CN121549072A - 场效应晶体管 - Google Patents
场效应晶体管Info
- Publication number
- CN121549072A CN121549072A CN202480041184.8A CN202480041184A CN121549072A CN 121549072 A CN121549072 A CN 121549072A CN 202480041184 A CN202480041184 A CN 202480041184A CN 121549072 A CN121549072 A CN 121549072A
- Authority
- CN
- China
- Prior art keywords
- layer
- semiconductor substrate
- contact
- inter
- layers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/64—Double-diffused metal-oxide semiconductor [DMOS] FETs
- H10D30/66—Vertical DMOS [VDMOS] FETs
Landscapes
- Electrodes Of Semiconductors (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023124922A JP2025021163A (ja) | 2023-07-31 | 2023-07-31 | 電界効果トランジスタ |
| JP2023-124922 | 2023-07-31 | ||
| PCT/JP2024/018533 WO2025027977A1 (ja) | 2023-07-31 | 2024-05-20 | 電界効果トランジスタ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN121549072A true CN121549072A (zh) | 2026-02-17 |
Family
ID=94395044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202480041184.8A Pending CN121549072A (zh) | 2023-07-31 | 2024-05-20 | 场效应晶体管 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2025021163A (https=) |
| CN (1) | CN121549072A (https=) |
| WO (1) | WO2025027977A1 (https=) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4738562B2 (ja) | 2000-03-15 | 2011-08-03 | 三菱電機株式会社 | 半導体装置の製造方法 |
| JP5817816B2 (ja) * | 2011-04-12 | 2015-11-18 | 株式会社デンソー | 半導体装置の製造方法 |
| CN113632238B (zh) * | 2019-04-01 | 2024-08-02 | 三菱电机株式会社 | 半导体装置 |
| CN114556588B (zh) * | 2019-10-11 | 2025-08-19 | 株式会社电装 | 开关元件 |
| JP7662431B2 (ja) * | 2021-06-29 | 2025-04-15 | 株式会社豊田中央研究所 | 半導体装置 |
-
2023
- 2023-07-31 JP JP2023124922A patent/JP2025021163A/ja active Pending
-
2024
- 2024-05-20 CN CN202480041184.8A patent/CN121549072A/zh active Pending
- 2024-05-20 WO PCT/JP2024/018533 patent/WO2025027977A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2025021163A (ja) | 2025-02-13 |
| WO2025027977A1 (ja) | 2025-02-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |