilled in the art will appreciate that each triode conducting and when disconnecting, it can produce an oscillator signal, the signal that produces at the collector electrode of triode Q1 seems to be similar to the waveform of OUT3, but low on amplitude.Triode Q1 has low-loss speed-sensitive switch triode.Neutral point (node) or common node G1 are corresponding to the level of " O " V of tertiary voltage output waveform shown in Figure 10.Best, capacitor C 4 and C5 belong to ceramic mould, and its withstand voltage is greater than 3000V, and electric capacity is 1000～2000PF or smaller.
In an illustrated embodiment, first to the 3rd importation 310,320 and 330 input voltage V IN1To V IN3The single phase alternating current (A.C.) voltage of 100～200V preferably, and can use a two-phase amplitude limiter to supply changeably.Be the characteristic distortion that prevents to be caused by change in voltage and frequency of input voltage skew, (that is, Varicon) can be used as capacitor C 1, C2 and C3 are to adjust to the incoming frequency of an expectation for variable capacitance.
The coil L1 of each importation, L2 and L3 have constituted the elementary winding of transformer T, and coil L4, L5 and L6 have constituted the secondary winding of transformer T, and are connected on separately the lead-out terminal.Here be noted that the coil L4 of the secondary winding that constitutes transformer T, each terminal of L5 and L6 is all answered ground connection.The withstand voltage of coil L1 to L6 all should be enough high to bear the infringement of using 3000V voltage to cause in 10 minutes.During coiling, should notice guaranteeing that insulating coating is not damaged.Primary winding coil L1, L2 and L3 use the one-level insulated coil to twine, with anti-wear and aging.Secondary winding coil L4, L5 and L6 also use the one-level insulated coil to twine.Because coil L6 is mainly used in the purpose that produces a peak voltage rather than produces electric current, so the diameter of coil L6 smaller than coil L4, the number of turn of coil L6 is coil L4 and L5 5 times preferably, to prevent the anti-stream of high output voltage OUT1 and OUT2.And, can use the segmentation bobbin with coil around thereon, every section the number of turn of bobbin should be 300 or still less, to guarantee the reliability of coil.If the number of turn that bobbin is every section surpasses 300, because the leakage loss of the coil interlayer of coiling, the electrical potential difference of coil increases greatly, causes the wearing and tearing or the damage of coil.And if produce a hard pulse in the system, transformer T can or encircle the ripple noise and reduce quality or damage owing to this pulse.
Best, transformer T should be insulated by filled thermoset epoxy resin.If substitute thermosetting epoxy resin with the air-setting resin, owing to be included in the coagulating agent in the resin, the magnetic field of transformer can weaken.Such magnetic field seepage can not influence the operating voltage of system, purifies the efficient of specifying harmful components but can reduce.In order to solve the magnetic field leakage problems, the production of transformer should be in such a way, and promptly 50% insulation filling material is in that to insert the back thermoset, and bubble wherein is removed, and 50% the packing material that then will be left is inserted and the mold that insulate.
Silicon steel plate or nickel chromium triangle steel plate can be used as the iron core of transformer T.Iron core scribbles insulating varnish by the method for infiltration, to stop the infiltration of dust and moisture.The thickness of iron core is preferably 0.8mm, is made by the material with good coefficient of heat transfer and initial susceptibility.
And if the iron core heating, transformer T has the problem of irregular current source.For addressing this problem, a heat abstractor (not shown) can be tied up on iron core, and a cooling water pipe is contacted installation with heat abstractor, thus the cooling iron core, the pulse current of stabilizing transformer T.Copper pipe helps the stable of pulse current, and non magnetic or insulated tube is unfavorable for the stable of thermal conductivity and pulse current.
Connecting first output 340 on the secondary winding coil L4, it for example comprises one or three grades of filter circuit HD1 and HC1, HD2 and HC2, and HD3 and HC3, this filter circuit comprise high voltage rectifier diode HD1, HD2, HD3 and electric capacity HC1, HC2 and HC3.The alternating voltage of responding among the coil L4 is by filter circuit rectification and filtering, and correspondingly, a direct current voltage is as shown in Figure 8 exported as the first output voltage OUT1.Here, diode HD1 to HD3 is the kenotron with withstand voltage characteristic of about 120% of its output voltage.The withstand voltage of electric capacity HC1 to HC3 is about 10KV or higher, and their capacitance is defined as HC1＜HC2＜HC3.Especially, consider the fail safe of electric capacity HC3, wish that electric capacity HC3 uses in the 10-15KV scope.
The output voltage OUT1 of first output 340 is that a high commutated direct current is pressed, its waveform as shown in Figure 8, its peak value V PDIn the 10-12KV scope.By increasing the withstand voltage of electric capacity HC3, can obtain more galvanic current pressure output.
Being connected on the secondary winding coil L5 is second output 350, and it comprises two filter circuit HD4, HD5, and HC4 and HD6, a HC5 and a matched coil Lm are used for impedance matching.Diode HD4 to HD6 is a kenotron, has 120% withstand voltage characteristic of its output voltage.Diode HD4 and HD5 have improved the electric current that flows through, to prevent the anti-stream of electric current.Preferably electric capacity HC4 has identical withstand voltage and identical capacitance with HC5.Otherwise, increase by the leakage current of capacitor.
As shown in Figure 9, the output voltage OUT2 of second output 350 forms one-period property peaked wave DC skew by a predetermined voltage level.The secondary current of this peaked wave is by diode HD4 and HD5 decision.Periodically spike is because diac T1 causes.
Directly the output voltage OUT3 from coil L6 output forms the circumferential wave that is shown in Figure 10.The peak value of this circumferential wave is Vp, is a wave of oscillation behind the peak value.In circumferential wave, peak value Vp is very important, and the wave of oscillation can be ignored.Peak value Vp determines in the present embodiment in 10～20KV scope, is an important parameter of reaction unit, and in reaction unit, accelerated electron beam produces gas laser by producing also by electrode.Peak value should be consistent with the dielectric constant in the reaction unit.
Three above-mentioned output voltage OUT1 to OUT3 are by a resistance R x and a capacitor C x coupling, produce a final output voltage OUT.Final output voltage is a high pressure, high-frequency signal, and the system that is provided for is as power.Resistance R x is the overload that is used for preventing 300 of reaction unit 100 and high-frequency and high-voltage generating meanss, and the resistance value of wishing resistance R x is at 500～700M Ω.If the resistance of resistance R x is greater than 700M Ω, because the exhausted event of electrostatic phenomenon can injure the operator and damage measuring equipment.
The waveform of the output voltage OUT of the high-frequency and high-voltage generating means 300 of Fig. 6 is shown in Fig. 7 a and 7b when different.Fig. 7 a shows based on microsecond (μ sec) (10 -6Second) be the time target output voltage OUT of unit, Fig. 7 b shows based on the time target output voltage OUT that with millisecond (10-3 second) is unit.For the output voltage with conventional electron beam power supply equipment comes comparison output voltage OUT, with the waveform of conventional output voltage use respectively with microsecond and millisecond as unit the time be shown in Figure 12 a and 12b.According to comparison to two output voltage waveforms, as seen traditional output voltage is a waveform, and it changes to the peak value that it is about the OV level from negative voltage, and output voltage OUT of the present invention is one-period property spike (pulse) ripple, as shown in Figure 7, it is by a direct current level V PDPromote or the DC skew.
And, as shown in figure 11, by level V PDThe output voltage of DC skew can obtain by the first output voltage OUT1 is added on the 3rd output voltage OUT3.Output voltage that may be such is a bit unstable and weak, can not obtain continuous electron beam, and the final output voltage OUT that can produce electronics/laser beam like this obtains by the second output voltage OUT2 being added on the DC offset voltage among Figure 11.
Such just as is known to the person skilled in the art, device 300 can make very closely and also expense not high.
As above the final output voltage OUT that is produced by high-frequency and high-voltage generating means 300 is supplied to reaction unit 100 by power supply device 200.Power supply device 200 is used for the electron beam transmitter unit assembly and the electron beam electrode of coupled reaction device 100.Unit 200 also provides high-frequency and high voltage to reaction unit 100.
Below, with reference to figures 13 to the structure of 15 explanation power supply devices 200.
Figure 13 is the perspective view of power supply device of the present invention.With reference to Figure 13, power supply device 200 comprises a central frame 210, and it is fixed on the electron beam electrode 120 of reaction unit 100; A housing 220, it is fixed on the electron beam transmitter unit assembly and around central frame 210; With the element 230 that is coupling, be used to make central frame 210 to cooperate with the insulation attitude, and electrically contact with central frame 210 with housing 220, provide high-frequency high-voltage signal with high-frequency and high-voltage generating means 300 to central frame 210.
Figure 14 shows the structure of power supply device, and its housing parts is cut open.With reference to Figure 14, central frame 210 has a cylindrical wall 211, and the diameter of this cylindrical wall 211 is identical with the diameter of electron beam electrode 120, and the top of cylindrical wall 211 and bottom are formed with flange 213.Be formed with fastener hole 215 on the flange 213, be used for flange 213 is fixed to the flange 123 of electron beam electrode.Housing 220 is a box-like, and all open on its upper and lower surface, and has flange 223 to be formed at its top and bottom.One lid (not shown) is fixed on the flange 223 by fastener hole 225.This lid is fixed on the electron beam transmitter unit 110, so that central frame 210 and electron beam electrode 120 pass it, pernicious gas is passed through.And the both sides of housing are formed with outward extending cylindrical part 227, and the both sides of cylindrical part 227 are formed with outward extending insulator terminal fixed part 229.
Connection Element 230 comprises that one is fixed in the axis of centres 231 on the central frame 210 with conduction state, vertical fixing is in the reinforcement axle 232 at the two ends of the axis of centres 231, a plurality of insulator terminals 233, its middle body is attached to the end of strengthening axle 232, and its circumferential section is fixed on the cylindrical part 227 of housing 220; With an energy input terminal 240, it with state of insulation adhere to housing 220 on cylindrical part 227, and be connected on the axis of centres 231 with conduction state, be used for the high-frequency and high-voltage generating means to electron beam electrode 120 supply of current.
As shown in figure 15, energy input terminal 240 comprises the round base 241 and the insulated tube 245 that are attached to cylindrical part 227 ends of housing 220, the lead (not shown) that is used to insulate and draws from pedestal 241 and high-frequency and high-voltage generating means 300.Energy input terminal 240 also comprises an exhaust outlet 243, is used for providing compressed air to reaction unit 100.Offer reaction unit 100 from the exhaust outlet air supplied by the slit 247 between pedestal 241 and the insulated tube 245.
The cleaning harmful gas operation that is realized by harmful gas purifying device will be described below.
The cleaning harmful gas operation can be divided into three operations: first operation is to produce high-frequency high-voltage signal by the high-frequency and high-voltage generating means, second operation is to produce gas laser and electron beam by high frequency and the high voltage that generation is provided to reaction unit, and the 3rd operation is by the gas laser of generation and the harmful components in the electron beam reduction waste gas.
With reference to figure 6,100～200V, the single phase alternating current (A.C.) voltage of 50～60Hz is input to first to the 3rd importation 310,320 and 330, as their input signal V IN1To V IN3, cause first to the 3rd importation 310,320 and 330 vibrations respectively.
It is high voltage that from first to the 3rd importation 310,320 and 330 oscillating impulse are promoted respectively by transformer T.The high voltage of responding in the secondary winding coil L4 of transformer T is by 340 rectifications of first output and filtering, and High Level DC Voltage shown in Figure 8 is like this exported from first output 340 as the first output voltage OUT1.The high voltage of responding in secondary winding coil L5 is handled by second output 350, second output 350 comprises two filter circuit HD4, HD5, HC4 and HD6, HC5 and impedance matching coil Lm, periodicity peaked wave voltage shown in Figure 9 like this is from 350 outputs of second output, as the second output voltage OUT2.Circumferential wave voltage shown in Figure 10 is directly exported from secondary winding coil L6 as the 3rd output voltage OUT3.These three output voltage OUT1 to OUT3 are mated by resistance R x and capacitor C x, thereby obtain being shown in the final output voltage OUT of Fig. 7 a and 7b.
The output voltage OUT of the high-frequency and high-voltage generating means of Fig. 6 is a high-frequency high-voltage, and its cycle is very short, is about 10ns, and shown in Fig. 7 a and 7b, its peak voltage levvl is at least 1KV, is preferably 10KV or higher.The energy of this high-frequency high-voltage is supplied to the electron beam magnetic pole 120 of reaction unit 100 by power supply device 200.
Therefore, form an electric field between the electrode 111 of electron beam electrode 120 and electron beam transmitter unit 110, electron beam is launched to the reacting hole 125 of electron beam electrode 120 from the electrode of electron beam transmitter unit 111.At this moment, shown in Fig. 7 a, because pulse is provided, therefore keeping one all the time is about 10KV or higher dc static gesture, has also produced coherent laser beam when electron beam produces.And, as shown in figure 16, because the torsion structure of the reacting hole 125 of electron beam electrode 120, the width of the light beam of generation is expanded, consistent with the stepped construction of the electrode of electron beam transmitter unit 110, and this causes that new coherent laser beam is extended and emits from incident wave.
Figure 18 is the schematic diagram of equivalent electric circuit of the reaction unit of Fig. 2.With reference to Figure 18, because in reaction unit, the electrode 111 of electron beam transmitter unit and electron beam electrode are considered to constitute an electric capacity, reaction unit can be expressed as the equivalent electric circuit of Figure 18.Particularly reaction unit is made up of a plurality of parallel mutually capacitors that connect, and can produce a large amount of noises like this in the operation of reaction unit.This noise is along with discharging gas is outwards emitted.Yet, as shown in Figure 1, because reaction unit 100 is connected on connector 140 and the exhaust channel 130, therefore repeatedly expands and shrink at discharging gas, in the time of by reaction unit 100, connector 140 and exhaust channel 130, whole device can be used as the acoustic absorption device to reduce noise.
With reference to figure 4a, look down reaction unit from the top, can imagine that a plurality of electron beams launches to reacting hole from each electrode, gas laser and electron beam are transmitted into electrode and the interelectrode conversion zone of electron beam with the latticed form of thousands of meshes like this.At the reaction zone central part, the white wave effect appears, blown afloat strong ion wind and strong diffraction wind along the counter-clockwise direction of Fig. 4 a.
When containing harmful components such as NOx, SOx, during formed reaction zone, harmful components were decomposed by high density electron beam, eliminate harmful components by the oxidation/reduction reaction of harmful components like this above the waste gas of HC etc. flowed into.
For example, confirmed to flow under the situation of NOx at reaction zone, the electron beam by radiation in the experiment has produced N 2And O 2Simultaneously, also done another experiment at this device with respect to the detergent power of the discharging gas of diesel engine, this gas has comprised a large amount of NOx and HC.In this experiment, can find out that eliminating relevant oxidation base with NOx mainly is O, HO 2And OH, ozone (O simultaneously 3) oxidation of NOx is also worked.In detail, O 3With the O in the reaction unit 2[O] ion of producing of decomposition impel the elimination of the NOx of harmful pneumatolytic of generation in dividing.Most of final harmless composition is not discharged in the air, but is absorbed by the carbon component that is deposited on thinly on electron beam transmitter unit 111 and the electron beam electrode.SOx by Decomposition is also eliminated.
By N 2The Nitrogen Atom (N) of decomposing and producing is also by reaction Impel the elimination of NOx.
Recognize owing to N and OH HO 2And O 2NO is produced in reaction, and therefore compressed air being flowed into reaction zone is favourable with effective removal NOx.Particularly, outside waste gas, flow into compressed air, in the compressed air contained humidity can decompose ( ), thereby help the carrying out that react.Compressed air flows into reaction unit 100 by the compressed air input port 243 of energy input terminal 240 shown in Figure 15.
Best harmful gas purifying device of the present invention comprises a high-frequency and high-voltage generating means, a power supply device and a plurality of reaction unit that is fixed in the top and the bottom of power supply device successively.Figure 17 shows such device, and wherein power supply device 200 places central authorities, and three reaction units 100 are fixed in the top and the bottom of power supply device.
With reference to Figure 17, waste gas sucks from " A " position and discharges from " B " position.Waste gas is by reaction zone, and each reaction zone all is formed between electron beam transmitter unit 110 and the electron beam electrode 120, and with the electron radiation bundle, the harmful components in the waste gas are eliminated like this.At this moment, although very fast to the exhaust-gas flow of " B " position from " A " position, when by this device, reaction has all taken place by electron beam in wherein all waste gas.This is because the gas laser in the reaction unit and the density of electron beam are very high, and reaction unit 100 is circular, causes the whole zone radiation at exhaust channel of gas laser and electron beam.And, because gas laser and electron beam are to radiate with extremely short wavelength, so although waste gas is to pass through conversion zone with high speed, the harmful components in the waste gas are exposed to inevitably in gas laser and the electron beam and react.
Harmful gas purifying device of the present invention can be installed on the small-sized exhaust system, as automobile.And as shown in figure 19, several parallel devices that link together can be installed on the combustion furnace to raise the efficiency and to handle the capacity of waste gas.
This method and apparatus that is used for purifying harmful gas can be used for various occasions.For example, can be used for handling combustion furnace, industrial equipment, the waste gas that various dynamic power machines etc. produce.It also can be used as the living space, industrial area, the air cleaner of the underground space (as the tunnel) etc.It also can be used as air cleaner and deodorizing apparatus.In addition, because its ozoniferous function, it can be used as sterilizer or Pasteurizer, can be used for medical treatment simultaneously, oxygen process units, food hygiene equipment etc.And concerning any people who is familiar with this technology, obviously this device can be used for every field, as be used for central authorities heating/cooling device clarifier, waste water treatment plant, the waste water treatment plant that is used to regenerate, the VOC processing unit, rain maker is used for the various devices of kitchen operation etc.
We have carried out once predicting the experiment of this method and apparatus of the present invention to the reduction performance of pernicious gas, and it the results are shown in following table 1.In experiment, 100V, the AC power of 400mA is supplied to the power supply device 200 of harmful gas purifying device.
Table 1
Analysis item Flow into concentration Concentration of emission Slip (%)
Cigarette 20％ 3％ 85
CO 5000ppm 1500ppm 70
HC 5000ppm 1500ppm 70
NOx 3000ppm 1200ppm 60
SOx 3000ppm 1200ppm 60
PM (particulate material) 0.5mg/m 2 0.15mg/m 2 70
And, confirm a kind of undetermined material indirectly by a Bioexperiment, such as dioxide, it is very harmful to the thing of living, and is included in the waste gas, its chemical constituent or structure do not confirm accurately also in harmful gas purifying device of the present invention, whether it is decomposed or reduces.
At first, the gas that is produced by rubbish or damaged tire burning is collected and is dissolved in the distilled water to obtain its concentrated solution.It is in 10 liters the fish basin that fish is arranged that this concentrated solution of 100cc is introduced into a volume, and all fish all in the dust in a few minutes.The gas that produces that will burn is simultaneously handled through device of the present invention, and the gas after the processing is collected and dissolves, to obtain its concentrate.This concentrate is poured in the fish basin, and all fishes in the susceptible of proof basin still live and grow, and do not have death.
According to the direct measurement to the pernicious gas percent reduction, and above-mentioned non-direct biological test can recognize that harmful gas purifying device of the present invention has superior effect to the reduction of the harmful components in the waste gas.
As mentioned above,, be easy to transportation and installation, therefore can lower price be installed on the automobile because harmful gas purifying device of the present invention produces high density gas laser and electron beam in a box-like equipment.And, a plurality of reaction units can improve its purification efficiency at an easy rate by being serially connected.The parallel connection of several devices of the present invention simultaneously can be used for big capacity discharging machine or combustion furnace easily.
Here invention has been described and explanation with reference to preferred embodiment, to one skilled in the art, also can carry out various changes aspect form and the details under the situation that does not break away from the present invention's spirit and category.

Claims (8)

1. voltage generator that is used to produce high-frequency high-voltage signal, this high-frequency high-voltage signal is used to produce electron beam, and this voltage generator comprises:
A booster transformer, it be useful on first, second and the 3rd primary coil that receive an alternating voltage and respectively with first, second and the 3rd primary coil corresponding first, second and level coil for the third time, each an end ground connection of three secondary coils;
One first input oscillating circuit is coupled with described the 3rd primary coil, is used to produce an input oscillator signal, and the described first input oscillating circuit comprises:
A pair of electric capacity at AC supply voltage two interpolars connected in series, this is to the common node ground connection of electric capacity;
A pair of connected in series at a utmost point of AC supply voltage and the resistance between ground, thus determined a common node therebetween;
A triode that is connected between described the 3rd primary coil and ground; With
One is connected one of described triode control input and this is to the electric capacity between the common node of resistance;
One second input oscillating circuit, it is included in an electric capacity and a resistance connected in series between the two ends of described first primary coil;
One the 3rd input oscillating circuit, it comprises and electric capacity of second parallel connection of primary windings and a diac of connecting with them;
One first output, be coupled with described first secondary coil, be used to produce an output signal that has the 1KV direct voltage at least, wherein said first output comprises a plurality of filter circuits connected in series, each filter circuit comprises a kenotron and a high-voltage capacitance, be used for the output voltage of described first secondary coil is carried out rectification and filtering, the electric capacity that places near the described high-voltage capacitance the lead-out terminal of described first output is greater than the electric capacity from the lead-out terminal of described first output high-voltage capacitance far away; With
One second output is coupled with described second subprime coil, is used to produce a pulse signal, and its peak-to-peak pulse duration is greater than described input oscillator signal, and wherein said second output comprises:
One first filter circuit, it comprises two parallel diode and connected electric capacity that connect;
An impedance matching coil that is connected with described first filter circuit; With
One second filter circuit, it is connected on the described impedance matching coil, comprises a diode and an electric capacity,
The output of the output of described first output, second output and the output of level coil for the third time are coupled mutually to produce the high-frequency high-voltage signal.
2. voltage generator as claimed in claim 1, the electric capacity of the wherein said second input oscillating circuit comprises a polyester electric capacity, and its withstand voltage is at least the twice of AC supply voltage, and this polyester electric capacity is by insulation shell shielding and use epoxy resin pattern.
3. voltage generator as claimed in claim 1, the electric capacity of the capacitor of the wherein said second input oscillating circuit is less than 1 μ F.
4. voltage generator as claimed in claim 1, the resistance of the wherein said first input oscillating circuit is a ceramic variable resistor, has determined the charge/discharge time constant of coupled capacitor.
5. voltage generator as claimed in claim 1, wherein the 3rd input withstand voltage with electric capacity second parallel connection of primary windings oscillating circuit is the twice of AC supply voltage at least.
6. voltage generator as claimed in claim 1, wherein said booster transformer comprise a segmentation bobbin, are wound with coil on it, and the number of turn that bobbin is every section is 300 or still less.
7. voltage generator as claimed in claim 1, the diameter of the wherein said coil of level for the third time is less than other two secondary coils, and its number of turn is greater than other two secondary coils.
8. voltage generator as claimed in claim 1 also comprises a cooling device that is attached to booster transformer, and is overheated to prevent described booster transformer.
CNB031555608A 1998-07-27 1998-12-11 Method for cleaning harmfel gas by using gas laser and electron-beam irradiation and its equipment Expired - Fee Related CN1260748C (en)

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