CN101084457A - Light reflection mirror, its manufacturing method, and projector - Google Patents

Light reflection mirror, its manufacturing method, and projector Download PDF

Info

Publication number
CN101084457A
CN101084457A CN 200580037854 CN200580037854A CN101084457A CN 101084457 A CN101084457 A CN 101084457A CN 200580037854 CN200580037854 CN 200580037854 CN 200580037854 A CN200580037854 A CN 200580037854A CN 101084457 A CN101084457 A CN 101084457A
Authority
CN
China
Prior art keywords
light reflection
reflection mirror
reflectance coating
quality
plastic basis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN 200580037854
Other languages
Chinese (zh)
Inventor
大藏贵博
武井正一
浜名宣充
青木久雄
小和田二治男
天井直喜
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Kyocera Optec Co Ltd
Original Assignee
Kyocera Chemical Corp
Kyocera Optec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Chemical Corp, Kyocera Optec Co Ltd filed Critical Kyocera Chemical Corp
Publication of CN101084457A publication Critical patent/CN101084457A/en
Pending legal-status Critical Current

Links

Images

Landscapes

  • Optical Elements Other Than Lenses (AREA)
  • Projection Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Transforming Electric Information Into Light Information (AREA)

Abstract

A light reflecting mirror, which can be easily manufactured by using a light-weight and low-cost plastic base material and has a high reflectance, and a method for manufacturing such light reflecting mirror. In the light reflecting mirror, a reflecting film (52) containing silver is formed on a surface of the plastic base material (50) whose thermal deformation temperature is 130 DEG C or higher. The plastic base material (50) is a thermosetting resin molding, the surface of the reflecting film is a smooth plane having a PV (peak to valley) value of 0.5 m or less without a sharp angle protrusion, and further, the reflectance of the reflecting film surface is 96% or more.

Description

Light reflection mirror and manufacture method thereof and projector
Technical field
The present invention relates to a kind of light reflection mirror that especially constitutes base material and have high reflectance, relate to a kind of imaging usefulness and illuminating light reflection mirror and manufacture method and projector of in projector or projection TV etc., being suitable for use as in more detail by plastic material.
Background technology
The projector of projected image is divided into front type projector and back side type projector.Front type projector is configured in reflection type screen on the wall in room, will comprise that the projecting cell of micromodule equipment and projection lens etc. is arranged at the central portion in room, from projection lens towards the screen prjection light modulated, display image etc. on screen.The light modulated that the observer has seen by screen reflection.On the other hand, type projector in the back side will comprise that the projecting cell of micromodule equipment and projection lens etc. is configured in the inside of the framework of box, and then be provided with transmission-type screen at the front face of framework.What the observer saw is the light modulated that has seen through screen from the outside of framework.
Recently, developing big picture, for example have the diagonal angle for from 70 inches to 100 inches back side type projector.In such back side type projector with big picture, the distance from the projection lens to the screen need have the length more than the 2m, and is very big thereby framework becomes.Therefore, between projection lens and screen, dispose mirror, the depth of framework is reduced.
In patent documentation 1 and 2, disclose the projector that is used to realize miniaturization and wide-angleization.This projector from the image formation component folded light beam, makes image projection with four catoptrons to screen simultaneously.
So utilizing a plurality of light reflection mirrors to come under the situation of projects images, no matter reflecting surface is convex-shaped or concave shape, or plane, under the low situation of the reflectivity of light reflection mirror, all can't obtain distinct image with high image quality.
In addition, as the mirror that is configured between projection lens and the screen, if use the front-surface mirror of glass, then in the back side type projector of big picture, the area of mirror becomes more than 1.5m * 1.1m.And because glass is very crisp breaks easily, so if form the above thickness of 5mm, then the problem of Cun Zaiing is, the weight of mirror becomes more than the 20kg, and installing integral body can become more than the 100kg.
Therefore, in patent documentation 3, propose a kind of little plastics of proportion of 60% that utilize proportion to be less than glass and make the technology that is configured in the mirror between projection lens and the screen.The mirror of patent documentation 3 records, reflective metal such as evaporation silver or aluminium form on the one side of transparent plastic sheet.
But because screen is big more, mirror also maximizes, and therefore requires to have enough intensity.But in the plastic basis material that common thermosetting resin is formed, even increase thickness, intensity is also poor, therefore has the problem of breaking easily or being easy to generate crackle.
In order to obtain the high plastic basis material of intensity, generally be well known that and use the resin combination that contains reinforcing fibers such as glass fibre.But, in resin combination, contain a large amount of reinforcing fibers and the base material that obtains, because of reinforcing fiber makes surperficial roughening, flatness descends.Therefore, when reflective metal such as substrate surface evaporation silver or aluminium form reflectance coating, there is the problem of the reflectivity decline of reflectance coating.
On the other hand, type projector in the back side requires further slimming.That is, as shown in Figure 5, existing back side type projector is at the internal configurations back side of framework mirror 21, with 21 reflections of back side mirror from optical engine 22 image projected, display image on screen 23.In such perpendicular projection mode, be 80 ° owing to draw the angle, projection distance L1 is more than 900mm, so the thickness L2 of projector is also more than 500mm.
To this, in the realization that proposes recently in the back side type projector of slimming, as shown in figure 16, utilize aspheric mirror 24 to tilt projection from optical engine 22 image projected, it is reflected and display image on screen 23 with back side mirror 25.Therefore, can realize 160 ° super wide picture angle, can realize that projection distance L1 is 200mm, the thickness L2 of projector is the equipment of the slimming below 200mm also.In addition,, also use a plurality of level crossings or aspheric mirror sometimes, image is reflected in turn, throw simultaneously according to the apparatus structure of projector.
But, owing to image is reflected in turn, throw simultaneously with aspheric mirror 24 or back side mirror 25 so a plurality of catoptrons, so if the reflectivity of each catoptron is not high, the then image obfuscation that shows at screen 23.Therefore, wish that a kind of light weight and emissivity are at the catoptron more than 96%.
As the high catoptron of reflectivity, in patent documentation 4, record a kind of reflection horizon that possesses specific silver, and at the visible region reflectivity at the catoptron more than 98%.But in patent documentation 4, reflectivity is to use glass baseplate to make at the catoptron more than 98%.Under the situation of using glass baseplate, be difficult to realize lightweight, and have the problem that cost uprises owing to need accurate surface finish.
And then, on base material, especially plastic basis material, be covered and contained in the light reflection mirror of silver-colored reflectance coating, because the base material of the periphery of reflectance coating and the engaging force of reflectance coating are low, so exist moisture to be immersed between the base material and reflectance coating of this periphery, and slowly carry out the corrosion of reflectance coating, and then make the problem that reflectance coating comes off from base material from periphery.
Patent documentation 1: the Japanese documentation spy opens the 2002-40326 communique;
Patent documentation 2: the Japanese documentation spy opens the 2003-177320 communique;
Patent documentation 3: the Japanese documentation spy opens flat 7-230072 communique;
Patent documentation 4: the Japanese documentation spy opens 2003-114313 communique ([0073], [0081]).
Summary of the invention
Major subjects of the present invention is, provides a kind of and uses light weight and cheap plastic basis material, can make simply and light reflection mirror and manufacture method thereof that reflectivity is high.
Other problems of the present invention are, a kind of plastic basis material that utilizes is provided, and realize the light reflection mirror of high strength, high reflectance.
Other problem of the present invention is, a kind of light reflection mirror is provided, and it can suppress the corrosion of the reflectance coating that causes because of the moisture that enters between base material and the reflectance coating.
Other problem of the present invention is, a kind of projector is provided, and it can utilize light weight and cheap light reflection mirror, obtains high image quality and distinct image.
The present inventor has carried out deep discussion in order to solve described problem, found that, has been covered to contain in the light reflection mirror of silver-colored reflectance coating on the surface of plastic basis material, and the reflectivity that can make the reflectance coating surface is more than 96%.
Promptly, light reflection mirror of the present invention by heat distortion temperature the plastic basis material more than 130 ℃ and form on the surface of this base material contain silver reflectance coating constitute, the PV on described reflectance coating surface (peak tovalley) value is below 0.5 μ m, and be the even surface that does not have the acute angle projection, the reflectivity on described reflectance coating surface is more than 96%.As described plastic basis material, for example can enumerate the thermosetting resin formed products.
Preferably, light reflection mirror of the present invention comprises: the plastics strengthening layer, and it contains the reinforcing fiber of 8～20 quality %; Plastic basis material, it contains surface that is formed on this plastics strengthening layer and the plastics gloss layer of reinforcing fiber below 5 quality % that contains; And the reflectance coating that contains silver, it is coated on the described plastics gloss layer surface of this plastic basis material.
On described plastic basis material, can be provided with jut at periphery, be used to throw the middle body that becomes light reflection surface of picture with encirclement.
The manufacture method of light reflection mirror of the present invention comprises: in mould, the thermosetting resin constituent that will be made of the rigidizer of the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and 0.1～3 quality % is injected in the mould, carry out heat hardening with 135～180 ℃ temperature, the operation of shaping plastic basis material and form the operation of the reflectance coating that contains silver on the plastic basis material that obtains surface.
Other the manufacture method of light reflection mirror of the present invention comprises: the plastics strengthening layer of the reinforcing fiber that contains 8～20 quality % and the plastics gloss layer that contains the reinforcing fiber below the 5 quality % are carried out stacked shaping and the surface that obtains the operation of plastic basis material and the plastics gloss layer in the plastic basis material that obtains forms the operation of the reflectance coating that contains silver.
In other the manufacture method of light reflection mirror of the present invention, the thermosetting resin constituent is formed, obtain plastic basis material, surface-coated reflectance coating at this plastic basis material, wherein, use in the part corresponding of described plastic basis material with the corresponding portion boundary portion of middle body and be provided with the mould of recess, described plastic basis material is formed with periphery, periphery at plastic basis material is provided with jut, to surround the middle body on reflectance coating surface.
Other the manufacture method of light reflection mirror of the present invention, stacked described connecting airtight property raising film, the reflectance coating that contains silver, reflection increase film on the surface of described plastic basis material in turn, wherein, comprising: the operation that keeps described plastic basis material in die cavity; In described die cavity, supply with the operation of the gas be used to generate plasma; Space in described die cavity applies the operation of high-frequency electric field; In described die cavity, be heated as described each film raw material evaporating materials and make the operation of its evaporation; And control the quantity delivered of described gas in described die cavity, make on described base material when forming described each film than each film formed initial stage, afterwards the gas delivery volume control operation that tails off of the quantity delivered during; During described each film formed, the film formation method that remains on below 60 ℃ by the temperature with described base material formed connecting airtight property raising film, contains the reflectance coating of silver and reflects the increase film.
Projector of the present invention possesses above-mentioned light reflection mirror.Specifically, projector of the present invention is via at least three light reflection mirrors projected image on screen, wherein, with described three light reflection mirrors when the working direction of light is made as first, second and the 3rd light reflection mirror in turn, at least the first and second light reflection mirror constitutes and form the reflectance coating that contains silver on the surface of plastic basis material, and the light reflectivity on reflectance coating surface is more than 96%.
In addition, the PV value on reflectance coating surface and surface state can be passed through non-contact three-dimensional profile measurement machine (for example trade name " NH-3SP " of three hawk ray machines (strain) system) measurement.In addition, in the present invention, the notion of reflectance coating that what is called contains silver is, except the silverskin of the unijunction crystal layer that approaches fine silver, also comprises reflectance coating, and this reflectance coating also comprises silver and other compositions in the scope of reflectivity of reflectance coating itself not being brought influence.
The invention effect
Light reflection mirror of the present invention, contain silver-colored reflectance coating because constituting be covered on the surface of the plastic basis material more than 130 ℃ in heat distortion temperature, even so size about large paper edition, for example 130mm * 150mm, also can light weight and make at an easy rate, and the PV value on reflectance coating surface is below 0.5 μ m, and be the shiny surface that does not have the acute angle projection, reflectivity is more than 96%, therefore, be applicable to the aspheric mirror and the level crossing of the rear projector use of slim rear projector, particularly slim big picture.Thermotolerance is good under the situation of using thermosetting resin as plastic basis material.
Base material possesses the light reflection mirror of the present invention of plastics strengthening layer, owing to have high strength, and the substrate surface of lining reflectance coating is the few plastics gloss layer of amount of reinforcing fiber, so have high reflectivity.
Periphery on the reflectance coating surface is provided with the light reflection mirror of the present invention of jut, jut in the periphery setting on reflectance coating surface becomes so-called burrock, owing to stoped the moisture that is immersed between base material and the reflectance coating at periphery to be immersed in middle body, so have the effect of the reflectance coating corrosion of the middle body that can suppress to become reflecting surface.
According to the manufacture method of light reflection mirror of the present invention, owing to back processing such as there is no need to polish, so can make reflectivity simply at the light reflection mirror more than 96%.Especially the thermosetting resin constituent that the rigidizer by the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and 0.1～3 quality % is constituted forms and the plastic basis material that obtains, back processing such as need not polish, can make its surperficial PV value below 0.5 μ m, and form the even surface that does not have the acute angle projection.Thus, almost directly reflect the surface state of plastic basis material, the PV value of reproduced reflectance coating and forms the even surface that does not have the acute angle projection also below 0.5 μ m, can access the light reflection mirror of reflectivity at the high reflectance more than 96%.
Be provided with the mould of recess using in the part corresponding of plastic basis material with the corresponding portion boundary portion of middle body with periphery, when described plastic basis material is formed, because the periphery on the reflectance coating surface in the shaping of plastic basis material forms projection, so can not increase process number, can be simply and make the superior light reflection mirror of reflection characteristic at an easy rate.
Projector of the present invention, contain the light reflection mirror that silver-colored reflectance coating constitutes owing to using in the formation of the surface of plastic basis material, and because light weight, cheapness and the light reflectivity of at least the first and second light reflection mirror that approaches image forming (for example image formation component) are more than 96%, so can access high image quality and distinct image.
Therefore, light reflection mirror of the present invention is suitable for aspheric mirror and level crossing that the rear projector of slim rear projector, particularly slim big picture uses.
Description of drawings
Fig. 1 is the sectional view of the light reflection mirror of expression first embodiment of the present invention;
Fig. 2 is the concept map of an example of the expression film forming device that is used to make light reflection mirror of the present invention;
Fig. 3 is the key diagram of the process of expression film formation;
Fig. 4 is the stereographic map of the suitable example of expression light reflection mirror of the present invention;
Fig. 5 is the sectional view of the light reflection mirror of expression second embodiment of the present invention;
Fig. 6 is the general principal view of the projection of expression the 3rd embodiment of the present invention with light reflection mirror;
Fig. 7 is the enlarged drawing of A portion shown in Figure 6;
Fig. 8 is the summary section of the molding die of plastic basis material of the present invention;
Fig. 9 is the enlarged drawing of B portion shown in Figure 8;
Figure 10 is the skeleton diagram of the projector of expression the 4th embodiment of the present invention;
Figure 11 is the chart of the surface apparatus of the reflectance coating that obtains in embodiment 1 of three dimensional representation;
Figure 12 is the SEM photo that is illustrated in the surface state of the reflectance coating that obtains among the embodiment 1;
Figure 13 is expression has formed the section of the catoptron under the state of the reflectance coating that obtains in embodiment 1 a SEM photo;
Figure 14 is the chart of the surface state of the reflectance coating that obtains in embodiment 1 of three dimensional representation;
Figure 15 is the key diagram of the principle of expression rear projector;
Figure 16 is the key diagram of the principle of the slim rear projector of expression.
Among the figure: the 1-boat; The 3-heating power supply; The 4-coalignment; 5-High frequency power supply power; The 6-DC voltage applies power supply; The 9-evaporating materials; 11-die cavity (chamber); The 20-evaporation source; The 50-plastic basis material; Connecting airtight property of 51-raising film; The 52-reflectance coating; The 53-first transparent dielectric layer; The 54-second transparent dielectric layer
Embodiment
＜the first embodiment 〉
Light reflection mirror of the present invention forms at the surface-coated reflectance coating that contains silver of heat distortion temperature at the plastic basis material more than 130 °.
The plastic basis material that uses if consider its heat distortion temperature, then can use the thermosetting resin formed products.As such thermosetting resin formed products,, for example, can use various thermosetting resins such as unsaturated polyester (UP), epoxy resin, phenolics, polycarbonate so long as heat distortion temperature more than 130 °, does not just limit especially.Especially preferably use unsaturated polyester resin.
Under the situation of using unsaturated polyester resin, the thermosetting resin constituent preferably is made of the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and the rigidizer of 0.1～3 quality %, it is formed and obtains the base material of regulation shape.
Unsaturated polyester resin, be to have mixed by the sour composition that constitutes to α, β-unsaturated dibasic acid or by its anhydride and multivalence alcohol to carry out the unsaturated polyester (UP) (prepolymer) that polymerization obtains and the aqueous resin of polymerizable monomer, the ratio that unsaturated polyester (UP) contains is 65～75 quality %, and the ratio that polymerizable monomer contains is 35～25 quality %.
α, β-unsaturated dibasic acid or its anhydride as this unsaturated polyester resin use, for example, can enumerate: acid or its anhydride of one or more in maleic acid, fumaric acid, itaconic acid, the citraconic acid etc. especially are fit to use maleic acid or its anhydride or fumaric acid.In addition,, for example can enumerate as multivalence alcohol: glycol, diglycol, dipropylene glycol, two contract third (support) glycol, neopentyl glycol etc., can mix they one or more and use.
And then, also can in α, β-unsaturated dibasic acid or its anhydride, multivalence alcohol, add monounsaturated dicarboxylic acid or its anhydride as required, carry out polymerization.As monounsaturated dicarboxylic acid or its anhydride, for example can enumerate phthalic acid or its anhydride, isophathalic acid, terephthalic acids, tetrahydrophthalic acid, tetrahydrobenzene dicarboxylic acid anhydride, hexane diacid, decanedioic acid etc., also can mix one or more that use them.
In addition, except above-mentioned multivalence alcohol, can be as required, with 1, ammediol, 1,3-succinyl, 1,4-succinyl, 1, one or more material such as 6-hexanediol, 1,4 cyclohexane dimethanol, hydrogenation biphenol A is mixed in the above-mentioned multivalence alcohol and uses.
As the polymerizable monomer that is used in unsaturated polyester resin, for example can enumerate: styrene, vinyltoluene, divinyl toluene, p-methyl styrene, methyl methacrylate, diallyl phthalate, diallyl isophthalic acid ester etc., also can use a kind of of them or mix two or more the use.In the polymerizable monomer of ormal weight, mix unsaturated polyester (UP), being included in the unsaturated polyester resin, but also can when the modulation of unsaturated polyester (UP), add its part.The use level of unsaturated polyester resin is 7～19 quality % in resin combination, preferably 8～13 quality %.
As the thermoplastic resin that is engaged in the described resin combination, for example can enumerate: polystyrene copolymer, tygon, Polyvinylchloride, polyvinyl acetate, polymethylmethacrylate, polymethylmethacrylate are copolymer, modified ABS resin, polycaprolactone, modification polycarbamate etc.Especially, from dispersiveness, low-shrinkage, these aspects of rigidity, preferred polymethylmethacrylate, polymethylmethacrylate are that the vinyl acetate of the such acrylic resin of copolymer (comprising copolymer), polyvinyl acetate, styrene-vinyl acetate copolymer and so on is resin (comprising copolymer).The use level of thermoplastic resin is 6～19 quality % in resin combination, preferably 8～12 quality %.
As the inorganic filler that in described resin combination, cooperates, for example, can enumerate known inorganic fillers such as lime carbonate, mica, talcum, graphite, carbon black, asbestos, aluminium hydroxide.The mean grain size of inorganic filler is preferably in the scope of 0.1～60 μ m, the preferably broken shape of its shape.The use level of inorganic filler is 70～84 quality % in resin combination.
The reinforcing fiber that cooperates in described resin combination can improve the intensity of formed products.As the reinforcing fiber that uses, for example can enumerate: glass fibre, carbon fiber (carbon fibre), graphite fiber, aramid fibre, carborundum fiber, alumina fibre, boron fibre, steel fibre, amorphous cellulose, organic fiber etc., also can use theirs-kind or mix two or more the use.
The fibre length of reinforcing fiber is preferably 1～3mm, and fibre diameter is 5～100 μ m preferably.In addition, the use level of reinforcing fiber preferably is 0～5 quality % in resin combination.If fibre length is elongated, if perhaps use level surpasses 5 quality %, then as described later, the PV value surpasses 0.5 μ m, is difficult to do not existed acute angle projection and level and smooth forming face.
The rigidizer that begins as the sclerous reaction that makes unsaturated polyester resin, for example, can enumerate: t-butyl peroxy benzoic ether, t-butyl peroxy-2-Ethylhexyl Alcohol, t-butyl peroxy isopropyl carbonic ester, 1,1-two (t-butyl peroxy)-3,3, organic peroxides such as 5-trimethyl-cyclohexane.The use level of rigidizer is 0.1～3 quality % in resin combination.
And then, in order to make the formed products demoulding from mould easily, internal mold release can be coupled in the described thermosetting resin constituent.As internal mold release, for example can enumerate: aliphatics slaines such as zinc stearate, dolomol, calcium stearate, aluminium stearate.The use level of internal mold release can be to be 0.1～3 quality % in resin combination.
In addition, in described thermosetting resin constituent, can cooperate tackifier such as colorant, magnesium oxide, calcium oxide such as pigment as required.
Plastic basis material of the present invention injects described thermosetting resin constituent in the mould, is shaped with 135～180 ℃ temperature heat hardenings.As manufacturing process, can enumerate: the method that injection moulding, transmission (transfer) shaping, compression molding etc. are used in the shaping of common thermosetting resin.
Described thermosetting resin constituent, aspect the flatness of guaranteeing the formed products surface, dimensional stability, the shaping shrinkage rate when preferably being shaped is 0.05～0.10%.Shaping shrinkage rate is that the size to the mould of the formed products of normal temperature and normal temperature compares, and represents the value of its ratio, calculates according to (die size-formed products size)/die size.
The mould that uses need make the face corresponding with the reflectance coating formation face of formed products smooth, and specifically, the surfaceness Rz that stipulates among the JIS B 0601-2001 is below 0.5 μ m, preferably below 0.4 μ m.
And there are not the projection of acute angle in the plastic basis material that is shaped, PV value below 0.5 μ m, be level and smooth face.Therefore, the demoulding formed products not be used in the surface and smooth layer (internal coating etc.) be set or implement back processing such as polishing, can directly form reflectance coating on its surface, and can form the even surface that does not have the acute angle projection, the PV value on surface of reflectance coating of stronger influence that is subjected to the plastic basis material surface is also below 0.5 μ m.
Then, form the reflectance coating that contains silver on the surface of the plastic basis material that obtains.At this moment, on the surface of plastic basis material, can directly form the reflectance coating that contains silver, perhaps also can make connecting airtight property raising mould between reflectance coating and base material by method described later.And then the reflection that also can form more than two-layer on the surface of described reflectance coating increases film.Reflection increases film and for example can enumerate: on the reflectance coating surface at least stacked above one another the film of the second transparent dielectric layer of the first transparent dielectric layer of high index of refraction and low-refraction, but lamination order is not particularly limited.Also can be at the surperficial further stacked high index of refraction of the second transparent dielectric layer or the transparent dielectric layer of low-refraction (for example, the transparent dielectric layer of alternatively stacked high index of refraction and low-refraction).In addition, consider economy, then be preferably in below 5 layers if reflection increases film.
Below, the situation that forms connecting airtight property raising film, reflectance coating and reflection in turn and increase film for the surface at plastic basis material describes, but for the situation of having only reflectance coating, for the situation of connecting airtight property of formation raising film and reflectance coating, the situation that forms reflectance coating and reflection and increase film is suitable for too.
In preferred implementation of the present invention, as shown in Figure 1, surface at plastic basis material 50, increase film from described base material 50 connecting airtight property of side stacked above one another raising films 51, the reflection that contains the reflectance coating 52 of silver and comprise the first transparent dielectric layer 53 and the second transparent dielectric layer 54, wherein, connecting airtight property raising film 51 is by from Cr, CrO, Cr 2O 3, Y 2O 3, LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3Deng at least a formation selected, the first transparent dielectric layer 53 and the second transparent dielectric layer 54 are by from Y 2O 3, MgF 2, LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3Form Deng the compound of selecting in the group that constitutes.
Connecting airtight property raising film 51 improves the connecting airtight property of reflectance coatings 52 and plastic basis material 50, thereby and has and prevent effectively that moisture from seeing through plastic basis material 50 and contact the function of corroding reflectance coating 52 with reflectance coating 52.If consider connecting airtight property, then the thickness of connecting airtight property raising film 51 is 10～200nm, preferably 30～80nm.If the not enough 10nm of the thickness of connecting airtight property raising film 51, then connecting airtight property worsens easily, and is difficult to prevent effectively that moisture from seeing through plastic basis material 50 and contacting with reflectance coating 52.In addition, connecting airtight property raising film 51, as long as connecting airtight property is good, then be preferably as much as possible thin, so the thickness of connecting airtight property raising film 51 is preferably below 200nm.
In addition, the SEM photo from embodiment described later as can be seen, connecting airtight property raising film 51 also has the porous of making and has the surface of the plastic basis material 50 of countless fine cracks to be in the function of more level and smooth surface state.Though it is also not obvious to obtain the reason of such function, supposition is to constitute the interaction that has produced certain chemistry or physics between the surface of the composition of connecting airtight property raising film 51 and plastic basis material 50.No matter be which kind of situation, become more level and smooth surface state by the surface that makes plastic basis material 50, can further improve the reflectivity of reflectance coating.
The thickness of the reflectance coating 52 that is made of silver is 100～200nm, preferably 70～130nm.When the thickness deficiency 100nm of reflectance coating 52, light sees through easily, the reflectivity step-down.On the other hand, the thickness of reflectance coating 52 surpasses 200nm, and reflectivity can not improve, and because silver can make material cost increase, so the thickness of reflectance coating 52 is unnecessary not preferably thick.
The first transparent dielectric layer 53 and the second transparent dielectric layer 54 constitute based on the highly reflecting films of multi-coated interference layer, i.e. reflection increases film.Therefore, their thickness is suitably determined by its refractive index and light wavelength.In addition, the refractive index of the second transparent dielectric layer 54 is greater than the refractive index of the first transparent dielectric layer 53.For example, the first transparent dielectric layer 53 uses MgF 2, the second transparent dielectric layer 54 uses La 2Ti 3O 8Thereby, be that the thickness of the first transparent dielectric layer 53 is about 73nm under the situation of the highest reflectivity in the visible region, the thickness of the second transparent dielectric layer 54 is about 60nm.
In addition; the reflection that is made of the first transparent dielectric layer 53 and the second transparent dielectric layer 54 increases the effect that film also plays protection reflectance coating 52; increase film by reflection and can prevent effectively that the moisture that contains etc. from contact with reflectance coating 52 in atmosphere, prevent from reflectance coating 52 produced and corrode etc.
The reflectance coating 52 that contains silver is more than 20 times of total of other peak strength based on (111) peak strength of the surperficial refraction of X-ray of first transparent dielectric layer 53 sides.The directionality height and the crystal density that this means crystallization are high and fine and close, and then the character of reflectance coating is homogeneous.Thus, suppress to become absorption or the scattering of light in film of reflectivity main reasons for decrease.That is, the energy that the absorption of light means light becomes heat and loses in the film inner conversion, produces the defective of impurity etc. in film.
In addition, reflectance coating 52 is being observed the arithmetic average roughness measured below 3nm (being converted into μ m then is 0.003 μ m) by atomic force microscope (AFM).So-called atomic force microscope is such microscope: when the cantilever that has probe during near specimen surface, effect lower cantalever bending at interatomic force, utilize this phenomenon, detect its displacement by laser-bounce light, can be with concavo-convex the carry out image conversion of Nano grade to the surface.It is smooth that the surfaceness of being measured by such atomic force microscope means that below 3nm reflectance coating 52 comes down to.Thus, suppressed to become of the scattering of the light of reflectivity main reasons for decrease at laminar surface.
Therefore,, can think,, realize high reflectance so suppress scattering of light and absorption because reflectance coating 52 is fine and close and smooth according to above point.
In addition, the arithmetic average roughness on the second transparent dielectric layer 54 and surfaces base material 50 opposite sides is below 5nm.Thus, because the second transparent dielectric layer 54 is smooth,, realize high reflectivity so help to suppress scattering of light and absorption with reflectance coating 52.
Then, describe for the method for making catoptron.Fig. 2 represents to make the summary of the employed film forming device of this catoptron.Following film formation method by evaporating materials 9 and change membrance casting condition as required, is carried out film forming continuously by a film forming device on plastic basis material 50.
At first, describe for the situation that on the surface of plastic basis material 50, forms connecting airtight property raising film 51.Bottom in the die cavity 11 in the film forming device shown in Figure 2 disposes evaporation source 20, and this evaporation source 20 is accommodated in boat (boat) 1 and kept evaporating materials 9.In the mode with respect to this evaporation source 20, the top in die cavity 11 is provided with the base material maintaining part 2 that is used to keep base material 50.Evaporating materials 9 as being used to form connecting airtight property raising film 51 can use LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2, Al 2O 3
Base material maintaining part 2 is made of conductive material, applies the High frequency power from high frequency power supply (RF) 5 through coalignment (MN) 4 and as the capacitor 7 of direct current shield filter.In addition, can utilize variable condenser that capacitor 7 is played a role as the part of match circuit.And then, in base material maintaining part 2, via as the coil 8 of radioshielding filtrator and be connected with the cathode side that DC voltage applies power supply (DC) 6.The terminal of the opposition side of the base material maintaining part 2 of high frequency power supply 5 is connected with the anode-side that DC voltage applies power supply 6, and their ground connection.
Boat 1, for example itself is made by the high material of resistance, for example accepts the power supply from the heating power supply 3 of AC power formation, produces the heat that is used to make evaporating materials 9 evaporations.Boat 1 is also connecting the anode-side that DC voltage applies power supply 6.
Space in the die cavity 11 by vacuum pump 14 exhausts, becomes specified vacuum state in during film forms via gas outlet 12 and vent valve 13.In order in die cavity 11, to supply with non-active gas (for example argon gas etc.) and reactant gas (for example oxygen), die cavity 11 links to each other with non-active gas supply source 21 and reactant gas supply source 23 via volume control device (MFC) 24 and gas supply pipe 25.The supply of non-active gas supply source 21/stop to be undertaken by open and close valve 21a.The supply of reactant gas supply source 23/stop to be undertaken by open and close valve 23a.
Vacuum tightnesss in the die cavity 11 are measured by vacuometer 15, and based on the output of this vacuometer 15, volume control device 24 is controlled by the control device 30 that is made of microcomputer etc.Thus, to controlling, make that the vacuum tightness in the die cavity 11 remains setting from the gas delivery volume of non-active gas supply source 21 and reactant gas supply source 23.In order to obtain connecting airtight property raising film 51, the vacuum tightness the when layer in the die cavity 11 forms is 1.0 * 10 -2～5.0 * 10 -2Pa, preferably 2.0 * 10 -2～3.0 * 10 -2Pa.At this moment, oxygen concentration is about 1.0 * 10 -2～3.0 * 10 -2Adjust in the scope of Pa.
Formation speed for the lip-deep film of measuring plastic basis material 50 is provided with the thickness monitor 17 that is associated with base material maintaining part 2.The output signal of this thickness monitor 17 is input to control device 30, and this control device 30 is based on the output of the output control heating power supply 3 of thickness monitor 17.So, control is adjusted the evaporation capacity of evaporating materials 9 to the energising amount of boat 1, makes that the formation speed of film is the value of wishing.In order to obtain the connecting airtight property raising film 51 as metal oxide film, the formation speed of this metal oxide film was 5～20 /seconds, preferably 13～18 /seconds.
High frequency power supply 5 for example is that frequency is the high frequency electric source of 10～50MHz, as long as but be set at general 13.56MHz, as the per unit area (cm of the base material maintaining part 2 of sparking electrode 2) be output as 50～800mW, the High frequency power that is preferably 85～170mW is applied in base material maintaining part 2.The high-frequency electric field corresponding with it forms in die cavity 11, thereby generates in die cavity 11 by from gas supplying tubing 25 gas supplied and the plasma that constitutes from evaporating materials 9 vaporized evaporants.Among the particle that has been ionized in this plasma, the particle of positively charged is attracted the surface to base material 50 applying from DC voltage under the effect of Dc bias that power supply 6 puts on base material maintaining part 2.The voltage that applies that applies power supply 6 from DC voltage is 100～400V, preferably 180～230V.
On the other hand, the electronics that has dissociated in the plasma is attracted to applying the boat 1 that the anode-side of power supply 6 links to each other with DC voltage.At this moment, because evaporating materials 9 continues from evaporation source 20 evaporations, therefore, evaporation particle and electron collision see near evaporation source 20 that thus the trace of plasma drops to the luminophor of the shape of evaporation source 20.And, concentrate near evaporation source 20 electronics and be inhaled into ground connection and boat 1 that link to each other with anode-side, with evaporating materials 9 collisions on the boat 1.Thus, if evaporating materials 9 is by boat 1 heating, and then the collision with electronics can promote its evaporation.That is,, can obtain promoting the effect (deposition auxiliaring effect) of evaporation with low temperature owing to the tyco electronics of concentrating to evaporating materials 9.
As shown in Figure 2, die cavity 11 is not attached to DC voltage and applies power supply 6 and high frequency power supply 5, and is also earth-free.That is, die cavity 11 is electric free state.Therefore, can not produce high-frequency discharge between base material maintaining part 2 and die cavity 11, the charged particle in the plasma in the die cavity 11 also can not attracted to the inwall of die cavity 11.Therefore, the cationization in the plasma the particle or the particle of positively charged guided surface efficiently to base material 50, the negative charged particle in the plasma is that electronics is by the evaporating materials 9 of concentrated vectoring on boat 1.Thus, good film can be realized forming, and the evaporation of evaporating materials 9 can be promoted based on electron beam effectively.And then, can suppress the inwall that evaporating materials is attached to die cavity 11.
If plasma is stable in die cavity 11, then by to evaporating materials 9 from the plasma irradiating electron beam, evaporating materials 9 is evaporated by the plasma sucking-off.Therefore, for the speed of adhering to that makes the evaporating materials 9 that is attached to base material 50 keeps certain, then based on the output of thickness monitor 17, control device 30 reduces the output of heating power supply 3.That is, reduce the electrical current of boat 1 or the voltage of switching on.Thus, regulate velocity of evaporation.
Owing to promote the evaporation of evaporating materials 9 by the electron beam of supplying with from plasma, therefore, can suppress the heating current value of boat 1 lower, therefore can continue to keep the evaporation of evaporating materials 9 with lower heating-up temperature, the evaporation of effect that can be by having utilized plasma forms film.
The film of this device forms and is characterised in that supply method from non-active gas to die cavity 11 that supply with.Promptly, initial stage in film formation, from gas supplying tubing 25 with bigger flow to die cavity 11 supply gas, if the evaporation from evaporating materials 9 comes to life, then reduce from gas supplying tubing 25 gas supplied quantity delivereds, thus, in the starting stage that the sluggish film of the evaporation of evaporating materials 9 forms, in die cavity 11, form from the plasma of the non-active gas of gas supplying tubing 25 supplies.If the evaporation from evaporating materials 9 comes to life, then reduce from gas supplying tubing 25 gas supplied quantity delivereds, up in die cavity 11, forming the plasma that accounts for the composition of domination from the evaporation particle of evaporating materials 9.
So, import non-active gas to die cavity 11 by the starting stage that forms at film, can in die cavity 11, form stable plasma apace.Thus, owing to the film that just can utilize action of plasma from the starting stage forms, so can form the film of good connecting airtight property, i.e. connecting airtight property raising film 51 on the surface of base material 50.
Fig. 3 is the figure that is used to illustrate the process more specifically that film forms.In the figure, record be under the surperficial film forming situation of base material 50, in die cavity 11, supply with non-active gas from non-active gas supply source 21, carry out an example of the process that film forms simultaneously.Specifically, the time of Fig. 3 (a) expression gas delivery volume changes, and the time of the vacuum tightness in Fig. 3 (b) expression die cavity 11 changes, and the time of the heating current value of Fig. 3 (c) expression boat 1 changes.
T1 during before film forms the beginning of handling, control device 30 is opened vent valve 13, and by the environmental gas that vacuum pump 14 is discharged in the die cavity 11, the vacuum tightness in the die cavity 11 remains on for example about 10 -3Pa.From this state, control device 30 is opened valve 21a, 23a at moment t10, begins from non-active gas supply source 21 and reactant gas supply source 23 supply gas.Control device 30 is opened valve 21a, 23a at moment t10, begins to mention supply source 21 and reactant gas supply source 23a supply gas from non-active gas.After beginning to supply with this gas, control device 30 is by monitoring the output signal of vacuometer 15, and Control Flow control device 24 for example remains 2 * 10 with the vacuum tightnesss in the die cavity 11 -2Pa.
Thus, beginning is to boat 1 energising, T2 during evaporating materials 9 is heated, and by the high-frequency electric field that applies from high frequency power supply 5, generation plasma die cavity 11 in.The atom or the molecule of the non-active gas that has been ionized in this plasma applying from DC voltage under the effect of Dc bias that power supply 6 puts on base material maintaining part 2, are directed to base material 50.The atom of this non-active gas or molecular jostling be in base material 50, thus during produce base material 50 undesirable intensifications among the T2, at this moment, shutter 18 can be set below base material 50, stop non-active gas to get final product towards base material 50.
During T2, control device 30 control heating power supplies 3, beginning is to boat 1 energising.Follow in this, rise to the heating current value of boat 1 energising, during T2 when finishing, for example reach 150A.The moment t11 of the plasma stability in die cavity 11 opens shutter 18 by the drive unit under the control of control device 30 (not diagram), thus, begins to form film.By the evaporation of evaporating materials 9, the evaporation example is directed in the plasma, so as long as with certain flow from gas supplying tubing 25 supply gas to die cavity 11 in, the vacuum tightnesss in the die cavity 11 are decline just.
But control device 30 Control Flow control device 24 make vacuum tightnesss in the die cavity 11 be maintained at certain value (for example 2 * 10 -2Pa), adjust gas delivery volume thus via gas supplying tubing 25.Consequently be accompanied by from the increase of the amount of evaporating materials 9 evaporation, shown in reference symbol A, the import volume of the non-active gas that imports to die cavity 11 reduces.Therefore, film form during initial stage of T3, the composition of plasma is subjected to the domination of non-active gas, but the composition of this plasma changes to the composition of the domination of the evaporant that is subjected to evaporating materials 9 fast.In order to obtain connecting airtight property raising film 51, be accompanied by increase from the evaporation capacity of evaporating materials 9, shown in reference symbol A,,, controls like that the time shown in reference symbol C so changing owing to reduce to the import volume of die cavity 11 importing non-active gas.In addition, be accompanied by the increase from the evaporation capacity of evaporating materials 9, the import volume that imports oxygen to die cavity 11 increases.
On the other hand, by the supply from the electronics of plasma, promote the evaporation from evaporating materials 9, therefore by carrying out the FEEDBACK CONTROL based on the output of thickness monitor 17, shown in reference symbol B, the electric current that supplies to boat 1 from heating power supply 3 reduces.Through during for example about 2～3 seconds, current value drops to 80A from 150A.Therefore, evaporating materials 9 evaporates under the temperature low-temperature condition lower than common evaporation or ion film plating, so base material 50 can not heat up because of the radiation heat transition from evaporation source 20.
As previously discussed,, under the state that non-active gas is imported die cavity 11, begin to form film, thereby can in die cavity 11, generate good plasma in the starting stage that forms from film according to this embodiment.Thus, evaporating materials is subjected to the effect of plasma from the starting stage, simultaneously by the base material 50 that leads effectively.Consequently can form efficiently by from LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3The connecting airtight property raising film 51 of the middle at least a formation of selecting.
After connecting airtight property raising film 51 forms, ag material is accommodated the boat 1 that remains in evaporation source 20 as evaporating materials 9, with the formation of connecting airtight property raising film 51 similarly, the surface of the connecting airtight property raising film 51 on base material 50 forms silver layer, obtains reflectance coating 52.At this moment, do not use the reactant gas supply source 23 that is used to supply with oxygen isoreactivity gas.In addition, under the situation of the reflectance coating 52 that obtains silver, the vacuum tightness in the die cavity 11 is 1.0 * 10 -2～5.0 * 10 -2Pa, preferably 2.5 * 10 -2～3.5 * 10 -2Pa, the formation speed of reflectance coating 52 was 10～20 /seconds, preferably 15～18 /seconds.
After having formed silver-colored reflectance coating 52, as evaporating materials 9 with MgF 2Or SiO 2Accommodate and remain in boat 1, with the formation of connecting airtight property raising film 51 similarly, form by MgF on the surface of reflectance coating 52 2Or SiO 2The first transparent dielectric layer 53 that constitutes.
Then, use LaTiO as evaporating materials 9 3, La 2Ti 3O 8, SiO 2, TiO 2, Al 2O 3, with the formation of connecting airtight property raising film 51 similarly, form on the surface of the first transparent dielectric layer silver layer 53 by from LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3The second transparent dielectric layer 54 of the middle at least a formation of selecting.
When boat 1 is supplied with each evaporating materials 9, for example supply with each material of connecting airtight property raising film 51, reflectance coating 52, the first and second transparent dielectric layer 53,54 in turn to boat 1 from coating material feeder (not diagram), under the membrance casting condition of each regulation, evaporate in turn, carry out film forming continuously on the surface of substrate 50.
During these films formation, base material 50 is maintained at below 60 ℃.Therefore, the surface that is preferably in plastic basis material 50 forms described each film (layer) 51～54.For example the heat resisting temperature of polycarbonate is 120 ℃～130 ℃, and the heat resisting temperature of polymethylmethacrylate is about 80 ℃, therefore can stacked above one another form each film (layer) 51～54 for these plastic basis materials 50.
So, according to this film formation method,, can in die cavity 11, generate plasma fast at the film formation initial stage because in die cavity 11, supply with the gas that is used to form plasma.Thus, form the starting stage, can make each film (layer) 51～54 of the effect that has utilized plasma, can obtain the catoptron of connecting airtight property and superior durability from film.
In addition, the quantity delivered of supply gas in die cavity 11, it is more to form the initial stage at film, tails off afterwards, therefore can suppress the temperature rising of the base material 50 that causes in base material 50 because of the atom of the non-active gas supplied with to die cavity 11 in or molecular jostling.
And then, by applying the DC electric field that voltage source 6 applies from direct current, in the plasma particle of positively charged or cationization particle be accelerated and fly to base material 50 directions, with base material 50 collisions, be deposited in the surface of base material 50.Form thus and apply film.On the other hand, the electronics with negative charge quickens to the boat 1 that becomes anode-side, concentrates the evaporating materials 9 of collision on boat 1, the energy that evaporating materials 9 is provided for evaporating.So even obtain replacing the high-octane evaporating materials 9 also evaporation easily at low temperatures of heat energy, the plasma in die cavity 11 forms regional evapotranspiration.That is, the electronics in the plasma that forms in die cavity 11 is directed to evaporating materials 9, thus, promotes the evaporation of material, obtains so-called deposition auxiliaring effect, therefore, can further reduce the heat energy of the evaporating materials 9 that is caused by resistance heated etc.Consequently, rise owing to can suppress the temperature of plastic basis material 50, so can more form film under the low temperature state.
From the evaporation capacity of evaporating materials 9 is that output that energy by will imposing on heating arrangements and DC voltage apply power supply 6 is controlled in the described scope and adjusts.In addition, the particle of evaporating materials 9 is to be controlled in the described scope by the output that DC voltage is applied power supply 6 to adjust to the collision energy of base material 50.Thus, can provide enough energy, make it can simply not be deposited in the surface of base material 50, but the atom or the molecules align of the evaporation material layer that the surface of base material 50 forms are arranged again evaporation material.And then, can provide enough energy to the particle of evaporation material, it is soaked in the base material 50.
Therefore, in the present invention, can obtain smooth almost do not have defective, the fine and close and good film 51～54 of connecting airtight property in the film, under the situation of reflectance coating 52, be to approach the almost silverskin of the unijunction crystal layer of fine silver.
In the present invention, the shape of base material does not limit especially.Therefore, for example utilize the plastic basis material 55 of complicated shape as shown in Figure 4, can directly form the silver-colored reflectance coating 56 of the layer structure formation of described film 51～54 on its surface.In addition, the present invention is suitable for making aspheric mirror etc.
The reflectance coating of argentiferous among the present invention, owing to be the film of unijunction crystalloid of the directionality good (on a direction, aliging) of crystallization, so have following advantage.
(1) being that light reflectivity on the wide wavelength bandwidth (being roughly the visible region) of 420～700nm is very high at wavelength, is more than 96%.
(2) incident angle of light is in 10～50 ° scope, and the variable quantity of reflectivity is little, below 0.5%.
(3) the connecting airtight property with plastic basis material etc. is superior.
(4) because connecting airtight property is superior, so corrosion is few, permanance is greatly improved.
So, the reflectance coating evaporation that will contain silver is on the surface of described plastic basis material 50, and this reflectance coating surfaceness is very little, and is smooth in fact, and is the fabulous unijunction crystalloid of directionality of crystallization.At this moment, the surface of reflectance coating almost is the surface state that plastic basis material 50 has been reproduced in directly reflection, and the PV value of plastic basis material 50 of the present invention is below 0.5 μ m, and the projection that does not have acute angle is level and smooth face, therefore, can not impair the high reflectance that reflectance coating has, reflectivity is more than 96%.
Therefore, light reflection mirror of the present invention can utilize its superior characteristic, suitably is used for following illustrative various uses.
The catoptron that A, crystal projection machine are used.
There is no need to make three kinds of catoptrons that correspond respectively to blue light, green light, red light (ternary coloured light), just can obtain high reflectivity each color with a kind of catoptron as the catoptron that uses existing aluminium reflection horizon.
The lamp tunnel that B, DLP projector use (on the inside surface of the matrix of square tube shape, having formed the optics of silverskin and transparent dielectric layer).
Catoptrons such as C, astronomical telescope, telestereoscope.
The use of D, various optical devices the substitute of catoptron in aluminium reflection horizon.
E, because base material is plastics, in the height reflection shaped mirror that has formed the reflectance coating of stipulating to be covered on the concavo-convex special-shaped plastic basis material by shaping on the surface etc.
Then, illustrate the situation that light reflection mirror of the present invention is used for projector.Projector of the present invention comprises: projection lens, and it is used to throw the light modulated that penetrates from the spatial modulation element of liquid crystal display cells etc.; Light reflection mirror of the present invention; With the transmission-type screen of accepting by the light of this mirror reflects.Such back side type projector can enumerate projector shown in Figure 15 as described, or projector shown in Figure 16.
That is, back side type projector shown in Figure 15, at the internal configurations back side of framework mirror 21, by back side mirror 21 reflection from optical engine 22 image projected, and on screen 23 display image.In such perpendicular projection mode, be 80 ° owing to draw the angle, projection distance L1 is more than the 900mm, therefore, the thickness L2 of projector is also more than 500mm.
To this, in the back side type projector of the slimming that proposes recently, as shown in figure 16, utilize aspheric mirror 24 to tilt projection from optical engine 22 image projected, by back side mirror 25 it is reflected and on screen 23 display image.Therefore, can form 160 ° super wide picture angle, projection distance L1 is 200mm, and the thickness L2 of projector also can form following slim of 200mm.In addition, according to the apparatus structure of projector, also use a plurality of level crossings or aspheric mirror sometimes, reflected image throws simultaneously in turn.For this reason, owing to need the high mirror of reflectivity, so light reflection mirror of the present invention goes for the aspheric mirror 24 or the back side mirror 25 of this projector.
＜the second embodiment 〉
As shown in Figure 5, in the light reflection mirror of this embodiment, plastic basis material 50 ' comprise plastics strengthening layer 50a and plastics gloss layer 50b forms reflectance coating 52 on gloss layer 50b surface.
Described plastics strengthening layer 50a and plastics gloss layer 50b if consider its heat distortion temperature, then preferably use thermosetting resin to form.As such thermosetting resin,, for example can use various thermosetting resins such as unsaturated polyester (UP), epoxy resin, phenolics, melamine resin as long as the heat distortion temperature of formed products then is not particularly limited more than 130 ℃.Especially, from the viewpoint of transfer printing, forming dimension stability, preferably use unsaturated polyester resin.
Under the situation of using unsaturated polyester resin, the thermosetting resin constituent that described plastics strengthening layer forms usefulness preferably includes the unsaturated polyester resin of 7～19 quality %, the thermoplastic resin of 6～19 quality %, the inorganic filler of 50～78 quality %, the reinforcing fiber of 8～20 quality % and the rigidizer of 0.1～3 quality %.That is,, can improve intensity by containing the reinforcing fiber of 8～20 quality %.When the amount less than 8 quality % of reinforcing fiber, the intensity that can not get wishing.On the other hand, if the amount of reinforcing fiber surpasses 20 quality %, then the Resin Flow variation is difficult to be shaped, and is therefore not preferred.
In addition, be used to form the thermosetting resin constituent of described plastics gloss layer 50b, be preferably, containing unsaturated polyester resin is 7～19 quality %, thermoplastic resin is 6～19 quality %, inorganic filler is 70～84 quality %, and reinforcing fiber is below the 5 quality %, and rigidizer is 0.1～3 quality %.That is, the amount by making reinforcing fiber below 5 quality %, base material 50 ' the surface become even surface with gloss, therefore, the reflectance coating evaporation to the surface of gloss layer 50b the time, can obtained high reflectivity.If the amount of reinforcing fiber surpasses 5 quality %, then the flatness on surface descends, and PV (peak to valley) value surpasses 0.5 μ m, is difficult to obtain not having acute angle projection and level and smooth forming face, can not get high reflectivity.In addition, in plastics gloss layer 50b, the amount of reinforcing fiber also can be 0 quality %.
As described reinforcing fiber, for example can enumerate: glass fibre, carbon fiber, graphite fiber, aramid fibre, carborundum fiber, alumina fibre, boron fibre, steel fibre, amorphous cellulose, organic fiber etc. also can use a kind of of them or mix two or more the use.The fibre length of reinforcing fiber is preferably 1～3mm, and fibre diameter is 5～100 μ m preferably.If fibre length is long, then the flatness on plastics gloss layer 50b surface might variation.
In order to make light reflection mirror of the present invention, the plastics strengthening layer 50a of the reinforcing fiber that contains 8～20 quality % and the plastics gloss layer 50b that contains the reinforcing fiber below the 5 quality % are carried out stacked above one another to be shaped, obtain plastic basis material 50 ', evaporation reflectance coating on the surface of the base material 50 that obtains ' middle plastics gloss layer 50b.The order that is shaped does not limit especially, any of can be shaped earlier strengthening layer 50a and gloss layer 50b.
Described plastic basis material 50 ', for example be shaped independently respectively strengthening layer 50a and gloss layer 50b bond them and stacked formation one, but preferably carry out progressive forming by a mould.That is, inject the thermosetting resin constituent that strengthening layer is for example used in mould, being shaped forms described strengthening layer 50a, under the state of the not demoulding, injects the thermosetting resin constituent that gloss layer is used in described mould then, and being shaped forms gloss layer 50b.
This minute two-stage shaping the time when being shaped (gloss layer), in order to prevent entrained air, can in degasification, form.Thus, improve the connecting airtight property of strengthening layer 50a and gloss layer 50b, can obtain high bond strength.In addition, (hardening of resin) stage after finishing that is shaped of the first order in mould is injected in the mould partial thermosetting resin constituent at least.
Heat hardening is carried out in the shaping of described thermosetting resin constituent under 135～180 ℃ temperature.As manufacturing process, can enumerate injection moulding, transmit the method that shaping, compression molding etc. are used in the shaping of common thermosetting resin.
The thickness of described plastics gloss layer 50b is preferably thin than described plastics strengthening layer 50a, and under the situation of thickness greater than plastics strengthening layer 50a of plastics gloss layer 50b, the intensity of base material 50 improves might become insufficient.Specifically, the thickness of plastics gloss layer 50b can be about 0.1～0.9 times of thickness of plastics strengthening layer 50a.
In addition, the difference of the linear expansion coefficient of described plastics strengthening layer 50a and plastics gloss layer 50b is preferably 3 * 10 -5/ ℃ in.Difference at linear expansion coefficient has surpassed 3 * 10 -5/ ℃ situation under, might between plastics strengthening layer 50a and plastics gloss layer 50b, produce be full of cracks because of the variation of environment temperature.For the difference with linear expansion coefficient is controlled in the above-mentioned scope, for example, can be at the use level of reinforcing fiber identical gradation composition with the fit on same amount.
It must be even surface that reflectance coating mould and formed products that uses forms the corresponding face of face, and specifically, the surfaceness Rz that stipulates among the JIS B 0601-2001 is below 0.5 μ m, preferably below 0.4 μ m.In addition, be shaped, below enumerate various manufacturing process, for example can adopt: the method for utilizing two moulds to be formed separately in order to carry out described secondary; Perhaps in a mould, process the method for two independent shapes; More preferably finished after the shaping of the first order in the die cavity in mould, the method for the machinery by having utilized hydraulic pressure or motor enlarges the die cavity space and carries out method that the second level is shaped etc.
Method as two independent shapes of processing in a mould; except that above-mentioned; for example can enumerate following method; (1) dividing plate is set; after the either party of strengthening layer and gloss layer that has been shaped; by hydraulic means or by motor unload lower clapboard form shape another the layer; (2) for example; in patrix, be set up in parallel two shapes respectively; form the either party of strengthening layer and gloss layer by any shape, afterwards, open mould; make the slip of counterdie or patrix or make its rotation, use shape shaping the opposing party's on a side layer of the opposing party layer.
In addition, in order to carry out degasification required when carrying out the secondary shaping with a mould, for example can enumerate following method, the release channel of setting gas in mould is the method for gas bend (gas bent), in shaping, only open the method that mould discharges gas a little every the very short time, by to vacuumizing the method that reduces pressure in the mould, utilize mold-slide part mechanism and utilize mould and sliding part between the gap method of carrying out degasification, the jemmy that is used to take out formed products carries out methods such as degasification.By degasification, the survival gas in the mould is discharged, can improve the transfer printing of the resin in the mould.
So the plastic basis material 50 that is shaped ', the PV value on the surface of gloss layer 50b and is the shiny surface that does not have the acute angle projection below 0.5 μ m.Therefore, the demoulding formed products not be used in the surface and smooth layer (internal coating etc.) be set or implement back processing such as polishing, can directly form reflectance coating on its surface, and the PV value that can form the reflectance coating surface that influences by force that is subjected to substrate surface is below 0.5 μ m and do not have an even surface of acute angle projection.
Then, on the surface of the base material that obtains, similarly form the reflectance coating that contains silver with first embodiment.In addition, since identical with first embodiment, so omit explanation.
＜the three embodiment 〉
Fig. 6 represents that the projector of present embodiment with light reflection mirror 100, exists the middle body that becomes light reflection surface 62 and its periphery 63 of being used to throw picture on the reflectance coating surface.Periphery 63 with respect to middle body 62 be towards under the dip plane.In addition, at the boundary member of middle body 62 and periphery 63 or approach the periphery 63 of this boundary member, as shown in Figure 7, be formed with jut 64.This jut 64 spreads all over the full week on reflectance coating surface and is provided with, and surrounds middle body 62.Fig. 2 is the enlarged drawing of the A part of Fig. 1.
The surfaceness Rz of middle body 62 is below 0.5 μ m, preferably at 0.05～0.4 μ m.If the surfaceness Rz of middle body 62 surpasses 0.5 μ m, then the reflectivity at middle body 62 descends, and as described later, is difficult to make reflectivity more than 96%.Especially the reflectance coating surface of middle body 62 forms the shiny surface of the projection that does not have acute angle, and reflectivity is more than 96%.
The size of described jut 64 does not limit especially, but highly is preferably 0.01～0.05mm, and width (the especially width at top) is preferably about 0.01～0.05mm.Thus, can give full play to as the effect that prevents the burrock that reflectance coating corrodes.
Form under the situation of jut 64 at periphery 63, preferably when the shaping of plastic basis material, form jut 64 simultaneously with shaping.
Below, describe for the manufacture method that forms the plastic basis material of jut 64 at periphery 63.
Fig. 8 represent to be used to be shaped described plastic basis material 50,50 ' mould.Mould is made of counterdie 67 and patrix 68, and patrix 68 constitutes by the mold component corresponding with the periphery of plastic basis material 65 with the corresponding mold component 66 of middle body, and these mold components 65,66 are fixedly become one by bolt etc.
At this, in order to make middle body 62 reflection projection lights, it is even surface that die surface also needs.Specifically, the surfaceness Rz that stipulates among the JIS B 0601-2001 is below 0.5 μ m, preferably below 0.4 μ m.
The PV value of the middle body 62 of the plastic basis material that is shaped and is the shiny surface that does not have the acute angle projection below 0.5 μ m.
Jut 64 shown in Figure 7 is to flow in the clearance C that is provided with between mold component 65 and mold component 66 by a part that makes thermosetting resin as shown in Figure 9 to form.
What the width of clearance C was suitable is about 0.01～0.05mm.If the width of clearance C is littler than this scope, then might be difficult to form and effectively prevents the jut 64 that corrodes at reflectance coating periphery.In addition, if greater than this scope, then because jut 64 becomes big, flow into material and become many, forming pressure might disappear.
In addition,, then can not play the effect of corroding of preventing,, then might hinder the light path of projection light if opposite than its height if the height of jut is lower than it.
The plastic basis material 50,50 that is shaped ', if consider its heat distortion temperature, then can use the thermosetting resin formed products.As such thermosetting resin formed products,, for example can use various thermosetting resins such as unsaturated polyester (UP), epoxy resin, phenolics, polycarbonate so long as heat distortion temperature just is being not particularly limited more than 130 ℃.Especially preferably use unsaturated polyester resin.
Under the situation of using unsaturated polyester resin, thermosetting resin constituent and described same, preferably constitute, it is formed and obtain the plastic basis material of regulation shape by the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and the rigidizer of 0.1～3 quality %.
Then,, similarly form the reflectance coating that contains silver, obtain projector's light reflection mirror with first embodiment on the surface of the plastic basis material 50 that obtains.In addition, identical with first and second embodiment, omit explanation.
＜the four embodiment 〉
Figure 10 is the skeleton diagram of an example of the projector of expression present embodiment.This projector is a back side type projector, as shown in figure 10, make light beam from image formation component A image projected along four light reflection mirrors, be the working direction of light, in turn by first light reflection mirror 31, second light reflection mirror 32, the 3rd light reflection mirror 33 and 34 reflections of the 4th light reflection mirror, by plane mirror 35a, 35b reflection, on transmission-type screen 36, amplify projection at last.
As image formation component A, for example can enumerate liquid crystal or DMD (Digital MicromirrorDevice, the trade mark of Dekisatsuinstruments corporate system) etc.
The first, second, third and the 4th each light reflection mirror 31,32,33,34 can be from by shape being the aspheric mirror that parabolic shape, hyperboloid shape, drum, elliptical shape constitute; The free form surface mirror that free form surface by polynomial repressentation constitutes; Spherical mirror; And select among the level crossing to use.Wherein, especially the light reflectivity on the reflectance coating surface of first and second light reflection mirror 31,32 more than 96%.So in will process as expansion in turn, because the light reflectivity of first and second light reflection mirror 31,32 is very high, more than 96%, therefore even under the situation lower such as the light reflectivity of follow-up light reflection mirror 33,34 etc., also can images with high image quality be projected on the screen 36 with striking contrast than it.
Relative with it, be lower than at the light reflectivity of first and second light reflection mirror 31,32 under 96% the situation, even the light reflectivity of follow-up light reflection mirror 33,34 etc., also can't obtain distinct images with high image quality more than 96%.
In the present invention, as long as the light reflectivity of first and second light reflection mirror 31,32 is more than 96%, the light reflectivity of then follow-up light reflection mirror 33,34 etc. can be more than 96%, also can less than 96%.And, in this embodiment, represented to possess the projector of the first, second, third and the 4th light reflection mirror 31,32,33,34 and plane mirror 35a, 35b, but so long as the light reflectivity of first, second light reflection mirror at least that possesses at least three light reflection mirrors and approach image formation component A just can project images with high image quality on the screen 36 brightly more than 96%.
Light reflectivity constitutes at the above-mentioned light reflection mirror more than 96% and forms the reflectance coating that contains silver on the surface at plastic basis material.
The plastic basis material that uses if consider its heat distortion temperature, then can use the thermosetting resin formed products same with first～the 3rd embodiment.In addition, since identical with first～the 3rd embodiment, so omit explanation.
Below, enumerate embodiment the present invention is described, but the present invention is not limited to following embodiment.
Embodiment 1
Mix each composition shown in following with the ratio shown in the table 1, mix obtaining the thermosetting resin constituent by mixer with normal temperature.
Unsaturated polyester resin: the trade name " yupika7123 " of Japanese yupika (strain) corporate system
Thermoplastic resin: the trade name " A-25 " of Japanese yupika (strain) corporate system
Inorganic filling material: the trade name " NS-200 " of day eastern efflorescence industry (strain) corporate system
Rigidizer (A): the trade name " paahekisaHC " of Japanese grease (strain) corporate system
Rigidizer (B): the trade name " paabutipuZ " of Japanese grease (strain) corporate system
Release agent: the trade name " efukokemuZNS-P " of rising sun electrochemical industry (strain) corporate system
[table 1]
Composition Use level (quality %)
Unsaturated polyester resin 11.8
Thermoplastic resin 7.9
Inorganic filling material 78.9
Rigidizer (A) 0.1
Rigidizer (B) 0.3
Release agent 1
The thermosetting resin constituent that obtains is put into compression molding with in the mould, transmit forming machine (prince's machinery (strain) system) with 50t and carry out compression molding, obtain the plastic basis material that thickness is 2mm.Molding condition is as described below.
Forming temperature: 165 ℃
Clamping pressure: 150kgf/cm 2
Injection pressure: 50kgf/cm 2
Firm time: 3 minutes
Then, to the demoulding plastic basis material surperficial unreal apply the worker, according to direct stacked each layer of the order of following (i)～(iv), making light reflection mirror.
(i) connecting airtight property raising film 51: lanthanium titanate LaTiO 3(thickness 40nm)
(ii) reflectance coating 52: silver-colored Ag (thickness 100nm)
The (iii) first transparent dielectric layer 53: magnesium fluoride MgF 2(thickness 73nm)
The (iv) second transparent dielectric layer 54: lanthanium titanate La 2Ti 3O 8(thickness 60nm)
The manufacturing conditions of each layer is as described below.
(I) connecting airtight property raising film 51
Evaporating materials 9:Y 2O 3(purity 99%)
The gas that in die cavity 11, imports: Ar gas and oxygen
Apply electric power: frequency 13.56MHz, 85mW/cm from high frequency power supply 5 to what base material maintaining part 2 applied 2(per unit area of base material maintaining part 2 apply electric power)
Direct current applies power supply 6: cathode side is connected in base material maintaining part 2, and anode-side is connected in boat 1
Apply power supply 6 from direct current and apply voltage: 230V to what base material maintaining part 2 applied
Die cavity 11: the electric free state that does not have ground connection
Y 2O 3The formation speed of layer: 15 /below second
(A) Y 2O 3The starting stage that layer forms (Fig. 3 during T2)
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 350A (T2 latter stage)
(B) Y 2O 3The formation stage (Fig. 3 during T3) of layer
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 230A (T3 latter stage)
And can with thickness the Y of 40nm 2O 3Layer is produced on base material 50 surfaces.This film make whole during, the surface temperature of base material 50 remains on 40 ℃ of less thaies.
From the electric current of heating power supply 3 to boat 1 energising: 230A (T3 latter stage)
And can with thickness the LaTiO of 40nm 3Layer is produced on base material 50 surfaces.This film make whole during, the surface temperature of substrate 50 remains on 40 ℃ of less thaies.
(II) reflectance coating 52
Evaporating materials 9: silver (purity 99.9%)
The gas that in die cavity 11, imports: Ar gas
Apply electric power: frequency 13.56MHz, 85mW/cm from high frequency power supply 5 to what base material maintaining part 2 applied 2(per unit area of base material maintaining part 2 apply electric power)
Direct current applies power supply 6: cathode side is connected in base material maintaining part 2, and anode-side is connected in boat 1
Apply power supply 6 from direct current and apply voltage: 230V to what base material maintaining part 2 applied
Die cavity 11: the electric free state that does not have ground connection
The formation speed of reflectance coating: 5～18 /seconds
(a) reflect the film formed starting stage (Fig. 3 during T2)
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 280A (T2 latter stage)
(b) the formation stage of reflectance coating (Fig. 3 during T3)
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: about 210A (T3 latter stage)
And can be that the reflectance coating of 110nm is produced on Y with thickness 2O 3The surface of layer.This reflectance coating make whole during since 40 ℃ down the heat seal of reaction react a little, therefore the surface temperature with base material 50 remains on about 40～45 ℃.
(III) the first transparent dielectric layer 53
Evaporating materials 9: magnesium fluoride MgF 2(purity 99.9%)
The gas that in die cavity 11, imports: Ar gas
Apply electric power: frequency 13.56MHz, 85mW/cm from high frequency power supply 5 to what base material maintaining part 2 applied 2(per unit area of base material maintaining part 2 apply electric power)
Direct current applies power supply 6: cathode side is connected in base material maintaining part 2, and anode-side is connected in boat 1
Apply power supply 6 from direct current and apply voltage: 230V to what base material maintaining part 2 applied
Die cavity 11: the electric free state that does not have ground connection
MgF 2The formation speed of layer: 15 /below second
(A) MgF 2The starting stage that layer forms (Fig. 3 during T2)
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 350A (T2 latter stage)
(B) MgF 2The formation stage (Fig. 3 during T3) of layer
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 230A (T3 latter stage)
And can with thickness the MgF of 54nm 2Layer is produced on the surface of reflectance coating.At this MgF 2Layer is made whole during owing to or not in the heat seal of reaction more than 40 ℃, so the surface temperature of substrate 50 remains on 40 ℃ of less thaies.
Then,
Evaporating materials 9: yttria Y 2O 3(purity 99%)
The gas that in die cavity 11, imports: Ar gas and oxygen
Apply electric power: frequency 13.56MHz, 85mW/cm from high frequency power supply 5 to what base material maintaining part 2 applied 2(per unit area of base material maintaining part 2 apply electric power)
Direct current applies power supply 6: cathode side is connected in base material maintaining part 2, and anode-side is connected in boat 1
Apply power supply 6 from direct current and apply voltage: 230V to what base material maintaining part 2 applied
Die cavity 11: the electric free state that does not have ground connection
Y 2O 3The formation speed of layer: 15 /below second
(A) Y 2O 3The starting stage that layer forms (Fig. 3 during T2)
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 350A (T2 latter stage)
(B) Y 2O 3The formation stage (Fig. 3 during T3) of layer
Vacuum tightness in the die cavity 11: 2 * 10 -2Pa, certain
From the electric current of heating power supply 3 to boat 1 energising: 230A (T3 latter stage)
And can with thickness the LaTiO of 20nm 3Layer is produced on base material 50 surfaces.This film make whole during, the surface temperature of substrate 50 remains on 40 ℃ of less thaies.
(IV) the second transparent dielectric layer 54
Except using La 2Ti 3O 8Replace described two-layer outside, with described (I) similarly, at Y 2O 3It is the La of 50nm that the surface of layer has made thickness 2Ti 3O 8Layer.At this La 2Ti 3O 8Layer is made whole during owing to or not in the heat seal of reaction more than 40 ℃, so the surface temperature of substrate 50 remains on 40 ℃ of less thaies.
For the light reflection mirror that obtains at embodiment 1, carry out following evaluation test.
1. surface state
The surface state and the PV value on reflectance coating surface have been measured by non-contact three-dimensional profile measurement machine (trade name " NH-3SP " of three hawk ray machines (strain) system).Figure 11 represents its result.Figure 11 represents the 3D shape with 100 times of reflectance coating surfaces of measuring of multiplying power of object lens.As can be seen from Figure 11, the surface of reflectance coating is the even surface that does not have the acute angle projection.In addition, the maximal value of height (thickness) direction of measuring from this figure is 0.21 μ m, and minimum value is-0.2 μ m, so the PV value is about 0.4 μ m.
2. the SEM on surface observes
Under the state that does not form the first transparent dielectric layer 53 and the second transparent dielectric layer 54, with the surface (from the photo on the surface that vergence direction is observed) and the cross section of 5000 times of SEM (scanning electron microscope) observations.Figure 12 and Figure 13 represent their SEM photo respectively.
3. based on (111) peak strength of X-ray diffraction
Use X-ray diffraction device (the RINT1400V type of electric corporation system of science), X ray is output as 50kV-200mA, measurement range 2 θ=10 °～100 °, and with luminous slit-scatter slit-be subjected to optical slits: 1 ° of-1 °-0.3mm measures.Consequently, (111) peak strength of the reflectance coating 52 of embodiment is about 23 times of total of other peak strengths.
4. reflectivity
Utilize photometer (the spectrophotometer U-4000 of (strain) Hitachi system) to measure (wavelength: about 350～750nm) reflectivity in the visible region.Consequently reflectivity is 98%.
In addition, using Cr, CrO, Cr 2O 3, Y 2O 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3Any during as connecting airtight property raising film 51, using SiO 2, Y 2O 3During as the first transparent dielectric layer 53, and using LaTiO 3, SiO 2, TiO 2And Al 2O 3Any during as the second transparent dielectric layer 54, obtained having catoptron with above-mentioned any embodiment identical characteristics.
[comparative example 1]
Except using glass baseplate to be used as the base material, made reflective mirror in the same manner with embodiment 1.About this light reflection mirror, carried out evaluation test similarly to Example 1.Figure 14 represents the 3D shape with 100 times of reflectance coating surfaces of measuring of multiplying power of object lens.As can be seen from Figure 14, the surface of reflectance coating is the more and significant face that rises and falls of acute angle projection.In addition, the maximal value of height (thickness) direction of measuring from this figure is 0.44 μ m, and minimum value is-0.49 μ m, so the PV restriction is 0.93 μ m.
In addition, the reflectivity of measuring similarly to Example 1 is 90%.
Embodiment 2
Mix each composition shown in following with the ratio shown in the table 2, by mixer with normal temperature mix strengthened layer with and each thermosetting resin constituent of using of gloss layer.
Unsaturated polyester resin: the trade name " yupika7123 " of Japanese yupika (strain) corporate system
Thermoplastic resin: the trade name " A-25 " of Japanese yupika (strain) corporate system
Inorganic filling material: the trade name " NS-200 " of day eastern efflorescence industry (strain) corporate system
Reinforcing fiber: the trade name " RES03-BM5 " of Japanese nitre subbundle (strain) corporate system
Rigidizer (A): the trade name " paahekisaHC " of Japanese grease (strain) corporate system
Rigidizer (B): the trade name " paabutipuZ " of Japanese grease (strain) corporate system
Release agent: the trade name " efukokemuZNS-P " of rising sun electrochemical industry (strain) corporate system
[table 2]
Composition Strengthening layer use level (quality %) Gloss layer use level (quality %)
Unsaturated polyester resin 11.8 11.8
Thermoplastic resin 7.9 7.9
Inorganic filling material 63.9 78.9
Reinforcing fiber 15 0
Rigidizer (A) 0.1 0.1
Rigidizer (B) 0.3 0.3
Release agent 1 1
At first, the thermosetting resin constituent that the strengthening layer that obtains is used is put in the transmission molding die, transmitted forming machine (prince's machinery (strain) system) with 50t and form, the thickness that has been shaped is the strengthening layer of 2mm.Molding condition is as described below.
Forming temperature: 165 ℃
Clamping pressure: 150kgf/cm 2
Injection pressure: 50kgf/cm 2
Firm time: 3 minutes
Then, drop into the thermosetting resin constituent that gloss layer is used in identical mould, forming thickness is the gloss layer of 1mm on described strengthening layer.Molding condition is as described below.In addition, in this embodiment,, adopt and in mould, utilized the gas bend to come the structure of degasification as the degasification structure.
Forming temperature: 165 ℃
Clamping pressure: 150kgf/cm 2
Injection pressure: 50kgf/cm 2
Firm time: 3 minutes
The plastics strengthening layer that obtains and the linear expansion coefficient of plastics gloss layer are respectively 2.0 * 10 -5/ ℃ and 0.8 * 10 -5/ ℃, its difference is 1.2 * 10 -5/ ℃.From above-mentioned numerical value as can be seen, strengthening layer and gloss layer can not come off because of the difference of expansivity, thereby integrated.
To the demoulding plastic basis material surperficial unreal apply the worker, according to direct stacked each film (layer) of the order of following (i)～(iv), making light reflection mirror.
(i) connecting airtight property raising film 51:Y 2O 3(thickness 40nm)
(ii) reflectance coating 52: silver-colored Ag (thickness 100nm)
The (iii) first transparent dielectric layer 53: magnesium fluoride MgF 2(thickness 73nm)
The (iv) second transparent dielectric layer 54: lanthanium titanate La 2Ti 3O 8(thickness 60nm)
The manufacturing conditions of each film (layer) is identical with embodiment 1.
Carry out following evaluation test for the light reflection mirror that obtains at embodiment 2.
＜strength test 〉
By JIS K6911 (1995) (bending strength test), the gloss layer that constitutes base material, strengthening layer and compound these the bending strength of base material have been measured.Its result is as shown in table 3.
[table 3]
Figure A20058003785400371
In addition, the SEM on the surface state of the light reflection mirror that obtains at embodiment 2, surface observe, identical based on (111) peak strength and the reflectivity of X-ray diffraction with embodiment 1.
[comparative example 2]
Except using: as base material only use the base material that the moulding material identical with the composition of described gloss layer be shaped (below, be called the gloss base material) with only use with outside described strengthening layer is formed the base material (hereinafter referred to as strengthening base material) that identical moulding material is shaped and embodiment made light reflection mirror in the same manner.Similarly carried out the evaluation test of reflectivity and PV value about this light reflection mirror and embodiment.Its result is as shown in table 4.
[table 4]
Base material The gloss base material Strengthen base material
Reflectivity (%) 98 85
PV value (μ m) 0.4 0.8
Embodiment 3
Except using Fig. 8, mould shown in Figure 9 to be used as the mould, obtained light reflection mirror similarly to Example 1.The plastic basis material that has been shaped, the surfaceness Rz at the position suitable with the middle body of reflectance coating is 0.4 μ m.In addition, because described mould has clearance C, highly be that 0.03mm, width are the jut of 0.03mm so can form at the position of working as with the borderline phase of the periphery on reflectance coating surface and middle body.In addition, the width of periphery (i.e. width from the peripheral part to the projection) is about 1mm.
About the light reflection mirror that obtains at embodiment 3, carried out following evaluation test.
＜corrosion test (moisture resistance test) 〉
The light reflection mirror that will obtain at embodiment 3 kept 100 hours in the environmental gas of humidity 95% 60 ℃ of temperature, checked the carrying out property of the corrosion of this moment.Being that periphery corrodes in the outside of jut consequently, is that middle body is not found corrosion in the inboard of jut.
On the other hand, in the level crossing on the surface that makes reflectance coating lining glass baseplate, owing to do not have projection at periphery, the corrosion that produces at peripheral part proceeds to from about the about 3mm of periphery.
Find out thus and can confirm following effect that the effect that stops the corrosion that takes place in the outside of jut to be carried out to the reflection region of jut inboard has been played in the existence of jut.
The surface state of the light reflection mirror that obtains in addition,, reflectivity and all identical with embodiment 1 based on (111) peak strength of X-ray diffraction.

Claims (39)

1. light reflection mirror, it is characterized in that, by heat distortion temperature the plastic basis material more than 130 ℃ and form on the surface of this base material contain silver reflectance coating constitute, the PV value on described reflectance coating surface is below 0.5 μ m, and be the even surface that does not have the acute angle projection, the reflectivity on described reflectance coating surface is more than 96%.
2. light reflection mirror as claimed in claim 1 is characterized in that,
Described plastic basis material is the thermosetting resin formed products.
3. light reflection mirror as claimed in claim 1 is characterized in that,
Described plastic basis material is the thermosetting resin constituent that the rigidizer by the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and 0.1～3 quality % constitutes to be formed form.
4. a light reflection mirror is characterized in that, comprising:
Plastic basis material, it comprises the plastics strengthening layer of the reinforcing fiber that contains 8～20 quality % and is formed on the surface of this plastics strengthening layer and the plastics gloss layer of reinforcing fiber below 5 quality % that contains; And
Contain the reflectance coating of silver, it is coated on the described plastics gloss layer surface of this plastic basis material.
5. light reflection mirror as claimed in claim 4 is characterized in that,
The thickness of described plastics gloss layer is thinner than described plastics strengthening layer.
6. light reflection mirror as claimed in claim 4 is characterized in that,
The intensity of described plastics strengthening layer is more than 90MPa.
7. light reflection mirror as claimed in claim 4 is characterized in that,
The surface of described plastics gloss layer is that the PV value is below 0.5 μ m and do not have an even surface of acute angle projection.
8. light reflection mirror as claimed in claim 4, wherein,
The difference of the linear expansion coefficient of described plastics strengthening layer and plastics gloss layer is 3 * 10 -5/ ℃ in.
9. light reflection mirror as claimed in claim 4 is characterized in that,
Described plastics strengthening layer is the thermosetting resin constituent that the strengthening layer that the rigidizer by the reinforcing fiber of the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 50～78 quality %, 8～20 quality % and 0.1～3 quality % constitutes forms usefulness to be formed form.
10. light reflection mirror as claimed in claim 4 is characterized in that,
Described plastics gloss layer is the thermosetting resin constituent that the gloss layer that the rigidizer by the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and 0.1～3 quality % constitutes forms usefulness to be formed form.
11. light reflection mirror as claimed in claim 4 is characterized in that,
The described surface of reflectance coating of containing silver is that the PV value is below 0.5 μ m and do not have an even surface of acute angle projection.
12. as claim 1 or 4 described light reflection mirrors, it is characterized in that,
On described plastic basis material, be provided with jut at periphery, be used to throw the middle body that becomes light reflection surface of picture with encirclement.
13. light reflection mirror as claimed in claim 12 is characterized in that,
The height of described jut is 0.01～0.05mm, and width is 0.01～0.05mm.
14. light reflection mirror as claimed in claim 12 is characterized in that,
The surfaceness Rz of middle body is below 0.5 μ m.
15. as claim 1 or 4 described light reflection mirrors, it is characterized in that,
Described reflectance coating is more than 20 times of total of other peak strength based on (111) peak strength of X-ray diffraction.
16. as claim 1 or 4 described light reflection mirrors, it is characterized in that,
The thickness of described reflectance coating is 100～200nm.
17. as claim 1 or 4 described light reflection mirrors, it is characterized in that,
Between described reflectance coating and plastic basis material, accompany connecting airtight property raising film.
18. light reflection mirror as claimed in claim 17 is characterized in that,
Described connecting airtight property raising film is by from Cr, CrO, Cr 2O 3, Y 2O 3, LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3At least a formation of selecting in the group that constitutes, thickness is 10～200nm.
19. as claim 1 or 4 described light reflection mirrors, it is characterized in that,
Be formed with reflection on the surface of described reflectance coating and increase film.
20. light reflection mirror as claimed in claim 19 is characterized in that,
It is by from Y that described reflection increases film 2O 3, MgF 2, LaTiO 3, La 2Ti 3O 8, SiO 2, TiO 2And Al 2O 3The two-layer above transparent dielectric layer that the compound of selecting in the group that constitutes forms.
21. light reflection mirror as claimed in claim 19 is characterized in that,
Described reflection increases the transparent dielectric layer of film stacked at least high index of refraction on the reflectance coating surface and the transparent dielectric layer of low-refraction forms.
22. as claim 3,9 or 10 described light reflection mirrors, wherein,
The mean grain size of described inorganic filler is 0.1～60 μ m.
23. as claim 3,9 or 10 described light reflection mirrors, wherein,
The fibre length of described reinforcing fiber is 1～3mm, and diameter is 5～100 μ m.
24. the manufacture method of a light reflection mirror, comprise: in mould, the thermosetting resin constituent that will be made of the rigidizer of the inorganic filler of the thermoplastic resin of the unsaturated polyester resin of 7～19 quality %, 6～19 quality %, 70～84 quality %, reinforcing fiber below the 5 quality % and 0.1～3 quality % is injected in the mould, carry out heat hardening with 135～180 ℃ temperature, operation that forms plastic basis material and the operation that forms the reflectance coating that contains silver on resulting plastic basis material surface are shaped.
25. the manufacture method of a light reflection mirror comprises: the plastics strengthening layer of the reinforcing fiber that contains 8～20 quality % and the plastics gloss layer that contains the reinforcing fiber below the 5 quality % are carried out stacked shaping and obtain the operation of plastic basis material and form the operation of the reflectance coating that contains silver on the surface of plastics gloss layer among resulting plastic basis material.
26. the manufacture method of light reflection mirror as claimed in claim 25, wherein,
Any of the thermosetting resin constituent that the described strengthening layer of injection is used and gloss layer is used in mould, after be shaped described plastics strengthening layer of formation or plastics gloss layer, inject another kind of thermosetting resin constituent, form plastics gloss layer or plastics strengthening layer thereby be shaped.
27. the manufacture method of light reflection mirror as claimed in claim 26, wherein,
After the shaping of a side thermosetting resin constituent, to carrying out degasification in the described mould, or in degasification, carry out the shaping of described the opposing party's thermosetting resin constituent.
28. the manufacture method of a light reflection mirror forms the thermosetting resin constituent and obtains plastic basis material, and at the surface-coated reflectance coating of this plastic basis material, the manufacture method of described light reflection mirror is characterised in that,
Use is provided with the mould of recess in the part corresponding with periphery of described plastic basis material with the corresponding portion boundary portion of middle body, described plastic basis material is formed, and jut is set at the periphery of plastic basis material, to surround the middle body on reflectance coating surface.
29. the manufacture method of light reflection mirror as claimed in claim 28, wherein,
Described mould has: mold component corresponding with the periphery of described plastic basis material and the mold component corresponding with middle body have the gap under the state that two mold components are combined into one between this two mold component.
30. the manufacture method as each described light reflection mirror in the claim 24,25 or 28 is characterized in that,
Described thermosetting resin constituent also contains the release agent of 0.1～3 quality %.
31. the manufacture method as each described light reflection mirror in the claim 24,25 or 28 is characterized in that,
Before the surface of described plastic basis material forms the reflectance coating that contains silver, form connecting airtight property raising film on the surface of described plastic basis material earlier.
32. the manufacture method as each described light reflection mirror in the claim 24,25,28 or 31 is characterized in that,
After the surface of described plastic basis material forms the reflectance coating that contains silver, form reflection on the surface of reflectance coating and increase film.
33. the manufacture method of light reflection mirror as claimed in claim 32, wherein,
Described reflection increases film and is made of two-layer above transparent dielectric layer.
34. light reflection mirror as claimed in claim 33, wherein,
Described reflection increases the transparent dielectric layer of film stacked at least high index of refraction on the reflectance coating surface and the transparent dielectric layer of low-refraction forms.
35. the manufacture method of a catoptron, stacked described connecting airtight property raising film, the reflectance coating that contains silver and reflection increase film on the surface of described plastic basis material in turn, and the manufacture method of described catoptron is characterised in that, comprising:
The operation that in die cavity, keeps described plastic basis material;
In described die cavity, supply with the operation of the gas be used to generate plasma;
Space in described die cavity applies the operation of high-frequency electric field;
In described die cavity, be heated as described each film raw material evaporating materials and make the operation of its evaporation; And
Control the quantity delivered of described gas in described die cavity, make on described base material when forming described each film, form the gas delivery volume at initial stage, afterwards the gas delivery volume control operation that tails off of the gas delivery volume during than each film;
Wherein, during described each film formed, the film formation method that remains on below 60 ℃ by the temperature with described base material formed connecting airtight property raising film, contains the reflectance coating of silver and reflects the increase film.
36. a projector is characterized in that, possesses each described light reflection mirror in the claim 1,4 or 12.
37. a projector, it is characterized in that via at least three light reflection mirrors projected image on screen,
When with described three light reflection mirrors when the working direction of light is made as first, second and the 3rd light reflection mirror in turn, at least the first and second light reflection mirror constitutes and form the reflectance coating that contains silver on the surface of plastic basis material, and the light reflectivity on reflectance coating surface is more than 96%.
38. projector as claimed in claim 37, wherein,
The shape of described first, second and the 3rd light reflection mirror is: the aspheric mirror that is made of parabolic shape, hyperboloid shape, drum or elliptical shape; The free form surface mirror that free form surface by polynomial repressentation constitutes; Spherical mirror; Perhaps level crossing.
39. projector as claimed in claim 37, wherein,
At least the first and second light reflection mirror is that the PV value on described reflectance coating surface is below 0.5 μ m and do not have an even surface of acute angle projection.
CN 200580037854 2004-11-02 2005-11-02 Light reflection mirror, its manufacturing method, and projector Pending CN101084457A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2004319773A JP2006133331A (en) 2004-11-02 2004-11-02 Light reflection mirror, its manufacturing method, and projector
JP319773/2004 2004-11-02
JP359525/2004 2004-12-13
JP121928/2005 2005-04-20
JP121929/2005 2005-04-20

Publications (1)

Publication Number Publication Date
CN101084457A true CN101084457A (en) 2007-12-05

Family

ID=36726960

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200580037854 Pending CN101084457A (en) 2004-11-02 2005-11-02 Light reflection mirror, its manufacturing method, and projector

Country Status (2)

Country Link
JP (1) JP2006133331A (en)
CN (1) CN101084457A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103347684A (en) * 2010-11-04 2013-10-09 Ccp复合材料公司 Solar reflector in composite material based on resin reinforced with cut fibre, and uses in solar plant
CN103649790A (en) * 2011-06-23 2014-03-19 柯尼卡美能达株式会社 Optical reflection film and method for producing same
CN105403938A (en) * 2015-12-25 2016-03-16 巨洋神州（苏州）数字技术有限公司 Optical extinction reflection sheet and rear projection system
CN106125488A (en) * 2016-06-28 2016-11-16 张家港宝视特影视器材有限公司 A kind of have the curtain intercepting steam function
CN106468792A (en) * 2015-08-19 2017-03-01 扬明光学股份有限公司 Optical devices
CN108196418A (en) * 2018-02-27 2018-06-22 广东欧珀移动通信有限公司 Laser projection module, depth camera and electronic device
CN108375864A (en) * 2018-02-27 2018-08-07 广东欧珀移动通信有限公司 The laser projection module and its detection method of rupture, depth camera and electronic device
US11307431B2 (en) 2018-02-27 2022-04-19 Guangdong Oppo Mobile Telecommunications Corp., Ltd. Laser projection modules and methods for detecting fracture thereof, depth cameras and electronic devices

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013199612A (en) * 2012-03-26 2013-10-03 Kyocera Chemical Corp Unsaturated polyester resin composition and molded product thereof
JP2015014701A (en) * 2013-07-05 2015-01-22 日東光学株式会社 Reflective film, reflective mirror, and projection optical system
JP6302688B2 (en) * 2014-02-03 2018-03-28 ジオマテック株式会社 High reflection film, substrate with high reflection film, and method of manufacturing high reflection film
US10444414B2 (en) 2015-07-27 2019-10-15 Konica Minolta, Inc. Silver reflector, and manufacture method and examination method therefor

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0753866A (en) * 1993-08-11 1995-02-28 Toray Ind Inc Resin composition and molded product
JP3447132B2 (en) * 1993-12-20 2003-09-16 富士通株式会社 projector
DE19641162A1 (en) * 1996-10-07 1998-04-09 Bakelite Ag Reflector blank, and method and means for its production
JP2001184915A (en) * 1999-12-28 2001-07-06 Koito Mfg Co Ltd Lamp reflection mirror and method of manufacturing it
JP2002339084A (en) * 2001-03-13 2002-11-27 Kiyousera Opt Kk Metal film and metal film coated member
JP2003114313A (en) * 2001-10-03 2003-04-18 Kiyousera Opt Kk Reflection mirror and image projector device using the same
JP4128401B2 (en) * 2002-07-12 2008-07-30 Ｓａｂｉｃイノベーティブプラスチックスジャパン合同会社 Reflector

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103347684A (en) * 2010-11-04 2013-10-09 Ccp复合材料公司 Solar reflector in composite material based on resin reinforced with cut fibre, and uses in solar plant
CN103649790A (en) * 2011-06-23 2014-03-19 柯尼卡美能达株式会社 Optical reflection film and method for producing same
CN103649790B (en) * 2011-06-23 2016-10-19 柯尼卡美能达株式会社 Optical reflectance coating and manufacture method thereof
CN106468792A (en) * 2015-08-19 2017-03-01 扬明光学股份有限公司 Optical devices
CN106468792B (en) * 2015-08-19 2019-09-10 扬明光学股份有限公司 Optical devices
CN105403938A (en) * 2015-12-25 2016-03-16 巨洋神州（苏州）数字技术有限公司 Optical extinction reflection sheet and rear projection system
CN106125488A (en) * 2016-06-28 2016-11-16 张家港宝视特影视器材有限公司 A kind of have the curtain intercepting steam function
CN108196418A (en) * 2018-02-27 2018-06-22 广东欧珀移动通信有限公司 Laser projection module, depth camera and electronic device
CN108375864A (en) * 2018-02-27 2018-08-07 广东欧珀移动通信有限公司 The laser projection module and its detection method of rupture, depth camera and electronic device
CN112611546A (en) * 2018-02-27 2021-04-06 Oppo广东移动通信有限公司 Laser projection module, depth camera and electronic device
US11307431B2 (en) 2018-02-27 2022-04-19 Guangdong Oppo Mobile Telecommunications Corp., Ltd. Laser projection modules and methods for detecting fracture thereof, depth cameras and electronic devices

Also Published As

Publication number Publication date
JP2006133331A (en) 2006-05-25

Similar Documents

Publication Publication Date Title
CN101084457A (en) Light reflection mirror, its manufacturing method, and projector
TWI388614B (en) Composite films suitable for use in opto-electronic and electronic devices
CN104169749B (en) Reflective film
US9459379B2 (en) Optical member and method for producing same
USRE41747E1 (en) Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
JP4790396B2 (en) Method for producing transparent film
KR20070090889A (en) Light reflecting mirror, method for manufacturing such light reflecting mirror and projector
KR20110031440A (en) Wire grid type polarizer, and method for manufacturing the polarizer
CN101726767A (en) Optical article and method for manufacturing the same
CN114217438B (en) Grating structure, lens and head-mounted display device
EP1326097A3 (en) Process for forming a thin film and apparatus therefor
JP2008203473A (en) Antireflection structure and structure
JP2014073598A (en) Gas barrier film
US7113338B2 (en) Thin-film structure and method for producing the same
WO2021082400A1 (en) Cvd preparation method for reducing spot defects of camera module and product thereof
JP2010204380A (en) Light reflecting mirror and method of manufacturing the same
CN102141642A (en) Reflective film laminate
CN100418913C (en) Transparent zirconium oxide - tantalum and/or tantalum oxide coating
CN100582044C (en) Vaporizing deposition material for producing highly refractive optical layers
JPS5860701A (en) Reflection preventing film
JP2007046081A (en) Method for producing transparent gas barrier film, and transparent gas barrier film obtained thereby
CN101210312B (en) Film preparation method for balancing film stress
JP2006171059A (en) Optical reflecting mirror, its manufacturing method, and projector
JP2006301232A (en) Light reflecting mirror, method for manufacturing same, and projector
CN114641709B (en) Anti-reflection structure and method for manufacturing same

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication