CN117826282A - Optical coating material and preparation method and application thereof - Google Patents
Optical coating material and preparation method and application thereof Download PDFInfo
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- CN117826282A CN117826282A CN202311639731.6A CN202311639731A CN117826282A CN 117826282 A CN117826282 A CN 117826282A CN 202311639731 A CN202311639731 A CN 202311639731A CN 117826282 A CN117826282 A CN 117826282A
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- 239000000463 material Substances 0.000 title claims abstract description 107
- 230000003287 optical effect Effects 0.000 title claims abstract description 100
- 238000000576 coating method Methods 0.000 title claims abstract description 62
- 239000011248 coating agent Substances 0.000 title claims abstract description 59
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- 238000001746 injection moulding Methods 0.000 claims abstract description 58
- 239000000758 substrate Substances 0.000 claims abstract description 53
- 239000004033 plastic Substances 0.000 claims abstract description 21
- 229920003023 plastic Polymers 0.000 claims abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 18
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000010894 electron beam technology Methods 0.000 claims abstract description 10
- 238000002207 thermal evaporation Methods 0.000 claims abstract description 10
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 9
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims abstract description 8
- 239000004926 polymethyl methacrylate Substances 0.000 claims abstract description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 8
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims abstract description 3
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 3
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 3
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims abstract description 3
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims abstract description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims abstract description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000004417 polycarbonate Substances 0.000 claims abstract description 3
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 3
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 claims abstract description 3
- XASAPYQVQBKMIN-UHFFFAOYSA-K ytterbium(iii) fluoride Chemical compound F[Yb](F)F XASAPYQVQBKMIN-UHFFFAOYSA-K 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 33
- 238000007747 plating Methods 0.000 claims description 28
- 230000004044 response Effects 0.000 claims description 23
- 238000002474 experimental method Methods 0.000 claims description 22
- 230000008569 process Effects 0.000 claims description 22
- 238000003384 imaging method Methods 0.000 claims description 10
- 238000009792 diffusion process Methods 0.000 claims description 9
- 239000003921 oil Substances 0.000 claims description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 238000002347 injection Methods 0.000 claims description 6
- 239000007924 injection Substances 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 238000002844 melting Methods 0.000 claims description 5
- 238000013386 optimize process Methods 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 3
- 230000008018 melting Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims 2
- NXEAFRGGOHGNKQ-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4].[Ti+4] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Ti+4].[Ti+4] NXEAFRGGOHGNKQ-UHFFFAOYSA-N 0.000 claims 1
- 238000006213 oxygenation reaction Methods 0.000 claims 1
- 238000013461 design Methods 0.000 abstract description 9
- 238000005516 engineering process Methods 0.000 abstract description 8
- 239000010408 film Substances 0.000 description 35
- 230000008859 change Effects 0.000 description 6
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 description 6
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000013178 mathematical model Methods 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000611 regression analysis Methods 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010023 transfer printing Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/03—Injection moulding apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
Abstract
An optical coating material, a preparation method and application thereof, comprising: the substrate is manufactured by injection molding of optical plastics; the coating film is arranged on the surface of the substrate, and is prepared by respectively coating a high refractive index material and a low refractive index material serving as film materials on the substrate in an electron beam thermal evaporation mode; wherein the optical plastic is one of polymethyl methacrylate, polycarbonate and cycloolefin polymer; the high refractive index material is one of titanium dioxide, titanium oxide, tantalum pentoxide and niobium pentoxide; the low refractive index material is one of silicon dioxide, aluminum oxide, magnesium fluoride and ytterbium fluoride. The optical coating material, the preparation method and the application thereof have reasonable design, adopt the electron beam thermal evaporation technology, and coat the continuous and uniform broadband antireflection film on the optical plastic substrate by the high refractive index material and the low refractive index material, thereby having wide application prospect.
Description
Technical Field
The invention belongs to the technical field of optical coating materials, and particularly relates to an optical coating material, a preparation method and application thereof.
Background
With the development of photoelectric technology and the change of consumer market demands, optical lenses have a development trend of miniaturization, high definition and large field of view, and people have higher requirements on the optical lenses. The optical lens has various application scenes and large span of working time, and in order to ensure that the optical lens can work normally in daytime or at night and prevent ghost image phenomena, an optical film with anti-reflection property from a visible light wave band to an infrared light wave band is required to be deposited on the surface of the optical lens, namely, an optical coating material is prepared.
The uniformity of the film thickness of the optical coating material coating is an important index for evaluating the characteristics of the optical coating material, the uniformity of the film thickness has an important influence on the overall performance of the optical coating material, the optical performance of the antireflection film can change along with the change of the surface position of a substrate due to the poor uniformity of the film thickness, the problem that ghost images are generated on an optical lens and the like can be caused, and even the optical coating material is scrapped because the design requirement cannot be met.
Therefore, the invention aims to develop an optical coating material and a preparation method thereof, which are applied to an optical lens, and a broadband antireflection film is prepared on an optical plastic lens by adopting an electron beam thermal evaporation technology, so that the uniformity of film thickness is good, and the change of the surface type of a substrate is small.
Disclosure of Invention
The invention aims to: in order to overcome the defects, the invention aims to provide an optical coating material, a preparation method and application thereof, and has reasonable design, and the high refractive index material and the low refractive index material are coated on an optical plastic substrate by adopting an electron beam thermal evaporation technology to form a continuous and uniform broadband antireflection film, so that the uniformity of the film thickness is good, the surface type change of the substrate is small, and the application prospect is wide.
The invention aims at realizing the following technical scheme:
an optical plating material comprising:
the substrate is manufactured by injection molding of optical plastics;
the coating film is arranged on the surface of the substrate, and is prepared by respectively coating a high refractive index material and a low refractive index material serving as film materials on the substrate in an electron beam thermal evaporation mode;
wherein the optical plastic is one of polymethyl methacrylate, polycarbonate and cycloolefin polymer; the high refractive index material is one of titanium dioxide, titanium oxide, tantalum pentoxide and niobium pentoxide; the low refractive index material is one of silicon dioxide, aluminum oxide, magnesium fluoride and ytterbium fluoride.
The optical coating material has reasonable design, adopts the electron beam thermal evaporation technology, coats the high refractive index material and the low refractive index material on the optical plastic substrate with a continuous and uniform broadband antireflection film, and can realize the effects of clear imaging under the natural light condition and imaging under the night glimmer condition when the optical coating material is applied to an optical lens.
Further, in the above optical coating material, the optical plastic is polymethyl methacrylate.
The invention selects polymethyl methacrylate as the raw material of the substrate, and the polymethyl methacrylate has high strength and hardness, high Abbe number, low birefringence and other optical characteristics, is relatively low in price, and can be precisely molded by changing injection molding process parameters to increase the flow property of the melt.
Further, in the above optical plating material, the high refractive index material is titanium pentoxide.
The invention selects the titanium pentoxide as the high refractive index material, the light transmission range of the titanium pentoxide is 400-12000 nm, the melting point is 1775 ℃, the evaporation temperature is about 1900 ℃, and compared with other titanium oxides, the titanium pentoxide has better chemical stability, sputtering is not easy to occur in the evaporation process, and the titanium dioxide film prepared by taking the titanium pentoxide as the film material has the advantages of good adhesion with a substrate, stable refractive index and high surface smoothness.
Further, in the above optical plating material, the low refractive index material is silicon dioxide.
According to the invention, silicon dioxide is selected as a low refractive index material, the light transmission range of the silicon dioxide is 200-3500 nm, the melting point is 1650 ℃, the evaporation temperature is about 2200 ℃, and the silicon dioxide has excellent chemical stability.
The invention also relates to a preparation method of the optical coating material, which comprises injection molding of a substrate and plating of a coating film.
Further, the preparation method of the optical coating material, the injection molding of the substrate, specifically comprises the following steps:
s1, establishing a process parameter regression model for process parameters which obviously influence the injection molding precision of a substrate based on a response surface method;
s2, determining an optimized process parameter combination of injection molding of the substrate based on the process parameter regression model;
and S3, injection molding the optical plastic by adopting precise injection molding equipment based on the optimized technological parameter combination to prepare the substrate.
The optical lens has high requirements in terms of optical performance, dimensional accuracy, cost control and the like, and conventional injection molding machines and injection molding processes cannot be manufactured. The precision injection molding equipment can accurately control various injection molding process parameters, and the requirements of the imaging optical lens on optical performance and dimensional accuracy are met. The area accuracy is one of the most important evaluation parameters for measuring whether an optical lens can be used for imaging optics. The surface type precision of the optical lens is closely related to a plurality of injection molding process influencing factors such as the type of the selected optical plastic, process parameters, mold design and the like, wherein the key technology for improving the surface type precision of the optical lens is to search for the optimized injection molding process parameter combination. In the conventional injection molding process, the setting of the process parameter combination is often determined experimentally and by simple design experiments based on the experience of engineers. These methods tend to be expensive both in time and money and require engineers to have a rich experience and profound theoretical knowledge. According to the invention, a response surface method is adopted to design experiments on technological parameters which obviously influence the surface type precision of the substrate, and a technological parameter regression model is established to obtain an optimized technological parameter combination.
The response surface method is a typical model construction method of data statistics in a regression analysis mathematical model, and reflects the relationship between a response variable and several independent variables by constructing a polynomial model. The final objective of the response surface approach is to determine the optimal operating parameters or ranges of operating parameters for a system, which is typically used to construct mathematical models when the relationship between the response variable and several independent variables is too complex or unknown. In the injection molding process, the response surface method can accurately describe the relation between the process parameters and the surface type precision through a mathematical model, find out the optimized process parameter combination and perfect the injection molding process scheme of the substrate.
Further, the preparation method of the optical coating material, wherein the step S1 specifically includes the following steps:
s11: taking injection molding process parameters such as melt temperature, injection speed, dwell pressure I, dwell pressure II, dwell time I, dwell time II, mold temperature and cooling time as factors of a response surface experiment, and according to recommended process parameters of optical plastic adopted by Moldflow software on a substrate and injection molding experience of a traditional imaging optical lens, preparing injection molding process parameter levels of response surfaces of the injection molding process parameters;
s12: generating an experiment table according to the determined factors and parameter levels of the response surface experiment, and distributing the parameter levels of each injection molding process into the experiment table;
s13: performing a response surface injection molding experiment, and recording various experimental data;
s14: and constructing a process parameter regression model which obviously influences the injection molding precision of the substrate according to the experimental data.
The injection molding process parameters such as melt temperature, injection speed, dwell pressure, dwell time, mold temperature, cooling time and the like have different degrees of influence on the surface type precision of the injection molding substrate. According to the previous experience of imaging optical injection molding, the pressure maintaining stage adopts a two-stage pressure maintaining mode, the transfer printing property can be improved, the pressure balance is kept, the internal stress increase of the optical lens caused by the rapid pressure is reduced, and the optical performance of the optical lens is better improved. Therefore, the parameters of the injection molding process, such as melt temperature, injection speed, dwell pressure I, dwell pressure II, dwell time I, dwell time II, mold temperature and cooling time, are taken as the controlling factors for the factors of the response surface experiment.
Further, the preparation method of the optical coating material, wherein the coating film comprises the following steps:
(1) Starting: starting an uninterruptible power supply, and starting a total gate of the coating machine after the voltage is stabilized; switching on a power supply of a vacuum system; opening a vacuum system to wait for the temperature rise of the oil diffusion pump; after the oil diffusion pump is heated to the temperature required by the experiment, opening a vacuum chamber door; adding a high-refractive-index material and a low-refractive-index material which are used as film materials into a crucible; attaching the cleaned substrate to a workpiece tray by a holder; closing a vacuum chamber door, and preparing for vacuumizing;
(2) Vacuumizing: after the oil diffusion pump is heated to 250 ℃, the target vacuum degree is set to be 5 multiplied by 10 < -3 > at a control console of the coating machine, the vacuumizing option is clicked, and the equipment automatically vacuumizes until the vacuum degree in the cavity reaches a set value. Pre-melting the high refractive index material after vacuumizing is completed; continuously vacuumizing after premelting is finished, checking a coating process after the vacuum degree in the vacuum chamber reaches a set value and is stable, and starting the preparation of the broadband antireflection film after confirming that the process is correct;
(3) Plating: opening a film material baffle to plate a broadband antireflection film; oxygen is added when high refractive index materials are plated, the oxygen partial pressure is 1 multiplied by 10 < -3 > Pa, oxygen is not added when low refractive index materials are plated, the ion source current is 550 mA, the voltage is 450 eV, and the film plating is completed;
(4) And (5) shutting down: and taking out the optical coating material after coating.
The invention also relates to application of the optical coating material, and the solid electrolyte is applied to an optical lens.
Preferably, the optical coating material is applied to a security optical lens, can meet the requirements of all-weather operation, can clearly image under natural light conditions and can still image under night glimmer conditions.
Compared with the prior art, the invention has the following beneficial effects:
(1) The optical coating material disclosed by the invention is reasonable in design, and adopts an electron beam thermal evaporation technology to coat a continuous and uniform broadband antireflection film on an optical plastic substrate with a high refractive index material and a low refractive index material, so that when the optical coating material is applied to an optical lens, the effects of clear imaging under a natural light condition and imaging under a night low-light condition can be realized;
(2) The preparation method of the optical coating material disclosed by the invention is simple, a response surface method is adopted to design experiments on technological parameters which obviously influence the surface type precision of a substrate, a technological parameter regression model is established to obtain an optimized technological parameter combination, optical plastics are injection molded by precision injection molding equipment based on the optimized technological parameter combination to prepare the substrate, and then an electron beam thermal evaporation technology is adopted to prepare the broadband antireflection film on the substrate by precision injection molding, so that the film thickness uniformity is good, and the surface type change of the substrate is small.
Drawings
FIG. 1 is a flow chart of S1 of example 2 of the optical coating material of the present invention;
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below in reference to examples 1-3, example 1 and example 2 in combination with specific experimental data and fig. 1, and it is obvious that the described embodiments are only some embodiments of the present invention, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the invention without making any inventive effort, are intended to fall within the scope of the invention.
Example 1 below provides an optical coating material.
Example 1
The optical coating material of the embodiment 1 comprises a substrate and a coating film, wherein the substrate is prepared by injection molding of polymethyl methacrylate, the coating film is arranged on the surface of the substrate, and the coating film is prepared by respectively coating titanium pentoxide serving as a high refractive index material and silicon dioxide serving as a low refractive index material serving as a film material on the substrate in an electron beam thermal evaporation mode.
The optical coating material of example 1 has a center wavelength of 500nm, a reflection bandwidth of 400-900 nm, an average reflectance within the reflection bandwidth of no more than 0.7%, and a maximum residual reflectance of no more than 2.3%.
The optical plating material of example 1 has a stack expression of s|0.22 L0.3H0.68L0.55H0.45L0.7H0.5L0.28H0.2L|A with S as the substrate, H as the high refractive index material, L as the low refractive index material, and a as air.
Example 2 below provides a method of preparing an optical coating material.
Example 2
The preparation method of the optical coating material of the embodiment 2 specifically comprises the following steps:
precision injection molding of substrates
S1, as shown in FIG. 1, establishing a process parameter regression model for process parameters which obviously influence the injection molding precision of a substrate based on a response surface method;
s11: taking injection molding process parameters such as melt temperature, injection speed, dwell pressure I, dwell pressure II, dwell time I, dwell time II, mold temperature and cooling time as factors of a response surface experiment, and according to recommended process parameters of optical plastic adopted by Moldflow software on a substrate and injection molding experience of a traditional imaging optical lens, preparing injection molding process parameter levels of response surfaces of the injection molding process parameters;
s12: generating an experiment table according to the determined factors and parameter levels of the response surface experiment, and distributing the parameter levels of each injection molding process into the experiment table;
s13: performing a response surface injection molding experiment, and recording various experimental data;
s14: according to the experimental data, a process parameter regression model which obviously influences the injection molding precision of the substrate is constructed;
s2, determining an optimized process parameter combination of injection molding of the substrate based on the process parameter regression model;
and S3, injection molding the optical plastic by adopting precise injection molding equipment based on the optimized technological parameter combination to prepare the substrate.
Plating of (II) plating film
(1) Starting: starting an uninterruptible power supply, and starting a total gate of the coating machine after the voltage is stabilized; switching on a power supply of a vacuum system; opening a vacuum system to wait for the temperature rise of the oil diffusion pump; after the oil diffusion pump is heated to the temperature required by the experiment, opening a vacuum chamber door; adding a high-refractive-index material and a low-refractive-index material which are used as film materials into a crucible; attaching the cleaned substrate to a workpiece tray by a holder; closing a vacuum chamber door, and preparing for vacuumizing;
(2) Vacuumizing: after the oil diffusion pump is heated to 250 ℃, the target vacuum degree is set to be 5 multiplied by 10 < -3 > at a control console of the coating machine, the vacuumizing option is clicked, and the equipment automatically vacuumizes until the vacuum degree in the cavity reaches a set value. Pre-melting the high refractive index material after vacuumizing is completed; continuously vacuumizing after premelting is finished, checking a coating process after the vacuum degree in the vacuum chamber reaches a set value and is stable, and starting the preparation of the broadband antireflection film after confirming that the process is correct;
(3) Plating: opening a film material baffle, and plating a broadband antireflection film according to a film stack expression S|0.22 L0.3H0.68L0.55H0.45L0.7H0.5L0.28H0.2L|A of the optical plating material designed in the embodiment 1; oxygen is added when high refractive index materials are plated, the oxygen partial pressure is 1 multiplied by 10 < -3 > Pa, oxygen is not added when low refractive index materials are plated, the ion source current is 550 mA, the voltage is 450 eV, and the film plating is completed;
(4) And (5) shutting down: after the film coating is finished, the optical coating material is taken out, and the surface of the optical coating material is observed by using a microscope, so that the prepared optical coating material has good surface quality and no phenomena of film cracking, wrinkling and falling.
There are many ways in which the invention may be practiced, and what has been described above is merely a preferred embodiment of the invention. It should be noted that the above examples are only for illustrating the present invention and are not intended to limit the scope of the present invention. It will be apparent to those skilled in the art that modifications may be made without departing from the principles of the invention, and such modifications are intended to be within the scope of the invention.
Claims (9)
1. An optical plating material, comprising:
the substrate is manufactured by injection molding of optical plastics;
the coating film is arranged on the surface of the substrate, and is prepared by respectively coating a high refractive index material and a low refractive index material serving as film materials on the substrate in an electron beam thermal evaporation mode;
wherein the optical plastic is one of polymethyl methacrylate, polycarbonate and cycloolefin polymer; the high refractive index material is one of titanium dioxide, titanium oxide, tantalum pentoxide and niobium pentoxide; the low refractive index material is one of silicon dioxide, aluminum oxide, magnesium fluoride and ytterbium fluoride.
2. The optical plating material according to claim 1, wherein the optical plastic is polymethyl methacrylate.
3. The optical plating material according to claim 1, wherein the high refractive index material is tri-titanium pentoxide.
4. The optical plating material according to claim 1, wherein the low refractive index material is silica.
5. The method of producing an optical plating material according to any one of claims 1 to 4, comprising injection molding of a substrate, plating of a plating film.
6. The method for producing an optical plating material according to claim 5, wherein the injection molding of the substrate comprises the steps of:
s1, establishing a process parameter regression model for process parameters which obviously influence the injection molding precision of a substrate based on a response surface method;
s2, determining an optimized process parameter combination of injection molding of the substrate based on the process parameter regression model;
and S3, injection molding the optical plastic by adopting precise injection molding equipment based on the optimized technological parameter combination to prepare the substrate.
7. The method for preparing an optical plating material according to claim 6, wherein the step S1 specifically comprises the following steps:
s11: taking injection molding process parameters such as melt temperature, injection speed, dwell pressure I, dwell pressure II, dwell time I, dwell time II, mold temperature and cooling time as factors of a response surface experiment, and according to recommended process parameters of optical plastic adopted by Moldflow software on a substrate and injection molding experience of a traditional imaging optical lens, preparing injection molding process parameter levels of response surfaces of the injection molding process parameters;
s12: generating an experiment table according to the determined factors and parameter levels of the response surface experiment, and distributing the parameter levels of each injection molding process into the experiment table;
s13: performing a response surface injection molding experiment, and recording various experimental data;
s14: and constructing a process parameter regression model which obviously influences the injection molding precision of the substrate according to the experimental data.
8. The method for producing an optical plating material according to claim 5, wherein the plating of the plating film comprises the steps of:
(1) Starting: starting an uninterruptible power supply, and starting a total gate of the coating machine after the voltage is stabilized; switching on a power supply of a vacuum system; opening a vacuum system to wait for the temperature rise of the oil diffusion pump; after the oil diffusion pump is heated to the temperature required by the experiment, opening a vacuum chamber door; adding a high-refractive-index material and a low-refractive-index material which are used as film materials into a crucible; attaching the cleaned substrate to a workpiece tray by a holder; closing a vacuum chamber door, and preparing for vacuumizing;
(2) Vacuumizing: after the oil diffusion pump is heated to 250 ℃, the target vacuum degree is set to be 5 multiplied by 10 at a control desk of the coating machine -3 Clicking the vacuumizing option, and automatically vacuumizing the equipment until the vacuum degree in the cavity reaches a set value; pre-melting the high refractive index material after vacuumizing is completed; continuously vacuumizing after premelting is finished, checking a coating process after the vacuum degree in the vacuum chamber reaches a set value and is stable, and starting the preparation of the broadband antireflection film after confirming that the process is correct;
(3) Plating: opening a film material baffle to plate a broadband antireflection film; oxygenation is carried out when plating high refractive index material, and oxygen partial pressure is 1 multiplied by 10 -3 Pa, the oxygen is not added when the low refractive index material is plated, the current of an ion source is 550 mA, the voltage is 450 eV, and the film plating is completed;
(4) And (5) shutting down: and taking out the optical coating material after coating.
9. Use of an optical coating material according to any one of claims 1 to 4, wherein the optical coating material is applied to an optical lens.
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