CN117690840A - Load port - Google Patents

Load port Download PDF

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Publication number
CN117690840A
CN117690840A CN202311642084.4A CN202311642084A CN117690840A CN 117690840 A CN117690840 A CN 117690840A CN 202311642084 A CN202311642084 A CN 202311642084A CN 117690840 A CN117690840 A CN 117690840A
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CN
China
Prior art keywords
door
container
load port
foup
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202311642084.4A
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Chinese (zh)
Inventor
三浦辰弥
小仓源五郎
重田贵司
小笠原幸雄
河合俊宏
谷山育志
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Sinfonia Technology Co Ltd
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Sinfonia Technology Co Ltd
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Filing date
Publication date
Application filed by Sinfonia Technology Co Ltd filed Critical Sinfonia Technology Co Ltd
Publication of CN117690840A publication Critical patent/CN117690840A/en
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67126Apparatus for sealing, encapsulating, glassing, decapsulating or the like
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/6735Closed carriers
    • H01L21/67389Closed carriers characterised by atmosphere control
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67772Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Glass Compositions (AREA)
  • Paper (AREA)
  • Exchange Systems With Centralized Control (AREA)

Abstract

The invention provides a load port capable of preventing a FOUP from contacting a door and preventing a seal between the load port and the FOUP or the door from being released when the FOUP is moved toward the door. Thus, the load port comprises: the container comprises a base (21), an opening (43), a door (51), a 1 st sealing member (43) for sealing between the base (21) and the container (7), and a 2 nd sealing member (44) for sealing between the base (21) and the door (51), wherein after the container (7) is placed on a placing table (24) for placing the container (7), the door (51) is retracted from an initial position in which the door (51) is in contact with the 2 nd sealing member (44) and an end face of the door (51) on the side of the container (7) is located at a position closer to the container (7) than an abutting surface of the door (51) and the 2 nd sealing member (44).

Description

Load port
The present application is a divisional application of application number 201780021499.6 (international application number PCT/JP 2017/010657) with application name "load port" and application number 2017, 3-16.
Technical Field
The present invention relates to a load port capable of circulating a gas in a wafer transfer chamber without exposing a wafer during transfer to the outside air.
Background
Conventionally, semiconductor manufacturing is performed by performing various processing steps on a wafer as a substrate. In recent years, high integration of devices and miniaturization of circuits have been advanced, and it has been demanded to maintain a high degree of cleanliness of the wafer circumferential edge so that oxygen, moisture, and particles do not adhere to the wafer surface. In order to prevent the change in the surface properties such as oxidation of the wafer surface, the operation of bringing the wafer circumferential edge into a nitrogen atmosphere as an inert gas or into a vacuum state is also performed.
In order to properly maintain the atmosphere around the wafer, the wafer is placed in a sealed type storage box called a FOUP (Front-Opening Unified Pod) and is managed, and the inside of the storage box is filled with nitrogen. A processing apparatus for processing a wafer and a Load Port (Load Port) for transferring a wafer between the processing apparatus and a FOUP are used. The load port forms a part of a wall that separates the wafer processing apparatus from the external space and functions as an interface between the processing apparatus and the FOUP. The processing device and the load port may be directly connected, and EFEM (Equipment Front End Module) may be disposed between the processing device and the load port. The EFEM constitutes a wafer transfer chamber that is substantially enclosed within a housing, and has a load port on one of its opposing walls that functions as an interface with a FOUP, and a load-lock chamber connected to the other wall for preventing direct communication between the processing apparatus and the transfer chamber. A wafer transfer device for transferring a wafer is provided in the wafer transfer chamber, and the wafer is transferred between a FOUP connected to the load port and the load lock chamber by the wafer transfer device. In the wafer transfer chamber, a downward flow, which is clean atmosphere, is always discharged from a fan filter unit disposed at an upper portion of the transfer chamber.
In recent years, in the most advanced process of wafers, there is a possibility that the properties of the wafers may be changed even by oxygen, moisture, or the like contained in clean atmosphere used as a downflow. Therefore, as in patent document 1, a technique for circulating an inert gas in an EFEM is required to be put into practical use.
Prior art literature
Patent literature
Patent document 1: japanese patent laid-open publication No. 2014-112631
Disclosure of Invention
Problems to be solved by the invention
However, in the load port described in patent document 1, an end surface of a door of the load port protrudes toward a FOUP (container). Therefore, there is a problem that: when the FOUP is moved toward the door, the FOUP contacts the door to push the door, and the seal between the load port and the FOUP or door is released. Even when the end surface of the door of the load port does not protrude toward the FOUP, the same problem occurs when the pressure in the FOUP increases as a result of the injection of the inert gas, and the pressure causes a part of the lid of the FOUP to expand or the entire lid to protrude toward the load port.
The present invention has been made to solve the above-described problems, and an object of the present invention is to provide a load port that can prevent a FOUP from coming into contact with a door when the FOUP is moved toward the door, and prevent a seal between the load port and the FOUP or the door from being released.
Solution for solving the problem
The load port of claim 1 is characterized in that,
comprising the following steps:
a base portion that constitutes a part of a wall that partitions the conveyance space from an external space;
an opening provided in the base;
a door that can open and close the opening and fix and release the cover to and from the container containing the content;
a 1 st sealing member for sealing between the base and the container; and
a 2 nd sealing member for sealing between the base and the door,
after the container is placed on the placement table for placing the container, the door is retracted in a direction opposite to the container from an initial position in which the door is in contact with the 2 nd seal member and an end surface of the door on the container side is positioned closer to the container side than a contact surface of the door with the 2 nd seal member.
In this aspect, after the container is placed on the placement table, the door is retracted in a direction opposite to the container from an initial position at which the door is in contact with the 2 nd seal member and the end surface of the door on the container side is located closer to the container side than the contact surface of the door with the 2 nd seal member. This can prevent the container from coming into contact with the door when the container is moved toward the door to come into contact with the 1 st seal member. Thus, the seal between the base and the container or door can be prevented from being released.
The load port according to claim 2 is characterized in that the door abuts against the 2 nd seal member at a door retracted position to which the door is retracted.
In this embodiment, the door abuts against the 2 nd seal member at the door retracted position to which the door is retracted. Thus, when the container is moved toward the door and the container is in contact with the 1 st seal member, a closed space can be formed by at least the base, the 1 st seal member, the 2 nd seal member, the lid, and the door.
The load port of claim 3 is characterized in that,
when the door is in a door retracted position and the container is in contact with the opening portion via the 1 st seal member, a closed space is formed by at least the 1 st seal member, the 2 nd seal member, the cover, and the door, and after the closed space is filled with gas, the door is advanced from the retracted position toward the container.
In this embodiment, after the closed space is filled with the gas, the door is advanced from the retracted position toward the container. Thus, the container and the door are brought close to each other, and the door releases the fixation of the lid body to the container, so that the lid body can be detached from the container.
The load port of claim 4 is characterized in that the door is in contact with the cover at a door advance position to which the door is advanced.
In this aspect, the door is in contact with the cover at a door advance position to which the door is advanced. Thus, the door can reliably release the fixation of the lid body to the container and detach the lid body from the container. In addition, even if the door is inclined due to contact with the cover body, the seal between the door and the 2 nd seal member is released, and the airtight space is filled with the gas, so that the atmosphere does not enter the conveyance space.
The load port of claim 5 is characterized in that a dimension of the 2 nd seal member in a direction in which the door advances and retreats is larger than a dimension of the 1 st seal member in the direction in which the door advances and retreats.
In this embodiment, the dimension of the 2 nd seal member in the direction of the door advancing and retreating is larger than the dimension of the 1 st seal member in the direction of the door advancing and retreating. Thus, the advancing/retreating (moving) distance of the door can be ensured to be large in a state where the door and the 2 nd sealing member are abutted and sealed.
The load port of claim 6 is characterized in that,
comprising the following steps:
A base portion that constitutes a part of a wall that partitions the conveyance space from an external space;
an opening provided in the base;
a door that can open and close the opening and fix and release the cover to and from the container containing the content;
a 1 st sealing member for sealing between the base and the container; and
a 2 nd sealing member for sealing between the base and the door,
after the container is placed on a placement table on which the container is placed, the container is advanced from the placement position toward the door to a container retracted position in which the container is in contact with the 1 st seal member and an end surface of the door in contact with the 2 nd seal member on the container side is spaced apart from the container by a predetermined interval.
In this aspect, after the container is placed on the placement table for placing the container, the container is advanced from the placement position toward the door to the container retracted position where the container is in contact with the 1 st seal member and the end surface of the door in contact with the 2 nd seal member on the container side is spaced apart from the container by a predetermined interval. This can prevent the container from coming into contact with the door when the container is moved toward the door to come into contact with the 1 st seal member. Thus, the seal between the base and the container or door can be prevented from being released.
The load port according to claim 7 is characterized in that, when the container is in the container retracted position, a closed space is formed by at least the 1 st seal member, the 2 nd seal member, the lid body, and the door, and the container is advanced from the container retracted position toward the door after the closed space is filled with gas.
In this embodiment, after the closed space is filled with the gas, the container is advanced from the container retracted position toward the door. Thus, the container and the door are brought close to each other, and the door releases the fixation of the lid body to the container, so that the lid body can be detached from the container.
The load port of claim 8, wherein the lid body is in contact with the door at a container advanced position to which the container is advanced.
In this solution, the cover is in contact with the door in the container advanced position, to which the container is advanced. Thus, the door can reliably release the fixation of the lid body to the container and detach the lid body from the container. In addition, even if the door is inclined due to contact with the cover body, the seal between the door and the 2 nd seal member is released, and the airtight space is filled with the gas, so that the atmosphere does not enter the conveyance space.
The load port of claim 9 is characterized in that the dimension of the 1 st seal member in the direction in which the container advances and retreats opposite to the advancing direction is larger than the dimension of the 2 nd seal member in the direction in which the container advances and retreats.
In this embodiment, the dimension of the 1 st seal member in the direction in which the container advances and retreats opposite to the advancing direction is larger than the dimension of the 2 nd seal member in the direction in which the container advances and retreats. In this way, the distance between the container and the 1 st seal member can be ensured to be large in a state where the container is in contact with and sealed by the 1 st seal member.
ADVANTAGEOUS EFFECTS OF INVENTION
In claim 1, after the container is placed on the placement table, the door is retracted in a direction opposite to the container from an initial position at which the door is in contact with the 2 nd seal member and the end surface of the door on the container side is located closer to the container side than the contact surface of the door and the 2 nd seal member. This can prevent the container from coming into contact with the door when the container is moved toward the door to come into contact with the 1 st seal member. Thus, the seal between the base and the container or door can be prevented from being released.
In claim 2, the door abuts against the 2 nd seal member at the door retracted position to which the door is retracted. Thus, when the container is moved toward the door and the container is brought into contact with the 1 st seal member, a closed space can be formed by at least the base, the 1 st seal member, the 2 nd seal member, the lid, and the door.
In claim 3, after the closed space is filled with the gas, the door is advanced from the retracted position toward the container. Thus, the container and the door come close to each other, and the door releases the fixation of the lid body to the container, so that the lid body can be detached from the container.
In claim 4, the door is in contact with the cover at a door advance position to which the door is advanced. Thus, the door can reliably release the fixation of the lid body to the container and detach the lid body from the container. In addition, even if the door is inclined due to contact with the cover body, the seal between the door and the 2 nd seal member is released, and the airtight space is filled with the gas, so that the atmosphere does not enter the conveyance space.
In claim 5, the dimension of the 2 nd seal member in the direction of the door advancing and retreating is larger than the dimension of the 1 st seal member in the direction of the door advancing and retreating. Thus, the advancing/retreating (moving) distance of the door can be ensured to be large in a state where the door and the 2 nd sealing member are abutted and sealed.
In claim 6, after the container is placed on the placement table for placing the container, the container is advanced from the placement position toward the door to the container retracted position where the container is in contact with the 1 st seal member and the end surface of the door in contact with the 2 nd seal member on the container side is spaced apart from the container by a predetermined interval. This can prevent the container from coming into contact with the door when the container is moved toward the door to come into contact with the 1 st seal member. Thus, the seal between the base and the container or door can be prevented from being released.
In claim 7, after the closed space is filled with the gas, the container is advanced toward the door from the container retracted position. Thus, the container and the door come close to each other, and the door releases the fixation of the lid body to the container, so that the lid body can be detached from the container.
In claim 8, the lid body is in contact with the door at a container advanced position to which the container is advanced. Thus, the door can reliably release the fixation of the lid body to the container and detach the lid body from the container. In addition, even if the door is inclined due to contact with the cover body, the seal between the door and the 2 nd seal member is released, and the airtight space is filled with the gas, so that the atmosphere does not enter the conveyance space.
In claim 9, the 1 st seal member has a larger dimension in the direction in which the container advances and retreats opposite to the advancing direction than the 2 nd seal member has in the direction in which the container advances and retreats. In this way, the distance for advancing and retreating (moving) the container can be ensured to be large in a state where the container is in contact with the 1 st seal member and sealed.
Drawings
FIG. 1 is a side view showing the EFEM with the side walls removed.
Fig. 2 is a perspective view of the load port shown in fig. 1.
Fig. 3 is a side cross-sectional view showing a FOUP and a load port.
Fig. 4 is an enlarged perspective view showing a main portion of a window unit and a door constituting the EFEM.
Fig. 5 is a cross-sectional view of the 1 st O-ring seal of embodiment 1.
Fig. 6 is a cross-sectional view of the 2 nd O-ring seal of embodiment 1.
Fig. 7 is a cross-sectional view of each member forming a closed space.
Fig. 8 is a block diagram showing a connection state of the control unit to each sensor and each driving unit.
Fig. 9 is a flowchart of embodiment 1 when wafers in a FOUP are taken out and put in.
Fig. 10 is a cross-sectional view showing a state in which a FOUP is placed on a stage.
Fig. 11 is a cross-sectional view showing a state in which the FOUP is advanced toward the load port and the door is retracted from the state of fig. 10.
Fig. 12 is a cross-sectional view showing a state in which the door is advanced toward the FOUP from the state of fig. 11.
Fig. 13 is a cross-sectional view showing a state in which the opening of the load port is opened from the state of fig. 12.
Fig. 14 is a cross-sectional view of the 1 st O-ring seal of embodiment 2.
Fig. 15 is a cross-sectional view of a 2 nd O-ring seal of embodiment 2.
Fig. 16 is a flowchart of embodiment 2 when wafers in a FOUP are taken out and put in.
Fig. 17 is a cross-sectional view showing a state when the FOUP is advanced to the retracted position.
Fig. 18 is a cross-sectional view showing a state when the FOUP is further advanced toward the door from the state of fig. 17.
Fig. 19 is a cross-sectional view of the 1 st O-ring seal of embodiment 3.
Fig. 20 is a cross-sectional view of the 2 nd O-ring seal of embodiment 3.
Fig. 21 is a flowchart of embodiment 3 when wafers in a FOUP are taken out and put in.
Fig. 22 is a cross-sectional view showing a state in which the FOUP is advanced to the retracted position and the door is retracted to the retracted position.
Fig. 23 is a cross-sectional view showing a state in which the FOUP and the door are brought closer from the state of fig. 22.
Fig. 24 is a cross-sectional view showing a modification of the 1 st O-ring and the 2 nd O-ring.
Fig. 25 is a cross-sectional view showing a modification in which the 1 st O-ring and the 2 nd O-ring are integrated.
Detailed Description
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
< embodiment 1 >
FIG. 1 is a side view of the interior that can be seen by removing the side walls of the EFEM 1. As shown in fig. 1, the EFEM 1 includes a wafer transfer device 2 for transferring a wafer W between predetermined transfer positions, a box-shaped casing 3 provided so as to surround the wafer transfer device 2, a load port 4 connected to the outside of a front surface side wall of the casing 3, and a control member 5. In the present application, the direction of the side to which the load port 4 is connected when viewed from the housing 3 is defined as the front, and the direction of the side opposite to the side to which the load port 4 is connected when viewed from the housing 3 is defined as the rear.
By controlling the operation of the wafer transfer device 2 by the control means 5, the wafer (content) W stored in the FOUP (container) 7 placed on the load port 4 can be transferred to the transfer space 9 inside the housing 3, and the wafer W after each process can be transferred again into the FOUP 7.
The load port 4 includes a door 51 (see fig. 2), and the FOUP 7 is opened to the conveyance space 9 by connecting the door 51 to the lid 32 provided on the FOUP 7 and moving the door together. A plurality of mounting portions are provided in the vertical direction in the FOUP 7, and thereby a plurality of wafers W can be accommodated. In addition, nitrogen is generally filled in the FOUP 7, and the atmosphere in the FOUP 7 can also be replaced with nitrogen by means of the load port 4 under the control of the control means 5.
The control unit 5 is configured as a controller unit provided in the upper space of the housing 3. The control unit 5 is used to perform driving control of the wafer transfer device 2, nitrogen replacement control of the FOUP 7 by the load port 4, opening and closing control of the door 51, nitrogen circulation control in the housing 3, and the like. The control section 5 is formed of a general microprocessor or the like including a CPU, a memory, and an interface, and a program necessary for processing is stored in the memory in advance, and the CPU sequentially reads and executes the necessary program and cooperates with peripheral hardware resources to realize a desired function. The nitrogen cycle control will be described later.
The internal space of the housing 3 is partitioned by the partition member 8 into a gas return path 10 and a conveying space 9 which is a space required for driving the wafer conveying device 2. The conveying space 9 and the gas return path 10 communicate with each other only at a gas outlet 11 provided in an upper portion of the conveying space 9 extending in the width direction and at a gas suction port 12 provided in a lower portion of the conveying space 9 extending in the width direction. The gas delivery port 11 and the gas suction port 12 circulate the inert gas by generating a downward flow in the transport space 9 and an upward flow in the gas return path 10. In the present embodiment, nitrogen is used as the inert gas, but the circulated gas is not limited to this, and other gases may be used.
A gas supply member 16 for introducing nitrogen into the housing 3 is connected to the rear upper portion of the return path 10. The gas supply section 16 can control the supply of nitrogen and the stop of the supply based on a command from the control section 5. Therefore, when a part of the nitrogen flows out of the casing 3, the nitrogen atmosphere in the casing 3 can be kept constant by supplying the flowing-out amount of nitrogen to the gas supply member 16. A gas discharge member 17 for discharging nitrogen gas in the case 3 is connected to the rear lower portion. The gas discharge means 17 operates in response to a command from the control means 5, and can communicate the inside of the case 3 with a nitrogen gas discharge destination provided outside by opening a shutter, not shown. Then, by using the nitrogen supply by the gas supply means 16, the inside of the casing 3 can be replaced with a nitrogen atmosphere or the pressure in the casing 3 can be controlled. In the present embodiment, the gas supply unit 16 supplies nitrogen because the circulated gas is nitrogen, but in the case of circulating another gas, the gas supply unit 16 supplies the circulated gas.
A fan filter unit 13 (FFU 13) including a filter 13b and a fan 13a as a 1 st air blowing member is provided in the air outlet 11. The fan filter unit 13 removes particles contained in the nitrogen gas circulated in the casing 3, and blows air downward into the conveyance space 9 to generate a downward air flow in the conveyance space 9. In addition, the FFU13 is supported by a support member 18 connected to the partition member 8 and extending in the horizontal direction.
The fan 13a and the fan 15 of the FFU13 described above circulate the nitrogen gas in the housing 3 by causing the nitrogen gas to descend in the transport space 9 and ascend in the gas return path 10. Since the gas outlet 11 opens downward, the FFU13 discharges nitrogen downward. Since the gas suction port 12 is opened upward, the downward Fang Chouxi nitrogen gas can be directed without disturbing the downdraft generated by the FFU13, and a smooth nitrogen gas flow can be formed. Further, by generating a downward air flow in the transfer space 9, particles adhering to the upper portion of the wafer W are removed, the released gas temporarily released from the processed wafer is removed, and the situation in which these released gas and particles float due to the movement of the wafer transfer device 2 or the like in the transfer space 9 is prevented.
Fig. 2 shows a perspective view of the load port 4. The configuration of the load port 4 will be described below.
In the loading port 4, a horizontal base 23 is provided so as to vertically stand up from the rear of the leg portion 25 to which the caster and the installation leg are attached, and so as to face forward from a height position of about 60% of the base 21. A stage 24 for placing the FOUP 7 thereon is provided above the horizontal base 23.
As schematically shown in fig. 3, the FOUP 7 includes a main body 31 having an internal space Sf for accommodating a wafer W (see fig. 1), and a lid 32 for opening and closing an opening 31a provided in one surface of the main body 31 to be a carry-out port of the wafer W. When the FOUP 7 is accurately placed on the stage 24, the lid 32 faces the base 21.
Referring back to fig. 2, the stage 24 is provided with a positioning pin 24a for positioning the FOUP 7, and a locking claw 24b for fixing the FOUP 7 to the stage 24. The locking claws 24b can fix the FOUP 7 by performing a locking operation after properly positioning the FOUP 7 on the stage 24, and can bring the FOUP 7 into a state detachable from the stage 24 by performing an unlocking operation. The stage 24 is driven by a stage driving unit (not shown) to move in the front-rear direction in a state where the FOUP 7 is placed thereon.
Whether the FOUP 7 is positioned at an appropriate position is detected by a positioning sensor 60 disposed near the positioning pin 24 a. Preferably, the positioning sensor 60 is disposed near each positioning pin 24 a. Here, proper positioning means that the height of the bottom surface of the FOUP 7 relative to the stage 24 is within a predetermined range from the upper surface of the stage 24.
The gas injection portion 70 for supplying nitrogen gas into the FOUP 7 and the gas exhaust portion 71 for exhausting nitrogen gas from the FOUP 7 are provided at two positions on the stage 24. The gas injection portion 70 and the gas exhaust portion 71 are generally located below the bottom surface of the FOUP 7 in a properly positioned state, and the gas injection portion 70 and the gas exhaust portion 71 move upward in use and are connected to the gas supply valve 33 (see fig. 3) and the gas exhaust valve 34 provided in the FOUP 7, respectively.
In use, the upper end of the gas injection part 70 contacts the gas supply valve 33 of the FOUP 7, and similarly, the upper end of the gas exhaust part 71 contacts the gas exhaust valve 34 of the FOUP 7. Then, the gas such as dry nitrogen gas can be supplied from the gas injection unit 70 to the internal space Sf of the FOUP 7 via the gas supply valve 33, and the nitrogen gas in the internal space Sf can be discharged from the gas discharge unit 71 via the gas discharge valve 34. The positive pressure setting may be made such that the pressure in the internal space Sf is higher than the pressure in the delivery space 9 of the outer casing 3 by making the nitrogen gas supply amount larger than the nitrogen gas discharge amount.
For the base 21 constituting the load port 4, it forms part of the front surface wall that isolates the conveying space 9 from the external space. As shown in fig. 2, the base 21 includes support posts 21a and 21a standing on both sides, a base body 21b supported by these support posts 21a and 21a, and a window unit 40 attached to a window 21c, and the window 21c is opened in a substantially rectangular shape on the base body 21 b. Here, the substantially rectangular shape as referred to in the present application means a shape formed by smoothly connecting rectangular shapes having four sides as basic shapes and four corners with circular arcs.
The window unit 40 is provided at a position facing the lid 32 (see fig. 3) of the FOUP 7. Since the window unit 40 is provided with the opening 42 (see fig. 4) having a substantially rectangular shape as described in detail later, the conveyance space 9 of the housing 3 can be opened via the opening 42.
The window unit 40 includes a window frame 41, a 1 st O-ring (1 st seal member) 43 as an elastic member attached to the window frame 41, a 2 nd O-ring (2 nd seal member) 44 as an elastic member attached to the window frame 41, and a clamp unit 45 as a pull-in member for bringing the FOUP 7 into close contact with the window frame 41 via the 1 st O-ring 43.
The window frame portion 41 is formed in a frame shape having a substantially rectangular opening 42 formed inside. Since the window frame portion 41 constitutes a part of the base 21 (see fig. 2) as a constituent of the window unit 40, the opening 42 can open the front surface wall of the housing 3.
A 1 st O-ring 43 is disposed on the front surface of the window frame 41 so as to surround the vicinity of the peripheral edge of the opening 42. A 2 nd O-ring 44 is disposed on the rear surface of the window frame 41 so as to surround the vicinity of the peripheral edge of the opening 42.
Fig. 5 is a longitudinal cross-sectional view of the 1 st O-ring 43, and fig. 6 is a longitudinal cross-sectional view of the 2 nd O-ring 44. The cross-sectional shape of the 1 st O-ring 43 and the cross-sectional shape of the 2 nd O-ring 44 are in a chinese "convex" shape. In the figure, an arrow indicates a forward and backward direction of the window unit 40, that is, a forward and backward direction of the FOUP 9 and the door 51, which will be described later. The dimension L1 represents the height dimension of the 1 st O-ring 43 in the advancing and retreating direction of the door 51. The dimension L2 represents the height dimension of the 2 nd O-ring 44 in the advancing and retreating direction of the door 51. That is, in the present embodiment, the dimension L2 of the 2 nd O-ring 44 is larger than the dimension L1 of the 1 st O-ring 43.
The opening 42 is slightly larger than the outer periphery of the lid 32 of the FOUP 7, and the lid 32 can move through the opening 42. In a state where the FOUP 7 is placed on the stage 24, as shown in fig. 7, the front surface of the main body 31 forming the peripheral portion of the lid 32 is in contact with the front surface of the window frame 41 (the base 21) as the contact surface 31b via the 1 st O-ring seal 43. Thus, when the FOUP 7 is attached to the window unit 40, the 1 st O-ring 43 seals (closes) between the periphery of the opening 42 (the base 21) and the FOUP 7.
The door portion 51 is in contact with the rear surface of the window frame 41 via the 2 nd O-ring 44. Thereby, the 2 nd O-ring 44 seals between the peripheral edge of the opening 42 and the door 51.
The sandwiching means 45 are provided at a total of 4 of both side portions of the window frame 41, which are arranged apart in the vertical direction. Each of the gripping units 45 is substantially formed of an engagement piece 46 and a cylinder 47 for operating the engagement piece 46, and each gripping unit 45 presses the FOUP 7 toward the base 21 side in a state where the FOUP 7 is attached to the window unit 40.
When the engaging piece 46 protrudes forward, the tip thereof faces upward, and when the engaging piece 46 is pulled in the rear direction, the tip thereof faces inward in the direction of the FOUP 7. The engagement piece 46 can be engaged with a flange portion protruding laterally from the FOUP 7 by the tip end thereof being directed inward by the pinching operation.
The load port 4 further includes an opening/closing mechanism 50 for opening/closing the window unit 40, and the window unit 40 is configured to be capable of mounting the FOUP 7.
As shown in fig. 3, the opening and closing mechanism 50 includes a door portion 51 for opening and closing the opening portion 42, a support frame 52 for supporting the door portion 51, a movable block 54 for supporting the support frame 52 to be movable in the front-rear direction via a slide support member 53, and a slide rail 55 for supporting the movable block 54 to be movable in the up-down direction with respect to the base main body 21 b.
The door 51 includes an adsorption portion 56 (see fig. 4) for adsorbing the lid 32 of the FOUP 7, and a coupling member 57 for holding the lid 32 for performing a locking operation for opening and closing the lid 32 of the FOUP 7. The door 51 can fix and release the cover 32, and can attach and detach the cover 32 to and from the FOUP 7. The coupling member 57 can be opened by performing the unlocking operation of the cover 32, and can be integrated by coupling the cover 32 to the door 51. In contrast, the coupling member 57 can be also configured to release the coupling between the cover 32 and the door 51 by performing the locking operation of the cover 32, and to put the cover 32 in the closed state by attaching it to the main body 31.
As shown in fig. 3, the door 51 is provided with a gas injection nozzle 73 for injecting nitrogen gas between the FOUP 7 and the door 51 and a gas discharge nozzle 74 for discharging nitrogen gas between the FOUP 7 and the door 51 when the FOUP 7 is mounted on the window unit 40. The upper end of the gas injection nozzle 73 extends to the outer surface of the door 51, and the lower end is connected to a gas supply device (not shown). Similarly, the upper end of the gas discharge nozzle 74 extends to the outer surface of the door 51, and the lower end is connected to a gas discharge device (not shown). In a state where the FOUP 7 and the door 51 are integrated by the chucking unit 45, nitrogen is supplied by communicating the gas injection nozzle 73 with the sealed space Sd (see fig. 7), and nitrogen is discharged by communicating the gas discharge nozzle 74 with the sealed space Sd, whereby nitrogen can be replaced and filled in the sealed space Sd.
Further, actuators (not shown) for moving the door 51 in the front-rear direction and in the up-down direction are provided in each direction, and by applying driving instructions from the control unit Cp to these actuators, the door 51 can be moved in the front-rear direction and in the up-down direction. In this way, the load port 4 is operated by giving a drive command to each unit by the control unit Cp.
As shown in fig. 8, the input side of the control unit Cp is connected to the registration sensor 60, the door position detection sensor 81, the stage detection sensor 82, and the atmosphere sensor 83. The registration sensor 60 detects whether the FOUP 7 is positioned at an appropriate position on the stage 24. The door position detection sensor 81 detects the position of the advance and retreat of the door 51. The stage detection sensor 82 detects a position of the stage 24 in the forward and backward direction. The atmosphere sensor 83 detects humidity and oxygen concentration in the sealed space Sd, and detects whether or not nitrogen is substituted in the sealed space Sd.
The output side of the control unit Cp is connected to a stage driving unit 85, a door driving unit 86, a clamping unit driving unit 87, a gas supply device 88, and a gas discharge device 89. The gas supply device 88 is connected to the gas injection nozzle 73 for supplying nitrogen to the closed space Sd. The gas discharge device 89 is connected to the gas discharge nozzle 74 for discharging nitrogen from the closed space Sd.
Next, the operations of the FOUP 7 and the door 51 when the load port 4 of embodiment 1 is used will be described.
First, in step S1 shown in fig. 9, the ceiling-based conveyor, not shown, places the FOUP 7 at the container transfer position of the stage 24. The container transfer position is a position in which the FOUP 7 can be placed on the stage 24 within the movement range of the stage 24.
At this time, as shown in fig. 10, the door portion 51 is disposed at the door closing position. The door closing position is an initial position where the door 51 is in contact with the 2 nd seal member 44 and the end surface 51a of the door 51 on the FOUP 7 side is located closer to the FOUP 7 side than the contact surface of the door 51 with the 2 nd seal member 44. Specifically, the end surface 51a of the door 51 is located closer to the FOUP 7 than the base 21 of the load port 4, and is within the range of the size of the 1 st O-ring 43 in the front-rear direction.
In step S2, the positioning sensor 60 detects whether the FOUP 7 is positioned at an appropriate position on the stage 24. If the FOUP 7 is not properly positioned, an error is sent to the upper controller and the above steps are repeated.
When the FOUP 7 is properly positioned, the process advances to step S3, where the door driving unit 86 retracts the door 51 from the door closed position in a direction opposite to the FOUP 7 to the door retracted position (see fig. 11). The door retracted position is a position where the door 51 is retracted from the door closed position (initial position) in a direction opposite to the FOUP 7 and the door 51 is brought into contact with the 2 nd seal member 44. The door 51 advances from the rear to the front of the load port 4 and retreats from the front to the rear of the load port 4. These advance and retreat directions are horizontal directions. By retracting the gate 51, the 2 nd O-ring 44 is extended as compared with fig. 10. Whether the door section 51 is retracted to the door retracted position is detected by the door position detection sensor 81.
In step S4, the stage driving unit 85 advances the stage 24 and the FOUP 7 from the container delivery position to the door opening/closing position (see fig. 11). The door opening/closing position is a position in which the lid 32 is fixed to or removed from the FOUP 7 by the coupling member 57 and the lid 32 is attached to or detached from the FOUP 7 in the movement range of the door 51. The movement amount of the FOUP 7 from the container delivery position to the door opening and closing position is 71mm. The stage detection sensor 82 detects whether the stage 24 is moved to the door opening/closing position. When the stage detection sensor 82 detects that the stage 24 is at the door open/close position, the clamp unit 45 is operated according to a signal from the clamp unit driving section 87. This brings the FOUP 7 closer to the load port 4, thereby improving the sealing performance between the FOUP 7 and the base 21 and the 1 st O-ring 43. The FOUP 7 advances from the front of the load port 4 to the rear, and retreats (retreats) from the rear of the load port 4 to the front. These advance and retreat directions are horizontal directions.
When the door 51 is in the door retracted position and the FOUP 7 is in the door open position and is in contact with the window frame 41 of the load port 4 via the 1 st O-ring seal 43, the sealed space Sd is formed. The sealed space Sd is formed by the base 21, the 1 st seal member 43, the 2 nd seal member 44, the lid 32, the FOUP 7, and the door 51. In step S5, the inside of the sealed space Sd is replaced with nitrogen gas from the atmosphere by the gas injection nozzle 73 and the gas discharge nozzle 74. The atmosphere sensor 83 detects whether or not the inside of the closed space Sd is replaced with nitrogen gas.
Thereafter, in step S6, the door driving unit 86 advances the door 51 from the door retracted position toward the FOUP 7 to the door open/closed position (door advanced position) (see fig. 12). When the door 51 is in the door open/close position, the door 51 contacts the lid 32, and the connecting member 57 releases the fixation of the lid 32 to the FOUP 7 and holds the lid 32. Further, the distance between the door retracted position and the door open/close position was set to 3mm.
In step S7, the door driving unit 86 moves the door 51 and the cover 32 held by the door 51 from the door opening position to the door opening position, and opens the opening 42 of the load port 4 (see fig. 13). The door open position is a position where the opening 42 is open and the wafer transfer device 2 can enter the FOUP 7. The wafer transfer device 2 performs the taking-out and the taking-in of the wafer W in the FOUP 7 in this state.
At the end of the taking-out and putting-in of the wafer W, in step S8, the door driving section 86 moves the door section 51 from the door open position to the door open position. At this time, the coupling member 57 attaches and fixes the lid 32 to the FOUP 7. Then, the fixing of the FOUP 7 and the load port 4 by the chucking unit 45 is released, and in step S9, the stage driving unit 85 moves the stage 24 and the FOUP 7 backward to the container transfer position.
Features of the load port of the present embodiment
The load port 4 of the present embodiment has the following features.
In the load port 4 of the present embodiment, after the FOUP 7 is placed on the stage 24, the door 51 is retracted in the opposite direction to the FOUP 7 from the initial position in which the door 51 is in contact with the 2 nd seal member 44 and the end surface 51a of the door 51 on the FOUP 7 side is located closer to the FOUP 7 side than the contact surface of the door 51 with the 2 nd seal member 43. This can prevent the FOUP 7 from coming into contact with the door 51 when the FOUP 7 is moved toward the door 51 to come into contact with the 1 st seal member 43. Thus, even if the FOUP 7 or the door section 51 is pushed out or tilted by the contact, the seal between the base 21 and the FOUP 7 or the door section 51 can be prevented from being released.
In the load port 4 of the present embodiment, the door 51 is in contact with the 2 nd seal member 44 at the door retracted position to which the door 51 is retracted. Thus, when the FOUP 7 is moved toward the door 51 and the FOUP 7 is brought into contact with the 1 st seal member 43, at least the base portion, the 1 st seal member 43, the 2 nd seal member 44, the lid 32, and the door 51 can form a sealed space Sd.
In the load port 4 of the present embodiment, after the sealed space Sd is filled with nitrogen gas, the door 51 is advanced from the retracted position toward the FOUP 7. As a result, the FOUP 7 and the door 51 are brought close to each other, and the coupling member 57 of the door 51 releases the fixation of the lid 32 to the FOUP 7, so that the lid 32 can be detached from the FOUP 7.
In the load port 4 of the present embodiment, the door 51 is in contact with the lid 32 at a door advance position to which the door 51 is advanced. Thus, the coupling member 57 of the door 51 can reliably release the fixation of the lid 32 to the FOUP 7, and the lid 32 can be detached from the FOUP 7. Further, even if the door 51 is inclined due to the contact of the door 51 with the cover 32, and the seal between the door 51 and the 2 nd seal member 44 is released, the air does not enter the conveyance space 9 because the sealed space Sd is filled with nitrogen gas.
In the load port 4 of the present embodiment, the dimension of the 2 nd seal member 44 in the direction in which the door 51 advances and retreats is larger than the dimension of the 1 st seal member 43 in the direction in which the door 51 advances and retreats. In this way, the advancing/retreating (moving) distance of the door 51 can be ensured to be large in a state where the door 51 and the 2 nd seal member 44 are in contact and sealed.
< embodiment 2 >
Since each structure of embodiment 2, for example, the load port 4 is the same as that of embodiment 1, the description thereof will be omitted. In embodiment 1, the dimension L2 of the 2 nd O-ring 44 is larger than the dimension L1 of the 1 st O-ring 43. However, as shown in fig. 14 and 15, embodiment 2 is different from embodiment 1 in that the dimension L1 of the 1 st O-ring seal 43 is larger than the dimension L2 of the 2 nd O-ring seal 44.
Next, the operations of the FOUP 7 and the door 51 when the load port 4 according to embodiment 2 is used will be described. Note that, since the definition of each position of the FOUP 7, such as the container transfer position, and the door portion 51, such as the door closing position, is the same as embodiment 1, the description thereof will be omitted.
First, in step S11 shown in fig. 16, the ceiling-based walk-behind unmanned conveyor, not shown, places the FOUP 7 at the container transfer position of the stage 24.
At this time, as shown in fig. 17, the door section 51 performs the operation of holding the door by the door pushing mechanism 90 in the door closing position. The door pushing mechanism 90 is disposed in plural along the opening periphery of the opening 42 on the wall surface of the base 21 on the conveyance space 9 side. The main components of the door pushing mechanism 90 are a cylinder 91, a rod 92 that can protrude from the cylinder 91 or retract into the cylinder 91, and a roller 93 rotatably provided at the tip end portion of the rod 92. The cylinder 91 is attached to a bracket 94 that is disposed obliquely from the base 21 so as to appropriately press the roller 93 against the door 51. By appropriately pressing the roller 93 against the gate 51, the sealability achieved by the base 21, the gate 51, and the 2 nd O-ring 44 can be improved.
In step S12, the positioning sensor 60 detects whether the FOUP 7 is positioned at an appropriate position on the stage 24. If the FOUP 7 is not properly positioned, the above steps are repeated.
If the FOUP 7 is properly positioned, the process advances to step S13. In step S13, the mounting table 24 and the FOUP 7 advance from the container transfer position toward the door 51 to the container retracted position (see fig. 17). The container retracted position is a position where the FOUP 7 abuts against the 1 st O-ring 43 and the end surface of the door 51 abutting against the 2 nd O-ring 44 on the FOUP 7 side is spaced apart from the FOUP 7 by a predetermined interval. The container retracted position is located between a container opening and closing position and a container delivery position, which will be described later.
At this time, since the closed space Sd is formed, the inside of the closed space Sd is replaced with nitrogen from the atmosphere by the gas injection nozzle 73 and the gas discharge nozzle 74 to fill with nitrogen in step S14.
In step S15, the stage driving unit 85 advances the stage 24 and the FOUP 7 from the container retracted position toward the door 51 to the container open/closed position (container advanced position) (see fig. 18). The container opening/closing position is a position in which the wafer transport device 2 can take out the wafer W in the FOUP 7 through the opening 42 in the movement range of the stage 24. When the FOUP 7 is in the container open/close position, the door 51 contacts the lid 32, and the coupling member 57 releases the fixation of the lid 32 to the FOUP 7 and holds the lid 32. The movement amount of the FOUP 7 from the container retracted position to the container open/close position was set to 8mm.
Thereafter, the door is released from the grip, and in step S16, the door portion 51 and the cover 32 are moved from the door open position to the door open position. The wafer transfer device 2 performs the taking-out and the taking-in of the wafer W in the FOUP 7 in this state.
If the taking out and putting in of the wafer W are completed, the process advances to step S17. In step S17, the door driving unit 86 moves the door 51 from the door open position to the door open position. At this time, the coupling member 57 attaches the cover 32 to the FOUP 7, and performs a door pinching operation.
Then, the fixing between the FOUP 7 and the load port 4 by the chucking unit 45 is released, and in step S18, the stage driving unit 85 moves the stage 24 and the FOUP 7 backward to the container transfer position.
Features of the load port of the present embodiment
The load port 4 of the present embodiment has the following features.
In the load port 4 of the present embodiment, after the FOUP 7 is placed on the stage 24 for placing the FOUP 7, the FOUP 7 is advanced from the placement position toward the door 51 to the container retracted position where the FOUP 7 is in contact with the 1 st O-ring 43 and is spaced apart from the end surface of the door 51 on the FOUP 7 side in contact with the 2 nd O-ring 44 by a predetermined interval. This can prevent the FOUP 7 from coming into contact with the door 51 when the FOUP 7 is moved toward the door 51 to come into contact with the 1 st O-ring 43. Therefore, even if the FOUP 7 or the door section 51 is inclined due to contact, the seal between the base 21 and the FOUP 7 or the door section 51 can be prevented from being released.
In the load port 4 of the present embodiment, after the sealed space Sd is filled with nitrogen gas, the FOUP 7 is advanced toward the door 51 from the container retracted position. As a result, the FOUP 7 and the door 51 are brought close to each other, and the suction portion 56 of the door 51 releases the fixation of the lid 32 to the FOUP 7, so that the lid 32 can be detached from the ROUP 7.
In the load port 4 of the present embodiment, the lid 32 is in contact with the door 51 at the container advanced position to which the FOUP 7 advances. Thus, the suction portion 56 of the door 51 can reliably release the fixing of the lid 32 to the FOUP 7, and the lid 32 can be detached from the FOUP 7. Further, even if the door 51 is inclined due to the contact of the door 51 with the cover 32, and the seal between the door 51 and the 2 nd O-ring 44 is released, the air does not enter the conveyance space 9 because the sealed space Sd is filled with nitrogen gas.
< embodiment 3 >
Since each structure of embodiment 3, for example, the load port 4 is the same as that of embodiment 1, the description thereof will be omitted. In embodiment 1, the dimension L2 of the 2 nd O-ring 44 is larger than the dimension L1 of the 1 st O-ring 43. However, embodiment 3 shown in fig. 19 and 20 is different from embodiment 1 in that the dimension L1 of the 1 st O-ring seal 43 and the dimension L2 of the 2 nd O-ring seal 44 are substantially equal.
Next, the operation of the FOUP 7 and the door 51 when the load port 4 according to embodiment 3 is used will be described. Note that, since the definition of each position of the FOUP 7, such as the container transfer position, and the door portion 51, such as the door closing position, is the same as embodiment 1, the description thereof will be omitted.
First, in step S21 shown in fig. 21, the ceiling-based walk-behind unmanned conveyor, not shown, places the FOUP 7 at the container transfer position of the stage 24.
In step S22, the positioning sensor 60 detects whether the FOUP 7 is positioned at an appropriate position on the stage 24. If the FOUP 7 is not properly positioned, the above steps are repeated.
When the FOUP 7 is properly positioned, the process advances to step S23, where the door 51 is retracted from the door closed position to the door retracted position (see fig. 22). At the same time or with a delay, the stage 24 and the FOUP 7 are advanced from the container transfer position to the container retracted position in step S24. Accordingly, in a state where the door 51 is in contact with the 2 nd O-ring 44 and the FOUP 7 is in contact with the 1 st O-ring 43, contact between the door 51 and the lid 32 can be reliably prevented. The distance between the door closing position and the door retracted position is preferably 4mm or less.
At this time, since the closed space Sd is formed, the inside of the closed space Sd is replaced with nitrogen from the atmosphere by filling the nitrogen gas with the gas injection nozzle 73 and the gas discharge nozzle 74 in step S25.
Next, in step S26, the stage 24 and the FOUP 7 are placed close to the door 51 from the container placement position. In other words, the stage 24 and the FOUP 7 are advanced toward the door 51. At the same time, in step S27, the door 51 is brought closer to the FOUP 7 from the door retracted position. In other words, the door 51 is advanced toward the FOUP 7.
With step S26 and step S27, as shown in fig. 23, the cover 32 is brought into contact with the gate 51. At this time, by setting the driving force of the stage driving section 85 and the closing force of the door section 51 of the door driving section 86 to be equal, even if the cover 32 and the door section 51 come into contact, it is possible to prevent a situation in which either the cover 32 or the door section 51 is inclined.
In a state where the lid 32 and the door 51 are in contact, the coupling member 57 releases the fixation of the lid 32 to the FOUP 7, and holds the lid 32.
Then, in step S28, the door driving unit 86 moves the door 51 and the cover 32 to the door open position. After the completion of the operation in step S28 or in conjunction with the operation, the stage 24 is advanced toward the door 51, and moved to a predetermined position where the wafer W can be taken out. The wafer transfer device 2 performs the taking-out and the taking-in of the wafer W in the FOUP 7 in this state.
If the taking out and putting in of the wafer W are completed, the process advances to step S29. In step S29, the door driving unit 86 moves the door 51 from the door open position to the door open position. At this time, the coupling member 57 attaches the cover 32 to the FOUP 7, and performs a door pinching operation.
Then, the fixing between the FOUP 7 and the load port 4 by the chucking unit 45 is released, and in step S30, the stage driving unit 85 moves the stage 24 and the FOUP 7 backward to the container transfer position.
The embodiments of the present invention have been described above with reference to the drawings, but the specific configuration is not limited to these embodiments. The scope of the present invention is expressed not only by the description of the embodiments described above but also by the claims, and also by all changes that come within the meaning and range of equivalency of the claims.
The load port 4 of the illustrated embodiment is provided in the EFEM 1. However, the present invention is not limited to this, and the present invention may be applied directly to a processing apparatus without using the EFEM 1, or to a sorting apparatus for replacing and aligning wafers W in the FOUP 7, or to a storage apparatus for temporarily storing wafers W in the FOUP 7.
In the above embodiment, the FOUP 7 is used as an example of the container, but the present invention is not limited thereto. For example, MAC (Multi Application Carrier) and FOSB (Front Opening Shipping Box) used for wafer transfer may be used as the container. Further, the present invention can also be applied to a container for transporting an article that needs to maintain a predetermined environment with respect to the outside air, in addition to the wafer transport.
In the above embodiment, the wafer W is illustrated as the storage object stored in the container, but the present invention is not limited thereto. For example, an electronic component, a substrate used for a flat panel display, a cell culture container for storing cells, or the like may be stored.
In the above embodiment, nitrogen is used as the gas, but the present invention is not limited thereto. For example, a desired ambient gas such as dry gas or argon gas may be used.
In the embodiment, whether the door portion 51 is retracted to the door retracted position is detected by the door position detection sensor 81. However, the detection is not limited to this, and may be performed based on the driving state of the gate driving unit 86, or may be performed based on whether or not a predetermined time has elapsed by a timer.
In the embodiment, whether the stage 24 moves to the parking position is detected by the stage detection sensor 82. However, the detection is not limited to this, and may be performed based on a signal from the stage driving section 85, or may be performed based on whether or not a predetermined time has elapsed by a timer.
In the embodiment, whether or not to replace the inside of the closed space Sd with nitrogen gas is detected by the atmosphere sensor 83. However, the present invention is not limited to this, and the detection may be performed by a timer according to whether or not a predetermined time has elapsed.
In the embodiment, the nitrogen gas is ejected from the gas injection unit 70 from the time immediately after the FOUP 7 is placed on the stage 24 to the time when the stage 24 is advanced to the container opening/closing position or the container retracted position. However, the present invention is not limited to this, and the atmosphere around the door 51 may be simultaneously discharged from the gas discharge portion 71.
The material of the 1 st O-ring 43 and the 2 nd O-ring 44 is not particularly limited. The sealing member may be an O-ring made of fluororubber or silicone rubber, or an elastic member such as sponge made of ethylene propylene rubber such as EPDM (ethylene propylene diene monomer). In the case of an O-ring made of fluororubber or silicone rubber, the O-ring may have a hollow structure so as to have an elastic force. In the case of the hollow structure, the sealability and the contact position of other members can be adjusted by supplying gas into the hollow portion or discharging gas from the hollow portion.
In the embodiment, the 1 st O-ring 43 and the 2 nd O-ring 44 having a Chinese "convex" shape in cross section are used. However, the present invention is not limited to this, and a seal member having a thin plate-like cross section that is gently curved may be used as shown in fig. 24. Thus, the gas in the sealed space Sd is not likely to enter the conveyance space 9, and the outside atmosphere can be prevented from entering the sealed space Sd from the FOUP 7.
In the embodiment described, separate 1 st O-ring seals 43 and 2 nd O-ring seals 44 are employed. However, as shown in fig. 25, an integrated O-ring 43 attached to the opening edge of the base 21 may be used, in which one end is brought into contact with the FOUP 7 and the other end is brought into contact with the door 51, thereby sealing the sealed space Sd. At this time, the sealed space Sd is formed by at least the O-ring 43, the lid 32, and the door 51, which are integrally formed by the 1 st O-ring and the 2 nd O-ring.
In the embodiment described above, the lid 32 protrudes from the contact surface 31b of the FOUP 7 toward the load port 4, and the protruding amount is set to ±5mm with respect to the designed dimension, for example. Further, the protruding amount of the lid 32 when nitrogen gas is injected into the FOUP 7 is set to about 3mm.
In the embodiment, the door 51 is moved relative to the FOUP 7 in a state where the door 51 holds the lid 32, so that the lid 32 is attached to and detached from the FOUP 7. However, the present invention is not limited thereto, and the cover 32 may be attached to or detached from the FOUP 7 by moving the table 24 and the FOUP 7 to the position shown in fig. 17 in a state where the door 51 is fixed to the cover 32 (see fig. 18). Further, both the mounting table 24 and the door 51 may be moved to attach and detach the cover 32 to and from the FOUP 7. That is, the cover 32 may be attached and detached by changing the relative distance between the FOUP 7 and the cover 32.
The present invention can also be applied to a load port in which the 1 st O-ring 43 and the 2 nd O-ring 44 are not provided. The configuration of the load port is the same as that of the embodiment except that the 1 st O-ring 43 and the 2 nd O-ring 44 are not provided, and therefore, the description thereof is omitted. That is, in the case where the door protrudes from the base portion of the load port toward the outside space side as in patent document 1 illustrated as the prior document of the present application, or in the case where a part or all of the lid body protrudes or expands toward the load port side due to the pressure rise in the FOUP, there is a problem that: when the door and the FOUP come into contact with each other and push occurs, either the door or the FOUP tilts, and the door cannot be properly locked. However, by applying the present invention, by moving at least either the door or the FOUP to the retracted position, the distance between the door and the FOUP can be relatively adjusted before the locking operation. Of course, this effect is also produced in the above-described embodiment provided with the 1 st O-ring seal 43 and the 2 nd O-ring seal 44.
The present invention is also applicable to a load port provided with only any one of the 1 st O-ring 43 and the 2 nd O-ring 44.
Description of the reference numerals
4. A load port; 7. FOUP (container); 9. a conveying space; 21. a base; 32. a cover body; 42. an opening portion; 43. a 1 st O-ring seal (1 st seal member); 44. a 2 nd O-ring seal (2 nd seal member); 51. a door part (door); sd, a closed space; w, wafer (contents).

Claims (7)

1. A load port, characterized in that,
the load port includes:
a base portion that constitutes a part of a wall that partitions the conveyance space from an external space;
an opening provided in the base;
a mounting table for mounting a container containing a content and operable to be movable with respect to the opening portion;
a locking unit for fixing the container to the mounting table;
a container gas injection unit for supplying an inert gas into the container;
a door that can open and close the opening and can fix and release the cover to and from the container on the mounting table;
a container-side sealing member for sealing between the base and the container;
a conveying space side sealing member for sealing between the base and the door;
a clamping unit that presses the container against the base to improve sealability of the container-side sealing member between the base and the container; and
And a door clamp that presses the door against the base to improve sealability of the conveying-space-side sealing member between the base and the door.
2. The load port of claim 1, wherein the load port is configured to receive a load port,
the door is configured to advance and retreat between a door closing position and a door retreat position with respect to the base by a door driving portion,
the door closing position is a position in which the door abuts against the conveying-space-side sealing member and the end surface of the door on the container side is located closer to the container side than the abutting surface of the door against the conveying-space-side sealing member,
the door retracted position is a position at which the door is retracted from the door closed position to a side opposite to the side on which the container is located.
3. The load port of claim 2, wherein the load port is configured to receive a load port,
at the door retreat position, the conveying space side sealing member abuts against the door.
4. The load port of claim 1, wherein the load port is configured to receive a load port,
the load port includes a door position detection sensor for detecting a forward and backward position of the door.
5. The load port of claim 1, wherein the load port is configured to receive a load port,
the door holder operates when the door driving unit moves the door from the door retracted position toward the container.
6. The load port of claim 1, wherein the load port is configured to receive a load port,
the cover body is provided with a cover outer surface arranged on the door side and a cover back surface arranged on the container side,
in a state where an opening provided in the base is closed by the container, a contact surface between the container-side seal member and the container is located between the lid outer surface and the lid back surface.
7. The load port of claim 1, wherein the load port is configured to receive a load port,
the container gas injection unit supplies an inert gas immediately after the container is placed on the placement table.
CN202311642084.4A 2016-03-29 2017-03-16 Load port Pending CN117690840A (en)

Applications Claiming Priority (4)

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JP2016066084A JP6687840B2 (en) 2016-03-29 2016-03-29 Load port
JP2016-066084 2016-03-29
CN201780021499.6A CN108886012B (en) 2016-03-29 2017-03-16 load port
PCT/JP2017/010657 WO2017169847A1 (en) 2016-03-29 2017-03-16 Load port

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CN202311642084.4A Pending CN117690840A (en) 2016-03-29 2017-03-16 Load port
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KR102477013B1 (en) 2022-12-14
KR20220005637A (en) 2022-01-13
TW202316547A (en) 2023-04-16
CN108886012B (en) 2023-12-19
TW202109707A (en) 2021-03-01
TWI790491B (en) 2023-01-21
JP6687840B2 (en) 2020-04-28
TW201735212A (en) 2017-10-01
CN117690839A (en) 2024-03-12
KR20180128922A (en) 2018-12-04
KR102350964B1 (en) 2022-01-14
CN117690841A (en) 2024-03-12
CN108886012A (en) 2018-11-23
KR20230004889A (en) 2023-01-06
JP2017183408A (en) 2017-10-05
WO2017169847A1 (en) 2017-10-05
TWI710040B (en) 2020-11-11

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