CN117758225A - Workpiece holder and vacuum equipment - Google Patents
Workpiece holder and vacuum equipment Download PDFInfo
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- CN117758225A CN117758225A CN202410046480.9A CN202410046480A CN117758225A CN 117758225 A CN117758225 A CN 117758225A CN 202410046480 A CN202410046480 A CN 202410046480A CN 117758225 A CN117758225 A CN 117758225A
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- 238000005530 etching Methods 0.000 claims abstract description 40
- 238000000576 coating method Methods 0.000 claims abstract description 32
- 239000011248 coating agent Substances 0.000 claims abstract description 31
- 230000008859 change Effects 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 11
- 230000005540 biological transmission Effects 0.000 claims description 10
- 238000001816 cooling Methods 0.000 claims description 10
- 230000007246 mechanism Effects 0.000 claims description 9
- 239000000498 cooling water Substances 0.000 claims description 5
- 238000007747 plating Methods 0.000 claims description 5
- 230000007306 turnover Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 25
- 230000008569 process Effects 0.000 abstract description 25
- 238000009434 installation Methods 0.000 description 12
- 230000000694 effects Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 6
- 239000007888 film coating Substances 0.000 description 6
- 238000009501 film coating Methods 0.000 description 6
- 238000007789 sealing Methods 0.000 description 6
- 239000011553 magnetic fluid Substances 0.000 description 5
- 238000012840 feeding operation Methods 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000009966 trimming Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000009347 mechanical transmission Effects 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
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Abstract
The application relates to a workpiece frame, a vacuum device, a workpiece frame first rotating shaft, a workpiece frame second rotating shaft and a mounting structure; the mounting structure is designed into a U-shaped structure and comprises two side support arms and a bottom platform, wherein each mounting structure is provided with at least one workpiece disc for placing workpieces, and the workpiece disc is mounted on the bottom platform of the mounting structure; during operation, the first rotating shaft and the second rotating shaft rotate around the rotating axis, so that the mounting structure performs space overturning in the vacuum cavity of the vacuum equipment, the workpiece disc is placed at different space positions on the mounting structure, a balancing device is designed on the mounting structure, the mounting structure is balanced, so that dynamic balance is formed by the mounting structure in overturning, the mounting structure forms dynamic balance in overturning, a two-dimensional space adjusting function is realized, the working efficiency of the vacuum equipment is improved, vibration of the vacuum equipment in a coating/etching process is reduced, and the working stability of the vacuum equipment is maintained.
Description
Technical Field
The application relates to the technical field of vacuum, in particular to a workpiece holder and vacuum equipment.
Background
In vacuum equipment, such as vacuum coating equipment and vacuum etching equipment, a workpiece is typically placed on a workpiece holder or a workpiece tray for coating or etching.
The conventional workpiece frame is one-dimensional rotating, and a plurality of turnover workpiece trays are arranged on some workpiece frames, however, in certain special processes, the requirements on the position and angle adjustment of the workpiece are higher, the requirements of the special processes are difficult to meet in the vacuum cavity space of the conventional workpiece frame, so that the coating or etching effect cannot reach the design requirements, and the use effect of the vacuum equipment is affected.
Disclosure of Invention
The purpose of this application is to solve one of the technical defects of above-mentioned, provides a work rest and vacuum equipment, promotes the result of use of vacuum equipment.
A workpiece holder built into a vacuum chamber of a vacuum apparatus, comprising: the first rotating shaft and the second rotating shaft are positioned on the rotating shaft line, and at least one mounting structure for mounting the workpiece disc is arranged between the first rotating shaft and the second rotating shaft;
the first rotating shaft is mounted on the vacuum cavity through a first fixing seat, and the second rotating shaft is mounted on the vacuum cavity through a second fixing seat;
the mounting structure is designed into a U-shaped structure and comprises two side support arms and a bottom platform, and each mounting structure is provided with at least one workpiece disc for placing workpieces; the workpiece disc is arranged on a bottom platform of the mounting structure;
when the vacuum equipment is in operation, the first rotating shaft and the second rotating shaft rotate around the rotating axis, so that the mounting structure performs space overturning in the vacuum cavity of the vacuum equipment, and the workpiece disc is placed at different space positions.
In one embodiment, the bottom platform of the mounting structure is further flipped about a central axis for flipping the workpiece tray on the bottom platform to a different angle.
In one embodiment, the bottom two side arms of the mounting structure are provided with telescopic structures for longitudinally telescopic movement of the bottom platform along the extending direction of the side arms.
In one embodiment, the first fixing base is provided with a first servo motor connected with the first rotating shaft, and the first servo motor is used for rotating the first rotating shaft to drive the mounting structure to overturn.
In one embodiment, the second fixing seat is provided with a second servo motor which transmits power to the workpiece disc through the first transmission mechanism so as to drive the workpiece disc to rotate.
In one embodiment, the second servo motor further transmits power to the mounting structure through a second transmission mechanism, and the bottom platform of the mounting structure is driven to overturn around the central axis.
In one embodiment, the first rotating shaft is connected to the outer shell of the vacuum cavity through a first magnetic fluid sealing device, and the second rotating shaft is connected to the outer shell of the vacuum cavity through a second magnetic fluid sealing device.
In one embodiment, a heating plate is built into the workpiece tray for heating the placed workpieces.
In one embodiment, the workpiece disc is provided with a temperature sensor for detecting the real-time temperature of the workpiece disc.
In one embodiment, the workpiece disc is internally provided with a cooling cavity, and the cooling cavity is connected with a cooling water channel and used for radiating heat of the workpiece disc.
In one embodiment, the mounting structure is provided with a balancing device provided with a weight plate for balancing the mounting structure such that the mounting structure forms a dynamic balance in flipping.
In one embodiment, the balancing device controls the longitudinal movement of the weight plate in the direction of extension of the side arms and/or controls the lateral swinging of the weight plate in a direction perpendicular to the direction of extension of the side arms.
In one embodiment, the balancing device moves the weight plate to an initial position after the workpiece is placed on the workpiece holder, and adjusts the weight plate in a state in which the workpiece holder is rotated; and detecting the real-time output power of the workpiece frame, acquiring a target position according to the minimum value of the power, and adjusting the weight plate to the target position when the vacuum equipment operates.
In one embodiment, the balancing device detects a change in real-time output power of the workpiece holder during operation of the vacuum apparatus, and adjusts the position of the weight stack until the change is less than a set threshold when the change exceeds the set threshold.
A vacuum apparatus, comprising: the vacuum chamber, the coating equipment or the etching equipment which are arranged in the vacuum chamber, and the workpiece frame;
the workpiece frame is used for placing a workpiece to be coated or etched, and the coating equipment is used for coating or etching the workpiece to be coated.
According to the workpiece frame and the vacuum equipment, the U-shaped structure-shaped mounting structures are designed, at least one workpiece disc for placing workpieces is arranged on each mounting structure, and when the workpiece frame and the vacuum equipment work, the first rotating shaft and the second rotating shaft rotate around the rotating axis, and the mounting structures are spatially turned in the vacuum cavity of the vacuum equipment so that the workpiece discs are placed in different spatial positions; according to the technical scheme, a two-dimensional space adjusting function is realized, and the working efficiency of the vacuum equipment is improved.
Furthermore, the bottom platform with the mounting structure is designed to turn around the central axis, so that the workpiece disc can be turned to different angles, and the workpiece disc can be turned to a specific pointing angle.
Further, the two side support arms at the bottom of the mounting structure are provided with telescopic structures, the workpiece disc is longitudinally telescopic moved along the extending direction of the side support arms, the overturning amplitude and the reachable distance range of the workpiece disc can be adjusted, and therefore the multi-layer layout effect of the workpiece disc can be achieved.
Furthermore, the balancing device is designed on the mounting structure, and the mounting structure is balanced so that dynamic balance is formed in the overturning process, so that the dynamic balance is formed in the overturning process, vibration generated in the coating/etching process of the vacuum equipment is reduced, and the working stability of the vacuum equipment is maintained.
Furthermore, an automatic balancing scheme of the workpiece frame is provided, and after the workpiece is placed on the workpiece frame, quick and convenient automatic balancing after the workpiece is placed on the workpiece frame is realized.
Further, a balance state fine adjustment scheme in the operation process of the vacuum equipment is designed, and the whole workpiece frame is kept in a stable balance state in the operation process of the vacuum equipment, so that the stability of the vacuum equipment can be kept, and the quality and effect of coating/etching are improved.
Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the application.
Drawings
The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:
FIG. 1 is a schematic illustration of a work piece carrier structure of one embodiment;
FIG. 2 is a schematic diagram of an exemplary mounting structure;
FIG. 3 is a schematic side view of an exemplary mounting structure;
FIG. 4 is a schematic side view of another example mounting structure;
FIG. 5 is a schematic view of another example mounting structure;
FIG. 6 is a schematic view of a work piece carrier structure of another embodiment;
FIG. 7 is a schematic side view of an exemplary balancing apparatus;
FIG. 8 is a schematic diagram of an exemplary balancing apparatus control;
fig. 9 is an electrical connection diagram of an example vacuum apparatus.
Detailed Description
Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for the purpose of illustrating the present application and are not to be construed as limiting the present application.
As used herein, the singular forms "a", "an", "the" and "the" are intended to include the plural forms as well, unless expressly stated otherwise, as understood by those skilled in the art. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, but do not preclude the presence or addition of one or more other features, integers, steps, operations.
For the defect of the workpiece holder in the vacuum equipment, the application designs a new workpiece holder, referring to fig. 1, fig. 1 is a schematic workpiece holder structure of an embodiment, the workpiece holder 01 is built in a vacuum cavity 02 of the vacuum equipment 100, an ion source 03 is arranged in the vacuum cavity 02, and the structure comprises: the first rotating shaft 11, the second rotating shaft 12, and at least one mounting structure 13 for mounting the workpiece tray 131, which is provided between the first rotating shaft 11 and the second rotating shaft 12; the first rotating shaft 11 can be mounted on the vacuum cavity 02 through a first fixing seat 11a, the second rotating shaft 12 can be mounted on the vacuum cavity 02 through a second fixing seat 12a, and the first rotating shaft 11 and the second rotating shaft 12 are positioned on the same rotating shaft line; the mounting structures 13 are designed into a U-shaped structure, and can comprise two side support arms 132 and a bottom platform 133, at least one workpiece disc 131 is arranged on the bottom platform 133 of each mounting structure 13, the workpiece disc 131 is arranged on the bottom platform 133, and the workpiece disc 131 is used for placing a workpiece to be coated/etched.
As in the workpiece holder 01 of the above embodiment, in operation, the first rotary shaft 11 and the second rotary shaft 12 rotate about the rotation axis, the mounting structure 13 is turned over in the vacuum chamber 02, and the workpiece tray 131 is placed in different spatial positions.
As for the design of the mounting structure 13, as shown in fig. 1, the number of the mounting structures may be one or a plurality of the mounting structures may be designed, and as shown in fig. 2, fig. 2 is a schematic diagram of an exemplary mounting structure in which two mounting structures 13 are provided between the first rotating shaft 11 and the second rotating shaft 12. Exemplary, as shown in fig. 3, fig. 3 is a schematic side view of an exemplary mounting structure, wherein the side arms 132 of the two mounting structures 13 face opposite to each other, and form an angle of 180 ° therebetween; for example, the two mounting structures 13 form a 180 ° angular arrangement, and in use, the two mounting structures 13 are flipped within the vacuum chamber 02 to place the mounted workpiece tray 131 in different spatial positions.
In addition, in some embodiments, the design of the mounting structure 13 may also be set to three or more; as shown in fig. 4, fig. 4 is a schematic side view of another exemplary mounting structure, where in the design of three mounting structures 13, each mounting structure 13 may have an included angle of 0 °; for another example, four mounting structures 13 are provided, and each mounting structure 13 may be an included angle of 90 ° or the like, and other design schemes are not described here again.
For the design of the workpiece tray 131 on the mounting structure 13, one or more workpiece trays 131 can be mounted; for example, in the layout of the workpiece trays 131, two groups of workpiece trays 131 symmetrical up and down may be disposed on the bottom platform 133 of the mounting structure 13; as shown in fig. 1 to 4, a plurality of sets of workpiece trays 131 may be arranged and mounted on the mounting structure 13, and each set of workpiece trays 131 may be turned over in operation.
According to the scheme of the embodiment, through the installation structure 13 with the U-shaped structural design, the installation structure 13 is supported through the first rotating shaft 11 and the second rotating shaft 12 and integrally overturns around the rotating axis, so that the installed workpiece disc 131 is rotated to different positions in space, coating films or etching at different angles can be realized according to technological conditions when the vacuum equipment is used, a multidimensional space adjusting effect is realized, and the coating film or etching effect of the vacuum equipment is improved.
In one embodiment, referring to fig. 3-5, fig. 5 is a schematic view of another example mounting structure, wherein the bottom platform 133 of the mounting structure 13 is further flipped about a central axis for flipping the workpiece tray 131 on the bottom platform 133 to a different angle; the workpiece tray 131 can be directed to any angular position by the bottom platform 133 also being flipped about the central axis; specifically, according to the coating/etching requirements, a first rotation speed of the first rotating shaft 11 and the second rotating shaft 12 around the rotation axis and a second rotation speed of the bottom platform 133 around the central axis can be set, and through different combination of the first rotation speed and the second rotation speed, the specific pointing angle can be turned, for example, the workpiece on the part of the workpiece disc 131 can be always pointed in the direction of the ion source 03.
As in the solution of the above embodiment, the bottom platform 133 is designed to turn around the central axis, and the specific pointing angle is turned through the combination of the first rotation shaft 11, the second rotation shaft 12 and the different angles of the bottom platform 133, so as to meet the richer coating/etching requirements.
In one embodiment, as shown in fig. 5, the bottom two side arms 132 of the mounting structure 13 may further be provided with a telescopic structure 132b for longitudinally moving the bottom platform 133 in a telescopic manner along the extending direction of the side arms 132; for each mounting platform, when in use, the bottom platform 133 is moved to different lengths in a telescopic manner, so that the overturning amplitude and the reachable distance range of the workpiece disc 131 can be adjusted, and the multilayer layout effect of the workpiece disc 131 can be formed; for this telescoping structure 132b, it may be implemented by a push rod, linear module, or the like, as an example.
As in the solution of the foregoing embodiment, the side support arm 132 pushes the bottom platform 133 to longitudinally stretch through the telescopic structure 132b, so that the workpiece disc 131 can be set to any spatial position according to the requirement, so that the workpiece disc 131 can be adjusted to a suitable spatial position according to the requirement of coating or etching, the coating or etching effect is improved, and the richer coating/etching requirement is satisfied.
In one embodiment, referring to FIG. 6, FIG. 6 is a schematic illustration of a work piece carrier structure of another embodiment; in the present embodiment, a first fixing seat 11a and a second fixing seat 12a are arranged outside the vacuum cavity 02, and a first rotating shaft 11 and a second rotating shaft 12 are fixed, wherein the first rotating shaft 11 is connected to the first fixing seat 11a through the outer shell of the vacuum cavity 02, and the second rotating shaft 12 is connected to the second fixing seat 12a through the outer shell of the vacuum cavity 02; a first servo motor 110 is arranged in the first fixing seat 11a, the end part of the first rotating shaft 11 is connected with the first servo motor 110, and the first servo motor 110 rotates the first rotating shaft 11 to drive the mounting structure 13 to overturn; the second fixing base 12a is internally provided with a second servo motor 120, the end part of the second rotating shaft 12 is connected with the second servo motor 120, and the second servo motor 120 transmits power to the workpiece disc 131 through the first transmission mechanism to drive the workpiece disc 131 to rotate.
In one embodiment, the second servo motor 120 may also transmit power to the mounting structure 13 via a second transmission mechanism to drive the bottom platform 133 of the mounting structure 13 to flip around the central axis. For the first transmission mechanism and the second transmission mechanism, the power can be transmitted into the vacuum cavity 02 through the second rotating shaft 12 by adopting a mechanical transmission mode or a gear set; of course, other mechanical structures can be adopted to transmit power, such as flexible wires, etc., and conventional technical schemes can be adopted for the transmission mechanism, which are not illustrated in the drawings in the embodiment, and specific design schemes are not repeated here.
In one embodiment, as shown in fig. 6, the first rotating shaft 11 may be connected to the outer casing of the vacuum chamber 02 through a first magnetic fluid sealing device 111, and the second rotating shaft 12 may be connected to the outer casing of the vacuum chamber 02 through a second magnetic fluid sealing device 121. According to the technical scheme of the embodiment, non-contact sealing is realized through magnetic fluid sealing, so that energy consumption can be effectively reduced.
In one embodiment, in consideration of the coating process requirement, a heating plate 31c is built in the workpiece tray 131 for heating the placed workpiece, and as shown in fig. 6, the heating plate 31c may be disposed on the surface of the workpiece tray 131; as in the case of the previous embodiment, by heating the workpiece tray 131, heat is transferred to the substrate, i.e., the workpiece, so that molecules of the substrate are more active, providing the quality of the film.
In one embodiment, considering the cooling requirement of some special coating and etching processes, as shown in fig. 6, the workpiece disc 131 is internally provided with a cooling cavity 31d, and the second rotating shaft 12 is internally provided with a cooling water path 31e; the cooling cavity 31d is connected to the water inlet 31f on the second fixing base 12a through a cooling water channel 31 e. In the solution of the above embodiment, in some special film plating processes, when the thin film is amorphous, crystallization of the thin film on the substrate can be avoided by properly cooling the substrate; during vacuum etching, heat generated during etching can be taken away through water cooling, so that the etching quality is improved.
In one embodiment, as shown in fig. 6, a temperature sensor 32 is disposed on the workpiece tray 131, and the temperature sensor 32 is used to detect the real-time temperature of the workpiece tray 131; preferably, in order to facilitate the transmission of detection data, the temperature sensor 32 can wirelessly transmit the detected real-time temperature to the outside of the vacuum cavity 02, so that the state of the workpiece can be monitored in real time, and important data reference is provided for the control of the plating or etching process; for example, in combination with real-time temperature data of the workpiece disk 131, the surface temperature of the workpiece can be controlled to be stable by controlling the flow of the cooling water path 31e, the combination control of the heating plate 31c and the like, so that the working efficiency of coating/etching is improved.
In one embodiment, since the center of gravity of the workpiece rest 01 is offset due to the U-shaped structure design, in order to make the whole mounting structure 13 stable during the overturning process, the mounting platform needs to be trimmed, and accordingly, as shown in fig. 5 to 6, a balancing device 14 may be further arranged on the mounting structure 13 to trim, so that the mounting structure 13 forms dynamic balance during overturning.
For the structural design of the balancing device 14, in some embodiments, it may include a plurality of detachable weight plates 141, and the balancing device 14 may adjust the balance by increasing or decreasing the number of weight plates 141 according to the overall mass of the workpiece holder 01 and the workpiece disc 131 after the workpiece is placed.
In addition, in view of the fact that the overall weight of the mounting structure 13 will vary after the work piece is placed on the work piece tray 131, in order to achieve the balance requirements in different situations, this embodiment provides several embodiments of a balancing device 14, so as to ensure that the overall dynamic balance is maintained during the rotation of the work piece holder 01.
In certain embodiments, as shown in fig. 5-6, the balancing apparatus 14 may be configured to be adjustable, as shown in fig. 7, where fig. 7 is a schematic side view of an exemplary balancing apparatus, and where the left side view is a schematic front view and the right side view is A-A view of the left side view; as shown in fig. 7, the device may include a weight plate 141 and a linear module 142, where the weight plate 141 is mounted on a slider of the linear module 142, and as shown in fig. 8, fig. 8 is a schematic control diagram of an exemplary balancing device, and the weight plate 141 is moved by controlling the slider to move longitudinally along the extending direction of the side arm 132 by a distance L, so that the position of the weight plate 141 may be adjusted to implement a dynamic balancing function of the workpiece rest 01; further, considering the center of gravity shifting situation, the connection portion between the linear module 142 and the mounting structure 13 is hinged, as shown in the direction of the swing arrow in the figure, the linear module 142 can swing around the rotating shaft by an angle θ, and the swing angle θ is within an angle range [ - α, α ], so that the center of gravity shifting position of the weight plate 141 can be adjusted to achieve a better balance state.
As for the control portion of the balancing apparatus 14, it may be exemplified by a controller, which may be a separate hardware or may be the industrial personal computer 04 of the vacuum apparatus, and in the embodiment of the present application, it is preferable to use the industrial personal computer 04 of the vacuum apparatus for the control.
It should be noted that, regarding the installation positions and the installation number of the balancing devices 14, they may be determined according to the actual structural design situation and the requirement of the installation structure 13, and only a part of the design schemes are illustrated in the embodiment of the present application, and no limitation is made to the structure of the balancing devices 14, the installation positions and the installation number thereof.
As in the solution of the above embodiment, the dynamic balance of the workpiece holder 01 during the overturning process can be achieved by the balancing device 14, so that the vibration generated by the vacuum equipment 100 during the coating/etching process is reduced, and the working stability of the vacuum equipment is maintained.
Based on the balancing device 14 of the above embodiment, in view of how to accurately determine the moving distance L and the swinging angle θ of the weight plate 141 during trimming, the embodiments of the present application also provide embodiments of the trimming technical solution, so that quick and convenient automatic trimming after the workpiece rest 01 is placed on the workpiece tray 131 is realized under the condition that different numbers of workpieces are placed on the workpiece tray 131.
In one embodiment, the automatic balancing scheme of the balancing apparatus 14 may include the following:
(1) After the work is mounted on the work tray 131, the balancing device 14 is controlled to move the weight plate 141 to an initial position, and the work frame 01 is rotated by the vacuum apparatus to turn the work frame 01 inside the vacuum chamber 02.
The initial position may be, for example, a normal equilibrium position, i.e. an initial movement distance l=l 0 Swing angle θ=θ 0 Compared with the conventional feeding operation, the balancing processing problem of the whole workpiece frame 01 needs to be considered, and in the scheme of the embodiment, the feeding operation requirement can be reduced, and the balancing processing is completed through automatic balancing.
(2) In the rotating state, the weight plate 141 is controlled to be continuously adjusted within an adjustable range, and meanwhile, the corresponding output power of the workpiece rest 01 is detected in real time.
Illustratively, the workpiece holder 01 is controlled to rotate at a set rotational speed, and the weight plate 141 is adjusted to change within an adjustable range during rotation, while the output power of the first servo motor 110 is detected and fitted to obtain a corresponding output power curve.
(3) And acquiring a corresponding target position according to the minimum value of the output power in the whole adjusting range, and determining the target position of the weight plate 141 to be moved according to the minimum power value of the power curve.
For example, the target position corresponding to the minimum power value can be obtained through the output power curve, and when the vacuum equipment formally starts coating/etching, the balancing device 14 is controlled to adjust the weight plate 141 to the target position for operation.
According to the balancing technical scheme of the embodiment, after the workpiece is placed on the workpiece disc 131, the whole workpiece frame 01 can be quickly and accurately balanced according to the conditions of different distribution positions of the workpiece, the weight of the workpiece does not need to be accurately calculated in advance when the vacuum equipment is used for feeding, the workpiece is placed in a balanced distribution mode, quick feeding can be performed, automatic balancing is performed by utilizing the balancing device 14, the feeding operation efficiency is improved, and the stability of the vacuum equipment in the running process can be ensured.
Based on the adjustment scheme of the foregoing embodiment, the trimming technical scheme of the present embodiment may further include the following when implemented in detail:
at the swing angle θ=θ 0 (typically taken at 0 °) and l=l 0 In the case of (1), the moving distance L of the weight plate 141 is adjusted to move within a variable range, and the moving distance L is determined according to the minimum value of the power curve 1 The weight stack 141 is then moved to this l 1 At the location.
Hold the l 1 The position is unchanged, and the swing angle theta is continuously adjusted to change in an adjustable range, so that the corresponding swing angle theta is obtained when the minimum value of the power curve is obtained 1 Maintaining the swing angle theta 1 The moving distance L of the weight plate 141 is adjusted to move within a variable range, and the moving distance L is determined according to the minimum value of the power curve 2 And … …, repeatedly adjusting until the swing angle theta is obtained n And a movement distance l m As a final target location, the specific number of cycles may be as desired.
According to the balancing technical scheme, hardware equipment is not required to be added, after the workpiece is mounted on the workpiece disc 131, the whole workpiece frame 01 can be automatically and rapidly and accurately balanced in a whole rotating mode, the working efficiency of feeding operation is improved, coating or etching is rapidly carried out on the vacuum equipment, balancing processing is achieved, the working stability of the vacuum equipment is improved, and the quality of coating or etching of the workpiece is improved.
In one embodiment, the balancing device 14 may also detect a change value of the output power of the workpiece holder 01 relative to a minimum value during operation of the vacuum apparatus, and when the change value exceeds a set threshold value, adjust the position of the weight plate 141 until the change value is less than the set threshold value, thereby achieving fine adjustment of the balance state, in consideration of the gravity center shift of the workpiece holder 01 due to the change of the weight of the workpiece or other factors during coating or etching.
Exemplary, at the swing angle θ of the target position 1 And a movement distance l 2 For example, during the formal coating/etching process, the real-time output power of the first servo motor 110 can be detected, and when the variation value of the real-time output power exceeds the set threshold value, the moving distance l can be adjusted 2 To a moving distance l 3 And adjusting the swing angle theta 1 To the swing angle theta 2 And continuously adjusting the power until the change value of the real-time output power is smaller than the set threshold value.
According to the scheme of the embodiment, the balance device 14 can be used for fine adjustment of the weight piece 141 in the process of coating or etching of the vacuum equipment, so that the workpiece frame 01 can be kept in a balanced state when the quality of the workpiece changes after coating/etching in the working process of the vacuum equipment, the stability of the vacuum equipment is further maintained, and the coating/etching quality and effect of the vacuum equipment are improved.
An example of a vacuum apparatus is set forth below.
Referring to fig. 1 to 9, fig. 9 is an electrical connection diagram of an example vacuum apparatus, and the vacuum apparatus 100 of the present application may be a vacuum coating apparatus or a vacuum etching apparatus, including: a vacuum chamber 02, a plating apparatus or etching apparatus 05 built in the vacuum chamber 02, and the work rest 01 of the foregoing embodiment; in addition, the ion source 03 and the industrial personal computer 04 are also included; the workpiece frame 01 is used for placing a workpiece to be coated or etched, and the coating equipment is used for coating the workpiece to be coated; the work rest 01 is mounted in the vacuum chamber 02 in a horizontal manner, and when in use, the work plate 131 is turned over in the vacuum chamber 02.
As shown in fig. 9, the electrical structure of the vacuum apparatus 100 includes an industrial personal computer 04, an ion source 03, and a plating apparatus/etching apparatus 05; the industrial personal computer 04 is connected to the first servo motor 110, the second servo motor 120, the temperature sensor 32, the heating sheet 31c, and the like.
The vacuum equipment 100 controls a sputtering source to perform film coating through the industrial personal computer 04, and utilizes the ion source 03 to assist film coating/etching, in the film coating/etching process, the heating plate 31c or the water cooling pipeline is started according to the film coating process requirement to radiate heat of the workpiece disc 131, and the temperature sensor 32 detects the real-time temperature of the workpiece disc 131, so that accurate parameter support is provided for film coating/etching process control.
According to the vacuum equipment 100, through the installation structure 13 with the U-shaped structural design, the whole installation structure 13 overturns and the workpiece disc 131 is installed on the installation structure, so that the vacuum equipment 100 can automatically adjust the angle of the workpiece disc 131 according to the use process conditions, a two-dimensional space adjusting function is realized, the working efficiency of the vacuum equipment 100 is improved, and through the design of the balancing device 14 on the installation structure 13, the installation structure 13 forms dynamic balance in the overturning process and the fine adjustment of the balancing state in the operation process of the vacuum equipment 100, the vibration generated in the film coating/etching process of the vacuum equipment 100 is reduced, and the working stability of the vacuum equipment 100 is maintained; and an automatic balancing scheme of the workpiece frame 01 is provided, after the workpiece is placed on the workpiece frame 01, the rapid and convenient automatic balancing is realized after the workpiece is placed on the workpiece frame 01, and the whole workpiece frame 01 is kept in a stable balance state in the working process of the vacuum equipment 100, so that the stability can be kept, and the quality and effect of coating/etching are improved.
It will be understood by those skilled in the art that all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs unless defined otherwise. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the prior art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
The foregoing is only a partial embodiment of the present application, and it should be noted that, for a person skilled in the art, several improvements and modifications can be made without departing from the principle of the present application, and these improvements and modifications should also be considered as the protection scope of the present application.
Claims (10)
1. A workpiece holder built into a vacuum chamber of a vacuum apparatus, comprising: the first rotating shaft and the second rotating shaft are positioned on the rotating shaft line, and at least one mounting structure for mounting the workpiece disc is arranged between the first rotating shaft and the second rotating shaft;
the first rotating shaft is mounted on the vacuum cavity through a first fixing seat, and the second rotating shaft is mounted on the vacuum cavity through a second fixing seat;
the mounting structure is designed into a U-shaped structure and comprises two side support arms and a bottom platform, and each mounting structure is provided with at least one workpiece disc for placing workpieces; the workpiece disc is arranged on a bottom platform of the mounting structure;
when the vacuum equipment is in operation, the first rotating shaft and the second rotating shaft rotate around the rotating axis, so that the mounting structure performs space overturning in the vacuum cavity of the vacuum equipment, and the workpiece disc is placed at different space positions.
2. The workpiece holder of claim 1, wherein the bottom platform of the mounting structure is further flipped about a central axis for flipping the workpiece tray on the bottom platform to a different angle.
3. The workpiece holder of claim 1, wherein the bottom two side arms of the mounting structure are provided with telescoping structures for longitudinally telescoping the bottom platform in a direction along which the side arms extend.
4. The workpiece holder of claim 1, wherein the first fixing base is provided with a first servo motor connected with a first rotating shaft, and the first servo motor is used for rotating the first rotating shaft to drive the mounting structure to turn over;
the second fixing seat is provided with a second servo motor which transmits power to the workpiece disc through a first transmission mechanism so as to drive the workpiece disc to rotate.
5. A workpiece holder as defined in claim 3, in which the second servo motor also transmits power to the mounting structure via a second transmission mechanism to drive the bottom platform of the mounting structure to flip about the central axis.
6. The workpiece holder according to claim 1, wherein a heating plate is built in the workpiece tray for heating the placed workpiece;
the workpiece disc is provided with a temperature sensor for detecting the real-time temperature of the workpiece disc;
the workpiece disc is internally provided with a cooling cavity, and the cooling cavity is connected with a cooling water channel and used for radiating the workpiece disc.
7. The workpiece rest of claim 1, wherein the mounting structure is provided with a balancing device provided with a weight plate for balancing the mounting structure so that the mounting structure forms dynamic balance in overturning;
the balance device controls the weight plate to longitudinally move and/or transversely swing.
8. The workpiece holder of claim 7, wherein the balancing device moves the weight plate to an initial position after the workpiece is placed on the workpiece holder and adjusts the weight plate in a rotated state of the workpiece holder; and detecting the real-time output power of the workpiece frame, acquiring a target position according to the minimum value of the power, and adjusting the weight plate to the target position when the vacuum equipment operates.
9. The workpiece holder of claim 5, wherein the balancing device detects a change in real-time output power of the workpiece holder during operation of the vacuum apparatus, and adjusts the position of the weight stack until the change is less than a set threshold when the change exceeds the set threshold.
10. A vacuum apparatus, comprising: a vacuum chamber, a plating apparatus or an etching apparatus built in the vacuum chamber, and the workpiece holder according to any one of claims 1 to 9;
the workpiece frame is used for placing a workpiece to be coated or etched, and the coating equipment is used for coating or etching the workpiece to be coated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410046480.9A CN117758225A (en) | 2024-01-11 | 2024-01-11 | Workpiece holder and vacuum equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202410046480.9A CN117758225A (en) | 2024-01-11 | 2024-01-11 | Workpiece holder and vacuum equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117758225A true CN117758225A (en) | 2024-03-26 |
Family
ID=90310563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202410046480.9A Pending CN117758225A (en) | 2024-01-11 | 2024-01-11 | Workpiece holder and vacuum equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN117758225A (en) |
-
2024
- 2024-01-11 CN CN202410046480.9A patent/CN117758225A/en active Pending
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