CN120858497A - 激光装置以及光学元件的劣化判定方法 - Google Patents

激光装置以及光学元件的劣化判定方法

Info

Publication number
CN120858497A
CN120858497A CN202380095495.8A CN202380095495A CN120858497A CN 120858497 A CN120858497 A CN 120858497A CN 202380095495 A CN202380095495 A CN 202380095495A CN 120858497 A CN120858497 A CN 120858497A
Authority
CN
China
Prior art keywords
optical element
output data
laser
laser device
calculated based
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202380095495.8A
Other languages
English (en)
Chinese (zh)
Inventor
河野夏彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Gigaphoton Inc
Original Assignee
Gigaphoton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gigaphoton Inc filed Critical Gigaphoton Inc
Publication of CN120858497A publication Critical patent/CN120858497A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0207—Details of measuring devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/136—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling devices placed within the cavity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/139—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
CN202380095495.8A 2023-04-14 2023-04-14 激光装置以及光学元件的劣化判定方法 Pending CN120858497A (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/015219 WO2024214298A1 (ja) 2023-04-14 2023-04-14 レーザ装置及び光学素子の劣化判定方法

Publications (1)

Publication Number Publication Date
CN120858497A true CN120858497A (zh) 2025-10-28

Family

ID=93059251

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202380095495.8A Pending CN120858497A (zh) 2023-04-14 2023-04-14 激光装置以及光学元件的劣化判定方法

Country Status (4)

Country Link
US (1) US20260002833A1 (https=)
JP (1) JPWO2024214298A1 (https=)
CN (1) CN120858497A (https=)
WO (1) WO2024214298A1 (https=)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07245437A (ja) * 1994-03-04 1995-09-19 Toshiba Corp ガスレーザ発振器の出力ミラーの寿命判定方法及びその装置並びにレーザ加工機
JPH11330592A (ja) * 1998-05-19 1999-11-30 Nikon Corp レーザ光源装置およびそれを備えた露光装置
JP2000012923A (ja) * 1998-06-26 2000-01-14 Sumitomo Heavy Ind Ltd レーザ加工装置の光学部品の劣化診断装置及び方法
JP2001177165A (ja) * 1999-12-15 2001-06-29 Ushio Sogo Gijutsu Kenkyusho:Kk 加工用レーザ装置の光学部品モニタ装置
US6890474B2 (en) * 2001-05-08 2005-05-10 Spectra Physics, Inc. Algorithm for enhancing the lifetime of critical components in a laser system
US7378636B2 (en) * 2002-02-13 2008-05-27 Riken Method of evaluating non-linear optical crystal and device therefor and wavelength conversion method and device therefor
JP4197435B2 (ja) * 2003-01-21 2008-12-17 パナソニック株式会社 レーザ装置
JP2009260143A (ja) * 2008-04-18 2009-11-05 Toshiba Corp 光軸補正装置
WO2014038584A1 (ja) * 2012-09-07 2014-03-13 ギガフォトン株式会社 レーザ装置及びレーザ装置の制御方法
LT2933681T (lt) * 2014-04-14 2020-08-25 Deutsches Elektronen-Synchrotron Desy Baltosios šviesos generavimo naudojant kaitinimo siūlą būdas ir įrenginys
DE102014218353B4 (de) * 2014-09-12 2020-03-12 Crylas Crystal Laser Systems Gmbh Laseranordnung und Verfahren zur Erhöhung der Lebensdaueroptischer Elemente in einer Laseranordnung
CN112166534A (zh) * 2018-05-03 2021-01-01 宽腾矽公司 表征光学元件
JP7781162B2 (ja) * 2021-08-05 2025-12-05 ギガフォトン株式会社 ガスレーザ装置及び電子デバイスの製造方法

Also Published As

Publication number Publication date
JPWO2024214298A1 (https=) 2024-10-17
US20260002833A1 (en) 2026-01-01
WO2024214298A1 (ja) 2024-10-17

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