CN110349893B - Load port and EFEM - Google Patents
Load port and EFEM Download PDFInfo
- Publication number
- CN110349893B CN110349893B CN201910269198.6A CN201910269198A CN110349893B CN 110349893 B CN110349893 B CN 110349893B CN 201910269198 A CN201910269198 A CN 201910269198A CN 110349893 B CN110349893 B CN 110349893B
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- door
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- load port
- opening
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
Abstract
The invention provides a load port and an EFEM, which can shorten the time required for door cleaning treatment and prevent the undesirable gas which causes the performance change of the wafer as the object to be conveyed from flowing into the conveying chamber. The gas cleaning device comprises a first sealing part (5) which is arranged in front of a base (21) in a sealing manner between a FOUP4 and the base (21), a second sealing part (6) which is arranged between a loading port door (22) which is in a closing state and seals an opening part (21 a) and the base (21), and a gas injection part (71), wherein when a sealed space (DS) which is formed by a gap between a container door and the loading port door (22) and is separated by the first sealing part (5) and the second sealing part (6) is replaced by gas, a preferential opening part (X) of the first sealing part 5 is opened in preference to the second sealing part (6) by making the sealed space (DS) be in positive pressure, and at least the gas of the sealed space (DS) can be discharged through the opened part.
Description
Technical Field
The present invention relates to a load port functioning as an interface for transferring an object to be transferred stored in a container to a transfer space, and an EFEM including the load port.
Background
For example, in a semiconductor manufacturing process, wafers in a clean room are processed in order to improve yield and quality. In recent years, a "small-sized enclosure system" has been adopted in which the cleanliness is further improved only in a partial space around the wafer, and measures have been adopted to carry out the wafer and perform other processes. In the small enclosure system, a Load Port (Load Port) is provided in the interior of the casing adjacent to the transfer chamber, and the Load Port forms a part of a wall surface of a substantially closed wafer transfer chamber (hereinafter referred to as a transfer chamber), and has a function of opening and closing a door (hereinafter referred to as a "container door") of a transfer container (hereinafter referred to as a "container") in which a highly clean interior space accommodates a transfer object such as a wafer is placed. Hereinafter, a door of a load port that can be engaged with a container door and can open and close the container door is referred to as a "load port door".
The load port is a device for carrying out the entry and exit of the object to be carried between the load port and the carrying chamber, and functions as an interface portion between the carrying chamber and a container (for example, FOUP (Front-Opening Unified Pod)). Further, when the loading port door and the FOUP door (hereinafter referred to as "FOUP door") are opened at the same time with the loading port door and the FOUP door facing each other with a predetermined gap therebetween, the transfer robot (wafer transfer apparatus) disposed in the transfer chamber can take out the object to be transferred in the FOUP into the transfer chamber or store the object to be transferred into the FOUP from the transfer chamber.
In order to properly maintain the atmosphere around the wafer, a sealed holding cylinder called a FOUP is used as a container, and the wafer is housed and managed inside the FOUP. In order to transfer a wafer between a processing apparatus that processes a wafer and a FOUP, an EFEM (Equipment Front End Module: equipment front end module) configured by using a transfer chamber and a load port is used.
In recent years, high integration of devices and miniaturization of circuits have been promoted, and it has been demanded to maintain the wafer periphery at a high cleanliness so as not to cause adhesion of particles and moisture to the wafer surface. Therefore, in order not to change the surface properties such as oxidation of the wafer surface, nitrogen gas is filled in the FOUP, and the wafer periphery is placed in a nitrogen atmosphere as an inert gas or in a vacuum state.
In the most advanced process of wafers, there is a possibility that the performance of the wafers may be changed due to oxygen, moisture, or the like contained in clean atmosphere used as a direct current flowing from a fan filter unit disposed in the upper part of a transfer chamber. Therefore, as in patent document 1, a technique for circulating an inert gas in the EFEM is required to be put into practical use. The system described in patent document 1 is configured such that a sealing member is provided at an appropriate position of a load port so as to form a closed space between a container door (FOUP door) and a load port door.
However, in the above-described configuration in which the sealing member is provided, there is a concern that the atmosphere and particles remain in the sealed space, and when the FOUP doors and the load port door are simultaneously opened in a state in which the load port door faces the FOUP doors with a predetermined gap therebetween, the atmosphere and particles remaining in the sealed space may be mixed into the FOUP and the transfer chamber, and thus the wafer performance may be changed in the EFEM requiring a low oxygen concentration and a low humidity.
Accordingly, the present inventors propose the following structure: a gas injection nozzle for injecting a gas into a sealed space between a FOUP door and a load port door and a gas discharge nozzle for discharging the gas in the sealed space are used to remove the atmosphere in the sealed space and fill the atmosphere with nitrogen gas (perform purging) (patent document 2). By replacing the gas in the sealed space formed between the FOUP door and the load port door with nitrogen gas (hereinafter referred to as door purge), it is possible to suppress the inflow of particles and the like adhering to the FOUP door into the EFEM transport chamber when the door is open, and the inflow of oxygen gas contained in the minute space between the FOUP door and the load port into the EFEM transport chamber.
Prior art literature
Patent literature
Patent document 1: japanese patent laid-open publication No. 2014-112631
Patent document 2: international publication No. 2017/022431
Disclosure of Invention
Problems to be solved by the invention
However, in order to shorten the interval time, the time required for the door cleaning (nitrogen gas replacement treatment of the closed space) is limited. Therefore, if the supply amount of nitrogen gas to the closed space is increased, the pressure in the closed space increases, and as a result, a pressing force from the closed space toward the EFEM carrier chamber side acts on the load port door in a state where the opening of the susceptor is closed, and if the closing force of the load port door is insufficient, the tightness of the load port door side cannot be maintained, and a situation arises in which oxygen-containing gas and particles in the closed space flow into the EFEM carrier chamber.
On the other hand, in order to avoid such a situation, a structure is considered in which the gas atmosphere in the closed space is sucked, but if the balance between the supply of the replacement gas and the suction is destroyed and the suction amount is larger than the supply amount, the closed space becomes negative pressure. As a result, the FOUP door is pulled to the sealed space side, and the sealing performance with the container main body is lowered, and it is considered that the gas in the FOUP flows into the sealed space. Here, in order to perform a cleaning process (bottom cleaning process) in a FOUP, a nitrogen gas supply port and an exhaust port for naturally exhausting gas from the FOUP are provided at the bottom of the FOUP, and if the amount of gas suction used in the door cleaning process is larger than the amount of gas supply, gas (atmosphere) is sucked into the FOUP from the exhaust port for the bottom cleaning process and flows backward, and may flow into the enclosed space or even the EFEM transfer chamber.
The present invention has been made in view of such problems, and a main object thereof is to provide a load port having a structure in which a time required for a door cleaning process or a sealed space cleaning process based on the door cleaning process is reduced and an unwanted gas which causes a change in performance of a target object (wafer) to be transferred is not flowed into a transfer chamber, and an EFEM having such a load port. The present invention is applicable to a load port and an EFEM that can be used for a container other than a FOUP.
Means for solving the problems
That is, the present invention is based on a load port including: a base that forms a part of a wall that separates the conveyance space from an external space, and has an opening through which the conveyance object can pass; a loading port door which can be engaged with a container door of a container for accommodating the object to be transported and can open and close an opening of the base; a first sealing part for sealing between a container arranged at a predetermined position in front of a base and the base; and a second sealing portion for sealing between the loading port door and the base in a closed state in which the opening is closed, wherein a space in which the loading port door and the container door face each other with a gap of a predetermined size therebetween is a sealed space partitioned by the first sealing portion and the second sealing portion in a state in which the loading port door is closed and the container is in contact with the base via the first sealing portion.
In the loading port according to the present invention, in the basic configuration, the loading port further includes a gas injection portion for injecting a gas into the closed space, and a part or all of the first sealing portion is configured to be a preferential opening portion that is opened preferentially to the second sealing portion by making the closed space positive in pressure during a door cleaning process for replacing the closed space with a gas, so that at least the gas in the closed space can be discharged through the opening portion.
In the present invention, when the sealed space is in the positive pressure state, the portion that is preferentially opened over the second seal portion may be a part of the first seal portion or may be the entire first seal portion. That is, a portion (portion where the air is easily discharged) in which the sealed state is released by at least one portion of the first sealing portion when the sealed space is in the positive pressure state is previously set, which is a structure unique to the present invention that has not been thought before. The present invention also includes the following configurations: when the sealed space is at positive pressure, the first sealing part is opened preferentially to the second sealing part; the first sealing portion is preferably opened at a time point after the time point at which the sealed space becomes positive pressure (for example, a time point at which the sealed space becomes a pressure equal to or higher than a predetermined value).
The load port of the present invention can perform a door cleaning function in which a gap between a container door and a load port door is replaced with a gas by a gas injection portion and a closed space sealed by a first seal portion and a second seal portion, and can prevent or suppress a situation in which particles adhering to the container door, and gases including oxygen, moisture, particles, and the like, which exist between the container door and the load port door and possibly change the performance of wafers, such as oxidation of the wafers, flow into a conveyance space and the interior of a container when the load port door is opened. That is, oxygen, moisture, and particles in the closed space can be removed before the container door is opened and the closed space is opened.
In the load port according to the present invention, the first seal portion is preferably opened at a part or all of the preferential opening portion provided in the first seal portion by making the sealed space positive in the door cleaning process, and at least the gas in the sealed space can be discharged through the opened portion (there is a case where the sealed space contains air, particles, and the like existing in the sealed space before the door cleaning process is performed), so that the sealing force of the load port door is prevented from becoming weak due to the positive pressure in the sealed space, and the case where the particles adhering to the container door and the atmosphere containing oxygen, moisture, particles, and the like existing between the container door and the load port door flow from the sealed space into the transport space at a time before the door cleaning process is performed can be prevented. This allows a large amount of gas to be supplied to the sealed space in a short time while maintaining the cleanliness of the container, the sealed space, and the conveyance space, and allows the sealed space to be in a positive pressure state, thereby enabling the reduction of the time interval as compared with a mode in which the pressure is adjusted by supplying gas to the sealed space one by one while removing garbage in the sealed space.
In addition, in the load port of the present invention, special control is not required to equalize the pressure in the closed space with the pressure in the other space, and a control device (valve, piping, etc.) for controlling is not required, so that cost reduction and reduction of the interval time can be achieved.
In particular, if the load port of the present invention includes the gas discharge portion for discharging the gas in the closed space, it is possible to prevent or suppress occurrence of a situation where it is difficult to exchange the gas in the closed space, as compared with a configuration without the gas discharge portion. In addition, in such a load port, if the structure is adopted in which the exhaust means is provided in the vicinity of the preferential opening portion and at the atmospheric pressure outside the closed space, at least the gas for door cleaning or the like leaking from the preferential opening portion of the first seal portion provided as the seal member on the container side to the outside of the closed space can be efficiently discharged by the exhaust means when the pressure in the closed space becomes high.
In addition to the above basic configuration, the load port of the present invention further includes an exhaust unit for exhausting the gas in the sealed space, and the load port is characterized in that a part or the whole of the second sealing unit is set to be a preferential opening portion which is preferentially opened over the first sealing unit by making the sealed space under negative pressure when the sealed space is cleaned by the exhaust unit for exhausting the sealed space.
In the present invention, when the sealed space is in a negative pressure state, the portion that is more open than the first seal portion may be a part of the second seal portion or may be the entire second seal portion. That is, a portion (portion where the air is easily discharged) in which the sealed state is released by at least one portion of the second sealing portion when the sealed space is in the negative pressure state is previously set, which is a structure unique to the present invention that has not been thought before. The present invention also includes the following structures: when the sealed space is at negative pressure, the preferential opening part of the second sealing part is in a preferential opening state than the first sealing part; at a proper time (for example, a time when the sealed space is at a pressure equal to or lower than a predetermined value) after the time when the sealed space is at a negative pressure, the preferential opening portion of the second seal portion is in a state of being preferentially opened than the first seal portion.
The load port of the present invention has a function of cleaning the gap between the container door and the load port door by exhausting the air from the sealed space sealed by the first sealing portion and the second sealing portion by the exhaust portion, and therefore, it is possible to prevent or suppress the occurrence of a situation in which particles adhering to the container door, and the atmosphere including oxygen, moisture, particles, and the like, which are present between the container door and the load port door and possibly change the performance of the wafer, such as oxidation of the wafer, flow into the conveyance space and the interior of the container when the load port door is opened. That is, oxygen, moisture, and particles in the closed space can be removed before the container door is opened and the closed space is opened.
In order to reduce the time interval, if the closed space is brought into a negative pressure state by exhausting a large amount of air from the closed space to the outside of the closed space in a short time, the load port of the present invention is set such that a part or all of the preferential opening portions of the second seal portions are preferentially opened as compared with the first seal portions, and the air flows into the closed space from the transport space through the opening portions, so that the following situation can be completely prevented: the sealing force of the container door becomes weak due to the negative pressure in the sealed space, and at the time before the cleaning process of the sealed space using the discharge portion is performed, particles adhering to the container door, and the atmosphere containing oxygen, moisture, particles, and the like existing between the container door and the loading port door flow from the sealed space into the container; the negative pressure in the sealed space weakens the sealing force of the container door, and a gas flow is formed from the inside of the container toward the sealed space through the gap between the container door and the container body, so that the gas (atmosphere) flows back into the container or the sealed space from the exhaust port at the bottom of the container. This allows the sealed space to be brought into a negative pressure state by exhausting a large amount of air from the sealed space in a short time while maintaining high cleanliness of the container, the sealed space, and the transport space, and can reduce the time interval as compared with a case where garbage in the sealed space is removed while adjusting the pressure of the sealed space by exhausting the sealed space in a small amount.
In addition, in the load port of the present invention, special control is not required to equalize the pressure in the closed space with the pressure in the other space, and a control device (valve, piping, etc.) for controlling is not required, so that cost reduction and reduction of the interval time can be achieved.
In particular, if the load port of the present invention includes the gas injection portion for injecting the gas into the closed space, the door cleaning function for replacing the gas in the closed space is exhibited, and it is possible to prevent or suppress occurrence of a situation where it is difficult to exchange the gas in the closed space during the door cleaning process. In addition, in the load port according to the present invention, if the configuration is adopted in which the exhaust means is provided at the predetermined portion of the suction path for sucking the inside of the sealed space, when the sealed space is in the negative pressure state, the gas in the sealed space (including the door cleaning gas if the configuration is adopted as the gas injection portion) can be efficiently exhausted outside the sealed space by the exhaust means, and the situation that can occur if the sealed space is in the excessive negative pressure state, that is, the situation that the degree of sealing in the container by the container door is lowered, and the atmosphere flows back from the exhaust port provided in the container into the container can be eliminated.
The EFEM of the present invention is characterized by comprising: the load port with the structure; and a transfer room in which the transfer robot is disposed in the transfer space. In such an EFEM, when a transfer robot is used to transfer an object to be transferred such as a wafer between a container placed on a load port and a transfer chamber and before the transfer process, a preferential opening portion is opened by making the closed space positive or negative pressure during a door cleaning process or a cleaning process of the closed space, and by adopting this configuration, a gas (door cleaning gas) in the closed space can be discharged outside the closed space through the opening portion or can flow into the closed space from the transfer space through the opening portion, and the transfer process can be performed while maintaining a high degree of cleanliness of the container, the closed space, and the transfer space. In particular, in the EFEM of the present invention, if the transfer chamber is provided with a circulation passage for circulating the gas in the transfer space, a predetermined gas (for example, an inert gas or an environmental gas such as nitrogen gas) can be circulated in the transfer space and maintained in a clean state. In this case, the differential pressure of the conveyance space with respect to the external space (atmospheric pressure) other than the conveyance space is preferably +3 to 500Pa (G).
The effects of the invention are as follows.
According to the present invention, the gap between the container door and the load port door of the container disposed at the predetermined position in front of the susceptor is set as a closed space in the front-rear direction in which the doors face each other by the double seal structure formed by the first seal portion and the second seal portion, a pressure difference is generated between the pressure of the closed space and the atmospheric pressure, and a part or all of either the first seal portion or the second seal portion is set to be preferentially opened in a state in which the pressure difference is generated, so that it is possible to provide the load port having a structure in which the time required for the door cleaning process or the cleaning process of the closed space is reduced and an unwanted gas that causes a change in performance of the object to be conveyed (wafer or the like) is not caused to flow into the conveyance chamber, and the EFEM including such a load port.
Drawings
Fig. 1 is a schematic side view showing a relative positional relationship between an EFEM including a load port according to an embodiment of the present invention and peripheral devices thereof.
Fig. 2 is a perspective view partially omitted showing a load port according to an embodiment.
Fig. 3 is an x-direction view of fig. 2.
Fig. 4 is a view in the y-direction of fig. 2.
Fig. 5 is a side cross-sectional view schematically showing the load port of this embodiment with the container removed from the frame and the load port door in the fully closed position.
Fig. 6 is a view corresponding to fig. 5, showing a state in which the container is in contact with the frame via the first seal portion and the load port door is in the fully closed position.
Fig. 7 is a view corresponding to fig. 5 showing a state in which the load port door is in an open position.
Fig. 8 is an overall perspective view of the window unit in this embodiment.
Fig. 9 is an enlarged view of a main portion of fig. 6, and is a diagram schematically showing a timing at which the sealed state of the first seal portion and the second seal portion is maintained.
Fig. 10 is a view corresponding to fig. 9, showing a timing of releasing the sealed state of the first seal portion in this embodiment.
Fig. 11 is a view corresponding to fig. 9 and showing a main part of a load port according to a second embodiment of the present invention.
Fig. 12 is a view corresponding to fig. 11, showing a timing of releasing the sealed state of the second seal portion in this embodiment.
In the figure:
1-EFEM, 2-load port, 21-pedestal, 21 a-opening, 22-load port door, 3-transfer chamber, 31-transfer robot, 3S-transfer space, 4-container (FOUP), 43-container door (FOUP door), 5-first seal, 6-second seal, 71-gas injection, 72-gas exhaust (exhaust), 8-exhaust unit, DS-enclosed space, W-transfer object (wafer), X-priority opening.
Detailed Description
An embodiment of the present invention will be described below with reference to the drawings.
The load port 2 of the present embodiment is used, for example, in a semiconductor manufacturing process, and, as shown in fig. 1, is used to carry out the entry and exit of the objects to be carried between the transfer chamber 3 and the container 4 while forming a part of the wall surface of the transfer chamber 3 in the clean room. In the following description, a description will be given of a configuration in which a load port 2 constituting a part of the EFEM (Equipment Front End Module) of the present invention, that is, a configuration in which, for example, a wafer W as an object to be transferred is subjected to an in-out process between a container 4 (for example, a FOUP in the present embodiment) and a transfer chamber 3 (wafer transfer chamber). In addition, the wafer size processed by EFEM is standardized as SEMI (Semiconductor Equipment and Materials International) standard, but from the viewpoint of improving productivity, the wafer diameter is increased, and transition from a conventional wafer having a diameter of 300mm to a wafer having a diameter of 450mm to a wafer having a diameter of 500mm is advanced.
In the following description, in the front-rear direction D in which the FOUP4, the load port 2, and the transfer chamber 3 are arranged in this order, the transfer chamber 3 side is defined as "rear", the FOUP4 side is defined as "front", and the direction orthogonal to the front-rear direction D and the vertical direction H is defined as "side". Therefore, in the present embodiment, the wall surface 3A of the transfer chamber 3 on which the load port 2 is disposed can be regarded as a front wall surface.
As shown in fig. 1, 5, and 9, the FOUP4 in the present embodiment includes: a FOUP main body 42 in which the inner space 4S is opened only rearward by a carry-out inlet 41 formed in the rear surface 42B (surface on the base 21 side); and a FOUP door 43 (corresponding to a "container door" of the present invention) capable of opening and closing the carry-out inlet 41. The FOUP4 has a known structure in which a plurality of wafers W as objects to be transported are housed in a plurality of layers in the vertical direction H, and the wafers W can be taken in and out through the carry-out port 41.
The FOUP body 42 integrally has a front wall, a pair of left and right side walls, an upper wall, and a bottom wall. The inner space 4S surrounded by these walls is provided with a plurality of shelf portions (wafer mounting portions) on which wafers W can be mounted at predetermined intervals. A flange portion to be held by a container carrying device (e.g., OHT: over Head Transport) or the like is provided in the center portion of the upward surface of the upper wall. The rear end portion of the FOUP main body 42 is provided with a flange portion 45 protruding upward and laterally from the other portion. That is, the rim 45 is provided around the area where the FOUP door 43 is disposed in the FOUP main body 42.
The FOUP door 43 is substantially plate-shaped so as to face the load port door 22 of the load port 2 in a state of being placed on a later-described stage 23 of the load port 2. The height dimension of the FOUP door 43 is set to be substantially equal to the height dimension of the surface of the loading port door 22 facing the FOUP door 43 with a predetermined gap therebetween. In fig. 5, the FOUP door 43 is schematically shown to have a height slightly larger than the height of the surface of the loading port door 22 facing the FOUP door 43 with a predetermined gap therebetween. The FOUP door 43 is provided with a latch (not shown) capable of locking the FOUP door 43 to the FOUP main body 42. In the inward surface 431 of the FOUP door 43, a gasket (not shown) is provided at a predetermined portion that is in contact with or in proximity to the FOUP main body 42 in a state where the carry-out inlet 41 is closed by the FOUP door 43. The gasket is elastically deformed by being brought into contact with the FOUP main body 42 preferentially to the inward surface 431 of the FOUP door 43, whereby the internal space 4S of the FOUP4 can be sealed.
As shown in fig. 1 to 4, the load port 2 of the present embodiment includes: a base 21 having a plate shape, forming a part of the front wall surface 3A of the transfer chamber 3, and having an opening 21a for opening the internal space 3S of the transfer chamber 3; a loading port door 22 for opening and closing the opening 21a of the base 21; and a mounting table 23 provided on the base 21 in a substantially horizontal posture. Here, the opening 21a for opening the internal space 3S of the transfer chamber 3 is an opening formed in the base 21 to open the internal space 3S of the transfer chamber 3, which is a space partitioned by the base 21.
The base 21 has a substantially rectangular plate shape, is arranged in a standing posture, and has an opening 21a having a size capable of communicating with the carry-out inlet 41 of the FOUP4 placed on the stage 23. The load port 2 of the present embodiment can be used in a state where the susceptor 21 and the transfer chamber 3 are brought into close contact with each other. Further, a foot 24 having a rolling wheel and a foot is provided at the lower end of the base 21. In the present embodiment, a base 21 is applied, and the base 21 includes: a pillar 211 standing on both sides; a base body 212 supported by these pillars 211; and a window unit 214 mounted to a window 213 opened to the base body 212 in a substantially rectangular shape.
The window unit 214 is provided at a position facing the FOUP door 43, and an opening 215 provided in the window unit 214 corresponds to an "opening through which the object to be transported can pass" in the present invention.
Here, the substantially rectangular shape in the present embodiment is a shape having a rectangular shape including four sides as a basic shape, and four corners are smoothly connected by an arc. Further, although not shown, a gasket as an elastic member formed in a rectangular frame shape is provided near the outer periphery of the surface (front surface) of the base main body 212 on the transfer chamber 3 side, and the gasket is brought into contact with the vicinity of the edge of the opening in which the base 21 is mounted in the transfer chamber 3, thereby eliminating the gap between the base main body 212 and the transfer chamber 3 and suppressing leakage of gas from the internal space 3S of the transfer chamber 3 to the outside GS through the gap between the base main body 212 and the transfer chamber 3.
The mounting table 23 of the load port 2 is provided above a horizontal base 25 (support table), and the horizontal base 25 (support table) is disposed in a substantially horizontal posture at a position slightly above the center in the height direction of the susceptor 21. The loading table 23 is capable of loading the FOUP4 in an orientation in which the FOUP door 43 faces the loading port door 22, and the FOUP door 43 is capable of opening and closing the internal space 4S of the FOUP main body 42. As shown in fig. 5 and 6, the mounting table 23 is configured to be capable of moving back and forth with respect to the base 21 between a predetermined abutment position (see fig. 6) where the FOUP door 43 approaches the opening 21a of the base 21 and a position (see fig. 5) where the abutment position is separated from the base 21 by a predetermined distance from the FOUP door 43. As shown in fig. 2, the stage 23 has a plurality of protrusions (pins) 231 protruding upward, and the positioning of the FOUP4 on the stage 23 is achieved by engaging the protrusions 231 with holes (not shown) formed in the bottom surface of the FOUP 4. In fig. 5 and 6, the bottom surface of the FOUP4 is in contact with the upper surface of the stage 23 as the loading state of the FOUP4 on the stage 23. However, in practice, the FOUP4 is supported by engaging a plurality of positioning projections 231 protruding upward from the upper surface of the stage 23 with holes having bottoms formed in the bottom surface of the FOUP4, and the upper surface of the stage 23 and the bottom surface of the FOUP4 are not in contact with each other, and a predetermined gap is defined between the upper surface of the stage 23 and the bottom surface of the FOUP 4. Further, a locking claw 232 for fixing the FOUP4 to the stage 23 is provided. By pulling the locking claw 232 to a locked portion (not shown) provided on the bottom surface of the FOUP4 to be in a fixed locked state, the FOUP4 can be guided to an appropriate position on the mounting table 23 and fixed in cooperation with the positioning protrusion 231. Further, by releasing the lock state of the lock claw 232 with respect to the locked portion provided on the bottom surface of the FOUP4, the FOUP4 can be brought into a state in which it can be separated from the stage 23.
The load port 2 of the present embodiment is provided with a plurality of nozzles 261 at predetermined positions on the mounting table 23. The nozzles 261 inject an ambient gas (also referred to as a purge gas, mainly using nitrogen gas or dry air) which is a properly selected gas such as nitrogen gas, inert gas, or dry air into the FOUP4 from the bottom surface side of the FOUP4, and constitute a bottom purge portion 26 which can replace the gas atmosphere in the FOUP4 with the ambient gas. The plurality of nozzles 261 function as bottom cleaning injection nozzles for injecting the ambient gas into the FOUP4 and bottom cleaning discharge nozzles for discharging the gas atmosphere in the FOUP4, and may be provided in pairs at positions apart from each other in the width direction of the mounting table 23, for example. The plurality of nozzles 261 can be connected to an inlet and an outlet (both not shown) provided at the bottom of the FOUP4 in a fitted state. Each nozzle 261 (bottom cleaning injection nozzle, bottom cleaning discharge nozzle) or injection port has a valve function for restricting the backflow of the gas. The fitting portions between the nozzles 261 (bottom cleaning injection nozzle, bottom cleaning discharge nozzle) and the inlet and outlet of the FOUP4 are sealed by a gasket or the like provided on the nozzle 261. In the load port 2 of the present embodiment, if the FOUP4 is not placed on the stage 23, the nozzles 261 (bottom cleaning injection nozzle and bottom cleaning discharge nozzle) are positioned below the upper surface of the stage 23. When it is detected that the bottom surface portion of the FOUP4 is pressed against the pressed portion of the mounting table 23, for example, a pressure sensor, the nozzles 261 (bottom cleaning injection nozzle and bottom cleaning discharge nozzle) are pushed upward in response to a signal from the control unit 2C, and are connected to the inlet and the outlet of the FOUP4, respectively.
The loading port door 22 includes a coupling mechanism 221, and the coupling mechanism 221 is switchable between a cover coupling state in which the loading port door 22 is coupled to the FOUP door 43 and the FOUP door 43 is detachable from the FOUP body 42, and a cover coupling releasing state in which the coupling to the FOUP door 43 is released and the FOUP door 43 is attached to the FOUP body 42 (see fig. 4). The loading port door 22 is movable along a predetermined movement path while holding the FOUP door 43 in an integrated state by the coupling mechanism 221. As shown in fig. 5 and 6, the load port 2 of the present embodiment is configured to be capable of moving the load port door 22 at least between a fully closed position C, in which the FOUP door 43 held by the load port door 22 seals the internal space 4S of the FOUP body 42, and an open position O, in which the FOUP door 43 held by the load port door 22 is separated from the FOUP body 42 and the internal space 4S of the FOUP body 42 is opened into the transfer chamber 3. The load port 2 of the present embodiment is configured to be movable to an open position O shown in fig. 7 while maintaining the raised posture of the load port door 22 positioned at the fully closed position C shown in fig. 5 and 6, and to be movable in a downward direction while maintaining the raised posture from the open position O shown in fig. 7 to the fully open position not shown. That is, the movement path of the loading port door 22 between the fully closed position C and the fully open position includes: a path (horizontal path) for moving the loading port door 22 located at the fully closed position C to the open position O toward the transfer chamber 3 while maintaining the height position thereof; and a path (vertical path) for moving the loading port door 22 located at the open position O downward while maintaining the front-rear position thereof, wherein the movement direction of the loading port door 22 is switched from the horizontal direction to the vertical direction or vice versa at the open position O, which is a point where the horizontal path intersects the vertical path. The FOUP door 43 held at the loading port door 22 positioned at the open position O is positioned at a position rearward of the base 21 (a position completely separated from the FOUP main body 42 and disposed in the internal space 3S of the transfer chamber 3) together with the loading port door 22 so that the loading port door 22 positioned at the open position O can be moved in any one of the vertical direction and the horizontal direction.
Such movement of the load port door 22 is accomplished by a door movement mechanism 27 provided at the load port 2. As shown in fig. 5 to 7, the door moving mechanism 27 includes: a support frame 271 supporting the loading port door 22; a movable block 273 movably supporting the support frame 271 in the front-rear direction D via a slide supporting portion 272; a slide rail 274 that supports the movable block 273 so as to be movable in the up-down direction H; and a drive source (for example, a driver not shown) for moving the loading port door 22 in the front-rear direction D of the horizontal path and in the up-down direction H of the vertical path. By giving a drive command to the actuator from the control unit 2C, the loading port door 22 can be moved in the front-rear direction D and the up-down direction H. The present invention is not limited to the above-described embodiments, and may be applied to any other embodiments.
The support frame 271 supports under the rear of the loading port door 22. The support frame 271 is a substantially crank-shaped member that extends downward, passes through a slit-shaped insertion hole 21b formed in the base 21, and extends outward (toward the mounting table 23) of the transfer chamber 3. In the present embodiment, a slide support portion 272 for supporting the support frame 271, a movable block 273, and a slide rail 274 are disposed outside the transfer chamber 3. These slide support 272, movable block 273, and slide rail 274 serve as sliding portions when the loading port door 22 is moved. In the present embodiment, by disposing the above-described members outside the transfer chamber 3, even when particles are generated when the loading port door 22 moves, the insertion hole 21b is set to a minute slit shape, so that it is possible to prevent or suppress the particles from entering the transfer chamber 3. A cover 28 is provided, and the cover 28 covers parts and portions of the door moving mechanism 27 disposed outside the transfer chamber 3, specifically, a part of the support frame 271, the slide support 272, the movable block 273, and the slide rail 274. Thereby, the ambient air in the transfer chamber 3 is set to flow out to the outside GS of the EFEM1 without passing through the insertion hole 21b formed in the base 21
As shown in fig. 5, 9, and the like, the load port 2 of the present embodiment includes a first seal portion 5 and a second seal portion 6 provided near the peripheral edge of the opening 21a, and is configured such that, in a state in which the load port door 22 is in a closed state and the FOUP door 43 is brought into contact with the susceptor 21 via the first seal portion 5, a closed space DS is formed, and the space facing the FOUP door 43 and the load port door 22 in the front-rear direction D with a predetermined gap therebetween is partitioned from the outside GS by the first seal portion 5 and the second seal portion 6. In the present embodiment, the first seal portion 5 and the second seal portion 6 are unitized as the window unit 214.
As shown in fig. 2 to 4 and 8, the window unit 214 is mainly configured by a frame-shaped window frame 216, and the frame-shaped window frame 216 has a substantially rectangular opening 215 at a position of the window unit 214 facing the FOUP door 43 (in the example, a central portion of the window unit 214).
In the present embodiment, the opening 215 of the window frame 216 is set to a slightly larger opening size than the outer periphery (outer dimension) of the FOUP door 43, and the FOUP door 43 can move into the transfer chamber 3 through the opening 215 while being held by the loading port door 22. The opening 215 of the window frame 216 is the opening 21a of the base 21 itself.
The first seal portion 5 is provided around the opening 21a in the front surface of the base 21 in the vicinity of the opening edge of the opening 21a, and seals between the periphery of the opening 21a of the base 21 and the FOUP4 when the mounting table 23 on which the FOUP4 is mounted is positioned at the docking position (see fig. 6, 9, and the like). In the present embodiment, which adopts the structure in which the window unit 214 is mounted on the base 21, the first seal 5 is provided at a position surrounding the opening 215 in the vicinity of the opening edge of the opening 215 in the front surface 216A of the window frame 216 (see fig. 8). Specifically, the first seal portion 5 is circumferentially mounted on the front surface 216A of the window frame 216 at a position facing a FOUP seal surface (a surface of the FOUP body 42 set on the periphery of the FOUP door 43) that is the rear surface 42B of the FOUP body 42. The first seal portion 5 disposed around the opening 215 in the vicinity of the opening edge of the rectangular opening 215 has a substantially rectangular shape when viewed from the FOUP4 side. Therefore, as shown in fig. 8, the first seal portion 5 is roughly divided into an upper portion 5A disposed near the opening upper edge of the opening portion 215, a lower portion 5B disposed near the opening lower edge of the opening portion 215, and side portions 5C disposed near the opening both side edges of the opening portion 215. The first seal portion 5 of the present embodiment having a rectangular shape including the four side portions 5A, 5B, and 5C as a basic shape has a shape in which four corners are smoothly connected by circular arcs.
In the present embodiment, as shown in fig. 9, most of the first seal portion 5 is formed of an elastic body (circular elastic body D1) having a substantially circular cross-sectional shape, and some is formed of an elastic body (non-circular elastic body D2) having a cross-sectional shape that is more easily elastically deformed than the substantially circular elastic body. Specifically, the predetermined portions including the entire lower edge portion 5B, the entire left and right side edge portions 5C, and the both widthwise end portions of the upper edge portion 5A in the first seal portion 5 are formed of the circular elastic body D1, and the widthwise central portion of the upper edge portion 5A in the first seal portion 5 is formed of the non-circular elastic body D2. The non-circular elastic body D2 of the present embodiment is an elastic body having a cross-sectional shape (a bar shape having a longer dimension than a diameter of the substantially circular elastic body in cross-sectional view) and being disposed in a posture in which the rounded tip portion is gradually displaced upward toward the front (a popped-up posture, a posture in which the tip portion is displaced in a direction toward the outside GS of the sealed space DS). Further, in fig. 5 to 8, the first seal portion 5 is schematically shown without being clearly distinguished as a circular elastic body D1 and a non-circular elastic body D2.
When the stage 23 on which the FOUP4 is placed is positioned at the docking position, the first seal portion 5 functions as a seal between the periphery of the opening 21a of the base 21 and the FOUP 4. In a state where the sealing function is exhibited, when the pressure difference between the sealed space DS including the sealing region of the first sealing portion 5 and the external GS (under atmospheric pressure) is 500Pa (G) or less, for example, and preferably 300Pa (G) or less, as shown in fig. 10, the portion of the first sealing portion 5 formed of the non-circular elastic body D2 is released from the sealing state and opened preferentially than the portion formed of the circular elastic body D1. Hereinafter, the portion of the first seal portion 5 formed of the non-circular elastic body D2 is referred to as a preferential opening portion X, and the portion formed of the circular elastic body D1 is referred to as a non-opening portion Y.
Fig. 9 shows a state in which the first seal portion 5 (both of the preferential opening portion X and the non-opening portion Y) is elastically contacted with the FOUP4 placed on the stage 23 positioned at the predetermined docking position. The load port 2 of the present embodiment is arranged such that the first seal portion 5 protrudes toward the FOUP4 side of the end surface closest to the FOUP4 in the load port door 22 by a predetermined dimension (for example, 0.1mm or more and 3mm or less). Therefore, the FOUP door 43 and the load port door 22 do not contact each other, and the first seal 5 can maintain high tightness of the sealed space DS formed between the base 21 and the load port door 22.
That is, as shown in fig. 9, the first seal portion 5 elastically contacts the rear surface 42B of the FOUP main body 42 mounted on the mounting table 23 positioned at the predetermined docking position. In particular, the preferential opening portion X of the first seal portion 5 elastically contacts the FOUP4, and thereby the front end portion elastically deforms in a state of being lifted upward (toward the direction outside the sealed space DS GS) than at the time before the elastic contact with the FOUP 4. The non-opening portion Y of the first seal portion 5 is elastically deformed in a state of being compressed in the front-rear direction D compared with the time before the elastic contact with the FOUP4 by the elastic contact with the rear surface 42B of the FOUP main body 42 mounted on the mounting table 23 positioned at the predetermined abutting position. By maintaining the elastic contact state between the first seal portion 5 and the FOUP4, a good seal area can be formed.
In fig. 5 to 7, the first seal portion 5 and the second seal portion 6 are schematically indicated by black-painted substantially elliptical marks. In fig. 6 and 7, the rear surface 42B (sealing surface) of the FOUP body 42 is in contact with the base 21 (window unit 214), but in reality, the sealing surface of the FOUP body 42 is not in contact with the base 21 (window unit 214), and the first seal portion 5 is interposed between the sealing surface of the FOUP body 42 and the base 21 (window unit 214), as described above.
The second seal portion 6 is provided around the opening 21a in the vicinity of the opening edge of the opening 21a in the rear surface 21B of the base 21. In the present embodiment, which adopts the structure in which the window unit 214 is mounted on the base 21, the second seal portion 6 is provided at a position surrounding the opening 215 in the vicinity of the opening edge of the opening 215 in the rear face 216B of the window frame 216. Specifically, the second seal portion 6 is circumferentially mounted in a position opposed to a seal surface (a surface of the loading port door 22 set at an outer edge portion) of a predetermined portion of the front surface of the loading port door 22, that is, the entire surface 21A set at the base, in the rear surface 216B of the window frame portion 216. In the present embodiment, a flange-like thin portion is formed at the outer edge portion of the loading port door 22, and this thin portion is set to the sealing surface of the loading port door 22. The second seal 6 disposed around the opening 215 near the opening edge of the rectangular opening 215 is substantially rectangular when viewed from the transfer chamber 3 side.
In the present embodiment, as the second seal portion 6, an O-ring having a substantially circular cross-sectional shape is used, and a common O-ring is disposed over the upper side portion 6A, the lower side portion 6B, and the left and right side portions 6C of the second seal portion 6. As described above, in the present embodiment, the entire second seal portion 6 is formed of the elastic body (circular elastic body D1) having a substantially circular cross-sectional shape, and the entire second seal portion 6 is set to the "non-open portion Y". When the loading port door 22 is positioned at the closed position, the loading port door 22 (more specifically, the thin wall portion) is brought into contact with the rear surface 216B of the window frame 216 via the second seal portion 6, and the second seal portion 6 seals between the peripheral edge of the opening 21a of the base 21 and the loading port door 22 (see fig. 9). As a result, in a state in which the loading port door 22 is positioned at the closed position, outflow of the gas from the interior space 3S of the transfer chamber 3 to the outside of the transfer chamber 3 and inflow of the gas from the outside of the transfer chamber 3 to the interior space 3S of the transfer chamber 3 can be suppressed. The central portion of the loading port door 22, which is a portion other than the thin portion, is a thick portion having a thickness larger than that of the thin portion, and the thick portion is set to face the opening 21a (opening 215) so as to protrude forward from the opening 21a (opening 215 of the window frame 216) of the base 21.
In the load port 2 of the present embodiment, mounting grooves (in fig. 9 and 10, recesses into which the first seal portion 5 and the second seal portion 6 are fitted) having a concave cross section are formed in the front surface 216A and the rear surface 216B of the window frame portion 216 so as to surround the vicinity of the opening edge of the opening portion 215, respectively. The first seal 5 and the second seal 6 are tightly attached in a state of being inserted into the seal attachment grooves. In particular, the seal attachment groove for attaching the preferential opening portion X in the first seal portion 5 is formed in a cross-sectional trapezoid that gradually expands toward the depth direction of the groove, and is fixed by an appropriate means such as an adhesive in a state where an insertion portion provided at the base end portion of the preferential opening portion X is fitted into the seal attachment groove of the trapezoid. This prevents the preferential opening portion X of the first seal portion 5 from coming off the seal attachment groove. In this attached state, the portions of the first seal portion 5 and the second seal portion 6 not accommodated in the attachment groove are exposed to the outside of the attachment groove.
The load port 2 of the present embodiment includes a movement restricting portion L that restricts movement of the FOUP4 on the mounting table 23 positioned at the docking position in a direction away from (rearward of) the susceptor 21. In the present embodiment, the movement restricting portion L is unitized as the window unit 214.
The movement restricting unit L is switchable between a movement restricting state in which the FOUP4 positioned on the stage 23 in the docking position is restricted from moving in a direction away from the base 21 (backward), and a movement allowing state in which the FOUP4 positioned on the stage 23 in the docking position is allowed to move in a direction away from the base 21. That is, the movement restricting unit L is in a movement restricting state, and thereby can hold the FOUP4 placed on the placement table 23 positioned at the predetermined docking position.
As shown in fig. 8 and the like, the movement restricting unit L in the present embodiment includes: an engagement piece L1 that can engage with a flange 45 provided on the periphery of the FOUP door 43 in the FOUP main body 42; and a pull-in portion L2 that moves toward the base 21 side in a state in which the engagement piece L1 is engaged with the flange portion 45. Such a movement restriction portion L exhibits a clamping function that can be held in a state in which the convex edge portion 45 of the FOUP main body 42 is sandwiched between the engagement piece L1 and the base 21. In the present embodiment, a window unit 214 is provided in the base 21. Therefore, the movement restriction portion L has a function of sandwiching the convex edge portion 45 of the FOUP main body 42 between the engagement piece L1 and the window frame portion 216 of the window unit 214.
The entire engagement piece L1 including the front end can change the posture between a non-facing posture in which the front end does not face the FOUP4 in the front-rear direction D and a facing posture (posture shown in fig. 8) in which the front end faces the FOUP 4. The load port 2 of the present embodiment is configured such that the engagement piece L1 is in a non-facing posture, so that the stage 23 on which the FOUP4 is placed can be moved between a predetermined abutment position where the FOUP door 43 approaches the opening 215 and a position separated from the transfer chamber 3 by a predetermined distance from the abutment position. That is, the movement restriction portion L is brought into the movement permission state by bringing the engagement piece L1 into the non-facing posture.
In such a movement restricting portion L, when the mounting table 23 in the door abutting position is moved to the abutting position with the FOUP4 mounted thereon in a state in which the engaging piece L1 is in the non-facing posture, the engaging piece L1 in the non-facing posture is moved in a direction to be pulled into the transfer chamber 3 side, and the non-facing posture is changed to the facing posture. Thus, the engagement piece L1 can be engaged with the convex edge portion 45 protruding outward from the rear surface 42B of the FOUP main body 42. Then, by pulling the engaging piece L1 into the transfer chamber 3 side by the pulling-in portion L2, the engaging piece L1 is pulled into the transfer chamber 3 side (rearward) while maintaining the engaged state of the engaging piece L1 and the convex edge portion 45 of the FOUP 4. As a result, the FOUP4 positioned on the mounting table 23 at the docking position can be restricted from moving in a direction away from the base 21 by sandwiching the flange portion 45 of the FOUP4 between the engagement piece L1 and the base 21. That is, the movement restricting portion L changes the engagement piece L1 from the non-facing posture to the facing posture, and the movement restricting state (the state shown in fig. 8) is achieved by pulling in the engagement piece L1 to the base 21 side by the pulling-in portion L2.
In the load port 2 of the present embodiment, as shown in fig. 2 and 8, the movement restricting portions L are disposed in four total portions near the upper end and near the lower end of the two sides of the opening 21a having a substantially rectangular shape in the base 21, respectively. Specifically, the movement restricting portions L are disposed at four positions in total, which are separated in the vertical direction, on both side portions of the opening 215 having a substantially rectangular shape in the window frame portion 216 of the window unit 214.
In the present embodiment, as shown in fig. 9, the rear face 42B of the FOUP main body 42 of the FOUP4 placed on the placement table 23 positioned at the docking position is brought close to the front face 21A of the base 21 (the front face 216A of the window frame 216) with a gap of a predetermined size interposed therebetween, and the gap is configured to be sealable by the first seal portion 5. In the load port 2 of the present embodiment, after the time when the mounting table 23 is positioned at the predetermined docking position, if the load port door 22 is in the closed state, the FOUP door 43 and the load port door 22 are brought close to each other with a gap of a predetermined size therebetween, and the second seal 6 can seal between the load port door 22 and the susceptor 21. Therefore, the space in which the loading port door 22 and the FOUP door 43 face each other with a gap of a predetermined size therebetween becomes the sealed space DS partitioned by the first seal 5 and the second seal 6.
As shown in fig. 5, 9, and the like, the loading port door 22 of the present embodiment includes: a gas injection part 71 for injecting a gas into the closed space DS; and a gas discharge portion 72 for discharging the gas in the sealed space DS. The gas injection portion 71 is constituted, for example, by using a long nozzle, one end (downstream end in the gas injection direction) of which reaches the outer surface of the loading port door 22, and a gas injection valve 71a is connected to the vicinity of the other end (upstream end in the gas injection direction) of which. Similarly, the gas discharge portion 72 is also configured using, for example, a nozzle, one end of which (the upstream end in the gas discharge direction) reaches the outer surface of the loading port door 22, and a gas discharge valve 72a is connected to the vicinity of the other end of which (the downstream end in the gas discharge direction). According to this configuration, the gas injection portion 71 supplies the ambient gas (nitrogen gas in the present embodiment) to the sealed space DS, and the gas discharge portion 72 discharges the gas from the sealed space DS, whereby the sealed space DS can be purged with the gas. The gas cleaning process in which the sealed space DS in which the FOUP door 43 and the load port door 22 face each other with a predetermined gap therebetween is replaced with a gas is referred to as a "door cleaning process" in the present invention.
As shown in fig. 5, the gas injection valve 71a, the gas discharge valve 72a, and the gas discharge valve 71a are disposed at the upstream end of the gas injection portion 71 in the gas injection direction and at the downstream end of the gas discharge portion 72 in the gas discharge direction. Further, predetermined portions of the respective nozzles constituting the gas injection portion 71 and the gas discharge portion 72 penetrate the loading port door 22 in the thickness direction (front-rear direction D). The portion of the loading port door 22 through which the nozzle passes is subjected to an appropriate sealing process. In this embodiment, a nozzle excellent in flexibility or stretchability (including a wrinkle type) is applied. A tube can also be used to replace part or all of the nozzle. In fig. 5 and the like, the portions of the gas injection portion 71 and the gas discharge portion 72 exposed to the transfer space 3S are actually housed in a door cover (not shown) covering the loading port door 22 from the transfer chamber 3 side.
The load port 2 thus configured performs a predetermined operation by giving a drive command from the control unit 2C to each unit. The EFEM1 of the present embodiment has a plurality of (e.g., 3) load ports 2 arranged side by side along the front wall surface 3A of the transfer chamber 3.
As shown in fig. 1, the EFEM1 mainly includes a load port 2 and a transfer chamber 3 disposed adjacent to each other in a common clean room. The operation of the EFEM1 is controlled by a controller (a control unit 2C shown in fig. 2) of the load port 2 and a controller (a control unit 3C shown in fig. 1) of the EFEM1 as a whole.
The transfer chamber 3 is provided with, for example, a processing apparatus M (semiconductor processing apparatus) adjacent to a rear wall surface 3B facing a front wall surface 3A where the load ports 2 are arranged. In the clean room, the interior space MS of the processing apparatus M, the interior space 3S of the transfer chamber 3, and the interior space 4S of the FOUP4 placed on the load port 2 are maintained at high cleanliness. On the other hand, the space in which the load port 2 is disposed, in other words, the space outside the processing apparatus M and the space outside the EFEM1 are relatively low in cleanliness. Fig. 1 is a side view schematically showing the relative positional relationship between the load port 2 and the transfer chamber 3, and the relative positional relationship between the EFEM1 including the load port 2 and the transfer chamber 3 and the processing apparatus M.
The processing device M includes: a load lock chamber disposed at a position relatively close to the transfer chamber 3; and a processing apparatus main body disposed at a relatively remote position from the transfer chamber 3. In the present embodiment, as shown in fig. 1, the load port 2, the transfer chamber 3, and the processing apparatus M are arranged in close contact with each other in this order in the front-rear direction D of the EFEM 1. The operation of the processing device M is controlled by a controller (control unit MC shown in fig. 1) of the processing device M. Here, the controller MC as a controller of the entire processing apparatus M and the controller 3C as a controller of the entire EFEM1 are upper controllers of the controller 2C of the load port 2.
The transfer chamber 3 is provided with a transfer robot 31 in the internal space 3S, and the transfer robot 31 is capable of transferring a wafer W as an object to be transferred between the FOUP4 and the processing apparatus M. The transfer robot 31 has a link structure (multi-joint structure) in which, for example, a plurality of link elements are connected so as to be rotatable horizontally with respect to each other, and the link structure has an arm in which a hand is provided at a front end portion thereof, and an arm base that rotatably supports a base end portion of the arm, and in which a traveling portion that travels in a width direction of the transfer chamber 3 (parallel direction of the load ports 2) changes shape between a folded state in which the arm length is minimized and an extended state in which the arm length is longer than in the folded state. In addition, an EFEM may be configured in which one or both of the buffer position and the aligner are disposed on the side surface of the transfer chamber 3.
The transfer chamber 3 is connected to the processing apparatus M through the load port 2, and the internal space 3S is substantially sealed. The carrier chamber 3 is cleaned with a predetermined gas (an inert gas, an ambient gas such as nitrogen gas, or the like) by using a gas supply port and a gas discharge port, not shown, so that the ambient gas concentration can be increased. A fan filter unit 32 is provided at the upper part of the wafer transfer chamber 3 to send out the gas downward, and the gas is sucked by a chemical filter provided at the lower part. The sucked gas is returned toward the upper fan filter unit 32 via the circulation passage 321. In this way, a direct current, which is an air flow from above to below, is formed in the inner space 3S of the transfer chamber 3. Therefore, the ambient gas in the transfer chamber 3 can be circulated and maintained in a clean state. In addition, even when particles contaminating the surface of the wafer W are present in the inner space 3S of the transfer chamber 3, the particles can be pressed downward by the direct current, and adhesion of the particles to the surface of the wafer W being transferred can be suppressed. The flow of air through the fan filter unit 32 is schematically shown by arrows in fig. 1.
The load port 2 of the present embodiment performs a predetermined operation by giving a drive command from the control unit 2C to each unit. In the present embodiment, a drive command is given from the control unit 2C of the load port 2 to each unit. The control unit 2C is configured by a general microprocessor or the like having a CPU, a memory, and an interface, and stores a program necessary for processing in advance in the memory, and the CPU sequentially fetches and executes the necessary program to realize a desired function in cooperation with peripheral hardware.
Hereinafter, the operation flow of the EFEM1 will be described together with the operation and the method of using the EFEM1 having the load port 2.
First, the FOUP4 is carried above the load port 2 by a container carrying device such as an OHT that operates on a carrying line (line) extending along a common front wall surface 3A where the load ports 2 are arranged in the carrying chamber 3, and is placed on the stage 23. At this time, for example, the positioning protrusion 231 provided on the stage 23 is fitted into the positioning recess of the FOUP4. The control unit 2C sets the locking claw 232 on the mounting table 23 in a locked state (locking process). Specifically, the locking claws 232 on the mounting table 23 are pulled and fixed to a locked portion (not shown) provided on the bottom surface of the FOUP4. This allows the FOUP4 to be placed and fixed at a predetermined normal position on the stage 23. In the present embodiment, the FOUPs 4 can be placed on the placement tables 23 on which the 3 load ports 2 are arranged side by side in the width direction of the transfer chamber 3. Further, it is also possible to detect a normal position of the FOUP4 mounted on the mounting table 23 by a seating sensor (not shown) that detects whether the FOUP4 is mounted on the mounting table 23 at a predetermined position.
Next, in the load port 2 of the present embodiment, the control unit 2C moves the stage 23 at the position shown in fig. 5 to the docking position shown in fig. 6 (docking process). That is, the stage 23 in the position shown in fig. 5 is moved toward the base 21, and the rear surface of the FOUP4 (the rear surface 42B of the FOUP main body 42 and the outward surface of the FOUP door 43, which are the same surfaces with each other) is brought closer to the base forefront surface 21A closest to the FOUP main body 42 among the peripheral edges of the opening 21A in the base 21 to a predetermined distance. The movement restricting portion L maintains the engagement piece L1 in the movement allowing state of the non-facing posture until the abutting process is performed. The surface indicated by reference numeral 21B in fig. 5 and the like is the base rearmost surface, which is farthest from the FOUP main body 42, at the periphery of the opening 21a (the opening 215 of the window frame 216) in the base 21.
When the stage 23 is moved to the predetermined docking position, the control unit 2C performs a process of holding and fixing at least two sides of the FOUP4 using the movement restricting unit L in the load port 2 of the present embodiment. Specifically, the engaging piece L1 is pulled into the base 21 side by the pulling-in portion L2 of the movement restricting portion L. Then, the engagement piece L1 is switched from the non-facing posture to the facing posture, and is engaged with the flange 45 of the FOUP main body 42. In this state, the flange portion 45 of the FOUP4 positioned on the mounting table 23 at the docking position can be sandwiched between the engagement piece L1 of the movement restricting portion L and the base front-most surface 21A (front surface 216A of the window frame portion 216). That is, the container gripping process is realized by a process of switching the movement restriction portion L from the movement permission state to the movement restriction state.
The timing of switching the movement restriction portion L from the movement permission state to the movement restriction state may be after the timing of positioning the mounting table 23 at the docking position, or the movement restriction portion L may be switched from the movement permission state to the movement restriction state shortly after positioning the mounting table 23 at the docking position. Further, the movement limiting portion L may be configured to switch from the movement allowing state to the movement limiting state after a predetermined time elapses from the positioning of the mounting table 23 at the docking position.
In the load port 2 of the present embodiment, when the container clamping process is completed, the rear surface 42B of the FOUP main body 42, which is set as a sealing surface in the FOUP4 placed on the placing table 23 positioned at the docking position, is elastically brought into contact with the first seal portion 5 of the base 21 in the vicinity of the opening 21a (the opening 215 of the window frame 216) of the base 21, and a good sealing region can be formed between the FOUP4 and the base 21 by elastic deformation of the first seal portion 5. That is, in the load port 2 of the present embodiment, by performing the container clamping process, a process (sealing process) of forming a good sealing region between the FOUP4 and the susceptor 21 can be performed at the same time.
Specifically, the portion with which the first seal portion 5 elastically contacts is a portion around the vicinity of the carry-out entrance 41 of the FOUP4 in the rear face 42B of the FOUP main body 42. In the load port 2 of the present embodiment, a seal area is formed with the rear surface 42B of the FOUP main body 42 as a seal surface, which can immediately follow even if the seal surface fluctuates due to vibration or the like. In the load port 2 of the present embodiment, the state of the FOUP4 fixed to the mounting table 23 positioned at the docking position by the movement restricting portion L can be maintained by the container gripping process. Therefore, the FOUP4 in elastic contact with the first seal portion 5 can be prevented from moving in a direction away from the base 21 or tilting. In particular, in the present embodiment, the movement restricting portions L disposed in the four portions in total in the vicinity of the upper ends and the vicinity of the lower ends of the two sides of the substantially rectangular opening 215 can fix the four portions in total in the vicinity of the upper ends and the vicinity of the lower ends of the two sides of the front end portion of the FOUP main body 42.
In the load port 2 of the present embodiment, the control unit 2C performs a process (door cleaning process) of supplying nitrogen gas to the closed space DS and discharging the gas (atmosphere) staying in the closed space DS at this point by the gas discharge unit 72, after the container clamping process and the sealing process. The door cleaning process is a process of injecting nitrogen gas supplied from an appropriate gas supply source into the sealed space DS and replacing the sealed space DS with nitrogen gas. Specifically, the following process is performed: by opening the door cleaning gas injection valve 71a, nitrogen gas is supplied from the gas injection portion 71 to the closed space DS, and simultaneously, the door cleaning gas discharge valve 72a is opened, and the gas (atmosphere) remaining in the closed space DS is discharged by the gas discharge portion 72. Here, the atmosphere contains oxygen, moisture, particles, and the like, which may change the performance of the wafer W, such as oxidizing the wafer W. In addition, if the interior of the FOUP door 43 is hollow and the interior space of the FOUP door 43 communicates with the sealed space DS through a hole (door holding hole or the like) formed in the rear surface of the FOUP door 43, the interior space of the FOUP door 43 can be replaced with nitrogen gas by the door cleaning process of the present embodiment.
In the present embodiment, the sealed space DS is set to be at a positive pressure by increasing the supply amount of nitrogen gas to be larger than the discharge amount of nitrogen gas during the door cleaning process. As shown in fig. 10, at a proper timing after the timing when the sealed space DS becomes positive pressure, the preferential opening portion X (the widthwise central portion of the upper portion 5A in the present embodiment) in the first seal portion 5 is opened preferentially to the other portions of the first seal portion 5 and the second seal portion 6, that is, the non-opening portion Y. That is, the front end portion of the first seal portion 5 is elastically deformed by being pressed by the nitrogen gas filled in the sealed space DS so that the front end portion of the first seal portion is elastically brought into contact with the sealing surface of the FOUP4 in a lifted state, and the elastic contact state with the sealing surface of the FOUP4 is released by the front end portion of the first seal portion being deformed in the lifted direction. As a result, the load port 2 of the present embodiment can discharge nitrogen gas in the sealed space DS from the portion (the elastic contact state is released) that is opened in the first seal portion 5, that is, the preferential opening portion X (the discharge direction is schematically indicated by an arrow in fig. 10). The supply of nitrogen gas to the sealed space DS and the discharge of nitrogen gas are continued even after the time when nitrogen gas can be discharged from the preferential opening portion X of the first seal portion 5, and the gas is continuously filled into the sealed space DS. After a predetermined time has elapsed since the start of the door cleaning process, the door cleaning gas injection valve 71a and the door cleaning gas discharge valve 72a are closed, thereby ending the filling of the closed space DS with gas. Further, the gas injection operation of injecting the gas from the gas injection portion 71 into the sealed space DS and the gas discharge operation of discharging the gas from the sealed space DS by the gas discharge portion 72 may be repeated. The load port 2 of the present embodiment can maintain the sealed state of the non-open portion Y of the first seal portion 5 and the non-open portion Y of the second seal portion 6 even in the door cleaning process.
The load port 2 of the present embodiment is provided with an exhaust unit 8 (indicated by a two-dot chain line in fig. 9 and 10) in the vicinity of the preferential opening portion X in the first seal portion 5 and at the atmospheric pressure outside the closed space DS GS. The exhaust unit 8 includes: an exhaust port 81 set to an opening size capable of covering a portion (a preferential opening portion X) of the first sealing portion 5 where the sealed space DS is opened when the pressure is positive; and a suction box 82 that sucks the gas passing through the exhaust port 81. The exhaust unit 8 is connected to an exhaust system (not shown) such as an exhaust blower of a factory provided with the EFEM1, and is configured to be capable of forcibly sucking and exhausting the surplus gas. Further, by disposing an appropriate flow rate adjustment valve or shielding valve between the exhaust blower and the exhaust unit 8, the suction force or discharge amount of the exhaust unit 8 can be adjusted.
Therefore, the load port 2 of the present embodiment can perform the exhausting and the sucking so that the nitrogen gas leaking from the inside of the sealed space DS to the outside GS of the sealed space DS is guided into the exhausting unit 8 through the opened (the elastic contact state released) preferential opening portion X of the first seal portion 5. Further, in the process of performing the door cleaning process, if the positive pressure of the closed space DS (the pressure of the closed space DS is reduced from the positive pressure to the pressure close to the atmospheric pressure) can be maintained at a proper timing after the timing at which the inside of the closed space DS becomes positive pressure, the amount of the gas to be used and the gas use time can be limited by reducing the supply amount of the nitrogen gas to the closed space DS, and the cost can be reduced. Further, by providing an oxygen concentration meter that measures the oxygen concentration in the exhaust unit 8, the oxygen concentration in the exhaust unit 8 can be grasped. When the detection value of the oxygen concentration meter is configured to be input to the control unit, appropriate control according to the detection value of the oxygen concentration meter can be performed.
In the load port 2 of the present embodiment, the control unit 2C switches the connection mechanism 221 to the lid connection state (lid connection process) after the door cleaning process. By this process, the FOUP door 43 is connected to the loading port door 22 standing by in the fully closed position C by the connection mechanism 221, and can be held in a state of being opposed to each other with a predetermined gap therebetween. The FOUP door 43 is detachable from the FOUP main body 42. In the load port 2 of the present embodiment, the control unit 2C detects that the bottom surface portion of the FOUP4 presses a pressed portion of, for example, a pressure sensor provided on the stage 23 at a time point when the FOUP4 is placed at a normal position on the stage 23. In response to this, the control unit 2C gives a drive command (signal) to push the nozzles 261 (all the nozzles 261 including the nozzles functioning as the gas introduction units) provided on the mounting table 23 upward from the upper surface of the mounting table 23. As a result, the nozzles 261 are connected to the inlet and the outlet of the FOUP4, respectively, to supply nitrogen gas to the internal space 4S of the FOUP4, and to discharge the gas atmosphere in the FOUP4, and the internal space 4S of the FOUP4 is replaced with nitrogen gas, so that the water concentration and the oxygen concentration in the FOUP4 are reduced to a predetermined value or less, respectively, to thereby bring the surrounding environment of the wafer W in the FOUP4 to a low humidity environment and a low oxygen environment (bottom cleaning process).
In the load port 2 of the present embodiment, the control unit 2C executes a process (container sealing release process) of moving the FOUP door 43 together with the load port door 22, opening the opening 21a of the base 21 and the carry-out inlet 41 of the FOUP4, and releasing the sealed state in the FOUP4 after the lid connection process. Specifically, as shown in fig. 7, the control unit 2C moves the loading port door 22 from the fully closed position C toward the transfer chamber 3 along the horizontal path to the open position O in the internal space 5S of the chamber 5 by the door moving mechanism 27, and lowers the loading port door 22 reaching the open position O by a predetermined distance along the vertical path to be positioned at the fully open position (not shown). At the start of the container sealing release process, the sealed space DS and the inner space 4S of the FOUP4 are filled with nitrogen gas by the door cleaning process and the bottom cleaning process (in-container cleaning process), so that particles and the like adhering to the FOUP door 43 at the time before the door cleaning process is performed can be prevented from flying when the load port door 22 is moved to the inner space 3S side of the transfer chamber 3.
Thereby, the internal space 4S of the FOUP main body 42 and the internal space 3S of the transfer chamber 3 are in a state of communicating with each other. The nitrogen gas of the downdraft generated in the transfer space 3S is also kept clean. Here, when the volume (volume) of the sealed space DS increases at the time of performing the container sealing release process, the sealed space DS tends to become negative pressure, and there is a concern that the atmosphere enters the sealed space DS from the external space GS. Therefore, in the present embodiment, the container sealing release process is performed in a state where the sealed space DS is positive in pressure with respect to the external space GS. Specifically, at the time of performing the container sealing release process, the nitrogen gas continues to be supplied from the gas injection unit 71. In this way, in the present embodiment, the container sealing release process is set to be performed in a state where the sealed space DS is at least not negative pressure. In addition, the container sealing releasing process preferably opens the sealed space DS to the conveying space 3S with a uniform pressure. The pressure difference between the outer space GS and the conveyance space 3S is 3 to 500Pa (G), preferably 5 to 100Pa (G). In a state where the inner space 4S of the FOUP main body 42 is communicated with the inner space 3S of the transfer chamber 3 by the container sealing release process, the transfer robot 31 provided in the inner space 3S of the transfer chamber 3 accesses the inside of the FOUP4, and performs a transfer process (transfer process) with respect to the wafer W. The conveyance processing that can be performed in the conveyance processing includes a process in which the conveyance robot 31 takes out the wafer W in the FOUP4 by hand and a process in which the processed wafer W after the appropriate processing by the processing apparatus M is put into the FOUP4 by hand. For example, when the wafer W in the FOUP4 is transferred into the transfer chamber 3 by the transfer process, the wafer W transferred into the transfer chamber 3 is transferred to the processing apparatus M (specifically, the load lock chamber) or to the buffer station or the aligner by the transfer robot 31. The transfer robot 31 stores the processed wafers W after the appropriate processing in the processing apparatus M directly into the internal space 4S of the FOUP4 from the internal space MS of the processing apparatus M, or sequentially into the internal space 4S of the FOUP4 via the buffer position.
In the load port 2 of the present embodiment, when the transfer robot 31 performs the next access to the FOUP4, the transfer process is repeated. In the load port 2 of the present embodiment, when the process performed by the processing apparatus M is completed for all the wafers W in the FOUP4, the control unit 2C performs a process (container sealing process) of sealing the internal space 4S of the FOUP4 by moving the load port door 22 to the fully closed position C by the door moving mechanism 27 and closing the opening 21a of the susceptor 21 and the carry-out inlet 41 of the FOUP 4.
Next, the control unit 2C performs a process (cover coupling releasing process) of switching the coupling mechanism 221 from the cover coupling state to the cover coupling releasing state. By this process, the coupling state (lid coupling state) between the loading port door 22 and the FOUP door 43 by the coupling mechanism 221 is released, and the FOUP door 43 can be attached to the FOUP main body 42. As a result, the opening 21a of the base 21 and the carry-out port 41 of the FOUP4 are closed by the loading port door 22 and the FOUP door 43, respectively, and the internal space 4S of the FOUP4 is sealed.
In the load port 2 of the present embodiment, when the door cleaning process is stopped, the sealed space DS is not in a positive pressure state, and the portion (the preferential opening portion X) of the first seal portion 5 that is opened during the door cleaning process returns to elasticity and comes into elastic contact with the sealing surface of the FOUP 4. However, in order to avoid occurrence of a defect caused by the fact that the sealed space DS is not in a positive pressure state, it is important to maintain the positive pressure state of the sealed space DS.
Next, in the load port 2 of the present embodiment, the control unit 2C performs a container clamp release process for releasing the fixed state (clamp state) of the FOUP4 by the movement restriction unit L. Specifically, the engaging piece L1 at a position pulled into the base 21 by the pulling-in portion L2 of the movement restricting portion L is moved in a direction away from the base 21. Then, the engagement piece L1 is automatically switched from the facing posture to the non-facing posture, and the engagement state of the engagement piece L1 with respect to the convex edge portion 45 of the FOUP main body 42 is released, whereby the fixed state of the FOUP4 by the movement restricting portion L can be released. That is, the container clamp release process can be realized by a process of switching the movement restriction portion L from the movement restriction state to the movement permission state.
Next, in the load port 2 of the present embodiment, the control unit 2C executes a process (docking release process) of moving the mounting table 23 in a direction away from the susceptor 21. The control unit 2C releases the FOUP4 locked by the locking claws 232 on the mounting table 23 (lock release process). Specifically, the lock state of the lock claw 232 with respect to the locked portion provided on the bottom surface of the FOUP4 is released. Thus, the FOUP4 storing wafers W subjected to the predetermined process is transferred from the stage 23 of each load port 2 to the container transfer device, and is carried out to the next process.
As described above, in the load port 2 of the present embodiment, in a state in which the load port door 22 is closed and the container 4 is brought into contact with the susceptor 21 via the first seal portion 5, the space in which the load port door 22 and the FOUP door 43 face each other with a gap of a predetermined size interposed therebetween is the sealed space DS partitioned by the first seal portion 5 and the second seal portion 6, and the gas injection portion 71 for injecting gas into the sealed space DS is provided, and the door cleaning process for replacing the sealed space DS with gas can be performed, so that particles adhering to the FOUP door 43, and the atmosphere containing oxygen, moisture, particles, and the like, which may possibly change the performance of the wafer W, such as oxidation, can be prevented or suppressed from flowing into the conveyance space 3S and the inside of the FOUP4 when the load port door 22 is opened. That is, oxygen, moisture, and particles in the closed space DS can be removed before the FOUP door 43 is opened and the closed space DS is opened.
In addition, the load port 2 of the present embodiment is configured such that, of the first seal 5 and the second seal 6, a part or all of the first seal 5 that is a seal on the FOUP4 side is set to be a preferential opening portion X that is opened preferentially to the second seal 6 by making the enclosed space DS positive in the door cleaning process, and at least gas in the enclosed space DS can be discharged to the outside GS through the opening portion (when air, particles, and the like that are present in the enclosed space DS are included before the door cleaning process is performed), and therefore, it is possible to prevent a situation in which the closing force of the load port door 22 becomes weak due to the enclosed space DS being positive in pressure, and particles that are attached to the FOUP door 43 at a time before the door cleaning process is performed, and the air that is present between the FOUP door 43 and the load port door 22 and contains oxygen, moisture, particles, and the like, flows from the enclosed space DS into the transport space 3S. This allows a large amount of gas to be supplied to the sealed space DS in a short time while maintaining high cleanliness of the inside of the FOUP4, the sealed space DS, and the conveyance space 3S, and allows the sealed space DS to be in a positive pressure state, thereby enabling a reduction in the time interval as compared with a mode in which the pressure is adjusted by supplying gas to the sealed space DS little by little while removing garbage or the like in the sealed space DS.
Further, according to the load port 2 of the present embodiment, it is not necessary to perform special control to equalize the pressure in the sealed space DS with the pressure in other spaces (the internal space 4S of the FOUP4, the conveyance space 3S, and the like), and it is possible to reduce the cost and the time interval by eliminating the need for control equipment (valves and pipes).
In particular, since the load port 2 of the present embodiment is configured such that the exhaust means 8 is provided in the vicinity of the preferential opening portion X and at the atmospheric pressure which is the outside GS of the sealed space DS, even when the pressure in the sealed space DS becomes high, it is possible to efficiently exhaust, by the exhaust means 8, at least the gas such as the door cleaning gas leaking from the preferential opening portion X of the first seal portion 5 which is the seal portion provided on the FOUP4 side to the outside GS of the sealed space DS. In particular, in the present embodiment, the gas discharge portion 72 for discharging the gas in the sealed space DS is provided in association with the gas injection portion 71 in order to form a flow of the gas in the sealed space DS. Here, in the case where the gas discharge portion 72 for discharging the gas in the sealed space DS is not provided, the gas in the sealed space DS may be discharged only from the portion (the preferential opening portion X) where the sealed space DS is opened, and there is a possibility that a place where the gas is difficult to exchange may be present in the sealed space DS. On the other hand, in the present embodiment, since the gas discharge portion 72 that actively discharges the gas in the sealed space DS is provided, it is possible to prevent or suppress occurrence of a situation where it is difficult to exchange the gas in the sealed space DS, as compared with a structure that does not include the gas discharge portion 72. The gas discharge portion 72 is not necessarily required to perform suction, and may be open to the atmosphere. When the atmosphere is open, the pipe (exhaust pipe) forming the gas discharge portion 72 is preferably made larger in diameter, and more specifically, the pipe (supply pipe) forming the gas injection portion 71 is preferably made larger in diameter. In addition, by providing the plurality of gas injection portions 71 and the gas discharge portions 72, it is possible to prevent or suppress occurrence of a situation where it is difficult to exchange gas in the sealed space DS with a high probability. The present invention also includes a configuration without the gas exhaust portion 72 as an example of the EFEM of the present embodiment.
In the case where the embodiment described above is used as the first embodiment, the load port 2 according to the second embodiment of the present invention will be described below.
The load port 2 of the second embodiment has substantially the same structure as the load port 2 of the first embodiment, and differs from the load port 2 of the first embodiment in the following respects: a part or the whole of the second seal portion 6 is set as a preferential opening portion X which is opened preferentially than the second seal portion 6 by making the sealed space DS under negative pressure at the time of the door cleaning process of replacing the sealed space DS with a gas. In the following description and fig. 11 and 12, the same reference numerals are given to the parts corresponding to the parts of the load port 2 of the first embodiment.
The first sealing portion 5 provided in the load port 2 of the second embodiment is provided around the opening 21A in the vicinity of the opening edge of the opening 21A in the front surface 21A of the susceptor 21, and seals between the periphery of the opening 21A of the susceptor 21 and the FOUP4 when the FOUP4 is positioned at a predetermined position in front of the susceptor 2 (see fig. 11). In the present embodiment, which adopts the structure in which the window unit 214 is mounted on the base 21, the first seal portion 5 is provided at a position surrounding the opening 215 in the vicinity of the opening edge of the opening 215 in the front surface 216A of the window frame 216. Specifically, the first seal portion 5 is circumferentially mounted on the front surface 216A of the window frame 216 at a position facing a FOUP seal surface (a surface of the FOUP body 42 set on the peripheral portion of the FOUP door 43) that is the rear surface 42B of the FOUP body 42. The first seal portion 5 disposed around the opening 215 in the vicinity of the opening edge of the rectangular opening 215 has a substantially rectangular shape when viewed from the FOUP4 side. Therefore, the first seal portion 5 is roughly divided into an upper portion 5A disposed near the opening upper edge of the opening portion 215, a lower portion 5B disposed near the opening lower edge of the opening portion 215, and side portions 5C disposed near the opening both side edges of the opening portion 215. The first seal portion 5 of the present embodiment having a rectangular shape including the four side portions has a shape in which four corners are smoothly connected by circular arcs.
In the present embodiment, as the first seal portion 5, an O-ring having a substantially circular cross-sectional shape is used, and a common O-ring is disposed over the upper side portion 5A, the lower side portion 5B, and the left and right side portions 5C of the first seal portion 5. As described above, in the present embodiment, the entire first seal portion 5 is formed of the elastic body (circular elastic body D1) having a substantially circular cross-sectional shape, and the entire first seal portion 5 is set to the "non-open portion Y".
The first seal portion 5 is interposed between the FOUP4 placed on the stage 23 positioned at the docking position and the peripheral edge of the opening 21a of the base 21, and functions as a seal.
Fig. 11 shows a state in which the first seal portion 5 is in elastic contact with the FOUP4 mounted on the mounting table 23 positioned at a predetermined docking position. The load port 2 of the present embodiment is arranged such that the first seal portion 5 protrudes toward the FOUP4 side of the end surface closest to the FOUP4 in the load port door 22 by a predetermined dimension (for example, 0.1mm or more and 3mm or less). Therefore, the FOUP door 43 and the load port door 22 do not contact each other, and the first seal 5 can maintain high tightness of the sealed space DS formed between the base 21 and the load port door 22.
That is, as shown in fig. 11, the first seal portion 5 elastically contacts the rear surface 42B of the FOUP main body 42 mounted on the mounting table 23 positioned at the predetermined docking position. Specifically, the entire first seal portion 5 is elastically deformed in a state of being crushed in the front-rear direction D compared to the time before the elastic contact with the FOUP4 by elastically contacting the rear surface 42B of the FOUP main body 42 mounted on the mounting table 23 positioned at the predetermined abutting position. By maintaining the elastic contact state between the first seal portion 5 and the FOUP4, a good seal area can be formed.
The second seal portion 6 is provided around the opening 21a in the vicinity of the opening edge of the opening 21a in the rear surface 21B of the base 21. In the present embodiment, which adopts the structure in which the window unit 214 is mounted on the base 21, the second seal portion 6 is provided at a position surrounding the opening 215 in the vicinity of the opening edge of the opening 215 in the rear face 216B of the window frame 216. Specifically, the second seal portion 6 is circumferentially mounted in a position opposed to a sealing surface (a surface set at an outer edge portion of the loading port door 22) of a predetermined portion of the front surface of the loading port door 22, that is, the entire surface 21A set at the base, in the rear surface 216B of the window frame portion 216. In the present embodiment, the flange-like thin wall portion formed on the outer peripheral edge portion of the loading port door 22 is set as the sealing surface of the loading port door 22. The second seal 6 disposed around the opening 215 near the opening edge of the rectangular opening 215 is substantially rectangular when viewed from the transfer chamber 3 side.
In the present embodiment, the second seal portion 6 is formed of an elastic body (circular elastic body D1) having a substantially circular cross-sectional shape in a majority, and is formed of an elastic body (non-circular elastic body D2) having a cross-sectional shape that is more easily elastically deformed than the substantially circular elastic body. Specifically, the second seal 6 includes a predetermined portion including the entire lower edge portion 6B, the entire left and right side edge portions 6C, and the width-direction both end portions of the upper edge portion 6A, and is formed of a circular elastic body D1, and the width-direction center portion of the upper edge portion 6A in the second seal 6 is formed of a non-circular elastic body D2. The non-circular elastic body D2 of the present embodiment is an elastic body having a cross-sectional shape (a bar shape having a longer dimension than a diameter of the substantially circular elastic body in cross-sectional view) and being disposed in a posture in which the rounded distal end portion gradually displaces downward as it goes rearward (the side of the transfer chamber 3) (a posture in which the distal end portion sags, a posture in which the distal end portion deforms into the sealed space DS).
When the loading port door 22 is positioned at the closed position, the loading port door 22 (more specifically, the thin wall portion) is brought into contact with the rear surface 216B of the window frame 216 via the second seal portion 6, and the second seal portion 6 seals between the peripheral edge of the opening 21a of the base 21 and the loading port door 22 (see fig. 11). In particular, the preferential opening portion X of the second seal portion 6 is elastically contacted with the loading port door 22, whereby the front end portion is elastically deformed in a state of being pressed downward (toward the inside of the sealed space DS) than at the time before being elastically contacted with the loading port door 22. As a result, in a state in which the loading port door 22 is positioned at the closed position, outflow of the gas from the interior space 3S of the transfer chamber 3 to the outside of the transfer chamber 3 and inflow of the gas from the outside of the transfer chamber 3 to the interior space 3S of the transfer chamber 3 can be suppressed. In a state where the second seal portion 6 performs a sealing function, the second seal portion 6 receives a predetermined pressure between the sealed space DS including the sealing region of the second seal portion 6 and the internal space 3S of the transfer chamber 3, and as shown in fig. 12, the preferential opening portion X in the second seal portion 6 is opened by releasing the sealing state preferentially to the non-opening portion Y.
In the load port 2 of the present embodiment, mounting grooves (in fig. 11 and 12, recesses into which the first seal portion 5 and the second seal portion 6 are fitted) having a concave cross section are formed in the front surface 216A and the rear surface 216B of the window frame portion 216 so as to surround the vicinity of the opening edge of the opening portion 215, respectively. The first seal 5 and the second seal 6 are tightly attached in a state of being inserted into the seal attachment grooves. In particular, the seal attachment groove for attaching the preferential opening portion X in the second seal portion 6 is set to a cross-sectional trapezoid that gradually expands toward the depth direction of the groove, and is fixed by an appropriate means such as an adhesive in a state where an insertion portion provided at the base end portion of the preferential opening portion X is fitted into the seal attachment groove of the trapezoid. This prevents the preferential opening portion X of the second seal portion 6 from coming off the seal attachment groove. In this attached state, the portions of the first seal portion 5 and the second seal portion 6 not accommodated in the attachment groove are exposed to the outside of the attachment groove.
In the present embodiment, when the mounting table 23 is positioned at a predetermined docking position, the rear surface 42B of the FOUP main body 42 is brought close to the front surface 21A of the base 21 (the front surface 216A of the window frame 216) with a gap of a predetermined size interposed therebetween, and the gap is configured to be sealable by the first sealing portion 5. In the load port 2 of the present embodiment, after the time when the mounting table 23 is positioned at the predetermined docking position, if the load port door 22 is in the closed state, the FOUP door 43 and the load port door 22 are brought close to each other with a gap of a predetermined size therebetween, and the second seal 6 can seal between the load port door 22 and the susceptor 21. Therefore, the space in which the loading port door 22 and the FOUP door 43 face each other with a gap of a predetermined size therebetween becomes the sealed space DS partitioned by the first seal 5 and the second seal 6.
The loading port door 22 of the second embodiment includes: a gas injection part 71 for injecting a gas into the closed space DS; and a gas discharge portion 72 (corresponding to the "discharge portion" of the present invention) for discharging the gas in the sealed space DS, the gas injection portion 71 supplies the gas such as dry nitrogen gas to the sealed space DS, and the gas discharge portion 72 discharges the gas (including the gas) in the sealed space DS, whereby the sealed space DS can be purged with the gas.
In the load port 2 of the present embodiment, when the container clamping process is completed, the rear surface 42B of the FOUP main body 42, which is set as a sealing surface in the FOUP4 placed on the placing table 23 positioned at the docking position, is elastically brought into contact with the first seal portion 5 of the base 21 in the vicinity of the opening 21a (the opening 215 of the window frame 216) of the base 21, and a good seal area can be formed between the FOUP4 and the base 21 by elastic deformation of the first seal portion 5. That is, in the load port 2 of the present embodiment, by performing the container clamping process, a process (sealing process) of forming a good sealing region between the FOUP4 and the susceptor 21 can be performed at the same time.
In the load port 2 of the present embodiment, the control unit 2C performs a process (door cleaning process) of supplying nitrogen gas to the closed space DS and discharging the gas (atmosphere) staying in the closed space DS at this point by the gas discharge unit 72, after the container clamping process and the sealing process. In the present embodiment, the vacuum in the sealed space DS is set to be negative by increasing the discharge amount of nitrogen gas more than the supply amount of nitrogen gas during the door cleaning process.
As shown in fig. 12, at a proper timing after the timing when the sealed space DS becomes negative pressure, the preferential opening portion X (the widthwise central portion of the upper portion 6A in the present embodiment) in the second seal portion 6 is opened preferentially to the other portions of the second seal portion 6 and the first seal portion 5, that is, the non-opening portion Y. That is, in the second seal portion 6, the preferential opening portion X that elastically contacts the sealing surface of the loading port door 22 in a state in which the front end portion sags is pressed by the nitrogen gas filled in the closed space DS to elastically deform, and is deformed in a direction in which the front end portion of the preferential opening portion X is pressed down (toward the inside of the closed space DS), thereby releasing the elastic contact state with respect to the sealing surface of the loading port door 22. As a result, in the load port 2 of the present embodiment, an air flow (the air flow from the inner space 3S of the transfer chamber 3 to the closed space DS is schematically indicated by the arrow in fig. 12) is formed from the inner space 3S of the transfer chamber 3 to the closed space DS through the opened (the elastic contact state is released) portion, i.e., the preferential opening portion X, in the second seal portion 6. The supply and discharge of nitrogen gas to and from the sealed space DS are continued even after the time when the gas flow through the preferential opening portion X of the second seal portion 6 is formed, and the gas filling into the sealed space DS is continued. After a predetermined time has elapsed from the start of the door cleaning process, the door cleaning gas injection valve and the door cleaning gas discharge valve are closed, thereby ending the filling of the closed space DS with gas. Further, the gas injection operation of injecting the gas from the gas injection portion 71 into the sealed space DS and the gas discharge operation of discharging the gas from the sealed space DS by the gas discharge portion 72 may be repeated.
In the load port 2 of the present embodiment, a suction path for sucking the inside of the sealed space DS is formed by the gas discharge portion 72, and the discharge portion 72 functions as an exhaust means. The exhaust unit is connected to an exhaust system (not shown) such as an exhaust blower of a factory provided with the EFEM1, and is configured to be capable of forcibly sucking and exhausting surplus gas. Further, the suction force or the discharge amount of the exhaust unit can be adjusted by disposing an appropriate flow rate adjustment valve or a shielding valve between the exhaust blower and the exhaust unit.
In the load port 2 of the present embodiment, when the negative pressure state of the closed space DS is maintained at a proper timing after the timing at which the inside of the closed space DS is brought into the negative pressure during the door cleaning process, the amount of the gas to be used and the gas use time can be limited by reducing the supply amount of the nitrogen gas to the closed space DS, so that the cost can be reduced. Further, by providing an oxygen concentration meter that measures the oxygen concentration in the exhaust unit, the oxygen concentration in the exhaust unit can be grasped, and when the detection value of the oxygen concentration meter can be input to the control unit, appropriate control according to the detection value of the oxygen concentration meter can be performed. In addition, when the container sealing release process is performed, the sealed space DS is in a negative pressure state, and thus, there is a concern that the atmosphere enters the sealed space DS from the external space GS. Therefore, in the present embodiment, it is preferable to perform the container sealing release process in a state where the sealed space DS is positive in pressure with respect to the external space GS. Specifically, at the time of performing the container sealing release process, the nitrogen gas is continuously supplied from the gas injection portion 71, and the container sealing release process can be performed in a state where the sealed space DS is at least not negative pressure.
By performing the door cleaning function, the load port 2 according to the second embodiment can prevent or suppress the particles adhering to the FOUP door 43, and the atmosphere including oxygen, moisture, particles, and the like, which may cause a change in the performance of the wafer W, such as oxidation of the wafer W, existing between the FOUP door 43 and the load port door 22, from flowing into the conveyance space 3S and the interior of the FOUP4 when the load port door 22 is opened. That is, oxygen, moisture, and particles in the closed space DS can be removed before the FOUP door 43 is opened and the closed space DS is opened.
In the load port 2 according to the second embodiment, a part or all of the first seal portion 5 and the second seal portion 6, which are seal portions on the transfer chamber 3 side, is set to be a preferential opening portion X that is preferentially opened than the first seal portion 5 by making the closed space DS be under negative pressure during the door cleaning process, so that an air flow from the transfer space 3S to the closed space DS through the opening portion can be formed, and the following situation can be completely prevented: since the sealed space DS becomes negative pressure and the sealing force of the FOUP door 43 becomes weak, particles adhering to the FOUP door 43 and the atmosphere containing oxygen, moisture, particles, and the like existing between the FOUP door 43 and the loading port door 22 flow from the sealed space DS into the FOUP4 at a time before the door cleaning process is performed; since the sealing force of the FOUP door 43 becomes weak due to the negative pressure in the sealed space DS, a gas flow from the inside of the FOUP4 to the sealed space DS through the gap between the FOUP door 43 and the FOUP main body 42 is formed, and the gas (atmosphere) flows backward from the exhaust port at the bottom of the FOUP into the FOUP4 or the sealed space DS. This allows the enclosed space DS to be in a negative pressure state by exhausting a large amount of gas from the enclosed space DS in a short time while maintaining high cleanliness of the enclosed space DS and the conveyance space 3S in the FOUP4, and allows the time interval to be shortened as compared with a case where garbage or the like in the enclosed space DS is removed while adjusting the pressure by supplying gas little by little to the enclosed space DS.
In addition, according to the load port 2 of the second embodiment, it is not necessary to perform special control to equalize the pressure in the closed space DS with the pressure in the other spaces (the internal space 4S of the FOUP4 and the transfer space 3S), and it is not necessary to use control equipment (valves and pipes) for performing control, so that cost reduction and reduction in the time interval can be achieved.
In particular, since the load port 2 of the second embodiment has a configuration in which the exhaust means is provided at a predetermined portion of the suction path for sucking the inside of the enclosed space DS, when the enclosed space DS is in a negative pressure state, the gas (door cleaning gas) in the enclosed space DS can be efficiently exhausted to the outside GS of the enclosed space DS by the exhaust means, and a situation that may occur if the enclosed space DS is in an excessive negative pressure state, that is, a situation in which the degree of sealing in the FOUP4 by the FOUP door 43 is lowered, and the atmosphere flows back into the FOUP4 from the exhaust port provided in the FOUP4 can be eliminated.
The EFEM1 according to the first and second embodiments includes: the load port 2 having the above-described structure; and a transfer chamber 3 in which a transfer robot is disposed in the transfer space 3S, the transfer robot can cause a transfer object such as a wafer W to enter and exit between the FOUP4 placed on the load port 2 and the transfer chamber 3, and the door cleaning process is performed at a timing earlier than the entry and exit process, so that the entry and exit process can be performed while maintaining a high degree of cleanliness of the inside of the FOUP4, the sealed space DS, and the transfer space 3S. In addition, the above-described operational effects of the load port 2 are obtained, and the problems (the decrease in the closing force of the load port door 22, the decrease in the closing force of the FOUP door 43, the contamination in the transfer chamber 3, and the contamination in the FOUP 4) caused by the positive pressure state or the negative pressure state of the sealed space DS can be eliminated, and the door cleaning process time and the interval time can be reduced.
The present invention is not limited to the above embodiments.
When the sealed space is in a positive pressure state, the portion (preferential opening portion) that is preferentially opened over the second seal portion may be a part of the first seal portion or may be the entire first seal portion. That is, when the sealed space is in the positive pressure state, the portion (the portion where the seal is easily torn) in which the sealed state is released by at least one portion of the first seal portion by the pressure from the inside of the sealed space to the outside of the sealed space is set in advance, and thus the substantially same operational effects as those of the loading port according to the first embodiment can be obtained. Therefore, a structure in which preferential opening portions are set at a plurality of positions of the first seal portion can also be employed.
The present invention may have any of the following structures: when the sealed space is at positive pressure, the preferential opening part of the first sealing part is in a preferential opening state than the second sealing part; the first sealing portion is preferably opened at a time point after the time point at which the sealed space becomes positive pressure (for example, a time point at which the sealed space becomes a pressure equal to or higher than a predetermined value).
Similarly, when the sealed space is in a negative pressure state, the portion that is preferably opened more than the first seal portion may be a part of the second seal portion or may be the entire second seal portion. That is, when the sealed space is in a negative pressure state, the portion (portion where the seal is easily torn) in which the sealed state is released from at least the portion of the second seal portion by the suction force applied to the sealed space is set in advance, whereby the substantially same operational effects as those of the loading port according to the second embodiment can be obtained. Therefore, a structure in which preferential opening portions are set at a plurality of positions of the second seal portion can also be employed.
The present invention may have any of the following structures: when the sealed space is at negative pressure, the preferential opening part of the second sealing part is in a preferential opening state than the first sealing part; at a proper time (for example, a time when the sealed space is at a pressure equal to or lower than a predetermined value) after the time when the sealed space is at a negative pressure, the preferential opening portion of the second seal portion is in a state of being preferentially opened than the first seal portion.
The cross-sectional shapes and materials of the preferential opening portion and the non-opening portion of the first seal portion and the second seal portion are not limited to those of the above-described embodiment, and may be appropriately changed or selected as long as they are members for ensuring sealing properties (sealing properties). As an example, a form in which either or both of the preferential opening portion and the non-opening portion are configured using a hollow seal portion that expands or contracts by the introduction or discharge of the fluid can be cited.
The shape of the seal mounting groove for mounting the first seal portion and the second seal portion may be appropriately changed according to the shape of the base end portion (mounting end portion) of the seal portion.
The exhaust unit can appropriately select any of a natural exhaust type or a suction exhaust (negative pressure exhaust) type. The position, size, number, etc. of the exhaust ports of the exhaust unit may be set according to the position, size, number, etc. of the portion (preferential opening portion) of the first sealing portion that is preferentially opened than the second sealing portion when the sealed space is in the positive pressure state.
In the above embodiment, the FOUP used for wafer transfer is used as the container. However, the container of the present invention is not limited thereto, and MAC (Multi Application Carrier), H-MAC (Horizontal-MAC), FOSB (Front Open Shipping Box), and the like can be used. The container is not limited to the wafer storage container, and may be a closed container for storing a content (object to be transported) such as an electronic device transported in a state filled with an inert gas.
In the above-described embodiment, the configuration in which the load port is mounted to the EFEM has been described, but the present invention can also be applied to a sorter including a transfer chamber for sorting objects to be transferred in a container mounted on a load port and replacing objects to be transferred in a container mounted on another load port, and a processing apparatus itself as a transfer chamber and mounting the load port to the processing apparatus itself.
In the embodiment, the ambient gas used for the door cleaning process and the like is exemplified by nitrogen, but the present invention is not limited thereto, and a desired gas (inert gas) such as a dry gas or argon gas can be used.
In the embodiment, the configuration having the first seal portion and the second seal portion, respectively, is exemplified, but the loading port may be provided with a common seal portion integrally having the first seal portion disposed on the front surface of the base, the second seal portion disposed on the rear surface of the base, and the connecting portion disposed in a state penetrating the base in the thickness direction and connecting the first seal portion and the second seal portion.
A guide may be provided to guide the gas from the seal tearing portion (preferential opening portion) to the exhaust unit. In addition, if the amount of gas leaking from the sealed space in the positive pressure state to the outside of the sealed space through the preferential opening portion is small (the amount of the degree of risk to the operator) during the door cleaning process, the exhaust unit can be omitted.
In the above-described embodiment, the second sealing portion is provided at the rear surface of the base, but the second sealing portion may be provided at the front surface of the loading port door (for example, the front surface of the thin wall portion in the above-described embodiment), and the second sealing portion may be used to seal between the loading port door and the base in the closed state in which the opening of the base is closed.
The gap size that can be sealed by the first seal portion in the thickness direction of the base (front-rear direction of the container, base, transfer chamber arrangement), that is, the gap between the container and the base disposed at a predetermined position in front of the base, and the gap size that can be sealed by the second seal portion in the thickness direction of the base, that is, the gap between the loading port door and the base in the closed state in which the opening is closed, may be the same or substantially different. The shape, material, and the like of the sealing portion can be appropriately changed according to the size of the sealable gap.
The loading port door may be temporarily in an inclined posture (with the movement of the track in a partial circular arc shape) during the movement from the closed position to the fully open position.
In the first embodiment, the configuration including the gas supply portion and the gas discharge portion is exemplified as the load port, but a modification of the load port of this embodiment may be exemplified without the gas discharge portion. Even the load port having such a configuration can perform the door cleaning process by the gas supply unit or the airtight cleaning process based on the door cleaning process, and has the effect of functioning based on the load port of the first embodiment.
In the second embodiment, the configuration having the gas supply portion and the gas discharge portion is exemplified as the load port, but a modification of the load port of this embodiment may be exemplified without the gas supply portion. Even in the load port having such a configuration, the process of cleaning the closed space (the closed space cleaning process) can be performed by discharging the gas in the closed space from the discharge portion (the gas outlet portion), and the load port according to the second embodiment serves as a reference.
In addition, the specific configuration of each part is not limited to the above embodiment, and various modifications may be made without departing from the scope of the present invention.
Claims (8)
1. A load port, comprising:
a base that forms a part of a wall that separates the conveyance space from an external space, and has an opening through which the conveyance object can pass;
a loading port door capable of engaging with a container door provided in a container for accommodating the object to be transported and capable of opening and closing the opening of the base;
a first sealing part for sealing between a container arranged at a predetermined position in front of the base and the base; and
A second sealing part for sealing between the loading port door and the base in a closed state of closing the opening,
the loading port door is configured such that, in a state in which the loading port door is in the closed state and the container is in contact with the base via the first seal portion, a space in which the loading port door and the container door face each other with a gap of a predetermined size therebetween is a closed space partitioned by the first seal portion and the second seal portion,
further comprises a gas injection part for injecting gas into the closed space,
the first seal portion is partially or entirely configured to be a preferential opening portion that is opened preferentially than the second seal portion by making the sealed space at positive pressure during a door cleaning process for replacing the sealed space with the gas, and at least the gas in the sealed space can be discharged through the preferential opening portion.
2. The load port of claim 1, wherein the load port is configured to receive a load port,
and a gas discharge part for discharging the gas in the sealed space.
3. The load port of claim 1 or 2, wherein,
An exhaust unit is provided in the vicinity of the preferential opening portion and outside the closed space, i.e., at atmospheric pressure.
4. A load port, comprising:
a base that forms a part of a wall that separates the conveyance space from an external space, and has an opening through which the conveyance object can pass;
a loading port door capable of engaging with a container door provided in a container for accommodating the object to be transported and capable of opening and closing the opening of the base;
a first sealing part for sealing between a container arranged at a predetermined position in front of the base and the base; and
a second sealing part for sealing between the loading port door and the base in a closed state of closing the opening,
the loading port door is configured such that, in a state in which the loading port door is in the closed state and the container is in contact with the base via the first seal portion, a space in which the loading port door and the container door face each other with a gap of a predetermined size therebetween is a closed space partitioned by the first seal portion and the second seal portion,
further comprises a discharge part for discharging the gas in the closed space,
And a second seal portion that is provided in a part or the whole of the first seal portion, and that is opened in preference to the first seal portion by making the sealed space be under negative pressure during the sealed space cleaning process for exhausting the sealed space.
5. The load port of claim 4, wherein the load port is configured to receive a load port,
the gas injection part is provided for injecting gas into the closed space.
6. The load port of claim 4 or 5, wherein,
an exhaust unit is provided at a predetermined portion of a suction path for sucking the inside of the closed space.
7. An EFEM comprising:
the load port of any one of claims 1 to 6; and
the transfer space is provided with a transfer chamber for the transfer robot.
8. The EFEM as claimed in claim 7, wherein,
the transfer chamber has a circulation passage for circulating the gas in the transfer space,
the carrying space has a pressure difference of 3 to 500Pa (G) with respect to an external space other than the carrying space.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018072021A JP7125591B2 (en) | 2018-04-04 | 2018-04-04 | Loadport and EFEM |
| JP2018-072021 | 2018-04-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110349893A CN110349893A (en) | 2019-10-18 |
| CN110349893B true CN110349893B (en) | 2023-11-14 |
Family
ID=68171752
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910269198.6A Active CN110349893B (en) | 2018-04-04 | 2019-04-04 | Load port and EFEM |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7125591B2 (en) |
| KR (1) | KR20190116103A (en) |
| CN (1) | CN110349893B (en) |
| TW (1) | TWI803613B (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7422577B2 (en) * | 2020-03-23 | 2024-01-26 | 平田機工株式会社 | Load port and control method |
| CN112242338B (en) * | 2020-12-18 | 2021-03-02 | 西安奕斯伟硅片技术有限公司 | Load port and front end module capable of maintaining cleanliness of FOUP lid |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH06501815A (en) * | 1990-11-01 | 1994-02-24 | アシスト テクノロジーズ インコーポレイテッド | Apparatus and method for transferring articles between two controlled environments |
| JP2013118278A (en) * | 2011-12-02 | 2013-06-13 | Shin Etsu Polymer Co Ltd | Substrate housing container |
| JP2015115517A (en) * | 2013-12-13 | 2015-06-22 | シンフォニアテクノロジー株式会社 | Wafer transport device and efem |
| WO2016147980A1 (en) * | 2015-03-19 | 2016-09-22 | シンフォニアテクノロジー株式会社 | Door opening and closing device, transport device, sorter device, and docking method for container |
| WO2017022431A1 (en) * | 2015-08-04 | 2017-02-09 | シンフォニアテクノロジー株式会社 | Door opening/closing system, and load port equipped with door opening/closing system |
| WO2017169847A1 (en) * | 2016-03-29 | 2017-10-05 | シンフォニアテクノロジー株式会社 | Load port |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6024980B2 (en) | 2012-10-31 | 2016-11-16 | Tdk株式会社 | Load port unit and EFEM system |
| US9136149B2 (en) * | 2012-11-16 | 2015-09-15 | Taiwan Semiconductor Manufacturing Company, Ltd. | Loading port, system for etching and cleaning wafers and method of use |
| JP6291878B2 (en) * | 2014-01-31 | 2018-03-14 | シンフォニアテクノロジー株式会社 | Load port and EFEM |
| KR101739518B1 (en) | 2015-08-20 | 2017-05-26 | 비알 컨설팅 인코포레이티드 | Composition comprising the extracts of dendropanax morbifera |
-
2018
- 2018-04-04 JP JP2018072021A patent/JP7125591B2/en active Active
-
2019
- 2019-04-03 KR KR1020190039226A patent/KR20190116103A/en not_active Application Discontinuation
- 2019-04-03 TW TW108112022A patent/TWI803613B/en active
- 2019-04-04 CN CN201910269198.6A patent/CN110349893B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06501815A (en) * | 1990-11-01 | 1994-02-24 | アシスト テクノロジーズ インコーポレイテッド | Apparatus and method for transferring articles between two controlled environments |
| JP2013118278A (en) * | 2011-12-02 | 2013-06-13 | Shin Etsu Polymer Co Ltd | Substrate housing container |
| JP2015115517A (en) * | 2013-12-13 | 2015-06-22 | シンフォニアテクノロジー株式会社 | Wafer transport device and efem |
| WO2016147980A1 (en) * | 2015-03-19 | 2016-09-22 | シンフォニアテクノロジー株式会社 | Door opening and closing device, transport device, sorter device, and docking method for container |
| WO2017022431A1 (en) * | 2015-08-04 | 2017-02-09 | シンフォニアテクノロジー株式会社 | Door opening/closing system, and load port equipped with door opening/closing system |
| WO2017169847A1 (en) * | 2016-03-29 | 2017-10-05 | シンフォニアテクノロジー株式会社 | Load port |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20190116103A (en) | 2019-10-14 |
| TW201943007A (en) | 2019-11-01 |
| CN110349893A (en) | 2019-10-18 |
| JP7125591B2 (en) | 2022-08-25 |
| TWI803613B (en) | 2023-06-01 |
| JP2019186293A (en) | 2019-10-24 |
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