CN121587089A - 半导体装置 - Google Patents

半导体装置

Info

Publication number
CN121587089A
CN121587089A CN202480048650.5A CN202480048650A CN121587089A CN 121587089 A CN121587089 A CN 121587089A CN 202480048650 A CN202480048650 A CN 202480048650A CN 121587089 A CN121587089 A CN 121587089A
Authority
CN
China
Prior art keywords
region
layer
base layer
semiconductor substrate
fwd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202480048650.5A
Other languages
English (en)
Chinese (zh)
Inventor
本谷圭佑
高桥茂树
赤井智喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
Denso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denso Corp filed Critical Denso Corp
Publication of CN121587089A publication Critical patent/CN121587089A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/64Double-diffused metal-oxide semiconductor [DMOS] FETs
    • H10D30/66Vertical DMOS [VDMOS] FETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/80Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs

Landscapes

  • Electrodes Of Semiconductors (AREA)
CN202480048650.5A 2023-07-25 2024-07-23 半导体装置 Pending CN121587089A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023-121047 2023-07-25
JP2023121047A JP2025017799A (ja) 2023-07-25 2023-07-25 半導体装置
PCT/JP2024/026322 WO2025023245A1 (ja) 2023-07-25 2024-07-23 半導体装置

Publications (1)

Publication Number Publication Date
CN121587089A true CN121587089A (zh) 2026-02-27

Family

ID=94375356

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202480048650.5A Pending CN121587089A (zh) 2023-07-25 2024-07-23 半导体装置

Country Status (3)

Country Link
JP (1) JP2025017799A (https=)
CN (1) CN121587089A (https=)
WO (1) WO2025023245A1 (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4544360B2 (ja) * 2008-10-24 2010-09-15 トヨタ自動車株式会社 Igbtの製造方法
JP5686033B2 (ja) * 2011-04-27 2015-03-18 トヨタ自動車株式会社 半導体装置の製造方法
JP6063915B2 (ja) * 2014-12-12 2017-01-18 株式会社豊田中央研究所 逆導通igbt

Also Published As

Publication number Publication date
JP2025017799A (ja) 2025-02-06
WO2025023245A1 (ja) 2025-01-30

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