CN1216739C - 相容式预制互连结构 - Google Patents

相容式预制互连结构 Download PDF

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CN1216739C
CN1216739C CN028072146A CN02807214A CN1216739C CN 1216739 C CN1216739 C CN 1216739C CN 028072146 A CN028072146 A CN 028072146A CN 02807214 A CN02807214 A CN 02807214A CN 1216739 C CN1216739 C CN 1216739C
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N·伊瓦莫托
J·佩迪戈
S·蒂斯达尔
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Honeywell International Inc
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
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Abstract

一种带有用多个导体(300)刺穿的热固层(100)的组件(10),在释放层(200)上成形后,被夹在IC和PWB或其它支撑表面之间,然后再固化。在固化热固材料之前或期间去除释放层。在固化前去除可以通过剥离来实现,在固化期间去除可以通过固化方法破坏热固层。

Description

相容式预制互连结构
技术领域
本发明涉及集成电路包装和装配。
背景技术
众所周知,使用底部填充物料在类似印刷线路板(PWB)的支持表面上装配集成电路(IC)装置以改良受热性和尺寸外观性,这种例子如美国专利5654081题目为带有底部填充体的集成电路组件,其中分析了使用特定的底部填充组件给线路板上安装倒装晶片(flip-chip)IC装置。
底部填充物料可以位于IC和表面(以下简称PWB)之间,这种装配可以在IC和PWB之间以电/冶金方式相互连接之前或之后进行。如果在电连接形成后制作,底部填充材料可以从IC和PWB间的空隙则注入,或者通过一个位于IC下部的PWB中的孔进行注入。但是,这种注入方法存在的问题是注入这种底部填充材料需要时间,难以获得底部填充材料完整均匀的分布。
如果事先形成电连接,底部填充即可以被“构建”(即印刷)在IC或PWB上面,也可以是夹在IC和PWB之间的预制式,参考的专利构建方法包括前述美国专利5654081和题为浅浮雕电路模型(Low Profile Electronic Circuit Modules)的美国专利5936847。在使用过于复杂的处理方法以及平行形成多个IC和PWB时,在IC或PWB上印刷材料不总是理想的。
使用一种无导体预制式的专利是题为带有对预制式特点的倒装集成电路包以及其形成方法的美国专利6040630。不利的是非导体预制需要在IC和PWB上使用垫或其它导体,该IC和PWB能通过该预制部扩展。
预制式包括一个已充填的初加工绝缘体结构,其中绝缘体包括一个聚合物涂膜,充填材料包括暂时为液相的被烧结材料,在题为垂直互连电路组件及其组分使用的美国专利5948533中使用这种预制式。但是,不需要在所有情况下都使用聚合物涂膜。
所以,需要提供将底部填充IC装配到支撑表面如PWB上的改良方法及装置。
发明内容
本发明提供的方法和装置包括,在释放层上形成由多个导体刺穿的热固层的组件,然后把该组件夹在IC和PWB或其它支撑表面之间,随后加工处理。这种释放层可以在热固材料处理之前或处理其间去除。在处理前去除可以通过剥离的方式完成。在处理期间的去除可以采用破坏处理层的方式。
参照用相同标号表示相同部件的附图,从下面详细说明的本发明的最佳实施例可以明确本发明的各种目的、特点、方面和优点。
附图说明
图1是探用本发明的兼容式预制互连结构的顶视图;
图2是探用本发明的兼容式预制互连结构的剖视图;
图3是探用本发明的兼容式预制互连结构中集成电路与印刷电路板配合互连的剖视图。
具体实施方式
在图1-3中,优选的预制组件10包括一个基层组件100、一个脱落层组件200和穿通导体300。
基层组件100最好包括一个B级热固材料单件。虽然可以使用热塑材料,由于热固材料能提供附加强度和稳定性,最好使用热固材料。优选B级热固材料包括但不限于:氰酸酯类、脂环族环氧树酯类、双顺丁烯二酰亚胺类(bismaleimides)、氰酸/环氧树脂共聚物、氰酸酯/双顺丁烯二酰亚胺共聚物或混合物以及环脂肪族环氧树酯/双顺丁烯二酰亚胺共聚物或混合物。虽然基层组件100优选由一单层成形,但也可以是一个多层组件。
脱落组件200包括脱落层210和释放涂层220。脱落层210最好用相低廉的材料形成的,如聚酯或赛璐珞膜。释放涂层220最好位于脱落层210和基层组件100之间,且包括有标准硅、特氟隆或石墨释放剂,如市场现有的可由ChemleaseTM和BuehlerTM得到的材料。这种材料现有的例子是POL-ESE233TM。在另一个实施例中,脱落组件200不包含释放涂层220,尤其是使用的材料具有低自然表面能和具有对其它材料低粘性的情况下,如特氟隆和调整后的聚胺。在一个次选实施例中,不除去脱落层,而是将其变或最终结构的一部分。很明显,在许多实施例中,释放涂层220的痕迹在去除脱落层100后仍然残存。
可以看出:释放涂层220与廉宜的含有聚酯或赛璐珞膜的脱落层210结合使用会有很多优点优越于任何现存的保护覆盖方法和装置,例如脱落组件200成本低廉、预制组件10容易使用、以及组件10适应性增加。
穿通导体300可以采用其它方法形成,包括将电线穿过/刺过基层组件100,或者在基层组件100中形成导电通道。穿通导体300可以穿过或不穿过脱落组件200,视以下因素而定:至少部分地根据所使用的生产方法,和使穿通导体300最终电连接的客体类型(即垫、焊球、柱或者其它类型)。因此,选择电线用于与垫连接,或者接到外壳或板子上的通道,但是,如果连接到柱或球上,最好选择通道方式。优选选择穿通导体的类型,如果穿通导体穿过脱落组件200,可以选择多种结构和生产方法。图2的实施例是通道301、302和电线303的实施例,301表示穿通导体刺穿整个互连结构,302表示刺穿基层组件100和释放涂层220,303表示只刺穿基层组件100。
如果使用导电通道,很明显这种通道应使用焊料糊,而不使用暂时液相烧结材料。如果使用穿线/热敏球成型,优选的焊料糊包括PbSn、PbSnAg、铟合金、金的共晶体/金的合金。
很明显,伸进脱落组件200的穿通导体300中可以为相应的排列稳定性提供附加的机械稳定性。
形成预制组件10的优选方法包括:提供脱落层210,带有释放涂层220的涂覆脱落底层210,在释放涂层220顶上施用热固材料100,固化热固材料100形成B级层,把穿通导体300插入热固材料100中。穿通导体300的插入最好包括把电线穿进热固材料100中,也可以采用在热固材料100中用激光打孔或钻孔再填充。采用“偏移”加工的激光通道可以提供一个较大底径痕迹,减小了在接触点定位的难度。使用预制组件10的优选方法包括:提供一个IC;提供一个机械和电气方式焊接该IC的支撑表面;将预制组件10施加在IC上或支持表面上;剥离脱落层210;把预制组件10夹在IC和支撑表面之间;固化预制组件10的基层组件。
在热固层100形成结构期间应包括机械支撑结构。在一实施例中,热固层100含有纤维筛材料,该渗入到热固层100中的纤维筛材料可以是由但不限于玻璃、石墨、聚对亚苯基对苯二酰胺(KEVLAR)、特氟隆(TEFLON)或者聚酯。对于辅助机械支撑,热固材料也可以采用微粒填充物的形式。这种填充物可以包括但不限于:钒土、硅石、石墨纤维、石墨颗粒、氮化硅、碳化硅、氮化铝、金刚石、铍和传导聚合物填料。
如果需要加强导热性,预制件可以包括使用导热材料的结构。优选实施方式是在热固材料100中加入非导电填料。该填料包括但不限于:氮化硅、碳化硅、氮化铝、氮化硼、金刚石、导体聚合物填料、石墨和矾土。在另一实施方式中使用热导筛材料与热固层100相结合的结构。在这种实施例中,导热石墨筛与热固材料相结合形成部分层100。这种热固材料可以包含或不包含导体填料结构。在特殊的实施例中,可以把物理导热层102附加预制结构上。例如,可以把铜板或变相层102作为中层附加在热固层101和103之间。热固材料可以包含或不包含传导填料结构,视导热要求而定。
以上公开了兼容式预制互连结构的典型实例和应用方式。但很明显,除了所描述的外,本领域的普通技术人员在不脱离本发明概念的范围内可以进行更多修改。因此,本发明的主题并不是局限于随附的权利要求的精神。此外,在说明书和权利要求书的解释中,所有术语可以全文一致最广范的形式进行解释。特别是术语“包括”和“包含”应是对所涉及的构件、组件或步骤的非排除式解释,表示要介绍或运用的构件、组件或步骤,或者结合有不能清楚地表达的其它构件、组件或步骤。

Claims (21)

1、一种IC组件,包括一个IC、一个支撑表面和一个将该IC和该支撑表面以机械和电气方式互连的互连机构;该互连机构包括多个被电连合到该IC和该支撑表面上的穿通导体以及一个机械连合到穿通导体、IC及支持表面上的绝缘基层,和位于该绝缘基层和IC或支撑表面之间的释放涂层痕迹;该释放涂层痕迹包含不同于IC、支撑表面、绝缘基层组分的残存组分;其特征在于,穿通导体包括电线或焊料糊,或者,绝缘基层包括渗有热固物的纤维筛材料。
2、根据权利要求1所述的IC组件,其特征在于,该IC绝缘基层包括至少由下列物质组中之一构成的材料:氰酸酯类、脂环族环氧树酯类、双顺丁烯二酰亚胺类、氰酸酯和环氧树脂共聚物、氰酸酯和双顺丁烯二酰亚胺共聚物,以及环脂肪族环氧树酯和双顺丁烯二酰亚胺共聚物。
3、根据权利要求2所述的IC组件,其特征在于,释放涂层痕迹至少部分包括硅、特氟隆或石墨释放剂的残留物。
4、根据权利要求3所述的IC组件,其特征在于,穿通导体包括埋入并穿过绝缘基层的电线。
5、根据权利要求4所述的IC组件,其特征在于,穿通导体包括焊料糊通道,该焊料糊至少包括下列一种:PbSn、PbSnAg、铟合金、Au共晶合金。
6、根据权利要求1所述的IC组件,其特征在于,绝缘基层包括渗有热固物质的纤维筛材料,该纤维筛材料至少包括下列一种物质:玻璃、石墨、聚对亚苯基对苯二酰胺(KEVLAR)、特氟隆(TEELON)和聚酯。
7、根据权利要求1所述的IC组件,其特征在于,绝缘基层包括渗有热固物质的纤维筛材料,该纤维筛材料是热导体。
8、根据权利要求1所述的IC组件,其特征在于,绝缘基层包括与微粒填料掺合的热固物质。
9、根据权利要求8所述的IC组件,其特征在于,填料至少包括以下一种:钒土、硅石、石墨纤维、石墨颗粒、氮化硅、碳化硅、氮化铝、金刚石、铍和导体聚合物填料。
10、根据权利要求8所述的IC组件,其特征在于,填料是导热、不导电的物质。
11、根据权利要求1所述的IC组件,其特征在于,绝缘基层包括夹在二热固层之间的物理导热层。
12、根据权利要求11所述的IC组件,其特征在于,导热层包括铜或变相膜。
13、一种把IC和支撑表面相结合的方法,包括:
提供一个IC;
提供一个以机械和电连接方式焊接IC的支撑表面;
提供一个预制组件,该预制组件包括一个基层和一个脱落层,该基层包括电线或焊料糊的穿通过导体,或者该基层包括渗有热固物质的纤维筛材料;
把预制组件用在IC或支持表面上;
剥离脱落层;
把剥离后的预制组件夹在IC和支撑表面之间;
固化基层。
14、根据权利要求13所述的方法,其特征在于,提供预制组件包括:
提供一个脱落层;
用释放涂层涂布脱落底层;
在释放涂层顶部使用热固物质;
固化热固物质形成B级熔层;
把穿通导体插入热固物质中。
15、根据权利要求14所述的方法,其特征在于,把穿通导体插入热固物质中的步骤包括:把电线刺穿进热固物质中,或者热固物质上用激光打孔或钻孔后,再用焊料糊充填该孔。
16、根据权利要求14所述的方法,其特征在于,释放涂层至少部分包括硅、特氟隆或石墨释放剂。
17、根据权利要求13所述的方法,其特征在于,基层包括渗有热固物质的细筛纤维材料,该细筛纤维是热导体。
18、根据权利要求13所述的方法,其特征在于,基层包括渗有热固物质的细筛纤维材料,该细筛纤维是非导电体。
19、根据权利要求13所述的方法,其特征在于,基层包括与颗粒填料相混合的热固物质。
20、根据权利要求19所述的方法,其特征在于,颗粒填料是热导体。
21、根据权利要求19所述的方法,其特征在于,颗粒填料是非导电体。
CN028072146A 2001-03-26 2002-03-07 相容式预制互连结构 Expired - Fee Related CN1216739C (zh)

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EP1379382A4 (en) 2004-06-30
JP2005503002A (ja) 2005-01-27
US6923882B2 (en) 2005-08-02
EP1379382A1 (en) 2004-01-14
WO2002076735A1 (en) 2002-10-03
KR20040030552A (ko) 2004-04-09
US20020136874A1 (en) 2002-09-26
CA2442394A1 (en) 2002-10-03
CN1500042A (zh) 2004-05-26

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