CN118235091A - 转印膜、具有导体图案的层叠体及具有导体图案的层叠体的制造方法、转印膜的制造方法 - Google Patents

转印膜、具有导体图案的层叠体及具有导体图案的层叠体的制造方法、转印膜的制造方法 Download PDF

Info

Publication number
CN118235091A
CN118235091A CN202280074098.8A CN202280074098A CN118235091A CN 118235091 A CN118235091 A CN 118235091A CN 202280074098 A CN202280074098 A CN 202280074098A CN 118235091 A CN118235091 A CN 118235091A
Authority
CN
China
Prior art keywords
photosensitive composition
meth
composition layer
compound
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202280074098.8A
Other languages
English (en)
Chinese (zh)
Inventor
佐藤守正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN118235091A publication Critical patent/CN118235091A/zh
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/32—Layered products comprising a layer of synthetic resin comprising polyolefins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04—Interconnection of layers
    • B32B7/06—Interconnection of layers permitting easy separation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2323/00—Polyalkenes
    • B32B2323/10—Polypropylene

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
CN202280074098.8A 2021-11-30 2022-10-27 转印膜、具有导体图案的层叠体及具有导体图案的层叠体的制造方法、转印膜的制造方法 Pending CN118235091A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021194465 2021-11-30
JP2021-194465 2021-11-30
PCT/JP2022/040086 WO2023100553A1 (ja) 2021-11-30 2022-10-27 転写フィルム、導体パターンを有する積層体及び導体パターンを有する積層体の製造方法、転写フィルムの製造方法

Publications (1)

Publication Number Publication Date
CN118235091A true CN118235091A (zh) 2024-06-21

Family

ID=86611855

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202280074098.8A Pending CN118235091A (zh) 2021-11-30 2022-10-27 转印膜、具有导体图案的层叠体及具有导体图案的层叠体的制造方法、转印膜的制造方法

Country Status (5)

Country Link
JP (1) JPWO2023100553A1 (https=)
KR (1) KR102879919B1 (https=)
CN (1) CN118235091A (https=)
TW (1) TW202334748A (https=)
WO (1) WO2023100553A1 (https=)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3797332B2 (ja) 1999-03-18 2006-07-19 日立化成工業株式会社 感光性エレメント、これを用いたレジストパターンの製造法、プリント配線板の製造法及びリードフレームの製造法
JP2004191648A (ja) * 2002-12-11 2004-07-08 Hitachi Chem Co Ltd 感光性エレメント、これを用いたレジストパターンの形成方法及びプリント配線板の製造方法
WO2014175274A1 (ja) * 2013-04-24 2014-10-30 日立化成株式会社 感光性エレメント、感光性エレメントロール、レジストパターンの製造方法及び電子部品

Also Published As

Publication number Publication date
JPWO2023100553A1 (https=) 2023-06-08
TW202334748A (zh) 2023-09-01
KR20240090361A (ko) 2024-06-21
KR102879919B1 (ko) 2025-11-03
WO2023100553A1 (ja) 2023-06-08

Similar Documents

Publication Publication Date Title
WO2021199996A1 (ja) 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び感光性転写材料用仮支持体
JP2025188224A (ja) 積層体の製造方法、回路配線基板の製造方法、転写フィルム
CN116018262B (zh) 感光性转印材料、树脂图案的制造方法、蚀刻方法及电子器件的制造方法
JP7692423B2 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
JP7342246B2 (ja) 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法及びタッチパネルの製造方法
WO2023145156A1 (ja) 転写フィルム及び導体パターン形成方法
JP2023007384A (ja) 積層体、転写フィルム、パターン形成方法、回路配線の製造方法
WO2021161965A1 (ja) 感光性フィルム、及び感光性フィルムの製造方法
KR102879919B1 (ko) 전사 필름, 도체 패턴을 갖는 적층체 및 도체 패턴을 갖는 적층체의 제조 방법, 전사 필름의 제조 방법
JP7742236B2 (ja) 転写フィルム、積層体の製造方法、導体パターンを有する積層体の製造方法
JP7848140B2 (ja) 積層体の製造方法、回路配線の製造方法、転写フィルム
JP7787089B2 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
JP7844123B2 (ja) 感光性組成物、転写フィルム及び導体パターンを有する積層体の製造方法
JP7416910B2 (ja) 感光性転写材料、樹脂パターンの製造方法、回路配線の製造方法、及び感光性転写材料用仮支持体
CN118707808A (zh) 卷绕体、树脂图案的制造方法、具有导体图案的层叠体的制造方法
CN119179235A (zh) 卷绕体、具有树脂图案的层叠体的制造方法、具有导体图案的层叠体的制造方法
CN116981996A (zh) 转印膜、层叠体的制造方法、电路配线的制造方法
CN116249939A (zh) 感光性转印材料、树脂图案的制造方法、电路配线的制造方法及电子设备的制造方法
KR20230033612A (ko) 전사 필름, 도체 패턴을 갖는 적층체의 제조 방법
TW202311872A (zh) 具有導體圖案之積層體之製造方法、轉印膜
CN116745697A (zh) 感光性转印材料、树脂图案的制造方法、电路配线的制造方法及触摸面板的制造方法
KR20230032894A (ko) 도체 패턴을 갖는 적층체의 제조 방법 및 전사 필름
WO2022131324A1 (ja) 転写フィルム、積層体の製造方法、回路配線の製造方法
JP2022184719A (ja) 転写フィルム、積層体、パターン形成方法、回路配線の製造方法
CN116981997A (zh) 具有导体图案的层叠体的制造方法

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination