CN1232626C - Cleaning agent - Google Patents
Cleaning agent Download PDFInfo
- Publication number
- CN1232626C CN1232626C CN 01128510 CN01128510A CN1232626C CN 1232626 C CN1232626 C CN 1232626C CN 01128510 CN01128510 CN 01128510 CN 01128510 A CN01128510 A CN 01128510A CN 1232626 C CN1232626 C CN 1232626C
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- CN
- China
- Prior art keywords
- clean
- cleaning
- present
- out system
- carbon atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000012459 cleaning agent Substances 0.000 title abstract description 6
- 239000000654 additive Substances 0.000 claims abstract description 12
- 230000000996 additive effect Effects 0.000 claims abstract description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000001335 aliphatic alkanes Chemical class 0.000 claims abstract description 4
- 239000000203 mixture Substances 0.000 claims description 10
- 150000002430 hydrocarbons Chemical class 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- -1 alkane ketone Chemical class 0.000 claims description 3
- 239000008139 complexing agent Substances 0.000 claims description 3
- 239000012188 paraffin wax Substances 0.000 claims description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 7
- 238000004140 cleaning Methods 0.000 abstract description 7
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 abstract description 4
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 abstract description 4
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052731 fluorine Inorganic materials 0.000 abstract description 3
- 239000011737 fluorine Substances 0.000 abstract description 3
- 239000011347 resin Substances 0.000 abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 3
- 150000002576 ketones Chemical class 0.000 abstract description 2
- 238000004506 ultrasonic cleaning Methods 0.000 abstract description 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 abstract 1
- 239000003344 environmental pollutant Substances 0.000 abstract 1
- 238000007654 immersion Methods 0.000 abstract 1
- 231100000719 pollutant Toxicity 0.000 abstract 1
- 239000002689 soil Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 229960004418 trolamine Drugs 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- MWDWMQNTNBHJEI-UHFFFAOYSA-N 1,1,2,3,3-pentafluoropropane Chemical compound FC(F)C(F)C(F)F MWDWMQNTNBHJEI-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 150000004699 copper complex Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000005826 halohydrocarbons Chemical class 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 229910017053 inorganic salt Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- GOLXNESZZPUPJE-UHFFFAOYSA-N spiromesifen Chemical compound CC1=CC(C)=CC(C)=C1C(C(O1)=O)=C(OC(=O)CC(C)(C)C)C11CCCC1 GOLXNESZZPUPJE-UHFFFAOYSA-N 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 230000002087 whitening effect Effects 0.000 description 1
Landscapes
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The present invention relates to a cleaning agent which is suitable for electronic industry. The cleaning agent is composed of the following components according to the percentage by weight: 10 to 85% of alkane with 3 to 9 carbon atoms, 1 to 30% of ketone with 3 to 8 carbon atoms, 1 to 30% of ether with 3 to 10 carbon atoms, 1 to 30% of alcohol with 1 to 3 carbon atoms, and 0.01 to 10% of additive. The present invention is composed of chlorocarbon substances without fluorine, so the present invention has no environment pollution and good capacity for cleaning rosin, resin, oily soil and pollutants, and the present invention can dry quickly after cleaning. The present invention can be used for cleaning electronic devices and PCB by both immersion cleaning and ultrasonic cleaning.
Description
Technical field:
The present invention relates to the clean-out system of electronics, mechanical industry, particularly relate to rosiny leaning solvent on greasy dirt on the objects such as being applicable to clean metal, pottery and the wiring board.
Background technology:
At present; electronics; advancing by leaps and bounds of electrician trade; the soldering that matches is with it also proposed higher requirement with material; simultaneously; the importance of HUMAN HEALTH is also more and more paid attention to by people; advocate and taked a series of measures by developed country; be used to improve the global environment that the mankind depend on for existence; United Nations's Environmental Protection Administration has also proposed the requirement of the material of the harmful atmospheric environment of time limit change; and the electron and electrician industry is because very high to the reliability requirement of portioned product; must after producing welding, clean product; and the clean-out system major part of using now is fluorine-containing; the hydrocarbon compound of chlorine substituent; this type of material has serious destruction to atmospheric ozone layer; belong to necessary time limit that United Nations proposes and forbid the scope of producing and using, this type of material of while hazardness very big to operative employee's healthy same existence is at above factor; the electron and electrician industry presses for to be transformed existing clean-out system, to reach the purpose of protection human health and atmospheric environment.Wherein a measure is exactly the clean-out system that clean-out system is made not contain into the fluorochlorohydrocarbon class.The domestic research institute that how tame clean-out system once occurred, some unit has developed aqueous cleaning agent, " a kind of acidic water-based cleaning agent for metals " of the southern power machine of the notification number announced as Chinese patent 1067275 company, this clean-out system contains carboxylic acid, esters surface active agent and inorganic salts, described carboxylic acid contains 2-7 C, the alkyd of at least one carboxyl and a carboxyl, described esters surface active agent is an alkyl phosphate, described inorganic salt are vitriol, but most of electronic products is avoided and is washed with water, makes that aqueous cleaning agent is promoted aspect PCB and utilization is very restricted.
The organic solvent type clean-out system has appearred again subsequently, the notification number of announcing as Chinese patent is 1045134 Chengdu organic chemistry institutes " a kind of remove the multi-component high-efficient detergent that solder flux is used ", this clean-out system is by Nitromethane 99Min., acetonitrile, ethyl acetate, 1,1,1-trichloroethane, and Virahol or propyl alcohol or ethanol composition, also " 1 of notification number 1078257 U.S. United info stock Co., Ltd that announce just like Chinese patent, 1,2,3, the azeotropic shape composition of 3-pentafluoropropane ", this clean-out system is to contain 1,1,2,3,3-pentafluoropropane and methyl alcohol or ethanol and the composition that contains Nitromethane 99Min..Though the clean-out system of these organic types has stability preferably, and the workpiece that is cleaned is not had corrosion, seepage force is stronger, can remove solder flux and degreasing effectively, toxicity is low, but hydrocarbons still fluorine-containing in clean-out system, chlorine.
Summary of the invention:
The object of the present invention is to provide a kind of syntheticly, the ability of good cleaning rosin, resin, greasy dirt, pollutent is arranged, and it is fast to clean after drying by no fluorochlorohydrocarbon class material; Both can be used to embathe electronic component, can be used for the clean-out system of ultrasonic cleaning again.
Clean-out system of the present invention, composed of the following components by weight percentage
C
3-C
9Alkane 10-90%
C
3-C
8Ketone 1-30%
C
3-C
10Ether 1-30%
C
1-C
3Alcohol 1-30%
Additive 0.01-10%
Alkane is naphthenic hydrocarbon or straight-chain paraffin, and ketone is naphthenone or straight alkane ketone, and ether is straight chain alkane ether, and alcohol is monohydroxy-alcohol; Additive is the mixture of synergy with nonionogenic tenside, inhibiter, complexing agent.
The preparation method that it is concrete:
1, with 1-2 kind C
3-C
9Alkane 10-90%, 1-2 kind C
3-C
8Ketone 1-30%, C
3-C
10Ether 1-30%, C
1-C
3Alcohol 1-30% joins in the reactor, stirs 30-40 minute, forms mixture.
2, in mixture, slowly splash into additive by weight proportion; After dropwising, restir 10-15 minute, obtain clean-out system of the present invention.
Clean-out system among the present invention does not contain the halohydrocarbon such as freonll-11 that atmospheric ozone layer had destruction, and its hydrocarbons is naphthenic hydrocarbon or straight-chain paraffin, its polarity and C
1-C
5The polarities match of alcohol, with in the ethers-in o-key and the ketone
Bond polarity is complementary; has tensio-active agent in the additive; inhibiter, complexing agent; be cleaned that metal object smooth finish is good, not oxidation; being cleaned PCB does not return white; the greasy dirt that is cleaned surfaces such as metal such as copper, aluminium is cleaned; the components and parts of PCB generally all are zinc-plated; the position of leaking copper is arranged once in a while; also do not corrode not patination, rosin that it is surperficial and additive reaction owing to generate the copper complex of protectiveness; be dissolved in wherein and form the material be soluble in clean-out system, do not contain and remain in PCB surface whitening look.
Clean-out system of the present invention detects the synopsis of data and normal data
| Test item | Normal data | Detected result | |
| I | II | ||
| Outward appearance | Clear | Clear | Clear |
| Smell | Free from extraneous odour | Free from extraneous odour | Free from extraneous odour |
| Acidity (% is in HCI) | ≤0.001 | ＜0.001 | ＜0.001 |
| Moisture content (%) | ≤0.05 | 0.01 | 0.01 |
| Evaporation residue (%) | ≤0.01 | 0.005 | 0.001 |
Clean-out system of the present invention and like product detect the data synopsis
| Test item | Detect data | Contrasting data * | |
| Outward appearance | Clear | Clear | |
| Smell | Free from extraneous odour | Free from extraneous odour | |
| Acidity (% is in HCI) | 0.001 | 0.02 | |
| Moisture content (%) | 0.04 | 0.05 | |
| Evaporation residue (%) | 0.005 | 0.01 | |
| Washing power (%) | Clean greasy dirt | 92 | 93 |
| Clean rosin | 91 | 90 | |
| PH value | 6.5 | 6.5 | |
*Contrasting data is the import clean-out system.
Clean-out system of the present invention is slightly better than external product aspect the cleaning resin, and slightly poor what compare aspect the cleaning greasy dirt.
Description of drawings:
Accompanying drawing is preparation technology's schema of the present invention.
The C that A is weight percentage
3-C
9Alkane;
The C that B is weight percentage
3-C
8Ketone;
The C that C is weight percentage
3-C
10Ether;
The C that D is weight percentage
1-C
3Alcohol;
E is an intermediate blend;
F is an additive;
G is a clean-out system of the present invention.
1 normal temperature and pressure stirred 30-40 minute down
2 stirred 10-20 minute
Embodiment:
Below in conjunction with the drawings and specific embodiments explanation the present invention.
Embodiment 1:A is the hexanaphthene of 70% (weight); B is the pimelinketone of 10% (weight); C is the ethylene glycol ethyl ether of 8% (weight); D is the Virahol of 10% (weight); F is the additive of 2% (weight), and additive is the mixture of trolamine and ethyl acetate.
Embodiment 2:A is the heptane of 65% (weight); B is the pimelinketone of 8% (weight); C is the butyl glycol ether of 7% (weight); D is 18.5% (weight) Virahol; F is the additive of 1.5% (weight), and additive is the mixture of trolamine and ethyl acetate.
Claims (1)
1. clean-out system that is applicable to electron trade, by following component by weight percentage ratio form:
C
3-C
9Naphthenic hydrocarbon or straight-chain paraffin 10-90%
C
3-C
8Naphthenone or straight alkane ketone 1-30%
C
3-C
10Straight chain alkane ether 1-30%
C
1-C
3Monohydroxy-alcohol 1-30%
Additive is the mixture 0.01-10% of complexing agent, inhibiter, nonionogenic tenside.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01128510 CN1232626C (en) | 2001-07-25 | 2001-07-25 | Cleaning agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 01128510 CN1232626C (en) | 2001-07-25 | 2001-07-25 | Cleaning agent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1398957A CN1398957A (en) | 2003-02-26 |
| CN1232626C true CN1232626C (en) | 2005-12-21 |
Family
ID=4668359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 01128510 Expired - Fee Related CN1232626C (en) | 2001-07-25 | 2001-07-25 | Cleaning agent |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN1232626C (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MXPA04010525A (en) * | 2002-04-23 | 2005-06-08 | Sonic Environmental Solutions | Sonication treatment of polychlorinated biphenyl contaminated media. |
| CN101319171B (en) * | 2008-07-23 | 2011-01-26 | 重庆四胜电气有限公司 | Electrotechnical ceramic cleaning fluid |
| CN102660408B (en) * | 2012-04-20 | 2014-04-16 | 东莞市新球清洗科技有限公司 | Circuit board cleaning agent replacing trichloroethylene |
| CN103194331A (en) * | 2013-03-29 | 2013-07-10 | 深圳市同方新源科技有限公司 | Cleaning agent for electronics and preparation method thereof |
| CN104099194A (en) * | 2013-04-03 | 2014-10-15 | 东莞市剑鑫电子材料有限公司 | Circuit board cleaning agent and preparation method thereof |
| CN103555447A (en) * | 2013-10-30 | 2014-02-05 | 合肥市华美光电科技有限公司 | Water-based computer printed circuit board cleaning agent and preparation method thereof |
| CN105039025A (en) * | 2015-06-04 | 2015-11-11 | 宁夏共享化工有限公司 | Cleaning agent for cleaning 3D-type sand printing head and preparation method of cleaning agent |
| CN105296208A (en) * | 2015-11-25 | 2016-02-03 | 深圳市裕满实业有限公司 | Environment-friendly type circuit board cleaning agent and preparation method thereof |
| CN105802758B (en) * | 2016-05-17 | 2019-04-05 | 江苏筑磊电子科技有限公司 | Cleaning Agent for PCB agent after fire |
| CN108531303A (en) * | 2017-08-23 | 2018-09-14 | 长沙普济生物科技股份有限公司 | A kind of agent for carbon hydrogen detergent and preparation method containing acyl amino acids surfactant |
| CN109576089A (en) * | 2018-12-31 | 2019-04-05 | 广东新球清洗科技股份有限公司 | Pcb board ultrasound agent for carbon hydrogen detergent and its application method |
| CN111073776A (en) * | 2019-12-25 | 2020-04-28 | 广东好顺欧迪斯科技股份有限公司 | Clearing agent composition and application thereof |
| CN111117816A (en) * | 2019-12-31 | 2020-05-08 | 苏州市晶协高新电子材料有限公司 | Novel welding slag cleaning agent and preparation method thereof |
| CN112877143A (en) * | 2021-01-22 | 2021-06-01 | 盐城市贝加尔电子材料有限公司 | Preparation method of acidic degreasing agent for PCB (printed circuit board) |
| CN113150883B (en) * | 2021-04-26 | 2023-05-05 | 山东京博石油化工有限公司 | Environment-friendly aerosol for vehicle and preparation method thereof |
| CN113604292A (en) * | 2021-09-13 | 2021-11-05 | 常州智高化学科技有限公司 | Modified alcohol detergent and preparation method thereof |
-
2001
- 2001-07-25 CN CN 01128510 patent/CN1232626C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN1398957A (en) | 2003-02-26 |
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| ASS | Succession or assignment of patent right |
Owner name: CHENZHOU JINJIAN SOLDER LTD. Free format text: FORMER OWNER: DENG HESHENG Effective date: 20090626 |
|
| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20090626 Address after: Science and Technology Industrial Zone, Chenzhou Development Zone, Hunan Patentee after: Chenzhou Gold Arrow Solder Co., Ltd. Address before: Hunan city in Chenzhou Province Economic and Technological Development Zone Wan Hua Lu Chenzhou Jinjian solder Co Ltd Patentee before: Deng Hesheng |
|
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20051221 Termination date: 20150725 |
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| EXPY | Termination of patent right or utility model |