CN117826535A - Manufacturing method of nano-imprinting adhesive layer for optical element - Google Patents

Manufacturing method of nano-imprinting adhesive layer for optical element Download PDF

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Publication number
CN117826535A
CN117826535A CN202211188560.5A CN202211188560A CN117826535A CN 117826535 A CN117826535 A CN 117826535A CN 202211188560 A CN202211188560 A CN 202211188560A CN 117826535 A CN117826535 A CN 117826535A
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China
Prior art keywords
adhesive layer
imprinting
nano
optical element
manufacturing
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CN202211188560.5A
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Chinese (zh)
Inventor
林晓辉
孙易安
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Shanghai Yujue Technology Co ltd
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Shanghai Yujue Technology Co ltd
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Priority to CN202211188560.5A priority Critical patent/CN117826535A/en
Publication of CN117826535A publication Critical patent/CN117826535A/en
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Abstract

The invention discloses a method for manufacturing a nano imprinting adhesive layer for an optical element, which comprises the following steps of S1, preparing imprinting adhesive; s11: selecting a material; s12: mixing the raw materials; s2: preparing an imprinting adhesive layer; s21: preparing a substrate; s22: coating a fence; s23: coating an imprinting adhesive layer; s24: intermittent coverage is repeatedly coated; s25: stamping the adhesive layer; s3: etching the adhesive layer to obtain an imprinting adhesive layer; according to the invention, the first adhesive layer is uniformly coated on the substrate in a mode of writing the zigzag lines or the cloud Lei Wen, so that the adhesive is uniformly diffused, meanwhile, when the adhesive layer is formed, the thickness of the adhesive layer is the maximum thickness of each position of the adhesive layer, and the other areas with smaller thickness are improved through subsequent coverage repeated coating, namely, the second adhesive layer, so that the formation of the adhesive layer is more reasonable.

Description

Manufacturing method of nano-imprinting adhesive layer for optical element
Technical Field
The invention particularly relates to the technical field of nano-imprinting glue, in particular to a method for manufacturing a nano-imprinting glue layer for an optical element.
Background
Among the current AR solutions in all kinds, the most mass-production possible solution is the optical waveguide solution. The nano-imprinting technology is needed in the mass production of the optical waveguide. In the process of stamping the product, the glue needs to be uniformly coated on the glass, and a spin coating mode is generally selected. In this way, a glue layer with uniform thickness distribution can be obtained, and the general deviation can be controlled within +/-2%.
After imprinting, residual glue with inconsistent thickness is formed due to consistent glue thickness, and the thickness deviation of the residual glue is more than 100 nm. This thickness deviation has a great influence on the high quality propagation of the internal optical path, and may also destroy the total reflection conditions within the waveguide, resulting in a part of the light being coupled out of the waveguide, causing optical path leakage and energy loss.
Through retrieval, the patent with the Chinese patent publication number of CN113900354A discloses a manufacturing method of a nano-imprinting adhesive layer and an optical element, and the manufacturing method of the nano-imprinting adhesive layer comprises the following steps: step S10: coating glue on a substrate and forming a glue layer with uniform thickness; step S20: the mask plate is placed over the glue layer to form an intermediate piece. Although the above method improves the problems to some extent, the effect is still not ideal.
Disclosure of Invention
The invention aims to solve the defects in the prior art, and provides a manufacturing method of a nano-imprinting adhesive layer for an optical element.
In order to achieve the above purpose, the present invention adopts the following technical scheme:
the preparation method of the nano-imprinting adhesive layer for the optical element comprises the following steps:
s1, preparing impression compound;
s11: selecting materials, namely base resin, active monomers, a photoinitiator, a stabilizer, a leveling agent, a defoaming agent, a plasticizer and a coupling agent; specifically, an crafty polyether modified epoxy acrylic resin is selected as a base resin;
s12: mixing raw materials, mixing base resin and active monomer in a container to obtain a mixed solution thereof, sequentially adding a photoinitiator, a stabilizer, a leveling agent, a defoaming agent, a plasticizer and a coupling agent, and heating at constant temperature until the monomers polymerize to obtain the imprinting glue;
s2: preparing an imprinting adhesive layer;
s21: preparing a substrate; selecting a pet substrate;
s22: coating a fence; selecting a pet solvent in a molten state, and coating a fence on the substrate;
s23: coating an imprinting adhesive layer; uniformly coating the stamping glue in the fence of the substrate in a writing mode of a zigzag pattern or cloud Lei Wen by using glue coating equipment to form a first glue layer;
s24: intermittent coverage is repeatedly coated; coating a second adhesive layer by using the method of S23, wherein the starting point of the second adhesive layer is selected in the gap of the first adhesive layer;
s25: stamping the adhesive layer; after finishing the repeated coating of S24, selecting a transparent imprinting template to imprint the adhesive layer;
s3: and etching the adhesive layer to obtain the imprinting adhesive layer.
Further, the reactive monomer is one of 1, 6-hexanediol methoxy monoacrylate or ethoxylated neopentyl glycol methoxy monoacrylate.
Based on the scheme, the photoinitiator is one of acyl phosphine oxide, phthalide ketal or acetophenone, michler's ketone and benzophenone.
As a still further scheme of the invention, the stabilizer is one or more of benzene diphenol, p-methoxyphenol, 2, 6-di-tert-butyl cresol, phenothiazine or anthraquinone.
Further, the leveling agent is one or more of polyacrylate, cellulose acetate butyrate, nitrocellulose and polyvinyl butyral.
Based on the scheme, the defoaming agent is phosphate or fatty acid ester, and the plasticizer is di (2-ethylhexyl) phthalate or diethyl phthalate.
As a still further aspect of the present invention, the coupling agent is gamma-propyl methacrylate trimethoxysilane or gamma-aminopropyl triethoxysilane.
Further, the surface layer of the substrate is coated with a hexamethyldisilazane layer.
On the basis of the above scheme, in the S24 process, the number of the glue layers is at least two.
The beneficial effects of the invention are as follows:
1. by uniformly coating the first adhesive layer on the substrate in a mode of writing the zigzag lines or the cloud Lei Wen, the adhesive is uniformly diffused, meanwhile, when the adhesive layer is formed, the thickness of the adhesive layer is the maximum thickness of each position of the adhesive layer, and the other areas with thinner thickness are improved through subsequent coverage repeated coating, namely, the second adhesive layer, so that the adhesive layer is formed more reasonably.
Drawings
Fig. 1 is a schematic flow chart of a method for manufacturing a nano-imprinting adhesive layer for an optical element according to the present invention;
fig. 2 is a schematic diagram of a pen with a zigzag pattern in embodiment 1 of a method for manufacturing a nano-imprinting adhesive layer for an optical element according to the present invention;
fig. 3 is a schematic drawing of a pen-up pattern of example 2 Yun Lei of a method for manufacturing a nano-imprinting adhesive layer for an optical element according to the present invention.
In the figure: the first glue layer of the A-shape pattern, the second glue layer of the B-shape pattern and the first glue layer of the C-cloud thunder pattern and the second glue layer of the D-cloud thunder pattern are taken as the coating starting points.
Detailed Description
The following description of the embodiments of the present invention will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present invention, but not all embodiments.
Example 1
Referring to fig. 1 and 2, a method for manufacturing a nano-imprinting adhesive layer for an optical element includes the following steps:
s1, preparing impression compound;
s11: selecting materials, namely base resin, active monomers, a photoinitiator, a stabilizer, a leveling agent, a defoaming agent, a plasticizer and a coupling agent; specifically, an crafty polyether modified epoxy acrylic resin is selected as a base resin;
s12: mixing raw materials, mixing base resin and active monomer in a container to obtain a mixed solution thereof, sequentially adding a photoinitiator, a stabilizer, a leveling agent, a defoaming agent, a plasticizer and a coupling agent, and heating at constant temperature until the monomers polymerize to obtain the imprinting glue;
s2: preparing an imprinting adhesive layer;
s21: preparing a substrate; selecting a pet substrate;
s22: coating a fence; selecting a pet solvent in a molten state, and coating a fence on the substrate;
s23: coating an imprinting adhesive layer; uniformly coating the stamping glue in a fence of the substrate in a writing mode of a zigzag pattern by using glue coating equipment to form a first glue layer;
s24: intermittent coverage is repeatedly coated; coating a second adhesive layer by using the method of S23, wherein the starting point of the second adhesive layer is selected in the gap of the first adhesive layer;
s25: stamping the adhesive layer; after finishing the repeated coating of S24, selecting a transparent imprinting template to imprint the adhesive layer;
s3: and etching the adhesive layer to obtain the imprinting adhesive layer.
The active monomer is one of 1, 6-hexanediol methoxy monoacrylate or ethoxylated neopentyl glycol methoxy monoacrylate, so that the viscosity of the monomer can be reduced, and the irritation of the monomer can be reduced;
the photoinitiator is one of acylphosphine oxide, phthalide ketal or acetophenone, michler's ketone and benzophenone, wherein the common acylphosphine oxide comprises BAPO,819 and TIM, the photoinitiator molecule is excited after absorbing ultraviolet light energy, and the molecule covalent bond in the excited state is broken to generate free radicals.
The stabilizer is one or more of benzene diphenol, p-methoxyphenol, 2, 6-di-tert-butylphenol, phenothiazine or anthraquinone, and is used for reducing polymerization during storage and improving the storage stability of the resin;
the leveling agent is one or more of polyacrylate, cellulose acetate butyrate, nitrocellulose and polyvinyl butyral, and is used for improving the leveling property of the resin and preventing the occurrence of coating defects such as shrinkage cavity, needle eye and the like;
the defoamer is phosphate or fatty acid ester, the plasticizer is di (2-ethylhexyl) phthalate or diethyl phthalate, and the defoamer is used for preventing and eliminating bubbles generated in the manufacturing and using processes of the coating and preventing defects such as pinholes and the like generated in the coating;
the coupling agent is gamma-methylacrylic acid propyl trimethoxy silane or gamma-aminopropyl triethoxy silane, and the two materials with different properties and sizes are firmly combined.
The surface layer of the substrate is coated with hexamethyldisilazane layers, and the number of the adhesive layers is at least two in the S24 process.
Example 2
Referring to fig. 1 and 3, this embodiment is different from embodiment 1 in step S23: in this embodiment:
s23: coating an imprinting adhesive layer; the imprinting glue is uniformly coated in the fence of the substrate in a writing mode of a zigzag pattern or cloud Lei Wen by using glue coating equipment to form a first glue layer.
Working principle: when the coating is used, the first adhesive layer is uniformly coated on the substrate in a mode of writing the zigzag lines or the cloud Lei Wen, so that the adhesive is uniformly diffused, meanwhile, when the adhesive layer is formed, the thickness of the adhesive layer is the maximum thickness of each position of the adhesive layer, and the other areas with thinner thickness are improved through subsequent repeated coating of the coverage, namely, the second adhesive layer, so that the adhesive layer is formed more reasonably.
The foregoing is only a preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art, who is within the scope of the present invention, should make equivalent substitutions or modifications according to the technical scheme of the present invention and the inventive concept thereof, and should be covered by the scope of the present invention.

Claims (9)

1. The method for manufacturing the nano-imprinting adhesive layer for the optical element is characterized by comprising the following steps of:
s1, preparing impression compound;
s11: selecting materials, namely base resin, active monomers, a photoinitiator, a stabilizer, a leveling agent, a defoaming agent, a plasticizer and a coupling agent; specifically, an crafty polyether modified epoxy acrylic resin is selected as a base resin;
s12: mixing raw materials, mixing base resin and active monomer in a container to obtain a mixed solution thereof, sequentially adding a photoinitiator, a stabilizer, a leveling agent, a defoaming agent, a plasticizer and a coupling agent, and heating at constant temperature until the monomers polymerize to obtain the imprinting glue;
s2: preparing an imprinting adhesive layer;
s21: preparing a substrate; selecting a pet substrate;
s22: coating a fence; selecting a pet solvent in a molten state, and coating a fence on the substrate;
s23: coating an imprinting adhesive layer; uniformly coating the stamping glue in the fence of the substrate in a writing mode of a zigzag pattern or cloud Lei Wen by using glue coating equipment to form a first glue layer;
s24: intermittent coverage is repeatedly coated; coating a second adhesive layer by using the method of S23, wherein the starting point of the second adhesive layer is selected in the gap of the first adhesive layer;
s25: stamping the adhesive layer; after finishing the repeated coating of S24, selecting a transparent imprinting template to imprint the adhesive layer;
s3: and etching the adhesive layer to obtain the imprinting adhesive layer.
2. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the active monomer is one of 1, 6-hexanediol methoxy monoacrylate or ethoxylated neopentyl glycol methoxy monoacrylate.
3. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the photoinitiator is one of acyl phosphine oxide, phthalide ketal or acetophenone, michler's ketone and benzophenone.
4. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the stabilizer is one or more of benzene diphenol, p-methoxyphenol, 2, 6-di-tert-butyl cresol, phenothiazine or anthraquinone.
5. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the leveling agent is one or more of polyacrylate, cellulose acetate butyrate, nitrocellulose and polyvinyl butyral.
6. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the defoamer is phosphate or fatty acid ester, and the plasticizer is di (2-ethylhexyl) phthalate or diethyl phthalate.
7. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the coupling agent is gamma-methacrylic acid propyl trimethoxy silane or gamma-aminopropyl triethoxy silane.
8. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: the surface layer of the substrate is coated with a hexamethyldisilazane layer.
9. The method for manufacturing a nano-imprinting adhesive layer for an optical element according to claim 1, wherein: in the S24 process, the number of the glue layers is at least two.
CN202211188560.5A 2022-09-27 2022-09-27 Manufacturing method of nano-imprinting adhesive layer for optical element Pending CN117826535A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202211188560.5A CN117826535A (en) 2022-09-27 2022-09-27 Manufacturing method of nano-imprinting adhesive layer for optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202211188560.5A CN117826535A (en) 2022-09-27 2022-09-27 Manufacturing method of nano-imprinting adhesive layer for optical element

Publications (1)

Publication Number Publication Date
CN117826535A true CN117826535A (en) 2024-04-05

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Family Applications (1)

Application Number Title Priority Date Filing Date
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